Bürger J, Venugopal H, Kool D, et al. HighResolution Study of Changes in Morphology and Chemistry of Cylindrical PS            b            PMMA Block Copolymer Nanomasks during Mask Development. Advanced Materials Interfaces. 2022;9(26). doi:10.1002/admi.202200962

Meier F, Littmann M, Bürger J, et al. Selective Area Growth of Cubic Gallium Nitride in Nanoscopic Silicon Dioxide Masks. physica status solidi (b). Published online 2022. doi:10.1002/pssb.202200508

Bürger J, Venugopal H, Kool D, et al. HighResolution Study of Changes in Morphology and Chemistry of Cylindrical PS            b            PMMA Block Copolymer Nanomasks during Mask Development. Advanced Materials Interfaces. 2022;9(26). doi:10.1002/admi.202200962

Bürger J, Kunnathully V, Kool D, Lindner J, Brassat K. Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM. Nanomaterials. 2020;10(1). doi:10.3390/nano10010141

Brassat K, Kool D, Lindner J. Modification of block copolymer lithography masks by O2 plasma treatment: Insights from lift off experiments, nanopore etching and free membranes. To be submitted.

Brassat K, Kool D, Bürger J, Lindner J. Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography. Nanoscale. 2018;10(21):10005-10017. doi:10.1039/c8nr01397g

Brassat K, Kool D, Lindner J. Hierarchical nanopore and nanoring arrays by self-assembly techniques. In: ; 2018.

Brassat K, Taube A, Kool D, et al. Ti-6Al-4V alloy: 3D printing of lightweight implants and nanopatterning by self-assembly. In: ; 2018.

Brassat K, Kool D, Taube A, Schaper M, Lindner J. Morphology investigation of nanopores by block copolymer lithography on different material surfaces. In: ; 2018.

Brassat K, Kool D, Bürger J, Lindner J. Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques. In: ; 2017.

Brassat K, Kool D, Lindner J. Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography . In: ; 2016.