Single-Molecule Desorption Studies of Poly(acrylic acid) at Electrolyte/Oxide/TiAlN Interfaces
S. Schwiderek, A.G. Orive, S. Karimi Aghda, J.M. Schneider, M.T. de los Arcos de Pedro, G. Grundmeier, Langmuir (2020) 9489–9498.

Characterisation of micropores in plasma deposited SiO x  films by means of positron annihilation lifetime spectroscopy
C. Hoppe, F. Mitschker, M. Butterling, M.O. Liedke, M.T. de los Arcos de Pedro, P. Awakowicz, A. Wagner, G. Grundmeier, Journal of Physics D: Applied Physics (2020).

Influence of dielectric barrier plasma treatment of ZnMgAl alloycoated steel on the adsorption of organophosphonic acid monolayers
S. Knust, A. Kuhlmann, A.G. Orive, M.T. de los Arcos de Pedro, G. Grundmeier, Surface and Interface Analysis (2020) 1077–1082.

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO2-Based Thin-Film Transistor Devices
L. Mai, D. Zanders, E. Subaf, E. Ciftyurek, C. Hoppe, D. Rogalla, W. Gilbert, M.T. de los Arcos de Pedro, K. Schierbaum, G. Grundmeier, C. Bock, A. Devi, ACS Applied Materials &; Interfaces (2019) 3169–3180.

Potential Precursor Alternatives to the Pyrophoric Trimethylaluminium for the Atomic Layer Deposition of Aluminium Oxide
L. Mai, N. Boysen, D. Zanders, M.T. de los Arcos de Pedro, F. Mitschker, B. Mallick, G. Grundmeier, P. Awakowicz, A. Devi, Chemistry – A European Journal (2019) 7489–7500.

Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma
S. Knust, A. Kuhlmann, M.T. de los Arcos de Pedro, G. Grundmeier, RSC Advances (2019) 35077–35088.

Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers
I. Giner, B. Torun, Y. Han, B. Duderija, D. Meinderink, A.G. Orive, M.T. de los Arcos de Pedro, C. Weinberger, M. Tiemann, H.-J. Schmid, G. Grundmeier, Applied Surface Science (2019) 873–879.

Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids
X. Wu, M. Muntzeck, M.T. de los Arcos de Pedro, G. Grundmeier, R. Wilhelm, T. Wagner, Applied Optics (2018).

Luminescent N thin films: a new chemical vapour deposition route towards rare-earth sulphides
S. Cwik, S.M.J. Beer, M. Schmidt, N.C. Gerhardt, M.T. de los Arcos de Pedro, D. Rogalla, J. Weßing, I. Giner, M. Hofmann, G. Grundmeier, A.D. Wieck, A. Devi, Dalton Transactions (2018) 2926–2938.

Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD
D. Kirchheim, S. Wilski, M. Jaritz, F. Mitschker, M. Oberberg, J. Trieschmann, L. Banko, M. Brochhagen, R. Schreckenberg, C. Hopmann, M. Böke, J. Benedikt, M.T. de los Arcos de Pedro, G. Grundmeier, D. Grochla, A. Ludwig, T. Mussenbrock, R.P. Brinkmann, P. Awakowicz, R. Dahlmann, Journal of Coatings Technology and Research (2018) 573–583.

Validation of a Terminally Amino Functionalized TetraAlkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties
D. Zanders, E. Ciftyurek, C. Hoppe, M.T. de los Arcos de Pedro, A. Kostka, D. Rogalla, G. Grundmeier, K.D. Schierbaum, A. Devi, Advanced Materials Interfaces (2018).

PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials &; Interfaces (2018) 7422–7434.

PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials &; Interfaces (2018) 7422–7434.

PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads
M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials &; Interfaces (2018) 7422–7434.

Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene
J. Dietrich, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier, Contributions to Plasma Physics (2018) 377–383.

Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas
M. Budde, C. Corbella, S. Große-Kreul, M.T. de los Arcos de Pedro, G. Grundmeier, A. von Keudell, Plasma Processes and Polymers (2018).

Water assisted atomic layer deposition of yttrium oxide using tris(N,N-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties
L. Mai, N. Boysen, E. Subaf, M.T. de los Arcos de Pedro, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi, RSC Advances (2018) 4987–4994.

Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)
F. Mitschker, L. Schücke, C. Hoppe, M. Jaritz, R. Dahlmann, M.T. de los Arcos de Pedro, C. Hopmann, G. Grundmeier, P. Awakowicz, Journal of Physics D: Applied Physics (2018).

Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET
F. Mitschker, J. Wißing, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier, P. Awakowicz, Journal of Physics D: Applied Physics (2018).

Connection between target poisoning and current waveforms in reactive high-power impulse magnetron sputtering of chromium
V. Layes, C. Corbella, S. Monjé, V. Schulz-von der Gathen, A. von Keudell, M.T. de los Arcos de Pedro, Plasma Sources Science and Technology (2018).