Volk MF, Rüter CE, Santandrea M, et al. Fabrication of low-loss Rb-exchanged ridge waveguides in z-cut KTiOPO_4. Optical Materials Express. Published online 2017. doi:10.1364/ome.8.000082
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DOI: 10.1364/ome.8.000082

Brecht B, Lazo-Arjona O, Kaczmarek KT, et al. A monolithic, doubly-resonant parametric down-conversion source for Caesium Raman memories. In: Frontiers in Optics 2017. ; 2017. doi:10.1364/fio.2017.jw4a.3
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Stefszky M, Ricken R, Eigner C, Quiring V, Herrmann H, Silberhorn C. Waveguide Cavity Resonator as a Source of Optical Squeezing. Physical Review Applied. 2017. doi:10.1103/physrevapplied.7.044026
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Sansoni L, Luo KH, Eigner C, et al. A two-channel, spectrally degenerate polarization entangled source on chip. npj Quantum Information. Published online 2017. doi:10.1038/s41534-016-0005-z
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Burenkov IA, Sharma AK, Gerrits T, et al. Full statistical mode reconstruction of a light field via a photon-number-resolved measurement. Physical Review A. 2017. doi:10.1103/physreva.95.053806
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Meyer-Scott E, Montaut N, Tiedau J, et al. Limits on the heralding efficiencies and spectral purities of spectrally filtered single photons from photon-pair sources. Physical Review A. 2017. doi:10.1103/physreva.95.061803
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Riedl T, Lindner J. Heteroepitaxy of III–V Zinc Blende Semiconductors on Nanopatterned Substrates. In: Nanai L, ed. Nanoscaled Films and Layers. InTech; 2017. doi:10.5772/67572
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Brassat K, Lindner J. Joining self-assembly techniques: A route to hierarchical nanopores. In: ; 2017.
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Brassat K, Kool D, Bürger J, Lindner J. Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques. In: ; 2017.
LibreCat: /record/3952

Brassat K, Keller A, Grundmeier G, Bremser W, Strube O, Lindner J. Tailored antidot patterns created by nanosphere lithography for bioapplications. In: ; 2017.
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Kismann M, Riedl T, Lindner J. Morphological properties of nanopillar patterned Si surfaces obtained by nanosphere lithography and metal-assisted wet-chemical etching. 2017.
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Kunnathully V, Riedl T, Karlisch A, Reuter D, Lindner J. InAs heteroepitaxy on GaAs patterned by nanosphere lithography. In: ; 2017.
LibreCat: /record/3955

Riedl T, Kunnathully V, Karlisch A, Reuter D, Lindner J. Group III arsenide heteroepitaxy on Si(111) using SiNx nanohole masks patterned by nanosphere lithography. In: ; 2017.
LibreCat: /record/3987

Riedl T, Kunnathully V, Karlisch A, et al. Morphology, structure and enhanced PL of molecular beam epitaxial In0.2G.8As layers on nanopillar patterned GaAs. 2017.
LibreCat: /record/3988

Riedl T, Lindner J. Strain and strain energy in axial-heteroepitaxial GaAs/InAs nanopillars analyzed by atomistic and continuum elastic calculations. 2017.
LibreCat: /record/3989

Riedl T, Lindner J. The influence of the sphere material on the opening size distribution of nanosphere lithography masks. 2017.
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Riedl T, Kunnathully V, Lindner J. Evolution of the opening size of nanosphere lithography masks during thermal annealing. 2017.
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Rieger T, Riedl T, Neumann E, Grützmacher D, Lindner J, Pawlis A. Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence. ACS Applied Materials &; Interfaces. 2017;9(9):8371-8377. doi:10.1021/acsami.6b15824
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DOI: 10.1021/acsami.6b15824

Lindner J, Riedl T. Strain effects on the heteroepitaxy of III-V compound semiconductors on nanopatterned surfaces. In: ; 2017.
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Lindner J. Ion Beam Modification of Self-Organized Nanostructures. In: ; 2017.
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