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G. Grundmeier, A. von Keudell, and M. T. de los Arcos de Pedro, “Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces,”10.1002/ppap.201500087__Plasma Processes and Polymers, pp. 926–940, 2015, doi:10.1002/ppap.201500087 .

F. Mitschker et al., “Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films,”10.1002/ppap.201500085__Plasma Processes and Polymers, pp. 1002–1009, 2015, doi:10.1002/ppap.201500085 .

D. Schröder, S. Burhenn, M. T. de los Arcos de Pedro, and V. Schulz-von der Gathen, “Characteristics of a propagating, self-pulsing, constricted ‘;3-mode-like’ discharge,”10.1088/0022-3727/48/5/055206__Journal of Physics D: Applied Physics, Art. no. 055206, 2015, doi:10.1088/0022-3727/48/5/055206 .

A. Marcak, C. Corbella, M. T. de los Arcos de Pedro, and A. von Keudell, “Note: Ion-induced secondary electron emission from oxidized metal surfaces measured in a particle beam reactor,”10.1063/1.4932309__Review of Scientific Instruments, Art. no. 106102, 2015, doi:10.1063/1.4932309 .

T. Niendorf et al., “Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications,”10.1007/s11661-015-2932-2__Metallurgical and Materials Transactions A, pp. 2829–2833, 2015, doi:10.1007/s11661-015-2932-2 .

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H.-G. Steinrück et al., “Nanoscale Structure of Si/SiO2/Organics Interfaces,”10.1021/nn5056223__ACS Nano, vol. 8, pp. 12676–12681, 2014, doi:10.1021/nn5056223 .

A. Khassanov, T. Schmaltz, H.-G. Steinrück, A. Magerl, A. Hirsch, and M. Halik, “Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film Memory Transistors,”10.1002/admi.201400238__Advanced Materials Interfaces, vol. 1, p. 1400238, 2014, doi:10.1002/admi.201400238 .

T. Schmaltz, A. Khassanov, H.-G. Steinrück, A. Magerl, A. Hirsch, and M. Halik, “Tuning the molecular order of -based self-assembled monolayers in field-effect transistors,”10.1039/c4nr03557g__Nanoscale, vol. 6, pp. 13022–13027, 2014, doi:10.1039/c4nr03557g .

H.-G. Steinrück, A. Magerl, M. Deutsch, and B. M. Ocko, “Pseudorotational Epitaxy of Self-Assembled Octadecyltrichlorosilane Monolayers on Sapphire (0001),”10.1103/physrevlett.113.156101__Physical Review Letters, vol. 113, p. 156101, 2014, doi:10.1103/physrevlett.113.156101 .

I. Bald and A. Keller, “Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy,” Molecules, vol. 19, pp. 13803–13823, 2014.

D. König, D. Naujoks, M. T. de los Arcos de Pedro, S. Grosse-Kreul, and A. Ludwig, “X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films,”10.1002/adem.201400317__Advanced Engineering Materials, pp. 669–673, 2014, doi:10.1002/adem.201400317 .

M. T. de los Arcos de Pedro, R. Schröder, Y. A. Gonzalvo, V. S. der Gathen, and J. Winter, “Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate,”10.1088/0963-0252/23/5/054008__Plasma Sources Science and Technology, Art. no. 054008, 2014, doi:10.1088/0963-0252/23/5/054008 .

B. Eren et al., “Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology,”10.1016/j.cplett.2014.06.042__Chemical Physics Letters, pp. 82–87, 2014, doi:10.1016/j.cplett.2014.06.042 .

P. D. Machura, A. Hecimovic, S. Gallian, J. Winter, and M. T. de los Arcos de Pedro, “Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges,”10.1088/0963-0252/23/6/065043__Plasma Sources Science and Technology, Art. no. 065043, 2014, doi:10.1088/0963-0252/23/6/065043 .

D. Marinov, O. Guaitella, M. T. de los Arcos de Pedro, A. von Keudell, and A. Rousseau, “Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure,”10.1088/0022-3727/47/47/475204__Journal of Physics D: Applied Physics, Art. no. 475204, 2014, doi:10.1088/0022-3727/47/47/475204 .

K. Xu, V.-S. Dang, A. Ney, M. T. de los Arcos de Pedro, and A. Devi, “Nanostructured Er&;SUB&;2&;/SUB&;O&;SUB&;3&;/SUB&; Thin Films Grown by Metalorganic Chemical Vapour Deposition,”10.1166/jnn.2014.8848__Journal of Nanoscience and Nanotechnology, pp. 5095–5102, 2014, doi:10.1166/jnn.2014.8848 .

N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, and F. Faupel, “Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites,” JOURNAL OF NANOPARTICLE RESEARCH, vol. 15, no. 11, 2013.

Z. Wang et al., “Region-Selective Self-Assembly of Functionalized Carbon Allotropes from Solution,”10.1021/nn405488n__ACS Nano, vol. 7, pp. 11427–11434, 2013, doi:10.1021/nn405488n .

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K. Xu et al., “Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties,”10.1039/c3tc30401a__Journal of Materials Chemistry C, Art. no. 3939, 2013, doi:10.1039/c3tc30401a .

N. B. Srinivasan et al., “Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2(iPrN)2CMe2] (M=Mo, W) as precursors,”10.1016/j.surfcoat.2013.06.024__Surface and Coatings Technology, pp. 130–136, 2013, doi:10.1016/j.surfcoat.2013.06.024 .

A. Will et al., “Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum,”10.1088/0022-3727/46/8/084009__Journal of Physics D: Applied Physics, Art. no. 084009, 2013, doi:10.1088/0022-3727/46/8/084009 .

C. Corbella, S. Grosse-Kreul, O. Kreiter, M. T. de los Arcos de Pedro, J. Benedikt, and A. von Keudell, “Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces,”10.1063/1.4826066__Review of Scientific Instruments, Art. no. 103303, 2013, doi:10.1063/1.4826066 .

J. Winter, A. Hecimovic, M. T. de los Arcos de Pedro, M. Böke, and V. Schulz-von der Gathen, “Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity,”10.1088/0022-3727/46/8/084007__Journal of Physics D: Applied Physics, Art. no. 084007, 2013, doi:10.1088/0022-3727/46/8/084007 .

K. Rügner, R. Reuter, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell, and J. Benedikt, “Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure,”10.1002/ppap.201300059__Plasma Processes and Polymers, pp. 1061–1073, 2013, doi:10.1002/ppap.201300059 .

P. Thissen, V. Thissen, S. Wippermann, Y. J. Chabal, G. Grundmeier, and W. G. Schmidt, “pH-dependent structure and energetics of O/MgO(100),” Surface Science, vol. 606, pp. 902–907, 2012.

M. Banerjee et al., “Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors,”10.1021/cg3010147__Crystal Growth &; Design, pp. 5079–5089, 2012, doi:10.1021/cg3010147 .

A. P. Milanov et al., “SO3, Er2O3, and O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors,”10.1039/c2dt31219k__Dalton Transactions, Art. no. 13936, 2012, doi:10.1039/c2dt31219k .

R. Reuter, K. Rügner, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell, and J. Benedikt, “The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure,”10.1002/ppap.201100146__Plasma Processes and Polymers, pp. 1116–1124, 2012, doi:10.1002/ppap.201100146 .

A. P. Ehiasarian et al., “High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization,”10.1063/1.3692172__Applied Physics Letters, Art. no. 114101, 2012, doi:10.1063/1.3692172 .

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M. Prenzel, M. T. de los Arcos de Pedro, A. Kortmann, J. Winter, and A. von Keudell, “Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films,”10.1063/1.4767383__Journal of Applied Physics, Art. no. 103306, 2012, doi:10.1063/1.4767383 .

A. Hecimovic, M. T. de los Arcos de Pedro, V. Schulz-von der Gathen, M. Böke, and J. Winter, “Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges,”10.1088/0963-0252/21/3/035017__Plasma Sources Science and Technology, Art. no. 035017, 2012, doi:10.1088/0963-0252/21/3/035017 .

D. Schröder, H. Bahre, N. Knake, J. Winter, M. T. de los Arcos de Pedro, and V. Schulz-von der Gathen, “Influence of target surfaces on the atomic oxygen distribution in the effluent of a micro-scaled atmospheric pressure plasma jet,”10.1088/0963-0252/21/2/024007__Plasma Sources Science and Technology, Art. no. 024007, 2012, doi:10.1088/0963-0252/21/2/024007 .

M. Maxisch et al., “PM-IRRAS studies of the adsorption and stability of organophosphonate monolayers on passivated NiTi surfaces,” APPLIED SURFACE SCIENCE, vol. 257, no. 6, pp. 2011–2018, 2011.

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M. T. de los Arcos de Pedro et al., “Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition,”10.1016/j.tsf.2011.12.007__Thin Solid Films, pp. 11–16, 2011, doi:10.1016/j.tsf.2011.12.007 .

T. B. Thiede et al., “Evaluation of Homoleptic Guanidinate and Amidinate Complexes of Gadolinium and Dysprosium for MOCVD of Rare-Earth Nitride Thin Films,”10.1021/cm102840v__Chemistry of Materials, pp. 1430–1440, 2011, doi:10.1021/cm102840v .

A. R. Lahrood, M. T. de los Arcos de Pedro, M. Prenzel, A. von Keudell, and J. Winter, “X-ray photoelectron spectroscopy on implanted argon as a tool to follow local structural changes in thin films,”10.1016/j.tsf.2011.07.040__Thin Solid Films, pp. 1625–1630, 2011, doi:10.1016/j.tsf.2011.07.040 .

S. Wippermann, W. G. Schmidt, P. Thissen, and G. Grundmeier, “Dissociative and molecular adsorption of water on;1-Al2O3(0001),” physica status solidi (c), vol. 7, no. 2, pp. 137–140, 2010.

M. Maxisch et al., “PM-IRRAS studies of the adsorption and stability of organophosphonate monolayers on passivated NiTi surfaces,”10.1016/j.apsusc.2010.09.044__Applied Surface Science, pp. 2011–2018, 2010, doi:10.1016/j.apsusc.2010.09.044 .

S. Wippermann, W. G. Schmidt, P. Thissen, and G. Grundmeier, “Dissociative and molecular adsorption of water on;1-Al2O3(0001),” physica status solidi (c), vol. 7, no. 2, pp. 137–140, 2009.

P. Thissen, G. Grundmeier, S. Wippermann, and W. G. Schmidt, “Water adsorption on the ;1-Al2O3(0001) surface,” Physical Review B, vol. 80, no. 24, 2009.