Nanoscale Structure of Si/SiO2/Organics Interfaces
H.-G. Steinrück, A. Schiener, T. Schindler, J. Will, A. Magerl, O. Konovalov, G. Li Destri, O.H. Seeck, M. Mezger, J. Haddad, M. Deutsch, A. Checco, B.M. Ocko, ACS Nano 8 (2014) 12676–12681.
LibreCat: /record/23637
DOI: 10.1021/nn5056223

Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film Memory Transistors
A. Khassanov, T. Schmaltz, H.-G. Steinrück, A. Magerl, A. Hirsch, M. Halik, Advanced Materials Interfaces 1 (2014) 1400238.
LibreCat: /record/23638
DOI: 10.1002/admi.201400238

Tuning the molecular order of -based self-assembled monolayers in field-effect transistors
T. Schmaltz, A. Khassanov, H.-G. Steinrück, A. Magerl, A. Hirsch, M. Halik, Nanoscale 6 (2014) 13022–13027.
LibreCat: /record/23639
DOI: 10.1039/c4nr03557g

Pseudorotational Epitaxy of Self-Assembled Octadecyltrichlorosilane Monolayers on Sapphire (0001)
H.-G. Steinrück, A. Magerl, M. Deutsch, B.M. Ocko, Physical Review Letters 113 (2014) 156101.
LibreCat: /record/23640
DOI: 10.1103/physrevlett.113.156101

Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy
I. Bald, A. Keller, Molecules 19 (2014) 13803–13823.
LibreCat: /record/22683
DOI: 10.3390/molecules190913803

X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films
D. König, D. Naujoks, M.T. de los Arcos de Pedro, S. Grosse-Kreul, A. Ludwig, Advanced Engineering Materials (2014) 669–673.
LibreCat: /record/22580
DOI: 10.1002/adem.201400317

Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate
M.T. de los Arcos de Pedro, R. Schröder, Y.A. Gonzalvo, V.S. der Gathen, J. Winter, Plasma Sources Science and Technology (2014).
LibreCat: /record/22585
DOI: 10.1088/0963-0252/23/5/054008

Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology
B. Eren, L. Marot, R. Steiner, M.T. de los Arcos de Pedro, M. Düggelin, D. Mathys, K.N. Goldie, V. Olivieri, E. Meyer, Chemical Physics Letters (2014) 82–87.
LibreCat: /record/22586
DOI: 10.1016/j.cplett.2014.06.042

Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges
P.D. Machura, A. Hecimovic, S. Gallian, J. Winter, M.T. de los Arcos de Pedro, Plasma Sources Science and Technology (2014).
LibreCat: /record/22587
DOI: 10.1088/0963-0252/23/6/065043

Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure
D. Marinov, O. Guaitella, M.T. de los Arcos de Pedro, A. von Keudell, A. Rousseau, Journal of Physics D: Applied Physics (2014).
LibreCat: /record/22588
DOI: 10.1088/0022-3727/47/47/475204

Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition
K. Xu, V.-S. Dang, A. Ney, M.T. de los Arcos de Pedro, A. Devi, Journal of Nanoscience and Nanotechnology (2014) 5095–5102.
LibreCat: /record/22590
DOI: 10.1166/jnn.2014.8848

Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites
N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, F. Faupel, JOURNAL OF NANOPARTICLE RESEARCH 15 (2013).
LibreCat: /record/20946
DOI: 10.1007/s11051-013-2080-9
WoS: 000326054400001

Region-Selective Self-Assembly of Functionalized Carbon Allotropes from Solution
Z. Wang, S. Mohammadzadeh, T. Schmaltz, J. Kirschner, A. Khassanov, S. Eigler, U. Mundloch, C. Backes, H.-G. Steinrück, A. Magerl, F. Hauke, A. Hirsch, M. Halik, ACS Nano 7 (2013) 11427–11434.
LibreCat: /record/23641
DOI: 10.1021/nn405488n

Low-Voltage Self-Assembled Monolayer Field-Effect Transistors on Flexible Substrates
T. Schmaltz, A.Y. Amin, A. Khassanov, T. Meyer-Friedrichsen, H.-G. Steinrück, A. Magerl, J.J. Segura, K. Voitchovsky, F. Stellacci, M. Halik, Advanced Materials 25 (2013) 4511–4514.
LibreCat: /record/23642
DOI: 10.1002/adma.201301176

Oxygen diffusivity in silicon derived from dynamical X-ray diffraction
J. Will, A. Gröschel, D. Kot, M.A. Schubert, C. Bergmann, H.-G. Steinrück, G. Kissinger, A. Magerl, Journal of Applied Physics 7 (2013) 073508.
LibreCat: /record/23643
DOI: 10.1063/1.4792747

Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition
V.-S. Dang, H. Parala, J.H. Kim, K. Xu, N.B. Srinivasan, E. Edengeiser, M. Havenith, A.D. Wieck, M.T. de los Arcos de Pedro, Roland.A. Fischer, A. Devi, Physica Status Solidi (a) (2013) 416–424.
LibreCat: /record/22584
DOI: 10.1002/pssa.201330115

MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics
N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, D. Rogalla, H.-W. Becker, A. Devi, R.A. Fischer, Physica Status Solidi (a) (2013) 260–266.
LibreCat: /record/22589
DOI: 10.1002/pssa.201330127

Atomic layer deposition of EO3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties
K. Xu, A.R. Chaudhuri, H. Parala, D. Schwendt, M.T. de los Arcos de Pedro, H.J. Osten, A. Devi, Journal of Materials Chemistry C (2013).
LibreCat: /record/22596
DOI: 10.1039/c3tc30401a

Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2(iPrN)2CMe2] (M=Mo, W) as precursors
N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R.A. Fischer, Surface and Coatings Technology (2013) 130–136.
LibreCat: /record/22593
DOI: 10.1016/j.surfcoat.2013.06.024

Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum
A. Will, M.T. de los Arcos de Pedro, C. Corbella, A. Hecimovic, P.D. Machura, J. Winter, A. von Keudell, Journal of Physics D: Applied Physics (2013).
LibreCat: /record/22594
DOI: 10.1088/0022-3727/46/8/084009