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M. T. de los Arcos de Pedro, R. Schröder, Y. A. Gonzalvo, V. S. der Gathen, and J. Winter, “Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate,”10.1088/0963-0252/23/5/054008__Plasma Sources Science and Technology, Art. no. 054008, 2014, doi:10.1088/0963-0252/23/5/054008 .
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B. Eren et al., “Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology,”10.1016/j.cplett.2014.06.042__Chemical Physics Letters, pp. 82–87, 2014, doi:10.1016/j.cplett.2014.06.042 .
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P. D. Machura, A. Hecimovic, S. Gallian, J. Winter, and M. T. de los Arcos de Pedro, “Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges,”10.1088/0963-0252/23/6/065043__Plasma Sources Science and Technology, Art. no. 065043, 2014, doi:10.1088/0963-0252/23/6/065043 .
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D. Marinov, O. Guaitella, M. T. de los Arcos de Pedro, A. von Keudell, and A. Rousseau, “Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure,”10.1088/0022-3727/47/47/475204__Journal of Physics D: Applied Physics, Art. no. 475204, 2014, doi:10.1088/0022-3727/47/47/475204 .
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K. Xu, V.-S. Dang, A. Ney, M. T. de los Arcos de Pedro, and A. Devi, “Nanostructured Er&;SUB&;2&;/SUB&;O&;SUB&;3&;/SUB&; Thin Films Grown by Metalorganic Chemical Vapour Deposition,”10.1166/jnn.2014.8848__Journal of Nanoscience and Nanotechnology, pp. 5095–5102, 2014, doi:10.1166/jnn.2014.8848 .
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N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, and F. Faupel, “Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites,” JOURNAL OF NANOPARTICLE RESEARCH, vol. 15, no. 11, 2013.
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V.-S. Dang et al., “Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition,”10.1002/pssa.201330115__physica status solidi (a), pp. 416–424, 2013, doi:10.1002/pssa.201330115 .
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N. B. Srinivasan et al., “MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics,”10.1002/pssa.201330127__physica status solidi (a), pp. 260–266, 2013, doi:10.1002/pssa.201330127 .
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K. Xu et al., “Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties,”10.1039/c3tc30401a__Journal of Materials Chemistry C, Art. no. 3939, 2013, doi:10.1039/c3tc30401a .
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A. Will et al., “Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum,”10.1088/0022-3727/46/8/084009__Journal of Physics D: Applied Physics, Art. no. 084009, 2013, doi:10.1088/0022-3727/46/8/084009 .
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C. Corbella, S. Grosse-Kreul, O. Kreiter, M. T. de los Arcos de Pedro, J. Benedikt, and A. von Keudell, “Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces,”10.1063/1.4826066__Review of Scientific Instruments, Art. no. 103303, 2013, doi:10.1063/1.4826066 .
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J. Winter, A. Hecimovic, M. T. de los Arcos de Pedro, M. Böke, and V. Schulz-von der Gathen, “Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity,”10.1088/0022-3727/46/8/084007__Journal of Physics D: Applied Physics, Art. no. 084007, 2013, doi:10.1088/0022-3727/46/8/084007 .
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K. Rügner, R. Reuter, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell, and J. Benedikt, “Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure,”10.1002/ppap.201300059__Plasma Processes and Polymers, pp. 1061–1073, 2013, doi:10.1002/ppap.201300059 .
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