Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications
T. Niendorf, F. Brenne, K.-P. Hoyer, D. Schwarze, M. Schaper, R. Grothe, M. Wiesener, G. Grundmeier, H.J. Maier, Metallurgical and Materials Transactions A (2015) 2829–2833.

Joining with electrochemical support (ECUF): Cold pressure welding of copper
C. Ebbert, H.C. Schmidt, D. Rodman, F. Nuernberger, W. Homberg, H.J. Maier, G. Grundmeier, JOURNAL OF MATERIALS PROCESSING TECHNOLOGY 214 (2014) 2179–2187.

Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy
I. Bald, A. Keller, Molecules 19 (2014) 13803–13823.

X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films
D. König, D. Naujoks, M.T. de los Arcos de Pedro, S. Grosse-Kreul, A. Ludwig, Advanced Engineering Materials (2014) 669–673.

Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate
M.T. de los Arcos de Pedro, R. Schröder, Y.A. Gonzalvo, V.S. der Gathen, J. Winter, Plasma Sources Science and Technology (2014).

Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology
B. Eren, L. Marot, R. Steiner, M.T. de los Arcos de Pedro, M. Düggelin, D. Mathys, K.N. Goldie, V. Olivieri, E. Meyer, Chemical Physics Letters (2014) 82–87.

Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges
P.D. Machura, A. Hecimovic, S. Gallian, J. Winter, M.T. de los Arcos de Pedro, Plasma Sources Science and Technology (2014).

Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure
D. Marinov, O. Guaitella, M.T. de los Arcos de Pedro, A. von Keudell, A. Rousseau, Journal of Physics D: Applied Physics (2014).

Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition
K. Xu, V.-S. Dang, A. Ney, M.T. de los Arcos de Pedro, A. Devi, Journal of Nanoscience and Nanotechnology (2014) 5095–5102.

Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites
N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, F. Faupel, JOURNAL OF NANOPARTICLE RESEARCH 15 (2013).

Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition
V.-S. Dang, H. Parala, J.H. Kim, K. Xu, N.B. Srinivasan, E. Edengeiser, M. Havenith, A.D. Wieck, M.T. de los Arcos de Pedro, Roland.A. Fischer, A. Devi, Physica Status Solidi (a) (2013) 416–424.

MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics
N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, D. Rogalla, H.-W. Becker, A. Devi, R.A. Fischer, Physica Status Solidi (a) (2013) 260–266.

Atomic layer deposition of EO3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties
K. Xu, A.R. Chaudhuri, H. Parala, D. Schwendt, M.T. de los Arcos de Pedro, H.J. Osten, A. Devi, Journal of Materials Chemistry C (2013).

Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2(iPrN)2CMe2] (M=Mo, W) as precursors
N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R.A. Fischer, Surface and Coatings Technology (2013) 130–136.

Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum
A. Will, M.T. de los Arcos de Pedro, C. Corbella, A. Hecimovic, P.D. Machura, J. Winter, A. von Keudell, Journal of Physics D: Applied Physics (2013).

Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces
C. Corbella, S. Grosse-Kreul, O. Kreiter, M.T. de los Arcos de Pedro, J. Benedikt, A. von Keudell, Review of Scientific Instruments (2013).

Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity
J. Winter, A. Hecimovic, M.T. de los Arcos de Pedro, M. Böke, V. Schulz-von der Gathen, Journal of Physics D: Applied Physics (2013).

Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure
K. Rügner, R. Reuter, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell, J. Benedikt, Plasma Processes and Polymers (2013) 1061–1073.

pH-dependent structure and energetics of O/MgO(100)
P. Thissen, V. Thissen, S. Wippermann, Y.J. Chabal, G. Grundmeier, W.G. Schmidt, Surface Science 606 (2012) 902–907.

Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors
M. Banerjee, N.B. Srinivasan, H. Zhu, S.J. Kim, K. Xu, M. Winter, H.-W. Becker, D. Rogalla, M.T. de los Arcos de Pedro, D. Bekermann, D. Barreca, R.A. Fischer, A. Devi, Crystal Growth &; Design (2012) 5079–5089.