SO3, EO3, and O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors
A.P. Milanov, K. Xu, S. Cwik, H. Parala, M.T. de los Arcos de Pedro, H.-W. Becker, D. Rogalla, R. Cross, S. Paul, A. Devi, Dalton Transactions (2012).

The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure
R. Reuter, K. Rügner, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell, J. Benedikt, Plasma Processes and Polymers (2012) 1116–1124.

High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization
A.P. Ehiasarian, A. Hecimovic, M.T. de los Arcos de Pedro, R. New, V. Schulz-von der Gathen, M. Böke, J. Winter, Applied Physics Letters (2012).

Nanocomposites of carbon nanotubes embedded in a (Ti,Al)N coated film
L. Marot, M.T. de los Arcos de Pedro, A.M. Bünzli, C. Wäckerlin, R. Steiner, P. Oelhafen, E. Meyer, D. Mathys, P. Spätig, G. Covarel, Surface and Coatings Technology (2012) 223–228.

Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films
M. Prenzel, M.T. de los Arcos de Pedro, A. Kortmann, J. Winter, A. von Keudell, Journal of Applied Physics (2012).

Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges
A. Hecimovic, M.T. de los Arcos de Pedro, V. Schulz-von der Gathen, M. Böke, J. Winter, Plasma Sources Science and Technology (2012).

Influence of target surfaces on the atomic oxygen distribution in the effluent of a micro-scaled atmospheric pressure plasma jet
D. Schröder, H. Bahre, N. Knake, J. Winter, M.T. de los Arcos de Pedro, V. Schulz-von der Gathen, Plasma Sources Science and Technology (2012).

PM-IRRAS studies of the adsorption and stability of organophosphonate monolayers on passivated NiTi surfaces
M. Maxisch, C. Ebbert, B. Torun, N. Fink, T. de los Arcos, J. Lackmann, H.J. Maier, G. Grundmeier, APPLIED SURFACE SCIENCE 257 (2011) 2011–2018.

Liquid-Phase Epitaxy of Multicomponent Layer-Based Porous Coordination Polymer Thin Films of [M(L)(P)0.5] Type: Importance of Deposition Sequence on the Oriented Growth
D. Zacher, K. Yusenko, A. Bétard, S. Henke, M. Molon, T. Ladnorg, O. Shekhah, B. Schüpbach, M.T. de los Arcos de Pedro, M. Krasnopolski, M. Meilikhov, J. Winter, A. Terfort, C. Wöll, R.A. Fischer, Chemistry - A European Journal (2011) 1448–1455.

Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition
M.T. de los Arcos de Pedro, S. Cwik, A.P. Milanov, V. Gwildies, H. Parala, T. Wagner, A. Birkner, D. Rogalla, H.-W. Becker, J. Winter, A. Ludwig, R.A. Fischer, A. Devi, Thin Solid Films (2011) 11–16.

Evaluation of Homoleptic Guanidinate and Amidinate Complexes of Gadolinium and Dysprosium for MOCVD of Rare-Earth Nitride Thin Films
T.B. Thiede, M. Krasnopolski, A.P. Milanov, M.T. de los Arcos de Pedro, A. Ney, H.-W. Becker, D. Rogalla, J. Winter, A. Devi, R.A. Fischer, Chemistry of Materials (2011) 1430–1440.

X-ray photoelectron spectroscopy on implanted argon as a tool to follow local structural changes in thin films
A.R. Lahrood, M.T. de los Arcos de Pedro, M. Prenzel, A. von Keudell, J. Winter, Thin Solid Films (2011) 1625–1630.

Dissociative and molecular adsorption of water on;1-Al2O3(0001)
S. Wippermann, W.G. Schmidt, P. Thissen, G. Grundmeier, Physica Status Solidi (C) 7 (2010) 137–140.

PM-IRRAS studies of the adsorption and stability of organophosphonate monolayers on passivated NiTi surfaces
M. Maxisch, C. Ebbert, B. Torun, N. Fink, M.T. de los Arcos de Pedro, J. Lackmann, H.J. Maier, G. Grundmeier, Applied Surface Science (2010) 2011–2018.

Dissociative and molecular adsorption of water on;1-Al2O3(0001)
S. Wippermann, W.G. Schmidt, P. Thissen, G. Grundmeier, Physica Status Solidi (C) 7 (2009) 137–140.

Water adsorption on the ;1-Al2O3(0001) surface
P. Thissen, G. Grundmeier, S. Wippermann, W.G. Schmidt, Physical Review B 80 (2009).

Water adsorption on hydrogenated Si(111) surfaces
B. Lange, R. Posner, K. Pohl, C. Thierfelder, G. Grundmeier, S. Blankenburg, W.G. Schmidt, Surface Science 603 (2009) 60–64.

The importance of catalyst oxidation for the growth of carbon nanotubes on Si substrates
M.T. de los Arcos de Pedro, P. Oelhafen, D. Mathys, Carbon (2009) 1977–1982.

On the graphitisation role of oxide supports in carbon nanotube CVD synthesis
M.H. Rümmeli, F. Schäffel, M.T. de los Arcos de Pedro, D. Haberer, A. Bachmatiuk, C. Kramberger, P. Ayala, E. Borowiak-Palen, D. Adebimpe, T. Gemming, A. Leonhardt, B. Rellinghaus, L. Schultz, T. Pichler, B. Büchner, Physica Status Solidi (b) (2008) 1939–1942.

The Influence of Catalyst's Oxidation Degree on Carbon Nanotube Growth as a Substrate-Independent Parameter
M.T. de los Arcos de Pedro, P. Oelhafen, V. Thommen, D. Mathys, The Journal of Physical Chemistry C (2007) 16392–16396.