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Meyers, Thorsten, Fábio F. Vidor, Katharina Brassat, Jörg Lindner, and Ulrich Hilleringmann. “Low-Voltage DNTT-Based Thin-Film Transistors and Inverters for Flexible Electronics.”https://doi.org/10.1016/j.mee.2016.12.018__Microelectronic Engineering 174 (2016): 35–39.https://doi.org/10.1016/j.mee.2016.12.018 .

Meyers, Thorsten, Fábio F. Vidor, Katharina Brassat, Jörg K.N. Lindner, and Ulrich Hilleringmann. “Low-Voltage DNTT-Based Thin-Film Transistors and Inverters for Flexible Electronics.”https://doi.org/10.1016/j.mee.2016.12.018__Microelectronic Engineering 174 (2016): 35–39.https://doi.org/10.1016/j.mee.2016.12.018 .

Vidor, Fábio F., Thorsten Meyers, Gilson I. Wirth, and Ulrich Hilleringmann. “ZnO Nanoparticle Thin-Film Transistors on Flexible Substrate Using Spray-Coating Technique.”https://doi.org/10.1016/j.mee.2016.02.059__Microelectronic Engineering 159 (2016): 155–58.https://doi.org/10.1016/j.mee.2016.02.059 .

Zankovych, S., I. Maximov, I. Shorubalko, J. Seekamp, M. Beck, S. Romanov, Dirk Reuter, et al. “Nanoimprint-Induced Effects on Electrical and Optical Properties of Quantum Well Structures.”https://doi.org/10.1016/s0167-9317(03)00074-1__Microelectronic Engineering, 2003, 214–20.https://doi.org/10.1016/s0167-9317(03)00074-1 .

Pannemann, Ch., T. Diekmann, and Ulrich Hilleringmann. “Nanometer Scale Organic Thin Film Transistors with Pentacene.”https://doi.org/10.1016/s0167-9317(03)00146-1__Microelectronic Engineering 67–68 (2003): 845–52.https://doi.org/10.1016/s0167-9317(03)00146-1 .

Kähler, D., U. Kunze, Dirk Reuter, and A.D. Wieck. “Quantum Wire Fabrication from Compensating-Layer GaAs–AlGaAs Heterostructures.”https://doi.org/10.1016/s0167-9317(02)00474-4__Microelectronic Engineering, 2002, 619–23.https://doi.org/10.1016/s0167-9317(02)00474-4 .

Schönstein, I., J. Müller, Ulrich Hilleringmann, and K. Goser. “Characterization of Submicron NMOS Devices Due to Visible Light Emission.”https://doi.org/10.1016/0167-9317(93)90092-j__Microelectronic Engineering 21, no. 1–4 (2002): 363–66.https://doi.org/10.1016/0167-9317(93)90092-j .

Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.”https://doi.org/10.1016/0167-9317(92)90425-q__Microelectronic Engineering 19, no. 1–4 (2002): 211–14.https://doi.org/10.1016/0167-9317(92)90425-q .

Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “Characterisation of Sub-100 Nm-MOS-Transistors Processed by Optical Lithography and a Sidewall-Etchback Technique.”https://doi.org/10.1016/0167-9317(95)00280-4__Microelectronic Engineering 30, no. 1–4 (2002): 431–34.https://doi.org/10.1016/0167-9317(95)00280-4 .