Reuter, Dirk, D Kähler, U Kunze, and A D Wieck. “Layer-Compensated Selectively Doped AlxG-XAs/GaAs Heterostructures as a Base Material for Nanolithography.”https://doi.org/10.1088/0268-1242/16/7/314__Semiconductor Science and Technology, 2002, 603–7.https://doi.org/10.1088/0268-1242/16/7/314 .
LibreCat: /record/8747
DOI: 10.1088/0268-1242/16/7/314

Reuter, Dirk, D Kähler, U Kunze, and A D Wieck. “Layer-Compensated Selectively Doped AlxG-XAs/GaAs Heterostructures as a Base Material for Nanolithography.”https://doi.org/10.1088/0268-1242/16/7/314__Semiconductor Science and Technology, 2002, 603–7.https://doi.org/10.1088/0268-1242/16/7/314 .
LibreCat: /record/8768
DOI: 10.1088/0268-1242/16/7/314