PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films
M.T. de los Arcos de Pedro, P. Awakowicz, M. Böke, N. Boysen, R.P. Brinkmann, R. Dahlmann, A. Devi, D. Eremin, J. Franke, T. Gergs, J. Jenderny, E. Kemaneci, T.D. Kühne, S. Kusmierz, T. Mussenbrock, J. Rubner, J. Trieschmann, M. Wessling, X. Xie, D. Zanders, F. Zysk, G. Grundmeier, PLASMA PROCESSES AND POLYMERS (2023) e2300186.

PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth
M.T. de los Arcos de Pedro, P. Awakowicz, J. Benedikt, B. Biskup, M. Böke, N. Boysen, R. Buschhaus, R. Dahlmann, A. Devi, T. Gergs, J. Jenderny, A. von Keudell, T.D. Kühne, S. Kusmierz, H. Müller, T. Mussenbrock, J. Trieschmann, D. Zanders, F. Zysk, G. Grundmeier, PLASMA PROCESSES AND POLYMERS (2023) e2300150.

Influence of surface activation on the microporosity of PECVD and PEALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS
C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, T. Arcos, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).

Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation
X. Xie, T. de los Arcos, G. Grundmeier, Plasma Processes and Polymers 19 (2022).

Influence of surface activation on the microporosity of PECVD and PEALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS
C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, M.T. de los Arcos de Pedro, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).

Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation
X. Xie, M.T. de los Arcos de Pedro, G. Grundmeier, Plasma Processes and Polymers 19 (2022).

A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).

A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).

Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas
M. Budde, C. Corbella, S. Große-Kreul, M.T. de los Arcos de Pedro, G. Grundmeier, A. von Keudell, Plasma Processes and Polymers (2018).

Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces
G. Grundmeier, A. von Keudell, M.T. de los Arcos de Pedro, Plasma Processes and Polymers (2015) 926–940.

Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films
F. Mitschker, J. Dietrich, B. Ozkaya, M.T. de los Arcos de Pedro, I. Giner, P. Awakowicz, G. Grundmeier, Plasma Processes and Polymers (2015) 1002–1009.

Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure
K. Rügner, R. Reuter, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell, J. Benedikt, Plasma Processes and Polymers (2013) 1061–1073.

The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure
R. Reuter, K. Rügner, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell, J. Benedikt, Plasma Processes and Polymers (2012) 1116–1124.