Influence of surface activation on the microporosity of PECVD and PEALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS
C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, T. Arcos, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).
LibreCat: /record/34648
DOI: 10.1002/ppap.202100174

Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation
X. Xie, T. de los Arcos, G. Grundmeier, Plasma Processes and Polymers 19 (2022).
LibreCat: /record/34650
DOI: 10.1002/ppap.202200052

Influence of surface activation on the microporosity of PECVD and PEALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS
C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, M.T. de los Arcos de Pedro, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).
LibreCat: /record/35977
DOI: 10.1002/ppap.202100174

Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation
X. Xie, M.T. de los Arcos de Pedro, G. Grundmeier, Plasma Processes and Polymers 19 (2022).
LibreCat: /record/35974
DOI: 10.1002/ppap.202200052

A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).
LibreCat: /record/22838
DOI: 10.1002/ppap.201700209

A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD
M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A. Devi, Plasma Processes and Polymers (2018).
LibreCat: /record/22839
DOI: 10.1002/ppap.201700209

Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas
M. Budde, C. Corbella, S. Große-Kreul, M.T. de los Arcos de Pedro, G. Grundmeier, A. von Keudell, Plasma Processes and Polymers (2018).
LibreCat: /record/22547
DOI: 10.1002/ppap.201700230

Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces
G. Grundmeier, A. von Keudell, M.T. de los Arcos de Pedro, Plasma Processes and Polymers (2015) 926–940.
LibreCat: /record/22579
DOI: 10.1002/ppap.201500087

Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films
F. Mitschker, J. Dietrich, B. Ozkaya, M.T. de los Arcos de Pedro, I. Giner, P. Awakowicz, G. Grundmeier, Plasma Processes and Polymers (2015) 1002–1009.
LibreCat: /record/22582
DOI: 10.1002/ppap.201500085

Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure
K. Rügner, R. Reuter, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell, J. Benedikt, Plasma Processes and Polymers (2013) 1061–1073.
LibreCat: /record/22592
DOI: 10.1002/ppap.201300059