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X. Xie, T. de los Arcos, and G. Grundmeier, “Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation,”10.1002/ppap.202200052__Plasma Processes and Polymers, vol. 19, no. 11, Art. no. 2200052, 2022, doi:10.1002/ppap.202200052 .
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C. Hoppe et al., “Influence of surface activation on the microporosity of PECVD and PEALD SiO            <sub>              x            </sub>            thin films on PDMS,”10.1002/ppap.202100174__Plasma Processes and Polymers, vol. 19, no. 4, Art. no. 2100174, 2022, doi:10.1002/ppap.202100174 .
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X. Xie, M. T. de los Arcos de Pedro, and G. Grundmeier, “Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation,”10.1002/ppap.202200052__Plasma Processes and Polymers, vol. 19, no. 11, Art. no. 2200052, 2022, doi:10.1002/ppap.202200052 .
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M. Gebhard et al., “A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD,” Plasma Processes and Polymers, 2018.
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M. Gebhard et al., “A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD,” Plasma Processes and Polymers, 2018.
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M. Budde, C. Corbella, S. Große-Kreul, M. T. de los Arcos de Pedro, G. Grundmeier, and A. von Keudell, “Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas,”10.1002/ppap.201700230__Plasma Processes and Polymers, Art. no. 1700230, 2018, doi:10.1002/ppap.201700230 .
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G. Grundmeier, A. von Keudell, and M. T. de los Arcos de Pedro, “Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces,”10.1002/ppap.201500087__Plasma Processes and Polymers, pp. 926–940, 2015, doi:10.1002/ppap.201500087 .
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F. Mitschker et al., “Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films,”10.1002/ppap.201500085__Plasma Processes and Polymers, pp. 1002–1009, 2015, doi:10.1002/ppap.201500085 .
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K. Rügner, R. Reuter, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell, and J. Benedikt, “Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure,”10.1002/ppap.201300059__Plasma Processes and Polymers, pp. 1061–1073, 2013, doi:10.1002/ppap.201300059 .
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R. Reuter, K. Rügner, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell, and J. Benedikt, “The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure,”10.1002/ppap.201100146__Plasma Processes and Polymers, pp. 1116–1124, 2012, doi:10.1002/ppap.201100146 .
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