Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the microporosity of PECVD and PEALD SiO            <sub>              x            </sub>            thin films on PDMS. Plasma Processes and Polymers. 2022;19(4). doi:10.1002/ppap.202100174

Xie X, de los Arcos T, Grundmeier G. Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation. Plasma Processes and Polymers. 2022;19(11). doi:10.1002/ppap.202200052

Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the microporosity of PECVD and PEALD SiO            <sub>              x            </sub>            thin films on PDMS. Plasma Processes and Polymers. 2022;19(4). doi:10.1002/ppap.202100174

Xie X, de los Arcos de Pedro MT, Grundmeier G. Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation. Plasma Processes and Polymers. 2022;19(11). doi:10.1002/ppap.202200052

Gebhard M, Mitschker F, Hoppe C, et al. A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD. Plasma Processes and Polymers. 2018. doi:10.1002/ppap.201700209

Gebhard M, Mitschker F, Hoppe C, et al. A combinatorial approach to enhance barrier properties of thin films on polymers: Seeding and capping of PECVD thin films by PEALD. Plasma Processes and Polymers. 2018. doi:10.1002/ppap.201700209

Budde M, Corbella C, Große-Kreul S, de los Arcos de Pedro MT, Grundmeier G, von Keudell A. Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. Plasma Processes and Polymers. Published online 2018. doi:10.1002/ppap.201700230

Grundmeier G, von Keudell A, de los Arcos de Pedro MT. Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces. Plasma Processes and Polymers. Published online 2015:926-940. doi:10.1002/ppap.201500087

Mitschker F, Dietrich J, Ozkaya B, et al. Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films. Plasma Processes and Polymers. Published online 2015:1002-1009. doi:10.1002/ppap.201500085

Rügner K, Reuter R, Ellerweg D, de los Arcos de Pedro MT, von Keudell A, Benedikt J. Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure. Plasma Processes and Polymers. Published online 2013:1061-1073. doi:10.1002/ppap.201300059

Reuter R, Rügner K, Ellerweg D, de los Arcos de Pedro MT, von Keudell A, Benedikt J. The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure. Plasma Processes and Polymers. Published online 2012:1116-1124. doi:10.1002/ppap.201100146