Tuneable photonic crystals obtained by liquid crystal infiltration
H.-S. Kitzerow, A. Lorenz, H. Matthias, Physica Status Solidi (a) 204 (2007) 3754–3767.
LibreCat: /record/39759
DOI: 10.1002/pssa.200776404

Electro-thermo-mechanical analytical modeling of multilayer cantilever microactuator
J. Jiang, U. Hilleringmann, X. Shui, Sensors and Actuators A: Physical 137 (2007) 302–307.
LibreCat: /record/39563
DOI: 10.1016/j.sna.2007.03.012

Chemical and Magnetic Interface Properties of Tunnel Junctions With Co$_2$MnSi/Co$_2$FeSi Multilayer Electrode Showing Large Tunneling Magnetoresistance
J. Schmalhorst, D. Ebke, M. Sacher, N.-N. Liu, A. Thomas, G. Reiss, A. Htten, E. Arenholz, IEEE Transactions on Magnetics 43 (2007) 2806–2808.
LibreCat: /record/29679
DOI: 10.1109/tmag.2007.893475

Active Damping of Drive Train Oscillations for an Electrically Driven Vehicle
N. Amann, J. Böcker, F. Prenner, IEEE/ASME Transactions on Mechatronics 9 (2004) 697–700.
LibreCat: /record/29924
DOI: 10.1109/tmech.2004.839036

Nanometer scale organic thin film transistors with Pentacene
Ch. Pannemann, T. Diekmann, U. Hilleringmann, Microelectronic Engineering 67–68 (2003) 845–852.
LibreCat: /record/39851
DOI: 10.1016/s0167-9317(03)00146-1

High dynamic control of a three-level voltage-source-converter drive for a main strip mill
J. Böcker, J. Janning, H. Jebenstreit, IEEE Transactions on Industrial Electronics 49 (2002) 1081–1092.
LibreCat: /record/29998
DOI: 10.1109/tie.2002.803220

Optoelectronic system integration on silicon: waveguides, photodetectors, and VLSI CMOS circuits on one chip
U. Hilleringmann, K. Goser, IEEE Transactions on Electron Devices 42 (2002) 841–846.
LibreCat: /record/39904
DOI: 10.1109/16.381978

Characterization of submicron NMOS devices due to visible light emission
I. Schönstein, J. Müller, U. Hilleringmann, K. Goser, Microelectronic Engineering 21 (2002) 363–366.
LibreCat: /record/39912
DOI: 10.1016/0167-9317(93)90092-j

Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon
U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.
LibreCat: /record/39914
DOI: 10.1016/0167-9317(92)90425-q

System integration of optical devices and analog CMOS amplifiers
E. Brass, U. Hilleringmann, K. Schumacher, IEEE Journal of Solid-State Circuits 29 (2002) 1006–1010.
LibreCat: /record/39906
DOI: 10.1109/4.297714

System integration of optical devices and analog CMOS amplifiers
E. Brass, U. Hilleringmann, K. Schumacher, IEEE Journal of Solid-State Circuits 29 (2002) 1006–1010.
LibreCat: /record/39907
DOI: 10.1109/4.297714

Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique
J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 30 (2002) 431–434.
LibreCat: /record/39899
DOI: 10.1016/0167-9317(95)00280-4

VLSI technologies for artificial neural networks
K. Goser, U. Hilleringmann, U. Rueckert, K. Schumacher, IEEE Micro 9 (2002) 28–44.
LibreCat: /record/39925
DOI: 10.1109/40.42985

A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV
V. Mankowski, U. Hilleringmann, K. Schumacher, Microelectronic Engineering 53 (2002) 525–528.
LibreCat: /record/39882
DOI: 10.1016/s0167-9317(00)00370-1

1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition and etchback technique
J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 53 (2002) 213–216.
LibreCat: /record/39879
DOI: 10.1016/s0167-9317(00)00299-9

A silicon based technology for monolithic integration of waveguides and VLSI CMOS circuits
U. Hilleringmann, K. Knospe, C. Heite, K. Schumacher, K. Goser, Microelectronic Engineering 15 (2002) 289–292.
LibreCat: /record/39919
DOI: 10.1016/0167-9317(91)90231-2

VLSI technologies for artificial neural networks
K. Goser, U. Hilleringmann, U. Rueckert, K. Schumacher, IEEE Micro 9 (2002) 28–44.
LibreCat: /record/39926
DOI: 10.1109/40.42985

Floating gate structures as nonvolatile analog memory cells in 1.0;cm-LOCOS-CMOS technology with PZT dielectrica
A. Soennecken, U. Hilleringmann, K. Goser, Microelectronic Engineering 15 (2002) 633–636.
LibreCat: /record/39920
DOI: 10.1016/0167-9317(91)90299-s

Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon
U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.
LibreCat: /record/39915
DOI: 10.1016/0167-9317(92)90425-q

CMOS compatible micromachining by dry silicon-etching techniques
S. Adams, U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 191–194.
LibreCat: /record/39916
DOI: 10.1016/0167-9317(92)90420-v