Kitzerow, Heinz-Siegfried, A. Lorenz, and H. Matthias. “Tuneable Photonic Crystals Obtained by Liquid Crystal Infiltration.”https://doi.org/10.1002/pssa.200776404__Physica Status Solidi (a) 204, no. 11 (2007): 3754–67.https://doi.org/10.1002/pssa.200776404 .

Jiang, Jianliang, Ulrich Hilleringmann, and Xiaoping Shui. “Electro-Thermo-Mechanical Analytical Modeling of Multilayer Cantilever Microactuator.”https://doi.org/10.1016/j.sna.2007.03.012__Sensors and Actuators A: Physical 137, no. 2 (2007): 302–7.https://doi.org/10.1016/j.sna.2007.03.012 .

Schmalhorst, Jan, Daniel Ebke, Marc Sacher, Ning-Ning Liu, Andy Thomas, Gnter Reiss, Andreas Htten, and Elke Arenholz. “Chemical and Magnetic Interface Properties of Tunnel Junctions With Co$_2$MnSi/Co$_2$FeSi Multilayer Electrode Showing Large Tunneling Magnetoresistance.”https://doi.org/10.1109/tmag.2007.893475__IEEE Transactions on Magnetics 43, no. 6 (2007): 2806–8.https://doi.org/10.1109/tmag.2007.893475 .

Amann, Notker, Joachim Böcker, and Franz Prenner. “Active Damping of Drive Train Oscillations for an Electrically Driven Vehicle.”https://doi.org/10.1109/tmech.2004.839036__IEEE/ASME Transactions on Mechatronics 9, no. 4 (2004): 697–700.https://doi.org/10.1109/tmech.2004.839036 .

Pannemann, Ch., T. Diekmann, and Ulrich Hilleringmann. “Nanometer Scale Organic Thin Film Transistors with Pentacene.”https://doi.org/10.1016/s0167-9317(03)00146-1__Microelectronic Engineering 67–68 (2003): 845–52.https://doi.org/10.1016/s0167-9317(03)00146-1 .

Böcker, Joachim, Jörg Janning, and Helmut Jebenstreit. “High Dynamic Control of a Three-Level Voltage-Source-Converter Drive for a Main Strip Mill.”https://doi.org/10.1109/tie.2002.803220__IEEE Transactions on Industrial Electronics 49, no. 5 (2002): 1081–92.https://doi.org/10.1109/tie.2002.803220 .

Hilleringmann, Ulrich, and K. Goser. “Optoelectronic System Integration on Silicon: Waveguides, Photodetectors, and VLSI CMOS Circuits on One Chip.”https://doi.org/10.1109/16.381978__IEEE Transactions on Electron Devices 42, no. 5 (2002): 841–46.https://doi.org/10.1109/16.381978 .

Schönstein, I., J. Müller, Ulrich Hilleringmann, and K. Goser. “Characterization of Submicron NMOS Devices Due to Visible Light Emission.”https://doi.org/10.1016/0167-9317(93)90092-j__Microelectronic Engineering 21, no. 1–4 (2002): 363–66.https://doi.org/10.1016/0167-9317(93)90092-j .

Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.”https://doi.org/10.1016/0167-9317(92)90425-q__Microelectronic Engineering 19, no. 1–4 (2002): 211–14.https://doi.org/10.1016/0167-9317(92)90425-q .

Brass, E., Ulrich Hilleringmann, and K. Schumacher. “System Integration of Optical Devices and Analog CMOS Amplifiers.”https://doi.org/10.1109/4.297714__IEEE Journal of Solid-State Circuits 29, no. 8 (2002): 1006–10.https://doi.org/10.1109/4.297714 .

Brass, E., Ulrich Hilleringmann, and K. Schumacher. “System Integration of Optical Devices and Analog CMOS Amplifiers.”https://doi.org/10.1109/4.297714__IEEE Journal of Solid-State Circuits 29, no. 8 (2002): 1006–10.https://doi.org/10.1109/4.297714 .

Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “Characterisation of Sub-100 Nm-MOS-Transistors Processed by Optical Lithography and a Sidewall-Etchback Technique.”https://doi.org/10.1016/0167-9317(95)00280-4__Microelectronic Engineering 30, no. 1–4 (2002): 431–34.https://doi.org/10.1016/0167-9317(95)00280-4 .

Goser, K., Ulrich Hilleringmann, U. Rueckert, and K. Schumacher. “VLSI Technologies for Artificial Neural Networks.”https://doi.org/10.1109/40.42985__IEEE Micro 9, no. 6 (2002): 28–44.https://doi.org/10.1109/40.42985 .

Mankowski, V., Ulrich Hilleringmann, and K. Schumacher. “A Novel Insulation Technique for Smart Power Switching Devices and Very High Voltage ICs above 10 KV.”https://doi.org/10.1016/s0167-9317(00)00370-1__Microelectronic Engineering 53, no. 1–4 (2002): 525–28.https://doi.org/10.1016/s0167-9317(00)00370-1 .

Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “/f-Noise of Sub-100 Nm-MOS-Transistors Fabricated by a Special Deposition and Etchback Technique.”https://doi.org/10.1016/s0167-9317(00)00299-9__Microelectronic Engineering 53, no. 1–4 (2002): 213–16.https://doi.org/10.1016/s0167-9317(00)00299-9 .

Hilleringmann, Ulrich, K. Knospe, C. Heite, K. Schumacher, and K. Goser. “A Silicon Based Technology for Monolithic Integration of Waveguides and VLSI CMOS Circuits.”https://doi.org/10.1016/0167-9317(91)90231-2__Microelectronic Engineering 15, no. 1–4 (2002): 289–92.https://doi.org/10.1016/0167-9317(91)90231-2 .

Goser, K., Ulrich Hilleringmann, U. Rueckert, and K. Schumacher. “VLSI Technologies for Artificial Neural Networks.”https://doi.org/10.1109/40.42985__IEEE Micro 9, no. 6 (2002): 28–44.https://doi.org/10.1109/40.42985 .

Soennecken, A., Ulrich Hilleringmann, and K. Goser. “Floating Gate Structures as Nonvolatile Analog Memory Cells in 1.0;cm-LOCOS-CMOS Technology with PZT Dielectrica.”https://doi.org/10.1016/0167-9317(91)90299-s__Microelectronic Engineering 15, no. 1–4 (2002): 633–36.https://doi.org/10.1016/0167-9317(91)90299-s .

Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.”https://doi.org/10.1016/0167-9317(92)90425-q__Microelectronic Engineering 19, no. 1–4 (2002): 211–14.https://doi.org/10.1016/0167-9317(92)90425-q .

Adams, S., Ulrich Hilleringmann, and K. Goser. “CMOS Compatible Micromachining by Dry Silicon-Etching Techniques.”https://doi.org/10.1016/0167-9317(92)90420-v__Microelectronic Engineering 19, no. 1–4 (2002): 191–94.https://doi.org/10.1016/0167-9317(92)90420-v .