Hilleringmann, Ulrich, and K. Goser. “Optoelectronic System Integration on Silicon: Waveguides, Photodetectors, and VLSI CMOS Circuits on One Chip.”https://doi.org/10.1109/16.381978__IEEE Transactions on Electron Devices 42, no. 5 (2002): 841–46.https://doi.org/10.1109/16.381978 .

Schönstein, I., J. Müller, Ulrich Hilleringmann, and K. Goser. “Characterization of Submicron NMOS Devices Due to Visible Light Emission.”https://doi.org/10.1016/0167-9317(93)90092-j__Microelectronic Engineering 21, no. 1–4 (2002): 363–66.https://doi.org/10.1016/0167-9317(93)90092-j .

Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.”https://doi.org/10.1016/0167-9317(92)90425-q__Microelectronic Engineering 19, no. 1–4 (2002): 211–14.https://doi.org/10.1016/0167-9317(92)90425-q .

Brass, E., Ulrich Hilleringmann, and K. Schumacher. “System Integration of Optical Devices and Analog CMOS Amplifiers.”https://doi.org/10.1109/4.297714__IEEE Journal of Solid-State Circuits 29, no. 8 (2002): 1006–10.https://doi.org/10.1109/4.297714 .

Brass, E., Ulrich Hilleringmann, and K. Schumacher. “System Integration of Optical Devices and Analog CMOS Amplifiers.”https://doi.org/10.1109/4.297714__IEEE Journal of Solid-State Circuits 29, no. 8 (2002): 1006–10.https://doi.org/10.1109/4.297714 .

Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “Characterisation of Sub-100 Nm-MOS-Transistors Processed by Optical Lithography and a Sidewall-Etchback Technique.”https://doi.org/10.1016/0167-9317(95)00280-4__Microelectronic Engineering 30, no. 1–4 (2002): 431–34.https://doi.org/10.1016/0167-9317(95)00280-4 .

Goser, K., Ulrich Hilleringmann, U. Rueckert, and K. Schumacher. “VLSI Technologies for Artificial Neural Networks.”https://doi.org/10.1109/40.42985__IEEE Micro 9, no. 6 (2002): 28–44.https://doi.org/10.1109/40.42985 .

Mankowski, V., Ulrich Hilleringmann, and K. Schumacher. “A Novel Insulation Technique for Smart Power Switching Devices and Very High Voltage ICs above 10 KV.”https://doi.org/10.1016/s0167-9317(00)00370-1__Microelectronic Engineering 53, no. 1–4 (2002): 525–28.https://doi.org/10.1016/s0167-9317(00)00370-1 .

Horstmann, J.T., Ulrich Hilleringmann, and K. Goser. “/f-Noise of Sub-100 Nm-MOS-Transistors Fabricated by a Special Deposition and Etchback Technique.”https://doi.org/10.1016/s0167-9317(00)00299-9__Microelectronic Engineering 53, no. 1–4 (2002): 213–16.https://doi.org/10.1016/s0167-9317(00)00299-9 .

Hilleringmann, Ulrich, K. Knospe, C. Heite, K. Schumacher, and K. Goser. “A Silicon Based Technology for Monolithic Integration of Waveguides and VLSI CMOS Circuits.”https://doi.org/10.1016/0167-9317(91)90231-2__Microelectronic Engineering 15, no. 1–4 (2002): 289–92.https://doi.org/10.1016/0167-9317(91)90231-2 .

Goser, K., Ulrich Hilleringmann, U. Rueckert, and K. Schumacher. “VLSI Technologies for Artificial Neural Networks.”https://doi.org/10.1109/40.42985__IEEE Micro 9, no. 6 (2002): 28–44.https://doi.org/10.1109/40.42985 .

Soennecken, A., Ulrich Hilleringmann, and K. Goser. “Floating Gate Structures as Nonvolatile Analog Memory Cells in 1.0;cm-LOCOS-CMOS Technology with PZT Dielectrica.”https://doi.org/10.1016/0167-9317(91)90299-s__Microelectronic Engineering 15, no. 1–4 (2002): 633–36.https://doi.org/10.1016/0167-9317(91)90299-s .

Hilleringmann, Ulrich, and K. Goser. “Results of Monolithic Integration of Optical Waveguides, Photodiodes and CMOS Circuits on Silicon.”https://doi.org/10.1016/0167-9317(92)90425-q__Microelectronic Engineering 19, no. 1–4 (2002): 211–14.https://doi.org/10.1016/0167-9317(92)90425-q .

Adams, S., Ulrich Hilleringmann, and K. Goser. “CMOS Compatible Micromachining by Dry Silicon-Etching Techniques.”https://doi.org/10.1016/0167-9317(92)90420-v__Microelectronic Engineering 19, no. 1–4 (2002): 191–94.https://doi.org/10.1016/0167-9317(92)90420-v .

Horstmann, J.T., Ulrich Hilleringmann, and K.F. Goser. “Matching Analysis of Deposition Defined 50-Nm MOSFET’s.”https://doi.org/10.1109/16.658845__IEEE Transactions on Electron Devices 45, no. 1 (2002): 299–306.https://doi.org/10.1109/16.658845 .

Mankowski, V., Ulrich Hilleringmann, and K. Schumacher. “KV Low Current Cascaded Light Triggered Switch on One Silicon Chip.”https://doi.org/10.1016/s0167-9317(99)00122-7__Microelectronic Engineering 46, no. 1–4 (2002): 413–17.https://doi.org/10.1016/s0167-9317(99)00122-7 .

Horstmann, J.T., Ulrich Hilleringmann, and K.F. Goser. “Matching Analysis of Deposition Defined 50-Nm MOSFET’s.”https://doi.org/10.1109/16.658845__IEEE Transactions on Electron Devices 45, no. 1 (2002): 299–306.https://doi.org/10.1109/16.658845 .

Wirth, G, Ulrich Hilleringmann, J.T Horstmann, and K Goser. “Mesoscopic Transport Phenomena in Ultrashort Channel MOSFETs.”https://doi.org/10.1016/s0038-1101(99)00060-x__Solid-State Electronics 43, no. 7 (2002): 1245–50.https://doi.org/10.1016/s0038-1101(99)00060-x .

Otterbach, R., Ulrich Hilleringmann, T.J. Horstmann, and K. Goser. “Structures with a Minimum Feature Size of Less than 100 Nm in CVD-Diamond for Sensor Applications.”https://doi.org/10.1016/s0925-9635(01)00373-9__Diamond and Related Materials 10, no. 3–7 (2002): 511–14.https://doi.org/10.1016/s0925-9635(01)00373-9 .

Hilleringmann, Ulrich, T. Vieregge, and J.T. Horstmann. “A Structure Definition Technique for 25 Nm Lines of Silicon and Related Materials.”https://doi.org/10.1016/s0167-9317(00)00380-4__Microelectronic Engineering 53, no. 1–4 (2002): 569–72.https://doi.org/10.1016/s0167-9317(00)00380-4 .