Nanometer scale organic thin film transistors with Pentacene
Ch. Pannemann, T. Diekmann, U. Hilleringmann, Microelectronic Engineering 67–68 (2003) 845–852.

Piezoelectric transformers - state of the art and development trends
T. Hemsel, W. Littmann, J. Wallaschek, in: Ultrasonics Symposium, 2002. Proceedings. 2002 IEEE, 2002, pp. 645–648.

Lyotropic Mesophases Next to Highly Efficient Microemulsions: A <sup>2</sup>H NMR Study
C. Stubenrauch, C. Frank, R. Strey, D. Burgemeister, C. Schmidt, Langmuir 18 (2002) 5027–5030.

Fluorescent columnar liquid crystalline 3,4,9,10-tetra-(n-alkoxycarbonyl)-perylenes
S. Benning, H.-S. Kitzerow, H. Bock, M.-F. Achard, Liquid Crystals 27 (2002) 901–906.

Absorption and luminescence spectra of electroluminescent liquid crystals with triphenylene, pyrene and perylene units
S. Keuker-Baumann, H. Bock, F.D. Sala, S.A. Benning, T. Haßheider, T. Frauenheim, H.-S. Kitzerow, Liquid Crystals 28 (2002) 1105–1113.

Collapse of sodium polyacrylate chains in calcium salt solutions
R. Schweins, K. Huber, The European Physical Journal E 5 (2002) 117–126.

Ca<sup>2+</sup> and Cu<sup>2+</sup> Induced Conformational Changes of Sodium Polymethacrylate in Dilute Aqueous Solution
Y. Ikeda, M. Beer, M. Schmidt, K. Huber, Macromolecules 31 (2002) 728–733.

Model of Polydisperse Wormlike Stars and Its Application to Dyestuff Aggregates
A. Katzenstein, K. Huber, Langmuir 18 (2002) 7049–7056.

Optoelectronic system integration on silicon: waveguides, photodetectors, and VLSI CMOS circuits on one chip
U. Hilleringmann, K. Goser, IEEE Transactions on Electron Devices 42 (2002) 841–846.

Characterization of submicron NMOS devices due to visible light emission
I. Schönstein, J. Müller, U. Hilleringmann, K. Goser, Microelectronic Engineering 21 (2002) 363–366.

Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon
U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.

Characterisation of sub-100 nm-MOS-transistors processed by optical lithography and a sidewall-etchback technique
J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 30 (2002) 431–434.

A novel insulation technique for smart power switching devices and very high voltage ICs above 10 kV
V. Mankowski, U. Hilleringmann, K. Schumacher, Microelectronic Engineering 53 (2002) 525–528.

1/f-Noise of sub-100 nm-MOS-transistors fabricated by a special deposition and etchback technique
J.T. Horstmann, U. Hilleringmann, K. Goser, Microelectronic Engineering 53 (2002) 213–216.

A silicon based technology for monolithic integration of waveguides and VLSI CMOS circuits
U. Hilleringmann, K. Knospe, C. Heite, K. Schumacher, K. Goser, Microelectronic Engineering 15 (2002) 289–292.

Floating gate structures as nonvolatile analog memory cells in 1.0;cm-LOCOS-CMOS technology with PZT dielectrica
A. Soennecken, U. Hilleringmann, K. Goser, Microelectronic Engineering 15 (2002) 633–636.

Results of monolithic integration of optical waveguides, photodiodes and CMOS circuits on silicon
U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 211–214.

CMOS compatible micromachining by dry silicon-etching techniques
S. Adams, U. Hilleringmann, K. Goser, Microelectronic Engineering 19 (2002) 191–194.

Matching analysis of deposition defined 50-nm MOSFET's
J.T. Horstmann, U. Hilleringmann, K.F. Goser, IEEE Transactions on Electron Devices 45 (2002) 299–306.

12 kV low current cascaded light triggered switch on one silicon chip
V. Mankowski, U. Hilleringmann, K. Schumacher, Microelectronic Engineering 46 (2002) 413–417.