---
_id: '4116'
abstract:
- lang: eng
  text: "Anisotropic etching processes for mesa structure formation using fluorinated
    plasma\r\natmospheres in an electron cyclotron resonance (ECR) plasma etcher were
    studied on Novasic\r\nsubstrates with 10 μm thick 3C-SiC(100) grown on Si(100).
    To achieve reasonable etching rates, a\r\nspecial gas inlet system suitable for
    injecting SF6 into the high density downstream Ar ECR plasma\r\nwas designed.
    The influence of the etching mask material on the sidewall morphology was\r\ninvestigated.
    Masking materials with small grain sizes are preferable to achieve a desired shape.\r\nThe
    evolution of the mesa form was investigated in dependence on the gas composition,
    the applied\r\nbias, the pressure and the composition of the gas atmosphere. The
    achieved sidewall slope was 84.5\r\ndeg. The aspect ratios of the fabricated structures
    in the developed residue free ECR plasma etching\r\nprocess were between 5 and
    10. Mesa structures aligned to [100] and [110] directions were\r\nfabricated."
article_type: original
author:
- first_name: Lars
  full_name: Hiller, Lars
  last_name: Hiller
- first_name: Thomas
  full_name: Stauden, Thomas
  last_name: Stauden
- first_name: Ricarda M.
  full_name: Kemper, Ricarda M.
  last_name: Kemper
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
- first_name: Donat J.
  full_name: As, Donat J.
  id: '14'
  last_name: As
  orcid: 0000-0003-1121-3565
- first_name: Jörg
  full_name: Pezoldt, Jörg
  last_name: Pezoldt
citation:
  ama: Hiller L, Stauden T, Kemper RM, Lindner J, As DJ, Pezoldt J. ECR-Ectching of
    Submicron and Nanometer Sized 3C-SiC(100) Mesa Structures. <i>Materials Science
    Forum</i>. 2012;717-720:901-904. doi:<a href="https://doi.org/10.4028/www.scientific.net/msf.717-720.901">10.4028/www.scientific.net/msf.717-720.901</a>
  apa: Hiller, L., Stauden, T., Kemper, R. M., Lindner, J., As, D. J., &#38; Pezoldt,
    J. (2012). ECR-Ectching of Submicron and Nanometer Sized 3C-SiC(100) Mesa Structures.
    <i>Materials Science Forum</i>, <i>717–720</i>, 901–904. <a href="https://doi.org/10.4028/www.scientific.net/msf.717-720.901">https://doi.org/10.4028/www.scientific.net/msf.717-720.901</a>
  bibtex: '@article{Hiller_Stauden_Kemper_Lindner_As_Pezoldt_2012, title={ECR-Ectching
    of Submicron and Nanometer Sized 3C-SiC(100) Mesa Structures}, volume={717–720},
    DOI={<a href="https://doi.org/10.4028/www.scientific.net/msf.717-720.901">10.4028/www.scientific.net/msf.717-720.901</a>},
    journal={Materials Science Forum}, publisher={Trans Tech Publications}, author={Hiller,
    Lars and Stauden, Thomas and Kemper, Ricarda M. and Lindner, Jörg and As, Donat
    J. and Pezoldt, Jörg}, year={2012}, pages={901–904} }'
  chicago: 'Hiller, Lars, Thomas Stauden, Ricarda M. Kemper, Jörg Lindner, Donat J.
    As, and Jörg Pezoldt. “ECR-Ectching of Submicron and Nanometer Sized 3C-SiC(100)
    Mesa Structures.” <i>Materials Science Forum</i> 717–720 (2012): 901–4. <a href="https://doi.org/10.4028/www.scientific.net/msf.717-720.901">https://doi.org/10.4028/www.scientific.net/msf.717-720.901</a>.'
  ieee: 'L. Hiller, T. Stauden, R. M. Kemper, J. Lindner, D. J. As, and J. Pezoldt,
    “ECR-Ectching of Submicron and Nanometer Sized 3C-SiC(100) Mesa Structures,” <i>Materials
    Science Forum</i>, vol. 717–720, pp. 901–904, 2012, doi: <a href="https://doi.org/10.4028/www.scientific.net/msf.717-720.901">10.4028/www.scientific.net/msf.717-720.901</a>.'
  mla: Hiller, Lars, et al. “ECR-Ectching of Submicron and Nanometer Sized 3C-SiC(100)
    Mesa Structures.” <i>Materials Science Forum</i>, vol. 717–720, Trans Tech Publications,
    2012, pp. 901–04, doi:<a href="https://doi.org/10.4028/www.scientific.net/msf.717-720.901">10.4028/www.scientific.net/msf.717-720.901</a>.
  short: L. Hiller, T. Stauden, R.M. Kemper, J. Lindner, D.J. As, J. Pezoldt, Materials
    Science Forum 717–720 (2012) 901–904.
conference:
  location: Cleveland (USA)
  name: International Conference on Silicon Carbide and Related Materials (ICSCRM)
    2011
date_created: 2018-08-23T13:35:20Z
date_updated: 2023-10-09T09:09:13Z
ddc:
- '530'
department:
- _id: '15'
- _id: '286'
doi: 10.4028/www.scientific.net/msf.717-720.901
file:
- access_level: closed
  content_type: application/pdf
  creator: hclaudia
  date_created: 2018-08-23T13:37:42Z
  date_updated: 2018-08-23T13:37:42Z
  file_id: '4117'
  file_name: ECR-etching of Submicron and Nanometer Sized 3C-SiC(100) Mesa Structures.pdf
  file_size: 1309453
  relation: main_file
  success: 1
file_date_updated: 2018-08-23T13:37:42Z
has_accepted_license: '1'
language:
- iso: eng
page: 901-904
publication: Materials Science Forum
publication_identifier:
  issn:
  - 1662-9752
publication_status: published
publisher: Trans Tech Publications
status: public
title: ECR-Ectching of Submicron and Nanometer Sized 3C-SiC(100) Mesa Structures
type: journal_article
user_id: '14931'
volume: 717-720
year: '2012'
...
---
_id: '4146'
abstract:
- lang: eng
  text: The existence of anti-phase domains in cubic GaN grown on 3C-SiC/Si (001)
    substrates by plasma-assisted molecular beam epitaxy is reported. The influence
    of the 3C-SiC/Si (001) substrate morphology is studied with emphasis on the anti-phase
    domains (APDs). The GaN nucleation is governed by the APDs of the substrate, resulting
    in equal plane orientation and the same anti-phase boundaries. The presence of
    the APDs is independent of the GaN layer thickness. Atomic force microscopy surface
    analysis indicates lateral growth anisotropy of GaN facets in dependence of the
    APD orientation. This anisotropy can be linked to Ga and N face types of the {111}
    planes, similar to observations of anisotropic growth in 3C-SiC. In contrast to
    3C-SiC, however, a difference in GaN phase composition for the two types of APDs
    can be measured by electron backscatter diffraction, μ-Raman and cathodoluminescence
    spectroscopy.
article_number: '123512'
article_type: original
author:
- first_name: Ricarda
  full_name: Maria Kemper, Ricarda
  last_name: Maria Kemper
- first_name: Thorsten
  full_name: Schupp, Thorsten
  last_name: Schupp
- first_name: Maik
  full_name: Häberlen, Maik
  last_name: Häberlen
- first_name: Thomas
  full_name: Niendorf, Thomas
  last_name: Niendorf
- first_name: Hans-Jürgen
  full_name: Maier, Hans-Jürgen
  last_name: Maier
- first_name: Anja
  full_name: Dempewolf, Anja
  last_name: Dempewolf
- first_name: Frank
  full_name: Bertram, Frank
  last_name: Bertram
- first_name: Jürgen
  full_name: Christen, Jürgen
  last_name: Christen
- first_name: Ronny
  full_name: Kirste, Ronny
  last_name: Kirste
- first_name: Axel
  full_name: Hoffmann, Axel
  last_name: Hoffmann
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
- first_name: Donat
  full_name: As, Donat
  id: '14'
  last_name: As
  orcid: 0000-0003-1121-3565
citation:
  ama: Maria Kemper R, Schupp T, Häberlen M, et al. Anti-phase domains in cubic GaN.
    <i>Journal of Applied Physics</i>. 2011;110(12). doi:<a href="https://doi.org/10.1063/1.3666050">10.1063/1.3666050</a>
  apa: Maria Kemper, R., Schupp, T., Häberlen, M., Niendorf, T., Maier, H.-J., Dempewolf,
    A., Bertram, F., Christen, J., Kirste, R., Hoffmann, A., Lindner, J., &#38; As,
    D. (2011). Anti-phase domains in cubic GaN. <i>Journal of Applied Physics</i>,
    <i>110</i>(12), Article 123512. <a href="https://doi.org/10.1063/1.3666050">https://doi.org/10.1063/1.3666050</a>
  bibtex: '@article{Maria Kemper_Schupp_Häberlen_Niendorf_Maier_Dempewolf_Bertram_Christen_Kirste_Hoffmann_et
    al._2011, title={Anti-phase domains in cubic GaN}, volume={110}, DOI={<a href="https://doi.org/10.1063/1.3666050">10.1063/1.3666050</a>},
    number={12123512}, journal={Journal of Applied Physics}, publisher={AIP Publishing},
    author={Maria Kemper, Ricarda and Schupp, Thorsten and Häberlen, Maik and Niendorf,
    Thomas and Maier, Hans-Jürgen and Dempewolf, Anja and Bertram, Frank and Christen,
    Jürgen and Kirste, Ronny and Hoffmann, Axel and et al.}, year={2011} }'
  chicago: Maria Kemper, Ricarda, Thorsten Schupp, Maik Häberlen, Thomas Niendorf,
    Hans-Jürgen Maier, Anja Dempewolf, Frank Bertram, et al. “Anti-Phase Domains in
    Cubic GaN.” <i>Journal of Applied Physics</i> 110, no. 12 (2011). <a href="https://doi.org/10.1063/1.3666050">https://doi.org/10.1063/1.3666050</a>.
  ieee: 'R. Maria Kemper <i>et al.</i>, “Anti-phase domains in cubic GaN,” <i>Journal
    of Applied Physics</i>, vol. 110, no. 12, Art. no. 123512, 2011, doi: <a href="https://doi.org/10.1063/1.3666050">10.1063/1.3666050</a>.'
  mla: Maria Kemper, Ricarda, et al. “Anti-Phase Domains in Cubic GaN.” <i>Journal
    of Applied Physics</i>, vol. 110, no. 12, 123512, AIP Publishing, 2011, doi:<a
    href="https://doi.org/10.1063/1.3666050">10.1063/1.3666050</a>.
  short: R. Maria Kemper, T. Schupp, M. Häberlen, T. Niendorf, H.-J. Maier, A. Dempewolf,
    F. Bertram, J. Christen, R. Kirste, A. Hoffmann, J. Lindner, D. As, Journal of
    Applied Physics 110 (2011).
date_created: 2018-08-27T12:40:30Z
date_updated: 2023-10-09T09:10:50Z
ddc:
- '530'
department:
- _id: '15'
- _id: '286'
doi: 10.1063/1.3666050
file:
- access_level: closed
  content_type: application/pdf
  creator: hclaudia
  date_created: 2018-08-27T12:42:38Z
  date_updated: 2018-08-27T12:42:38Z
  file_id: '4147'
  file_name: Anti-phase domains in cubic GaN.pdf
  file_size: 3305430
  relation: main_file
  success: 1
file_date_updated: 2018-08-27T12:42:38Z
has_accepted_license: '1'
intvolume: '       110'
issue: '12'
language:
- iso: eng
publication: Journal of Applied Physics
publication_identifier:
  issn:
  - 0021-8979
  - 1089-7550
publication_status: published
publisher: AIP Publishing
status: public
title: Anti-phase domains in cubic GaN
type: journal_article
user_id: '14931'
volume: 110
year: '2011'
...
---
_id: '13568'
author:
- first_name: C.
  full_name: Mietze, C.
  last_name: Mietze
- first_name: M.
  full_name: Landmann, M.
  last_name: Landmann
- first_name: E.
  full_name: Rauls, E.
  last_name: Rauls
- first_name: H.
  full_name: Machhadani, H.
  last_name: Machhadani
- first_name: S.
  full_name: Sakr, S.
  last_name: Sakr
- first_name: M.
  full_name: Tchernycheva, M.
  last_name: Tchernycheva
- first_name: F. H.
  full_name: Julien, F. H.
  last_name: Julien
- first_name: Wolf Gero
  full_name: Schmidt, Wolf Gero
  id: '468'
  last_name: Schmidt
  orcid: 0000-0002-2717-5076
- first_name: K.
  full_name: Lischka, K.
  last_name: Lischka
- first_name: Donat Josef
  full_name: As, Donat Josef
  id: '14'
  last_name: As
  orcid: 0000-0003-1121-3565
citation:
  ama: Mietze C, Landmann M, Rauls E, et al. Band offsets in cubic GaN/AlN superlattices.
    <i>Physical Review B</i>. 2011;83(19). doi:<a href="https://doi.org/10.1103/physrevb.83.195301">10.1103/physrevb.83.195301</a>
  apa: Mietze, C., Landmann, M., Rauls, E., Machhadani, H., Sakr, S., Tchernycheva,
    M., Julien, F. H., Schmidt, W. G., Lischka, K., &#38; As, D. J. (2011). Band offsets
    in cubic GaN/AlN superlattices. <i>Physical Review B</i>, <i>83</i>(19). <a href="https://doi.org/10.1103/physrevb.83.195301">https://doi.org/10.1103/physrevb.83.195301</a>
  bibtex: '@article{Mietze_Landmann_Rauls_Machhadani_Sakr_Tchernycheva_Julien_Schmidt_Lischka_As_2011,
    title={Band offsets in cubic GaN/AlN superlattices}, volume={83}, DOI={<a href="https://doi.org/10.1103/physrevb.83.195301">10.1103/physrevb.83.195301</a>},
    number={19}, journal={Physical Review B}, author={Mietze, C. and Landmann, M.
    and Rauls, E. and Machhadani, H. and Sakr, S. and Tchernycheva, M. and Julien,
    F. H. and Schmidt, Wolf Gero and Lischka, K. and As, Donat Josef}, year={2011}
    }'
  chicago: Mietze, C., M. Landmann, E. Rauls, H. Machhadani, S. Sakr, M. Tchernycheva,
    F. H. Julien, Wolf Gero Schmidt, K. Lischka, and Donat Josef As. “Band Offsets
    in Cubic GaN/AlN Superlattices.” <i>Physical Review B</i> 83, no. 19 (2011). <a
    href="https://doi.org/10.1103/physrevb.83.195301">https://doi.org/10.1103/physrevb.83.195301</a>.
  ieee: 'C. Mietze <i>et al.</i>, “Band offsets in cubic GaN/AlN superlattices,” <i>Physical
    Review B</i>, vol. 83, no. 19, 2011, doi: <a href="https://doi.org/10.1103/physrevb.83.195301">10.1103/physrevb.83.195301</a>.'
  mla: Mietze, C., et al. “Band Offsets in Cubic GaN/AlN Superlattices.” <i>Physical
    Review B</i>, vol. 83, no. 19, 2011, doi:<a href="https://doi.org/10.1103/physrevb.83.195301">10.1103/physrevb.83.195301</a>.
  short: C. Mietze, M. Landmann, E. Rauls, H. Machhadani, S. Sakr, M. Tchernycheva,
    F.H. Julien, W.G. Schmidt, K. Lischka, D.J. As, Physical Review B 83 (2011).
date_created: 2019-10-01T09:11:23Z
date_updated: 2025-12-05T10:41:18Z
department:
- _id: '15'
- _id: '170'
- _id: '295'
- _id: '284'
- _id: '35'
- _id: '230'
- _id: '27'
doi: 10.1103/physrevb.83.195301
intvolume: '        83'
issue: '19'
language:
- iso: eng
project:
- _id: '52'
  name: Computing Resources Provided by the Paderborn Center for Parallel Computing
publication: Physical Review B
publication_identifier:
  issn:
  - 1098-0121
  - 1550-235X
publication_status: published
status: public
title: Band offsets in cubic GaN/AlN superlattices
type: journal_article
user_id: '16199'
volume: 83
year: '2011'
...
---
_id: '13835'
author:
- first_name: A.
  full_name: Scholle, A.
  last_name: Scholle
- first_name: S.
  full_name: Greulich-Weber, S.
  last_name: Greulich-Weber
- first_name: Donat Josef
  full_name: As, Donat Josef
  id: '14'
  last_name: As
  orcid: 0000-0003-1121-3565
- first_name: Ch.
  full_name: Mietze, Ch.
  last_name: Mietze
- first_name: N. T.
  full_name: Son, N. T.
  last_name: Son
- first_name: C.
  full_name: Hemmingsson, C.
  last_name: Hemmingsson
- first_name: B.
  full_name: Monemar, B.
  last_name: Monemar
- first_name: E.
  full_name: Janzén, E.
  last_name: Janzén
- first_name: Uwe
  full_name: Gerstmann, Uwe
  id: '171'
  last_name: Gerstmann
  orcid: 0000-0002-4476-223X
- first_name: S.
  full_name: Sanna, S.
  last_name: Sanna
- first_name: E.
  full_name: Rauls, E.
  last_name: Rauls
- first_name: Wolf Gero
  full_name: Schmidt, Wolf Gero
  id: '468'
  last_name: Schmidt
  orcid: 0000-0002-2717-5076
citation:
  ama: Scholle A, Greulich-Weber S, As DJ, et al. Magnetic characterization of conductance
    electrons in GaN. <i>physica status solidi (b)</i>. 2010;247(7):1728-1731. doi:<a
    href="https://doi.org/10.1002/pssb.200983582">10.1002/pssb.200983582</a>
  apa: Scholle, A., Greulich-Weber, S., As, D. J., Mietze, Ch., Son, N. T., Hemmingsson,
    C., Monemar, B., Janzén, E., Gerstmann, U., Sanna, S., Rauls, E., &#38; Schmidt,
    W. G. (2010). Magnetic characterization of conductance electrons in GaN. <i>Physica
    Status Solidi (b)</i>, <i>247</i>(7), 1728–1731. <a href="https://doi.org/10.1002/pssb.200983582">https://doi.org/10.1002/pssb.200983582</a>
  bibtex: '@article{Scholle_Greulich-Weber_As_Mietze_Son_Hemmingsson_Monemar_Janzén_Gerstmann_Sanna_et
    al._2010, title={Magnetic characterization of conductance electrons in GaN}, volume={247},
    DOI={<a href="https://doi.org/10.1002/pssb.200983582">10.1002/pssb.200983582</a>},
    number={7}, journal={physica status solidi (b)}, author={Scholle, A. and Greulich-Weber,
    S. and As, Donat Josef and Mietze, Ch. and Son, N. T. and Hemmingsson, C. and
    Monemar, B. and Janzén, E. and Gerstmann, Uwe and Sanna, S. and et al.}, year={2010},
    pages={1728–1731} }'
  chicago: 'Scholle, A., S. Greulich-Weber, Donat Josef As, Ch. Mietze, N. T. Son,
    C. Hemmingsson, B. Monemar, et al. “Magnetic Characterization of Conductance Electrons
    in GaN.” <i>Physica Status Solidi (b)</i> 247, no. 7 (2010): 1728–31. <a href="https://doi.org/10.1002/pssb.200983582">https://doi.org/10.1002/pssb.200983582</a>.'
  ieee: 'A. Scholle <i>et al.</i>, “Magnetic characterization of conductance electrons
    in GaN,” <i>physica status solidi (b)</i>, vol. 247, no. 7, pp. 1728–1731, 2010,
    doi: <a href="https://doi.org/10.1002/pssb.200983582">10.1002/pssb.200983582</a>.'
  mla: Scholle, A., et al. “Magnetic Characterization of Conductance Electrons in
    GaN.” <i>Physica Status Solidi (b)</i>, vol. 247, no. 7, 2010, pp. 1728–31, doi:<a
    href="https://doi.org/10.1002/pssb.200983582">10.1002/pssb.200983582</a>.
  short: A. Scholle, S. Greulich-Weber, D.J. As, Ch. Mietze, N.T. Son, C. Hemmingsson,
    B. Monemar, E. Janzén, U. Gerstmann, S. Sanna, E. Rauls, W.G. Schmidt, Physica
    Status Solidi (b) 247 (2010) 1728–1731.
date_created: 2019-10-15T07:40:58Z
date_updated: 2025-12-16T07:46:59Z
department:
- _id: '15'
- _id: '170'
- _id: '295'
- _id: '284'
- _id: '790'
- _id: '35'
- _id: '230'
doi: 10.1002/pssb.200983582
funded_apc: '1'
intvolume: '       247'
issue: '7'
language:
- iso: eng
page: 1728-1731
publication: physica status solidi (b)
publication_identifier:
  issn:
  - 0370-1972
  - 1521-3951
publication_status: published
status: public
title: Magnetic characterization of conductance electrons in GaN
type: journal_article
user_id: '16199'
volume: 247
year: '2010'
...
---
_id: '4218'
abstract:
- lang: eng
  text: 'In this work we focus on the fabrication of ohmic contacts and of Schottky
    barrier devices (SBD) on non-polar cubic GaN epilayers grown by molecular beam
    epitaxy (MBE). A Ti/Al/Ni/Au metallization was used for ohmic contacts and the
    contact resistance was measured by transmission line measurements (TLM). Ni, Pd,
    Ag and NiSi Schottky barrier devices 300 µm in diameter were fabricated by thermal
    evaporation using contact lithography on cubic GaN epilayers. The current-voltage
    (I-V) and the capacity-voltage (C-V) characteristics were studied at room temperature
    in detail. A clear rectifying behavior was measured in all SBDs. In the Ni and
    Ag SBDs an abnormal large leakage current under reverse bias was observed. Isochronal
    thermal annealing of these Ni and Ag based SBDs at 200°C in air improved the reverse
    characteristics by up to three orders of magnitude. This is in contrast to the
    Pd contacts, where the as grown contact showed already good performance and thermal
    annealing had nearly no influence on the I-V characteristics. For all SBDs the
    magnitude of the reverse current is generally larger than that expected due to
    thermionic emission and an exponential increase of the reverse current is observed
    with increasing reverse voltage. In-depth analysis of the I-V characteristic showed
    that a thin surface barrier is formed at the metal semiconductor interface and
    that crystal defects like dislocations may be the reasons for the discrepancy
    between experimental data and thermionic emission theory. '
author:
- first_name: Donat J.
  full_name: As, Donat J.
  id: '14'
  last_name: As
  orcid: 0000-0003-1121-3565
- first_name: Elena
  full_name: Tschumak, Elena
  last_name: Tschumak
- first_name: Irina
  full_name: Laubenstein, Irina
  last_name: Laubenstein
- first_name: Ricarda M.
  full_name: Kemper, Ricarda M.
  last_name: Kemper
- first_name: Klaus
  full_name: Lischka, Klaus
  last_name: Lischka
citation:
  ama: 'As DJ, Tschumak E, Laubenstein I, Kemper RM, Lischka K. Schottky and Ohmic
    Contacts on Non-Polar Cubic GaN Epilayers. In: <i>Materials Research Society Symposium
    Proceedings</i>. Vol 1108. Materials Research Society; 2009:3-8. doi:<a href="https://doi.org/10.1557/proc-1108-a01-02">10.1557/proc-1108-a01-02</a>'
  apa: As, D. J., Tschumak, E., Laubenstein, I., Kemper, R. M., &#38; Lischka, K.
    (2009). Schottky and Ohmic Contacts on Non-Polar Cubic GaN Epilayers. <i>Materials
    Research Society Symposium Proceedings</i>, <i>1108</i>, 3–8. <a href="https://doi.org/10.1557/proc-1108-a01-02">https://doi.org/10.1557/proc-1108-a01-02</a>
  bibtex: '@inproceedings{As_Tschumak_Laubenstein_Kemper_Lischka_2009, title={Schottky
    and Ohmic Contacts on Non-Polar Cubic GaN Epilayers}, volume={1108}, DOI={<a href="https://doi.org/10.1557/proc-1108-a01-02">10.1557/proc-1108-a01-02</a>},
    booktitle={Materials Research Society Symposium Proceedings}, publisher={Materials
    Research Society}, author={As, Donat J. and Tschumak, Elena and Laubenstein, Irina
    and Kemper, Ricarda M. and Lischka, Klaus}, year={2009}, pages={3–8} }'
  chicago: As, Donat J., Elena Tschumak, Irina Laubenstein, Ricarda M. Kemper, and
    Klaus Lischka. “Schottky and Ohmic Contacts on Non-Polar Cubic GaN Epilayers.”
    In <i>Materials Research Society Symposium Proceedings</i>, 1108:3–8. Materials
    Research Society, 2009. <a href="https://doi.org/10.1557/proc-1108-a01-02">https://doi.org/10.1557/proc-1108-a01-02</a>.
  ieee: 'D. J. As, E. Tschumak, I. Laubenstein, R. M. Kemper, and K. Lischka, “Schottky
    and Ohmic Contacts on Non-Polar Cubic GaN Epilayers,” in <i>Materials Research
    Society Symposium Proceedings</i>, 2009, vol. 1108, pp. 3–8, doi: <a href="https://doi.org/10.1557/proc-1108-a01-02">10.1557/proc-1108-a01-02</a>.'
  mla: As, Donat J., et al. “Schottky and Ohmic Contacts on Non-Polar Cubic GaN Epilayers.”
    <i>Materials Research Society Symposium Proceedings</i>, vol. 1108, Materials
    Research Society, 2009, pp. 3–8, doi:<a href="https://doi.org/10.1557/proc-1108-a01-02">10.1557/proc-1108-a01-02</a>.
  short: 'D.J. As, E. Tschumak, I. Laubenstein, R.M. Kemper, K. Lischka, in: Materials
    Research Society Symposium Proceedings, Materials Research Society, 2009, pp.
    3–8.'
date_created: 2018-08-28T12:57:35Z
date_updated: 2023-10-09T09:12:30Z
department:
- _id: '15'
- _id: '284'
doi: 10.1557/proc-1108-a01-02
intvolume: '      1108'
language:
- iso: eng
page: 3-8
publication: Materials Research Society Symposium Proceedings
publication_status: published
publisher: Materials Research Society
status: public
title: Schottky and Ohmic Contacts on Non-Polar Cubic GaN Epilayers
type: conference
user_id: '14931'
volume: 1108
year: '2009'
...
