@inproceedings{3991, author = {{Riedl, Thomas and Kunnathully, Vinay and Lindner, Jörg}}, location = {{Straßburg (France)}}, title = {{{Evolution of the opening size of nanosphere lithography masks during thermal annealing}}}, year = {{2017}}, } @article{3992, author = {{Rieger, Torsten and Riedl, Thomas and Neumann, Elmar and Grützmacher, Detlev and Lindner, Jörg and Pawlis, Alexander}}, issn = {{1944-8244}}, journal = {{ACS Applied Materials & Interfaces}}, number = {{9}}, pages = {{8371--8377}}, publisher = {{American Chemical Society (ACS)}}, title = {{{Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence}}}, doi = {{10.1021/acsami.6b15824}}, volume = {{9}}, year = {{2017}}, } @inproceedings{3999, author = {{Lindner, Jörg and Riedl, Thomas}}, location = {{Warsaw ( Poland)}}, title = {{{Strain effects on the heteroepitaxy of III-V compound semiconductors on nanopatterned surfaces}}}, year = {{2017}}, } @inproceedings{4000, author = {{Lindner, Jörg}}, location = {{Dresden (Germany)}}, title = {{{Ion Beam Modification of Self-Organized Nanostructures}}}, year = {{2017}}, } @inproceedings{4001, author = {{Brassat, Katharina and Keller, A. and Grundmeier, G. and Bremser, W. and Strube, O. and Lindner, Jörg}}, location = {{Straßbourg (France)}}, title = {{{Bioinspired material design by hierarchical self-assembly on prepatterned surfaces }}}, year = {{2017}}, } @inproceedings{4003, author = {{Brassat, Katharina and Brodehl, Christoph and Lindner, Jörg}}, location = {{Brasov (Romania)}}, title = {{{Regular surface nanopatterning with nanosphere lithography, block copolymer lithography and cominations of both}}}, year = {{2017}}, } @article{3997, abstract = {{Switchable two dimensional liquid crystal diffraction gratings are promising can- didates in beam steering devices, multiplexers and holographic displays. For these areas of applications a high degree of integration in optical systems is much sought-after. In the context of diffraction gratings this means that the angle of diffraction should be rather high, which typically poses a problem as the fabrication of small grating periods is challenging. In this paper, we propose the use of nanosphere lithography (NSL) for the fabrication of two-dimensionally structured electrodes with a periodicity of a few micrometers. NSL is based on the self-assembly of micro- or nanometer sized spheres into monolayers. It allows for easy substrate structuring on wafer scale. The manufactured electrode is combined with a liquid crystalline polymer-stabilized blue phase, which facilitates sub-millisecond electrical switching of the diffraction efficiency at adiffractionangle of 21.4°.}}, author = {{Wahle, M. and Brassat, Katharina and Ebel, J. and Bürger, Julius and Lindner, Jörg and Kitzerow, Heinz-Siegfried}}, journal = {{Optics Express 25}}, number = {{19}}, pages = {{22608--22619}}, title = {{{Two-dimensional switchable blue phase gratings manufactured by nanosphere lithography}}}, doi = {{10.1364/OE.25.022607}}, volume = {{25}}, year = {{2017}}, } @inproceedings{4002, author = {{Kitzerow, Heinz-Siegfried and Lindner, Jörg}}, location = {{Barcelona (Spain)}}, title = {{{Plasmonic nanostructures: spectroscopy and electron microscopy}}}, year = {{2017}}, } @article{3956, abstract = {{In this article we present an integration technique for low-voltage DNTT-based TFTs for flexible electronic applications. Therefore, a high-k nanocomposite combining the flexibility of its polymericmatrix and the high permittivity of the incorporated inorganic material was used as gate dielectric layer. The influence of a conventional photolithography process upon the dielectric layer is analyzed regarding electrical instabilities in the device characteristics. The impact of an implemented sacrificial layer to reduce chemical stress to the insulating film during photolithography is evaluated. Furthermore, first inverter circuits were integrated and electrically characterized. Additionally, the implementation of this sacrificial layer can be used for future complementary circuit design.}}, author = {{Meyers, Thorsten and Vidor, Fábio F. and Brassat, Katharina and Lindner, Jörg and Hilleringmann, Ulrich}}, issn = {{0167-9317}}, journal = {{Microelectronic Engineering}}, pages = {{35--39}}, publisher = {{Elsevier BV}}, title = {{{Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics}}}, doi = {{10.1016/j.mee.2016.12.018}}, volume = {{174}}, year = {{2016}}, } @inproceedings{4004, author = {{Brassat, Katharina and Rüdiger, Arne and Bürger, Julius and Bremser, W. and Strube, Oliver and Lindner, Jörg}}, location = {{Warsaw (Poland)}}, title = {{{Enzyme mediated autodeposition of protein particles on nanosphere lithographically nanostructured surfaces }}}, year = {{2016}}, } @inproceedings{4005, author = {{Brassat, Katharina and Bürger, Julius and Reinecke, Melanie and Briese, Dennis and Duschik, K. and Schaper, Mirko and Lindner, Jörg}}, location = {{Warsaw (Poland)}}, title = {{{Arrangement of perovskitic semiconductor nanoparticles using soft lithography }}}, year = {{2016}}, } @inproceedings{4006, author = {{Brassat, Katharina and Rüdiger, Arne and Bürger, Julius and Bremser, W. and Strube, O. and Lindner, Jörg}}, location = {{Warsaw (Poland)}}, title = {{{Site-selective protein immobilization on regular antidot patterns fabricated by nanosphere lithography }}}, year = {{2016}}, } @inproceedings{4007, author = {{Brassat, Katharina and Kool, Daniel and Lindner, Jörg}}, location = {{Warsaw (Poland)}}, title = {{{Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography }}}, year = {{2016}}, } @inproceedings{4008, author = {{Brassat, Katharina and Lindner, Jörg}}, location = {{Porquerolles (France)}}, title = {{{Sub-20 nm surface patterning by block copolymer lithography }}}, year = {{2016}}, } @inproceedings{4009, author = {{Brodehl, Christoph and Greulich-Weber, Siegmund and Lindner, Jörg}}, location = {{Lille (France)}}, title = {{{Fabricating metasurface-based optical devices with a low-cost technique}}}, year = {{2016}}, } @inproceedings{4010, author = {{Puglisi, R.A. and Bongiorno, C. and Brassat, Katharina and Garozzo, Christina and La Magna, A. and Lindner, Jörg}}, location = {{Warsaw (Poland)}}, title = {{{High-resolution TEM and STEM-EELS studies of colloidal Au nanoparticles self-assembled in nanometric SiO2 nanopore arrays fabricated by block-copolymer lithography }}}, year = {{2016}}, } @inproceedings{4011, author = {{Riedl, Thomas and Lindner, Jörg}}, location = {{Warsaw (Poland)}}, title = {{{Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins }}}, year = {{2016}}, } @inproceedings{4012, author = {{Riedl, Thomas and Lindner, Jörg}}, location = {{Regensburg (Germany)}}, title = {{{Theoretical analysis of strain and misfit dislocation stability in axial-heteroepitaxial GaAs/InAs nanopillars}}}, year = {{2016}}, } @inproceedings{4013, author = {{Riedl, Thomas and Kemper, R.M. and As, Donald and Lindner, Jörg}}, location = {{Regensburg}}, title = {{{Stability of misfit dislocations in axial-heteroepitaxial 3CSiC/c-GaN nanopillars and nanomesas}}}, year = {{2016}}, } @inproceedings{4014, author = {{Rieger, T. and Riedl, Thomas and Lindner, Jörg and Pawlis, A.}}, location = {{Montpellier (France)}}, title = {{{Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique}}}, year = {{2016}}, }