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(2017). Evolution of the opening size of nanosphere lithography masks during thermal annealing. Presented at the E-MRS Spring Meeting 2017, Straßburg (France)."},"year":"2017","author":[{"first_name":"Thomas","last_name":"Riedl","id":"36950","full_name":"Riedl, Thomas"},{"first_name":"Vinay","full_name":"Kunnathully, Vinay","last_name":"Kunnathully"},{"first_name":"Jörg","last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg"}],"date_created":"2018-08-21T11:44:47Z","date_updated":"2022-01-06T07:00:05Z","conference":{"end_date":"2017-05-26","location":"Straßburg (France)","name":"E-MRS Spring Meeting 2017","start_date":"2017-05-22"},"title":"Evolution of the opening size of nanosphere lithography masks during thermal annealing","type":"conference","status":"public","series_title":"poster V.14.72","user_id":"55706","department":[{"_id":"286"},{"_id":"15"}],"_id":"3991","language":[{"iso":"eng"}]},{"intvolume":"         9","page":"8371-8377","citation":{"ama":"Rieger T, Riedl T, Neumann E, Grützmacher D, Lindner J, Pawlis A. Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence. <i>ACS Applied Materials &#38; Interfaces</i>. 2017;9(9):8371-8377. doi:<a href=\"https://doi.org/10.1021/acsami.6b15824\">10.1021/acsami.6b15824</a>","chicago":"Rieger, Torsten, Thomas Riedl, Elmar Neumann, Detlev Grützmacher, Jörg Lindner, and Alexander Pawlis. “Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence.” <i>ACS Applied Materials &#38; Interfaces</i> 9, no. 9 (2017): 8371–77. <a href=\"https://doi.org/10.1021/acsami.6b15824\">https://doi.org/10.1021/acsami.6b15824</a>.","ieee":"T. Rieger, T. Riedl, E. Neumann, D. Grützmacher, J. Lindner, and A. Pawlis, “Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence,” <i>ACS Applied Materials &#38; Interfaces</i>, vol. 9, no. 9, pp. 8371–8377, 2017.","apa":"Rieger, T., Riedl, T., Neumann, E., Grützmacher, D., Lindner, J., &#38; Pawlis, A. (2017). Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence. <i>ACS Applied Materials &#38; Interfaces</i>, <i>9</i>(9), 8371–8377. <a href=\"https://doi.org/10.1021/acsami.6b15824\">https://doi.org/10.1021/acsami.6b15824</a>","bibtex":"@article{Rieger_Riedl_Neumann_Grützmacher_Lindner_Pawlis_2017, title={Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence}, volume={9}, DOI={<a href=\"https://doi.org/10.1021/acsami.6b15824\">10.1021/acsami.6b15824</a>}, number={9}, journal={ACS Applied Materials &#38; Interfaces}, publisher={American Chemical Society (ACS)}, author={Rieger, Torsten and Riedl, Thomas and Neumann, Elmar and Grützmacher, Detlev and Lindner, Jörg and Pawlis, Alexander}, year={2017}, pages={8371–8377} }","mla":"Rieger, Torsten, et al. “Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence.” <i>ACS Applied Materials &#38; Interfaces</i>, vol. 9, no. 9, American Chemical Society (ACS), 2017, pp. 8371–77, doi:<a href=\"https://doi.org/10.1021/acsami.6b15824\">10.1021/acsami.6b15824</a>.","short":"T. Rieger, T. Riedl, E. Neumann, D. Grützmacher, J. Lindner, A. Pawlis, ACS Applied Materials &#38; Interfaces 9 (2017) 8371–8377."},"year":"2017","issue":"9","publication_identifier":{"issn":["1944-8244","1944-8252"]},"publication_status":"published","doi":"10.1021/acsami.6b15824","title":"Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence","volume":9,"author":[{"full_name":"Rieger, Torsten","last_name":"Rieger","first_name":"Torsten"},{"first_name":"Thomas","last_name":"Riedl","id":"36950","full_name":"Riedl, Thomas"},{"last_name":"Neumann","full_name":"Neumann, Elmar","first_name":"Elmar"},{"first_name":"Detlev","last_name":"Grützmacher","full_name":"Grützmacher, Detlev"},{"first_name":"Jörg","id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner"},{"full_name":"Pawlis, Alexander","last_name":"Pawlis","first_name":"Alexander"}],"date_created":"2018-08-21T11:45:23Z","publisher":"American Chemical Society (ACS)","date_updated":"2022-01-06T07:00:05Z","status":"public","publication":"ACS Applied Materials & Interfaces","type":"journal_article","department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","_id":"3992"},{"conference":{"location":"Warsaw ( Poland)","end_date":"2017-09-21","start_date":"2017-09-18","name":"E-MRS Fall Meeting 2017"},"title":"Strain effects on the heteroepitaxy of III-V compound semiconductors on nanopatterned surfaces","author":[{"last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg"},{"id":"36950","full_name":"Riedl, Thomas","last_name":"Riedl","first_name":"Thomas"}],"date_created":"2018-08-21T12:06:17Z","date_updated":"2022-01-06T07:00:06Z","citation":{"chicago":"Lindner, Jörg, and Thomas Riedl. “Strain Effects on the Heteroepitaxy of III-V Compound Semiconductors on Nanopatterned Surfaces,” 2017.","ieee":"J. Lindner and T. Riedl, “Strain effects on the heteroepitaxy of III-V compound semiconductors on nanopatterned surfaces,” presented at the E-MRS Fall Meeting 2017, Warsaw ( Poland), 2017.","ama":"Lindner J, Riedl T. Strain effects on the heteroepitaxy of III-V compound semiconductors on nanopatterned surfaces. In: ; 2017.","apa":"Lindner, J., &#38; Riedl, T. (2017). Strain effects on the heteroepitaxy of III-V compound semiconductors on nanopatterned surfaces. Presented at the E-MRS Fall Meeting 2017, Warsaw ( Poland).","mla":"Lindner, Jörg, and Thomas Riedl. <i>Strain Effects on the Heteroepitaxy of III-V Compound Semiconductors on Nanopatterned Surfaces</i>. 2017.","bibtex":"@inproceedings{Lindner_Riedl_2017, title={Strain effects on the heteroepitaxy of III-V compound semiconductors on nanopatterned surfaces}, author={Lindner, Jörg and Riedl, Thomas}, year={2017} }","short":"J. Lindner, T. Riedl, in: 2017."},"year":"2017","language":[{"iso":"eng"}],"department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","_id":"3999","status":"public","type":"conference"},{"status":"public","type":"conference","language":[{"iso":"eng"}],"_id":"4000","department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","year":"2017","citation":{"ama":"Lindner J. Ion Beam Modification of Self-Organized Nanostructures. In: ; 2017.","ieee":"J. Lindner, “Ion Beam Modification of Self-Organized Nanostructures,” presented at the International Workshop on Inelastic Ion-Surface Collisions, Dresden (Germany), 2017.","chicago":"Lindner, Jörg. “Ion Beam Modification of Self-Organized Nanostructures,” 2017.","mla":"Lindner, Jörg. <i>Ion Beam Modification of Self-Organized Nanostructures</i>. 2017.","short":"J. Lindner, in: 2017.","bibtex":"@inproceedings{Lindner_2017, title={Ion Beam Modification of Self-Organized Nanostructures}, author={Lindner, Jörg}, year={2017} }","apa":"Lindner, J. (2017). Ion Beam Modification of Self-Organized Nanostructures. Presented at the International Workshop on Inelastic Ion-Surface Collisions, Dresden (Germany)."},"title":"Ion Beam Modification of Self-Organized Nanostructures","conference":{"end_date":"2017-09-22","location":"Dresden (Germany)","name":"International Workshop on Inelastic Ion-Surface Collisions","start_date":"2017-09-17"},"date_updated":"2022-01-06T07:00:06Z","date_created":"2018-08-21T12:07:53Z","author":[{"full_name":"Lindner, Jörg","id":"20797","last_name":"Lindner","first_name":"Jörg"}]},{"citation":{"apa":"Brassat, K., Keller, A., Grundmeier, G., Bremser, W., Strube, O., &#38; Lindner, J. (2017). Bioinspired material design by hierarchical self-assembly on prepatterned surfaces . Presented at the E-MRS Spring Meeting 2017, Straßbourg (France).","bibtex":"@inproceedings{Brassat_Keller_Grundmeier_Bremser_Strube_Lindner_2017, title={Bioinspired material design by hierarchical self-assembly on prepatterned surfaces }, author={Brassat, Katharina and Keller, A. and Grundmeier, G.  and Bremser, W. and Strube, O. and Lindner, Jörg}, year={2017} }","short":"K. Brassat, A. Keller, G. Grundmeier, W. Bremser, O. Strube, J. Lindner, in: 2017.","mla":"Brassat, Katharina, et al. <i>Bioinspired Material Design by Hierarchical Self-Assembly on Prepatterned Surfaces </i>. 2017.","ama":"Brassat K, Keller A, Grundmeier G, Bremser W, Strube O, Lindner J. Bioinspired material design by hierarchical self-assembly on prepatterned surfaces . In: ; 2017.","chicago":"Brassat, Katharina, A. Keller, G.  Grundmeier, W. Bremser, O. Strube, and Jörg Lindner. “Bioinspired Material Design by Hierarchical Self-Assembly on Prepatterned Surfaces ,” 2017.","ieee":"K. Brassat, A. Keller, G. Grundmeier, W. Bremser, O. Strube, and J. Lindner, “Bioinspired material design by hierarchical self-assembly on prepatterned surfaces ,” presented at the E-MRS Spring Meeting 2017, Straßbourg (France), 2017."},"year":"2017","conference":{"end_date":"2017-05-26","location":"Straßbourg (France)","name":"E-MRS Spring Meeting 2017","start_date":"2017-05-22"},"title":"Bioinspired material design by hierarchical self-assembly on prepatterned surfaces ","author":[{"first_name":"Katharina","id":"11305","full_name":"Brassat, Katharina","last_name":"Brassat"},{"last_name":"Keller","full_name":"Keller, A.","first_name":"A."},{"first_name":"G. ","last_name":"Grundmeier","full_name":"Grundmeier, G. "},{"first_name":"W.","full_name":"Bremser, W.","last_name":"Bremser"},{"first_name":"O.","full_name":"Strube, O.","last_name":"Strube"},{"first_name":"Jörg","id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner"}],"date_created":"2018-08-21T12:10:02Z","date_updated":"2022-01-06T07:00:06Z","status":"public","type":"conference","language":[{"iso":"eng"}],"department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","_id":"4001"},{"status":"public","type":"conference","language":[{"iso":"eng"}],"_id":"4003","user_id":"55706","department":[{"_id":"286"},{"_id":"15"}],"year":"2017","citation":{"mla":"Brassat, Katharina, et al. <i>Regular Surface Nanopatterning with Nanosphere Lithography, Block Copolymer Lithography and Cominations of Both</i>. 2017.","bibtex":"@inproceedings{Brassat_Brodehl_Lindner_2017, title={Regular surface nanopatterning with nanosphere lithography, block copolymer lithography and cominations of both}, author={Brassat, Katharina and Brodehl, Christoph and Lindner, Jörg}, year={2017} }","short":"K. Brassat, C. Brodehl, J. Lindner, in: 2017.","apa":"Brassat, K., Brodehl, C., &#38; Lindner, J. (2017). Regular surface nanopatterning with nanosphere lithography, block copolymer lithography and cominations of both. Presented at the BraMat 2017, Brasov (Romania).","ieee":"K. Brassat, C. Brodehl, and J. Lindner, “Regular surface nanopatterning with nanosphere lithography, block copolymer lithography and cominations of both,” presented at the BraMat 2017, Brasov (Romania), 2017.","chicago":"Brassat, Katharina, Christoph Brodehl, and Jörg Lindner. “Regular Surface Nanopatterning with Nanosphere Lithography, Block Copolymer Lithography and Cominations of Both,” 2017.","ama":"Brassat K, Brodehl C, Lindner J. Regular surface nanopatterning with nanosphere lithography, block copolymer lithography and cominations of both. In: ; 2017."},"title":"Regular surface nanopatterning with nanosphere lithography, block copolymer lithography and cominations of both","conference":{"name":"BraMat 2017","start_date":"2017-03-09","end_date":"2017-03-11","location":"Brasov (Romania)"},"date_updated":"2022-01-06T07:00:06Z","author":[{"first_name":"Katharina","last_name":"Brassat","full_name":"Brassat, Katharina","id":"11305"},{"first_name":"Christoph","id":"30380","full_name":"Brodehl, Christoph","last_name":"Brodehl"},{"id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg"}],"date_created":"2018-08-21T12:13:19Z"},{"type":"journal_article","status":"public","department":[{"_id":"2"},{"_id":"286"},{"_id":"230"},{"_id":"15"},{"_id":"313"}],"user_id":"14931","_id":"3997","file_date_updated":"2018-08-21T12:02:06Z","article_type":"original","has_accepted_license":"1","publication_status":"published","page":"22608-22619","intvolume":"        25","citation":{"ama":"Wahle M, Brassat K, Ebel J, Bürger J, Lindner J, Kitzerow H-S. Two-dimensional switchable blue phase gratings manufactured by nanosphere lithography. <i>Optics Express 25</i>. 2017;25(19):22608-22619. doi:<a href=\"https://doi.org/10.1364/OE.25.022607\">10.1364/OE.25.022607</a>","ieee":"M. Wahle, K. Brassat, J. Ebel, J. Bürger, J. Lindner, and H.-S. Kitzerow, “Two-dimensional switchable blue phase gratings manufactured by nanosphere lithography,” <i>Optics Express 25</i>, vol. 25, no. 19, pp. 22608–22619, 2017, doi: <a href=\"https://doi.org/10.1364/OE.25.022607\">10.1364/OE.25.022607</a>.","chicago":"Wahle, M., Katharina Brassat, J. Ebel, Julius Bürger, Jörg Lindner, and Heinz-Siegfried Kitzerow. “Two-Dimensional Switchable Blue Phase Gratings Manufactured by Nanosphere Lithography.” <i>Optics Express 25</i> 25, no. 19 (2017): 22608–19. <a href=\"https://doi.org/10.1364/OE.25.022607\">https://doi.org/10.1364/OE.25.022607</a>.","bibtex":"@article{Wahle_Brassat_Ebel_Bürger_Lindner_Kitzerow_2017, title={Two-dimensional switchable blue phase gratings manufactured by nanosphere lithography}, volume={25}, DOI={<a href=\"https://doi.org/10.1364/OE.25.022607\">10.1364/OE.25.022607</a>}, number={19}, journal={Optics Express 25}, author={Wahle, M. and Brassat, Katharina and Ebel, J. and Bürger, Julius and Lindner, Jörg and Kitzerow, Heinz-Siegfried}, year={2017}, pages={22608–22619} }","mla":"Wahle, M., et al. “Two-Dimensional Switchable Blue Phase Gratings Manufactured by Nanosphere Lithography.” <i>Optics Express 25</i>, vol. 25, no. 19, 2017, pp. 22608–19, doi:<a href=\"https://doi.org/10.1364/OE.25.022607\">10.1364/OE.25.022607</a>.","short":"M. Wahle, K. Brassat, J. Ebel, J. Bürger, J. Lindner, H.-S. Kitzerow, Optics Express 25 25 (2017) 22608–22619.","apa":"Wahle, M., Brassat, K., Ebel, J., Bürger, J., Lindner, J., &#38; Kitzerow, H.-S. (2017). Two-dimensional switchable blue phase gratings manufactured by nanosphere lithography. <i>Optics Express 25</i>, <i>25</i>(19), 22608–22619. <a href=\"https://doi.org/10.1364/OE.25.022607\">https://doi.org/10.1364/OE.25.022607</a>"},"volume":25,"author":[{"first_name":"M.","last_name":"Wahle","full_name":"Wahle, M."},{"first_name":"Katharina","last_name":"Brassat","full_name":"Brassat, Katharina","id":"11305"},{"last_name":"Ebel","full_name":"Ebel, J.","first_name":"J."},{"first_name":"Julius","id":"46952","full_name":"Bürger, Julius","last_name":"Bürger"},{"last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg"},{"first_name":"Heinz-Siegfried","full_name":"Kitzerow, Heinz-Siegfried","id":"254","last_name":"Kitzerow"}],"date_updated":"2023-01-10T13:16:11Z","doi":"10.1364/OE.25.022607","publication":"Optics Express 25","file":[{"success":1,"relation":"main_file","content_type":"application/pdf","file_size":4327427,"file_id":"3998","file_name":"Two-dimensional switchable blue phase gratings manufactured by nanosphere lithography.pdf","access_level":"closed","date_updated":"2018-08-21T12:02:06Z","date_created":"2018-08-21T12:02:06Z","creator":"hclaudia"}],"abstract":[{"text":"Switchable two dimensional liquid crystal diffraction gratings are promising can-\r\ndidates in beam steering devices, multiplexers and holographic displays. For these areas of applications a high degree of integration in optical systems is much sought-after. In the context of diffraction gratings this means that the angle of diffraction should be rather high, which typically poses a problem as the fabrication of small grating periods is challenging. In this paper, we propose the use of nanosphere lithography (NSL) for the fabrication of two-dimensionally\r\nstructured electrodes with a periodicity of a few micrometers. NSL is based on the self-assembly of micro- or nanometer sized spheres into monolayers. It allows for easy substrate structuring on wafer scale. The manufactured electrode is combined with a liquid crystalline polymer-stabilized blue phase, which facilitates sub-millisecond electrical switching of the diffraction efficiency at adiffractionangle of 21.4°.","lang":"eng"}],"language":[{"iso":"eng"}],"ddc":["530"],"issue":"19","year":"2017","date_created":"2018-08-21T12:04:28Z","title":"Two-dimensional switchable blue phase gratings manufactured by nanosphere lithography"},{"status":"public","type":"conference","language":[{"iso":"eng"}],"user_id":"254","department":[{"_id":"286"},{"_id":"15"},{"_id":"313"},{"_id":"230"}],"_id":"4002","citation":{"ama":"Kitzerow H-S, Lindner J. Plasmonic nanostructures: spectroscopy and electron microscopy. In: ; 2017.","chicago":"Kitzerow, Heinz-Siegfried, and Jörg Lindner. “Plasmonic Nanostructures: Spectroscopy and Electron Microscopy,” 2017.","ieee":"H.-S. Kitzerow and J. Lindner, “Plasmonic nanostructures: spectroscopy and electron microscopy,” presented at the Europhotonics Spring School 2017, Barcelona (Spain), 2017.","mla":"Kitzerow, Heinz-Siegfried, and Jörg Lindner. <i>Plasmonic Nanostructures: Spectroscopy and Electron Microscopy</i>. 2017.","short":"H.-S. Kitzerow, J. Lindner, in: 2017.","bibtex":"@inproceedings{Kitzerow_Lindner_2017, title={Plasmonic nanostructures: spectroscopy and electron microscopy}, author={Kitzerow, Heinz-Siegfried and Lindner, Jörg}, year={2017} }","apa":"Kitzerow, H.-S., &#38; Lindner, J. (2017). <i>Plasmonic nanostructures: spectroscopy and electron microscopy</i>. Europhotonics Spring School 2017, Barcelona (Spain)."},"year":"2017","conference":{"end_date":"2017-03-24","location":"Barcelona (Spain)","name":"Europhotonics Spring School 2017","start_date":"2017-03-21"},"title":"Plasmonic nanostructures: spectroscopy and electron microscopy","date_created":"2018-08-21T12:11:46Z","author":[{"last_name":"Kitzerow","full_name":"Kitzerow, Heinz-Siegfried","id":"254","first_name":"Heinz-Siegfried"},{"full_name":"Lindner, Jörg","id":"20797","last_name":"Lindner","first_name":"Jörg"}],"date_updated":"2023-01-24T17:21:44Z"},{"type":"journal_article","status":"public","_id":"3956","user_id":"55706","department":[{"_id":"286"},{"_id":"15"}],"article_type":"original","file_date_updated":"2018-08-20T13:35:02Z","publication_status":"published","has_accepted_license":"1","publication_identifier":{"issn":["0167-9317"]},"citation":{"chicago":"Meyers, Thorsten, Fábio F. Vidor, Katharina Brassat, Jörg Lindner, and Ulrich Hilleringmann. “Low-Voltage DNTT-Based Thin-Film Transistors and Inverters for Flexible Electronics.” <i>Microelectronic Engineering</i> 174 (2016): 35–39. <a href=\"https://doi.org/10.1016/j.mee.2016.12.018\">https://doi.org/10.1016/j.mee.2016.12.018</a>.","ieee":"T. Meyers, F. F. Vidor, K. Brassat, J. Lindner, and U. Hilleringmann, “Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics,” <i>Microelectronic Engineering</i>, vol. 174, pp. 35–39, 2016.","ama":"Meyers T, Vidor FF, Brassat K, Lindner J, Hilleringmann U. Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics. <i>Microelectronic Engineering</i>. 2016;174:35-39. doi:<a href=\"https://doi.org/10.1016/j.mee.2016.12.018\">10.1016/j.mee.2016.12.018</a>","bibtex":"@article{Meyers_Vidor_Brassat_Lindner_Hilleringmann_2016, title={Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics}, volume={174}, DOI={<a href=\"https://doi.org/10.1016/j.mee.2016.12.018\">10.1016/j.mee.2016.12.018</a>}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Meyers, Thorsten and Vidor, Fábio F. and Brassat, Katharina and Lindner, Jörg and Hilleringmann, Ulrich}, year={2016}, pages={35–39} }","mla":"Meyers, Thorsten, et al. “Low-Voltage DNTT-Based Thin-Film Transistors and Inverters for Flexible Electronics.” <i>Microelectronic Engineering</i>, vol. 174, Elsevier BV, 2016, pp. 35–39, doi:<a href=\"https://doi.org/10.1016/j.mee.2016.12.018\">10.1016/j.mee.2016.12.018</a>.","short":"T. Meyers, F.F. Vidor, K. Brassat, J. Lindner, U. Hilleringmann, Microelectronic Engineering 174 (2016) 35–39.","apa":"Meyers, T., Vidor, F. F., Brassat, K., Lindner, J., &#38; Hilleringmann, U. (2016). Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics. <i>Microelectronic Engineering</i>, <i>174</i>, 35–39. <a href=\"https://doi.org/10.1016/j.mee.2016.12.018\">https://doi.org/10.1016/j.mee.2016.12.018</a>"},"intvolume":"       174","page":"35-39","date_updated":"2022-01-06T07:00:00Z","author":[{"full_name":"Meyers, Thorsten","last_name":"Meyers","first_name":"Thorsten"},{"last_name":"Vidor","full_name":"Vidor, Fábio F.","first_name":"Fábio F."},{"last_name":"Brassat","id":"11305","full_name":"Brassat, Katharina","first_name":"Katharina"},{"last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg"},{"first_name":"Ulrich","full_name":"Hilleringmann, Ulrich","last_name":"Hilleringmann"}],"volume":174,"doi":"10.1016/j.mee.2016.12.018","publication":"Microelectronic Engineering","abstract":[{"text":"In this article we present an integration technique for low-voltage DNTT-based TFTs for flexible electronic applications.\r\nTherefore, a high-k nanocomposite combining the flexibility of its polymericmatrix and the high permittivity\r\nof the incorporated inorganic material was used as gate dielectric layer. The influence of a conventional\r\nphotolithography process upon the dielectric layer is analyzed regarding electrical instabilities in the device characteristics.\r\nThe impact of an implemented sacrificial layer to reduce chemical stress to the insulating film during\r\nphotolithography is evaluated. Furthermore, first inverter circuits were integrated and electrically characterized.\r\nAdditionally, the implementation of this sacrificial layer can be used for future complementary circuit design.","lang":"eng"}],"file":[{"file_name":"Now-voltage DNTT-based thin-film transistors and inverters for flexible electronics.pdf","file_id":"3957","access_level":"closed","file_size":758984,"creator":"hclaudia","date_created":"2018-08-20T13:35:02Z","date_updated":"2018-08-20T13:35:02Z","relation":"main_file","success":1,"content_type":"application/pdf"}],"ddc":["530"],"language":[{"iso":"eng"}],"year":"2016","publisher":"Elsevier BV","date_created":"2018-08-20T13:33:05Z","title":"Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics"},{"language":[{"iso":"eng"}],"user_id":"55706","department":[{"_id":"286"},{"_id":"15"}],"_id":"4004","status":"public","type":"conference","conference":{"end_date":"2016-09-22","location":"Warsaw (Poland)","name":"E-MRS Fall Meeting 2016","start_date":"2016-09-19"},"title":"Enzyme mediated autodeposition of protein particles on nanosphere lithographically nanostructured surfaces ","date_created":"2018-08-21T12:19:28Z","author":[{"first_name":"Katharina","last_name":"Brassat","id":"11305","full_name":"Brassat, Katharina"},{"first_name":"Arne","full_name":"Rüdiger, Arne","last_name":"Rüdiger"},{"full_name":"Bürger, Julius","id":"46952","last_name":"Bürger","first_name":"Julius"},{"first_name":"W.","full_name":"Bremser, W.","last_name":"Bremser"},{"first_name":"Oliver","last_name":"Strube","full_name":"Strube, Oliver"},{"first_name":"Jörg","id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner"}],"date_updated":"2022-01-06T07:00:06Z","citation":{"apa":"Brassat, K., Rüdiger, A., Bürger, J., Bremser, W., Strube, O., &#38; Lindner, J. (2016). Enzyme mediated autodeposition of protein particles on nanosphere lithographically nanostructured surfaces . Presented at the E-MRS Fall Meeting 2016, Warsaw (Poland).","bibtex":"@inproceedings{Brassat_Rüdiger_Bürger_Bremser_Strube_Lindner_2016, title={Enzyme mediated autodeposition of protein particles on nanosphere lithographically nanostructured surfaces }, author={Brassat, Katharina and Rüdiger, Arne and Bürger, Julius and Bremser, W. and Strube, Oliver and Lindner, Jörg}, year={2016} }","short":"K. Brassat, A. Rüdiger, J. Bürger, W. Bremser, O. Strube, J. Lindner, in: 2016.","mla":"Brassat, Katharina, et al. <i>Enzyme Mediated Autodeposition of Protein Particles on Nanosphere Lithographically Nanostructured Surfaces </i>. 2016.","chicago":"Brassat, Katharina, Arne Rüdiger, Julius Bürger, W. Bremser, Oliver Strube, and Jörg Lindner. “Enzyme Mediated Autodeposition of Protein Particles on Nanosphere Lithographically Nanostructured Surfaces ,” 2016.","ieee":"K. Brassat, A. Rüdiger, J. Bürger, W. Bremser, O. Strube, and J. Lindner, “Enzyme mediated autodeposition of protein particles on nanosphere lithographically nanostructured surfaces ,” presented at the E-MRS Fall Meeting 2016, Warsaw (Poland), 2016.","ama":"Brassat K, Rüdiger A, Bürger J, Bremser W, Strube O, Lindner J. Enzyme mediated autodeposition of protein particles on nanosphere lithographically nanostructured surfaces . In: ; 2016."},"year":"2016"},{"conference":{"start_date":"2016-09-19","name":"E-MRS Fall Meeting 2016","location":"Warsaw (Poland)","end_date":"2016-09-22"},"title":"Arrangement of perovskitic semiconductor nanoparticles using soft lithography ","date_created":"2018-08-21T12:21:43Z","author":[{"first_name":"Katharina","full_name":"Brassat, Katharina","id":"11305","last_name":"Brassat"},{"first_name":"Julius","last_name":"Bürger","full_name":"Bürger, Julius","id":"46952"},{"first_name":"Melanie ","full_name":"Reinecke, Melanie ","last_name":"Reinecke"},{"last_name":"Briese","full_name":"Briese, Dennis","first_name":"Dennis"},{"full_name":"Duschik, K.","last_name":"Duschik","first_name":"K."},{"first_name":"Mirko","last_name":"Schaper","full_name":"Schaper, Mirko"},{"last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797","first_name":"Jörg"}],"date_updated":"2022-01-06T07:00:06Z","citation":{"apa":"Brassat, K., Bürger, J., Reinecke, M., Briese, D., Duschik, K., Schaper, M., &#38; Lindner, J. (2016). Arrangement of perovskitic semiconductor nanoparticles using soft lithography . Presented at the E-MRS Fall Meeting 2016, Warsaw (Poland).","bibtex":"@inproceedings{Brassat_Bürger_Reinecke_Briese_Duschik_Schaper_Lindner_2016, title={Arrangement of perovskitic semiconductor nanoparticles using soft lithography }, author={Brassat, Katharina and Bürger, Julius and Reinecke, Melanie  and Briese, Dennis and Duschik, K. and Schaper, Mirko and Lindner, Jörg}, year={2016} }","short":"K. Brassat, J. Bürger, M. Reinecke, D. Briese, K. Duschik, M. Schaper, J. Lindner, in: 2016.","mla":"Brassat, Katharina, et al. <i>Arrangement of Perovskitic Semiconductor Nanoparticles Using Soft Lithography </i>. 2016.","ieee":"K. Brassat <i>et al.</i>, “Arrangement of perovskitic semiconductor nanoparticles using soft lithography ,” presented at the E-MRS Fall Meeting 2016, Warsaw (Poland), 2016.","chicago":"Brassat, Katharina, Julius Bürger, Melanie  Reinecke, Dennis Briese, K. Duschik, Mirko Schaper, and Jörg Lindner. “Arrangement of Perovskitic Semiconductor Nanoparticles Using Soft Lithography ,” 2016.","ama":"Brassat K, Bürger J, Reinecke M, et al. Arrangement of perovskitic semiconductor nanoparticles using soft lithography . In: ; 2016."},"year":"2016","language":[{"iso":"eng"}],"department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","_id":"4005","status":"public","type":"conference"},{"citation":{"mla":"Brassat, Katharina, et al. <i>Site-Selective Protein Immobilization on Regular Antidot Patterns Fabricated by Nanosphere Lithography </i>. 2016.","short":"K. Brassat, A. Rüdiger, J. Bürger, W. Bremser, O. Strube, J. Lindner, in: 2016.","bibtex":"@inproceedings{Brassat_Rüdiger_Bürger_Bremser_Strube_Lindner_2016, title={Site-selective protein immobilization on regular antidot patterns fabricated by nanosphere lithography }, author={Brassat, Katharina and Rüdiger, Arne and Bürger, Julius and Bremser, W.  and Strube, O. and Lindner, Jörg}, year={2016} }","apa":"Brassat, K., Rüdiger, A., Bürger, J., Bremser, W., Strube, O., &#38; Lindner, J. (2016). Site-selective protein immobilization on regular antidot patterns fabricated by nanosphere lithography . Presented at the E-MRS Fall Meeting 2016, Warsaw (Poland).","ieee":"K. Brassat, A. Rüdiger, J. Bürger, W. Bremser, O. Strube, and J. Lindner, “Site-selective protein immobilization on regular antidot patterns fabricated by nanosphere lithography ,” presented at the E-MRS Fall Meeting 2016, Warsaw (Poland), 2016.","chicago":"Brassat, Katharina, Arne Rüdiger, Julius Bürger, W.  Bremser, O. Strube, and Jörg Lindner. “Site-Selective Protein Immobilization on Regular Antidot Patterns Fabricated by Nanosphere Lithography ,” 2016.","ama":"Brassat K, Rüdiger A, Bürger J, Bremser W, Strube O, Lindner J. Site-selective protein immobilization on regular antidot patterns fabricated by nanosphere lithography . In: ; 2016."},"year":"2016","author":[{"first_name":"Katharina","full_name":"Brassat, Katharina","id":"11305","last_name":"Brassat"},{"first_name":"Arne","last_name":"Rüdiger","full_name":"Rüdiger, Arne"},{"first_name":"Julius","full_name":"Bürger, Julius","id":"46952","last_name":"Bürger"},{"last_name":"Bremser","full_name":"Bremser, W. ","first_name":"W. "},{"first_name":"O.","full_name":"Strube, O.","last_name":"Strube"},{"id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg"}],"date_created":"2018-08-21T12:23:38Z","date_updated":"2022-01-06T07:00:06Z","conference":{"name":"E-MRS Fall Meeting 2016","start_date":"2016-09-19","end_date":"2016-09-22","location":"Warsaw (Poland)"},"title":"Site-selective protein immobilization on regular antidot patterns fabricated by nanosphere lithography ","type":"conference","status":"public","department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","_id":"4006"},{"language":[{"iso":"eng"}],"user_id":"55706","department":[{"_id":"286"},{"_id":"15"}],"_id":"4007","status":"public","type":"conference","conference":{"start_date":"2016-09-19","name":"E-MRS Fall Meeting 2016","location":"Warsaw (Poland)","end_date":"2016-09-22"},"title":"Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography ","author":[{"first_name":"Katharina","full_name":"Brassat, Katharina","id":"11305","last_name":"Brassat"},{"first_name":"Daniel","last_name":"Kool","full_name":"Kool, Daniel","id":"44586"},{"last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg"}],"date_created":"2018-08-21T12:25:04Z","date_updated":"2022-01-06T07:00:06Z","citation":{"ieee":"K. Brassat, D. Kool, and J. Lindner, “Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography ,” presented at the E-MRS Fall Meeting 2016, Warsaw (Poland), 2016.","chicago":"Brassat, Katharina, Daniel Kool, and Jörg Lindner. “Hierarchically Ordered Nanopore Structures Formed by Combined Nanosphere and Block Copolymer Lithography ,” 2016.","ama":"Brassat K, Kool D, Lindner J. Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography . In: ; 2016.","short":"K. Brassat, D. Kool, J. Lindner, in: 2016.","bibtex":"@inproceedings{Brassat_Kool_Lindner_2016, title={Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography }, author={Brassat, Katharina and Kool, Daniel and Lindner, Jörg}, year={2016} }","mla":"Brassat, Katharina, et al. <i>Hierarchically Ordered Nanopore Structures Formed by Combined Nanosphere and Block Copolymer Lithography </i>. 2016.","apa":"Brassat, K., Kool, D., &#38; Lindner, J. (2016). Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography . Presented at the E-MRS Fall Meeting 2016, Warsaw (Poland)."},"year":"2016"},{"title":"Sub-20 nm surface patterning by block copolymer lithography ","conference":{"location":"Porquerolles (France)","end_date":"2016-04-01","start_date":"2016-03-30","name":"Europhotonics Spring School 2016"},"date_updated":"2022-01-06T07:00:06Z","date_created":"2018-08-21T12:26:13Z","author":[{"first_name":"Katharina","last_name":"Brassat","full_name":"Brassat, Katharina","id":"11305"},{"id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg"}],"year":"2016","citation":{"ama":"Brassat K, Lindner J. Sub-20 nm surface patterning by block copolymer lithography . In: ; 2016.","chicago":"Brassat, Katharina, and Jörg Lindner. “Sub-20 Nm Surface Patterning by Block Copolymer Lithography ,” 2016.","ieee":"K. Brassat and J. Lindner, “Sub-20 nm surface patterning by block copolymer lithography ,” presented at the Europhotonics Spring School 2016, Porquerolles (France), 2016.","apa":"Brassat, K., &#38; Lindner, J. (2016). Sub-20 nm surface patterning by block copolymer lithography . Presented at the Europhotonics Spring School 2016, Porquerolles (France).","mla":"Brassat, Katharina, and Jörg Lindner. <i>Sub-20 Nm Surface Patterning by Block Copolymer Lithography </i>. 2016.","short":"K. Brassat, J. Lindner, in: 2016.","bibtex":"@inproceedings{Brassat_Lindner_2016, title={Sub-20 nm surface patterning by block copolymer lithography }, author={Brassat, Katharina and Lindner, Jörg}, year={2016} }"},"language":[{"iso":"eng"}],"_id":"4008","department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","status":"public","type":"conference"},{"status":"public","type":"conference","language":[{"iso":"eng"}],"department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","series_title":"contributed talk DD 12.3","_id":"4009","citation":{"chicago":"Brodehl, Christoph, Siegmund Greulich-Weber, and Jörg Lindner. “Fabricating Metasurface-Based Optical Devices with a Low-Cost Technique.” Contributed Talk DD 12.3, 2016.","ieee":"C. Brodehl, S. Greulich-Weber, and J. Lindner, “Fabricating metasurface-based optical devices with a low-cost technique.” 2016.","ama":"Brodehl C, Greulich-Weber S, Lindner J. Fabricating metasurface-based optical devices with a low-cost technique. 2016.","mla":"Brodehl, Christoph, et al. <i>Fabricating Metasurface-Based Optical Devices with a Low-Cost Technique</i>. 2016.","bibtex":"@article{Brodehl_Greulich-Weber_Lindner_2016, series={contributed talk DD 12.3}, title={Fabricating metasurface-based optical devices with a low-cost technique}, author={Brodehl, Christoph and Greulich-Weber, Siegmund and Lindner, Jörg}, year={2016}, collection={contributed talk DD 12.3} }","short":"C. Brodehl, S. Greulich-Weber, J. Lindner, (2016).","apa":"Brodehl, C., Greulich-Weber, S., &#38; Lindner, J. (2016). Fabricating metasurface-based optical devices with a low-cost technique. Presented at the E-MRS Spring Meeting 2016, Lille (France)."},"year":"2016","conference":{"end_date":"2016-05-06","location":"Lille (France)","name":"E-MRS Spring Meeting 2016","start_date":"2016-05-02"},"title":"Fabricating metasurface-based optical devices with a low-cost technique","date_created":"2018-08-21T12:30:03Z","author":[{"last_name":"Brodehl","full_name":"Brodehl, Christoph","id":"30380","first_name":"Christoph"},{"full_name":"Greulich-Weber, Siegmund","last_name":"Greulich-Weber","first_name":"Siegmund"},{"last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg"}],"date_updated":"2022-01-06T07:00:06Z"},{"user_id":"55706","department":[{"_id":"286"},{"_id":"15"}],"_id":"4010","language":[{"iso":"eng"}],"type":"conference","status":"public","date_created":"2018-08-21T12:32:13Z","author":[{"first_name":"R.A.","last_name":"Puglisi","full_name":"Puglisi, R.A."},{"first_name":"C. ","last_name":"Bongiorno","full_name":"Bongiorno, C. "},{"last_name":"Brassat","id":"11305","full_name":"Brassat, Katharina","first_name":"Katharina"},{"full_name":"Garozzo, Christina","last_name":"Garozzo","first_name":"Christina"},{"last_name":"La Magna","full_name":"La Magna, A. ","first_name":"A. "},{"last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797","first_name":"Jörg"}],"date_updated":"2022-01-06T07:00:07Z","conference":{"location":"Warsaw (Poland)","end_date":"2016-09-22","start_date":"2016-09-19","name":"E-MRS Fall Meeting 2016"},"title":"High-resolution TEM and STEM-EELS studies of colloidal Au nanoparticles self-assembled in nanometric SiO2 nanopore arrays fabricated by block-copolymer lithography ","citation":{"ama":"Puglisi RA, Bongiorno C, Brassat K, Garozzo C, La Magna A, Lindner J. High-resolution TEM and STEM-EELS studies of colloidal Au nanoparticles self-assembled in nanometric SiO2 nanopore arrays fabricated by block-copolymer lithography . In: ; 2016.","ieee":"R. A. Puglisi, C. Bongiorno, K. Brassat, C. Garozzo, A. La Magna, and J. Lindner, “High-resolution TEM and STEM-EELS studies of colloidal Au nanoparticles self-assembled in nanometric SiO2 nanopore arrays fabricated by block-copolymer lithography ,” presented at the E-MRS Fall Meeting 2016, Warsaw (Poland), 2016.","chicago":"Puglisi, R.A., C.  Bongiorno, Katharina Brassat, Christina Garozzo, A.  La Magna, and Jörg Lindner. “High-Resolution TEM and STEM-EELS Studies of Colloidal Au Nanoparticles Self-Assembled in Nanometric SiO2 Nanopore Arrays Fabricated by Block-Copolymer Lithography ,” 2016.","short":"R.A. Puglisi, C. Bongiorno, K. Brassat, C. Garozzo, A. La Magna, J. Lindner, in: 2016.","mla":"Puglisi, R. A., et al. <i>High-Resolution TEM and STEM-EELS Studies of Colloidal Au Nanoparticles Self-Assembled in Nanometric SiO2 Nanopore Arrays Fabricated by Block-Copolymer Lithography </i>. 2016.","bibtex":"@inproceedings{Puglisi_Bongiorno_Brassat_Garozzo_La Magna_Lindner_2016, title={High-resolution TEM and STEM-EELS studies of colloidal Au nanoparticles self-assembled in nanometric SiO2 nanopore arrays fabricated by block-copolymer lithography }, author={Puglisi, R.A. and Bongiorno, C.  and Brassat, Katharina and Garozzo, Christina and La Magna, A.  and Lindner, Jörg}, year={2016} }","apa":"Puglisi, R. A., Bongiorno, C., Brassat, K., Garozzo, C., La Magna, A., &#38; Lindner, J. (2016). High-resolution TEM and STEM-EELS studies of colloidal Au nanoparticles self-assembled in nanometric SiO2 nanopore arrays fabricated by block-copolymer lithography . Presented at the E-MRS Fall Meeting 2016, Warsaw (Poland)."},"year":"2016"},{"language":[{"iso":"eng"}],"_id":"4011","series_title":"contributed talk E.13.5","user_id":"55706","department":[{"_id":"286"}],"status":"public","type":"conference","title":"Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins ","conference":{"location":"Warsaw (Poland)","end_date":"2016-09-22","start_date":"2016-09-19","name":"E-MRS Fall Meeting 2016"},"date_updated":"2022-01-06T07:00:07Z","date_created":"2018-08-21T12:33:59Z","author":[{"first_name":"Thomas","full_name":"Riedl, Thomas","id":"36950","last_name":"Riedl"},{"first_name":"Jörg","last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg"}],"year":"2016","citation":{"apa":"Riedl, T., &#38; Lindner, J. (2016). Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins . Presented at the E-MRS Fall Meeting 2016, Warsaw (Poland).","bibtex":"@article{Riedl_Lindner_2016, series={contributed talk E.13.5}, title={Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins }, author={Riedl, Thomas and Lindner, Jörg}, year={2016}, collection={contributed talk E.13.5} }","mla":"Riedl, Thomas, and Jörg Lindner. <i>Automated SEM Image Analysis of the Opening Size Distribution of Nanosphere Lithography Masks and Their Origins </i>. 2016.","short":"T. Riedl, J. Lindner, (2016).","ama":"Riedl T, Lindner J. Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins . 2016.","ieee":"T. Riedl and J. Lindner, “Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins .” 2016.","chicago":"Riedl, Thomas, and Jörg Lindner. “Automated SEM Image Analysis of the Opening Size Distribution of Nanosphere Lithography Masks and Their Origins .” Contributed Talk E.13.5, 2016."}},{"type":"conference","status":"public","department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","series_title":"contributed talk DS 36.7","_id":"4012","language":[{"iso":"eng"}],"citation":{"chicago":"Riedl, Thomas, and Jörg Lindner. “Theoretical Analysis of Strain and Misfit Dislocation Stability in Axial-Heteroepitaxial GaAs/InAs Nanopillars.” Contributed Talk DS 36.7, 2016.","ieee":"T. Riedl and J. Lindner, “Theoretical analysis of strain and misfit dislocation stability in axial-heteroepitaxial GaAs/InAs nanopillars.” 2016.","ama":"Riedl T, Lindner J. Theoretical analysis of strain and misfit dislocation stability in axial-heteroepitaxial GaAs/InAs nanopillars. 2016.","mla":"Riedl, Thomas, and Jörg Lindner. <i>Theoretical Analysis of Strain and Misfit Dislocation Stability in Axial-Heteroepitaxial GaAs/InAs Nanopillars</i>. 2016.","bibtex":"@article{Riedl_Lindner_2016, series={contributed talk DS 36.7}, title={Theoretical analysis of strain and misfit dislocation stability in axial-heteroepitaxial GaAs/InAs nanopillars}, author={Riedl, Thomas and Lindner, Jörg}, year={2016}, collection={contributed talk DS 36.7} }","short":"T. Riedl, J. Lindner, (2016).","apa":"Riedl, T., &#38; Lindner, J. (2016). Theoretical analysis of strain and misfit dislocation stability in axial-heteroepitaxial GaAs/InAs nanopillars. Presented at the DPG Spring Meeting 2016, Regensburg (Germany)."},"year":"2016","author":[{"first_name":"Thomas","id":"36950","full_name":"Riedl, Thomas","last_name":"Riedl"},{"id":"20797","full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg"}],"date_created":"2018-08-21T12:35:39Z","date_updated":"2022-01-06T07:00:07Z","conference":{"end_date":"2016-03-11","location":"Regensburg (Germany)","name":"DPG Spring Meeting 2016","start_date":"2016-03-06"},"title":"Theoretical analysis of strain and misfit dislocation stability in axial-heteroepitaxial GaAs/InAs nanopillars"},{"author":[{"first_name":"Thomas","id":"36950","full_name":"Riedl, Thomas","last_name":"Riedl"},{"last_name":"Kemper","full_name":"Kemper, R.M.","first_name":"R.M."},{"first_name":"Donald","last_name":"As","full_name":"As, Donald"},{"last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg"}],"date_created":"2018-08-21T12:40:44Z","date_updated":"2022-01-06T07:00:07Z","conference":{"start_date":"2016-03-06","name":"DPG Spring Meeting 2016","location":"Regensburg","end_date":"2016-03-11"},"title":"Stability of misfit dislocations in axial-heteroepitaxial 3CSiC/c-GaN nanopillars and nanomesas","citation":{"ama":"Riedl T, Kemper RM, As D, Lindner J. Stability of misfit dislocations in axial-heteroepitaxial 3CSiC/c-GaN nanopillars and nanomesas. 2016.","chicago":"Riedl, Thomas, R.M. Kemper, Donald As, and Jörg Lindner. “Stability of Misfit Dislocations in Axial-Heteroepitaxial 3CSiC/c-GaN Nanopillars and Nanomesas.” Poster DS 53.3, 2016.","ieee":"T. Riedl, R. M. Kemper, D. As, and J. Lindner, “Stability of misfit dislocations in axial-heteroepitaxial 3CSiC/c-GaN nanopillars and nanomesas.” 2016.","bibtex":"@article{Riedl_Kemper_As_Lindner_2016, series={poster DS 53.3}, title={Stability of misfit dislocations in axial-heteroepitaxial 3CSiC/c-GaN nanopillars and nanomesas}, author={Riedl, Thomas and Kemper, R.M. and As, Donald and Lindner, Jörg}, year={2016}, collection={poster DS 53.3} }","short":"T. Riedl, R.M. Kemper, D. As, J. Lindner, (2016).","mla":"Riedl, Thomas, et al. <i>Stability of Misfit Dislocations in Axial-Heteroepitaxial 3CSiC/c-GaN Nanopillars and Nanomesas</i>. 2016.","apa":"Riedl, T., Kemper, R. M., As, D., &#38; Lindner, J. (2016). Stability of misfit dislocations in axial-heteroepitaxial 3CSiC/c-GaN nanopillars and nanomesas. Presented at the DPG Spring Meeting 2016, Regensburg."},"year":"2016","user_id":"55706","series_title":"poster DS 53.3","department":[{"_id":"286"},{"_id":"15"}],"_id":"4013","language":[{"iso":"eng"}],"type":"conference","status":"public"},{"author":[{"last_name":"Rieger","full_name":"Rieger, T.","first_name":"T."},{"first_name":"Thomas","full_name":"Riedl, Thomas","id":"36950","last_name":"Riedl"},{"last_name":"Lindner","id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg"},{"first_name":"A.","full_name":"Pawlis, A.","last_name":"Pawlis"}],"date_created":"2018-08-21T12:42:48Z","date_updated":"2022-01-06T07:00:07Z","conference":{"end_date":"2016-09-09","location":"Montpellier (France)","name":"19th International Conference on Molecular Beam Epitaxy","start_date":"2016-09-05"},"title":"Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique","citation":{"apa":"Rieger, T., Riedl, T., Lindner, J., &#38; Pawlis, A. (2016). Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique. Presented at the 19th International Conference on Molecular Beam Epitaxy, Montpellier (France).","short":"T. Rieger, T. Riedl, J. Lindner, A. Pawlis, (2016).","bibtex":"@article{Rieger_Riedl_Lindner_Pawlis_2016, series={poster Mo-P-8}, title={Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique}, author={Rieger, T. and Riedl, Thomas and Lindner, Jörg and Pawlis, A.}, year={2016}, collection={poster Mo-P-8} }","mla":"Rieger, T., et al. <i>Enhancement of the Critical Thickness of CdSe/ZnSe Quantum Wells via the Strain Compensation Technique</i>. 2016.","ieee":"T. Rieger, T. Riedl, J. Lindner, and A. Pawlis, “Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique.” 2016.","chicago":"Rieger, T., Thomas Riedl, Jörg Lindner, and A. Pawlis. “Enhancement of the Critical Thickness of CdSe/ZnSe Quantum Wells via the Strain Compensation Technique.” Poster Mo-P-8, 2016.","ama":"Rieger T, Riedl T, Lindner J, Pawlis A. Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique. 2016."},"year":"2016","department":[{"_id":"286"},{"_id":"15"}],"user_id":"55706","series_title":"poster Mo-P-8","_id":"4014","language":[{"iso":"eng"}],"type":"conference","status":"public"}]