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(2004). Thermal annealing of junctions with amorphous and polycrystalline ferromagnetic electrodes. <i>Journal of Applied Physics</i>, <i>96</i>(11), 6382–6386. <a href=\"https://doi.org/10.1063/1.1808899\">https://doi.org/10.1063/1.1808899</a>","mla":"Dimopoulos, T., et al. “Thermal Annealing of Junctions with Amorphous and Polycrystalline Ferromagnetic Electrodes.” <i>Journal of Applied Physics</i>, vol. 96, no. 11, AIP Publishing, 2004, pp. 6382–86, doi:<a href=\"https://doi.org/10.1063/1.1808899\">10.1063/1.1808899</a>.","short":"T. Dimopoulos, G. Gieres, J. Wecker, N. Wiese, M. Sacher, Journal of Applied Physics 96 (2004) 6382–6386.","bibtex":"@article{Dimopoulos_Gieres_Wecker_Wiese_Sacher_2004, title={Thermal annealing of junctions with amorphous and polycrystalline ferromagnetic electrodes}, volume={96}, DOI={<a href=\"https://doi.org/10.1063/1.1808899\">10.1063/1.1808899</a>}, number={11}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Dimopoulos, T. and Gieres, G. and Wecker, J. and Wiese, N. and Sacher, Marc}, year={2004}, pages={6382–6386} }","ama":"Dimopoulos T, Gieres G, Wecker J, Wiese N, Sacher M. Thermal annealing of junctions with amorphous and polycrystalline ferromagnetic electrodes. <i>Journal of Applied Physics</i>. 2004;96(11):6382-6386. doi:<a href=\"https://doi.org/10.1063/1.1808899\">10.1063/1.1808899</a>","ieee":"T. Dimopoulos, G. Gieres, J. Wecker, N. Wiese, and M. Sacher, “Thermal annealing of junctions with amorphous and polycrystalline ferromagnetic electrodes,” <i>Journal of Applied Physics</i>, vol. 96, no. 11, pp. 6382–6386, 2004, doi: <a href=\"https://doi.org/10.1063/1.1808899\">10.1063/1.1808899</a>.","chicago":"Dimopoulos, T., G. Gieres, J. Wecker, N. Wiese, and Marc Sacher. “Thermal Annealing of Junctions with Amorphous and Polycrystalline Ferromagnetic Electrodes.” <i>Journal of Applied Physics</i> 96, no. 11 (2004): 6382–86. <a href=\"https://doi.org/10.1063/1.1808899\">https://doi.org/10.1063/1.1808899</a>."},"intvolume":"        96","page":"6382-6386","publication_status":"published","publication_identifier":{"issn":["0021-8979","1089-7550"]},"user_id":"26883","department":[{"_id":"15"}],"_id":"29692","status":"public","type":"journal_article"},{"status":"public","type":"journal_article","extern":"1","article_number":"2120","user_id":"26883","department":[{"_id":"15"}],"_id":"29694","citation":{"mla":"Thomas, A., et al. “Aluminum Oxidation by a Remote Electron Cyclotron Resonance Plasma in Magnetic Tunnel Junctions.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 21, no. 5, 2120, American Vacuum Society, 2003, doi:<a href=\"https://doi.org/10.1116/1.1609480\">10.1116/1.1609480</a>.","short":"A. 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