Correlation between atmospheric DBD plasma-induced surface chemical changes on a ZnMgAl alloy coating and the resulting adhesive properties.
","lang":"eng"}],"type":"journal_article","publication":"RSC Advances","doi":"10.1039/c9ra07378g","title":"Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma","author":[{"first_name":"Steffen","full_name":"Knust, Steffen","last_name":"Knust"},{"last_name":"Kuhlmann","full_name":"Kuhlmann, Andreas","first_name":"Andreas"},{"first_name":"Maria Teresa","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro"},{"first_name":"Guido","last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido"}],"date_created":"2021-07-07T08:45:19Z","date_updated":"2023-01-24T08:34:36Z","citation":{"bibtex":"@article{Knust_Kuhlmann_de los Arcos de Pedro_Grundmeier_2019, title={Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma}, DOI={10.1039/c9ra07378g}, journal={RSC Advances}, author={Knust, Steffen and Kuhlmann, Andreas and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2019}, pages={35077–35088} }","short":"S. Knust, A. Kuhlmann, M.T. de los Arcos de Pedro, G. Grundmeier, RSC Advances (2019) 35077–35088.","mla":"Knust, Steffen, et al. “Surface Modification of ZnMgAl-Coated Steel by Dielectric-Barrier Discharge Plasma.” RSC Advances, 2019, pp. 35077–88, doi:10.1039/c9ra07378g.","apa":"Knust, S., Kuhlmann, A., de los Arcos de Pedro, M. T., & Grundmeier, G. (2019). Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma. RSC Advances, 35077–35088. https://doi.org/10.1039/c9ra07378g","ieee":"S. Knust, A. Kuhlmann, M. T. de los Arcos de Pedro, and G. Grundmeier, “Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma,” RSC Advances, pp. 35077–35088, 2019, doi: 10.1039/c9ra07378g.","chicago":"Knust, Steffen, Andreas Kuhlmann, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Surface Modification of ZnMgAl-Coated Steel by Dielectric-Barrier Discharge Plasma.” RSC Advances, 2019, 35077–88. https://doi.org/10.1039/c9ra07378g.","ama":"Knust S, Kuhlmann A, de los Arcos de Pedro MT, Grundmeier G. Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma. RSC Advances. Published online 2019:35077-35088. doi:10.1039/c9ra07378g"},"page":"35077-35088","year":"2019","publication_status":"published","publication_identifier":{"issn":["2046-2069"]}},{"_id":"22541","user_id":"54863","department":[{"_id":"302"}],"language":[{"iso":"eng"}],"type":"journal_article","publication":"Applied Surface Science","abstract":[{"lang":"eng","text":"Monodisperse micron-sized silica particle monolayers deposited onto plasma-grown SiOx-ultra-thin films have been used as reference systems to investigate wetting, water adsorption and capillary bridge formation as a function of silica surface functionalization. 1H,1H, 2H,2H perfluorooctyltriethoxysil (FOTS) monolayers, have been deposited on the respective surfaces by means of chemical vapor deposition resulting in macroscopically low energy surfaces. X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) reflection absorption spectroscopy confirmed the monolayer formation. Water adsorption isotherms were studied by a combination of in-situ FTIR reflection spectroscopy and quartz crystal microbalance (QCM) while macroscopic wetting was analysed by contact angle measurements. The comparative data evaluation indicates that the macroscopic wetting behaviour was changed as expected, however, that water nanodroplets formed both at intrinsic defects of the FOTS monolayer and at the FOTS/SiOx interface. Capillary bridges of liquid water are dominantly formed in the confined particle contact areas and between surface asperities on the particles. The comparison of wetting, adsorption and capillary bridge formation shows that the hydrophobization of porous materials by organosilane monolayers leads to the formation of morphology dependent nanoscopic defects that act as sites for preferential capillary bridge formation."}],"status":"public","date_updated":"2023-07-12T07:58:00Z","author":[{"full_name":"Giner, Ignacio","last_name":"Giner","first_name":"Ignacio"},{"full_name":"Torun, Boray","last_name":"Torun","first_name":"Boray"},{"last_name":"Han","full_name":"Han, Yan","first_name":"Yan"},{"last_name":"Duderija","id":"54863","full_name":"Duderija, Belma","first_name":"Belma"},{"first_name":"Dennis","last_name":"Meinderink","full_name":"Meinderink, Dennis"},{"first_name":"Alejandro González","full_name":"Orive, Alejandro González","last_name":"Orive"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"last_name":"Weinberger","full_name":"Weinberger, Christian","first_name":"Christian"},{"first_name":"Michael","full_name":"Tiemann, Michael","id":"23547","last_name":"Tiemann","orcid":"0000-0003-1711-2722"},{"full_name":"Schmid, Hans-Joachim","id":"464","orcid":"000-0001-8590-1921","last_name":"Schmid","first_name":"Hans-Joachim"},{"first_name":"Guido","id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier"}],"date_created":"2021-07-07T08:40:38Z","title":"Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers","doi":"10.1016/j.apsusc.2018.12.221","publication_status":"published","publication_identifier":{"issn":["0169-4332"]},"year":"2019","citation":{"short":"I. Giner, B. Torun, Y. Han, B. Duderija, D. Meinderink, A.G. Orive, M.T. de los Arcos de Pedro, C. Weinberger, M. Tiemann, H.-J. Schmid, G. Grundmeier, Applied Surface Science (2019) 873–879.","mla":"Giner, Ignacio, et al. “Water Adsorption and Capillary Bridge Formation on Silica Micro-Particle Layers Modified with Perfluorinated Organosilane Monolayers.” Applied Surface Science, 2019, pp. 873–79, doi:10.1016/j.apsusc.2018.12.221.","bibtex":"@article{Giner_Torun_Han_Duderija_Meinderink_Orive_de los Arcos de Pedro_Weinberger_Tiemann_Schmid_et al._2019, title={Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers}, DOI={10.1016/j.apsusc.2018.12.221}, journal={Applied Surface Science}, author={Giner, Ignacio and Torun, Boray and Han, Yan and Duderija, Belma and Meinderink, Dennis and Orive, Alejandro González and de los Arcos de Pedro, Maria Teresa and Weinberger, Christian and Tiemann, Michael and Schmid, Hans-Joachim and et al.}, year={2019}, pages={873–879} }","ama":"Giner I, Torun B, Han Y, et al. Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers. Applied Surface Science. Published online 2019:873-879. doi:10.1016/j.apsusc.2018.12.221","apa":"Giner, I., Torun, B., Han, Y., Duderija, B., Meinderink, D., Orive, A. G., de los Arcos de Pedro, M. T., Weinberger, C., Tiemann, M., Schmid, H.-J., & Grundmeier, G. (2019). Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers. Applied Surface Science, 873–879. https://doi.org/10.1016/j.apsusc.2018.12.221","ieee":"I. Giner et al., “Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers,” Applied Surface Science, pp. 873–879, 2019, doi: 10.1016/j.apsusc.2018.12.221.","chicago":"Giner, Ignacio, Boray Torun, Yan Han, Belma Duderija, Dennis Meinderink, Alejandro González Orive, Maria Teresa de los Arcos de Pedro, et al. “Water Adsorption and Capillary Bridge Formation on Silica Micro-Particle Layers Modified with Perfluorinated Organosilane Monolayers.” Applied Surface Science, 2019, 873–79. https://doi.org/10.1016/j.apsusc.2018.12.221."},"page":"873-879"},{"publication_identifier":{"issn":["1559-128X","2155-3165"]},"publication_status":"published","year":"2018","citation":{"ama":"Wu X, Muntzeck M, de los Arcos de Pedro MT, Grundmeier G, Wilhelm R, Wagner T. Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids. Applied Optics. Published online 2018. doi:10.1364/ao.57.009215","ieee":"X. Wu, M. Muntzeck, M. T. de los Arcos de Pedro, G. Grundmeier, R. Wilhelm, and T. Wagner, “Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids,” Applied Optics, Art. no. 9215, 2018, doi: 10.1364/ao.57.009215.","chicago":"Wu, Xia, Maren Muntzeck, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, René Wilhelm, and Thorsten Wagner. “Determination of the Refractive Indices of Ionic Liquids by Ellipsometry, and Their Application as Immersion Liquids.” Applied Optics, 2018. https://doi.org/10.1364/ao.57.009215.","bibtex":"@article{Wu_Muntzeck_de los Arcos de Pedro_Grundmeier_Wilhelm_Wagner_2018, title={Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids}, DOI={10.1364/ao.57.009215}, number={9215}, journal={Applied Optics}, author={Wu, Xia and Muntzeck, Maren and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Wilhelm, René and Wagner, Thorsten}, year={2018} }","short":"X. Wu, M. Muntzeck, M.T. de los Arcos de Pedro, G. Grundmeier, R. Wilhelm, T. Wagner, Applied Optics (2018).","mla":"Wu, Xia, et al. “Determination of the Refractive Indices of Ionic Liquids by Ellipsometry, and Their Application as Immersion Liquids.” Applied Optics, 9215, 2018, doi:10.1364/ao.57.009215.","apa":"Wu, X., Muntzeck, M., de los Arcos de Pedro, M. T., Grundmeier, G., Wilhelm, R., & Wagner, T. (2018). Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids. Applied Optics, Article 9215. https://doi.org/10.1364/ao.57.009215"},"date_updated":"2023-01-24T08:11:01Z","author":[{"first_name":"Xia","full_name":"Wu, Xia","last_name":"Wu"},{"first_name":"Maren","full_name":"Muntzeck, Maren","last_name":"Muntzeck"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Guido","last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido"},{"first_name":"René","full_name":"Wilhelm, René","last_name":"Wilhelm"},{"first_name":"Thorsten","last_name":"Wagner","full_name":"Wagner, Thorsten"}],"date_created":"2021-07-07T09:05:36Z","title":"Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids","doi":"10.1364/ao.57.009215","publication":"Applied Optics","type":"journal_article","status":"public","_id":"22562","department":[{"_id":"302"}],"user_id":"54556","article_number":"9215","language":[{"iso":"eng"}]},{"publication_identifier":{"issn":["1477-9226","1477-9234"]},"publication_status":"published","page":"2926-2938","citation":{"apa":"Cwik, S., Beer, S. M. J., Schmidt, M., Gerhardt, N. C., de los Arcos de Pedro, M. T., Rogalla, D., Weßing, J., Giner, I., Hofmann, M., Grundmeier, G., Wieck, A. D., & Devi, A. (2018). Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides. Dalton Transactions, 2926–2938. https://doi.org/10.1039/c8dt04317e","bibtex":"@article{Cwik_Beer_Schmidt_Gerhardt_de los Arcos de Pedro_Rogalla_Weßing_Giner_Hofmann_Grundmeier_et al._2018, title={Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides}, DOI={10.1039/c8dt04317e}, journal={Dalton Transactions}, author={Cwik, Stefan and Beer, Sebastian M. J. and Schmidt, Marcel and Gerhardt, Nils C. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Weßing, Jana and Giner, Ignacio and Hofmann, Martin and Grundmeier, Guido and et al.}, year={2018}, pages={2926–2938} }","mla":"Cwik, Stefan, et al. “Luminescent Nd2S3 Thin Films: A New Chemical Vapour Deposition Route towards Rare-Earth Sulphides.” Dalton Transactions, 2018, pp. 2926–38, doi:10.1039/c8dt04317e.","short":"S. Cwik, S.M.J. Beer, M. Schmidt, N.C. Gerhardt, M.T. de los Arcos de Pedro, D. Rogalla, J. Weßing, I. Giner, M. Hofmann, G. Grundmeier, A.D. Wieck, A. Devi, Dalton Transactions (2018) 2926–2938.","ama":"Cwik S, Beer SMJ, Schmidt M, et al. Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides. Dalton Transactions. Published online 2018:2926-2938. doi:10.1039/c8dt04317e","ieee":"S. Cwik et al., “Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides,” Dalton Transactions, pp. 2926–2938, 2018, doi: 10.1039/c8dt04317e.","chicago":"Cwik, Stefan, Sebastian M. J. Beer, Marcel Schmidt, Nils C. Gerhardt, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Jana Weßing, et al. “Luminescent Nd2S3 Thin Films: A New Chemical Vapour Deposition Route towards Rare-Earth Sulphides.” Dalton Transactions, 2018, 2926–38. https://doi.org/10.1039/c8dt04317e."},"year":"2018","date_created":"2021-07-07T08:40:12Z","author":[{"first_name":"Stefan","full_name":"Cwik, Stefan","last_name":"Cwik"},{"first_name":"Sebastian M. J.","full_name":"Beer, Sebastian M. J.","last_name":"Beer"},{"full_name":"Schmidt, Marcel","last_name":"Schmidt","first_name":"Marcel"},{"first_name":"Nils C.","full_name":"Gerhardt, Nils C.","last_name":"Gerhardt"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"full_name":"Rogalla, Detlef","last_name":"Rogalla","first_name":"Detlef"},{"full_name":"Weßing, Jana","last_name":"Weßing","first_name":"Jana"},{"first_name":"Ignacio","last_name":"Giner","full_name":"Giner, Ignacio"},{"full_name":"Hofmann, Martin","last_name":"Hofmann","first_name":"Martin"},{"last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido","first_name":"Guido"},{"first_name":"Andreas D.","full_name":"Wieck, Andreas D.","last_name":"Wieck"},{"last_name":"Devi","full_name":"Devi, Anjana","first_name":"Anjana"}],"date_updated":"2023-01-24T08:35:36Z","doi":"10.1039/c8dt04317e","title":"Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides","publication":"Dalton Transactions","type":"journal_article","status":"public","abstract":[{"text":"Development of two new neodymium containing precursors and their successful implementation in the MOCVD of luminescent Nd2S3 thin films.
","lang":"eng"}],"department":[{"_id":"302"}],"user_id":"54556","_id":"22540","language":[{"iso":"eng"}]},{"status":"public","type":"journal_article","publication":"Journal of Coatings Technology and Research","language":[{"iso":"eng"}],"user_id":"54556","department":[{"_id":"302"}],"_id":"22542","citation":{"apa":"Kirchheim, D., Wilski, S., Jaritz, M., Mitschker, F., Oberberg, M., Trieschmann, J., Banko, L., Brochhagen, M., Schreckenberg, R., Hopmann, C., Böke, M., Benedikt, J., de los Arcos de Pedro, M. T., Grundmeier, G., Grochla, D., Ludwig, A., Mussenbrock, T., Brinkmann, R. P., Awakowicz, P., & Dahlmann, R. (2018). Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD. Journal of Coatings Technology and Research, 573–583. https://doi.org/10.1007/s11998-018-0138-4","bibtex":"@article{Kirchheim_Wilski_Jaritz_Mitschker_Oberberg_Trieschmann_Banko_Brochhagen_Schreckenberg_Hopmann_et al._2018, title={Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD}, DOI={10.1007/s11998-018-0138-4}, journal={Journal of Coatings Technology and Research}, author={Kirchheim, Dennis and Wilski, Stefan and Jaritz, Montgomery and Mitschker, Felix and Oberberg, Moritz and Trieschmann, Jan and Banko, Lars and Brochhagen, Markus and Schreckenberg, Rabea and Hopmann, Christian and et al.}, year={2018}, pages={573–583} }","mla":"Kirchheim, Dennis, et al. “Improved Homogeneity of Plasma and Coating Properties Using a Lance Matrix Gas Distribution in MW-PECVD.” Journal of Coatings Technology and Research, 2018, pp. 573–83, doi:10.1007/s11998-018-0138-4.","short":"D. Kirchheim, S. Wilski, M. Jaritz, F. Mitschker, M. Oberberg, J. Trieschmann, L. Banko, M. Brochhagen, R. Schreckenberg, C. Hopmann, M. Böke, J. Benedikt, M.T. de los Arcos de Pedro, G. Grundmeier, D. Grochla, A. Ludwig, T. Mussenbrock, R.P. Brinkmann, P. Awakowicz, R. Dahlmann, Journal of Coatings Technology and Research (2018) 573–583.","chicago":"Kirchheim, Dennis, Stefan Wilski, Montgomery Jaritz, Felix Mitschker, Moritz Oberberg, Jan Trieschmann, Lars Banko, et al. “Improved Homogeneity of Plasma and Coating Properties Using a Lance Matrix Gas Distribution in MW-PECVD.” Journal of Coatings Technology and Research, 2018, 573–83. https://doi.org/10.1007/s11998-018-0138-4.","ieee":"D. Kirchheim et al., “Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD,” Journal of Coatings Technology and Research, pp. 573–583, 2018, doi: 10.1007/s11998-018-0138-4.","ama":"Kirchheim D, Wilski S, Jaritz M, et al. Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD. Journal of Coatings Technology and Research. Published online 2018:573-583. doi:10.1007/s11998-018-0138-4"},"page":"573-583","year":"2018","publication_status":"published","publication_identifier":{"issn":["1547-0091","1935-3804"]},"doi":"10.1007/s11998-018-0138-4","title":"Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD","author":[{"full_name":"Kirchheim, Dennis","last_name":"Kirchheim","first_name":"Dennis"},{"last_name":"Wilski","full_name":"Wilski, Stefan","first_name":"Stefan"},{"first_name":"Montgomery","full_name":"Jaritz, Montgomery","last_name":"Jaritz"},{"last_name":"Mitschker","full_name":"Mitschker, Felix","first_name":"Felix"},{"first_name":"Moritz","last_name":"Oberberg","full_name":"Oberberg, Moritz"},{"first_name":"Jan","full_name":"Trieschmann, Jan","last_name":"Trieschmann"},{"first_name":"Lars","full_name":"Banko, Lars","last_name":"Banko"},{"first_name":"Markus","full_name":"Brochhagen, Markus","last_name":"Brochhagen"},{"last_name":"Schreckenberg","full_name":"Schreckenberg, Rabea","first_name":"Rabea"},{"first_name":"Christian","last_name":"Hopmann","full_name":"Hopmann, Christian"},{"first_name":"Marc","last_name":"Böke","full_name":"Böke, Marc"},{"first_name":"Jan","full_name":"Benedikt, Jan","last_name":"Benedikt"},{"first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa"},{"first_name":"Guido","id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier"},{"first_name":"Dario","full_name":"Grochla, Dario","last_name":"Grochla"},{"full_name":"Ludwig, Alfred","last_name":"Ludwig","first_name":"Alfred"},{"first_name":"Thomas","last_name":"Mussenbrock","full_name":"Mussenbrock, Thomas"},{"first_name":"Ralf Peter","last_name":"Brinkmann","full_name":"Brinkmann, Ralf Peter"},{"full_name":"Awakowicz, Peter","last_name":"Awakowicz","first_name":"Peter"},{"full_name":"Dahlmann, Rainer","last_name":"Dahlmann","first_name":"Rainer"}],"date_created":"2021-07-07T08:41:15Z","date_updated":"2023-01-24T08:36:23Z"},{"publication_status":"published","publication_identifier":{"issn":["2196-7350","2196-7350"]},"year":"2018","citation":{"ama":"Zanders D, Ciftyurek E, Hoppe C, et al. Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. Advanced Materials Interfaces. Published online 2018. doi:10.1002/admi.201801540","chicago":"Zanders, David, Engin Ciftyurek, Christian Hoppe, Maria Teresa de los Arcos de Pedro, Aleksander Kostka, Detlef Rogalla, Guido Grundmeier, Klaus Dieter Schierbaum, and Anjana Devi. “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.” Advanced Materials Interfaces, 2018. https://doi.org/10.1002/admi.201801540.","ieee":"D. Zanders et al., “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties,” Advanced Materials Interfaces, Art. no. 1801540, 2018, doi: 10.1002/admi.201801540.","mla":"Zanders, David, et al. “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.” Advanced Materials Interfaces, 1801540, 2018, doi:10.1002/admi.201801540.","short":"D. Zanders, E. Ciftyurek, C. Hoppe, M.T. de los Arcos de Pedro, A. Kostka, D. Rogalla, G. Grundmeier, K.D. Schierbaum, A. Devi, Advanced Materials Interfaces (2018).","bibtex":"@article{Zanders_Ciftyurek_Hoppe_de los Arcos de Pedro_Kostka_Rogalla_Grundmeier_Schierbaum_Devi_2018, title={Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties}, DOI={10.1002/admi.201801540}, number={1801540}, journal={Advanced Materials Interfaces}, author={Zanders, David and Ciftyurek, Engin and Hoppe, Christian and de los Arcos de Pedro, Maria Teresa and Kostka, Aleksander and Rogalla, Detlef and Grundmeier, Guido and Schierbaum, Klaus Dieter and Devi, Anjana}, year={2018} }","apa":"Zanders, D., Ciftyurek, E., Hoppe, C., de los Arcos de Pedro, M. T., Kostka, A., Rogalla, D., Grundmeier, G., Schierbaum, K. D., & Devi, A. (2018). Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. Advanced Materials Interfaces, Article 1801540. https://doi.org/10.1002/admi.201801540"},"date_updated":"2023-01-24T08:36:44Z","author":[{"last_name":"Zanders","full_name":"Zanders, David","first_name":"David"},{"full_name":"Ciftyurek, Engin","last_name":"Ciftyurek","first_name":"Engin"},{"full_name":"Hoppe, Christian","last_name":"Hoppe","first_name":"Christian"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"Aleksander","last_name":"Kostka","full_name":"Kostka, Aleksander"},{"last_name":"Rogalla","full_name":"Rogalla, Detlef","first_name":"Detlef"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"},{"full_name":"Schierbaum, Klaus Dieter","last_name":"Schierbaum","first_name":"Klaus Dieter"},{"first_name":"Anjana","last_name":"Devi","full_name":"Devi, Anjana"}],"date_created":"2021-07-07T08:50:07Z","title":"Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties","doi":"10.1002/admi.201801540","type":"journal_article","publication":"Advanced Materials Interfaces","status":"public","_id":"22546","user_id":"54556","department":[{"_id":"302"}],"article_number":"1801540","language":[{"iso":"eng"}]},{"publication_status":"published","publication_identifier":{"issn":["1944-8244","1944-8252"]},"year":"2018","citation":{"apa":"Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., & Devi, A. (2018). PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces, 7422–7434. https://doi.org/10.1021/acsami.7b14916","bibtex":"@article{Gebhard_Mai_Banko_Mitschker_Hoppe_Jaritz_Kirchheim_Zekorn_de los Arcos de Pedro_Grochla_et al._2018, title={PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads}, DOI={10.1021/acsami.7b14916}, journal={ACS Applied Materials & Interfaces}, author={Gebhard, Maximilian and Mai, Lukas and Banko, Lars and Mitschker, Felix and Hoppe, Christian and Jaritz, Montgomery and Kirchheim, Dennis and Zekorn, Christoph and de los Arcos de Pedro, Maria Teresa and Grochla, Dario and et al.}, year={2018}, pages={7422–7434} }","short":"M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials & Interfaces (2018) 7422–7434.","mla":"Gebhard, Maximilian, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” ACS Applied Materials & Interfaces, 2018, pp. 7422–34, doi:10.1021/acsami.7b14916.","chicago":"Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” ACS Applied Materials & Interfaces, 2018, 7422–34. https://doi.org/10.1021/acsami.7b14916.","ieee":"M. Gebhard et al., “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” ACS Applied Materials & Interfaces, pp. 7422–7434, 2018, doi: 10.1021/acsami.7b14916.","ama":"Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces. 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Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials & Interfaces (2018) 7422–7434.","apa":"Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., & Devi, A. (2018). PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces, 7422–7434. https://doi.org/10.1021/acsami.7b14916","ama":"Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces. 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Gebhard et al., “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” ACS Applied Materials & Interfaces, pp. 7422–7434, 2018, doi: 10.1021/acsami.7b14916."},"year":"2018","publication_identifier":{"issn":["1944-8244","1944-8252"]},"publication_status":"published","language":[{"iso":"eng"}],"department":[{"_id":"302"}],"user_id":"54556","_id":"22549","status":"public","publication":"ACS Applied Materials & Interfaces","type":"journal_article"},{"type":"journal_article","publication":"ACS Applied Materials & Interfaces","status":"public","user_id":"54556","department":[{"_id":"302"}],"_id":"22551","language":[{"iso":"eng"}],"publication_status":"published","publication_identifier":{"issn":["1944-8244","1944-8252"]},"citation":{"apa":"Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. 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Gebhard et al., “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” ACS Applied Materials & Interfaces, pp. 7422–7434, 2018, doi: 10.1021/acsami.7b14916.","chicago":"Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” ACS Applied Materials & Interfaces, 2018, 7422–34. https://doi.org/10.1021/acsami.7b14916.","ama":"Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces. 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Dietrich, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier, Contributions to Plasma Physics (2018) 377–383.","mla":"Dietrich, J., et al. “Combined in Situ Infrared Reflection Absorption Spectroscopy-Quartz Crystal Microbalance Investigation of the Initial Growth Stages of Plasma-Deposited SiO x on Polypropylene.” Contributions to Plasma Physics, 2018, pp. 377–83, doi:10.1002/ctpp.201700036.","bibtex":"@article{Dietrich_Hoppe_de los Arcos de Pedro_Grundmeier_2018, title={Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO x on polypropylene}, DOI={10.1002/ctpp.201700036}, journal={Contributions to Plasma Physics}, author={Dietrich, J. and Hoppe, C. and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2018}, pages={377–383} }","apa":"Dietrich, J., Hoppe, C., de los Arcos de Pedro, M. T., & Grundmeier, G. (2018). Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO x on polypropylene. Contributions to Plasma Physics, 377–383. https://doi.org/10.1002/ctpp.201700036","ama":"Dietrich J, Hoppe C, de los Arcos de Pedro MT, Grundmeier G. Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO x on polypropylene. Contributions to Plasma Physics. Published online 2018:377-383. doi:10.1002/ctpp.201700036","chicago":"Dietrich, J., C. Hoppe, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Combined in Situ Infrared Reflection Absorption Spectroscopy-Quartz Crystal Microbalance Investigation of the Initial Growth Stages of Plasma-Deposited SiO x on Polypropylene.” Contributions to Plasma Physics, 2018, 377–83. https://doi.org/10.1002/ctpp.201700036.","ieee":"J. Dietrich, C. Hoppe, M. T. de los Arcos de Pedro, and G. Grundmeier, “Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO x on polypropylene,” Contributions to Plasma Physics, pp. 377–383, 2018, doi: 10.1002/ctpp.201700036."},"year":"2018","department":[{"_id":"302"}],"user_id":"54556","_id":"22548","language":[{"iso":"eng"}],"publication":"Contributions to Plasma Physics","type":"journal_article","status":"public"},{"status":"public","publication":"Plasma Processes and Polymers","type":"journal_article","article_number":"1700230","language":[{"iso":"eng"}],"_id":"22547","department":[{"_id":"302"}],"user_id":"54556","year":"2018","citation":{"bibtex":"@article{Budde_Corbella_Große-Kreul_de los Arcos de Pedro_Grundmeier_von Keudell_2018, title={Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas}, DOI={10.1002/ppap.201700230}, number={1700230}, journal={Plasma Processes and Polymers}, author={Budde, Maik and Corbella, Carles and Große-Kreul, Simon and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and von Keudell, Achim}, year={2018} }","short":"M. Budde, C. Corbella, S. Große-Kreul, M.T. de los Arcos de Pedro, G. Grundmeier, A. von Keudell, Plasma Processes and Polymers (2018).","mla":"Budde, Maik, et al. “Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” Plasma Processes and Polymers, 1700230, 2018, doi:10.1002/ppap.201700230.","apa":"Budde, M., Corbella, C., Große-Kreul, S., de los Arcos de Pedro, M. T., Grundmeier, G., & von Keudell, A. (2018). Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. Plasma Processes and Polymers, Article 1700230. https://doi.org/10.1002/ppap.201700230","ama":"Budde M, Corbella C, Große-Kreul S, de los Arcos de Pedro MT, Grundmeier G, von Keudell A. Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. Plasma Processes and Polymers. Published online 2018. doi:10.1002/ppap.201700230","chicago":"Budde, Maik, Carles Corbella, Simon Große-Kreul, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, and Achim von Keudell. “Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” Plasma Processes and Polymers, 2018. https://doi.org/10.1002/ppap.201700230.","ieee":"M. Budde, C. Corbella, S. Große-Kreul, M. T. de los Arcos de Pedro, G. Grundmeier, and A. von Keudell, “Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas,” Plasma Processes and Polymers, Art. no. 1700230, 2018, doi: 10.1002/ppap.201700230."},"publication_identifier":{"issn":["1612-8850"]},"publication_status":"published","title":"Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas","doi":"10.1002/ppap.201700230","date_updated":"2023-01-24T08:37:01Z","date_created":"2021-07-07T08:50:38Z","author":[{"last_name":"Budde","full_name":"Budde, Maik","first_name":"Maik"},{"first_name":"Carles","last_name":"Corbella","full_name":"Corbella, Carles"},{"full_name":"Große-Kreul, Simon","last_name":"Große-Kreul","first_name":"Simon"},{"first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"Achim","last_name":"von Keudell","full_name":"von Keudell, Achim"}]},{"type":"journal_article","publication":"RSC Advances","abstract":[{"lang":"eng","text":"A new water assisted atomic layer deposition (ALD) process was developed using the yttrium tris-guanidinate precursor which resulted in device quality thin films.
"}],"status":"public","_id":"22557","user_id":"54556","department":[{"_id":"302"}],"language":[{"iso":"eng"}],"publication_status":"published","publication_identifier":{"issn":["2046-2069"]},"year":"2018","citation":{"apa":"Mai, L., Boysen, N., Subaşı, E., de los Arcos de Pedro, M. T., Rogalla, D., Grundmeier, G., Bock, C., Lu, H.-L., & Devi, A. (2018). Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. RSC Advances, 4987–4994. https://doi.org/10.1039/c7ra13417g","mla":"Mai, Lukas, et al. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” RSC Advances, 2018, pp. 4987–94, doi:10.1039/c7ra13417g.","short":"L. Mai, N. Boysen, E. Subaşı, M.T. de los Arcos de Pedro, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi, RSC Advances (2018) 4987–4994.","bibtex":"@article{Mai_Boysen_Subaşı_de los Arcos de Pedro_Rogalla_Grundmeier_Bock_Lu_Devi_2018, title={Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties}, DOI={10.1039/c7ra13417g}, journal={RSC Advances}, author={Mai, Lukas and Boysen, Nils and Subaşı, Ersoy and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Grundmeier, Guido and Bock, Claudia and Lu, Hong-Liang and Devi, Anjana}, year={2018}, pages={4987–4994} }","ieee":"L. Mai et al., “Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties,” RSC Advances, pp. 4987–4994, 2018, doi: 10.1039/c7ra13417g.","chicago":"Mai, Lukas, Nils Boysen, Ersoy Subaşı, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Guido Grundmeier, Claudia Bock, Hong-Liang Lu, and Anjana Devi. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” RSC Advances, 2018, 4987–94. https://doi.org/10.1039/c7ra13417g.","ama":"Mai L, Boysen N, Subaşı E, et al. Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. RSC Advances. Published online 2018:4987-4994. doi:10.1039/c7ra13417g"},"page":"4987-4994","date_updated":"2023-01-24T08:39:45Z","date_created":"2021-07-07T09:02:26Z","author":[{"first_name":"Lukas","full_name":"Mai, Lukas","last_name":"Mai"},{"last_name":"Boysen","full_name":"Boysen, Nils","first_name":"Nils"},{"full_name":"Subaşı, Ersoy","last_name":"Subaşı","first_name":"Ersoy"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"full_name":"Rogalla, Detlef","last_name":"Rogalla","first_name":"Detlef"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"},{"last_name":"Bock","full_name":"Bock, Claudia","first_name":"Claudia"},{"full_name":"Lu, Hong-Liang","last_name":"Lu","first_name":"Hong-Liang"},{"first_name":"Anjana","last_name":"Devi","full_name":"Devi, Anjana"}],"title":"Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties","doi":"10.1039/c7ra13417g"},{"_id":"22558","department":[{"_id":"302"}],"user_id":"54556","article_number":"235201","language":[{"iso":"eng"}],"publication":"Journal of Physics D: Applied Physics","type":"journal_article","status":"public","date_updated":"2023-01-24T08:40:05Z","author":[{"first_name":"F","last_name":"Mitschker","full_name":"Mitschker, F"},{"first_name":"L","full_name":"Schücke, L","last_name":"Schücke"},{"first_name":"Ch","full_name":"Hoppe, Ch","last_name":"Hoppe"},{"last_name":"Jaritz","full_name":"Jaritz, M","first_name":"M"},{"full_name":"Dahlmann, R","last_name":"Dahlmann","first_name":"R"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"Ch","full_name":"Hopmann, Ch","last_name":"Hopmann"},{"last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido","first_name":"Guido"},{"first_name":"P","last_name":"Awakowicz","full_name":"Awakowicz, P"}],"date_created":"2021-07-07T09:02:43Z","title":"Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)","doi":"10.1088/1361-6463/aac0ab","publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","year":"2018","citation":{"bibtex":"@article{Mitschker_Schücke_Hoppe_Jaritz_Dahlmann_de los Arcos de Pedro_Hopmann_Grundmeier_Awakowicz_2018, title={Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)}, DOI={10.1088/1361-6463/aac0ab}, number={235201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Schücke, L and Hoppe, Ch and Jaritz, M and Dahlmann, R and de los Arcos de Pedro, Maria Teresa and Hopmann, Ch and Grundmeier, Guido and Awakowicz, P}, year={2018} }","mla":"Mitschker, F., et al. “Comparative Study on the Deposition of Silicon Oxide Permeation Barrier Coatings for Polymers Using Hexamethyldisilazane (HMDSN) and Hexamethyldisiloxane (HMDSO).” Journal of Physics D: Applied Physics, 235201, 2018, doi:10.1088/1361-6463/aac0ab.","short":"F. Mitschker, L. Schücke, C. Hoppe, M. Jaritz, R. Dahlmann, M.T. de los Arcos de Pedro, C. Hopmann, G. Grundmeier, P. Awakowicz, Journal of Physics D: Applied Physics (2018).","apa":"Mitschker, F., Schücke, L., Hoppe, C., Jaritz, M., Dahlmann, R., de los Arcos de Pedro, M. T., Hopmann, C., Grundmeier, G., & Awakowicz, P. (2018). Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). Journal of Physics D: Applied Physics, Article 235201. https://doi.org/10.1088/1361-6463/aac0ab","ama":"Mitschker F, Schücke L, Hoppe C, et al. Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). Journal of Physics D: Applied Physics. Published online 2018. doi:10.1088/1361-6463/aac0ab","chicago":"Mitschker, F, L Schücke, Ch Hoppe, M Jaritz, R Dahlmann, Maria Teresa de los Arcos de Pedro, Ch Hopmann, Guido Grundmeier, and P Awakowicz. “Comparative Study on the Deposition of Silicon Oxide Permeation Barrier Coatings for Polymers Using Hexamethyldisilazane (HMDSN) and Hexamethyldisiloxane (HMDSO).” Journal of Physics D: Applied Physics, 2018. https://doi.org/10.1088/1361-6463/aac0ab.","ieee":"F. Mitschker et al., “Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO),” Journal of Physics D: Applied Physics, Art. no. 235201, 2018, doi: 10.1088/1361-6463/aac0ab."}},{"publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","citation":{"ieee":"F. Mitschker, J. Wißing, C. Hoppe, M. T. de los Arcos de Pedro, G. Grundmeier, and P. Awakowicz, “Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET,” Journal of Physics D: Applied Physics, Art. no. 145201, 2018, doi: 10.1088/1361-6463/aab1dd.","chicago":"Mitschker, F, J Wißing, Ch Hoppe, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, and P Awakowicz. “Influence of Average Ion Energy and Atomic Oxygen Flux per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings on PET.” Journal of Physics D: Applied Physics, 2018. https://doi.org/10.1088/1361-6463/aab1dd.","ama":"Mitschker F, Wißing J, Hoppe C, de los Arcos de Pedro MT, Grundmeier G, Awakowicz P. Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET. Journal of Physics D: Applied Physics. Published online 2018. doi:10.1088/1361-6463/aab1dd","apa":"Mitschker, F., Wißing, J., Hoppe, C., de los Arcos de Pedro, M. T., Grundmeier, G., & Awakowicz, P. (2018). Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET. Journal of Physics D: Applied Physics, Article 145201. https://doi.org/10.1088/1361-6463/aab1dd","mla":"Mitschker, F., et al. “Influence of Average Ion Energy and Atomic Oxygen Flux per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings on PET.” Journal of Physics D: Applied Physics, 145201, 2018, doi:10.1088/1361-6463/aab1dd.","bibtex":"@article{Mitschker_Wißing_Hoppe_de los Arcos de Pedro_Grundmeier_Awakowicz_2018, title={Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET}, DOI={10.1088/1361-6463/aab1dd}, number={145201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Wißing, J and Hoppe, Ch and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Awakowicz, P}, year={2018} }","short":"F. Mitschker, J. Wißing, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier, P. 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