[{"citation":{"bibtex":"@article{Pothineni_Theile-Rasche_Müller_Grundmeier_de los Arcos de Pedro_Keller_2025, title={DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces}, DOI={<a href=\"https://doi.org/10.1002/chem.202404108\">10.1002/chem.202404108</a>}, journal={Chemistry – A European Journal}, author={Pothineni, Bhanu Kiran and Theile-Rasche, Chantal and Müller, Hendrik and Grundmeier, Guido and de los Arcos de Pedro, Maria Teresa and Keller, Adrian}, year={2025}, pages={e202404108} }","mla":"Pothineni, Bhanu Kiran, et al. “DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces.” <i>Chemistry – A European Journal</i>, 2025, p. e202404108, doi:<a href=\"https://doi.org/10.1002/chem.202404108\">10.1002/chem.202404108</a>.","short":"B.K. Pothineni, C. Theile-Rasche, H. Müller, G. Grundmeier, M.T. de los Arcos de Pedro, A. Keller, Chemistry – A European Journal (2025) e202404108.","apa":"Pothineni, B. K., Theile-Rasche, C., Müller, H., Grundmeier, G., de los Arcos de Pedro, M. T., &#38; Keller, A. (2025). DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces. <i>Chemistry – A European Journal</i>, e202404108. <a href=\"https://doi.org/10.1002/chem.202404108\">https://doi.org/10.1002/chem.202404108</a>","ieee":"B. K. Pothineni, C. Theile-Rasche, H. Müller, G. Grundmeier, M. T. de los Arcos de Pedro, and A. Keller, “DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces,” <i>Chemistry – A European Journal</i>, p. e202404108, 2025, doi: <a href=\"https://doi.org/10.1002/chem.202404108\">10.1002/chem.202404108</a>.","chicago":"Pothineni, Bhanu Kiran, Chantal Theile-Rasche, Hendrik Müller, Guido Grundmeier, Maria Teresa de los Arcos de Pedro, and Adrian Keller. “DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces.” <i>Chemistry – A European Journal</i>, 2025, e202404108. <a href=\"https://doi.org/10.1002/chem.202404108\">https://doi.org/10.1002/chem.202404108</a>.","ama":"Pothineni BK, Theile-Rasche C, Müller H, Grundmeier G, de los Arcos de Pedro MT, Keller A. DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces. <i>Chemistry – A European Journal</i>. Published online 2025:e202404108. doi:<a href=\"https://doi.org/10.1002/chem.202404108\">10.1002/chem.202404108</a>"},"page":"e202404108","year":"2025","doi":"10.1002/chem.202404108","title":"DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces","date_created":"2025-02-12T14:49:48Z","author":[{"last_name":"Pothineni","full_name":"Pothineni, Bhanu Kiran","first_name":"Bhanu Kiran"},{"last_name":"Theile-Rasche","full_name":"Theile-Rasche, Chantal","first_name":"Chantal"},{"full_name":"Müller, Hendrik","last_name":"Müller","first_name":"Hendrik"},{"first_name":"Guido","last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido"},{"first_name":"Maria Teresa","orcid":"0000-0002-8684-273X ","last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa"},{"first_name":"Adrian","orcid":"0000-0001-7139-3110","last_name":"Keller","full_name":"Keller, Adrian","id":"48864"}],"date_updated":"2025-06-10T09:10:16Z","status":"public","abstract":[{"lang":"eng","text":"Self-assembled DNA origami lattices on silicon oxide surfaces have great potential to serve as masks in molecular lithography. However, silicon oxide surfaces come in many different forms and the type and history of the silicon oxide has a large effect on its physicochemical surface properties. Therefore, we here investigate DNA origami lattice formation on differently fabricated SiOx films on silicon wafers after wet-chemical oxidation by RCA1. Despite having similar oxide compositions and hydroxylation states, of all surfaces tested, only thermally grown SiOx performs similarly well as native oxide. For the other SiOx films deposited by plasma-enhanced chemical vapor deposition and magnetron sputtering, DNA origami adsorption is strongly suppressed. This is attributed to an increased surface roughness and a lower oxide density, respectively. Our results demonstrate that the employed SiOx surface may decide over the outcome of an experiment and should be considered as an additional parameter that may require optimization and fine-tuning before high-quality lattices can be assembled. In particular, our observations suggest that efficient DNA origami lattice assembly on SiOx surfaces requires a low surface roughness and a high oxide density."}],"type":"journal_article","publication":"Chemistry – A European Journal","language":[{"iso":"eng"}],"user_id":"48864","department":[{"_id":"302"}],"_id":"58613"},{"type":"journal_article","publication":"Surface and Interface Analysis","status":"public","abstract":[{"text":"<jats:title>ABSTRACT</jats:title>\r\n                  <jats:p>Spin‐coated polylactide (PLA) thin films were exposed to nitrogen plasma for varying time intervals. The progressive etching of the PLA film in direct contact with the nitrogen plasma was monitored in situ using polarization modulated infrared reflection absorption spectroscopy (PM‐IRRAS). No appreciative changes in composition were seen with PM‐IRRAS, indicating that the etching did not significantly affect the bulk composition. Atomic force microscopy characterization of the plasma‐etched films showed that the PLA films are homogeneously etched. Subsequent ex situ XPS analysis of the treated surface revealed the presence of C‐N bonds in the surface‐near region that could be associated with amino and/or amide surface species. PLA films were also alternatively exposed to nitrogen ion beams produced by an electron‐cyclotron‐resonance (ECR) plasma source and were investigated in vacuo by XPS. This treatment revealed the partial substitution of surface oxygen species by nitrogen, resulting in a similar surface modification as in the plasma case. The comparison of XPS data and water contact angle studies suggest that the activated surfaces show a reorientation of macromolecular fragments in the surface‐near region depending on the polarity of the phase with which they are in contact. Under ultra‐high vacuum (UHV) conditions, the surface tends to lower its surface energy, while in contact with the aqueous phase, subsurface polar groups orientate outwards, which enables the formation of hydrogen bonds.</jats:p>","lang":"eng"}],"user_id":"54556","department":[{"_id":"302"}],"_id":"62876","language":[{"iso":"eng"}],"issue":"7","publication_status":"published","publication_identifier":{"issn":["0142-2421","1096-9918"]},"citation":{"ama":"Gołębiowska S, Voigt M, de los Arcos de Pedro MT, Grundmeier G. In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide Thin Films. <i>Surface and Interface Analysis</i>. 2025;57(7):499-509. doi:<a href=\"https://doi.org/10.1002/sia.7406\">10.1002/sia.7406</a>","ieee":"S. Gołębiowska, M. Voigt, M. T. de los Arcos de Pedro, and G. Grundmeier, “In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide Thin Films,” <i>Surface and Interface Analysis</i>, vol. 57, no. 7, pp. 499–509, 2025, doi: <a href=\"https://doi.org/10.1002/sia.7406\">10.1002/sia.7406</a>.","chicago":"Gołębiowska, Sandra, Markus Voigt, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide Thin Films.” <i>Surface and Interface Analysis</i> 57, no. 7 (2025): 499–509. <a href=\"https://doi.org/10.1002/sia.7406\">https://doi.org/10.1002/sia.7406</a>.","apa":"Gołębiowska, S., Voigt, M., de los Arcos de Pedro, M. T., &#38; Grundmeier, G. (2025). In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide Thin Films. <i>Surface and Interface Analysis</i>, <i>57</i>(7), 499–509. <a href=\"https://doi.org/10.1002/sia.7406\">https://doi.org/10.1002/sia.7406</a>","short":"S. Gołębiowska, M. Voigt, M.T. de los Arcos de Pedro, G. Grundmeier, Surface and Interface Analysis 57 (2025) 499–509.","bibtex":"@article{Gołębiowska_Voigt_de los Arcos de Pedro_Grundmeier_2025, title={In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide Thin Films}, volume={57}, DOI={<a href=\"https://doi.org/10.1002/sia.7406\">10.1002/sia.7406</a>}, number={7}, journal={Surface and Interface Analysis}, publisher={Wiley}, author={Gołębiowska, Sandra and Voigt, Markus and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2025}, pages={499–509} }","mla":"Gołębiowska, Sandra, et al. “In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide Thin Films.” <i>Surface and Interface Analysis</i>, vol. 57, no. 7, Wiley, 2025, pp. 499–509, doi:<a href=\"https://doi.org/10.1002/sia.7406\">10.1002/sia.7406</a>."},"page":"499-509","intvolume":"        57","year":"2025","author":[{"full_name":"Gołębiowska, Sandra","last_name":"Gołębiowska","first_name":"Sandra"},{"first_name":"Markus","last_name":"Voigt","full_name":"Voigt, Markus"},{"first_name":"Maria Teresa","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","orcid":"0000-0002-8684-273X ","last_name":"de los Arcos de Pedro"},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"}],"date_created":"2025-12-04T13:12:03Z","volume":57,"date_updated":"2025-12-04T13:13:00Z","publisher":"Wiley","doi":"10.1002/sia.7406","title":"In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide Thin Films"},{"_id":"62875","user_id":"54556","department":[{"_id":"302"}],"article_number":"140676","language":[{"iso":"eng"}],"type":"journal_article","publication":"Thin Solid Films","status":"public","date_updated":"2025-12-04T13:12:56Z","publisher":"Elsevier BV","date_created":"2025-12-04T13:11:23Z","author":[{"last_name":"Theile-Rasche","full_name":"Theile-Rasche, Chantal","first_name":"Chantal"},{"full_name":"Wang, Fuzeng","last_name":"Wang","first_name":"Fuzeng"},{"last_name":"Prüßner","full_name":"Prüßner, Tim","first_name":"Tim"},{"full_name":"Huck, Marten","last_name":"Huck","first_name":"Marten"},{"first_name":"Hans-Georg","last_name":"Steinrück","full_name":"Steinrück, Hans-Georg"},{"orcid":"0000-0002-8684-273X ","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"}],"volume":820,"title":"Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications in polymer processing","doi":"10.1016/j.tsf.2025.140676","publication_status":"published","publication_identifier":{"issn":["0040-6090"]},"year":"2025","citation":{"ieee":"C. Theile-Rasche <i>et al.</i>, “Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications in polymer processing,” <i>Thin Solid Films</i>, vol. 820, Art. no. 140676, 2025, doi: <a href=\"https://doi.org/10.1016/j.tsf.2025.140676\">10.1016/j.tsf.2025.140676</a>.","chicago":"Theile-Rasche, Chantal, Fuzeng Wang, Tim Prüßner, Marten Huck, Hans-Georg Steinrück, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Evaluation of Anti-Adhesive and Corrosion Protection Properties of TiAlSiN-Magnetron-Sputtered Films for Applications in Polymer Processing.” <i>Thin Solid Films</i> 820 (2025). <a href=\"https://doi.org/10.1016/j.tsf.2025.140676\">https://doi.org/10.1016/j.tsf.2025.140676</a>.","ama":"Theile-Rasche C, Wang F, Prüßner T, et al. Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications in polymer processing. <i>Thin Solid Films</i>. 2025;820. doi:<a href=\"https://doi.org/10.1016/j.tsf.2025.140676\">10.1016/j.tsf.2025.140676</a>","apa":"Theile-Rasche, C., Wang, F., Prüßner, T., Huck, M., Steinrück, H.-G., de los Arcos de Pedro, M. T., &#38; Grundmeier, G. (2025). Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications in polymer processing. <i>Thin Solid Films</i>, <i>820</i>, Article 140676. <a href=\"https://doi.org/10.1016/j.tsf.2025.140676\">https://doi.org/10.1016/j.tsf.2025.140676</a>","mla":"Theile-Rasche, Chantal, et al. “Evaluation of Anti-Adhesive and Corrosion Protection Properties of TiAlSiN-Magnetron-Sputtered Films for Applications in Polymer Processing.” <i>Thin Solid Films</i>, vol. 820, 140676, Elsevier BV, 2025, doi:<a href=\"https://doi.org/10.1016/j.tsf.2025.140676\">10.1016/j.tsf.2025.140676</a>.","bibtex":"@article{Theile-Rasche_Wang_Prüßner_Huck_Steinrück_de los Arcos de Pedro_Grundmeier_2025, title={Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications in polymer processing}, volume={820}, DOI={<a href=\"https://doi.org/10.1016/j.tsf.2025.140676\">10.1016/j.tsf.2025.140676</a>}, number={140676}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Theile-Rasche, Chantal and Wang, Fuzeng and Prüßner, Tim and Huck, Marten and Steinrück, Hans-Georg and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2025} }","short":"C. Theile-Rasche, F. Wang, T. Prüßner, M. Huck, H.-G. Steinrück, M.T. de los Arcos de Pedro, G. Grundmeier, Thin Solid Films 820 (2025)."},"intvolume":"       820"},{"author":[{"last_name":"Xu","full_name":"Xu, Xiaodan","first_name":"Xiaodan"},{"first_name":"Sandra","last_name":"Gołębiowska","full_name":"Gołębiowska, Sandra"},{"last_name":"de los Arcos de Pedro","orcid":"0000-0002-8684-273X ","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido","first_name":"Guido"},{"first_name":"Adrian","last_name":"Keller","full_name":"Keller, Adrian"}],"date_created":"2025-12-04T13:10:43Z","publisher":"Royal Society of Chemistry (RSC)","date_updated":"2025-12-04T13:13:06Z","doi":"10.1039/d5lf00109a","title":"DNA origami adsorption at single-crystalline TiO<sub>2</sub> surfaces","publication_status":"published","publication_identifier":{"issn":["2755-3701"]},"citation":{"apa":"Xu, X., Gołębiowska, S., de los Arcos de Pedro, M. T., Grundmeier, G., &#38; Keller, A. (2025). DNA origami adsorption at single-crystalline TiO<sub>2</sub> surfaces. <i>RSC Applied Interfaces</i>. <a href=\"https://doi.org/10.1039/d5lf00109a\">https://doi.org/10.1039/d5lf00109a</a>","short":"X. Xu, S. Gołębiowska, M.T. de los Arcos de Pedro, G. Grundmeier, A. Keller, RSC Applied Interfaces (2025).","bibtex":"@article{Xu_Gołębiowska_de los Arcos de Pedro_Grundmeier_Keller_2025, title={DNA origami adsorption at single-crystalline TiO<sub>2</sub> surfaces}, DOI={<a href=\"https://doi.org/10.1039/d5lf00109a\">10.1039/d5lf00109a</a>}, journal={RSC Applied Interfaces}, publisher={Royal Society of Chemistry (RSC)}, author={Xu, Xiaodan and Gołębiowska, Sandra and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Keller, Adrian}, year={2025} }","mla":"Xu, Xiaodan, et al. “DNA Origami Adsorption at Single-Crystalline TiO<sub>2</sub> Surfaces.” <i>RSC Applied Interfaces</i>, Royal Society of Chemistry (RSC), 2025, doi:<a href=\"https://doi.org/10.1039/d5lf00109a\">10.1039/d5lf00109a</a>.","ama":"Xu X, Gołębiowska S, de los Arcos de Pedro MT, Grundmeier G, Keller A. DNA origami adsorption at single-crystalline TiO<sub>2</sub> surfaces. <i>RSC Applied Interfaces</i>. Published online 2025. doi:<a href=\"https://doi.org/10.1039/d5lf00109a\">10.1039/d5lf00109a</a>","chicago":"Xu, Xiaodan, Sandra Gołębiowska, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, and Adrian Keller. “DNA Origami Adsorption at Single-Crystalline TiO<sub>2</sub> Surfaces.” <i>RSC Applied Interfaces</i>, 2025. <a href=\"https://doi.org/10.1039/d5lf00109a\">https://doi.org/10.1039/d5lf00109a</a>.","ieee":"X. Xu, S. Gołębiowska, M. T. de los Arcos de Pedro, G. Grundmeier, and A. Keller, “DNA origami adsorption at single-crystalline TiO<sub>2</sub> surfaces,” <i>RSC Applied Interfaces</i>, 2025, doi: <a href=\"https://doi.org/10.1039/d5lf00109a\">10.1039/d5lf00109a</a>."},"year":"2025","user_id":"54556","department":[{"_id":"302"}],"_id":"62874","language":[{"iso":"eng"}],"type":"journal_article","publication":"RSC Applied Interfaces","status":"public","abstract":[{"text":"<jats:p>DNA origami adsorption at single-crystalline TiO<jats:sub>2</jats:sub> surfaces is investigated at different Mg<jats:sup>2+</jats:sup> concentrations. For TiO<jats:sub>2</jats:sub>(001), DNA origami adsorption is stronger at 5 mM than at 10 mM Mg<jats:sup>2+</jats:sup>, whereas the opposite is observed for TiO<jats:sub>2</jats:sub>(110) and TiO<jats:sub>2</jats:sub>(111).</jats:p>","lang":"eng"}]},{"language":[{"iso":"eng"}],"user_id":"54556","department":[{"_id":"302"}],"_id":"58612","status":"public","type":"journal_article","publication":"ACS Applied Nano Materials","doi":"10.1021/acsanm.3c05949","title":"Nickel-Induced Reduced Graphene Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications","author":[{"full_name":"Luis-Sunga, Maximina","last_name":"Luis-Sunga","first_name":"Maximina"},{"last_name":"González-Orive","full_name":"González-Orive, Alejandro","first_name":"Alejandro"},{"last_name":"Calderón","full_name":"Calderón, Juan Carlos","first_name":"Juan Carlos"},{"first_name":"Ilaria","last_name":"Gamba","full_name":"Gamba, Ilaria"},{"full_name":"Ródenas, Airán","last_name":"Ródenas","first_name":"Airán"},{"first_name":"Maria Teresa","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","orcid":"0000-0002-8684-273X ","last_name":"de los Arcos de Pedro"},{"full_name":"Hernández-Creus, Alberto","last_name":"Hernández-Creus","first_name":"Alberto"},{"first_name":"Guido","last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido"},{"last_name":"Pastor","full_name":"Pastor, Elena","first_name":"Elena"},{"first_name":"Gonzalo","full_name":"García, Gonzalo","last_name":"García"}],"date_created":"2025-02-12T14:49:11Z","date_updated":"2025-02-12T14:56:48Z","citation":{"mla":"Luis-Sunga, Maximina, et al. “Nickel-Induced Reduced Graphene Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications.” <i>ACS Applied Nano Materials</i>, 2024, doi:<a href=\"https://doi.org/10.1021/acsanm.3c05949\">10.1021/acsanm.3c05949</a>.","bibtex":"@article{Luis-Sunga_González-Orive_Calderón_Gamba_Ródenas_de los Arcos de Pedro_Hernández-Creus_Grundmeier_Pastor_García_2024, title={Nickel-Induced Reduced Graphene Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications}, DOI={<a href=\"https://doi.org/10.1021/acsanm.3c05949\">10.1021/acsanm.3c05949</a>}, journal={ACS Applied Nano Materials}, author={Luis-Sunga, Maximina and González-Orive, Alejandro and Calderón, Juan Carlos and Gamba, Ilaria and Ródenas, Airán and de los Arcos de Pedro, Maria Teresa and Hernández-Creus, Alberto and Grundmeier, Guido and Pastor, Elena and García, Gonzalo}, year={2024} }","short":"M. Luis-Sunga, A. González-Orive, J.C. Calderón, I. Gamba, A. Ródenas, M.T. de los Arcos de Pedro, A. Hernández-Creus, G. Grundmeier, E. Pastor, G. García, ACS Applied Nano Materials (2024).","apa":"Luis-Sunga, M., González-Orive, A., Calderón, J. C., Gamba, I., Ródenas, A., de los Arcos de Pedro, M. T., Hernández-Creus, A., Grundmeier, G., Pastor, E., &#38; García, G. (2024). Nickel-Induced Reduced Graphene Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications. <i>ACS Applied Nano Materials</i>. <a href=\"https://doi.org/10.1021/acsanm.3c05949\">https://doi.org/10.1021/acsanm.3c05949</a>","ieee":"M. Luis-Sunga <i>et al.</i>, “Nickel-Induced Reduced Graphene Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications,” <i>ACS Applied Nano Materials</i>, 2024, doi: <a href=\"https://doi.org/10.1021/acsanm.3c05949\">10.1021/acsanm.3c05949</a>.","chicago":"Luis-Sunga, Maximina, Alejandro González-Orive, Juan Carlos Calderón, Ilaria Gamba, Airán Ródenas, Maria Teresa de los Arcos de Pedro, Alberto Hernández-Creus, Guido Grundmeier, Elena Pastor, and Gonzalo García. “Nickel-Induced Reduced Graphene Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications.” <i>ACS Applied Nano Materials</i>, 2024. <a href=\"https://doi.org/10.1021/acsanm.3c05949\">https://doi.org/10.1021/acsanm.3c05949</a>.","ama":"Luis-Sunga M, González-Orive A, Calderón JC, et al. Nickel-Induced Reduced Graphene Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications. <i>ACS Applied Nano Materials</i>. Published online 2024. doi:<a href=\"https://doi.org/10.1021/acsanm.3c05949\">10.1021/acsanm.3c05949</a>"},"year":"2024","publication_identifier":{"issn":["2574-0970"]}},{"doi":"10.3762/bjnano.15.51","title":"AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode","date_created":"2025-02-12T14:48:49Z","author":[{"last_name":"Müller","full_name":"Müller, Hendrik","first_name":"Hendrik"},{"first_name":"Hartmut","full_name":"Stadler, Hartmut","last_name":"Stadler"},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","orcid":"0000-0002-8684-273X ","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"last_name":"Keller","orcid":"0000-0001-7139-3110","id":"48864","full_name":"Keller, Adrian","first_name":"Adrian"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"}],"volume":15,"date_updated":"2025-02-12T14:56:14Z","citation":{"ama":"Müller H, Stadler H, de los Arcos de Pedro MT, Keller A, Grundmeier G. AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode. <i>Beilstein Journal of Nanotechnology</i>. 2024;15(1):603–611. doi:<a href=\"https://doi.org/10.3762/bjnano.15.51\">10.3762/bjnano.15.51</a>","ieee":"H. Müller, H. Stadler, M. T. de los Arcos de Pedro, A. Keller, and G. Grundmeier, “AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode,” <i>Beilstein Journal of Nanotechnology</i>, vol. 15, no. 1, pp. 603–611, 2024, doi: <a href=\"https://doi.org/10.3762/bjnano.15.51\">10.3762/bjnano.15.51</a>.","chicago":"Müller, Hendrik, Hartmut Stadler, Maria Teresa de los Arcos de Pedro, Adrian Keller, and Guido Grundmeier. “AFM-IR Investigation of Thin PECVD SiO x Films on a Polypropylene Substrate in the Surface-Sensitive Mode.” <i>Beilstein Journal of Nanotechnology</i> 15, no. 1 (2024): 603–611. <a href=\"https://doi.org/10.3762/bjnano.15.51\">https://doi.org/10.3762/bjnano.15.51</a>.","apa":"Müller, H., Stadler, H., de los Arcos de Pedro, M. T., Keller, A., &#38; Grundmeier, G. (2024). AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode. <i>Beilstein Journal of Nanotechnology</i>, <i>15</i>(1), 603–611. <a href=\"https://doi.org/10.3762/bjnano.15.51\">https://doi.org/10.3762/bjnano.15.51</a>","mla":"Müller, Hendrik, et al. “AFM-IR Investigation of Thin PECVD SiO x Films on a Polypropylene Substrate in the Surface-Sensitive Mode.” <i>Beilstein Journal of Nanotechnology</i>, vol. 15, no. 1, 2024, pp. 603–611, doi:<a href=\"https://doi.org/10.3762/bjnano.15.51\">10.3762/bjnano.15.51</a>.","short":"H. Müller, H. Stadler, M.T. de los Arcos de Pedro, A. Keller, G. Grundmeier, Beilstein Journal of Nanotechnology 15 (2024) 603–611.","bibtex":"@article{Müller_Stadler_de los Arcos de Pedro_Keller_Grundmeier_2024, title={AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive mode}, volume={15}, DOI={<a href=\"https://doi.org/10.3762/bjnano.15.51\">10.3762/bjnano.15.51</a>}, number={1}, journal={Beilstein Journal of Nanotechnology}, author={Müller, Hendrik and Stadler, Hartmut and de los Arcos de Pedro, Maria Teresa and Keller, Adrian and Grundmeier, Guido}, year={2024}, pages={603–611} }"},"intvolume":"        15","page":"603–611","year":"2024","issue":"1","publication_identifier":{"issn":["2190-4286"]},"language":[{"iso":"eng"}],"user_id":"54556","department":[{"_id":"302"}],"_id":"58611","status":"public","abstract":[{"lang":"eng","text":"AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate in the surface-sensitive mode"}],"type":"journal_article","publication":"Beilstein Journal of Nanotechnology"},{"language":[{"iso":"eng"}],"article_number":"2400171","department":[{"_id":"302"}],"user_id":"54556","_id":"62873","status":"public","abstract":[{"lang":"eng","text":"<jats:title>Abstract</jats:title><jats:p>Vapor phase infiltration (VPI) has emerged as a promising tool for fabrication of novel hybrid materials. In the field of polymeric gas separation membranes, a beneficial impact on stability and membrane performance is known for several polymers with differing functional groups. This study for the first time investigates VPI of trimethylaluminum (TMA) into poly(1‐trimethylsilyl‐1‐propyne) (PTMSP), featuring a carbon–carbon double bond as functional group. Saturation of the precursor inside the polymer is already attained after 60 s infiltration time leading to significant densification of the material. Depth profiling proves accumulation of aluminum in the polymer itself, but a significantly increased accumulation is visible in the gradient layer between polymer and SiO<jats:sub>2</jats:sub> substrate. A reaction pathway is proposed and supplemented by density‐functional theory (DFT) calculations. Infrared spectra derived from both experiments and simulation support the presented reaction pathway. In terms of permeance, a favorable impact on selectivity is observed for infiltration times up to 1 s. Longer infiltration times yield greatly reduced permeance values close or even below the detection limit of the measurement device. The present results of this study set a strong basis for the application of VPI on polymers for gas‐barrier and membrane applications in the future.</jats:p>"}],"publication":"Advanced Materials Interfaces","type":"journal_article","doi":"10.1002/admi.202400171","title":"Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum","volume":11,"date_created":"2025-12-04T13:07:52Z","author":[{"first_name":"Jonathan","full_name":"Jenderny, Jonathan","last_name":"Jenderny"},{"last_name":"Boysen","full_name":"Boysen, Nils","first_name":"Nils"},{"full_name":"Rubner, Jens","last_name":"Rubner","first_name":"Jens"},{"full_name":"Zysk, Frederik","last_name":"Zysk","first_name":"Frederik"},{"first_name":"Florian","full_name":"Preischel, Florian","last_name":"Preischel"},{"last_name":"de los Arcos de Pedro","orcid":"0000-0002-8684-273X ","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Varun Raj","full_name":"Damerla, Varun Raj","last_name":"Damerla"},{"full_name":"Kostka, Aleksander","last_name":"Kostka","first_name":"Aleksander"},{"last_name":"Franke","full_name":"Franke, Jonas","first_name":"Jonas"},{"first_name":"Rainer","full_name":"Dahlmann, Rainer","last_name":"Dahlmann"},{"full_name":"Kühne, Thomas D.","last_name":"Kühne","first_name":"Thomas D."},{"last_name":"Wessling","full_name":"Wessling, Matthias","first_name":"Matthias"},{"last_name":"Awakowicz","full_name":"Awakowicz, Peter","first_name":"Peter"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"date_updated":"2025-12-04T13:12:49Z","publisher":"Wiley","intvolume":"        11","citation":{"chicago":"Jenderny, Jonathan, Nils Boysen, Jens Rubner, Frederik Zysk, Florian Preischel, Maria Teresa de los Arcos de Pedro, Varun Raj Damerla, et al. “Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum.” <i>Advanced Materials Interfaces</i> 11, no. 28 (2024). <a href=\"https://doi.org/10.1002/admi.202400171\">https://doi.org/10.1002/admi.202400171</a>.","ieee":"J. Jenderny <i>et al.</i>, “Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum,” <i>Advanced Materials Interfaces</i>, vol. 11, no. 28, Art. no. 2400171, 2024, doi: <a href=\"https://doi.org/10.1002/admi.202400171\">10.1002/admi.202400171</a>.","ama":"Jenderny J, Boysen N, Rubner J, et al. Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum. <i>Advanced Materials Interfaces</i>. 2024;11(28). doi:<a href=\"https://doi.org/10.1002/admi.202400171\">10.1002/admi.202400171</a>","short":"J. Jenderny, N. Boysen, J. Rubner, F. Zysk, F. Preischel, M.T. de los Arcos de Pedro, V.R. Damerla, A. Kostka, J. Franke, R. Dahlmann, T.D. Kühne, M. Wessling, P. Awakowicz, A. Devi, Advanced Materials Interfaces 11 (2024).","bibtex":"@article{Jenderny_Boysen_Rubner_Zysk_Preischel_de los Arcos de Pedro_Damerla_Kostka_Franke_Dahlmann_et al._2024, title={Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum}, volume={11}, DOI={<a href=\"https://doi.org/10.1002/admi.202400171\">10.1002/admi.202400171</a>}, number={282400171}, journal={Advanced Materials Interfaces}, publisher={Wiley}, author={Jenderny, Jonathan and Boysen, Nils and Rubner, Jens and Zysk, Frederik and Preischel, Florian and de los Arcos de Pedro, Maria Teresa and Damerla, Varun Raj and Kostka, Aleksander and Franke, Jonas and Dahlmann, Rainer and et al.}, year={2024} }","mla":"Jenderny, Jonathan, et al. “Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum.” <i>Advanced Materials Interfaces</i>, vol. 11, no. 28, 2400171, Wiley, 2024, doi:<a href=\"https://doi.org/10.1002/admi.202400171\">10.1002/admi.202400171</a>.","apa":"Jenderny, J., Boysen, N., Rubner, J., Zysk, F., Preischel, F., de los Arcos de Pedro, M. T., Damerla, V. R., Kostka, A., Franke, J., Dahlmann, R., Kühne, T. D., Wessling, M., Awakowicz, P., &#38; Devi, A. (2024). Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum. <i>Advanced Materials Interfaces</i>, <i>11</i>(28), Article 2400171. <a href=\"https://doi.org/10.1002/admi.202400171\">https://doi.org/10.1002/admi.202400171</a>"},"year":"2024","issue":"28","publication_identifier":{"issn":["2196-7350","2196-7350"]},"publication_status":"published"},{"date_updated":"2023-08-11T14:13:19Z","publisher":"Elsevier BV","date_created":"2023-08-11T14:11:57Z","author":[{"first_name":"Hendrik","last_name":"Müller","full_name":"Müller, Hendrik"},{"first_name":"Christian","full_name":"Weinberger, Christian","id":"11848","last_name":"Weinberger"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"}],"volume":264,"title":"UV-enhanced environmental charge compensation in near ambient pressure XPS","doi":"10.1016/j.elspec.2023.147317","publication_status":"published","publication_identifier":{"issn":["0368-2048"]},"year":"2023","citation":{"mla":"Müller, Hendrik, et al. “UV-Enhanced Environmental Charge Compensation in near Ambient Pressure XPS.” <i>Journal of Electron Spectroscopy and Related Phenomena</i>, vol. 264, 147317, Elsevier BV, 2023, doi:<a href=\"https://doi.org/10.1016/j.elspec.2023.147317\">10.1016/j.elspec.2023.147317</a>.","bibtex":"@article{Müller_Weinberger_Grundmeier_de los Arcos de Pedro_2023, title={UV-enhanced environmental charge compensation in near ambient pressure XPS}, volume={264}, DOI={<a href=\"https://doi.org/10.1016/j.elspec.2023.147317\">10.1016/j.elspec.2023.147317</a>}, number={147317}, journal={Journal of Electron Spectroscopy and Related Phenomena}, publisher={Elsevier BV}, author={Müller, Hendrik and Weinberger, Christian and Grundmeier, Guido and de los Arcos de Pedro, Maria Teresa}, year={2023} }","short":"H. Müller, C. Weinberger, G. Grundmeier, M.T. de los Arcos de Pedro, Journal of Electron Spectroscopy and Related Phenomena 264 (2023).","apa":"Müller, H., Weinberger, C., Grundmeier, G., &#38; de los Arcos de Pedro, M. T. (2023). UV-enhanced environmental charge compensation in near ambient pressure XPS. <i>Journal of Electron Spectroscopy and Related Phenomena</i>, <i>264</i>, Article 147317. <a href=\"https://doi.org/10.1016/j.elspec.2023.147317\">https://doi.org/10.1016/j.elspec.2023.147317</a>","ieee":"H. Müller, C. Weinberger, G. Grundmeier, and M. T. de los Arcos de Pedro, “UV-enhanced environmental charge compensation in near ambient pressure XPS,” <i>Journal of Electron Spectroscopy and Related Phenomena</i>, vol. 264, Art. no. 147317, 2023, doi: <a href=\"https://doi.org/10.1016/j.elspec.2023.147317\">10.1016/j.elspec.2023.147317</a>.","chicago":"Müller, Hendrik, Christian Weinberger, Guido Grundmeier, and Maria Teresa de los Arcos de Pedro. “UV-Enhanced Environmental Charge Compensation in near Ambient Pressure XPS.” <i>Journal of Electron Spectroscopy and Related Phenomena</i> 264 (2023). <a href=\"https://doi.org/10.1016/j.elspec.2023.147317\">https://doi.org/10.1016/j.elspec.2023.147317</a>.","ama":"Müller H, Weinberger C, Grundmeier G, de los Arcos de Pedro MT. UV-enhanced environmental charge compensation in near ambient pressure XPS. <i>Journal of Electron Spectroscopy and Related Phenomena</i>. 2023;264. doi:<a href=\"https://doi.org/10.1016/j.elspec.2023.147317\">10.1016/j.elspec.2023.147317</a>"},"intvolume":"       264","_id":"46480","user_id":"54556","department":[{"_id":"302"}],"article_number":"147317","keyword":["Physical and Theoretical Chemistry","Spectroscopy","Condensed Matter Physics","Atomic and Molecular Physics","and Optics","Radiation","Electronic","Optical and Magnetic Materials"],"language":[{"iso":"eng"}],"type":"journal_article","publication":"Journal of Electron Spectroscopy and Related Phenomena","status":"public"},{"doi":"10.1007/s42452-023-05441-5","title":"Analysis of polycarbonate degradation at melt/FeCr-alloy interfaces as a function of the alloy composition by means of combinatorial thin film chemistry","volume":5,"date_created":"2025-02-12T14:47:24Z","author":[{"last_name":"Theile-Rasche","full_name":"Theile-Rasche, Chantal","first_name":"Chantal"},{"first_name":"T.","last_name":"Meng","full_name":"Meng, T."},{"first_name":"Maria Teresa","orcid":"0000-0002-8684-273X ","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556"},{"last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido","first_name":"Guido"}],"date_updated":"2025-02-12T14:55:33Z","intvolume":"         5","page":"1–12","citation":{"mla":"Theile-Rasche, Chantal, et al. “Analysis of Polycarbonate Degradation at Melt/FeCr-Alloy Interfaces as a Function of the Alloy Composition by Means of Combinatorial Thin Film Chemistry.” <i>SN Applied Sciences</i>, vol. 5, no. 10, 2023, pp. 1–12, doi:<a href=\"https://doi.org/10.1007/s42452-023-05441-5\">10.1007/s42452-023-05441-5</a>.","short":"C. Theile-Rasche, T. Meng, M.T. de los Arcos de Pedro, G. Grundmeier, SN Applied Sciences 5 (2023) 1–12.","bibtex":"@article{Theile-Rasche_Meng_de los Arcos de Pedro_Grundmeier_2023, title={Analysis of polycarbonate degradation at melt/FeCr-alloy interfaces as a function of the alloy composition by means of combinatorial thin film chemistry}, volume={5}, DOI={<a href=\"https://doi.org/10.1007/s42452-023-05441-5\">10.1007/s42452-023-05441-5</a>}, number={10}, journal={SN Applied Sciences}, author={Theile-Rasche, Chantal and Meng, T. and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2023}, pages={1–12} }","apa":"Theile-Rasche, C., Meng, T., de los Arcos de Pedro, M. T., &#38; Grundmeier, G. (2023). Analysis of polycarbonate degradation at melt/FeCr-alloy interfaces as a function of the alloy composition by means of combinatorial thin film chemistry. <i>SN Applied Sciences</i>, <i>5</i>(10), 1–12. <a href=\"https://doi.org/10.1007/s42452-023-05441-5\">https://doi.org/10.1007/s42452-023-05441-5</a>","ieee":"C. Theile-Rasche, T. Meng, M. T. de los Arcos de Pedro, and G. Grundmeier, “Analysis of polycarbonate degradation at melt/FeCr-alloy interfaces as a function of the alloy composition by means of combinatorial thin film chemistry,” <i>SN Applied Sciences</i>, vol. 5, no. 10, pp. 1–12, 2023, doi: <a href=\"https://doi.org/10.1007/s42452-023-05441-5\">10.1007/s42452-023-05441-5</a>.","chicago":"Theile-Rasche, Chantal, T. Meng, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Analysis of Polycarbonate Degradation at Melt/FeCr-Alloy Interfaces as a Function of the Alloy Composition by Means of Combinatorial Thin Film Chemistry.” <i>SN Applied Sciences</i> 5, no. 10 (2023): 1–12. <a href=\"https://doi.org/10.1007/s42452-023-05441-5\">https://doi.org/10.1007/s42452-023-05441-5</a>.","ama":"Theile-Rasche C, Meng T, de los Arcos de Pedro MT, Grundmeier G. Analysis of polycarbonate degradation at melt/FeCr-alloy interfaces as a function of the alloy composition by means of combinatorial thin film chemistry. <i>SN Applied Sciences</i>. 2023;5(10):1–12. doi:<a href=\"https://doi.org/10.1007/s42452-023-05441-5\">10.1007/s42452-023-05441-5</a>"},"year":"2023","issue":"10","publication_identifier":{"issn":["2523-3971"]},"language":[{"iso":"eng"}],"department":[{"_id":"302"}],"user_id":"54556","_id":"58608","status":"public","abstract":[{"lang":"eng","text":"Interfacial reactions at the polycarbonate (PC)/FeCr-alloy interface during melt contact were studied as function of the Fe:Cr ratio within the alloy. Thin Fe/Cr films with lateral composition gradients were deposited by magnetron sputtering; the analysis of the films was done with microscopy and X-ray photoelectron spectroscopy (XPS). The local interfacial polymeric film formation could be therefore directly correlated with the Fe:Cr ratio. The local thickness and structure of the formed polycarbonate residue was analyzed by means of imaging ellipsometry, atomic force microscopy as well as Fourier-transform infrared spectroscopy under grazing incidence and XPS. Moreover, confocal fluorescence microscopy of the PC melt/alloy interface could reveal the formation of minor degradation products in the interphase region. The results show that already an Fe:Cr ratio of 2 : 1 leads to a strong inhibition of the thermal degradation in comparison to the unalloyed iron, and that in general, the enrichment of chromium in the passive film leads to an effective suppression of interfacial PC degradation. The data contributes to improving the mechanistic understanding of the role of iron during this process. Additionally, a critical concentration of chromium in the alloys used for PC processing can be deduced."}],"publication":"SN Applied Sciences","type":"journal_article"},{"year":"2023","citation":{"chicago":"Arcos de Pedro, Maria Teresa de los, Peter Awakowicz, Marc Böke, Nils Boysen, Ralf Peter Brinkmann, Rainer Dahlmann, Anjana Devi, et al. “PECVD and PEALD on Polymer Substrates (Part II): Understanding and Tuning of Barrier and Membrane Properties of Thin Films.” <i>PLASMA PROCESSES AND POLYMERS</i>, 2023, e2300186. <a href=\"https://doi.org/10.1002/ppap.202300186\">https://doi.org/10.1002/ppap.202300186</a>.","ieee":"M. T. de los Arcos de Pedro <i>et al.</i>, “PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films,” <i>PLASMA PROCESSES AND POLYMERS</i>, p. e2300186, 2023, doi: <a href=\"https://doi.org/10.1002/ppap.202300186\">10.1002/ppap.202300186</a>.","ama":"de los Arcos de Pedro MT, Awakowicz P, Böke M, et al. PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films. <i>PLASMA PROCESSES AND POLYMERS</i>. Published online 2023:e2300186. doi:<a href=\"https://doi.org/10.1002/ppap.202300186\">10.1002/ppap.202300186</a>","bibtex":"@article{de los Arcos de Pedro_Awakowicz_Böke_Boysen_Brinkmann_Dahlmann_Devi_Eremin_Franke_Gergs_et al._2023, title={PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films}, DOI={<a href=\"https://doi.org/10.1002/ppap.202300186\">10.1002/ppap.202300186</a>}, journal={PLASMA PROCESSES AND POLYMERS}, author={de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Böke, Marc and Boysen, Nils and Brinkmann, Ralf Peter and Dahlmann, Rainer and Devi, Anjana and Eremin, Denis and Franke, Jonas and Gergs, Tobias and et al.}, year={2023}, pages={e2300186} }","short":"M.T. de los Arcos de Pedro, P. Awakowicz, M. Böke, N. Boysen, R.P. Brinkmann, R. Dahlmann, A. Devi, D. Eremin, J. Franke, T. Gergs, J. Jenderny, E. Kemaneci, T.D. Kühne, S. Kusmierz, T. Mussenbrock, J. Rubner, J. Trieschmann, M. Wessling, X. Xie, D. Zanders, F. Zysk, G. Grundmeier, PLASMA PROCESSES AND POLYMERS (2023) e2300186.","mla":"de los Arcos de Pedro, Maria Teresa, et al. “PECVD and PEALD on Polymer Substrates (Part II): Understanding and Tuning of Barrier and Membrane Properties of Thin Films.” <i>PLASMA PROCESSES AND POLYMERS</i>, 2023, p. e2300186, doi:<a href=\"https://doi.org/10.1002/ppap.202300186\">10.1002/ppap.202300186</a>.","apa":"de los Arcos de Pedro, M. T., Awakowicz, P., Böke, M., Boysen, N., Brinkmann, R. P., Dahlmann, R., Devi, A., Eremin, D., Franke, J., Gergs, T., Jenderny, J., Kemaneci, E., Kühne, T. D., Kusmierz, S., Mussenbrock, T., Rubner, J., Trieschmann, J., Wessling, M., Xie, X., … Grundmeier, G. (2023). PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films. <i>PLASMA PROCESSES AND POLYMERS</i>, e2300186. <a href=\"https://doi.org/10.1002/ppap.202300186\">https://doi.org/10.1002/ppap.202300186</a>"},"page":"e2300186","publication_identifier":{"issn":["1612-8850"]},"title":"PECVD and PEALD on polymer substrates (part II): Understanding and tuning of barrier and membrane properties of thin films","doi":"10.1002/ppap.202300186","date_updated":"2025-02-12T14:54:12Z","author":[{"orcid":"0000-0002-8684-273X ","last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"Peter","last_name":"Awakowicz","full_name":"Awakowicz, Peter"},{"last_name":"Böke","full_name":"Böke, Marc","first_name":"Marc"},{"full_name":"Boysen, Nils","last_name":"Boysen","first_name":"Nils"},{"first_name":"Ralf Peter","full_name":"Brinkmann, Ralf Peter","last_name":"Brinkmann"},{"last_name":"Dahlmann","full_name":"Dahlmann, Rainer","first_name":"Rainer"},{"first_name":"Anjana","last_name":"Devi","full_name":"Devi, Anjana"},{"first_name":"Denis","last_name":"Eremin","full_name":"Eremin, Denis"},{"full_name":"Franke, Jonas","last_name":"Franke","first_name":"Jonas"},{"first_name":"Tobias","last_name":"Gergs","full_name":"Gergs, Tobias"},{"first_name":"Jonathan","last_name":"Jenderny","full_name":"Jenderny, Jonathan"},{"last_name":"Kemaneci","full_name":"Kemaneci, Efe","first_name":"Efe"},{"full_name":"Kühne, Thomas D.","last_name":"Kühne","first_name":"Thomas D."},{"first_name":"Simon","last_name":"Kusmierz","full_name":"Kusmierz, Simon"},{"full_name":"Mussenbrock, Thomas","last_name":"Mussenbrock","first_name":"Thomas"},{"full_name":"Rubner, Jens","last_name":"Rubner","first_name":"Jens"},{"full_name":"Trieschmann, Jan","last_name":"Trieschmann","first_name":"Jan"},{"first_name":"Matthias","full_name":"Wessling, Matthias","last_name":"Wessling"},{"first_name":"Xiaofan","full_name":"Xie, Xiaofan","last_name":"Xie"},{"full_name":"Zanders, David","last_name":"Zanders","first_name":"David"},{"last_name":"Zysk","full_name":"Zysk, Frederik","first_name":"Frederik"},{"first_name":"Guido","full_name":"Grundmeier, Guido","id":"194","last_name":"Grundmeier"}],"date_created":"2025-02-12T14:47:57Z","abstract":[{"text":"Plasma Processes and Polymers is a plasma journal focusing on the interdisciplinary field of low temperature plasma science.","lang":"eng"}],"status":"public","type":"journal_article","publication":"PLASMA PROCESSES AND POLYMERS","language":[{"iso":"eng"}],"_id":"58609","user_id":"54556","department":[{"_id":"302"}]},{"language":[{"iso":"eng"}],"user_id":"54556","department":[{"_id":"302"}],"_id":"58610","status":"public","type":"journal_article","publication":"PLASMA PROCESSES AND POLYMERS","doi":"10.1002/ppap.202300150","title":"PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth","date_created":"2025-02-12T14:48:27Z","author":[{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","orcid":"0000-0002-8684-273X ","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"first_name":"Peter","full_name":"Awakowicz, Peter","last_name":"Awakowicz"},{"full_name":"Benedikt, Jan","last_name":"Benedikt","first_name":"Jan"},{"first_name":"Beatrix","full_name":"Biskup, Beatrix","last_name":"Biskup"},{"first_name":"Marc","last_name":"Böke","full_name":"Böke, Marc"},{"first_name":"Nils","last_name":"Boysen","full_name":"Boysen, Nils"},{"first_name":"Rahel","full_name":"Buschhaus, Rahel","last_name":"Buschhaus"},{"full_name":"Dahlmann, Rainer","last_name":"Dahlmann","first_name":"Rainer"},{"first_name":"Anjana","last_name":"Devi","full_name":"Devi, Anjana"},{"first_name":"Tobias","last_name":"Gergs","full_name":"Gergs, Tobias"},{"first_name":"Jonathan","last_name":"Jenderny","full_name":"Jenderny, Jonathan"},{"first_name":"Achim","full_name":"von Keudell, Achim","last_name":"von Keudell"},{"full_name":"Kühne, Thomas D.","last_name":"Kühne","first_name":"Thomas D."},{"full_name":"Kusmierz, Simon","last_name":"Kusmierz","first_name":"Simon"},{"last_name":"Müller","full_name":"Müller, Hendrik","first_name":"Hendrik"},{"last_name":"Mussenbrock","full_name":"Mussenbrock, Thomas","first_name":"Thomas"},{"last_name":"Trieschmann","full_name":"Trieschmann, Jan","first_name":"Jan"},{"first_name":"David","full_name":"Zanders, David","last_name":"Zanders"},{"first_name":"Frederik","last_name":"Zysk","full_name":"Zysk, Frederik"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","first_name":"Guido"}],"date_updated":"2025-02-12T14:54:43Z","citation":{"ama":"de los Arcos de Pedro MT, Awakowicz P, Benedikt J, et al. PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth. <i>PLASMA PROCESSES AND POLYMERS</i>. Published online 2023:e2300150. doi:<a href=\"https://doi.org/10.1002/ppap.202300150\">10.1002/ppap.202300150</a>","chicago":"Arcos de Pedro, Maria Teresa de los, Peter Awakowicz, Jan Benedikt, Beatrix Biskup, Marc Böke, Nils Boysen, Rahel Buschhaus, et al. “PECVD and PEALD on Polymer Substrates (Part I): Fundamentals and Analysis of Plasma Activation and Thin Film Growth.” <i>PLASMA PROCESSES AND POLYMERS</i>, 2023, e2300150. <a href=\"https://doi.org/10.1002/ppap.202300150\">https://doi.org/10.1002/ppap.202300150</a>.","ieee":"M. T. de los Arcos de Pedro <i>et al.</i>, “PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth,” <i>PLASMA PROCESSES AND POLYMERS</i>, p. e2300150, 2023, doi: <a href=\"https://doi.org/10.1002/ppap.202300150\">10.1002/ppap.202300150</a>.","apa":"de los Arcos de Pedro, M. T., Awakowicz, P., Benedikt, J., Biskup, B., Böke, M., Boysen, N., Buschhaus, R., Dahlmann, R., Devi, A., Gergs, T., Jenderny, J., von Keudell, A., Kühne, T. D., Kusmierz, S., Müller, H., Mussenbrock, T., Trieschmann, J., Zanders, D., Zysk, F., &#38; Grundmeier, G. (2023). PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth. <i>PLASMA PROCESSES AND POLYMERS</i>, e2300150. <a href=\"https://doi.org/10.1002/ppap.202300150\">https://doi.org/10.1002/ppap.202300150</a>","bibtex":"@article{de los Arcos de Pedro_Awakowicz_Benedikt_Biskup_Böke_Boysen_Buschhaus_Dahlmann_Devi_Gergs_et al._2023, title={PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth}, DOI={<a href=\"https://doi.org/10.1002/ppap.202300150\">10.1002/ppap.202300150</a>}, journal={PLASMA PROCESSES AND POLYMERS}, author={de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Benedikt, Jan and Biskup, Beatrix and Böke, Marc and Boysen, Nils and Buschhaus, Rahel and Dahlmann, Rainer and Devi, Anjana and Gergs, Tobias and et al.}, year={2023}, pages={e2300150} }","short":"M.T. de los Arcos de Pedro, P. Awakowicz, J. Benedikt, B. Biskup, M. Böke, N. Boysen, R. Buschhaus, R. Dahlmann, A. Devi, T. Gergs, J. Jenderny, A. von Keudell, T.D. Kühne, S. Kusmierz, H. Müller, T. Mussenbrock, J. Trieschmann, D. Zanders, F. Zysk, G. 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T., Devi, A., &#38; Grundmeier, G. (2023). Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al 2 O 3 atomic layer deposition. <i>Surface and Interface Analysis</i>. <a href=\"https://doi.org/10.1002/sia.7256\">https://doi.org/10.1002/sia.7256</a>","bibtex":"@article{Xie_Zanders_Preischel_de los Arcos de Pedro_Devi_Grundmeier_2023, title={Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al 2 O 3 atomic layer deposition}, DOI={<a href=\"https://doi.org/10.1002/sia.7256\">10.1002/sia.7256</a>}, journal={Surface and Interface Analysis}, author={Xie, Xiaofan and Zanders, David and Preischel, Florian and de los Arcos de Pedro, Maria Teresa and Devi, Anjana and Grundmeier, Guido}, year={2023} }","short":"X. Xie, D. Zanders, F. Preischel, M.T. de los Arcos de Pedro, A. Devi, G. Grundmeier, Surface and Interface Analysis (2023).","mla":"Xie, Xiaofan, et al. “Complementary Spectroscopic and Electrochemical Analysis of the Sealing of Micropores in Hexamethyldisilazane Plasma Polymer Films by Al 2 O 3 Atomic Layer Deposition.” <i>Surface and Interface Analysis</i>, 2023, doi:<a href=\"https://doi.org/10.1002/sia.7256\">10.1002/sia.7256</a>.","ama":"Xie X, Zanders D, Preischel F, de los Arcos de Pedro MT, Devi A, Grundmeier G. Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al 2 O 3 atomic layer deposition. <i>Surface and Interface Analysis</i>. Published online 2023. doi:<a href=\"https://doi.org/10.1002/sia.7256\">10.1002/sia.7256</a>","chicago":"Xie, Xiaofan, David Zanders, Florian Preischel, Maria Teresa de los Arcos de Pedro, Anjana Devi, and Guido Grundmeier. “Complementary Spectroscopic and Electrochemical Analysis of the Sealing of Micropores in Hexamethyldisilazane Plasma Polymer Films by Al 2 O 3 Atomic Layer Deposition.” <i>Surface and Interface Analysis</i>, 2023. <a href=\"https://doi.org/10.1002/sia.7256\">https://doi.org/10.1002/sia.7256</a>.","ieee":"X. Xie, D. Zanders, F. Preischel, M. T. de los Arcos de Pedro, A. Devi, and G. Grundmeier, “Complementary spectroscopic and electrochemical analysis of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al 2 O 3 atomic layer deposition,” <i>Surface and Interface Analysis</i>, 2023, doi: <a href=\"https://doi.org/10.1002/sia.7256\">10.1002/sia.7256</a>."},"year":"2023","publication_identifier":{"issn":["0142-2421"]}},{"doi":"10.1002/admi.202200962","title":"High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development","volume":9,"author":[{"id":"46952","full_name":"Bürger, Julius","last_name":"Bürger","first_name":"Julius"},{"last_name":"Venugopal","full_name":"Venugopal, Harikrishnan","first_name":"Harikrishnan"},{"id":"44586","full_name":"Kool, Daniel","last_name":"Kool","first_name":"Daniel"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"Alejandro","full_name":"Gonzalez Orive, Alejandro","last_name":"Gonzalez Orive"},{"first_name":"Guido","last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido"},{"first_name":"Katharina","last_name":"Brassat","full_name":"Brassat, Katharina","id":"11305"},{"last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797","first_name":"Jörg"}],"date_created":"2022-11-15T14:00:19Z","publisher":"Wiley","date_updated":"2023-01-11T10:10:59Z","intvolume":"         9","citation":{"bibtex":"@article{Bürger_Venugopal_Kool_de los Arcos de Pedro_Gonzalez Orive_Grundmeier_Brassat_Lindner_2022, title={High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development}, volume={9}, DOI={<a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>}, number={262200962}, journal={Advanced Materials Interfaces}, publisher={Wiley}, author={Bürger, Julius and Venugopal, Harikrishnan and Kool, Daniel and de los Arcos de Pedro, Maria Teresa and Gonzalez Orive, Alejandro and Grundmeier, Guido and Brassat, Katharina and Lindner, Jörg}, year={2022} }","mla":"Bürger, Julius, et al. “High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development.” <i>Advanced Materials Interfaces</i>, vol. 9, no. 26, 2200962, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>.","short":"J. Bürger, H. Venugopal, D. Kool, M.T. de los Arcos de Pedro, A. Gonzalez Orive, G. Grundmeier, K. Brassat, J. Lindner, Advanced Materials Interfaces 9 (2022).","apa":"Bürger, J., Venugopal, H., Kool, D., de los Arcos de Pedro, M. T., Gonzalez Orive, A., Grundmeier, G., Brassat, K., &#38; Lindner, J. (2022). High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development. <i>Advanced Materials Interfaces</i>, <i>9</i>(26), Article 2200962. <a href=\"https://doi.org/10.1002/admi.202200962\">https://doi.org/10.1002/admi.202200962</a>","ieee":"J. Bürger <i>et al.</i>, “High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development,” <i>Advanced Materials Interfaces</i>, vol. 9, no. 26, Art. no. 2200962, 2022, doi: <a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>.","chicago":"Bürger, Julius, Harikrishnan Venugopal, Daniel Kool, Maria Teresa de los Arcos de Pedro, Alejandro Gonzalez Orive, Guido Grundmeier, Katharina Brassat, and Jörg Lindner. “High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development.” <i>Advanced Materials Interfaces</i> 9, no. 26 (2022). <a href=\"https://doi.org/10.1002/admi.202200962\">https://doi.org/10.1002/admi.202200962</a>.","ama":"Bürger J, Venugopal H, Kool D, et al. High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical PS‐            <i>b</i>            ‐PMMA Block Copolymer Nanomasks during Mask Development. <i>Advanced Materials Interfaces</i>. 2022;9(26). doi:<a href=\"https://doi.org/10.1002/admi.202200962\">10.1002/admi.202200962</a>"},"year":"2022","issue":"26","publication_identifier":{"issn":["2196-7350","2196-7350"]},"publication_status":"published","language":[{"iso":"eng"}],"keyword":["General Medicine"],"article_number":"2200962","department":[{"_id":"15"},{"_id":"230"}],"user_id":"54556","_id":"34086","status":"public","publication":"Advanced Materials Interfaces","type":"journal_article"},{"citation":{"ieee":"C. Hoppe <i>et al.</i>, “Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS,” <i>Plasma Processes and Polymers</i>, vol. 19, no. 4, Art. no. 2100174, 2022, doi: <a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>.","chicago":"Hoppe, Christian, Felix Mitschker, Lukas Mai, Maciej Oskar Liedke, Maria Teresa de los Arcos de Pedro, Peter Awakowicz, Anjana Devi, et al. “Influence of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            Thin Films on PDMS.” <i>Plasma Processes and Polymers</i> 19, no. 4 (2022). <a href=\"https://doi.org/10.1002/ppap.202100174\">https://doi.org/10.1002/ppap.202100174</a>.","ama":"Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS. <i>Plasma Processes and Polymers</i>. 2022;19(4). doi:<a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>","mla":"Hoppe, Christian, et al. “Influence of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            Thin Films on PDMS.” <i>Plasma Processes and Polymers</i>, vol. 19, no. 4, 2100174, Wiley, 2022, doi:<a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>.","short":"C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, M.T. de los Arcos de Pedro, P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier, Plasma Processes and Polymers 19 (2022).","bibtex":"@article{Hoppe_Mitschker_Mai_Liedke_de los Arcos de Pedro_Awakowicz_Devi_Attallah_Butterling_Wagner_et al._2022, title={Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS}, volume={19}, DOI={<a href=\"https://doi.org/10.1002/ppap.202100174\">10.1002/ppap.202100174</a>}, number={42100174}, journal={Plasma Processes and Polymers}, publisher={Wiley}, author={Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej Oskar and de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Devi, Anjana and Attallah, Ahmed Gamal and Butterling, Maik and Wagner, Andreas and et al.}, year={2022} }","apa":"Hoppe, C., Mitschker, F., Mai, L., Liedke, M. O., de los Arcos de Pedro, M. T., Awakowicz, P., Devi, A., Attallah, A. G., Butterling, M., Wagner, A., &#38; Grundmeier, G. (2022). Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS. <i>Plasma Processes and Polymers</i>, <i>19</i>(4), Article 2100174. <a href=\"https://doi.org/10.1002/ppap.202100174\">https://doi.org/10.1002/ppap.202100174</a>"},"intvolume":"        19","year":"2022","issue":"4","publication_status":"published","publication_identifier":{"issn":["1612-8850","1612-8869"]},"doi":"10.1002/ppap.202100174","title":"Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO            <sub>              <i>x</i>            </sub>            thin films on PDMS","author":[{"first_name":"Christian","last_name":"Hoppe","full_name":"Hoppe, Christian"},{"full_name":"Mitschker, Felix","last_name":"Mitschker","first_name":"Felix"},{"first_name":"Lukas","last_name":"Mai","full_name":"Mai, Lukas"},{"full_name":"Liedke, Maciej Oskar","last_name":"Liedke","first_name":"Maciej Oskar"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"full_name":"Awakowicz, Peter","last_name":"Awakowicz","first_name":"Peter"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"},{"full_name":"Attallah, Ahmed Gamal","last_name":"Attallah","first_name":"Ahmed Gamal"},{"first_name":"Maik","full_name":"Butterling, Maik","last_name":"Butterling"},{"last_name":"Wagner","full_name":"Wagner, Andreas","first_name":"Andreas"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","first_name":"Guido"}],"date_created":"2023-01-11T10:10:09Z","volume":19,"date_updated":"2023-01-24T08:07:46Z","publisher":"Wiley","status":"public","type":"journal_article","publication":"Plasma Processes and Polymers","language":[{"iso":"eng"}],"article_number":"2100174","keyword":["Polymers and Plastics","Condensed Matter Physics"],"user_id":"54556","department":[{"_id":"302"}],"_id":"35977"},{"publisher":"Elsevier BV","date_updated":"2023-01-24T08:10:06Z","author":[{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"full_name":"Weinberger, Christian","last_name":"Weinberger","first_name":"Christian"},{"last_name":"Zysk","full_name":"Zysk, Frederik","first_name":"Frederik"},{"first_name":"Varun","full_name":"Raj Damerla, Varun","last_name":"Raj Damerla"},{"last_name":"Kollmann","full_name":"Kollmann, Sabrina","first_name":"Sabrina"},{"first_name":"Pascal","last_name":"Vieth","full_name":"Vieth, Pascal"},{"first_name":"Michael","full_name":"Tiemann, Michael","last_name":"Tiemann"},{"first_name":"Thomas D.","last_name":"Kühne","full_name":"Kühne, Thomas D."},{"full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"}],"date_created":"2023-01-11T10:09:49Z","volume":604,"title":"Challenges in the interpretation of gas core levels for the determination of gas-solid interactions within dielectric porous films by ambient pressure XPS","doi":"10.1016/j.apsusc.2022.154525","publication_status":"published","publication_identifier":{"issn":["0169-4332"]},"year":"2022","citation":{"ama":"de los Arcos de Pedro MT, Weinberger C, Zysk F, et al. Challenges in the interpretation of gas core levels for the determination of gas-solid interactions within dielectric porous films by ambient pressure XPS. <i>Applied Surface Science</i>. 2022;604. doi:<a href=\"https://doi.org/10.1016/j.apsusc.2022.154525\">10.1016/j.apsusc.2022.154525</a>","chicago":"Arcos de Pedro, Maria Teresa de los, Christian Weinberger, Frederik Zysk, Varun Raj Damerla, Sabrina Kollmann, Pascal Vieth, Michael Tiemann, Thomas D. Kühne, and Guido Grundmeier. “Challenges in the Interpretation of Gas Core Levels for the Determination of Gas-Solid Interactions within Dielectric Porous Films by Ambient Pressure XPS.” <i>Applied Surface Science</i> 604 (2022). <a href=\"https://doi.org/10.1016/j.apsusc.2022.154525\">https://doi.org/10.1016/j.apsusc.2022.154525</a>.","ieee":"M. T. de los Arcos de Pedro <i>et al.</i>, “Challenges in the interpretation of gas core levels for the determination of gas-solid interactions within dielectric porous films by ambient pressure XPS,” <i>Applied Surface Science</i>, vol. 604, Art. no. 154525, 2022, doi: <a href=\"https://doi.org/10.1016/j.apsusc.2022.154525\">10.1016/j.apsusc.2022.154525</a>.","short":"M.T. de los Arcos de Pedro, C. Weinberger, F. Zysk, V. Raj Damerla, S. Kollmann, P. Vieth, M. Tiemann, T.D. Kühne, G. 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T., Weinberger, C., Zysk, F., Raj Damerla, V., Kollmann, S., Vieth, P., Tiemann, M., Kühne, T. D., &#38; Grundmeier, G. (2022). Challenges in the interpretation of gas core levels for the determination of gas-solid interactions within dielectric porous films by ambient pressure XPS. <i>Applied Surface Science</i>, <i>604</i>, Article 154525. <a href=\"https://doi.org/10.1016/j.apsusc.2022.154525\">https://doi.org/10.1016/j.apsusc.2022.154525</a>"},"intvolume":"       604","_id":"35976","user_id":"54556","department":[{"_id":"302"}],"article_number":"154525","keyword":["Surfaces","Coatings and Films","Condensed Matter Physics","Surfaces and Interfaces","General Physics and Astronomy","General Chemistry"],"language":[{"iso":"eng"}],"type":"journal_article","publication":"Applied Surface Science","status":"public"},{"title":"Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation","doi":"10.1002/ppap.202200052","publisher":"Wiley","date_updated":"2023-01-24T08:48:44Z","date_created":"2023-01-11T10:08:25Z","author":[{"first_name":"Xiaofan","full_name":"Xie, Xiaofan","last_name":"Xie"},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"}],"volume":19,"year":"2022","citation":{"chicago":"Xie, Xiaofan, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane Plasma Polymer Thin Films before and after Plasma Oxidation.” <i>Plasma Processes and Polymers</i> 19, no. 11 (2022). <a href=\"https://doi.org/10.1002/ppap.202200052\">https://doi.org/10.1002/ppap.202200052</a>.","ieee":"X. 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Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation. <i>Plasma Processes and Polymers</i>, <i>19</i>(11), Article 2200052. <a href=\"https://doi.org/10.1002/ppap.202200052\">https://doi.org/10.1002/ppap.202200052</a>","short":"X. Xie, M.T. de los Arcos de Pedro, G. 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Oxidation stability of chromium aluminum oxynitride hard coatings. <i>Surface and Coatings Technology</i>. 2022;449. doi:<a href=\"https://doi.org/10.1016/j.surfcoat.2022.128927\">10.1016/j.surfcoat.2022.128927</a>","short":"K. Bobzin, C. Kalscheuer, G. Grundmeier, S. Kollmann, M. Carlet, M.T. de los Arcos de Pedro, Surface and Coatings Technology 449 (2022).","bibtex":"@article{Bobzin_Kalscheuer_Grundmeier_Kollmann_Carlet_de los Arcos de Pedro_2022, title={Oxidation stability of chromium aluminum oxynitride hard coatings}, volume={449}, DOI={<a href=\"https://doi.org/10.1016/j.surfcoat.2022.128927\">10.1016/j.surfcoat.2022.128927</a>}, number={128927}, journal={Surface and Coatings Technology}, publisher={Elsevier BV}, author={Bobzin, K. and Kalscheuer, C. and Grundmeier, Guido and Kollmann, S. and Carlet, M. and de los Arcos de Pedro, Maria Teresa}, year={2022} }","mla":"Bobzin, K., et al. “Oxidation Stability of Chromium Aluminum Oxynitride Hard Coatings.” <i>Surface and Coatings Technology</i>, vol. 449, 128927, Elsevier BV, 2022, doi:<a href=\"https://doi.org/10.1016/j.surfcoat.2022.128927\">10.1016/j.surfcoat.2022.128927</a>.","apa":"Bobzin, K., Kalscheuer, C., Grundmeier, G., Kollmann, S., Carlet, M., &#38; de los Arcos de Pedro, M. T. (2022). 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In situ backside Raman spectroscopy of zinc oxide nanorods in an atmospheric‐pressure dielectric barrier discharge plasma. <i>Journal of Raman Spectroscopy</i>, <i>52</i>(7), 1237–1245. <a href=\"https://doi.org/10.1002/jrs.6123\">https://doi.org/10.1002/jrs.6123</a>","short":"S. Knust, L. Ruhm, A. Kuhlmann, D. Meinderink, J. Bürger, J. Lindner, M.T. de los Arcos de Pedro, G. 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T. de los Arcos de Pedro <i>et al.</i>, “Review of infrared spectroscopy techniques for the determination of internal structure in thin SiO2 films,” <i>Vibrational Spectroscopy</i>, Art. no. 103256, 2021, doi: <a href=\"https://doi.org/10.1016/j.vibspec.2021.103256\">10.1016/j.vibspec.2021.103256</a>.","chicago":"Arcos de Pedro, Maria Teresa de los, Hendrik Müller, Fuzeng Wang, Varun Raj Damerla, Christian Hoppe, Christian Weinberger, Michael Tiemann, and Guido Grundmeier. “Review of Infrared Spectroscopy Techniques for the Determination of Internal Structure in Thin SiO2 Films.” <i>Vibrational Spectroscopy</i>, 2021. <a href=\"https://doi.org/10.1016/j.vibspec.2021.103256\">https://doi.org/10.1016/j.vibspec.2021.103256</a>.","ama":"de los Arcos de Pedro MT, Müller H, Wang F, et al. Review of infrared spectroscopy techniques for the determination of internal structure in thin SiO2 films. <i>Vibrational Spectroscopy</i>. Published online 2021. doi:<a href=\"https://doi.org/10.1016/j.vibspec.2021.103256\">10.1016/j.vibspec.2021.103256</a>"},"year":"2021","user_id":"54556","department":[{"_id":"302"}],"_id":"22538","language":[{"iso":"eng"}],"article_number":"103256","type":"journal_article","publication":"Vibrational Spectroscopy","status":"public"},{"date_updated":"2023-01-24T08:33:14Z","date_created":"2021-07-07T08:38:02Z","author":[{"first_name":"K.","full_name":"Bobzin, K.","last_name":"Bobzin"},{"first_name":"C.","full_name":"Kalscheuer, C.","last_name":"Kalscheuer"},{"first_name":"G.","last_name":"Grundmeier","full_name":"Grundmeier, G."},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"full_name":"Schwiderek, S.","last_name":"Schwiderek","first_name":"S."},{"first_name":"M.","last_name":"Carlet","full_name":"Carlet, M."}],"title":"Design of a TiAlON multilayer coating: Oxidation stability and deformation behavior","doi":"10.1016/j.surfcoat.2021.127417","publication_status":"published","publication_identifier":{"issn":["0257-8972"]},"year":"2021","citation":{"apa":"Bobzin, K., Kalscheuer, C., Grundmeier, G., de los Arcos de Pedro, M. T., Schwiderek, S., &#38; Carlet, M. (2021). Design of a TiAlON multilayer coating: Oxidation stability and deformation behavior. <i>Surface and Coatings Technology</i>, Article 127417. <a href=\"https://doi.org/10.1016/j.surfcoat.2021.127417\">https://doi.org/10.1016/j.surfcoat.2021.127417</a>","bibtex":"@article{Bobzin_Kalscheuer_Grundmeier_de los Arcos de Pedro_Schwiderek_Carlet_2021, title={Design of a TiAlON multilayer coating: Oxidation stability and deformation behavior}, DOI={<a href=\"https://doi.org/10.1016/j.surfcoat.2021.127417\">10.1016/j.surfcoat.2021.127417</a>}, number={127417}, journal={Surface and Coatings Technology}, author={Bobzin, K. and Kalscheuer, C. and Grundmeier, G. and de los Arcos de Pedro, Maria Teresa and Schwiderek, S. and Carlet, M.}, year={2021} }","short":"K. Bobzin, C. Kalscheuer, G. Grundmeier, M.T. de los Arcos de Pedro, S. Schwiderek, M. Carlet, Surface and Coatings Technology (2021).","mla":"Bobzin, K., et al. “Design of a TiAlON Multilayer Coating: Oxidation Stability and Deformation Behavior.” <i>Surface and Coatings Technology</i>, 127417, 2021, doi:<a href=\"https://doi.org/10.1016/j.surfcoat.2021.127417\">10.1016/j.surfcoat.2021.127417</a>.","ama":"Bobzin K, Kalscheuer C, Grundmeier G, de los Arcos de Pedro MT, Schwiderek S, Carlet M. Design of a TiAlON multilayer coating: Oxidation stability and deformation behavior. <i>Surface and Coatings Technology</i>. Published online 2021. doi:<a href=\"https://doi.org/10.1016/j.surfcoat.2021.127417\">10.1016/j.surfcoat.2021.127417</a>","chicago":"Bobzin, K., C. Kalscheuer, G. Grundmeier, Maria Teresa de los Arcos de Pedro, S. Schwiderek, and M. Carlet. “Design of a TiAlON Multilayer Coating: Oxidation Stability and Deformation Behavior.” <i>Surface and Coatings Technology</i>, 2021. <a href=\"https://doi.org/10.1016/j.surfcoat.2021.127417\">https://doi.org/10.1016/j.surfcoat.2021.127417</a>.","ieee":"K. Bobzin, C. Kalscheuer, G. Grundmeier, M. T. de los Arcos de Pedro, S. Schwiderek, and M. Carlet, “Design of a TiAlON multilayer coating: Oxidation stability and deformation behavior,” <i>Surface and Coatings Technology</i>, Art. no. 127417, 2021, doi: <a href=\"https://doi.org/10.1016/j.surfcoat.2021.127417\">10.1016/j.surfcoat.2021.127417</a>."},"_id":"22539","user_id":"54556","department":[{"_id":"302"}],"article_number":"127417","language":[{"iso":"eng"}],"type":"journal_article","publication":"Surface and Coatings Technology","status":"public"}]