---
_id: '58613'
abstract:
- lang: eng
text: Self-assembled DNA origami lattices on silicon oxide surfaces have great potential
to serve as masks in molecular lithography. However, silicon oxide surfaces come
in many different forms and the type and history of the silicon oxide has a large
effect on its physicochemical surface properties. Therefore, we here investigate
DNA origami lattice formation on differently fabricated SiOx films on silicon
wafers after wet-chemical oxidation by RCA1. Despite having similar oxide compositions
and hydroxylation states, of all surfaces tested, only thermally grown SiOx performs
similarly well as native oxide. For the other SiOx films deposited by plasma-enhanced
chemical vapor deposition and magnetron sputtering, DNA origami adsorption is
strongly suppressed. This is attributed to an increased surface roughness and
a lower oxide density, respectively. Our results demonstrate that the employed
SiOx surface may decide over the outcome of an experiment and should be considered
as an additional parameter that may require optimization and fine-tuning before
high-quality lattices can be assembled. In particular, our observations suggest
that efficient DNA origami lattice assembly on SiOx surfaces requires a low surface
roughness and a high oxide density.
author:
- first_name: Bhanu Kiran
full_name: Pothineni, Bhanu Kiran
last_name: Pothineni
- first_name: Chantal
full_name: Theile-Rasche, Chantal
last_name: Theile-Rasche
- first_name: Hendrik
full_name: Müller, Hendrik
last_name: Müller
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Adrian
full_name: Keller, Adrian
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
citation:
ama: Pothineni BK, Theile-Rasche C, Müller H, Grundmeier G, de los Arcos de Pedro
MT, Keller A. DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces.
Chemistry – A European Journal. Published online 2025:e202404108. doi:10.1002/chem.202404108
apa: Pothineni, B. K., Theile-Rasche, C., Müller, H., Grundmeier, G., de los Arcos
de Pedro, M. T., & Keller, A. (2025). DNA Origami Adsorption and Lattice Formation
on Different SiOx Surfaces. Chemistry – A European Journal, e202404108.
https://doi.org/10.1002/chem.202404108
bibtex: '@article{Pothineni_Theile-Rasche_Müller_Grundmeier_de los Arcos de Pedro_Keller_2025,
title={DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces},
DOI={10.1002/chem.202404108},
journal={Chemistry – A European Journal}, author={Pothineni, Bhanu Kiran and Theile-Rasche,
Chantal and Müller, Hendrik and Grundmeier, Guido and de los Arcos de Pedro, Maria
Teresa and Keller, Adrian}, year={2025}, pages={e202404108} }'
chicago: Pothineni, Bhanu Kiran, Chantal Theile-Rasche, Hendrik Müller, Guido Grundmeier,
Maria Teresa de los Arcos de Pedro, and Adrian Keller. “DNA Origami Adsorption
and Lattice Formation on Different SiOx Surfaces.” Chemistry – A European Journal,
2025, e202404108. https://doi.org/10.1002/chem.202404108.
ieee: 'B. K. Pothineni, C. Theile-Rasche, H. Müller, G. Grundmeier, M. T. de los
Arcos de Pedro, and A. Keller, “DNA Origami Adsorption and Lattice Formation on
Different SiOx Surfaces,” Chemistry – A European Journal, p. e202404108,
2025, doi: 10.1002/chem.202404108.'
mla: Pothineni, Bhanu Kiran, et al. “DNA Origami Adsorption and Lattice Formation
on Different SiOx Surfaces.” Chemistry – A European Journal, 2025, p. e202404108,
doi:10.1002/chem.202404108.
short: B.K. Pothineni, C. Theile-Rasche, H. Müller, G. Grundmeier, M.T. de los Arcos
de Pedro, A. Keller, Chemistry – A European Journal (2025) e202404108.
date_created: 2025-02-12T14:49:48Z
date_updated: 2025-06-10T09:10:16Z
department:
- _id: '302'
doi: 10.1002/chem.202404108
language:
- iso: eng
page: e202404108
publication: Chemistry – A European Journal
status: public
title: DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces
type: journal_article
user_id: '48864'
year: '2025'
...
---
_id: '62876'
abstract:
- lang: eng
text: "ABSTRACT\r\n Spin‐coated
polylactide (PLA) thin films were exposed to nitrogen plasma for varying time
intervals. The progressive etching of the PLA film in direct contact with the
nitrogen plasma was monitored in situ using polarization modulated infrared reflection
absorption spectroscopy (PM‐IRRAS). No appreciative changes in composition were
seen with PM‐IRRAS, indicating that the etching did not significantly affect the
bulk composition. Atomic force microscopy characterization of the plasma‐etched
films showed that the PLA films are homogeneously etched. Subsequent ex situ XPS
analysis of the treated surface revealed the presence of C‐N bonds in the surface‐near
region that could be associated with amino and/or amide surface species. PLA films
were also alternatively exposed to nitrogen ion beams produced by an electron‐cyclotron‐resonance
(ECR) plasma source and were investigated in vacuo by XPS. This treatment revealed
the partial substitution of surface oxygen species by nitrogen, resulting in a
similar surface modification as in the plasma case. The comparison of XPS data
and water contact angle studies suggest that the activated surfaces show a reorientation
of macromolecular fragments in the surface‐near region depending on the polarity
of the phase with which they are in contact. Under ultra‐high vacuum (UHV) conditions,
the surface tends to lower its surface energy, while in contact with the aqueous
phase, subsurface polar groups orientate outwards, which enables the formation
of hydrogen bonds."
author:
- first_name: Sandra
full_name: Gołębiowska, Sandra
last_name: Gołębiowska
- first_name: Markus
full_name: Voigt, Markus
last_name: Voigt
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Gołębiowska S, Voigt M, de los Arcos de Pedro MT, Grundmeier G. In Situ PM‐IRRAS
and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide Thin Films.
Surface and Interface Analysis. 2025;57(7):499-509. doi:10.1002/sia.7406
apa: Gołębiowska, S., Voigt, M., de los Arcos de Pedro, M. T., & Grundmeier,
G. (2025). In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification
of Polylactide Thin Films. Surface and Interface Analysis, 57(7),
499–509. https://doi.org/10.1002/sia.7406
bibtex: '@article{Gołębiowska_Voigt_de los Arcos de Pedro_Grundmeier_2025, title={In
Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide
Thin Films}, volume={57}, DOI={10.1002/sia.7406},
number={7}, journal={Surface and Interface Analysis}, publisher={Wiley}, author={Gołębiowska,
Sandra and Voigt, Markus and de los Arcos de Pedro, Maria Teresa and Grundmeier,
Guido}, year={2025}, pages={499–509} }'
chicago: 'Gołębiowska, Sandra, Markus Voigt, Maria Teresa de los Arcos de Pedro,
and Guido Grundmeier. “In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface
Modification of Polylactide Thin Films.” Surface and Interface Analysis
57, no. 7 (2025): 499–509. https://doi.org/10.1002/sia.7406.'
ieee: 'S. Gołębiowska, M. Voigt, M. T. de los Arcos de Pedro, and G. Grundmeier,
“In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of
Polylactide Thin Films,” Surface and Interface Analysis, vol. 57, no. 7,
pp. 499–509, 2025, doi: 10.1002/sia.7406.'
mla: Gołębiowska, Sandra, et al. “In Situ PM‐IRRAS and XPS Analysis of Nitrogen
Plasma Surface Modification of Polylactide Thin Films.” Surface and Interface
Analysis, vol. 57, no. 7, Wiley, 2025, pp. 499–509, doi:10.1002/sia.7406.
short: S. Gołębiowska, M. Voigt, M.T. de los Arcos de Pedro, G. Grundmeier, Surface
and Interface Analysis 57 (2025) 499–509.
date_created: 2025-12-04T13:12:03Z
date_updated: 2025-12-04T13:13:00Z
department:
- _id: '302'
doi: 10.1002/sia.7406
intvolume: ' 57'
issue: '7'
language:
- iso: eng
page: 499-509
publication: Surface and Interface Analysis
publication_identifier:
issn:
- 0142-2421
- 1096-9918
publication_status: published
publisher: Wiley
status: public
title: In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of
Polylactide Thin Films
type: journal_article
user_id: '54556'
volume: 57
year: '2025'
...
---
_id: '62875'
article_number: '140676'
author:
- first_name: Chantal
full_name: Theile-Rasche, Chantal
last_name: Theile-Rasche
- first_name: Fuzeng
full_name: Wang, Fuzeng
last_name: Wang
- first_name: Tim
full_name: Prüßner, Tim
last_name: Prüßner
- first_name: Marten
full_name: Huck, Marten
last_name: Huck
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
last_name: Steinrück
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Theile-Rasche C, Wang F, Prüßner T, et al. Evaluation of anti-adhesive and
corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications
in polymer processing. Thin Solid Films. 2025;820. doi:10.1016/j.tsf.2025.140676
apa: Theile-Rasche, C., Wang, F., Prüßner, T., Huck, M., Steinrück, H.-G., de los
Arcos de Pedro, M. T., & Grundmeier, G. (2025). Evaluation of anti-adhesive
and corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications
in polymer processing. Thin Solid Films, 820, Article 140676. https://doi.org/10.1016/j.tsf.2025.140676
bibtex: '@article{Theile-Rasche_Wang_Prüßner_Huck_Steinrück_de los Arcos de Pedro_Grundmeier_2025,
title={Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered
films for applications in polymer processing}, volume={820}, DOI={10.1016/j.tsf.2025.140676},
number={140676}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Theile-Rasche,
Chantal and Wang, Fuzeng and Prüßner, Tim and Huck, Marten and Steinrück, Hans-Georg
and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2025} }'
chicago: Theile-Rasche, Chantal, Fuzeng Wang, Tim Prüßner, Marten Huck, Hans-Georg
Steinrück, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Evaluation
of Anti-Adhesive and Corrosion Protection Properties of TiAlSiN-Magnetron-Sputtered
Films for Applications in Polymer Processing.” Thin Solid Films 820 (2025).
https://doi.org/10.1016/j.tsf.2025.140676.
ieee: 'C. Theile-Rasche et al., “Evaluation of anti-adhesive and corrosion
protection properties of TiAlSiN-magnetron-sputtered films for applications in
polymer processing,” Thin Solid Films, vol. 820, Art. no. 140676, 2025,
doi: 10.1016/j.tsf.2025.140676.'
mla: Theile-Rasche, Chantal, et al. “Evaluation of Anti-Adhesive and Corrosion Protection
Properties of TiAlSiN-Magnetron-Sputtered Films for Applications in Polymer Processing.”
Thin Solid Films, vol. 820, 140676, Elsevier BV, 2025, doi:10.1016/j.tsf.2025.140676.
short: C. Theile-Rasche, F. Wang, T. Prüßner, M. Huck, H.-G. Steinrück, M.T. de
los Arcos de Pedro, G. Grundmeier, Thin Solid Films 820 (2025).
date_created: 2025-12-04T13:11:23Z
date_updated: 2025-12-04T13:12:56Z
department:
- _id: '302'
doi: 10.1016/j.tsf.2025.140676
intvolume: ' 820'
language:
- iso: eng
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
publisher: Elsevier BV
status: public
title: Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered
films for applications in polymer processing
type: journal_article
user_id: '54556'
volume: 820
year: '2025'
...
---
_id: '62874'
abstract:
- lang: eng
text: DNA origami adsorption at single-crystalline TiO2
surfaces is investigated at different Mg2+ concentrations.
For TiO2(001), DNA origami adsorption is stronger at 5 mM
than at 10 mM Mg2+, whereas the opposite is observed for
TiO2(110) and TiO2(111).
author:
- first_name: Xiaodan
full_name: Xu, Xiaodan
last_name: Xu
- first_name: Sandra
full_name: Gołębiowska, Sandra
last_name: Gołębiowska
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Adrian
full_name: Keller, Adrian
last_name: Keller
citation:
ama: Xu X, Gołębiowska S, de los Arcos de Pedro MT, Grundmeier G, Keller A. DNA
origami adsorption at single-crystalline TiO2 surfaces. RSC Applied
Interfaces. Published online 2025. doi:10.1039/d5lf00109a
apa: Xu, X., Gołębiowska, S., de los Arcos de Pedro, M. T., Grundmeier, G., &
Keller, A. (2025). DNA origami adsorption at single-crystalline TiO2
surfaces. RSC Applied Interfaces. https://doi.org/10.1039/d5lf00109a
bibtex: '@article{Xu_Gołębiowska_de los Arcos de Pedro_Grundmeier_Keller_2025, title={DNA
origami adsorption at single-crystalline TiO2 surfaces}, DOI={10.1039/d5lf00109a},
journal={RSC Applied Interfaces}, publisher={Royal Society of Chemistry (RSC)},
author={Xu, Xiaodan and Gołębiowska, Sandra and de los Arcos de Pedro, Maria Teresa
and Grundmeier, Guido and Keller, Adrian}, year={2025} }'
chicago: Xu, Xiaodan, Sandra Gołębiowska, Maria Teresa de los Arcos de Pedro, Guido
Grundmeier, and Adrian Keller. “DNA Origami Adsorption at Single-Crystalline TiO2
Surfaces.” RSC Applied Interfaces, 2025. https://doi.org/10.1039/d5lf00109a.
ieee: 'X. Xu, S. Gołębiowska, M. T. de los Arcos de Pedro, G. Grundmeier, and A.
Keller, “DNA origami adsorption at single-crystalline TiO2 surfaces,”
RSC Applied Interfaces, 2025, doi: 10.1039/d5lf00109a.'
mla: Xu, Xiaodan, et al. “DNA Origami Adsorption at Single-Crystalline TiO2
Surfaces.” RSC Applied Interfaces, Royal Society of Chemistry (RSC), 2025,
doi:10.1039/d5lf00109a.
short: X. Xu, S. Gołębiowska, M.T. de los Arcos de Pedro, G. Grundmeier, A. Keller,
RSC Applied Interfaces (2025).
date_created: 2025-12-04T13:10:43Z
date_updated: 2025-12-04T13:13:06Z
department:
- _id: '302'
doi: 10.1039/d5lf00109a
language:
- iso: eng
publication: RSC Applied Interfaces
publication_identifier:
issn:
- 2755-3701
publication_status: published
publisher: Royal Society of Chemistry (RSC)
status: public
title: DNA origami adsorption at single-crystalline TiO2 surfaces
type: journal_article
user_id: '54556'
year: '2025'
...
---
_id: '58612'
author:
- first_name: Maximina
full_name: Luis-Sunga, Maximina
last_name: Luis-Sunga
- first_name: Alejandro
full_name: González-Orive, Alejandro
last_name: González-Orive
- first_name: Juan Carlos
full_name: Calderón, Juan Carlos
last_name: Calderón
- first_name: Ilaria
full_name: Gamba, Ilaria
last_name: Gamba
- first_name: Airán
full_name: Ródenas, Airán
last_name: Ródenas
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Alberto
full_name: Hernández-Creus, Alberto
last_name: Hernández-Creus
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Elena
full_name: Pastor, Elena
last_name: Pastor
- first_name: Gonzalo
full_name: García, Gonzalo
last_name: García
citation:
ama: Luis-Sunga M, González-Orive A, Calderón JC, et al. Nickel-Induced Reduced
Graphene Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite for Electronic
and Magnetic Applications. ACS Applied Nano Materials. Published online
2024. doi:10.1021/acsanm.3c05949
apa: Luis-Sunga, M., González-Orive, A., Calderón, J. C., Gamba, I., Ródenas, A.,
de los Arcos de Pedro, M. T., Hernández-Creus, A., Grundmeier, G., Pastor, E.,
& García, G. (2024). Nickel-Induced Reduced Graphene Oxide Nanoribbon Formation
on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications.
ACS Applied Nano Materials. https://doi.org/10.1021/acsanm.3c05949
bibtex: '@article{Luis-Sunga_González-Orive_Calderón_Gamba_Ródenas_de los Arcos
de Pedro_Hernández-Creus_Grundmeier_Pastor_García_2024, title={Nickel-Induced
Reduced Graphene Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite
for Electronic and Magnetic Applications}, DOI={10.1021/acsanm.3c05949},
journal={ACS Applied Nano Materials}, author={Luis-Sunga, Maximina and González-Orive,
Alejandro and Calderón, Juan Carlos and Gamba, Ilaria and Ródenas, Airán and de
los Arcos de Pedro, Maria Teresa and Hernández-Creus, Alberto and Grundmeier,
Guido and Pastor, Elena and García, Gonzalo}, year={2024} }'
chicago: Luis-Sunga, Maximina, Alejandro González-Orive, Juan Carlos Calderón, Ilaria
Gamba, Airán Ródenas, Maria Teresa de los Arcos de Pedro, Alberto Hernández-Creus,
Guido Grundmeier, Elena Pastor, and Gonzalo García. “Nickel-Induced Reduced Graphene
Oxide Nanoribbon Formation on Highly Ordered Pyrolytic Graphite for Electronic
and Magnetic Applications.” ACS Applied Nano Materials, 2024. https://doi.org/10.1021/acsanm.3c05949.
ieee: 'M. Luis-Sunga et al., “Nickel-Induced Reduced Graphene Oxide Nanoribbon
Formation on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications,”
ACS Applied Nano Materials, 2024, doi: 10.1021/acsanm.3c05949.'
mla: Luis-Sunga, Maximina, et al. “Nickel-Induced Reduced Graphene Oxide Nanoribbon
Formation on Highly Ordered Pyrolytic Graphite for Electronic and Magnetic Applications.”
ACS Applied Nano Materials, 2024, doi:10.1021/acsanm.3c05949.
short: M. Luis-Sunga, A. González-Orive, J.C. Calderón, I. Gamba, A. Ródenas, M.T.
de los Arcos de Pedro, A. Hernández-Creus, G. Grundmeier, E. Pastor, G. García,
ACS Applied Nano Materials (2024).
date_created: 2025-02-12T14:49:11Z
date_updated: 2025-02-12T14:56:48Z
department:
- _id: '302'
doi: 10.1021/acsanm.3c05949
language:
- iso: eng
publication: ACS Applied Nano Materials
publication_identifier:
issn:
- 2574-0970
status: public
title: Nickel-Induced Reduced Graphene Oxide Nanoribbon Formation on Highly Ordered
Pyrolytic Graphite for Electronic and Magnetic Applications
type: journal_article
user_id: '54556'
year: '2024'
...
---
_id: '58611'
abstract:
- lang: eng
text: AFM-IR investigation of thin PECVD SiOx films on a polypropylene substrate
in the surface-sensitive mode
author:
- first_name: Hendrik
full_name: Müller, Hendrik
last_name: Müller
- first_name: Hartmut
full_name: Stadler, Hartmut
last_name: Stadler
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Adrian
full_name: Keller, Adrian
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Müller H, Stadler H, de los Arcos de Pedro MT, Keller A, Grundmeier G. AFM-IR
investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive
mode. Beilstein Journal of Nanotechnology. 2024;15(1):603–611. doi:10.3762/bjnano.15.51
apa: Müller, H., Stadler, H., de los Arcos de Pedro, M. T., Keller, A., & Grundmeier,
G. (2024). AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate
in the surface-sensitive mode. Beilstein Journal of Nanotechnology, 15(1),
603–611. https://doi.org/10.3762/bjnano.15.51
bibtex: '@article{Müller_Stadler_de los Arcos de Pedro_Keller_Grundmeier_2024, title={AFM-IR
investigation of thin PECVD SiO x films on a polypropylene substrate in the surface-sensitive
mode}, volume={15}, DOI={10.3762/bjnano.15.51},
number={1}, journal={Beilstein Journal of Nanotechnology}, author={Müller, Hendrik
and Stadler, Hartmut and de los Arcos de Pedro, Maria Teresa and Keller, Adrian
and Grundmeier, Guido}, year={2024}, pages={603–611} }'
chicago: 'Müller, Hendrik, Hartmut Stadler, Maria Teresa de los Arcos de Pedro,
Adrian Keller, and Guido Grundmeier. “AFM-IR Investigation of Thin PECVD SiO x
Films on a Polypropylene Substrate in the Surface-Sensitive Mode.” Beilstein
Journal of Nanotechnology 15, no. 1 (2024): 603–611. https://doi.org/10.3762/bjnano.15.51.'
ieee: 'H. Müller, H. Stadler, M. T. de los Arcos de Pedro, A. Keller, and G. Grundmeier,
“AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate in
the surface-sensitive mode,” Beilstein Journal of Nanotechnology, vol.
15, no. 1, pp. 603–611, 2024, doi: 10.3762/bjnano.15.51.'
mla: Müller, Hendrik, et al. “AFM-IR Investigation of Thin PECVD SiO x Films on
a Polypropylene Substrate in the Surface-Sensitive Mode.” Beilstein Journal
of Nanotechnology, vol. 15, no. 1, 2024, pp. 603–611, doi:10.3762/bjnano.15.51.
short: H. Müller, H. Stadler, M.T. de los Arcos de Pedro, A. Keller, G. Grundmeier,
Beilstein Journal of Nanotechnology 15 (2024) 603–611.
date_created: 2025-02-12T14:48:49Z
date_updated: 2025-02-12T14:56:14Z
department:
- _id: '302'
doi: 10.3762/bjnano.15.51
intvolume: ' 15'
issue: '1'
language:
- iso: eng
page: 603–611
publication: Beilstein Journal of Nanotechnology
publication_identifier:
issn:
- 2190-4286
status: public
title: AFM-IR investigation of thin PECVD SiO x films on a polypropylene substrate
in the surface-sensitive mode
type: journal_article
user_id: '54556'
volume: 15
year: '2024'
...
---
_id: '62873'
abstract:
- lang: eng
text: AbstractVapor phase infiltration (VPI) has
emerged as a promising tool for fabrication of novel hybrid materials. In the
field of polymeric gas separation membranes, a beneficial impact on stability
and membrane performance is known for several polymers with differing functional
groups. This study for the first time investigates VPI of trimethylaluminum (TMA)
into poly(1‐trimethylsilyl‐1‐propyne) (PTMSP), featuring a carbon–carbon double
bond as functional group. Saturation of the precursor inside the polymer is already
attained after 60 s infiltration time leading to significant densification of
the material. Depth profiling proves accumulation of aluminum in the polymer itself,
but a significantly increased accumulation is visible in the gradient layer between
polymer and SiO2 substrate. A reaction pathway is proposed
and supplemented by density‐functional theory (DFT) calculations. Infrared spectra
derived from both experiments and simulation support the presented reaction pathway.
In terms of permeance, a favorable impact on selectivity is observed for infiltration
times up to 1 s. Longer infiltration times yield greatly reduced permeance values
close or even below the detection limit of the measurement device. The present
results of this study set a strong basis for the application of VPI on polymers
for gas‐barrier and membrane applications in the future.
article_number: '2400171'
author:
- first_name: Jonathan
full_name: Jenderny, Jonathan
last_name: Jenderny
- first_name: Nils
full_name: Boysen, Nils
last_name: Boysen
- first_name: Jens
full_name: Rubner, Jens
last_name: Rubner
- first_name: Frederik
full_name: Zysk, Frederik
last_name: Zysk
- first_name: Florian
full_name: Preischel, Florian
last_name: Preischel
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Varun Raj
full_name: Damerla, Varun Raj
last_name: Damerla
- first_name: Aleksander
full_name: Kostka, Aleksander
last_name: Kostka
- first_name: Jonas
full_name: Franke, Jonas
last_name: Franke
- first_name: Rainer
full_name: Dahlmann, Rainer
last_name: Dahlmann
- first_name: Thomas D.
full_name: Kühne, Thomas D.
last_name: Kühne
- first_name: Matthias
full_name: Wessling, Matthias
last_name: Wessling
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: Jenderny J, Boysen N, Rubner J, et al. Tuning the Permeation Properties of
Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using Trimethylaluminum.
Advanced Materials Interfaces. 2024;11(28). doi:10.1002/admi.202400171
apa: Jenderny, J., Boysen, N., Rubner, J., Zysk, F., Preischel, F., de los Arcos
de Pedro, M. T., Damerla, V. R., Kostka, A., Franke, J., Dahlmann, R., Kühne,
T. D., Wessling, M., Awakowicz, P., & Devi, A. (2024). Tuning the Permeation
Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using
Trimethylaluminum. Advanced Materials Interfaces, 11(28), Article
2400171. https://doi.org/10.1002/admi.202400171
bibtex: '@article{Jenderny_Boysen_Rubner_Zysk_Preischel_de los Arcos de Pedro_Damerla_Kostka_Franke_Dahlmann_et
al._2024, title={Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne)
by Vapor Phase Infiltration Using Trimethylaluminum}, volume={11}, DOI={10.1002/admi.202400171},
number={282400171}, journal={Advanced Materials Interfaces}, publisher={Wiley},
author={Jenderny, Jonathan and Boysen, Nils and Rubner, Jens and Zysk, Frederik
and Preischel, Florian and de los Arcos de Pedro, Maria Teresa and Damerla, Varun
Raj and Kostka, Aleksander and Franke, Jonas and Dahlmann, Rainer and et al.},
year={2024} }'
chicago: Jenderny, Jonathan, Nils Boysen, Jens Rubner, Frederik Zysk, Florian Preischel,
Maria Teresa de los Arcos de Pedro, Varun Raj Damerla, et al. “Tuning the Permeation
Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor Phase Infiltration Using
Trimethylaluminum.” Advanced Materials Interfaces 11, no. 28 (2024). https://doi.org/10.1002/admi.202400171.
ieee: 'J. Jenderny et al., “Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne)
by Vapor Phase Infiltration Using Trimethylaluminum,” Advanced Materials Interfaces,
vol. 11, no. 28, Art. no. 2400171, 2024, doi: 10.1002/admi.202400171.'
mla: Jenderny, Jonathan, et al. “Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne)
by Vapor Phase Infiltration Using Trimethylaluminum.” Advanced Materials Interfaces,
vol. 11, no. 28, 2400171, Wiley, 2024, doi:10.1002/admi.202400171.
short: J. Jenderny, N. Boysen, J. Rubner, F. Zysk, F. Preischel, M.T. de los Arcos
de Pedro, V.R. Damerla, A. Kostka, J. Franke, R. Dahlmann, T.D. Kühne, M. Wessling,
P. Awakowicz, A. Devi, Advanced Materials Interfaces 11 (2024).
date_created: 2025-12-04T13:07:52Z
date_updated: 2025-12-04T13:12:49Z
department:
- _id: '302'
doi: 10.1002/admi.202400171
intvolume: ' 11'
issue: '28'
language:
- iso: eng
publication: Advanced Materials Interfaces
publication_identifier:
issn:
- 2196-7350
- 2196-7350
publication_status: published
publisher: Wiley
status: public
title: Tuning the Permeation Properties of Poly(1‐trimethylsilyl‐1‐propyne) by Vapor
Phase Infiltration Using Trimethylaluminum
type: journal_article
user_id: '54556'
volume: 11
year: '2024'
...
---
_id: '46480'
article_number: '147317'
author:
- first_name: Hendrik
full_name: Müller, Hendrik
last_name: Müller
- first_name: Christian
full_name: Weinberger, Christian
id: '11848'
last_name: Weinberger
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
citation:
ama: Müller H, Weinberger C, Grundmeier G, de los Arcos de Pedro MT. UV-enhanced
environmental charge compensation in near ambient pressure XPS. Journal of
Electron Spectroscopy and Related Phenomena. 2023;264. doi:10.1016/j.elspec.2023.147317
apa: Müller, H., Weinberger, C., Grundmeier, G., & de los Arcos de Pedro, M.
T. (2023). UV-enhanced environmental charge compensation in near ambient pressure
XPS. Journal of Electron Spectroscopy and Related Phenomena, 264,
Article 147317. https://doi.org/10.1016/j.elspec.2023.147317
bibtex: '@article{Müller_Weinberger_Grundmeier_de los Arcos de Pedro_2023, title={UV-enhanced
environmental charge compensation in near ambient pressure XPS}, volume={264},
DOI={10.1016/j.elspec.2023.147317},
number={147317}, journal={Journal of Electron Spectroscopy and Related Phenomena},
publisher={Elsevier BV}, author={Müller, Hendrik and Weinberger, Christian and
Grundmeier, Guido and de los Arcos de Pedro, Maria Teresa}, year={2023} }'
chicago: Müller, Hendrik, Christian Weinberger, Guido Grundmeier, and Maria Teresa
de los Arcos de Pedro. “UV-Enhanced Environmental Charge Compensation in near
Ambient Pressure XPS.” Journal of Electron Spectroscopy and Related Phenomena
264 (2023). https://doi.org/10.1016/j.elspec.2023.147317.
ieee: 'H. Müller, C. Weinberger, G. Grundmeier, and M. T. de los Arcos de Pedro,
“UV-enhanced environmental charge compensation in near ambient pressure XPS,”
Journal of Electron Spectroscopy and Related Phenomena, vol. 264, Art.
no. 147317, 2023, doi: 10.1016/j.elspec.2023.147317.'
mla: Müller, Hendrik, et al. “UV-Enhanced Environmental Charge Compensation in near
Ambient Pressure XPS.” Journal of Electron Spectroscopy and Related Phenomena,
vol. 264, 147317, Elsevier BV, 2023, doi:10.1016/j.elspec.2023.147317.
short: H. Müller, C. Weinberger, G. Grundmeier, M.T. de los Arcos de Pedro, Journal
of Electron Spectroscopy and Related Phenomena 264 (2023).
date_created: 2023-08-11T14:11:57Z
date_updated: 2023-08-11T14:13:19Z
department:
- _id: '302'
doi: 10.1016/j.elspec.2023.147317
intvolume: ' 264'
keyword:
- Physical and Theoretical Chemistry
- Spectroscopy
- Condensed Matter Physics
- Atomic and Molecular Physics
- and Optics
- Radiation
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
publication: Journal of Electron Spectroscopy and Related Phenomena
publication_identifier:
issn:
- 0368-2048
publication_status: published
publisher: Elsevier BV
status: public
title: UV-enhanced environmental charge compensation in near ambient pressure XPS
type: journal_article
user_id: '54556'
volume: 264
year: '2023'
...
---
_id: '58608'
abstract:
- lang: eng
text: 'Interfacial reactions at the polycarbonate (PC)/FeCr-alloy interface during
melt contact were studied as function of the Fe:Cr ratio within the alloy. Thin
Fe/Cr films with lateral composition gradients were deposited by magnetron sputtering;
the analysis of the films was done with microscopy and X-ray photoelectron spectroscopy
(XPS). The local interfacial polymeric film formation could be therefore directly
correlated with the Fe:Cr ratio. The local thickness and structure of the formed
polycarbonate residue was analyzed by means of imaging ellipsometry, atomic force
microscopy as well as Fourier-transform infrared spectroscopy under grazing incidence
and XPS. Moreover, confocal fluorescence microscopy of the PC melt/alloy interface
could reveal the formation of minor degradation products in the interphase region.
The results show that already an Fe:Cr ratio of 2 : 1 leads to a strong inhibition
of the thermal degradation in comparison to the unalloyed iron, and that in general,
the enrichment of chromium in the passive film leads to an effective suppression
of interfacial PC degradation. The data contributes to improving the mechanistic
understanding of the role of iron during this process. Additionally, a critical
concentration of chromium in the alloys used for PC processing can be deduced.'
author:
- first_name: Chantal
full_name: Theile-Rasche, Chantal
last_name: Theile-Rasche
- first_name: T.
full_name: Meng, T.
last_name: Meng
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Theile-Rasche C, Meng T, de los Arcos de Pedro MT, Grundmeier G. Analysis of
polycarbonate degradation at melt/FeCr-alloy interfaces as a function of the alloy
composition by means of combinatorial thin film chemistry. SN Applied Sciences.
2023;5(10):1–12. doi:10.1007/s42452-023-05441-5
apa: Theile-Rasche, C., Meng, T., de los Arcos de Pedro, M. T., & Grundmeier,
G. (2023). Analysis of polycarbonate degradation at melt/FeCr-alloy interfaces
as a function of the alloy composition by means of combinatorial thin film chemistry.
SN Applied Sciences, 5(10), 1–12. https://doi.org/10.1007/s42452-023-05441-5
bibtex: '@article{Theile-Rasche_Meng_de los Arcos de Pedro_Grundmeier_2023, title={Analysis
of polycarbonate degradation at melt/FeCr-alloy interfaces as a function of the
alloy composition by means of combinatorial thin film chemistry}, volume={5},
DOI={10.1007/s42452-023-05441-5},
number={10}, journal={SN Applied Sciences}, author={Theile-Rasche, Chantal and
Meng, T. and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2023},
pages={1–12} }'
chicago: 'Theile-Rasche, Chantal, T. Meng, Maria Teresa de los Arcos de Pedro, and
Guido Grundmeier. “Analysis of Polycarbonate Degradation at Melt/FeCr-Alloy Interfaces
as a Function of the Alloy Composition by Means of Combinatorial Thin Film Chemistry.”
SN Applied Sciences 5, no. 10 (2023): 1–12. https://doi.org/10.1007/s42452-023-05441-5.'
ieee: 'C. Theile-Rasche, T. Meng, M. T. de los Arcos de Pedro, and G. Grundmeier,
“Analysis of polycarbonate degradation at melt/FeCr-alloy interfaces as a function
of the alloy composition by means of combinatorial thin film chemistry,” SN
Applied Sciences, vol. 5, no. 10, pp. 1–12, 2023, doi: 10.1007/s42452-023-05441-5.'
mla: Theile-Rasche, Chantal, et al. “Analysis of Polycarbonate Degradation at Melt/FeCr-Alloy
Interfaces as a Function of the Alloy Composition by Means of Combinatorial Thin
Film Chemistry.” SN Applied Sciences, vol. 5, no. 10, 2023, pp. 1–12, doi:10.1007/s42452-023-05441-5.
short: C. Theile-Rasche, T. Meng, M.T. de los Arcos de Pedro, G. Grundmeier, SN
Applied Sciences 5 (2023) 1–12.
date_created: 2025-02-12T14:47:24Z
date_updated: 2025-02-12T14:55:33Z
department:
- _id: '302'
doi: 10.1007/s42452-023-05441-5
intvolume: ' 5'
issue: '10'
language:
- iso: eng
page: 1–12
publication: SN Applied Sciences
publication_identifier:
issn:
- 2523-3971
status: public
title: Analysis of polycarbonate degradation at melt/FeCr-alloy interfaces as a function
of the alloy composition by means of combinatorial thin film chemistry
type: journal_article
user_id: '54556'
volume: 5
year: '2023'
...
---
_id: '58609'
abstract:
- lang: eng
text: Plasma Processes and Polymers is a plasma journal focusing on the interdisciplinary
field of low temperature plasma science.
author:
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Marc
full_name: Böke, Marc
last_name: Böke
- first_name: Nils
full_name: Boysen, Nils
last_name: Boysen
- first_name: Ralf Peter
full_name: Brinkmann, Ralf Peter
last_name: Brinkmann
- first_name: Rainer
full_name: Dahlmann, Rainer
last_name: Dahlmann
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Denis
full_name: Eremin, Denis
last_name: Eremin
- first_name: Jonas
full_name: Franke, Jonas
last_name: Franke
- first_name: Tobias
full_name: Gergs, Tobias
last_name: Gergs
- first_name: Jonathan
full_name: Jenderny, Jonathan
last_name: Jenderny
- first_name: Efe
full_name: Kemaneci, Efe
last_name: Kemaneci
- first_name: Thomas D.
full_name: Kühne, Thomas D.
last_name: Kühne
- first_name: Simon
full_name: Kusmierz, Simon
last_name: Kusmierz
- first_name: Thomas
full_name: Mussenbrock, Thomas
last_name: Mussenbrock
- first_name: Jens
full_name: Rubner, Jens
last_name: Rubner
- first_name: Jan
full_name: Trieschmann, Jan
last_name: Trieschmann
- first_name: Matthias
full_name: Wessling, Matthias
last_name: Wessling
- first_name: Xiaofan
full_name: Xie, Xiaofan
last_name: Xie
- first_name: David
full_name: Zanders, David
last_name: Zanders
- first_name: Frederik
full_name: Zysk, Frederik
last_name: Zysk
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: 'de los Arcos de Pedro MT, Awakowicz P, Böke M, et al. PECVD and PEALD on polymer
substrates (part II): Understanding and tuning of barrier and membrane properties
of thin films. PLASMA PROCESSES AND POLYMERS. Published online 2023:e2300186.
doi:10.1002/ppap.202300186'
apa: 'de los Arcos de Pedro, M. T., Awakowicz, P., Böke, M., Boysen, N., Brinkmann,
R. P., Dahlmann, R., Devi, A., Eremin, D., Franke, J., Gergs, T., Jenderny, J.,
Kemaneci, E., Kühne, T. D., Kusmierz, S., Mussenbrock, T., Rubner, J., Trieschmann,
J., Wessling, M., Xie, X., … Grundmeier, G. (2023). PECVD and PEALD on polymer
substrates (part II): Understanding and tuning of barrier and membrane properties
of thin films. PLASMA PROCESSES AND POLYMERS, e2300186. https://doi.org/10.1002/ppap.202300186'
bibtex: '@article{de los Arcos de Pedro_Awakowicz_Böke_Boysen_Brinkmann_Dahlmann_Devi_Eremin_Franke_Gergs_et
al._2023, title={PECVD and PEALD on polymer substrates (part II): Understanding
and tuning of barrier and membrane properties of thin films}, DOI={10.1002/ppap.202300186},
journal={PLASMA PROCESSES AND POLYMERS}, author={de los Arcos de Pedro, Maria
Teresa and Awakowicz, Peter and Böke, Marc and Boysen, Nils and Brinkmann, Ralf
Peter and Dahlmann, Rainer and Devi, Anjana and Eremin, Denis and Franke, Jonas
and Gergs, Tobias and et al.}, year={2023}, pages={e2300186} }'
chicago: 'Arcos de Pedro, Maria Teresa de los, Peter Awakowicz, Marc Böke, Nils
Boysen, Ralf Peter Brinkmann, Rainer Dahlmann, Anjana Devi, et al. “PECVD and
PEALD on Polymer Substrates (Part II): Understanding and Tuning of Barrier and
Membrane Properties of Thin Films.” PLASMA PROCESSES AND POLYMERS, 2023,
e2300186. https://doi.org/10.1002/ppap.202300186.'
ieee: 'M. T. de los Arcos de Pedro et al., “PECVD and PEALD on polymer substrates
(part II): Understanding and tuning of barrier and membrane properties of thin
films,” PLASMA PROCESSES AND POLYMERS, p. e2300186, 2023, doi: 10.1002/ppap.202300186.'
mla: 'de los Arcos de Pedro, Maria Teresa, et al. “PECVD and PEALD on Polymer Substrates
(Part II): Understanding and Tuning of Barrier and Membrane Properties of Thin
Films.” PLASMA PROCESSES AND POLYMERS, 2023, p. e2300186, doi:10.1002/ppap.202300186.'
short: M.T. de los Arcos de Pedro, P. Awakowicz, M. Böke, N. Boysen, R.P. Brinkmann,
R. Dahlmann, A. Devi, D. Eremin, J. Franke, T. Gergs, J. Jenderny, E. Kemaneci,
T.D. Kühne, S. Kusmierz, T. Mussenbrock, J. Rubner, J. Trieschmann, M. Wessling,
X. Xie, D. Zanders, F. Zysk, G. Grundmeier, PLASMA PROCESSES AND POLYMERS (2023)
e2300186.
date_created: 2025-02-12T14:47:57Z
date_updated: 2025-02-12T14:54:12Z
department:
- _id: '302'
doi: 10.1002/ppap.202300186
language:
- iso: eng
page: e2300186
publication: PLASMA PROCESSES AND POLYMERS
publication_identifier:
issn:
- 1612-8850
status: public
title: 'PECVD and PEALD on polymer substrates (part II): Understanding and tuning
of barrier and membrane properties of thin films'
type: journal_article
user_id: '54556'
year: '2023'
...
---
_id: '58610'
author:
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Jan
full_name: Benedikt, Jan
last_name: Benedikt
- first_name: Beatrix
full_name: Biskup, Beatrix
last_name: Biskup
- first_name: Marc
full_name: Böke, Marc
last_name: Böke
- first_name: Nils
full_name: Boysen, Nils
last_name: Boysen
- first_name: Rahel
full_name: Buschhaus, Rahel
last_name: Buschhaus
- first_name: Rainer
full_name: Dahlmann, Rainer
last_name: Dahlmann
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Tobias
full_name: Gergs, Tobias
last_name: Gergs
- first_name: Jonathan
full_name: Jenderny, Jonathan
last_name: Jenderny
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
- first_name: Thomas D.
full_name: Kühne, Thomas D.
last_name: Kühne
- first_name: Simon
full_name: Kusmierz, Simon
last_name: Kusmierz
- first_name: Hendrik
full_name: Müller, Hendrik
last_name: Müller
- first_name: Thomas
full_name: Mussenbrock, Thomas
last_name: Mussenbrock
- first_name: Jan
full_name: Trieschmann, Jan
last_name: Trieschmann
- first_name: David
full_name: Zanders, David
last_name: Zanders
- first_name: Frederik
full_name: Zysk, Frederik
last_name: Zysk
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
citation:
ama: 'de los Arcos de Pedro MT, Awakowicz P, Benedikt J, et al. PECVD and PEALD
on polymer substrates (part I): Fundamentals and analysis of plasma activation
and thin film growth. PLASMA PROCESSES AND POLYMERS. Published online 2023:e2300150.
doi:10.1002/ppap.202300150'
apa: 'de los Arcos de Pedro, M. T., Awakowicz, P., Benedikt, J., Biskup, B., Böke,
M., Boysen, N., Buschhaus, R., Dahlmann, R., Devi, A., Gergs, T., Jenderny, J.,
von Keudell, A., Kühne, T. D., Kusmierz, S., Müller, H., Mussenbrock, T., Trieschmann,
J., Zanders, D., Zysk, F., & Grundmeier, G. (2023). PECVD and PEALD on polymer
substrates (part I): Fundamentals and analysis of plasma activation and thin film
growth. PLASMA PROCESSES AND POLYMERS, e2300150. https://doi.org/10.1002/ppap.202300150'
bibtex: '@article{de los Arcos de Pedro_Awakowicz_Benedikt_Biskup_Böke_Boysen_Buschhaus_Dahlmann_Devi_Gergs_et
al._2023, title={PECVD and PEALD on polymer substrates (part I): Fundamentals
and analysis of plasma activation and thin film growth}, DOI={10.1002/ppap.202300150},
journal={PLASMA PROCESSES AND POLYMERS}, author={de los Arcos de Pedro, Maria
Teresa and Awakowicz, Peter and Benedikt, Jan and Biskup, Beatrix and Böke, Marc
and Boysen, Nils and Buschhaus, Rahel and Dahlmann, Rainer and Devi, Anjana and
Gergs, Tobias and et al.}, year={2023}, pages={e2300150} }'
chicago: 'Arcos de Pedro, Maria Teresa de los, Peter Awakowicz, Jan Benedikt, Beatrix
Biskup, Marc Böke, Nils Boysen, Rahel Buschhaus, et al. “PECVD and PEALD on Polymer
Substrates (Part I): Fundamentals and Analysis of Plasma Activation and Thin Film
Growth.” PLASMA PROCESSES AND POLYMERS, 2023, e2300150. https://doi.org/10.1002/ppap.202300150.'
ieee: 'M. T. de los Arcos de Pedro et al., “PECVD and PEALD on polymer substrates
(part I): Fundamentals and analysis of plasma activation and thin film growth,”
PLASMA PROCESSES AND POLYMERS, p. e2300150, 2023, doi: 10.1002/ppap.202300150.'
mla: 'de los Arcos de Pedro, Maria Teresa, et al. “PECVD and PEALD on Polymer Substrates
(Part I): Fundamentals and Analysis of Plasma Activation and Thin Film Growth.”
PLASMA PROCESSES AND POLYMERS, 2023, p. e2300150, doi:10.1002/ppap.202300150.'
short: M.T. de los Arcos de Pedro, P. Awakowicz, J. Benedikt, B. Biskup, M. Böke,
N. Boysen, R. Buschhaus, R. Dahlmann, A. Devi, T. Gergs, J. Jenderny, A. von Keudell,
T.D. Kühne, S. Kusmierz, H. Müller, T. Mussenbrock, J. Trieschmann, D. Zanders,
F. Zysk, G. Grundmeier, PLASMA PROCESSES AND POLYMERS (2023) e2300150.
date_created: 2025-02-12T14:48:27Z
date_updated: 2025-02-12T14:54:43Z
department:
- _id: '302'
doi: 10.1002/ppap.202300150
language:
- iso: eng
page: e2300150
publication: PLASMA PROCESSES AND POLYMERS
publication_identifier:
issn:
- 1612-8850
status: public
title: 'PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis
of plasma activation and thin film growth'
type: journal_article
user_id: '54556'
year: '2023'
...
---
_id: '58607'
author:
- first_name: Xiaofan
full_name: Xie, Xiaofan
last_name: Xie
- first_name: David
full_name: Zanders, David
last_name: Zanders
- first_name: Florian
full_name: Preischel, Florian
last_name: Preischel
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
citation:
ama: Xie X, Zanders D, Preischel F, de los Arcos de Pedro MT, Devi A, Grundmeier
G. Complementary spectroscopic and electrochemical analysis of the sealing of
micropores in hexamethyldisilazane plasma polymer films by Al 2 O 3 atomic layer
deposition. Surface and Interface Analysis. Published online 2023. doi:10.1002/sia.7256
apa: Xie, X., Zanders, D., Preischel, F., de los Arcos de Pedro, M. T., Devi, A.,
& Grundmeier, G. (2023). Complementary spectroscopic and electrochemical analysis
of the sealing of micropores in hexamethyldisilazane plasma polymer films by Al
2 O 3 atomic layer deposition. Surface and Interface Analysis. https://doi.org/10.1002/sia.7256
bibtex: '@article{Xie_Zanders_Preischel_de los Arcos de Pedro_Devi_Grundmeier_2023,
title={Complementary spectroscopic and electrochemical analysis of the sealing
of micropores in hexamethyldisilazane plasma polymer films by Al 2 O 3 atomic
layer deposition}, DOI={10.1002/sia.7256},
journal={Surface and Interface Analysis}, author={Xie, Xiaofan and Zanders, David
and Preischel, Florian and de los Arcos de Pedro, Maria Teresa and Devi, Anjana
and Grundmeier, Guido}, year={2023} }'
chicago: Xie, Xiaofan, David Zanders, Florian Preischel, Maria Teresa de los Arcos
de Pedro, Anjana Devi, and Guido Grundmeier. “Complementary Spectroscopic and
Electrochemical Analysis of the Sealing of Micropores in Hexamethyldisilazane
Plasma Polymer Films by Al 2 O 3 Atomic Layer Deposition.” Surface and Interface
Analysis, 2023. https://doi.org/10.1002/sia.7256.
ieee: 'X. Xie, D. Zanders, F. Preischel, M. T. de los Arcos de Pedro, A. Devi, and
G. Grundmeier, “Complementary spectroscopic and electrochemical analysis of the
sealing of micropores in hexamethyldisilazane plasma polymer films by Al 2 O 3
atomic layer deposition,” Surface and Interface Analysis, 2023, doi: 10.1002/sia.7256.'
mla: Xie, Xiaofan, et al. “Complementary Spectroscopic and Electrochemical Analysis
of the Sealing of Micropores in Hexamethyldisilazane Plasma Polymer Films by Al
2 O 3 Atomic Layer Deposition.” Surface and Interface Analysis, 2023, doi:10.1002/sia.7256.
short: X. Xie, D. Zanders, F. Preischel, M.T. de los Arcos de Pedro, A. Devi, G.
Grundmeier, Surface and Interface Analysis (2023).
date_created: 2025-02-12T14:45:05Z
date_updated: 2025-02-12T14:51:57Z
department:
- _id: '302'
doi: 10.1002/sia.7256
language:
- iso: eng
publication: Surface and Interface Analysis
publication_identifier:
issn:
- 0142-2421
status: public
title: Complementary spectroscopic and electrochemical analysis of the sealing of
micropores in hexamethyldisilazane plasma polymer films by Al 2 O 3 atomic layer
deposition
type: journal_article
user_id: '54556'
year: '2023'
...
---
_id: '34086'
article_number: '2200962'
author:
- first_name: Julius
full_name: Bürger, Julius
id: '46952'
last_name: Bürger
- first_name: Harikrishnan
full_name: Venugopal, Harikrishnan
last_name: Venugopal
- first_name: Daniel
full_name: Kool, Daniel
id: '44586'
last_name: Kool
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Alejandro
full_name: Gonzalez Orive, Alejandro
last_name: Gonzalez Orive
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Katharina
full_name: Brassat, Katharina
id: '11305'
last_name: Brassat
- first_name: Jörg
full_name: Lindner, Jörg
id: '20797'
last_name: Lindner
citation:
ama: Bürger J, Venugopal H, Kool D, et al. High‐Resolution Study of Changes in Morphology
and Chemistry of Cylindrical PS‐ b ‐PMMA Block Copolymer
Nanomasks during Mask Development. Advanced Materials Interfaces. 2022;9(26).
doi:10.1002/admi.202200962
apa: Bürger, J., Venugopal, H., Kool, D., de los Arcos de Pedro, M. T., Gonzalez
Orive, A., Grundmeier, G., Brassat, K., & Lindner, J. (2022). High‐Resolution
Study of Changes in Morphology and Chemistry of Cylindrical PS‐ b
‐PMMA Block Copolymer Nanomasks during Mask Development. Advanced
Materials Interfaces, 9(26), Article 2200962. https://doi.org/10.1002/admi.202200962
bibtex: '@article{Bürger_Venugopal_Kool_de los Arcos de Pedro_Gonzalez Orive_Grundmeier_Brassat_Lindner_2022,
title={High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical
PS‐ b ‐PMMA Block Copolymer Nanomasks during Mask
Development}, volume={9}, DOI={10.1002/admi.202200962},
number={262200962}, journal={Advanced Materials Interfaces}, publisher={Wiley},
author={Bürger, Julius and Venugopal, Harikrishnan and Kool, Daniel and de los
Arcos de Pedro, Maria Teresa and Gonzalez Orive, Alejandro and Grundmeier, Guido
and Brassat, Katharina and Lindner, Jörg}, year={2022} }'
chicago: Bürger, Julius, Harikrishnan Venugopal, Daniel Kool, Maria Teresa de los
Arcos de Pedro, Alejandro Gonzalez Orive, Guido Grundmeier, Katharina Brassat,
and Jörg Lindner. “High‐Resolution Study of Changes in Morphology and Chemistry
of Cylindrical PS‐ b ‐PMMA Block Copolymer Nanomasks
during Mask Development.” Advanced Materials Interfaces 9, no. 26 (2022).
https://doi.org/10.1002/admi.202200962.
ieee: 'J. Bürger et al., “High‐Resolution Study of Changes in Morphology
and Chemistry of Cylindrical PS‐ b ‐PMMA Block Copolymer
Nanomasks during Mask Development,” Advanced Materials Interfaces, vol.
9, no. 26, Art. no. 2200962, 2022, doi: 10.1002/admi.202200962.'
mla: Bürger, Julius, et al. “High‐Resolution Study of Changes in Morphology and
Chemistry of Cylindrical PS‐ b ‐PMMA Block Copolymer
Nanomasks during Mask Development.” Advanced Materials Interfaces, vol.
9, no. 26, 2200962, Wiley, 2022, doi:10.1002/admi.202200962.
short: J. Bürger, H. Venugopal, D. Kool, M.T. de los Arcos de Pedro, A. Gonzalez
Orive, G. Grundmeier, K. Brassat, J. Lindner, Advanced Materials Interfaces 9
(2022).
date_created: 2022-11-15T14:00:19Z
date_updated: 2023-01-11T10:10:59Z
department:
- _id: '15'
- _id: '230'
doi: 10.1002/admi.202200962
intvolume: ' 9'
issue: '26'
keyword:
- General Medicine
language:
- iso: eng
publication: Advanced Materials Interfaces
publication_identifier:
issn:
- 2196-7350
- 2196-7350
publication_status: published
publisher: Wiley
status: public
title: High‐Resolution Study of Changes in Morphology and Chemistry of Cylindrical
PS‐ b ‐PMMA Block Copolymer Nanomasks during Mask Development
type: journal_article
user_id: '54556'
volume: 9
year: '2022'
...
---
_id: '35977'
article_number: '2100174'
author:
- first_name: Christian
full_name: Hoppe, Christian
last_name: Hoppe
- first_name: Felix
full_name: Mitschker, Felix
last_name: Mitschker
- first_name: Lukas
full_name: Mai, Lukas
last_name: Mai
- first_name: Maciej Oskar
full_name: Liedke, Maciej Oskar
last_name: Liedke
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Peter
full_name: Awakowicz, Peter
last_name: Awakowicz
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Ahmed Gamal
full_name: Attallah, Ahmed Gamal
last_name: Attallah
- first_name: Maik
full_name: Butterling, Maik
last_name: Butterling
- first_name: Andreas
full_name: Wagner, Andreas
last_name: Wagner
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
citation:
ama: Hoppe C, Mitschker F, Mai L, et al. Influence of surface activation on the
microporosity of PE‐CVD and PE‐ALD SiO x
thin films on PDMS. Plasma Processes and Polymers.
2022;19(4). doi:10.1002/ppap.202100174
apa: Hoppe, C., Mitschker, F., Mai, L., Liedke, M. O., de los Arcos de Pedro, M.
T., Awakowicz, P., Devi, A., Attallah, A. G., Butterling, M., Wagner, A., &
Grundmeier, G. (2022). Influence of surface activation on the microporosity of
PE‐CVD and PE‐ALD SiO x
thin films on PDMS. Plasma Processes and Polymers, 19(4),
Article 2100174. https://doi.org/10.1002/ppap.202100174
bibtex: '@article{Hoppe_Mitschker_Mai_Liedke_de los Arcos de Pedro_Awakowicz_Devi_Attallah_Butterling_Wagner_et
al._2022, title={Influence of surface activation on the microporosity of PE‐CVD
and PE‐ALD SiO x
thin films on PDMS}, volume={19}, DOI={10.1002/ppap.202100174},
number={42100174}, journal={Plasma Processes and Polymers}, publisher={Wiley},
author={Hoppe, Christian and Mitschker, Felix and Mai, Lukas and Liedke, Maciej
Oskar and de los Arcos de Pedro, Maria Teresa and Awakowicz, Peter and Devi, Anjana
and Attallah, Ahmed Gamal and Butterling, Maik and Wagner, Andreas and et al.},
year={2022} }'
chicago: Hoppe, Christian, Felix Mitschker, Lukas Mai, Maciej Oskar Liedke, Maria
Teresa de los Arcos de Pedro, Peter Awakowicz, Anjana Devi, et al. “Influence
of Surface Activation on the Microporosity of PE‐CVD and PE‐ALD SiO
x Thin Films on PDMS.”
Plasma Processes and Polymers 19, no. 4 (2022). https://doi.org/10.1002/ppap.202100174.
ieee: 'C. Hoppe et al., “Influence of surface activation on the microporosity
of PE‐CVD and PE‐ALD SiO x
thin films on PDMS,” Plasma Processes and Polymers, vol. 19,
no. 4, Art. no. 2100174, 2022, doi: 10.1002/ppap.202100174.'
mla: Hoppe, Christian, et al. “Influence of Surface Activation on the Microporosity
of PE‐CVD and PE‐ALD SiO x
Thin Films on PDMS.” Plasma Processes and Polymers, vol. 19,
no. 4, 2100174, Wiley, 2022, doi:10.1002/ppap.202100174.
short: C. Hoppe, F. Mitschker, L. Mai, M.O. Liedke, M.T. de los Arcos de Pedro,
P. Awakowicz, A. Devi, A.G. Attallah, M. Butterling, A. Wagner, G. Grundmeier,
Plasma Processes and Polymers 19 (2022).
date_created: 2023-01-11T10:10:09Z
date_updated: 2023-01-24T08:07:46Z
department:
- _id: '302'
doi: 10.1002/ppap.202100174
intvolume: ' 19'
issue: '4'
keyword:
- Polymers and Plastics
- Condensed Matter Physics
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
- 1612-8869
publication_status: published
publisher: Wiley
status: public
title: Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO x thin
films on PDMS
type: journal_article
user_id: '54556'
volume: 19
year: '2022'
...
---
_id: '35976'
article_number: '154525'
author:
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Christian
full_name: Weinberger, Christian
last_name: Weinberger
- first_name: Frederik
full_name: Zysk, Frederik
last_name: Zysk
- first_name: Varun
full_name: Raj Damerla, Varun
last_name: Raj Damerla
- first_name: Sabrina
full_name: Kollmann, Sabrina
last_name: Kollmann
- first_name: Pascal
full_name: Vieth, Pascal
last_name: Vieth
- first_name: Michael
full_name: Tiemann, Michael
last_name: Tiemann
- first_name: Thomas D.
full_name: Kühne, Thomas D.
last_name: Kühne
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
citation:
ama: de los Arcos de Pedro MT, Weinberger C, Zysk F, et al. Challenges in the interpretation
of gas core levels for the determination of gas-solid interactions within dielectric
porous films by ambient pressure XPS. Applied Surface Science. 2022;604.
doi:10.1016/j.apsusc.2022.154525
apa: de los Arcos de Pedro, M. T., Weinberger, C., Zysk, F., Raj Damerla, V., Kollmann,
S., Vieth, P., Tiemann, M., Kühne, T. D., & Grundmeier, G. (2022). Challenges
in the interpretation of gas core levels for the determination of gas-solid interactions
within dielectric porous films by ambient pressure XPS. Applied Surface Science,
604, Article 154525. https://doi.org/10.1016/j.apsusc.2022.154525
bibtex: '@article{de los Arcos de Pedro_Weinberger_Zysk_Raj Damerla_Kollmann_Vieth_Tiemann_Kühne_Grundmeier_2022,
title={Challenges in the interpretation of gas core levels for the determination
of gas-solid interactions within dielectric porous films by ambient pressure XPS},
volume={604}, DOI={10.1016/j.apsusc.2022.154525},
number={154525}, journal={Applied Surface Science}, publisher={Elsevier BV}, author={de
los Arcos de Pedro, Maria Teresa and Weinberger, Christian and Zysk, Frederik
and Raj Damerla, Varun and Kollmann, Sabrina and Vieth, Pascal and Tiemann, Michael
and Kühne, Thomas D. and Grundmeier, Guido}, year={2022} }'
chicago: Arcos de Pedro, Maria Teresa de los, Christian Weinberger, Frederik Zysk,
Varun Raj Damerla, Sabrina Kollmann, Pascal Vieth, Michael Tiemann, Thomas D.
Kühne, and Guido Grundmeier. “Challenges in the Interpretation of Gas Core Levels
for the Determination of Gas-Solid Interactions within Dielectric Porous Films
by Ambient Pressure XPS.” Applied Surface Science 604 (2022). https://doi.org/10.1016/j.apsusc.2022.154525.
ieee: 'M. T. de los Arcos de Pedro et al., “Challenges in the interpretation
of gas core levels for the determination of gas-solid interactions within dielectric
porous films by ambient pressure XPS,” Applied Surface Science, vol. 604,
Art. no. 154525, 2022, doi: 10.1016/j.apsusc.2022.154525.'
mla: de los Arcos de Pedro, Maria Teresa, et al. “Challenges in the Interpretation
of Gas Core Levels for the Determination of Gas-Solid Interactions within Dielectric
Porous Films by Ambient Pressure XPS.” Applied Surface Science, vol. 604,
154525, Elsevier BV, 2022, doi:10.1016/j.apsusc.2022.154525.
short: M.T. de los Arcos de Pedro, C. Weinberger, F. Zysk, V. Raj Damerla, S. Kollmann,
P. Vieth, M. Tiemann, T.D. Kühne, G. Grundmeier, Applied Surface Science 604 (2022).
date_created: 2023-01-11T10:09:49Z
date_updated: 2023-01-24T08:10:06Z
department:
- _id: '302'
doi: 10.1016/j.apsusc.2022.154525
intvolume: ' 604'
keyword:
- Surfaces
- Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces
- General Physics and Astronomy
- General Chemistry
language:
- iso: eng
publication: Applied Surface Science
publication_identifier:
issn:
- 0169-4332
publication_status: published
publisher: Elsevier BV
status: public
title: Challenges in the interpretation of gas core levels for the determination of
gas-solid interactions within dielectric porous films by ambient pressure XPS
type: journal_article
user_id: '54556'
volume: 604
year: '2022'
...
---
_id: '35974'
article_number: '2200052'
author:
- first_name: Xiaofan
full_name: Xie, Xiaofan
last_name: Xie
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Xie X, de los Arcos de Pedro MT, Grundmeier G. Comparative analysis of hexamethyldisiloxane
and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation.
Plasma Processes and Polymers. 2022;19(11). doi:10.1002/ppap.202200052
apa: Xie, X., de los Arcos de Pedro, M. T., & Grundmeier, G. (2022). Comparative
analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin
films before and after plasma oxidation. Plasma Processes and Polymers,
19(11), Article 2200052. https://doi.org/10.1002/ppap.202200052
bibtex: '@article{Xie_de los Arcos de Pedro_Grundmeier_2022, title={Comparative
analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin
films before and after plasma oxidation}, volume={19}, DOI={10.1002/ppap.202200052},
number={112200052}, journal={Plasma Processes and Polymers}, publisher={Wiley},
author={Xie, Xiaofan and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido},
year={2022} }'
chicago: Xie, Xiaofan, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier.
“Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane Plasma
Polymer Thin Films before and after Plasma Oxidation.” Plasma Processes and
Polymers 19, no. 11 (2022). https://doi.org/10.1002/ppap.202200052.
ieee: 'X. Xie, M. T. de los Arcos de Pedro, and G. Grundmeier, “Comparative analysis
of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before
and after plasma oxidation,” Plasma Processes and Polymers, vol. 19, no.
11, Art. no. 2200052, 2022, doi: 10.1002/ppap.202200052.'
mla: Xie, Xiaofan, et al. “Comparative Analysis of Hexamethyldisiloxane and Hexamethyldisilazane
Plasma Polymer Thin Films before and after Plasma Oxidation.” Plasma Processes
and Polymers, vol. 19, no. 11, 2200052, Wiley, 2022, doi:10.1002/ppap.202200052.
short: X. Xie, M.T. de los Arcos de Pedro, G. Grundmeier, Plasma Processes and Polymers
19 (2022).
date_created: 2023-01-11T10:08:25Z
date_updated: 2023-01-24T08:48:44Z
department:
- _id: '302'
doi: 10.1002/ppap.202200052
intvolume: ' 19'
issue: '11'
keyword:
- Polymers and Plastics
- Condensed Matter Physics
language:
- iso: eng
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
- 1612-8869
publication_status: published
publisher: Wiley
status: public
title: Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma
polymer thin films before and after plasma oxidation
type: journal_article
user_id: '54556'
volume: 19
year: '2022'
...
---
_id: '46479'
article_number: '128927'
author:
- first_name: K.
full_name: Bobzin, K.
last_name: Bobzin
- first_name: C.
full_name: Kalscheuer, C.
last_name: Kalscheuer
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: S.
full_name: Kollmann, S.
last_name: Kollmann
- first_name: M.
full_name: Carlet, M.
last_name: Carlet
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
citation:
ama: Bobzin K, Kalscheuer C, Grundmeier G, Kollmann S, Carlet M, de los Arcos de
Pedro MT. Oxidation stability of chromium aluminum oxynitride hard coatings. Surface
and Coatings Technology. 2022;449. doi:10.1016/j.surfcoat.2022.128927
apa: Bobzin, K., Kalscheuer, C., Grundmeier, G., Kollmann, S., Carlet, M., &
de los Arcos de Pedro, M. T. (2022). Oxidation stability of chromium aluminum
oxynitride hard coatings. Surface and Coatings Technology, 449,
Article 128927. https://doi.org/10.1016/j.surfcoat.2022.128927
bibtex: '@article{Bobzin_Kalscheuer_Grundmeier_Kollmann_Carlet_de los Arcos de Pedro_2022,
title={Oxidation stability of chromium aluminum oxynitride hard coatings}, volume={449},
DOI={10.1016/j.surfcoat.2022.128927},
number={128927}, journal={Surface and Coatings Technology}, publisher={Elsevier
BV}, author={Bobzin, K. and Kalscheuer, C. and Grundmeier, Guido and Kollmann,
S. and Carlet, M. and de los Arcos de Pedro, Maria Teresa}, year={2022} }'
chicago: Bobzin, K., C. Kalscheuer, Guido Grundmeier, S. Kollmann, M. Carlet, and
Maria Teresa de los Arcos de Pedro. “Oxidation Stability of Chromium Aluminum
Oxynitride Hard Coatings.” Surface and Coatings Technology 449 (2022).
https://doi.org/10.1016/j.surfcoat.2022.128927.
ieee: 'K. Bobzin, C. Kalscheuer, G. Grundmeier, S. Kollmann, M. Carlet, and M. T.
de los Arcos de Pedro, “Oxidation stability of chromium aluminum oxynitride hard
coatings,” Surface and Coatings Technology, vol. 449, Art. no. 128927,
2022, doi: 10.1016/j.surfcoat.2022.128927.'
mla: Bobzin, K., et al. “Oxidation Stability of Chromium Aluminum Oxynitride Hard
Coatings.” Surface and Coatings Technology, vol. 449, 128927, Elsevier
BV, 2022, doi:10.1016/j.surfcoat.2022.128927.
short: K. Bobzin, C. Kalscheuer, G. Grundmeier, S. Kollmann, M. Carlet, M.T. de
los Arcos de Pedro, Surface and Coatings Technology 449 (2022).
date_created: 2023-08-11T14:08:33Z
date_updated: 2023-08-11T14:13:27Z
department:
- _id: '302'
doi: 10.1016/j.surfcoat.2022.128927
intvolume: ' 449'
keyword:
- Materials Chemistry
- Surfaces
- Coatings and Films
- Surfaces and Interfaces
- Condensed Matter Physics
- General Chemistry
language:
- iso: eng
publication: Surface and Coatings Technology
publication_identifier:
issn:
- 0257-8972
publication_status: published
publisher: Elsevier BV
status: public
title: Oxidation stability of chromium aluminum oxynitride hard coatings
type: journal_article
user_id: '54556'
volume: 449
year: '2022'
...
---
_id: '34087'
author:
- first_name: Steffen
full_name: Knust, Steffen
last_name: Knust
- first_name: Lukas
full_name: Ruhm, Lukas
last_name: Ruhm
- first_name: Andreas
full_name: Kuhlmann, Andreas
last_name: Kuhlmann
- first_name: Dennis
full_name: Meinderink, Dennis
id: '32378'
last_name: Meinderink
orcid: 0000-0002-2755-6514
- first_name: Julius
full_name: Bürger, Julius
id: '46952'
last_name: Bürger
- first_name: Jörg
full_name: Lindner, Jörg
id: '20797'
last_name: Lindner
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Knust S, Ruhm L, Kuhlmann A, et al. In situ backside Raman spectroscopy of
zinc oxide nanorods in an atmospheric‐pressure dielectric barrier discharge plasma.
Journal of Raman Spectroscopy. 2021;52(7):1237-1245. doi:10.1002/jrs.6123
apa: Knust, S., Ruhm, L., Kuhlmann, A., Meinderink, D., Bürger, J., Lindner, J.,
de los Arcos de Pedro, M. T., & Grundmeier, G. (2021). In situ backside Raman
spectroscopy of zinc oxide nanorods in an atmospheric‐pressure dielectric barrier
discharge plasma. Journal of Raman Spectroscopy, 52(7), 1237–1245.
https://doi.org/10.1002/jrs.6123
bibtex: '@article{Knust_Ruhm_Kuhlmann_Meinderink_Bürger_Lindner_de los Arcos de
Pedro_Grundmeier_2021, title={In situ backside Raman spectroscopy of zinc oxide
nanorods in an atmospheric‐pressure dielectric barrier discharge plasma}, volume={52},
DOI={10.1002/jrs.6123}, number={7},
journal={Journal of Raman Spectroscopy}, publisher={Wiley}, author={Knust, Steffen
and Ruhm, Lukas and Kuhlmann, Andreas and Meinderink, Dennis and Bürger, Julius
and Lindner, Jörg and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido},
year={2021}, pages={1237–1245} }'
chicago: 'Knust, Steffen, Lukas Ruhm, Andreas Kuhlmann, Dennis Meinderink, Julius
Bürger, Jörg Lindner, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier.
“In Situ Backside Raman Spectroscopy of Zinc Oxide Nanorods in an Atmospheric‐pressure
Dielectric Barrier Discharge Plasma.” Journal of Raman Spectroscopy 52,
no. 7 (2021): 1237–45. https://doi.org/10.1002/jrs.6123.'
ieee: 'S. Knust et al., “In situ backside Raman spectroscopy of zinc oxide
nanorods in an atmospheric‐pressure dielectric barrier discharge plasma,” Journal
of Raman Spectroscopy, vol. 52, no. 7, pp. 1237–1245, 2021, doi: 10.1002/jrs.6123.'
mla: Knust, Steffen, et al. “In Situ Backside Raman Spectroscopy of Zinc Oxide Nanorods
in an Atmospheric‐pressure Dielectric Barrier Discharge Plasma.” Journal of
Raman Spectroscopy, vol. 52, no. 7, Wiley, 2021, pp. 1237–45, doi:10.1002/jrs.6123.
short: S. Knust, L. Ruhm, A. Kuhlmann, D. Meinderink, J. Bürger, J. Lindner, M.T.
de los Arcos de Pedro, G. Grundmeier, Journal of Raman Spectroscopy 52 (2021)
1237–1245.
date_created: 2022-11-15T14:08:53Z
date_updated: 2023-01-04T14:51:10Z
department:
- _id: '15'
doi: 10.1002/jrs.6123
intvolume: ' 52'
issue: '7'
keyword:
- Spectroscopy
- General Materials Science
language:
- iso: eng
page: 1237-1245
publication: Journal of Raman Spectroscopy
publication_identifier:
issn:
- 0377-0486
- 1097-4555
publication_status: published
publisher: Wiley
status: public
title: In situ backside Raman spectroscopy of zinc oxide nanorods in an atmospheric‐pressure
dielectric barrier discharge plasma
type: journal_article
user_id: '77496'
volume: 52
year: '2021'
...
---
_id: '22538'
article_number: '103256'
author:
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Hendrik
full_name: Müller, Hendrik
last_name: Müller
- first_name: Fuzeng
full_name: Wang, Fuzeng
last_name: Wang
- first_name: Varun Raj
full_name: Damerla, Varun Raj
last_name: Damerla
- first_name: Christian
full_name: Hoppe, Christian
last_name: Hoppe
- first_name: Christian
full_name: Weinberger, Christian
last_name: Weinberger
- first_name: Michael
full_name: Tiemann, Michael
last_name: Tiemann
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
citation:
ama: de los Arcos de Pedro MT, Müller H, Wang F, et al. Review of infrared spectroscopy
techniques for the determination of internal structure in thin SiO2 films. Vibrational
Spectroscopy. Published online 2021. doi:10.1016/j.vibspec.2021.103256
apa: de los Arcos de Pedro, M. T., Müller, H., Wang, F., Damerla, V. R., Hoppe,
C., Weinberger, C., Tiemann, M., & Grundmeier, G. (2021). Review of infrared
spectroscopy techniques for the determination of internal structure in thin SiO2
films. Vibrational Spectroscopy, Article 103256. https://doi.org/10.1016/j.vibspec.2021.103256
bibtex: '@article{de los Arcos de Pedro_Müller_Wang_Damerla_Hoppe_Weinberger_Tiemann_Grundmeier_2021,
title={Review of infrared spectroscopy techniques for the determination of internal
structure in thin SiO2 films}, DOI={10.1016/j.vibspec.2021.103256},
number={103256}, journal={Vibrational Spectroscopy}, author={de los Arcos de Pedro,
Maria Teresa and Müller, Hendrik and Wang, Fuzeng and Damerla, Varun Raj and Hoppe,
Christian and Weinberger, Christian and Tiemann, Michael and Grundmeier, Guido},
year={2021} }'
chicago: Arcos de Pedro, Maria Teresa de los, Hendrik Müller, Fuzeng Wang, Varun
Raj Damerla, Christian Hoppe, Christian Weinberger, Michael Tiemann, and Guido
Grundmeier. “Review of Infrared Spectroscopy Techniques for the Determination
of Internal Structure in Thin SiO2 Films.” Vibrational Spectroscopy, 2021.
https://doi.org/10.1016/j.vibspec.2021.103256.
ieee: 'M. T. de los Arcos de Pedro et al., “Review of infrared spectroscopy
techniques for the determination of internal structure in thin SiO2 films,” Vibrational
Spectroscopy, Art. no. 103256, 2021, doi: 10.1016/j.vibspec.2021.103256.'
mla: de los Arcos de Pedro, Maria Teresa, et al. “Review of Infrared Spectroscopy
Techniques for the Determination of Internal Structure in Thin SiO2 Films.” Vibrational
Spectroscopy, 103256, 2021, doi:10.1016/j.vibspec.2021.103256.
short: M.T. de los Arcos de Pedro, H. Müller, F. Wang, V.R. Damerla, C. Hoppe, C.
Weinberger, M. Tiemann, G. Grundmeier, Vibrational Spectroscopy (2021).
date_created: 2021-07-07T08:37:38Z
date_updated: 2023-01-24T08:32:59Z
department:
- _id: '302'
doi: 10.1016/j.vibspec.2021.103256
language:
- iso: eng
publication: Vibrational Spectroscopy
publication_identifier:
issn:
- 0924-2031
publication_status: published
status: public
title: Review of infrared spectroscopy techniques for the determination of internal
structure in thin SiO2 films
type: journal_article
user_id: '54556'
year: '2021'
...
---
_id: '22539'
article_number: '127417'
author:
- first_name: K.
full_name: Bobzin, K.
last_name: Bobzin
- first_name: C.
full_name: Kalscheuer, C.
last_name: Kalscheuer
- first_name: G.
full_name: Grundmeier, G.
last_name: Grundmeier
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: S.
full_name: Schwiderek, S.
last_name: Schwiderek
- first_name: M.
full_name: Carlet, M.
last_name: Carlet
citation:
ama: 'Bobzin K, Kalscheuer C, Grundmeier G, de los Arcos de Pedro MT, Schwiderek
S, Carlet M. Design of a TiAlON multilayer coating: Oxidation stability and deformation
behavior. Surface and Coatings Technology. Published online 2021. doi:10.1016/j.surfcoat.2021.127417'
apa: 'Bobzin, K., Kalscheuer, C., Grundmeier, G., de los Arcos de Pedro, M. T.,
Schwiderek, S., & Carlet, M. (2021). Design of a TiAlON multilayer coating:
Oxidation stability and deformation behavior. Surface and Coatings Technology,
Article 127417. https://doi.org/10.1016/j.surfcoat.2021.127417'
bibtex: '@article{Bobzin_Kalscheuer_Grundmeier_de los Arcos de Pedro_Schwiderek_Carlet_2021,
title={Design of a TiAlON multilayer coating: Oxidation stability and deformation
behavior}, DOI={10.1016/j.surfcoat.2021.127417},
number={127417}, journal={Surface and Coatings Technology}, author={Bobzin, K.
and Kalscheuer, C. and Grundmeier, G. and de los Arcos de Pedro, Maria Teresa
and Schwiderek, S. and Carlet, M.}, year={2021} }'
chicago: 'Bobzin, K., C. Kalscheuer, G. Grundmeier, Maria Teresa de los Arcos de
Pedro, S. Schwiderek, and M. Carlet. “Design of a TiAlON Multilayer Coating: Oxidation
Stability and Deformation Behavior.” Surface and Coatings Technology, 2021.
https://doi.org/10.1016/j.surfcoat.2021.127417.'
ieee: 'K. Bobzin, C. Kalscheuer, G. Grundmeier, M. T. de los Arcos de Pedro, S.
Schwiderek, and M. Carlet, “Design of a TiAlON multilayer coating: Oxidation stability
and deformation behavior,” Surface and Coatings Technology, Art. no. 127417,
2021, doi: 10.1016/j.surfcoat.2021.127417.'
mla: 'Bobzin, K., et al. “Design of a TiAlON Multilayer Coating: Oxidation Stability
and Deformation Behavior.” Surface and Coatings Technology, 127417, 2021,
doi:10.1016/j.surfcoat.2021.127417.'
short: K. Bobzin, C. Kalscheuer, G. Grundmeier, M.T. de los Arcos de Pedro, S. Schwiderek,
M. Carlet, Surface and Coatings Technology (2021).
date_created: 2021-07-07T08:38:02Z
date_updated: 2023-01-24T08:33:14Z
department:
- _id: '302'
doi: 10.1016/j.surfcoat.2021.127417
language:
- iso: eng
publication: Surface and Coatings Technology
publication_identifier:
issn:
- 0257-8972
publication_status: published
status: public
title: 'Design of a TiAlON multilayer coating: Oxidation stability and deformation
behavior'
type: journal_article
user_id: '54556'
year: '2021'
...