Correlation between atmospheric DBD plasma-induced surface chemical changes on a ZnMgAl alloy coating and the resulting adhesive properties.
author: - first_name: Steffen full_name: Knust, Steffen last_name: Knust - first_name: Andreas full_name: Kuhlmann, Andreas last_name: Kuhlmann - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier citation: ama: Knust S, Kuhlmann A, de los Arcos de Pedro MT, Grundmeier G. Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma. RSC Advances. Published online 2019:35077-35088. doi:10.1039/c9ra07378g apa: Knust, S., Kuhlmann, A., de los Arcos de Pedro, M. T., & Grundmeier, G. (2019). Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma. RSC Advances, 35077–35088. https://doi.org/10.1039/c9ra07378g bibtex: '@article{Knust_Kuhlmann_de los Arcos de Pedro_Grundmeier_2019, title={Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma}, DOI={10.1039/c9ra07378g}, journal={RSC Advances}, author={Knust, Steffen and Kuhlmann, Andreas and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2019}, pages={35077–35088} }' chicago: Knust, Steffen, Andreas Kuhlmann, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Surface Modification of ZnMgAl-Coated Steel by Dielectric-Barrier Discharge Plasma.” RSC Advances, 2019, 35077–88. https://doi.org/10.1039/c9ra07378g. ieee: 'S. Knust, A. Kuhlmann, M. T. de los Arcos de Pedro, and G. Grundmeier, “Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma,” RSC Advances, pp. 35077–35088, 2019, doi: 10.1039/c9ra07378g.' mla: Knust, Steffen, et al. “Surface Modification of ZnMgAl-Coated Steel by Dielectric-Barrier Discharge Plasma.” RSC Advances, 2019, pp. 35077–88, doi:10.1039/c9ra07378g. short: S. Knust, A. Kuhlmann, M.T. de los Arcos de Pedro, G. Grundmeier, RSC Advances (2019) 35077–35088. date_created: 2021-07-07T08:45:19Z date_updated: 2023-01-24T08:34:36Z department: - _id: '302' doi: 10.1039/c9ra07378g language: - iso: eng page: 35077-35088 publication: RSC Advances publication_identifier: issn: - 2046-2069 publication_status: published status: public title: Surface modification of ZnMgAl-coated steel by dielectric-barrier discharge plasma type: journal_article user_id: '54556' year: '2019' ... --- _id: '22541' abstract: - lang: eng text: Monodisperse micron-sized silica particle monolayers deposited onto plasma-grown SiOx-ultra-thin films have been used as reference systems to investigate wetting, water adsorption and capillary bridge formation as a function of silica surface functionalization. 1H,1H, 2H,2H perfluorooctyltriethoxysil (FOTS) monolayers, have been deposited on the respective surfaces by means of chemical vapor deposition resulting in macroscopically low energy surfaces. X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FTIR) reflection absorption spectroscopy confirmed the monolayer formation. Water adsorption isotherms were studied by a combination of in-situ FTIR reflection spectroscopy and quartz crystal microbalance (QCM) while macroscopic wetting was analysed by contact angle measurements. The comparative data evaluation indicates that the macroscopic wetting behaviour was changed as expected, however, that water nanodroplets formed both at intrinsic defects of the FOTS monolayer and at the FOTS/SiOx interface. Capillary bridges of liquid water are dominantly formed in the confined particle contact areas and between surface asperities on the particles. The comparison of wetting, adsorption and capillary bridge formation shows that the hydrophobization of porous materials by organosilane monolayers leads to the formation of morphology dependent nanoscopic defects that act as sites for preferential capillary bridge formation. author: - first_name: Ignacio full_name: Giner, Ignacio last_name: Giner - first_name: Boray full_name: Torun, Boray last_name: Torun - first_name: Yan full_name: Han, Yan last_name: Han - first_name: Belma full_name: Duderija, Belma id: '54863' last_name: Duderija - first_name: Dennis full_name: Meinderink, Dennis last_name: Meinderink - first_name: Alejandro González full_name: Orive, Alejandro González last_name: Orive - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Christian full_name: Weinberger, Christian last_name: Weinberger - first_name: Michael full_name: Tiemann, Michael id: '23547' last_name: Tiemann orcid: 0000-0003-1711-2722 - first_name: Hans-Joachim full_name: Schmid, Hans-Joachim id: '464' last_name: Schmid orcid: 000-0001-8590-1921 - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier citation: ama: Giner I, Torun B, Han Y, et al. Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers. Applied Surface Science. Published online 2019:873-879. doi:10.1016/j.apsusc.2018.12.221 apa: Giner, I., Torun, B., Han, Y., Duderija, B., Meinderink, D., Orive, A. G., de los Arcos de Pedro, M. T., Weinberger, C., Tiemann, M., Schmid, H.-J., & Grundmeier, G. (2019). Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers. Applied Surface Science, 873–879. https://doi.org/10.1016/j.apsusc.2018.12.221 bibtex: '@article{Giner_Torun_Han_Duderija_Meinderink_Orive_de los Arcos de Pedro_Weinberger_Tiemann_Schmid_et al._2019, title={Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers}, DOI={10.1016/j.apsusc.2018.12.221}, journal={Applied Surface Science}, author={Giner, Ignacio and Torun, Boray and Han, Yan and Duderija, Belma and Meinderink, Dennis and Orive, Alejandro González and de los Arcos de Pedro, Maria Teresa and Weinberger, Christian and Tiemann, Michael and Schmid, Hans-Joachim and et al.}, year={2019}, pages={873–879} }' chicago: Giner, Ignacio, Boray Torun, Yan Han, Belma Duderija, Dennis Meinderink, Alejandro González Orive, Maria Teresa de los Arcos de Pedro, et al. “Water Adsorption and Capillary Bridge Formation on Silica Micro-Particle Layers Modified with Perfluorinated Organosilane Monolayers.” Applied Surface Science, 2019, 873–79. https://doi.org/10.1016/j.apsusc.2018.12.221. ieee: 'I. Giner et al., “Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers,” Applied Surface Science, pp. 873–879, 2019, doi: 10.1016/j.apsusc.2018.12.221.' mla: Giner, Ignacio, et al. “Water Adsorption and Capillary Bridge Formation on Silica Micro-Particle Layers Modified with Perfluorinated Organosilane Monolayers.” Applied Surface Science, 2019, pp. 873–79, doi:10.1016/j.apsusc.2018.12.221. short: I. Giner, B. Torun, Y. Han, B. Duderija, D. Meinderink, A.G. Orive, M.T. de los Arcos de Pedro, C. Weinberger, M. Tiemann, H.-J. Schmid, G. Grundmeier, Applied Surface Science (2019) 873–879. date_created: 2021-07-07T08:40:38Z date_updated: 2023-07-12T07:58:00Z department: - _id: '302' doi: 10.1016/j.apsusc.2018.12.221 language: - iso: eng page: 873-879 publication: Applied Surface Science publication_identifier: issn: - 0169-4332 publication_status: published status: public title: Water adsorption and capillary bridge formation on silica micro-particle layers modified with perfluorinated organosilane monolayers type: journal_article user_id: '54863' year: '2019' ... --- _id: '22562' article_number: '9215' author: - first_name: Xia full_name: Wu, Xia last_name: Wu - first_name: Maren full_name: Muntzeck, Maren last_name: Muntzeck - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: René full_name: Wilhelm, René last_name: Wilhelm - first_name: Thorsten full_name: Wagner, Thorsten last_name: Wagner citation: ama: Wu X, Muntzeck M, de los Arcos de Pedro MT, Grundmeier G, Wilhelm R, Wagner T. Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids. Applied Optics. Published online 2018. doi:10.1364/ao.57.009215 apa: Wu, X., Muntzeck, M., de los Arcos de Pedro, M. T., Grundmeier, G., Wilhelm, R., & Wagner, T. (2018). Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids. Applied Optics, Article 9215. https://doi.org/10.1364/ao.57.009215 bibtex: '@article{Wu_Muntzeck_de los Arcos de Pedro_Grundmeier_Wilhelm_Wagner_2018, title={Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids}, DOI={10.1364/ao.57.009215}, number={9215}, journal={Applied Optics}, author={Wu, Xia and Muntzeck, Maren and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Wilhelm, René and Wagner, Thorsten}, year={2018} }' chicago: Wu, Xia, Maren Muntzeck, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, René Wilhelm, and Thorsten Wagner. “Determination of the Refractive Indices of Ionic Liquids by Ellipsometry, and Their Application as Immersion Liquids.” Applied Optics, 2018. https://doi.org/10.1364/ao.57.009215. ieee: 'X. Wu, M. Muntzeck, M. T. de los Arcos de Pedro, G. Grundmeier, R. Wilhelm, and T. Wagner, “Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids,” Applied Optics, Art. no. 9215, 2018, doi: 10.1364/ao.57.009215.' mla: Wu, Xia, et al. “Determination of the Refractive Indices of Ionic Liquids by Ellipsometry, and Their Application as Immersion Liquids.” Applied Optics, 9215, 2018, doi:10.1364/ao.57.009215. short: X. Wu, M. Muntzeck, M.T. de los Arcos de Pedro, G. Grundmeier, R. Wilhelm, T. Wagner, Applied Optics (2018). date_created: 2021-07-07T09:05:36Z date_updated: 2023-01-24T08:11:01Z department: - _id: '302' doi: 10.1364/ao.57.009215 language: - iso: eng publication: Applied Optics publication_identifier: issn: - 1559-128X - 2155-3165 publication_status: published status: public title: Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids type: journal_article user_id: '54556' year: '2018' ... --- _id: '22540' abstract: - lang: eng text:Development of two new neodymium containing precursors and their successful implementation in the MOCVD of luminescent Nd2S3 thin films.
author: - first_name: Stefan full_name: Cwik, Stefan last_name: Cwik - first_name: Sebastian M. J. full_name: Beer, Sebastian M. J. last_name: Beer - first_name: Marcel full_name: Schmidt, Marcel last_name: Schmidt - first_name: Nils C. full_name: Gerhardt, Nils C. last_name: Gerhardt - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Detlef full_name: Rogalla, Detlef last_name: Rogalla - first_name: Jana full_name: Weßing, Jana last_name: Weßing - first_name: Ignacio full_name: Giner, Ignacio last_name: Giner - first_name: Martin full_name: Hofmann, Martin last_name: Hofmann - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: Andreas D. full_name: Wieck, Andreas D. last_name: Wieck - first_name: Anjana full_name: Devi, Anjana last_name: Devi citation: ama: 'Cwik S, Beer SMJ, Schmidt M, et al. Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides. Dalton Transactions. Published online 2018:2926-2938. doi:10.1039/c8dt04317e' apa: 'Cwik, S., Beer, S. M. J., Schmidt, M., Gerhardt, N. C., de los Arcos de Pedro, M. T., Rogalla, D., Weßing, J., Giner, I., Hofmann, M., Grundmeier, G., Wieck, A. D., & Devi, A. (2018). Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides. Dalton Transactions, 2926–2938. https://doi.org/10.1039/c8dt04317e' bibtex: '@article{Cwik_Beer_Schmidt_Gerhardt_de los Arcos de Pedro_Rogalla_Weßing_Giner_Hofmann_Grundmeier_et al._2018, title={Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides}, DOI={10.1039/c8dt04317e}, journal={Dalton Transactions}, author={Cwik, Stefan and Beer, Sebastian M. J. and Schmidt, Marcel and Gerhardt, Nils C. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Weßing, Jana and Giner, Ignacio and Hofmann, Martin and Grundmeier, Guido and et al.}, year={2018}, pages={2926–2938} }' chicago: 'Cwik, Stefan, Sebastian M. J. Beer, Marcel Schmidt, Nils C. Gerhardt, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Jana Weßing, et al. “Luminescent Nd2S3 Thin Films: A New Chemical Vapour Deposition Route towards Rare-Earth Sulphides.” Dalton Transactions, 2018, 2926–38. https://doi.org/10.1039/c8dt04317e.' ieee: 'S. Cwik et al., “Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides,” Dalton Transactions, pp. 2926–2938, 2018, doi: 10.1039/c8dt04317e.' mla: 'Cwik, Stefan, et al. “Luminescent Nd2S3 Thin Films: A New Chemical Vapour Deposition Route towards Rare-Earth Sulphides.” Dalton Transactions, 2018, pp. 2926–38, doi:10.1039/c8dt04317e.' short: S. Cwik, S.M.J. Beer, M. Schmidt, N.C. Gerhardt, M.T. de los Arcos de Pedro, D. Rogalla, J. Weßing, I. Giner, M. Hofmann, G. Grundmeier, A.D. Wieck, A. Devi, Dalton Transactions (2018) 2926–2938. date_created: 2021-07-07T08:40:12Z date_updated: 2023-01-24T08:35:36Z department: - _id: '302' doi: 10.1039/c8dt04317e language: - iso: eng page: 2926-2938 publication: Dalton Transactions publication_identifier: issn: - 1477-9226 - 1477-9234 publication_status: published status: public title: 'Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides' type: journal_article user_id: '54556' year: '2018' ... --- _id: '22542' author: - first_name: Dennis full_name: Kirchheim, Dennis last_name: Kirchheim - first_name: Stefan full_name: Wilski, Stefan last_name: Wilski - first_name: Montgomery full_name: Jaritz, Montgomery last_name: Jaritz - first_name: Felix full_name: Mitschker, Felix last_name: Mitschker - first_name: Moritz full_name: Oberberg, Moritz last_name: Oberberg - first_name: Jan full_name: Trieschmann, Jan last_name: Trieschmann - first_name: Lars full_name: Banko, Lars last_name: Banko - first_name: Markus full_name: Brochhagen, Markus last_name: Brochhagen - first_name: Rabea full_name: Schreckenberg, Rabea last_name: Schreckenberg - first_name: Christian full_name: Hopmann, Christian last_name: Hopmann - first_name: Marc full_name: Böke, Marc last_name: Böke - first_name: Jan full_name: Benedikt, Jan last_name: Benedikt - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: Dario full_name: Grochla, Dario last_name: Grochla - first_name: Alfred full_name: Ludwig, Alfred last_name: Ludwig - first_name: Thomas full_name: Mussenbrock, Thomas last_name: Mussenbrock - first_name: Ralf Peter full_name: Brinkmann, Ralf Peter last_name: Brinkmann - first_name: Peter full_name: Awakowicz, Peter last_name: Awakowicz - first_name: Rainer full_name: Dahlmann, Rainer last_name: Dahlmann citation: ama: Kirchheim D, Wilski S, Jaritz M, et al. Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD. Journal of Coatings Technology and Research. Published online 2018:573-583. doi:10.1007/s11998-018-0138-4 apa: Kirchheim, D., Wilski, S., Jaritz, M., Mitschker, F., Oberberg, M., Trieschmann, J., Banko, L., Brochhagen, M., Schreckenberg, R., Hopmann, C., Böke, M., Benedikt, J., de los Arcos de Pedro, M. T., Grundmeier, G., Grochla, D., Ludwig, A., Mussenbrock, T., Brinkmann, R. P., Awakowicz, P., & Dahlmann, R. (2018). Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD. Journal of Coatings Technology and Research, 573–583. https://doi.org/10.1007/s11998-018-0138-4 bibtex: '@article{Kirchheim_Wilski_Jaritz_Mitschker_Oberberg_Trieschmann_Banko_Brochhagen_Schreckenberg_Hopmann_et al._2018, title={Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD}, DOI={10.1007/s11998-018-0138-4}, journal={Journal of Coatings Technology and Research}, author={Kirchheim, Dennis and Wilski, Stefan and Jaritz, Montgomery and Mitschker, Felix and Oberberg, Moritz and Trieschmann, Jan and Banko, Lars and Brochhagen, Markus and Schreckenberg, Rabea and Hopmann, Christian and et al.}, year={2018}, pages={573–583} }' chicago: Kirchheim, Dennis, Stefan Wilski, Montgomery Jaritz, Felix Mitschker, Moritz Oberberg, Jan Trieschmann, Lars Banko, et al. “Improved Homogeneity of Plasma and Coating Properties Using a Lance Matrix Gas Distribution in MW-PECVD.” Journal of Coatings Technology and Research, 2018, 573–83. https://doi.org/10.1007/s11998-018-0138-4. ieee: 'D. Kirchheim et al., “Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD,” Journal of Coatings Technology and Research, pp. 573–583, 2018, doi: 10.1007/s11998-018-0138-4.' mla: Kirchheim, Dennis, et al. “Improved Homogeneity of Plasma and Coating Properties Using a Lance Matrix Gas Distribution in MW-PECVD.” Journal of Coatings Technology and Research, 2018, pp. 573–83, doi:10.1007/s11998-018-0138-4. short: D. Kirchheim, S. Wilski, M. Jaritz, F. Mitschker, M. Oberberg, J. Trieschmann, L. Banko, M. Brochhagen, R. Schreckenberg, C. Hopmann, M. Böke, J. Benedikt, M.T. de los Arcos de Pedro, G. Grundmeier, D. Grochla, A. Ludwig, T. Mussenbrock, R.P. Brinkmann, P. Awakowicz, R. Dahlmann, Journal of Coatings Technology and Research (2018) 573–583. date_created: 2021-07-07T08:41:15Z date_updated: 2023-01-24T08:36:23Z department: - _id: '302' doi: 10.1007/s11998-018-0138-4 language: - iso: eng page: 573-583 publication: Journal of Coatings Technology and Research publication_identifier: issn: - 1547-0091 - 1935-3804 publication_status: published status: public title: Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD type: journal_article user_id: '54556' year: '2018' ... --- _id: '22546' article_number: '1801540' author: - first_name: David full_name: Zanders, David last_name: Zanders - first_name: Engin full_name: Ciftyurek, Engin last_name: Ciftyurek - first_name: Christian full_name: Hoppe, Christian last_name: Hoppe - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Aleksander full_name: Kostka, Aleksander last_name: Kostka - first_name: Detlef full_name: Rogalla, Detlef last_name: Rogalla - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: Klaus Dieter full_name: Schierbaum, Klaus Dieter last_name: Schierbaum - first_name: Anjana full_name: Devi, Anjana last_name: Devi citation: ama: 'Zanders D, Ciftyurek E, Hoppe C, et al. Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. Advanced Materials Interfaces. Published online 2018. doi:10.1002/admi.201801540' apa: 'Zanders, D., Ciftyurek, E., Hoppe, C., de los Arcos de Pedro, M. T., Kostka, A., Rogalla, D., Grundmeier, G., Schierbaum, K. D., & Devi, A. (2018). Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. Advanced Materials Interfaces, Article 1801540. https://doi.org/10.1002/admi.201801540' bibtex: '@article{Zanders_Ciftyurek_Hoppe_de los Arcos de Pedro_Kostka_Rogalla_Grundmeier_Schierbaum_Devi_2018, title={Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties}, DOI={10.1002/admi.201801540}, number={1801540}, journal={Advanced Materials Interfaces}, author={Zanders, David and Ciftyurek, Engin and Hoppe, Christian and de los Arcos de Pedro, Maria Teresa and Kostka, Aleksander and Rogalla, Detlef and Grundmeier, Guido and Schierbaum, Klaus Dieter and Devi, Anjana}, year={2018} }' chicago: 'Zanders, David, Engin Ciftyurek, Christian Hoppe, Maria Teresa de los Arcos de Pedro, Aleksander Kostka, Detlef Rogalla, Guido Grundmeier, Klaus Dieter Schierbaum, and Anjana Devi. “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.” Advanced Materials Interfaces, 2018. https://doi.org/10.1002/admi.201801540.' ieee: 'D. Zanders et al., “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties,” Advanced Materials Interfaces, Art. no. 1801540, 2018, doi: 10.1002/admi.201801540.' mla: 'Zanders, David, et al. “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.” Advanced Materials Interfaces, 1801540, 2018, doi:10.1002/admi.201801540.' short: D. Zanders, E. Ciftyurek, C. Hoppe, M.T. de los Arcos de Pedro, A. Kostka, D. Rogalla, G. Grundmeier, K.D. Schierbaum, A. Devi, Advanced Materials Interfaces (2018). date_created: 2021-07-07T08:50:07Z date_updated: 2023-01-24T08:36:44Z department: - _id: '302' doi: 10.1002/admi.201801540 language: - iso: eng publication: Advanced Materials Interfaces publication_identifier: issn: - 2196-7350 - 2196-7350 publication_status: published status: public title: 'Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO 2 Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties' type: journal_article user_id: '54556' year: '2018' ... --- _id: '22550' author: - first_name: Maximilian full_name: Gebhard, Maximilian last_name: Gebhard - first_name: Lukas full_name: Mai, Lukas last_name: Mai - first_name: Lars full_name: Banko, Lars last_name: Banko - first_name: Felix full_name: Mitschker, Felix last_name: Mitschker - first_name: Christian full_name: Hoppe, Christian last_name: Hoppe - first_name: Montgomery full_name: Jaritz, Montgomery last_name: Jaritz - first_name: Dennis full_name: Kirchheim, Dennis last_name: Kirchheim - first_name: Christoph full_name: Zekorn, Christoph last_name: Zekorn - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Dario full_name: Grochla, Dario last_name: Grochla - first_name: Rainer full_name: Dahlmann, Rainer last_name: Dahlmann - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: Peter full_name: Awakowicz, Peter last_name: Awakowicz - first_name: Alfred full_name: Ludwig, Alfred last_name: Ludwig - first_name: Anjana full_name: Devi, Anjana last_name: Devi citation: ama: 'Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces. Published online 2018:7422-7434. doi:10.1021/acsami.7b14916' apa: 'Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., & Devi, A. (2018). PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces, 7422–7434. https://doi.org/10.1021/acsami.7b14916' bibtex: '@article{Gebhard_Mai_Banko_Mitschker_Hoppe_Jaritz_Kirchheim_Zekorn_de los Arcos de Pedro_Grochla_et al._2018, title={PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads}, DOI={10.1021/acsami.7b14916}, journal={ACS Applied Materials & Interfaces}, author={Gebhard, Maximilian and Mai, Lukas and Banko, Lars and Mitschker, Felix and Hoppe, Christian and Jaritz, Montgomery and Kirchheim, Dennis and Zekorn, Christoph and de los Arcos de Pedro, Maria Teresa and Grochla, Dario and et al.}, year={2018}, pages={7422–7434} }' chicago: 'Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” ACS Applied Materials & Interfaces, 2018, 7422–34. https://doi.org/10.1021/acsami.7b14916.' ieee: 'M. Gebhard et al., “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” ACS Applied Materials & Interfaces, pp. 7422–7434, 2018, doi: 10.1021/acsami.7b14916.' mla: 'Gebhard, Maximilian, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” ACS Applied Materials & Interfaces, 2018, pp. 7422–34, doi:10.1021/acsami.7b14916.' short: M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials & Interfaces (2018) 7422–7434. date_created: 2021-07-07T08:59:20Z date_updated: 2023-01-24T08:38:00Z department: - _id: '302' doi: 10.1021/acsami.7b14916 language: - iso: eng page: 7422-7434 publication: ACS Applied Materials & Interfaces publication_identifier: issn: - 1944-8244 - 1944-8252 publication_status: published status: public title: 'PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads' type: journal_article user_id: '54556' year: '2018' ... --- _id: '22549' author: - first_name: Maximilian full_name: Gebhard, Maximilian last_name: Gebhard - first_name: Lukas full_name: Mai, Lukas last_name: Mai - first_name: Lars full_name: Banko, Lars last_name: Banko - first_name: Felix full_name: Mitschker, Felix last_name: Mitschker - first_name: Christian full_name: Hoppe, Christian last_name: Hoppe - first_name: Montgomery full_name: Jaritz, Montgomery last_name: Jaritz - first_name: Dennis full_name: Kirchheim, Dennis last_name: Kirchheim - first_name: Christoph full_name: Zekorn, Christoph last_name: Zekorn - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Dario full_name: Grochla, Dario last_name: Grochla - first_name: Rainer full_name: Dahlmann, Rainer last_name: Dahlmann - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: Peter full_name: Awakowicz, Peter last_name: Awakowicz - first_name: Alfred full_name: Ludwig, Alfred last_name: Ludwig - first_name: Anjana full_name: Devi, Anjana last_name: Devi citation: ama: 'Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces. Published online 2018:7422-7434. doi:10.1021/acsami.7b14916' apa: 'Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., & Devi, A. (2018). PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces, 7422–7434. https://doi.org/10.1021/acsami.7b14916' bibtex: '@article{Gebhard_Mai_Banko_Mitschker_Hoppe_Jaritz_Kirchheim_Zekorn_de los Arcos de Pedro_Grochla_et al._2018, title={PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads}, DOI={10.1021/acsami.7b14916}, journal={ACS Applied Materials & Interfaces}, author={Gebhard, Maximilian and Mai, Lukas and Banko, Lars and Mitschker, Felix and Hoppe, Christian and Jaritz, Montgomery and Kirchheim, Dennis and Zekorn, Christoph and de los Arcos de Pedro, Maria Teresa and Grochla, Dario and et al.}, year={2018}, pages={7422–7434} }' chicago: 'Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” ACS Applied Materials & Interfaces, 2018, 7422–34. https://doi.org/10.1021/acsami.7b14916.' ieee: 'M. Gebhard et al., “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” ACS Applied Materials & Interfaces, pp. 7422–7434, 2018, doi: 10.1021/acsami.7b14916.' mla: 'Gebhard, Maximilian, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” ACS Applied Materials & Interfaces, 2018, pp. 7422–34, doi:10.1021/acsami.7b14916.' short: M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials & Interfaces (2018) 7422–7434. date_created: 2021-07-07T08:59:10Z date_updated: 2023-01-24T08:37:41Z department: - _id: '302' doi: 10.1021/acsami.7b14916 language: - iso: eng page: 7422-7434 publication: ACS Applied Materials & Interfaces publication_identifier: issn: - 1944-8244 - 1944-8252 publication_status: published status: public title: 'PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads' type: journal_article user_id: '54556' year: '2018' ... --- _id: '22551' author: - first_name: Maximilian full_name: Gebhard, Maximilian last_name: Gebhard - first_name: Lukas full_name: Mai, Lukas last_name: Mai - first_name: Lars full_name: Banko, Lars last_name: Banko - first_name: Felix full_name: Mitschker, Felix last_name: Mitschker - first_name: Christian full_name: Hoppe, Christian last_name: Hoppe - first_name: Montgomery full_name: Jaritz, Montgomery last_name: Jaritz - first_name: Dennis full_name: Kirchheim, Dennis last_name: Kirchheim - first_name: Christoph full_name: Zekorn, Christoph last_name: Zekorn - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Dario full_name: Grochla, Dario last_name: Grochla - first_name: Rainer full_name: Dahlmann, Rainer last_name: Dahlmann - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: Peter full_name: Awakowicz, Peter last_name: Awakowicz - first_name: Alfred full_name: Ludwig, Alfred last_name: Ludwig - first_name: Anjana full_name: Devi, Anjana last_name: Devi citation: ama: 'Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces. Published online 2018:7422-7434. doi:10.1021/acsami.7b14916' apa: 'Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., & Devi, A. (2018). PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. ACS Applied Materials & Interfaces, 7422–7434. https://doi.org/10.1021/acsami.7b14916' bibtex: '@article{Gebhard_Mai_Banko_Mitschker_Hoppe_Jaritz_Kirchheim_Zekorn_de los Arcos de Pedro_Grochla_et al._2018, title={PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads}, DOI={10.1021/acsami.7b14916}, journal={ACS Applied Materials & Interfaces}, author={Gebhard, Maximilian and Mai, Lukas and Banko, Lars and Mitschker, Felix and Hoppe, Christian and Jaritz, Montgomery and Kirchheim, Dennis and Zekorn, Christoph and de los Arcos de Pedro, Maria Teresa and Grochla, Dario and et al.}, year={2018}, pages={7422–7434} }' chicago: 'Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” ACS Applied Materials & Interfaces, 2018, 7422–34. https://doi.org/10.1021/acsami.7b14916.' ieee: 'M. Gebhard et al., “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” ACS Applied Materials & Interfaces, pp. 7422–7434, 2018, doi: 10.1021/acsami.7b14916.' mla: 'Gebhard, Maximilian, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” ACS Applied Materials & Interfaces, 2018, pp. 7422–34, doi:10.1021/acsami.7b14916.' short: M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials & Interfaces (2018) 7422–7434. date_created: 2021-07-07T08:59:35Z date_updated: 2023-01-24T08:38:19Z department: - _id: '302' doi: 10.1021/acsami.7b14916 language: - iso: eng page: 7422-7434 publication: ACS Applied Materials & Interfaces publication_identifier: issn: - 1944-8244 - 1944-8252 publication_status: published status: public title: 'PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads' type: journal_article user_id: '54556' year: '2018' ... --- _id: '22548' author: - first_name: J. full_name: Dietrich, J. last_name: Dietrich - first_name: C. full_name: Hoppe, C. last_name: Hoppe - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier citation: ama: Dietrich J, Hoppe C, de los Arcos de Pedro MT, Grundmeier G. Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO x on polypropylene. Contributions to Plasma Physics. Published online 2018:377-383. doi:10.1002/ctpp.201700036 apa: Dietrich, J., Hoppe, C., de los Arcos de Pedro, M. T., & Grundmeier, G. (2018). Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO x on polypropylene. Contributions to Plasma Physics, 377–383. https://doi.org/10.1002/ctpp.201700036 bibtex: '@article{Dietrich_Hoppe_de los Arcos de Pedro_Grundmeier_2018, title={Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO x on polypropylene}, DOI={10.1002/ctpp.201700036}, journal={Contributions to Plasma Physics}, author={Dietrich, J. and Hoppe, C. and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2018}, pages={377–383} }' chicago: Dietrich, J., C. Hoppe, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Combined in Situ Infrared Reflection Absorption Spectroscopy-Quartz Crystal Microbalance Investigation of the Initial Growth Stages of Plasma-Deposited SiO x on Polypropylene.” Contributions to Plasma Physics, 2018, 377–83. https://doi.org/10.1002/ctpp.201700036. ieee: 'J. Dietrich, C. Hoppe, M. T. de los Arcos de Pedro, and G. Grundmeier, “Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO x on polypropylene,” Contributions to Plasma Physics, pp. 377–383, 2018, doi: 10.1002/ctpp.201700036.' mla: Dietrich, J., et al. “Combined in Situ Infrared Reflection Absorption Spectroscopy-Quartz Crystal Microbalance Investigation of the Initial Growth Stages of Plasma-Deposited SiO x on Polypropylene.” Contributions to Plasma Physics, 2018, pp. 377–83, doi:10.1002/ctpp.201700036. short: J. Dietrich, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier, Contributions to Plasma Physics (2018) 377–383. date_created: 2021-07-07T08:57:20Z date_updated: 2023-01-24T08:37:20Z department: - _id: '302' doi: 10.1002/ctpp.201700036 language: - iso: eng page: 377-383 publication: Contributions to Plasma Physics publication_identifier: issn: - 0863-1042 publication_status: published status: public title: Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO x on polypropylene type: journal_article user_id: '54556' year: '2018' ... --- _id: '22547' article_number: '1700230' author: - first_name: Maik full_name: Budde, Maik last_name: Budde - first_name: Carles full_name: Corbella, Carles last_name: Corbella - first_name: Simon full_name: Große-Kreul, Simon last_name: Große-Kreul - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: Achim full_name: von Keudell, Achim last_name: von Keudell citation: ama: Budde M, Corbella C, Große-Kreul S, de los Arcos de Pedro MT, Grundmeier G, von Keudell A. Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. Plasma Processes and Polymers. Published online 2018. doi:10.1002/ppap.201700230 apa: Budde, M., Corbella, C., Große-Kreul, S., de los Arcos de Pedro, M. T., Grundmeier, G., & von Keudell, A. (2018). Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. Plasma Processes and Polymers, Article 1700230. https://doi.org/10.1002/ppap.201700230 bibtex: '@article{Budde_Corbella_Große-Kreul_de los Arcos de Pedro_Grundmeier_von Keudell_2018, title={Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas}, DOI={10.1002/ppap.201700230}, number={1700230}, journal={Plasma Processes and Polymers}, author={Budde, Maik and Corbella, Carles and Große-Kreul, Simon and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and von Keudell, Achim}, year={2018} }' chicago: Budde, Maik, Carles Corbella, Simon Große-Kreul, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, and Achim von Keudell. “Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” Plasma Processes and Polymers, 2018. https://doi.org/10.1002/ppap.201700230. ieee: 'M. Budde, C. Corbella, S. Große-Kreul, M. T. de los Arcos de Pedro, G. Grundmeier, and A. von Keudell, “Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas,” Plasma Processes and Polymers, Art. no. 1700230, 2018, doi: 10.1002/ppap.201700230.' mla: Budde, Maik, et al. “Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” Plasma Processes and Polymers, 1700230, 2018, doi:10.1002/ppap.201700230. short: M. Budde, C. Corbella, S. Große-Kreul, M.T. de los Arcos de Pedro, G. Grundmeier, A. von Keudell, Plasma Processes and Polymers (2018). date_created: 2021-07-07T08:50:38Z date_updated: 2023-01-24T08:37:01Z department: - _id: '302' doi: 10.1002/ppap.201700230 language: - iso: eng publication: Plasma Processes and Polymers publication_identifier: issn: - 1612-8850 publication_status: published status: public title: Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas type: journal_article user_id: '54556' year: '2018' ... --- _id: '22557' abstract: - lang: eng text:A new water assisted atomic layer deposition (ALD) process was developed using the yttrium tris-guanidinate precursor which resulted in device quality thin films.
author: - first_name: Lukas full_name: Mai, Lukas last_name: Mai - first_name: Nils full_name: Boysen, Nils last_name: Boysen - first_name: Ersoy full_name: Subaşı, Ersoy last_name: Subaşı - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Detlef full_name: Rogalla, Detlef last_name: Rogalla - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: Claudia full_name: Bock, Claudia last_name: Bock - first_name: Hong-Liang full_name: Lu, Hong-Liang last_name: Lu - first_name: Anjana full_name: Devi, Anjana last_name: Devi citation: ama: 'Mai L, Boysen N, Subaşı E, et al. Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. RSC Advances. Published online 2018:4987-4994. doi:10.1039/c7ra13417g' apa: 'Mai, L., Boysen, N., Subaşı, E., de los Arcos de Pedro, M. T., Rogalla, D., Grundmeier, G., Bock, C., Lu, H.-L., & Devi, A. (2018). Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. RSC Advances, 4987–4994. https://doi.org/10.1039/c7ra13417g' bibtex: '@article{Mai_Boysen_Subaşı_de los Arcos de Pedro_Rogalla_Grundmeier_Bock_Lu_Devi_2018, title={Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties}, DOI={10.1039/c7ra13417g}, journal={RSC Advances}, author={Mai, Lukas and Boysen, Nils and Subaşı, Ersoy and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Grundmeier, Guido and Bock, Claudia and Lu, Hong-Liang and Devi, Anjana}, year={2018}, pages={4987–4994} }' chicago: 'Mai, Lukas, Nils Boysen, Ersoy Subaşı, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Guido Grundmeier, Claudia Bock, Hong-Liang Lu, and Anjana Devi. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” RSC Advances, 2018, 4987–94. https://doi.org/10.1039/c7ra13417g.' ieee: 'L. Mai et al., “Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties,” RSC Advances, pp. 4987–4994, 2018, doi: 10.1039/c7ra13417g.' mla: 'Mai, Lukas, et al. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” RSC Advances, 2018, pp. 4987–94, doi:10.1039/c7ra13417g.' short: L. Mai, N. Boysen, E. Subaşı, M.T. de los Arcos de Pedro, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi, RSC Advances (2018) 4987–4994. date_created: 2021-07-07T09:02:26Z date_updated: 2023-01-24T08:39:45Z department: - _id: '302' doi: 10.1039/c7ra13417g language: - iso: eng page: 4987-4994 publication: RSC Advances publication_identifier: issn: - 2046-2069 publication_status: published status: public title: 'Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties' type: journal_article user_id: '54556' year: '2018' ... --- _id: '22558' article_number: '235201' author: - first_name: F full_name: Mitschker, F last_name: Mitschker - first_name: L full_name: Schücke, L last_name: Schücke - first_name: Ch full_name: Hoppe, Ch last_name: Hoppe - first_name: M full_name: Jaritz, M last_name: Jaritz - first_name: R full_name: Dahlmann, R last_name: Dahlmann - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Ch full_name: Hopmann, Ch last_name: Hopmann - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: P full_name: Awakowicz, P last_name: Awakowicz citation: ama: 'Mitschker F, Schücke L, Hoppe C, et al. Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). Journal of Physics D: Applied Physics. Published online 2018. doi:10.1088/1361-6463/aac0ab' apa: 'Mitschker, F., Schücke, L., Hoppe, C., Jaritz, M., Dahlmann, R., de los Arcos de Pedro, M. T., Hopmann, C., Grundmeier, G., & Awakowicz, P. (2018). Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). Journal of Physics D: Applied Physics, Article 235201. https://doi.org/10.1088/1361-6463/aac0ab' bibtex: '@article{Mitschker_Schücke_Hoppe_Jaritz_Dahlmann_de los Arcos de Pedro_Hopmann_Grundmeier_Awakowicz_2018, title={Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)}, DOI={10.1088/1361-6463/aac0ab}, number={235201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Schücke, L and Hoppe, Ch and Jaritz, M and Dahlmann, R and de los Arcos de Pedro, Maria Teresa and Hopmann, Ch and Grundmeier, Guido and Awakowicz, P}, year={2018} }' chicago: 'Mitschker, F, L Schücke, Ch Hoppe, M Jaritz, R Dahlmann, Maria Teresa de los Arcos de Pedro, Ch Hopmann, Guido Grundmeier, and P Awakowicz. “Comparative Study on the Deposition of Silicon Oxide Permeation Barrier Coatings for Polymers Using Hexamethyldisilazane (HMDSN) and Hexamethyldisiloxane (HMDSO).” Journal of Physics D: Applied Physics, 2018. https://doi.org/10.1088/1361-6463/aac0ab.' ieee: 'F. Mitschker et al., “Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO),” Journal of Physics D: Applied Physics, Art. no. 235201, 2018, doi: 10.1088/1361-6463/aac0ab.' mla: 'Mitschker, F., et al. “Comparative Study on the Deposition of Silicon Oxide Permeation Barrier Coatings for Polymers Using Hexamethyldisilazane (HMDSN) and Hexamethyldisiloxane (HMDSO).” Journal of Physics D: Applied Physics, 235201, 2018, doi:10.1088/1361-6463/aac0ab.' short: 'F. Mitschker, L. Schücke, C. Hoppe, M. Jaritz, R. Dahlmann, M.T. de los Arcos de Pedro, C. Hopmann, G. Grundmeier, P. Awakowicz, Journal of Physics D: Applied Physics (2018).' date_created: 2021-07-07T09:02:43Z date_updated: 2023-01-24T08:40:05Z department: - _id: '302' doi: 10.1088/1361-6463/aac0ab language: - iso: eng publication: 'Journal of Physics D: Applied Physics' publication_identifier: issn: - 0022-3727 - 1361-6463 publication_status: published status: public title: Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO) type: journal_article user_id: '54556' year: '2018' ... --- _id: '22559' article_number: '145201' author: - first_name: F full_name: Mitschker, F last_name: Mitschker - first_name: J full_name: Wißing, J last_name: Wißing - first_name: Ch full_name: Hoppe, Ch last_name: Hoppe - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier - first_name: P full_name: Awakowicz, P last_name: Awakowicz citation: ama: 'Mitschker F, Wißing J, Hoppe C, de los Arcos de Pedro MT, Grundmeier G, Awakowicz P. Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET. Journal of Physics D: Applied Physics. Published online 2018. doi:10.1088/1361-6463/aab1dd' apa: 'Mitschker, F., Wißing, J., Hoppe, C., de los Arcos de Pedro, M. T., Grundmeier, G., & Awakowicz, P. (2018). Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET. Journal of Physics D: Applied Physics, Article 145201. https://doi.org/10.1088/1361-6463/aab1dd' bibtex: '@article{Mitschker_Wißing_Hoppe_de los Arcos de Pedro_Grundmeier_Awakowicz_2018, title={Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET}, DOI={10.1088/1361-6463/aab1dd}, number={145201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Wißing, J and Hoppe, Ch and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Awakowicz, P}, year={2018} }' chicago: 'Mitschker, F, J Wißing, Ch Hoppe, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, and P Awakowicz. “Influence of Average Ion Energy and Atomic Oxygen Flux per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings on PET.” Journal of Physics D: Applied Physics, 2018. https://doi.org/10.1088/1361-6463/aab1dd.' ieee: 'F. Mitschker, J. Wißing, C. Hoppe, M. T. de los Arcos de Pedro, G. Grundmeier, and P. Awakowicz, “Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET,” Journal of Physics D: Applied Physics, Art. no. 145201, 2018, doi: 10.1088/1361-6463/aab1dd.' mla: 'Mitschker, F., et al. “Influence of Average Ion Energy and Atomic Oxygen Flux per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings on PET.” Journal of Physics D: Applied Physics, 145201, 2018, doi:10.1088/1361-6463/aab1dd.' short: 'F. Mitschker, J. Wißing, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier, P. Awakowicz, Journal of Physics D: Applied Physics (2018).' date_created: 2021-07-07T09:03:03Z date_updated: 2023-01-24T08:40:21Z department: - _id: '302' doi: 10.1088/1361-6463/aab1dd language: - iso: eng publication: 'Journal of Physics D: Applied Physics' publication_identifier: issn: - 0022-3727 - 1361-6463 publication_status: published status: public title: Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET type: journal_article user_id: '54556' year: '2018' ...