---
_id: '22577'
abstract:
- lang: eng
  text: <p>A new Ti-precursor for low-temperature PE-ALD of titanium dioxide thin
    films as gas barrier layers on polymer substrates.</p>
author:
- first_name: M.
  full_name: Gebhard, M.
  last_name: Gebhard
- first_name: F.
  full_name: Mitschker, F.
  last_name: Mitschker
- first_name: M.
  full_name: Wiesing, M.
  last_name: Wiesing
- first_name: I.
  full_name: Giner, I.
  last_name: Giner
- first_name: B.
  full_name: Torun, B.
  last_name: Torun
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: P.
  full_name: Awakowicz, P.
  last_name: Awakowicz
- first_name: G.
  full_name: Grundmeier, G.
  last_name: Grundmeier
- first_name: A.
  full_name: Devi, A.
  last_name: Devi
citation:
  ama: Gebhard M, Mitschker F, Wiesing M, et al. An efficient PE-ALD process for TiO2
    thin films employing a new Ti-precursor. <i>Journal of Materials Chemistry C</i>.
    Published online 2016:1057-1065. doi:<a href="https://doi.org/10.1039/c5tc03385c">10.1039/c5tc03385c</a>
  apa: Gebhard, M., Mitschker, F., Wiesing, M., Giner, I., Torun, B., de los Arcos
    de Pedro, M. T., Awakowicz, P., Grundmeier, G., &#38; Devi, A. (2016). An efficient
    PE-ALD process for TiO2 thin films employing a new Ti-precursor. <i>Journal of
    Materials Chemistry C</i>, 1057–1065. <a href="https://doi.org/10.1039/c5tc03385c">https://doi.org/10.1039/c5tc03385c</a>
  bibtex: '@article{Gebhard_Mitschker_Wiesing_Giner_Torun_de los Arcos de Pedro_Awakowicz_Grundmeier_Devi_2016,
    title={An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor},
    DOI={<a href="https://doi.org/10.1039/c5tc03385c">10.1039/c5tc03385c</a>}, journal={Journal
    of Materials Chemistry C}, author={Gebhard, M. and Mitschker, F. and Wiesing,
    M. and Giner, I. and Torun, B. and de los Arcos de Pedro, Maria Teresa and Awakowicz,
    P. and Grundmeier, G. and Devi, A.}, year={2016}, pages={1057–1065} }'
  chicago: Gebhard, M., F. Mitschker, M. Wiesing, I. Giner, B. Torun, Maria Teresa
    de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, and A. Devi. “An Efficient
    PE-ALD Process for TiO2 Thin Films Employing a New Ti-Precursor.” <i>Journal of
    Materials Chemistry C</i>, 2016, 1057–65. <a href="https://doi.org/10.1039/c5tc03385c">https://doi.org/10.1039/c5tc03385c</a>.
  ieee: 'M. Gebhard <i>et al.</i>, “An efficient PE-ALD process for TiO2 thin films
    employing a new Ti-precursor,” <i>Journal of Materials Chemistry C</i>, pp. 1057–1065,
    2016, doi: <a href="https://doi.org/10.1039/c5tc03385c">10.1039/c5tc03385c</a>.'
  mla: Gebhard, M., et al. “An Efficient PE-ALD Process for TiO2 Thin Films Employing
    a New Ti-Precursor.” <i>Journal of Materials Chemistry C</i>, 2016, pp. 1057–65,
    doi:<a href="https://doi.org/10.1039/c5tc03385c">10.1039/c5tc03385c</a>.
  short: M. Gebhard, F. Mitschker, M. Wiesing, I. Giner, B. Torun, M.T. de los Arcos
    de Pedro, P. Awakowicz, G. Grundmeier, A. Devi, Journal of Materials Chemistry
    C (2016) 1057–1065.
date_created: 2021-07-07T09:13:09Z
date_updated: 2023-01-24T08:18:08Z
department:
- _id: '302'
doi: 10.1039/c5tc03385c
language:
- iso: eng
page: 1057-1065
publication: Journal of Materials Chemistry C
publication_identifier:
  issn:
  - 2050-7526
  - 2050-7534
publication_status: published
status: public
title: An efficient PE-ALD process for TiO2 thin films employing a new Ti-precursor
type: journal_article
user_id: '54556'
year: '2016'
...
---
_id: '22578'
author:
- first_name: Martin
  full_name: Wiesing, Martin
  last_name: Wiesing
- first_name: Moritz
  full_name: to Baben, Moritz
  last_name: to Baben
- first_name: Jochen M.
  full_name: Schneider, Jochen M.
  last_name: Schneider
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Guido
  full_name: Grundmeier, Guido
  last_name: Grundmeier
citation:
  ama: Wiesing M, to Baben M, Schneider JM, de los Arcos de Pedro MT, Grundmeier G.
    Combined Electrochemical and Electron Spectroscopic Investigations of the Surface
    Oxidation of TiAlN HPPMS Hard Coatings. <i>Electrochimica Acta</i>. Published
    online 2016:120-128. doi:<a href="https://doi.org/10.1016/j.electacta.2016.05.011">10.1016/j.electacta.2016.05.011</a>
  apa: Wiesing, M., to Baben, M., Schneider, J. M., de los Arcos de Pedro, M. T.,
    &#38; Grundmeier, G. (2016). Combined Electrochemical and Electron Spectroscopic
    Investigations of the Surface Oxidation of TiAlN HPPMS Hard Coatings. <i>Electrochimica
    Acta</i>, 120–128. <a href="https://doi.org/10.1016/j.electacta.2016.05.011">https://doi.org/10.1016/j.electacta.2016.05.011</a>
  bibtex: '@article{Wiesing_to Baben_Schneider_de los Arcos de Pedro_Grundmeier_2016,
    title={Combined Electrochemical and Electron Spectroscopic Investigations of the
    Surface Oxidation of TiAlN HPPMS Hard Coatings}, DOI={<a href="https://doi.org/10.1016/j.electacta.2016.05.011">10.1016/j.electacta.2016.05.011</a>},
    journal={Electrochimica Acta}, author={Wiesing, Martin and to Baben, Moritz and
    Schneider, Jochen M. and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido},
    year={2016}, pages={120–128} }'
  chicago: Wiesing, Martin, Moritz to Baben, Jochen M. Schneider, Maria Teresa de
    los Arcos de Pedro, and Guido Grundmeier. “Combined Electrochemical and Electron
    Spectroscopic Investigations of the Surface Oxidation of TiAlN HPPMS Hard Coatings.”
    <i>Electrochimica Acta</i>, 2016, 120–28. <a href="https://doi.org/10.1016/j.electacta.2016.05.011">https://doi.org/10.1016/j.electacta.2016.05.011</a>.
  ieee: 'M. Wiesing, M. to Baben, J. M. Schneider, M. T. de los Arcos de Pedro, and
    G. Grundmeier, “Combined Electrochemical and Electron Spectroscopic Investigations
    of the Surface Oxidation of TiAlN HPPMS Hard Coatings,” <i>Electrochimica Acta</i>,
    pp. 120–128, 2016, doi: <a href="https://doi.org/10.1016/j.electacta.2016.05.011">10.1016/j.electacta.2016.05.011</a>.'
  mla: Wiesing, Martin, et al. “Combined Electrochemical and Electron Spectroscopic
    Investigations of the Surface Oxidation of TiAlN HPPMS Hard Coatings.” <i>Electrochimica
    Acta</i>, 2016, pp. 120–28, doi:<a href="https://doi.org/10.1016/j.electacta.2016.05.011">10.1016/j.electacta.2016.05.011</a>.
  short: M. Wiesing, M. to Baben, J.M. Schneider, M.T. de los Arcos de Pedro, G. Grundmeier,
    Electrochimica Acta (2016) 120–128.
date_created: 2021-07-07T09:13:27Z
date_updated: 2023-01-24T08:18:23Z
department:
- _id: '302'
doi: 10.1016/j.electacta.2016.05.011
language:
- iso: eng
page: 120-128
publication: Electrochimica Acta
publication_identifier:
  issn:
  - 0013-4686
publication_status: published
status: public
title: Combined Electrochemical and Electron Spectroscopic Investigations of the Surface
  Oxidation of TiAlN HPPMS Hard Coatings
type: journal_article
user_id: '54556'
year: '2016'
...
---
_id: '22579'
author:
- first_name: Guido
  full_name: Grundmeier, Guido
  last_name: Grundmeier
- first_name: Achim
  full_name: von Keudell, Achim
  last_name: von Keudell
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
citation:
  ama: Grundmeier G, von Keudell A, de los Arcos de Pedro MT. Fundamentals and Applications
    of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes at Materials
    Interfaces. <i>Plasma Processes and Polymers</i>. Published online 2015:926-940.
    doi:<a href="https://doi.org/10.1002/ppap.201500087">10.1002/ppap.201500087</a>
  apa: Grundmeier, G., von Keudell, A., &#38; de los Arcos de Pedro, M. T. (2015).
    Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis
    of Plasma Processes at Materials Interfaces. <i>Plasma Processes and Polymers</i>,
    926–940. <a href="https://doi.org/10.1002/ppap.201500087">https://doi.org/10.1002/ppap.201500087</a>
  bibtex: '@article{Grundmeier_von Keudell_de los Arcos de Pedro_2015, title={Fundamentals
    and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes
    at Materials Interfaces}, DOI={<a href="https://doi.org/10.1002/ppap.201500087">10.1002/ppap.201500087</a>},
    journal={Plasma Processes and Polymers}, author={Grundmeier, Guido and von Keudell,
    Achim and de los Arcos de Pedro, Maria Teresa}, year={2015}, pages={926–940} }'
  chicago: Grundmeier, Guido, Achim von Keudell, and Maria Teresa de los Arcos de
    Pedro. “Fundamentals and Applications of Reflection FTIR Spectroscopy for the
    Analysis of Plasma Processes at Materials Interfaces.” <i>Plasma Processes and
    Polymers</i>, 2015, 926–40. <a href="https://doi.org/10.1002/ppap.201500087">https://doi.org/10.1002/ppap.201500087</a>.
  ieee: 'G. Grundmeier, A. von Keudell, and M. T. de los Arcos de Pedro, “Fundamentals
    and Applications of Reflection FTIR Spectroscopy for the Analysis of Plasma Processes
    at Materials Interfaces,” <i>Plasma Processes and Polymers</i>, pp. 926–940, 2015,
    doi: <a href="https://doi.org/10.1002/ppap.201500087">10.1002/ppap.201500087</a>.'
  mla: Grundmeier, Guido, et al. “Fundamentals and Applications of Reflection FTIR
    Spectroscopy for the Analysis of Plasma Processes at Materials Interfaces.” <i>Plasma
    Processes and Polymers</i>, 2015, pp. 926–40, doi:<a href="https://doi.org/10.1002/ppap.201500087">10.1002/ppap.201500087</a>.
  short: G. Grundmeier, A. von Keudell, M.T. de los Arcos de Pedro, Plasma Processes
    and Polymers (2015) 926–940.
date_created: 2021-07-07T09:13:51Z
date_updated: 2023-01-24T08:18:39Z
department:
- _id: '302'
doi: 10.1002/ppap.201500087
language:
- iso: eng
page: 926-940
publication: Plasma Processes and Polymers
publication_identifier:
  issn:
  - 1612-8850
publication_status: published
status: public
title: Fundamentals and Applications of Reflection FTIR Spectroscopy for the Analysis
  of Plasma Processes at Materials Interfaces
type: journal_article
user_id: '54556'
year: '2015'
...
---
_id: '22582'
author:
- first_name: Felix
  full_name: Mitschker, Felix
  last_name: Mitschker
- first_name: Jan
  full_name: Dietrich, Jan
  last_name: Dietrich
- first_name: Berkem
  full_name: Ozkaya, Berkem
  last_name: Ozkaya
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Ignacio
  full_name: Giner, Ignacio
  last_name: Giner
- first_name: Peter
  full_name: Awakowicz, Peter
  last_name: Awakowicz
- first_name: Guido
  full_name: Grundmeier, Guido
  last_name: Grundmeier
citation:
  ama: Mitschker F, Dietrich J, Ozkaya B, et al. Spectroscopic and Microscopic Investigations
    of Degradation Processes in Polymer Surface-Near Regions During the Deposition
    of SiOx Films. <i>Plasma Processes and Polymers</i>. Published online 2015:1002-1009.
    doi:<a href="https://doi.org/10.1002/ppap.201500085">10.1002/ppap.201500085</a>
  apa: Mitschker, F., Dietrich, J., Ozkaya, B., de los Arcos de Pedro, M. T., Giner,
    I., Awakowicz, P., &#38; Grundmeier, G. (2015). Spectroscopic and Microscopic
    Investigations of Degradation Processes in Polymer Surface-Near Regions During
    the Deposition of SiOx Films. <i>Plasma Processes and Polymers</i>, 1002–1009.
    <a href="https://doi.org/10.1002/ppap.201500085">https://doi.org/10.1002/ppap.201500085</a>
  bibtex: '@article{Mitschker_Dietrich_Ozkaya_de los Arcos de Pedro_Giner_Awakowicz_Grundmeier_2015,
    title={Spectroscopic and Microscopic Investigations of Degradation Processes in
    Polymer Surface-Near Regions During the Deposition of SiOx Films}, DOI={<a href="https://doi.org/10.1002/ppap.201500085">10.1002/ppap.201500085</a>},
    journal={Plasma Processes and Polymers}, author={Mitschker, Felix and Dietrich,
    Jan and Ozkaya, Berkem and de los Arcos de Pedro, Maria Teresa and Giner, Ignacio
    and Awakowicz, Peter and Grundmeier, Guido}, year={2015}, pages={1002–1009} }'
  chicago: Mitschker, Felix, Jan Dietrich, Berkem Ozkaya, Maria Teresa de los Arcos
    de Pedro, Ignacio Giner, Peter Awakowicz, and Guido Grundmeier. “Spectroscopic
    and Microscopic Investigations of Degradation Processes in Polymer Surface-Near
    Regions During the Deposition of SiOx Films.” <i>Plasma Processes and Polymers</i>,
    2015, 1002–9. <a href="https://doi.org/10.1002/ppap.201500085">https://doi.org/10.1002/ppap.201500085</a>.
  ieee: 'F. Mitschker <i>et al.</i>, “Spectroscopic and Microscopic Investigations
    of Degradation Processes in Polymer Surface-Near Regions During the Deposition
    of SiOx Films,” <i>Plasma Processes and Polymers</i>, pp. 1002–1009, 2015, doi:
    <a href="https://doi.org/10.1002/ppap.201500085">10.1002/ppap.201500085</a>.'
  mla: Mitschker, Felix, et al. “Spectroscopic and Microscopic Investigations of Degradation
    Processes in Polymer Surface-Near Regions During the Deposition of SiOx Films.”
    <i>Plasma Processes and Polymers</i>, 2015, pp. 1002–09, doi:<a href="https://doi.org/10.1002/ppap.201500085">10.1002/ppap.201500085</a>.
  short: F. Mitschker, J. Dietrich, B. Ozkaya, M.T. de los Arcos de Pedro, I. Giner,
    P. Awakowicz, G. Grundmeier, Plasma Processes and Polymers (2015) 1002–1009.
date_created: 2021-07-07T09:15:22Z
date_updated: 2023-01-24T08:19:38Z
department:
- _id: '302'
doi: 10.1002/ppap.201500085
language:
- iso: eng
page: 1002-1009
publication: Plasma Processes and Polymers
publication_identifier:
  issn:
  - 1612-8850
publication_status: published
status: public
title: Spectroscopic and Microscopic Investigations of Degradation Processes in Polymer
  Surface-Near Regions During the Deposition of SiOx Films
type: journal_article
user_id: '54556'
year: '2015'
...
---
_id: '22583'
article_number: '055206'
author:
- first_name: Daniel
  full_name: Schröder, Daniel
  last_name: Schröder
- first_name: Sebastian
  full_name: Burhenn, Sebastian
  last_name: Burhenn
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Volker
  full_name: Schulz-von der Gathen, Volker
  last_name: Schulz-von der Gathen
citation:
  ama: 'Schröder D, Burhenn S, de los Arcos de Pedro MT, Schulz-von der Gathen V.
    Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge.
    <i>Journal of Physics D: Applied Physics</i>. Published online 2015. doi:<a href="https://doi.org/10.1088/0022-3727/48/5/055206">10.1088/0022-3727/48/5/055206</a>'
  apa: 'Schröder, D., Burhenn, S., de los Arcos de Pedro, M. T., &#38; Schulz-von
    der Gathen, V. (2015). Characteristics of a propagating, self-pulsing, constricted
    ‘γ-mode-like’ discharge. <i>Journal of Physics D: Applied Physics</i>, Article
    055206. <a href="https://doi.org/10.1088/0022-3727/48/5/055206">https://doi.org/10.1088/0022-3727/48/5/055206</a>'
  bibtex: '@article{Schröder_Burhenn_de los Arcos de Pedro_Schulz-von der Gathen_2015,
    title={Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’
    discharge}, DOI={<a href="https://doi.org/10.1088/0022-3727/48/5/055206">10.1088/0022-3727/48/5/055206</a>},
    number={055206}, journal={Journal of Physics D: Applied Physics}, author={Schröder,
    Daniel and Burhenn, Sebastian and de los Arcos de Pedro, Maria Teresa and Schulz-von
    der Gathen, Volker}, year={2015} }'
  chicago: 'Schröder, Daniel, Sebastian Burhenn, Maria Teresa de los Arcos de Pedro,
    and Volker Schulz-von der Gathen. “Characteristics of a Propagating, Self-Pulsing,
    Constricted ‘γ-Mode-like’ Discharge.” <i>Journal of Physics D: Applied Physics</i>,
    2015. <a href="https://doi.org/10.1088/0022-3727/48/5/055206">https://doi.org/10.1088/0022-3727/48/5/055206</a>.'
  ieee: 'D. Schröder, S. Burhenn, M. T. de los Arcos de Pedro, and V. Schulz-von der
    Gathen, “Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’
    discharge,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 055206, 2015,
    doi: <a href="https://doi.org/10.1088/0022-3727/48/5/055206">10.1088/0022-3727/48/5/055206</a>.'
  mla: 'Schröder, Daniel, et al. “Characteristics of a Propagating, Self-Pulsing,
    Constricted ‘γ-Mode-like’ Discharge.” <i>Journal of Physics D: Applied Physics</i>,
    055206, 2015, doi:<a href="https://doi.org/10.1088/0022-3727/48/5/055206">10.1088/0022-3727/48/5/055206</a>.'
  short: 'D. Schröder, S. Burhenn, M.T. de los Arcos de Pedro, V. Schulz-von der Gathen,
    Journal of Physics D: Applied Physics (2015).'
date_created: 2021-07-07T09:15:40Z
date_updated: 2023-01-24T08:19:53Z
department:
- _id: '302'
doi: 10.1088/0022-3727/48/5/055206
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge
type: journal_article
user_id: '54556'
year: '2015'
...
---
_id: '22581'
article_number: '106102'
author:
- first_name: Adrian
  full_name: Marcak, Adrian
  last_name: Marcak
- first_name: Carles
  full_name: Corbella, Carles
  last_name: Corbella
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Achim
  full_name: von Keudell, Achim
  last_name: von Keudell
citation:
  ama: 'Marcak A, Corbella C, de los Arcos de Pedro MT, von Keudell A. Note: Ion-induced
    secondary electron emission from oxidized metal surfaces measured in a particle
    beam reactor. <i>Review of Scientific Instruments</i>. Published online 2015.
    doi:<a href="https://doi.org/10.1063/1.4932309">10.1063/1.4932309</a>'
  apa: 'Marcak, A., Corbella, C., de los Arcos de Pedro, M. T., &#38; von Keudell,
    A. (2015). Note: Ion-induced secondary electron emission from oxidized metal surfaces
    measured in a particle beam reactor. <i>Review of Scientific Instruments</i>,
    Article 106102. <a href="https://doi.org/10.1063/1.4932309">https://doi.org/10.1063/1.4932309</a>'
  bibtex: '@article{Marcak_Corbella_de los Arcos de Pedro_von Keudell_2015, title={Note:
    Ion-induced secondary electron emission from oxidized metal surfaces measured
    in a particle beam reactor}, DOI={<a href="https://doi.org/10.1063/1.4932309">10.1063/1.4932309</a>},
    number={106102}, journal={Review of Scientific Instruments}, author={Marcak, Adrian
    and Corbella, Carles and de los Arcos de Pedro, Maria Teresa and von Keudell,
    Achim}, year={2015} }'
  chicago: 'Marcak, Adrian, Carles Corbella, Maria Teresa de los Arcos de Pedro, and
    Achim von Keudell. “Note: Ion-Induced Secondary Electron Emission from Oxidized
    Metal Surfaces Measured in a Particle Beam Reactor.” <i>Review of Scientific Instruments</i>,
    2015. <a href="https://doi.org/10.1063/1.4932309">https://doi.org/10.1063/1.4932309</a>.'
  ieee: 'A. Marcak, C. Corbella, M. T. de los Arcos de Pedro, and A. von Keudell,
    “Note: Ion-induced secondary electron emission from oxidized metal surfaces measured
    in a particle beam reactor,” <i>Review of Scientific Instruments</i>, Art. no.
    106102, 2015, doi: <a href="https://doi.org/10.1063/1.4932309">10.1063/1.4932309</a>.'
  mla: 'Marcak, Adrian, et al. “Note: Ion-Induced Secondary Electron Emission from
    Oxidized Metal Surfaces Measured in a Particle Beam Reactor.” <i>Review of Scientific
    Instruments</i>, 106102, 2015, doi:<a href="https://doi.org/10.1063/1.4932309">10.1063/1.4932309</a>.'
  short: A. Marcak, C. Corbella, M.T. de los Arcos de Pedro, A. von Keudell, Review
    of Scientific Instruments (2015).
date_created: 2021-07-07T09:15:01Z
date_updated: 2023-01-24T08:19:23Z
department:
- _id: '302'
doi: 10.1063/1.4932309
language:
- iso: eng
publication: Review of Scientific Instruments
publication_identifier:
  issn:
  - 0034-6748
  - 1089-7623
publication_status: published
status: public
title: 'Note: Ion-induced secondary electron emission from oxidized metal surfaces
  measured in a particle beam reactor'
type: journal_article
user_id: '54556'
year: '2015'
...
---
_id: '22580'
author:
- first_name: Dennis
  full_name: König, Dennis
  last_name: König
- first_name: Dennis
  full_name: Naujoks, Dennis
  last_name: Naujoks
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Simon
  full_name: Grosse-Kreul, Simon
  last_name: Grosse-Kreul
- first_name: Alfred
  full_name: Ludwig, Alfred
  last_name: Ludwig
citation:
  ama: König D, Naujoks D, de los Arcos de Pedro MT, Grosse-Kreul S, Ludwig A. X-Ray
    Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its
    Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory
    Thin Films. <i>Advanced Engineering Materials</i>. Published online 2014:669-673.
    doi:<a href="https://doi.org/10.1002/adem.201400317">10.1002/adem.201400317</a>
  apa: König, D., Naujoks, D., de los Arcos de Pedro, M. T., Grosse-Kreul, S., &#38;
    Ludwig, A. (2014). X-Ray Photoelectron Spectroscopy Investigations of the Surface
    Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape
    Memory Thin Films. <i>Advanced Engineering Materials</i>, 669–673. <a href="https://doi.org/10.1002/adem.201400317">https://doi.org/10.1002/adem.201400317</a>
  bibtex: '@article{König_Naujoks_de los Arcos de Pedro_Grosse-Kreul_Ludwig_2014,
    title={X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction
    Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape
    Memory Thin Films}, DOI={<a href="https://doi.org/10.1002/adem.201400317">10.1002/adem.201400317</a>},
    journal={Advanced Engineering Materials}, author={König, Dennis and Naujoks, Dennis
    and de los Arcos de Pedro, Maria Teresa and Grosse-Kreul, Simon and Ludwig, Alfred},
    year={2014}, pages={669–673} }'
  chicago: König, Dennis, Dennis Naujoks, Maria Teresa de los Arcos de Pedro, Simon
    Grosse-Kreul, and Alfred Ludwig. “X-Ray Photoelectron Spectroscopy Investigations
    of the Surface Reaction Layer and Its Effects on the Transformation Properties
    of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films.” <i>Advanced Engineering Materials</i>,
    2014, 669–73. <a href="https://doi.org/10.1002/adem.201400317">https://doi.org/10.1002/adem.201400317</a>.
  ieee: 'D. König, D. Naujoks, M. T. de los Arcos de Pedro, S. Grosse-Kreul, and A.
    Ludwig, “X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction
    Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape
    Memory Thin Films,” <i>Advanced Engineering Materials</i>, pp. 669–673, 2014,
    doi: <a href="https://doi.org/10.1002/adem.201400317">10.1002/adem.201400317</a>.'
  mla: König, Dennis, et al. “X-Ray Photoelectron Spectroscopy Investigations of the
    Surface Reaction Layer and Its Effects on the Transformation Properties of Nanoscale
    Ti51Ni38Cu11Shape Memory Thin Films.” <i>Advanced Engineering Materials</i>, 2014,
    pp. 669–73, doi:<a href="https://doi.org/10.1002/adem.201400317">10.1002/adem.201400317</a>.
  short: D. König, D. Naujoks, M.T. de los Arcos de Pedro, S. Grosse-Kreul, A. Ludwig,
    Advanced Engineering Materials (2014) 669–673.
date_created: 2021-07-07T09:14:25Z
date_updated: 2023-01-24T08:20:08Z
department:
- _id: '302'
doi: 10.1002/adem.201400317
extern: '1'
language:
- iso: eng
page: 669-673
publication: Advanced Engineering Materials
publication_identifier:
  issn:
  - 1438-1656
publication_status: published
status: public
title: X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer
  and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape
  Memory Thin Films
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22585'
article_number: '054008'
author:
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Raphael
  full_name: Schröder, Raphael
  last_name: Schröder
- first_name: Yolanda Aranda
  full_name: Gonzalvo, Yolanda Aranda
  last_name: Gonzalvo
- first_name: Volker Schulz-von der
  full_name: Gathen, Volker Schulz-von der
  last_name: Gathen
- first_name: Jörg
  full_name: Winter, Jörg
  last_name: Winter
citation:
  ama: de los Arcos de Pedro MT, Schröder R, Gonzalvo YA, Gathen VS der, Winter J.
    Description of HiPIMS plasma regimes in terms of composition, spoke formation
    and deposition rate. <i>Plasma Sources Science and Technology</i>. Published online
    2014. doi:<a href="https://doi.org/10.1088/0963-0252/23/5/054008">10.1088/0963-0252/23/5/054008</a>
  apa: de los Arcos de Pedro, M. T., Schröder, R., Gonzalvo, Y. A., Gathen, V. S.
    der, &#38; Winter, J. (2014). Description of HiPIMS plasma regimes in terms of
    composition, spoke formation and deposition rate. <i>Plasma Sources Science and
    Technology</i>, Article 054008. <a href="https://doi.org/10.1088/0963-0252/23/5/054008">https://doi.org/10.1088/0963-0252/23/5/054008</a>
  bibtex: '@article{de los Arcos de Pedro_Schröder_Gonzalvo_Gathen_Winter_2014, title={Description
    of HiPIMS plasma regimes in terms of composition, spoke formation and deposition
    rate}, DOI={<a href="https://doi.org/10.1088/0963-0252/23/5/054008">10.1088/0963-0252/23/5/054008</a>},
    number={054008}, journal={Plasma Sources Science and Technology}, author={de los
    Arcos de Pedro, Maria Teresa and Schröder, Raphael and Gonzalvo, Yolanda Aranda
    and Gathen, Volker Schulz-von der and Winter, Jörg}, year={2014} }'
  chicago: Arcos de Pedro, Maria Teresa de los, Raphael Schröder, Yolanda Aranda Gonzalvo,
    Volker Schulz-von der Gathen, and Jörg Winter. “Description of HiPIMS Plasma Regimes
    in Terms of Composition, Spoke Formation and Deposition Rate.” <i>Plasma Sources
    Science and Technology</i>, 2014. <a href="https://doi.org/10.1088/0963-0252/23/5/054008">https://doi.org/10.1088/0963-0252/23/5/054008</a>.
  ieee: 'M. T. de los Arcos de Pedro, R. Schröder, Y. A. Gonzalvo, V. S. der Gathen,
    and J. Winter, “Description of HiPIMS plasma regimes in terms of composition,
    spoke formation and deposition rate,” <i>Plasma Sources Science and Technology</i>,
    Art. no. 054008, 2014, doi: <a href="https://doi.org/10.1088/0963-0252/23/5/054008">10.1088/0963-0252/23/5/054008</a>.'
  mla: de los Arcos de Pedro, Maria Teresa, et al. “Description of HiPIMS Plasma Regimes
    in Terms of Composition, Spoke Formation and Deposition Rate.” <i>Plasma Sources
    Science and Technology</i>, 054008, 2014, doi:<a href="https://doi.org/10.1088/0963-0252/23/5/054008">10.1088/0963-0252/23/5/054008</a>.
  short: M.T. de los Arcos de Pedro, R. Schröder, Y.A. Gonzalvo, V.S. der Gathen,
    J. Winter, Plasma Sources Science and Technology (2014).
date_created: 2021-07-07T11:10:18Z
date_updated: 2023-01-24T08:20:25Z
department:
- _id: '302'
doi: 10.1088/0963-0252/23/5/054008
extern: '1'
language:
- iso: eng
publication: Plasma Sources Science and Technology
publication_identifier:
  issn:
  - 0963-0252
  - 1361-6595
publication_status: published
status: public
title: Description of HiPIMS plasma regimes in terms of composition, spoke formation
  and deposition rate
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22586'
author:
- first_name: Baran
  full_name: Eren, Baran
  last_name: Eren
- first_name: Laurent
  full_name: Marot, Laurent
  last_name: Marot
- first_name: Roland
  full_name: Steiner, Roland
  last_name: Steiner
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Marcel
  full_name: Düggelin, Marcel
  last_name: Düggelin
- first_name: Daniel
  full_name: Mathys, Daniel
  last_name: Mathys
- first_name: Kenneth N.
  full_name: Goldie, Kenneth N.
  last_name: Goldie
- first_name: Vesna
  full_name: Olivieri, Vesna
  last_name: Olivieri
- first_name: Ernst
  full_name: Meyer, Ernst
  last_name: Meyer
citation:
  ama: 'Eren B, Marot L, Steiner R, et al. Carbon nanotube growth on AlN support:
    Comparison between Ni and Fe chemical states and morphology. <i>Chemical Physics
    Letters</i>. Published online 2014:82-87. doi:<a href="https://doi.org/10.1016/j.cplett.2014.06.042">10.1016/j.cplett.2014.06.042</a>'
  apa: 'Eren, B., Marot, L., Steiner, R., de los Arcos de Pedro, M. T., Düggelin,
    M., Mathys, D., Goldie, K. N., Olivieri, V., &#38; Meyer, E. (2014). Carbon nanotube
    growth on AlN support: Comparison between Ni and Fe chemical states and morphology.
    <i>Chemical Physics Letters</i>, 82–87. <a href="https://doi.org/10.1016/j.cplett.2014.06.042">https://doi.org/10.1016/j.cplett.2014.06.042</a>'
  bibtex: '@article{Eren_Marot_Steiner_de los Arcos de Pedro_Düggelin_Mathys_Goldie_Olivieri_Meyer_2014,
    title={Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical
    states and morphology}, DOI={<a href="https://doi.org/10.1016/j.cplett.2014.06.042">10.1016/j.cplett.2014.06.042</a>},
    journal={Chemical Physics Letters}, author={Eren, Baran and Marot, Laurent and
    Steiner, Roland and de los Arcos de Pedro, Maria Teresa and Düggelin, Marcel and
    Mathys, Daniel and Goldie, Kenneth N. and Olivieri, Vesna and Meyer, Ernst}, year={2014},
    pages={82–87} }'
  chicago: 'Eren, Baran, Laurent Marot, Roland Steiner, Maria Teresa de los Arcos
    de Pedro, Marcel Düggelin, Daniel Mathys, Kenneth N. Goldie, Vesna Olivieri, and
    Ernst Meyer. “Carbon Nanotube Growth on AlN Support: Comparison between Ni and
    Fe Chemical States and Morphology.” <i>Chemical Physics Letters</i>, 2014, 82–87.
    <a href="https://doi.org/10.1016/j.cplett.2014.06.042">https://doi.org/10.1016/j.cplett.2014.06.042</a>.'
  ieee: 'B. Eren <i>et al.</i>, “Carbon nanotube growth on AlN support: Comparison
    between Ni and Fe chemical states and morphology,” <i>Chemical Physics Letters</i>,
    pp. 82–87, 2014, doi: <a href="https://doi.org/10.1016/j.cplett.2014.06.042">10.1016/j.cplett.2014.06.042</a>.'
  mla: 'Eren, Baran, et al. “Carbon Nanotube Growth on AlN Support: Comparison between
    Ni and Fe Chemical States and Morphology.” <i>Chemical Physics Letters</i>, 2014,
    pp. 82–87, doi:<a href="https://doi.org/10.1016/j.cplett.2014.06.042">10.1016/j.cplett.2014.06.042</a>.'
  short: B. Eren, L. Marot, R. Steiner, M.T. de los Arcos de Pedro, M. Düggelin, D.
    Mathys, K.N. Goldie, V. Olivieri, E. Meyer, Chemical Physics Letters (2014) 82–87.
date_created: 2021-07-07T11:10:35Z
date_updated: 2023-01-24T08:20:49Z
department:
- _id: '302'
doi: 10.1016/j.cplett.2014.06.042
extern: '1'
language:
- iso: eng
page: 82-87
publication: Chemical Physics Letters
publication_identifier:
  issn:
  - 0009-2614
publication_status: published
status: public
title: 'Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical
  states and morphology'
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22587'
article_number: '065043'
author:
- first_name: P D
  full_name: Machura, P D
  last_name: Machura
- first_name: A
  full_name: Hecimovic, A
  last_name: Hecimovic
- first_name: S
  full_name: Gallian, S
  last_name: Gallian
- first_name: J
  full_name: Winter, J
  last_name: Winter
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
citation:
  ama: Machura PD, Hecimovic A, Gallian S, Winter J, de los Arcos de Pedro MT. Simultaneous
    characterization of static and induced magnetic fields in high power impulse magnetron
    sputtering discharges. <i>Plasma Sources Science and Technology</i>. Published
    online 2014. doi:<a href="https://doi.org/10.1088/0963-0252/23/6/065043">10.1088/0963-0252/23/6/065043</a>
  apa: Machura, P. D., Hecimovic, A., Gallian, S., Winter, J., &#38; de los Arcos
    de Pedro, M. T. (2014). Simultaneous characterization of static and induced magnetic
    fields in high power impulse magnetron sputtering discharges. <i>Plasma Sources
    Science and Technology</i>, Article 065043. <a href="https://doi.org/10.1088/0963-0252/23/6/065043">https://doi.org/10.1088/0963-0252/23/6/065043</a>
  bibtex: '@article{Machura_Hecimovic_Gallian_Winter_de los Arcos de Pedro_2014, title={Simultaneous
    characterization of static and induced magnetic fields in high power impulse magnetron
    sputtering discharges}, DOI={<a href="https://doi.org/10.1088/0963-0252/23/6/065043">10.1088/0963-0252/23/6/065043</a>},
    number={065043}, journal={Plasma Sources Science and Technology}, author={Machura,
    P D and Hecimovic, A and Gallian, S and Winter, J and de los Arcos de Pedro, Maria
    Teresa}, year={2014} }'
  chicago: Machura, P D, A Hecimovic, S Gallian, J Winter, and Maria Teresa de los
    Arcos de Pedro. “Simultaneous Characterization of Static and Induced Magnetic
    Fields in High Power Impulse Magnetron Sputtering Discharges.” <i>Plasma Sources
    Science and Technology</i>, 2014. <a href="https://doi.org/10.1088/0963-0252/23/6/065043">https://doi.org/10.1088/0963-0252/23/6/065043</a>.
  ieee: 'P. D. Machura, A. Hecimovic, S. Gallian, J. Winter, and M. T. de los Arcos
    de Pedro, “Simultaneous characterization of static and induced magnetic fields
    in high power impulse magnetron sputtering discharges,” <i>Plasma Sources Science
    and Technology</i>, Art. no. 065043, 2014, doi: <a href="https://doi.org/10.1088/0963-0252/23/6/065043">10.1088/0963-0252/23/6/065043</a>.'
  mla: Machura, P. D., et al. “Simultaneous Characterization of Static and Induced
    Magnetic Fields in High Power Impulse Magnetron Sputtering Discharges.” <i>Plasma
    Sources Science and Technology</i>, 065043, 2014, doi:<a href="https://doi.org/10.1088/0963-0252/23/6/065043">10.1088/0963-0252/23/6/065043</a>.
  short: P.D. Machura, A. Hecimovic, S. Gallian, J. Winter, M.T. de los Arcos de Pedro,
    Plasma Sources Science and Technology (2014).
date_created: 2021-07-07T11:10:48Z
date_updated: 2023-01-24T08:21:04Z
department:
- _id: '302'
doi: 10.1088/0963-0252/23/6/065043
extern: '1'
language:
- iso: eng
publication: Plasma Sources Science and Technology
publication_identifier:
  issn:
  - 0963-0252
  - 1361-6595
publication_status: published
status: public
title: Simultaneous characterization of static and induced magnetic fields in high
  power impulse magnetron sputtering discharges
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22588'
article_number: '475204'
author:
- first_name: D
  full_name: Marinov, D
  last_name: Marinov
- first_name: O
  full_name: Guaitella, O
  last_name: Guaitella
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: A
  full_name: von Keudell, A
  last_name: von Keudell
- first_name: A
  full_name: Rousseau, A
  last_name: Rousseau
citation:
  ama: 'Marinov D, Guaitella O, de los Arcos de Pedro MT, von Keudell A, Rousseau
    A. Adsorption and reactivity of nitrogen atoms on silica surface under plasma
    exposure. <i>Journal of Physics D: Applied Physics</i>. Published online 2014.
    doi:<a href="https://doi.org/10.1088/0022-3727/47/47/475204">10.1088/0022-3727/47/47/475204</a>'
  apa: 'Marinov, D., Guaitella, O., de los Arcos de Pedro, M. T., von Keudell, A.,
    &#38; Rousseau, A. (2014). Adsorption and reactivity of nitrogen atoms on silica
    surface under plasma exposure. <i>Journal of Physics D: Applied Physics</i>, Article
    475204. <a href="https://doi.org/10.1088/0022-3727/47/47/475204">https://doi.org/10.1088/0022-3727/47/47/475204</a>'
  bibtex: '@article{Marinov_Guaitella_de los Arcos de Pedro_von Keudell_Rousseau_2014,
    title={Adsorption and reactivity of nitrogen atoms on silica surface under plasma
    exposure}, DOI={<a href="https://doi.org/10.1088/0022-3727/47/47/475204">10.1088/0022-3727/47/47/475204</a>},
    number={475204}, journal={Journal of Physics D: Applied Physics}, author={Marinov,
    D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A
    and Rousseau, A}, year={2014} }'
  chicago: 'Marinov, D, O Guaitella, Maria Teresa de los Arcos de Pedro, A von Keudell,
    and A Rousseau. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface
    under Plasma Exposure.” <i>Journal of Physics D: Applied Physics</i>, 2014. <a
    href="https://doi.org/10.1088/0022-3727/47/47/475204">https://doi.org/10.1088/0022-3727/47/47/475204</a>.'
  ieee: 'D. Marinov, O. Guaitella, M. T. de los Arcos de Pedro, A. von Keudell, and
    A. Rousseau, “Adsorption and reactivity of nitrogen atoms on silica surface under
    plasma exposure,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 475204,
    2014, doi: <a href="https://doi.org/10.1088/0022-3727/47/47/475204">10.1088/0022-3727/47/47/475204</a>.'
  mla: 'Marinov, D., et al. “Adsorption and Reactivity of Nitrogen Atoms on Silica
    Surface under Plasma Exposure.” <i>Journal of Physics D: Applied Physics</i>,
    475204, 2014, doi:<a href="https://doi.org/10.1088/0022-3727/47/47/475204">10.1088/0022-3727/47/47/475204</a>.'
  short: 'D. Marinov, O. Guaitella, M.T. de los Arcos de Pedro, A. von Keudell, A.
    Rousseau, Journal of Physics D: Applied Physics (2014).'
date_created: 2021-07-07T11:11:00Z
date_updated: 2023-01-24T08:21:18Z
department:
- _id: '302'
doi: 10.1088/0022-3727/47/47/475204
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Adsorption and reactivity of nitrogen atoms on silica surface under plasma
  exposure
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22590'
author:
- first_name: Ke
  full_name: Xu, Ke
  last_name: Xu
- first_name: Van-Son
  full_name: Dang, Van-Son
  last_name: Dang
- first_name: Andreas
  full_name: Ney, Andreas
  last_name: Ney
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Anjana
  full_name: Devi, Anjana
  last_name: Devi
citation:
  ama: Xu K, Dang V-S, Ney A, de los Arcos de Pedro MT, Devi A. Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62;
    Thin Films Grown by Metalorganic Chemical Vapour Deposition. <i>Journal of Nanoscience
    and Nanotechnology</i>. Published online 2014:5095-5102. doi:<a href="https://doi.org/10.1166/jnn.2014.8848">10.1166/jnn.2014.8848</a>
  apa: Xu, K., Dang, V.-S., Ney, A., de los Arcos de Pedro, M. T., &#38; Devi, A.
    (2014). Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62;
    Thin Films Grown by Metalorganic Chemical Vapour Deposition. <i>Journal of Nanoscience
    and Nanotechnology</i>, 5095–5102. <a href="https://doi.org/10.1166/jnn.2014.8848">https://doi.org/10.1166/jnn.2014.8848</a>
  bibtex: '@article{Xu_Dang_Ney_de los Arcos de Pedro_Devi_2014, title={Nanostructured
    Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by
    Metalorganic Chemical Vapour Deposition}, DOI={<a href="https://doi.org/10.1166/jnn.2014.8848">10.1166/jnn.2014.8848</a>},
    journal={Journal of Nanoscience and Nanotechnology}, author={Xu, Ke and Dang,
    Van-Son and Ney, Andreas and de los Arcos de Pedro, Maria Teresa and Devi, Anjana},
    year={2014}, pages={5095–5102} }'
  chicago: Xu, Ke, Van-Son Dang, Andreas Ney, Maria Teresa de los Arcos de Pedro,
    and Anjana Devi. “Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62;
    Thin Films Grown by Metalorganic Chemical Vapour Deposition.” <i>Journal of Nanoscience
    and Nanotechnology</i>, 2014, 5095–5102. <a href="https://doi.org/10.1166/jnn.2014.8848">https://doi.org/10.1166/jnn.2014.8848</a>.
  ieee: 'K. Xu, V.-S. Dang, A. Ney, M. T. de los Arcos de Pedro, and A. Devi, “Nanostructured
    Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by
    Metalorganic Chemical Vapour Deposition,” <i>Journal of Nanoscience and Nanotechnology</i>,
    pp. 5095–5102, 2014, doi: <a href="https://doi.org/10.1166/jnn.2014.8848">10.1166/jnn.2014.8848</a>.'
  mla: Xu, Ke, et al. “Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62;
    Thin Films Grown by Metalorganic Chemical Vapour Deposition.” <i>Journal of Nanoscience
    and Nanotechnology</i>, 2014, pp. 5095–102, doi:<a href="https://doi.org/10.1166/jnn.2014.8848">10.1166/jnn.2014.8848</a>.
  short: K. Xu, V.-S. Dang, A. Ney, M.T. de los Arcos de Pedro, A. Devi, Journal of
    Nanoscience and Nanotechnology (2014) 5095–5102.
date_created: 2021-07-07T11:11:37Z
date_updated: 2023-01-24T08:21:36Z
department:
- _id: '302'
doi: 10.1166/jnn.2014.8848
extern: '1'
language:
- iso: eng
page: 5095-5102
publication: Journal of Nanoscience and Nanotechnology
publication_identifier:
  issn:
  - 1533-4880
  - 1533-4899
publication_status: published
status: public
title: Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic
  Chemical Vapour Deposition
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22584'
author:
- first_name: Van-Son
  full_name: Dang, Van-Son
  last_name: Dang
- first_name: Harish
  full_name: Parala, Harish
  last_name: Parala
- first_name: Jin Hyun
  full_name: Kim, Jin Hyun
  last_name: Kim
- first_name: Ke
  full_name: Xu, Ke
  last_name: Xu
- first_name: Nagendra B.
  full_name: Srinivasan, Nagendra B.
  last_name: Srinivasan
- first_name: Eugen
  full_name: Edengeiser, Eugen
  last_name: Edengeiser
- first_name: Martina
  full_name: Havenith, Martina
  last_name: Havenith
- first_name: Andreas D.
  full_name: Wieck, Andreas D.
  last_name: Wieck
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Roland. A.
  full_name: Fischer, Roland. A.
  last_name: Fischer
- first_name: Anjana
  full_name: Devi, Anjana
  last_name: Devi
citation:
  ama: Dang V-S, Parala H, Kim JH, et al. Electrical and optical properties of TiO2thin
    films prepared by plasma-enhanced atomic layer deposition. <i>physica status solidi
    (a)</i>. Published online 2013:416-424. doi:<a href="https://doi.org/10.1002/pssa.201330115">10.1002/pssa.201330115</a>
  apa: Dang, V.-S., Parala, H., Kim, J. H., Xu, K., Srinivasan, N. B., Edengeiser,
    E., Havenith, M., Wieck, A. D., de los Arcos de Pedro, M. T., Fischer, Roland.
    A., &#38; Devi, A. (2013). Electrical and optical properties of TiO2thin films
    prepared by plasma-enhanced atomic layer deposition. <i>Physica Status Solidi
    (a)</i>, 416–424. <a href="https://doi.org/10.1002/pssa.201330115">https://doi.org/10.1002/pssa.201330115</a>
  bibtex: '@article{Dang_Parala_Kim_Xu_Srinivasan_Edengeiser_Havenith_Wieck_de los
    Arcos de Pedro_Fischer_et al._2013, title={Electrical and optical properties of
    TiO2thin films prepared by plasma-enhanced atomic layer deposition}, DOI={<a href="https://doi.org/10.1002/pssa.201330115">10.1002/pssa.201330115</a>},
    journal={physica status solidi (a)}, author={Dang, Van-Son and Parala, Harish
    and Kim, Jin Hyun and Xu, Ke and Srinivasan, Nagendra B. and Edengeiser, Eugen
    and Havenith, Martina and Wieck, Andreas D. and de los Arcos de Pedro, Maria Teresa
    and Fischer, Roland. A. and et al.}, year={2013}, pages={416–424} }'
  chicago: Dang, Van-Son, Harish Parala, Jin Hyun Kim, Ke Xu, Nagendra B. Srinivasan,
    Eugen Edengeiser, Martina Havenith, et al. “Electrical and Optical Properties
    of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” <i>Physica
    Status Solidi (a)</i>, 2013, 416–24. <a href="https://doi.org/10.1002/pssa.201330115">https://doi.org/10.1002/pssa.201330115</a>.
  ieee: 'V.-S. Dang <i>et al.</i>, “Electrical and optical properties of TiO2thin
    films prepared by plasma-enhanced atomic layer deposition,” <i>physica status
    solidi (a)</i>, pp. 416–424, 2013, doi: <a href="https://doi.org/10.1002/pssa.201330115">10.1002/pssa.201330115</a>.'
  mla: Dang, Van-Son, et al. “Electrical and Optical Properties of TiO2thin Films
    Prepared by Plasma-Enhanced Atomic Layer Deposition.” <i>Physica Status Solidi
    (a)</i>, 2013, pp. 416–24, doi:<a href="https://doi.org/10.1002/pssa.201330115">10.1002/pssa.201330115</a>.
  short: V.-S. Dang, H. Parala, J.H. Kim, K. Xu, N.B. Srinivasan, E. Edengeiser, M.
    Havenith, A.D. Wieck, M.T. de los Arcos de Pedro, Roland.A. Fischer, A. Devi,
    Physica Status Solidi (a) (2013) 416–424.
date_created: 2021-07-07T11:09:32Z
date_updated: 2023-01-24T08:21:54Z
department:
- _id: '302'
doi: 10.1002/pssa.201330115
extern: '1'
language:
- iso: eng
page: 416-424
publication: physica status solidi (a)
publication_identifier:
  issn:
  - 1862-6300
publication_status: published
status: public
title: Electrical and optical properties of TiO2thin films prepared by plasma-enhanced
  atomic layer deposition
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22589'
author:
- first_name: Nagendra B.
  full_name: Srinivasan, Nagendra B.
  last_name: Srinivasan
- first_name: Tobias B.
  full_name: Thiede, Tobias B.
  last_name: Thiede
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Detlef
  full_name: Rogalla, Detlef
  last_name: Rogalla
- first_name: Hans-Werner
  full_name: Becker, Hans-Werner
  last_name: Becker
- first_name: Anjana
  full_name: Devi, Anjana
  last_name: Devi
- first_name: Roland A.
  full_name: Fischer, Roland A.
  last_name: Fischer
citation:
  ama: 'Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. MOCVD of tungsten
    nitride thin films: Comparison of precursor performance and film characteristics.
    <i>physica status solidi (a)</i>. Published online 2013:260-266. doi:<a href="https://doi.org/10.1002/pssa.201330127">10.1002/pssa.201330127</a>'
  apa: 'Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Rogalla, D.,
    Becker, H.-W., Devi, A., &#38; Fischer, R. A. (2013). MOCVD of tungsten nitride
    thin films: Comparison of precursor performance and film characteristics. <i>Physica
    Status Solidi (a)</i>, 260–266. <a href="https://doi.org/10.1002/pssa.201330127">https://doi.org/10.1002/pssa.201330127</a>'
  bibtex: '@article{Srinivasan_Thiede_de los Arcos de Pedro_Rogalla_Becker_Devi_Fischer_2013,
    title={MOCVD of tungsten nitride thin films: Comparison of precursor performance
    and film characteristics}, DOI={<a href="https://doi.org/10.1002/pssa.201330127">10.1002/pssa.201330127</a>},
    journal={physica status solidi (a)}, author={Srinivasan, Nagendra B. and Thiede,
    Tobias B. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Becker,
    Hans-Werner and Devi, Anjana and Fischer, Roland A.}, year={2013}, pages={260–266}
    }'
  chicago: 'Srinivasan, Nagendra B., Tobias B. Thiede, Maria Teresa de los Arcos de
    Pedro, Detlef Rogalla, Hans-Werner Becker, Anjana Devi, and Roland A. Fischer.
    “MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and
    Film Characteristics.” <i>Physica Status Solidi (a)</i>, 2013, 260–66. <a href="https://doi.org/10.1002/pssa.201330127">https://doi.org/10.1002/pssa.201330127</a>.'
  ieee: 'N. B. Srinivasan <i>et al.</i>, “MOCVD of tungsten nitride thin films: Comparison
    of precursor performance and film characteristics,” <i>physica status solidi (a)</i>,
    pp. 260–266, 2013, doi: <a href="https://doi.org/10.1002/pssa.201330127">10.1002/pssa.201330127</a>.'
  mla: 'Srinivasan, Nagendra B., et al. “MOCVD of Tungsten Nitride Thin Films: Comparison
    of Precursor Performance and Film Characteristics.” <i>Physica Status Solidi (a)</i>,
    2013, pp. 260–66, doi:<a href="https://doi.org/10.1002/pssa.201330127">10.1002/pssa.201330127</a>.'
  short: N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, D. Rogalla, H.-W.
    Becker, A. Devi, R.A. Fischer, Physica Status Solidi (a) (2013) 260–266.
date_created: 2021-07-07T11:11:23Z
date_updated: 2023-01-24T08:22:27Z
department:
- _id: '302'
doi: 10.1002/pssa.201330127
extern: '1'
language:
- iso: eng
page: 260-266
publication: physica status solidi (a)
publication_identifier:
  issn:
  - 1862-6300
publication_status: published
status: public
title: 'MOCVD of tungsten nitride thin films: Comparison of precursor performance
  and film characteristics'
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22596'
article_number: '3939'
author:
- first_name: Ke
  full_name: Xu, Ke
  last_name: Xu
- first_name: Ayan Roy
  full_name: Chaudhuri, Ayan Roy
  last_name: Chaudhuri
- first_name: Harish
  full_name: Parala, Harish
  last_name: Parala
- first_name: Dominik
  full_name: Schwendt, Dominik
  last_name: Schwendt
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: H. Jörg
  full_name: Osten, H. Jörg
  last_name: Osten
- first_name: Anjana
  full_name: Devi, Anjana
  last_name: Devi
citation:
  ama: 'Xu K, Chaudhuri AR, Parala H, et al. Atomic layer deposition of Er2O3 thin
    films from Er tris-guanidinate and water: process optimization, film analysis
    and electrical properties. <i>Journal of Materials Chemistry C</i>. Published
    online 2013. doi:<a href="https://doi.org/10.1039/c3tc30401a">10.1039/c3tc30401a</a>'
  apa: 'Xu, K., Chaudhuri, A. R., Parala, H., Schwendt, D., de los Arcos de Pedro,
    M. T., Osten, H. J., &#38; Devi, A. (2013). Atomic layer deposition of Er2O3 thin
    films from Er tris-guanidinate and water: process optimization, film analysis
    and electrical properties. <i>Journal of Materials Chemistry C</i>, Article 3939.
    <a href="https://doi.org/10.1039/c3tc30401a">https://doi.org/10.1039/c3tc30401a</a>'
  bibtex: '@article{Xu_Chaudhuri_Parala_Schwendt_de los Arcos de Pedro_Osten_Devi_2013,
    title={Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and
    water: process optimization, film analysis and electrical properties}, DOI={<a
    href="https://doi.org/10.1039/c3tc30401a">10.1039/c3tc30401a</a>}, number={3939},
    journal={Journal of Materials Chemistry C}, author={Xu, Ke and Chaudhuri, Ayan
    Roy and Parala, Harish and Schwendt, Dominik and de los Arcos de Pedro, Maria
    Teresa and Osten, H. Jörg and Devi, Anjana}, year={2013} }'
  chicago: 'Xu, Ke, Ayan Roy Chaudhuri, Harish Parala, Dominik Schwendt, Maria Teresa
    de los Arcos de Pedro, H. Jörg Osten, and Anjana Devi. “Atomic Layer Deposition
    of Er2O3 Thin Films from Er Tris-Guanidinate and Water: Process Optimization,
    Film Analysis and Electrical Properties.” <i>Journal of Materials Chemistry C</i>,
    2013. <a href="https://doi.org/10.1039/c3tc30401a">https://doi.org/10.1039/c3tc30401a</a>.'
  ieee: 'K. Xu <i>et al.</i>, “Atomic layer deposition of Er2O3 thin films from Er
    tris-guanidinate and water: process optimization, film analysis and electrical
    properties,” <i>Journal of Materials Chemistry C</i>, Art. no. 3939, 2013, doi:
    <a href="https://doi.org/10.1039/c3tc30401a">10.1039/c3tc30401a</a>.'
  mla: 'Xu, Ke, et al. “Atomic Layer Deposition of Er2O3 Thin Films from Er Tris-Guanidinate
    and Water: Process Optimization, Film Analysis and Electrical Properties.” <i>Journal
    of Materials Chemistry C</i>, 3939, 2013, doi:<a href="https://doi.org/10.1039/c3tc30401a">10.1039/c3tc30401a</a>.'
  short: K. Xu, A.R. Chaudhuri, H. Parala, D. Schwendt, M.T. de los Arcos de Pedro,
    H.J. Osten, A. Devi, Journal of Materials Chemistry C (2013).
date_created: 2021-07-07T11:14:22Z
date_updated: 2023-01-24T08:24:04Z
department:
- _id: '302'
doi: 10.1039/c3tc30401a
extern: '1'
language:
- iso: eng
publication: Journal of Materials Chemistry C
publication_identifier:
  issn:
  - 2050-7526
  - 2050-7534
publication_status: published
status: public
title: 'Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water:
  process optimization, film analysis and electrical properties'
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22593'
author:
- first_name: N.B.
  full_name: Srinivasan, N.B.
  last_name: Srinivasan
- first_name: T.B.
  full_name: Thiede, T.B.
  last_name: Thiede
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: V.
  full_name: Gwildies, V.
  last_name: Gwildies
- first_name: M.
  full_name: Krasnopolski, M.
  last_name: Krasnopolski
- first_name: H.-W.
  full_name: Becker, H.-W.
  last_name: Becker
- first_name: D.
  full_name: Rogalla, D.
  last_name: Rogalla
- first_name: A.
  full_name: Devi, A.
  last_name: Devi
- first_name: R.A.
  full_name: Fischer, R.A.
  last_name: Fischer
citation:
  ama: Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. Transition metal
    nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2]
    (M=Mo, W) as precursors. <i>Surface and Coatings Technology</i>. Published online
    2013:130-136. doi:<a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>
  apa: Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Gwildies, V.,
    Krasnopolski, M., Becker, H.-W., Rogalla, D., Devi, A., &#38; Fischer, R. A. (2013).
    Transition metal nitride thin films grown by MOCVD using amidinato based complexes
    [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. <i>Surface and Coatings Technology</i>,
    130–136. <a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">https://doi.org/10.1016/j.surfcoat.2013.06.024</a>
  bibtex: '@article{Srinivasan_Thiede_de los Arcos de Pedro_Gwildies_Krasnopolski_Becker_Rogalla_Devi_Fischer_2013,
    title={Transition metal nitride thin films grown by MOCVD using amidinato based
    complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}, DOI={<a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>},
    journal={Surface and Coatings Technology}, author={Srinivasan, N.B. and Thiede,
    T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski,
    M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}, year={2013},
    pages={130–136} }'
  chicago: Srinivasan, N.B., T.B. Thiede, Maria Teresa de los Arcos de Pedro, V. Gwildies,
    M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, and R.A. Fischer. “Transition
    Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2]
    (M=Mo, W) as Precursors.” <i>Surface and Coatings Technology</i>, 2013, 130–36.
    <a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">https://doi.org/10.1016/j.surfcoat.2013.06.024</a>.
  ieee: 'N. B. Srinivasan <i>et al.</i>, “Transition metal nitride thin films grown
    by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as
    precursors,” <i>Surface and Coatings Technology</i>, pp. 130–136, 2013, doi: <a
    href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>.'
  mla: Srinivasan, N. B., et al. “Transition Metal Nitride Thin Films Grown by MOCVD
    Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.”
    <i>Surface and Coatings Technology</i>, 2013, pp. 130–36, doi:<a href="https://doi.org/10.1016/j.surfcoat.2013.06.024">10.1016/j.surfcoat.2013.06.024</a>.
  short: N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, V. Gwildies, M.
    Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R.A. Fischer, Surface and Coatings
    Technology (2013) 130–136.
date_created: 2021-07-07T11:13:33Z
date_updated: 2023-01-24T08:23:13Z
department:
- _id: '302'
doi: 10.1016/j.surfcoat.2013.06.024
extern: '1'
language:
- iso: eng
page: 130-136
publication: Surface and Coatings Technology
publication_identifier:
  issn:
  - 0257-8972
publication_status: published
status: public
title: Transition metal nitride thin films grown by MOCVD using amidinato based complexes
  [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22594'
article_number: '084009'
author:
- first_name: Andreas
  full_name: Will, Andreas
  last_name: Will
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Carles
  full_name: Corbella, Carles
  last_name: Corbella
- first_name: Ante
  full_name: Hecimovic, Ante
  last_name: Hecimovic
- first_name: Patrick D
  full_name: Machura, Patrick D
  last_name: Machura
- first_name: Jörg
  full_name: Winter, Jörg
  last_name: Winter
- first_name: Achim
  full_name: von Keudell, Achim
  last_name: von Keudell
citation:
  ama: 'Will A, de los Arcos de Pedro MT, Corbella C, et al. Target implantation and
    redeposition processes during high-power impulse magnetron sputtering of aluminum.
    <i>Journal of Physics D: Applied Physics</i>. Published online 2013. doi:<a href="https://doi.org/10.1088/0022-3727/46/8/084009">10.1088/0022-3727/46/8/084009</a>'
  apa: 'Will, A., de los Arcos de Pedro, M. T., Corbella, C., Hecimovic, A., Machura,
    P. D., Winter, J., &#38; von Keudell, A. (2013). Target implantation and redeposition
    processes during high-power impulse magnetron sputtering of aluminum. <i>Journal
    of Physics D: Applied Physics</i>, Article 084009. <a href="https://doi.org/10.1088/0022-3727/46/8/084009">https://doi.org/10.1088/0022-3727/46/8/084009</a>'
  bibtex: '@article{Will_de los Arcos de Pedro_Corbella_Hecimovic_Machura_Winter_von
    Keudell_2013, title={Target implantation and redeposition processes during high-power
    impulse magnetron sputtering of aluminum}, DOI={<a href="https://doi.org/10.1088/0022-3727/46/8/084009">10.1088/0022-3727/46/8/084009</a>},
    number={084009}, journal={Journal of Physics D: Applied Physics}, author={Will,
    Andreas and de los Arcos de Pedro, Maria Teresa and Corbella, Carles and Hecimovic,
    Ante and Machura, Patrick D and Winter, Jörg and von Keudell, Achim}, year={2013}
    }'
  chicago: 'Will, Andreas, Maria Teresa de los Arcos de Pedro, Carles Corbella, Ante
    Hecimovic, Patrick D Machura, Jörg Winter, and Achim von Keudell. “Target Implantation
    and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.”
    <i>Journal of Physics D: Applied Physics</i>, 2013. <a href="https://doi.org/10.1088/0022-3727/46/8/084009">https://doi.org/10.1088/0022-3727/46/8/084009</a>.'
  ieee: 'A. Will <i>et al.</i>, “Target implantation and redeposition processes during
    high-power impulse magnetron sputtering of aluminum,” <i>Journal of Physics D:
    Applied Physics</i>, Art. no. 084009, 2013, doi: <a href="https://doi.org/10.1088/0022-3727/46/8/084009">10.1088/0022-3727/46/8/084009</a>.'
  mla: 'Will, Andreas, et al. “Target Implantation and Redeposition Processes during
    High-Power Impulse Magnetron Sputtering of Aluminum.” <i>Journal of Physics D:
    Applied Physics</i>, 084009, 2013, doi:<a href="https://doi.org/10.1088/0022-3727/46/8/084009">10.1088/0022-3727/46/8/084009</a>.'
  short: 'A. Will, M.T. de los Arcos de Pedro, C. Corbella, A. Hecimovic, P.D. Machura,
    J. Winter, A. von Keudell, Journal of Physics D: Applied Physics (2013).'
date_created: 2021-07-07T11:13:47Z
date_updated: 2023-01-24T08:23:28Z
department:
- _id: '302'
doi: 10.1088/0022-3727/46/8/084009
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Target implantation and redeposition processes during high-power impulse magnetron
  sputtering of aluminum
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22591'
article_number: '103303'
author:
- first_name: Carles
  full_name: Corbella, Carles
  last_name: Corbella
- first_name: Simon
  full_name: Grosse-Kreul, Simon
  last_name: Grosse-Kreul
- first_name: Oliver
  full_name: Kreiter, Oliver
  last_name: Kreiter
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Jan
  full_name: Benedikt, Jan
  last_name: Benedikt
- first_name: Achim
  full_name: von Keudell, Achim
  last_name: von Keudell
citation:
  ama: Corbella C, Grosse-Kreul S, Kreiter O, de los Arcos de Pedro MT, Benedikt J,
    von Keudell A. Particle beam experiments for the analysis of reactive sputtering
    processes in metals and polymer surfaces. <i>Review of Scientific Instruments</i>.
    Published online 2013. doi:<a href="https://doi.org/10.1063/1.4826066">10.1063/1.4826066</a>
  apa: Corbella, C., Grosse-Kreul, S., Kreiter, O., de los Arcos de Pedro, M. T.,
    Benedikt, J., &#38; von Keudell, A. (2013). Particle beam experiments for the
    analysis of reactive sputtering processes in metals and polymer surfaces. <i>Review
    of Scientific Instruments</i>, Article 103303. <a href="https://doi.org/10.1063/1.4826066">https://doi.org/10.1063/1.4826066</a>
  bibtex: '@article{Corbella_Grosse-Kreul_Kreiter_de los Arcos de Pedro_Benedikt_von
    Keudell_2013, title={Particle beam experiments for the analysis of reactive sputtering
    processes in metals and polymer surfaces}, DOI={<a href="https://doi.org/10.1063/1.4826066">10.1063/1.4826066</a>},
    number={103303}, journal={Review of Scientific Instruments}, author={Corbella,
    Carles and Grosse-Kreul, Simon and Kreiter, Oliver and de los Arcos de Pedro,
    Maria Teresa and Benedikt, Jan and von Keudell, Achim}, year={2013} }'
  chicago: Corbella, Carles, Simon Grosse-Kreul, Oliver Kreiter, Maria Teresa de los
    Arcos de Pedro, Jan Benedikt, and Achim von Keudell. “Particle Beam Experiments
    for the Analysis of Reactive Sputtering Processes in Metals and Polymer Surfaces.”
    <i>Review of Scientific Instruments</i>, 2013. <a href="https://doi.org/10.1063/1.4826066">https://doi.org/10.1063/1.4826066</a>.
  ieee: 'C. Corbella, S. Grosse-Kreul, O. Kreiter, M. T. de los Arcos de Pedro, J.
    Benedikt, and A. von Keudell, “Particle beam experiments for the analysis of reactive
    sputtering processes in metals and polymer surfaces,” <i>Review of Scientific
    Instruments</i>, Art. no. 103303, 2013, doi: <a href="https://doi.org/10.1063/1.4826066">10.1063/1.4826066</a>.'
  mla: Corbella, Carles, et al. “Particle Beam Experiments for the Analysis of Reactive
    Sputtering Processes in Metals and Polymer Surfaces.” <i>Review of Scientific
    Instruments</i>, 103303, 2013, doi:<a href="https://doi.org/10.1063/1.4826066">10.1063/1.4826066</a>.
  short: C. Corbella, S. Grosse-Kreul, O. Kreiter, M.T. de los Arcos de Pedro, J.
    Benedikt, A. von Keudell, Review of Scientific Instruments (2013).
date_created: 2021-07-07T11:12:42Z
date_updated: 2023-01-24T08:22:42Z
department:
- _id: '302'
doi: 10.1063/1.4826066
extern: '1'
language:
- iso: eng
publication: Review of Scientific Instruments
publication_identifier:
  issn:
  - 0034-6748
  - 1089-7623
publication_status: published
status: public
title: Particle beam experiments for the analysis of reactive sputtering processes
  in metals and polymer surfaces
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22595'
article_number: '084007'
author:
- first_name: J
  full_name: Winter, J
  last_name: Winter
- first_name: A
  full_name: Hecimovic, A
  last_name: Hecimovic
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: M
  full_name: Böke, M
  last_name: Böke
- first_name: V
  full_name: Schulz-von der Gathen, V
  last_name: Schulz-von der Gathen
citation:
  ama: 'Winter J, Hecimovic A, de los Arcos de Pedro MT, Böke M, Schulz-von der Gathen
    V. Instabilities in high-power impulse magnetron plasmas: from stochasticity to
    periodicity. <i>Journal of Physics D: Applied Physics</i>. Published online 2013.
    doi:<a href="https://doi.org/10.1088/0022-3727/46/8/084007">10.1088/0022-3727/46/8/084007</a>'
  apa: 'Winter, J., Hecimovic, A., de los Arcos de Pedro, M. T., Böke, M., &#38; Schulz-von
    der Gathen, V. (2013). Instabilities in high-power impulse magnetron plasmas:
    from stochasticity to periodicity. <i>Journal of Physics D: Applied Physics</i>,
    Article 084007. <a href="https://doi.org/10.1088/0022-3727/46/8/084007">https://doi.org/10.1088/0022-3727/46/8/084007</a>'
  bibtex: '@article{Winter_Hecimovic_de los Arcos de Pedro_Böke_Schulz-von der Gathen_2013,
    title={Instabilities in high-power impulse magnetron plasmas: from stochasticity
    to periodicity}, DOI={<a href="https://doi.org/10.1088/0022-3727/46/8/084007">10.1088/0022-3727/46/8/084007</a>},
    number={084007}, journal={Journal of Physics D: Applied Physics}, author={Winter,
    J and Hecimovic, A and de los Arcos de Pedro, Maria Teresa and Böke, M and Schulz-von
    der Gathen, V}, year={2013} }'
  chicago: 'Winter, J, A Hecimovic, Maria Teresa de los Arcos de Pedro, M Böke, and
    V Schulz-von der Gathen. “Instabilities in High-Power Impulse Magnetron Plasmas:
    From Stochasticity to Periodicity.” <i>Journal of Physics D: Applied Physics</i>,
    2013. <a href="https://doi.org/10.1088/0022-3727/46/8/084007">https://doi.org/10.1088/0022-3727/46/8/084007</a>.'
  ieee: 'J. Winter, A. Hecimovic, M. T. de los Arcos de Pedro, M. Böke, and V. Schulz-von
    der Gathen, “Instabilities in high-power impulse magnetron plasmas: from stochasticity
    to periodicity,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 084007,
    2013, doi: <a href="https://doi.org/10.1088/0022-3727/46/8/084007">10.1088/0022-3727/46/8/084007</a>.'
  mla: 'Winter, J., et al. “Instabilities in High-Power Impulse Magnetron Plasmas:
    From Stochasticity to Periodicity.” <i>Journal of Physics D: Applied Physics</i>,
    084007, 2013, doi:<a href="https://doi.org/10.1088/0022-3727/46/8/084007">10.1088/0022-3727/46/8/084007</a>.'
  short: 'J. Winter, A. Hecimovic, M.T. de los Arcos de Pedro, M. Böke, V. Schulz-von
    der Gathen, Journal of Physics D: Applied Physics (2013).'
date_created: 2021-07-07T11:14:06Z
date_updated: 2023-01-24T08:23:42Z
department:
- _id: '302'
doi: 10.1088/0022-3727/46/8/084007
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: 'Instabilities in high-power impulse magnetron plasmas: from stochasticity
  to periodicity'
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22592'
author:
- first_name: Katja
  full_name: Rügner, Katja
  last_name: Rügner
- first_name: Rüdiger
  full_name: Reuter, Rüdiger
  last_name: Reuter
- first_name: Dirk
  full_name: Ellerweg, Dirk
  last_name: Ellerweg
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Achim
  full_name: von Keudell, Achim
  last_name: von Keudell
- first_name: Jan
  full_name: Benedikt, Jan
  last_name: Benedikt
citation:
  ama: Rügner K, Reuter R, Ellerweg D, de los Arcos de Pedro MT, von Keudell A, Benedikt
    J. Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure.
    <i>Plasma Processes and Polymers</i>. Published online 2013:1061-1073. doi:<a
    href="https://doi.org/10.1002/ppap.201300059">10.1002/ppap.201300059</a>
  apa: Rügner, K., Reuter, R., Ellerweg, D., de los Arcos de Pedro, M. T., von Keudell,
    A., &#38; Benedikt, J. (2013). Insight into the Reaction Scheme of SiO2 Film Deposition
    at Atmospheric Pressure. <i>Plasma Processes and Polymers</i>, 1061–1073. <a href="https://doi.org/10.1002/ppap.201300059">https://doi.org/10.1002/ppap.201300059</a>
  bibtex: '@article{Rügner_Reuter_Ellerweg_de los Arcos de Pedro_von Keudell_Benedikt_2013,
    title={Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric
    Pressure}, DOI={<a href="https://doi.org/10.1002/ppap.201300059">10.1002/ppap.201300059</a>},
    journal={Plasma Processes and Polymers}, author={Rügner, Katja and Reuter, Rüdiger
    and Ellerweg, Dirk and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim
    and Benedikt, Jan}, year={2013}, pages={1061–1073} }'
  chicago: Rügner, Katja, Rüdiger Reuter, Dirk Ellerweg, Maria Teresa de los Arcos
    de Pedro, Achim von Keudell, and Jan Benedikt. “Insight into the Reaction Scheme
    of SiO2 Film Deposition at Atmospheric Pressure.” <i>Plasma Processes and Polymers</i>,
    2013, 1061–73. <a href="https://doi.org/10.1002/ppap.201300059">https://doi.org/10.1002/ppap.201300059</a>.
  ieee: 'K. Rügner, R. Reuter, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell,
    and J. Benedikt, “Insight into the Reaction Scheme of SiO2 Film Deposition at
    Atmospheric Pressure,” <i>Plasma Processes and Polymers</i>, pp. 1061–1073, 2013,
    doi: <a href="https://doi.org/10.1002/ppap.201300059">10.1002/ppap.201300059</a>.'
  mla: Rügner, Katja, et al. “Insight into the Reaction Scheme of SiO2 Film Deposition
    at Atmospheric Pressure.” <i>Plasma Processes and Polymers</i>, 2013, pp. 1061–73,
    doi:<a href="https://doi.org/10.1002/ppap.201300059">10.1002/ppap.201300059</a>.
  short: K. Rügner, R. Reuter, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell,
    J. Benedikt, Plasma Processes and Polymers (2013) 1061–1073.
date_created: 2021-07-07T11:13:20Z
date_updated: 2023-01-24T08:22:58Z
department:
- _id: '302'
doi: 10.1002/ppap.201300059
extern: '1'
language:
- iso: eng
page: 1061-1073
publication: Plasma Processes and Polymers
publication_identifier:
  issn:
  - 1612-8850
publication_status: published
status: public
title: Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure
type: journal_article
user_id: '54556'
year: '2013'
...