[{"date_created":"2019-01-28T10:11:07Z","type":"journal_article","department":[{"_id":"15"},{"_id":"230"}],"issue":"15","publication":"Physical Review B","citation":{"chicago":"Kuznetsova, M. S., R. V. Cherbunin, I. Ya. Gerlovin, I. V. Ignatiev, S. Yu. Verbin, D. R. Yakovlev, Dirk Reuter, A. D. Wieck, and M. Bayer. “Spin Dynamics of Quadrupole Nuclei in InGaAs Quantum Dots.” <i>Physical Review B</i> 95, no. 15 (2017). <a href=\"https://doi.org/10.1103/physrevb.95.155312\">https://doi.org/10.1103/physrevb.95.155312</a>.","short":"M.S. Kuznetsova, R.V. Cherbunin, I.Y. Gerlovin, I.V. Ignatiev, S.Y. Verbin, D.R. Yakovlev, D. Reuter, A.D. Wieck, M. Bayer, Physical Review B 95 (2017).","apa":"Kuznetsova, M. S., Cherbunin, R. V., Gerlovin, I. Y., Ignatiev, I. V., Verbin, S. Y., Yakovlev, D. R., … Bayer, M. (2017). Spin dynamics of quadrupole nuclei in InGaAs quantum dots. <i>Physical Review B</i>, <i>95</i>(15). <a href=\"https://doi.org/10.1103/physrevb.95.155312\">https://doi.org/10.1103/physrevb.95.155312</a>","ieee":"M. S. Kuznetsova <i>et al.</i>, “Spin dynamics of quadrupole nuclei in InGaAs quantum dots,” <i>Physical Review B</i>, vol. 95, no. 15, 2017.","ama":"Kuznetsova MS, Cherbunin RV, Gerlovin IY, et al. Spin dynamics of quadrupole nuclei in InGaAs quantum dots. <i>Physical Review B</i>. 2017;95(15). doi:<a href=\"https://doi.org/10.1103/physrevb.95.155312\">10.1103/physrevb.95.155312</a>","bibtex":"@article{Kuznetsova_Cherbunin_Gerlovin_Ignatiev_Verbin_Yakovlev_Reuter_Wieck_Bayer_2017, title={Spin dynamics of quadrupole nuclei in InGaAs quantum dots}, volume={95}, DOI={<a href=\"https://doi.org/10.1103/physrevb.95.155312\">10.1103/physrevb.95.155312</a>}, number={15}, journal={Physical Review B}, publisher={American Physical Society (APS)}, author={Kuznetsova, M. S. and Cherbunin, R. V. and Gerlovin, I. Ya. and Ignatiev, I. V. and Verbin, S. Yu. and Yakovlev, D. R. and Reuter, Dirk and Wieck, A. D. and Bayer, M.}, year={2017} }","mla":"Kuznetsova, M. S., et al. “Spin Dynamics of Quadrupole Nuclei in InGaAs Quantum Dots.” <i>Physical Review B</i>, vol. 95, no. 15, American Physical Society (APS), 2017, doi:<a href=\"https://doi.org/10.1103/physrevb.95.155312\">10.1103/physrevb.95.155312</a>."},"publisher":"American Physical Society (APS)","_id":"7028","language":[{"iso":"eng"}],"user_id":"42514","doi":"10.1103/physrevb.95.155312","volume":95,"status":"public","title":"Spin dynamics of quadrupole nuclei in InGaAs quantum dots","year":"2017","author":[{"first_name":"M. S.","last_name":"Kuznetsova","full_name":"Kuznetsova, M. S."},{"first_name":"R. V.","last_name":"Cherbunin","full_name":"Cherbunin, R. V."},{"full_name":"Gerlovin, I. Ya.","first_name":"I. Ya.","last_name":"Gerlovin"},{"full_name":"Ignatiev, I. V.","first_name":"I. V.","last_name":"Ignatiev"},{"full_name":"Verbin, S. Yu.","first_name":"S. Yu.","last_name":"Verbin"},{"full_name":"Yakovlev, D. R.","first_name":"D. R.","last_name":"Yakovlev"},{"full_name":"Reuter, Dirk","first_name":"Dirk","last_name":"Reuter","id":"37763"},{"full_name":"Wieck, A. D.","first_name":"A. D.","last_name":"Wieck"},{"full_name":"Bayer, M.","last_name":"Bayer","first_name":"M."}],"publication_identifier":{"issn":["2469-9950","2469-9969"]},"publication_status":"published","date_updated":"2022-01-06T07:03:26Z","intvolume":"        95"},{"type":"journal_article","department":[{"_id":"15"},{"_id":"230"}],"date_created":"2019-01-28T10:13:17Z","publication":"Physical Review Letters","issue":"14","citation":{"mla":"Srinivasan, A., et al. “Detection and Control of Spin-Orbit Interactions in a GaAs Hole Quantum Point Contact.” <i>Physical Review Letters</i>, vol. 118, no. 14, American Physical Society (APS), 2017, doi:<a href=\"https://doi.org/10.1103/physrevlett.118.146801\">10.1103/physrevlett.118.146801</a>.","ama":"Srinivasan A, Miserev DS, Hudson KL, et al. Detection and Control of Spin-Orbit Interactions in a GaAs Hole Quantum Point Contact. <i>Physical Review Letters</i>. 2017;118(14). doi:<a href=\"https://doi.org/10.1103/physrevlett.118.146801\">10.1103/physrevlett.118.146801</a>","bibtex":"@article{Srinivasan_Miserev_Hudson_Klochan_Muraki_Hirayama_Reuter_Wieck_Sushkov_Hamilton_2017, title={Detection and Control of Spin-Orbit Interactions in a GaAs Hole Quantum Point Contact}, volume={118}, DOI={<a href=\"https://doi.org/10.1103/physrevlett.118.146801\">10.1103/physrevlett.118.146801</a>}, number={14}, journal={Physical Review Letters}, publisher={American Physical Society (APS)}, author={Srinivasan, A. and Miserev, D. S. and Hudson, K. L. and Klochan, O. and Muraki, K. and Hirayama, Y. and Reuter, Dirk and Wieck, A. D. and Sushkov, O. P. and Hamilton, A. R.}, year={2017} }","apa":"Srinivasan, A., Miserev, D. S., Hudson, K. L., Klochan, O., Muraki, K., Hirayama, Y., … Hamilton, A. R. (2017). Detection and Control of Spin-Orbit Interactions in a GaAs Hole Quantum Point Contact. <i>Physical Review Letters</i>, <i>118</i>(14). <a href=\"https://doi.org/10.1103/physrevlett.118.146801\">https://doi.org/10.1103/physrevlett.118.146801</a>","ieee":"A. Srinivasan <i>et al.</i>, “Detection and Control of Spin-Orbit Interactions in a GaAs Hole Quantum Point Contact,” <i>Physical Review Letters</i>, vol. 118, no. 14, 2017.","chicago":"Srinivasan, A., D. S. Miserev, K. L. Hudson, O. Klochan, K. Muraki, Y. Hirayama, Dirk Reuter, A. D. Wieck, O. P. Sushkov, and A. R. Hamilton. “Detection and Control of Spin-Orbit Interactions in a GaAs Hole Quantum Point Contact.” <i>Physical Review Letters</i> 118, no. 14 (2017). <a href=\"https://doi.org/10.1103/physrevlett.118.146801\">https://doi.org/10.1103/physrevlett.118.146801</a>.","short":"A. Srinivasan, D.S. Miserev, K.L. Hudson, O. Klochan, K. Muraki, Y. Hirayama, D. Reuter, A.D. Wieck, O.P. Sushkov, A.R. Hamilton, Physical Review Letters 118 (2017)."},"user_id":"42514","doi":"10.1103/physrevlett.118.146801","volume":118,"_id":"7029","publisher":"American Physical Society (APS)","language":[{"iso":"eng"}],"publication_status":"published","date_updated":"2022-01-06T07:03:26Z","intvolume":"       118","title":"Detection and Control of Spin-Orbit Interactions in a GaAs Hole Quantum Point Contact","year":"2017","status":"public","publication_identifier":{"issn":["0031-9007","1079-7114"]},"author":[{"full_name":"Srinivasan, A.","last_name":"Srinivasan","first_name":"A."},{"first_name":"D. S.","last_name":"Miserev","full_name":"Miserev, D. S."},{"last_name":"Hudson","first_name":"K. L.","full_name":"Hudson, K. L."},{"full_name":"Klochan, O.","last_name":"Klochan","first_name":"O."},{"full_name":"Muraki, K.","last_name":"Muraki","first_name":"K."},{"full_name":"Hirayama, Y.","first_name":"Y.","last_name":"Hirayama"},{"id":"37763","first_name":"Dirk","last_name":"Reuter","full_name":"Reuter, Dirk"},{"full_name":"Wieck, A. D.","first_name":"A. D.","last_name":"Wieck"},{"full_name":"Sushkov, O. P.","first_name":"O. P.","last_name":"Sushkov"},{"first_name":"A. R.","last_name":"Hamilton","full_name":"Hamilton, A. R."}]},{"author":[{"last_name":"Volk","first_name":"Martin F.","full_name":"Volk, Martin F."},{"full_name":"Rüter, Christian E.","last_name":"Rüter","first_name":"Christian E."},{"orcid":"0000-0001-5718-358X","first_name":"Matteo","last_name":"Santandrea","full_name":"Santandrea, Matteo","id":"55095"},{"first_name":"Christof","last_name":"Eigner","orcid":"https://orcid.org/0000-0002-5693-3083","full_name":"Eigner, Christof","id":"13244"},{"last_name":"Padberg","first_name":"Laura","full_name":"Padberg, Laura","id":"40300"},{"id":"216","full_name":"Herrmann, Harald","first_name":"Harald","last_name":"Herrmann"},{"id":"26263","full_name":"Silberhorn, Christine","last_name":"Silberhorn","first_name":"Christine"},{"full_name":"Kip, Detlef","first_name":"Detlef","last_name":"Kip"}],"publication_identifier":{"issn":["2159-3930"]},"status":"public","title":"Fabrication of low-loss Rb-exchanged ridge waveguides in z-cut KTiOPO_4","year":"2017","date_updated":"2022-01-06T07:04:18Z","publication_status":"published","language":[{"iso":"eng"}],"_id":"9681","article_number":"82","doi":"10.1364/ome.8.000082","user_id":"13244","citation":{"ieee":"M. F. Volk <i>et al.</i>, “Fabrication of low-loss Rb-exchanged ridge waveguides in z-cut KTiOPO_4,” <i>Optical Materials Express</i>, Art. no. 82, 2017, doi: <a href=\"https://doi.org/10.1364/ome.8.000082\">10.1364/ome.8.000082</a>.","apa":"Volk, M. F., Rüter, C. E., Santandrea, M., Eigner, C., Padberg, L., Herrmann, H., Silberhorn, C., &#38; Kip, D. (2017). Fabrication of low-loss Rb-exchanged ridge waveguides in z-cut KTiOPO_4. <i>Optical Materials Express</i>, Article 82. <a href=\"https://doi.org/10.1364/ome.8.000082\">https://doi.org/10.1364/ome.8.000082</a>","chicago":"Volk, Martin F., Christian E. Rüter, Matteo Santandrea, Christof Eigner, Laura Padberg, Harald Herrmann, Christine Silberhorn, and Detlef Kip. “Fabrication of Low-Loss Rb-Exchanged Ridge Waveguides in z-Cut KTiOPO_4.” <i>Optical Materials Express</i>, 2017. <a href=\"https://doi.org/10.1364/ome.8.000082\">https://doi.org/10.1364/ome.8.000082</a>.","short":"M.F. Volk, C.E. Rüter, M. Santandrea, C. Eigner, L. Padberg, H. Herrmann, C. Silberhorn, D. Kip, Optical Materials Express (2017).","mla":"Volk, Martin F., et al. “Fabrication of Low-Loss Rb-Exchanged Ridge Waveguides in z-Cut KTiOPO_4.” <i>Optical Materials Express</i>, 82, 2017, doi:<a href=\"https://doi.org/10.1364/ome.8.000082\">10.1364/ome.8.000082</a>.","bibtex":"@article{Volk_Rüter_Santandrea_Eigner_Padberg_Herrmann_Silberhorn_Kip_2017, title={Fabrication of low-loss Rb-exchanged ridge waveguides in z-cut KTiOPO_4}, DOI={<a href=\"https://doi.org/10.1364/ome.8.000082\">10.1364/ome.8.000082</a>}, number={82}, journal={Optical Materials Express}, author={Volk, Martin F. and Rüter, Christian E. and Santandrea, Matteo and Eigner, Christof and Padberg, Laura and Herrmann, Harald and Silberhorn, Christine and Kip, Detlef}, year={2017} }","ama":"Volk MF, Rüter CE, Santandrea M, et al. Fabrication of low-loss Rb-exchanged ridge waveguides in z-cut KTiOPO_4. <i>Optical Materials Express</i>. Published online 2017. doi:<a href=\"https://doi.org/10.1364/ome.8.000082\">10.1364/ome.8.000082</a>"},"publication":"Optical Materials Express","date_created":"2019-05-07T14:54:33Z","department":[{"_id":"15"},{"_id":"288"}],"type":"journal_article"},{"author":[{"last_name":"Brecht","orcid":"0000-0003-4140-0556 ","first_name":"Benjamin","full_name":"Brecht, Benjamin","id":"27150"},{"full_name":"Lazo-Arjona, O.","last_name":"Lazo-Arjona","first_name":"O."},{"last_name":"Kaczmarek","first_name":"K. T.","full_name":"Kaczmarek, K. T."},{"last_name":"Parker","first_name":"T.","full_name":"Parker, T."},{"full_name":"Ricken, R.","first_name":"R.","last_name":"Ricken"},{"first_name":"V.","last_name":"Quiring","full_name":"Quiring, V."},{"id":"13244","full_name":"Eigner, Christof","first_name":"Christof","orcid":"https://orcid.org/0000-0002-5693-3083","last_name":"Eigner"},{"full_name":"Luo, K. H.","last_name":"Luo","first_name":"K. H."},{"full_name":"Herrmann, Harald","first_name":"Harald","last_name":"Herrmann","id":"216"},{"full_name":"Silberhorn, Christine","last_name":"Silberhorn","first_name":"Christine","id":"26263"},{"full_name":"Walmsley, I. A.","first_name":"I. A.","last_name":"Walmsley"}],"publication_identifier":{"isbn":["9781943580330"]},"status":"public","title":"A monolithic, doubly-resonant parametric down-conversion source for Caesium Raman memories","year":"2017","date_updated":"2022-01-06T07:04:18Z","publication_status":"published","_id":"9682","language":[{"iso":"eng"}],"doi":"10.1364/fio.2017.jw4a.3","user_id":"13244","citation":{"bibtex":"@inproceedings{Brecht_Lazo-Arjona_Kaczmarek_Parker_Ricken_Quiring_Eigner_Luo_Herrmann_Silberhorn_et al._2017, title={A monolithic, doubly-resonant parametric down-conversion source for Caesium Raman memories}, DOI={<a href=\"https://doi.org/10.1364/fio.2017.jw4a.3\">10.1364/fio.2017.jw4a.3</a>}, booktitle={Frontiers in Optics 2017}, author={Brecht, Benjamin and Lazo-Arjona, O. and Kaczmarek, K. T. and Parker, T. and Ricken, R. and Quiring, V. and Eigner, Christof and Luo, K. H. and Herrmann, Harald and Silberhorn, Christine and et al.}, year={2017} }","chicago":"Brecht, Benjamin, O. Lazo-Arjona, K. T. Kaczmarek, T. Parker, R. Ricken, V. Quiring, Christof Eigner, et al. “A Monolithic, Doubly-Resonant Parametric down-Conversion Source for Caesium Raman Memories.” In <i>Frontiers in Optics 2017</i>, 2017. <a href=\"https://doi.org/10.1364/fio.2017.jw4a.3\">https://doi.org/10.1364/fio.2017.jw4a.3</a>.","ama":"Brecht B, Lazo-Arjona O, Kaczmarek KT, et al. A monolithic, doubly-resonant parametric down-conversion source for Caesium Raman memories. In: <i>Frontiers in Optics 2017</i>. ; 2017. doi:<a href=\"https://doi.org/10.1364/fio.2017.jw4a.3\">10.1364/fio.2017.jw4a.3</a>","short":"B. Brecht, O. Lazo-Arjona, K.T. Kaczmarek, T. Parker, R. Ricken, V. Quiring, C. Eigner, K.H. Luo, H. Herrmann, C. Silberhorn, I.A. Walmsley, in: Frontiers in Optics 2017, 2017.","ieee":"B. Brecht <i>et al.</i>, “A monolithic, doubly-resonant parametric down-conversion source for Caesium Raman memories,” in <i>Frontiers in Optics 2017</i>, 2017.","apa":"Brecht, B., Lazo-Arjona, O., Kaczmarek, K. T., Parker, T., Ricken, R., Quiring, V., … Walmsley, I. A. (2017). A monolithic, doubly-resonant parametric down-conversion source for Caesium Raman memories. In <i>Frontiers in Optics 2017</i>. <a href=\"https://doi.org/10.1364/fio.2017.jw4a.3\">https://doi.org/10.1364/fio.2017.jw4a.3</a>","mla":"Brecht, Benjamin, et al. “A Monolithic, Doubly-Resonant Parametric down-Conversion Source for Caesium Raman Memories.” <i>Frontiers in Optics 2017</i>, 2017, doi:<a href=\"https://doi.org/10.1364/fio.2017.jw4a.3\">10.1364/fio.2017.jw4a.3</a>."},"publication":"Frontiers in Optics 2017","date_created":"2019-05-07T14:54:45Z","department":[{"_id":"15"},{"_id":"288"}],"type":"conference"},{"citation":{"short":"M. Stefszky, R. Ricken, C. Eigner, V. Quiring, H. Herrmann, C. Silberhorn, Physical Review Applied (2017).","chicago":"Stefszky, M., R. Ricken, Christof Eigner, V. Quiring, Harald Herrmann, and Christine Silberhorn. “Waveguide Cavity Resonator as a Source of Optical Squeezing.” <i>Physical Review Applied</i>, 2017. <a href=\"https://doi.org/10.1103/physrevapplied.7.044026\">https://doi.org/10.1103/physrevapplied.7.044026</a>.","ieee":"M. Stefszky, R. Ricken, C. Eigner, V. Quiring, H. Herrmann, and C. Silberhorn, “Waveguide Cavity Resonator as a Source of Optical Squeezing,” <i>Physical Review Applied</i>, 2017.","apa":"Stefszky, M., Ricken, R., Eigner, C., Quiring, V., Herrmann, H., &#38; Silberhorn, C. (2017). Waveguide Cavity Resonator as a Source of Optical Squeezing. <i>Physical Review Applied</i>. <a href=\"https://doi.org/10.1103/physrevapplied.7.044026\">https://doi.org/10.1103/physrevapplied.7.044026</a>","bibtex":"@article{Stefszky_Ricken_Eigner_Quiring_Herrmann_Silberhorn_2017, title={Waveguide Cavity Resonator as a Source of Optical Squeezing}, DOI={<a href=\"https://doi.org/10.1103/physrevapplied.7.044026\">10.1103/physrevapplied.7.044026</a>}, journal={Physical Review Applied}, author={Stefszky, M. and Ricken, R. and Eigner, Christof and Quiring, V. and Herrmann, Harald and Silberhorn, Christine}, year={2017} }","ama":"Stefszky M, Ricken R, Eigner C, Quiring V, Herrmann H, Silberhorn C. Waveguide Cavity Resonator as a Source of Optical Squeezing. <i>Physical Review Applied</i>. 2017. doi:<a href=\"https://doi.org/10.1103/physrevapplied.7.044026\">10.1103/physrevapplied.7.044026</a>","mla":"Stefszky, M., et al. “Waveguide Cavity Resonator as a Source of Optical Squeezing.” <i>Physical Review Applied</i>, 2017, doi:<a href=\"https://doi.org/10.1103/physrevapplied.7.044026\">10.1103/physrevapplied.7.044026</a>."},"publication":"Physical Review Applied","date_created":"2019-05-07T14:55:32Z","department":[{"_id":"15"},{"_id":"288"}],"type":"journal_article","publication_identifier":{"issn":["2331-7019"]},"author":[{"first_name":"M.","last_name":"Stefszky","full_name":"Stefszky, M."},{"full_name":"Ricken, R.","last_name":"Ricken","first_name":"R."},{"id":"13244","full_name":"Eigner, Christof","last_name":"Eigner","orcid":"https://orcid.org/0000-0002-5693-3083","first_name":"Christof"},{"full_name":"Quiring, V.","first_name":"V.","last_name":"Quiring"},{"first_name":"Harald","last_name":"Herrmann","full_name":"Herrmann, Harald","id":"216"},{"first_name":"Christine","last_name":"Silberhorn","full_name":"Silberhorn, Christine","id":"26263"}],"title":"Waveguide Cavity Resonator as a Source of Optical Squeezing","year":"2017","status":"public","date_updated":"2022-01-06T07:04:18Z","publication_status":"published","_id":"9684","language":[{"iso":"eng"}],"doi":"10.1103/physrevapplied.7.044026","user_id":"13244"},{"publication_identifier":{"issn":["2056-6387"]},"author":[{"first_name":"Linda","last_name":"Sansoni","full_name":"Sansoni, Linda"},{"orcid":"0000-0003-1008-4976","first_name":"Kai Hong","last_name":"Luo","full_name":"Luo, Kai Hong","id":"36389"},{"id":"13244","first_name":"Christof","orcid":"https://orcid.org/0000-0002-5693-3083","last_name":"Eigner","full_name":"Eigner, Christof"},{"full_name":"Ricken, Raimund","last_name":"Ricken","first_name":"Raimund"},{"full_name":"Quiring, Viktor","first_name":"Viktor","last_name":"Quiring"},{"id":"216","last_name":"Herrmann","first_name":"Harald","full_name":"Herrmann, Harald"},{"full_name":"Silberhorn, Christine","first_name":"Christine","last_name":"Silberhorn","id":"26263"}],"status":"public","year":"2017","title":"A two-channel, spectrally degenerate polarization entangled source on chip","publication_status":"published","date_updated":"2022-01-06T07:04:18Z","_id":"9685","language":[{"iso":"eng"}],"user_id":"13244","doi":"10.1038/s41534-016-0005-z","citation":{"bibtex":"@article{Sansoni_Luo_Eigner_Ricken_Quiring_Herrmann_Silberhorn_2017, title={A two-channel, spectrally degenerate polarization entangled source on chip}, DOI={<a href=\"https://doi.org/10.1038/s41534-016-0005-z\">10.1038/s41534-016-0005-z</a>}, journal={npj Quantum Information}, author={Sansoni, Linda and Luo, Kai Hong and Eigner, Christof and Ricken, Raimund and Quiring, Viktor and Herrmann, Harald and Silberhorn, Christine}, year={2017} }","ama":"Sansoni L, Luo KH, Eigner C, et al. A two-channel, spectrally degenerate polarization entangled source on chip. <i>npj Quantum Information</i>. Published online 2017. doi:<a href=\"https://doi.org/10.1038/s41534-016-0005-z\">10.1038/s41534-016-0005-z</a>","mla":"Sansoni, Linda, et al. “A Two-Channel, Spectrally Degenerate Polarization Entangled Source on Chip.” <i>Npj Quantum Information</i>, 2017, doi:<a href=\"https://doi.org/10.1038/s41534-016-0005-z\">10.1038/s41534-016-0005-z</a>.","short":"L. Sansoni, K.H. Luo, C. Eigner, R. Ricken, V. Quiring, H. Herrmann, C. Silberhorn, Npj Quantum Information (2017).","chicago":"Sansoni, Linda, Kai Hong Luo, Christof Eigner, Raimund Ricken, Viktor Quiring, Harald Herrmann, and Christine Silberhorn. “A Two-Channel, Spectrally Degenerate Polarization Entangled Source on Chip.” <i>Npj Quantum Information</i>, 2017. <a href=\"https://doi.org/10.1038/s41534-016-0005-z\">https://doi.org/10.1038/s41534-016-0005-z</a>.","ieee":"L. Sansoni <i>et al.</i>, “A two-channel, spectrally degenerate polarization entangled source on chip,” <i>npj Quantum Information</i>, 2017, doi: <a href=\"https://doi.org/10.1038/s41534-016-0005-z\">10.1038/s41534-016-0005-z</a>.","apa":"Sansoni, L., Luo, K. H., Eigner, C., Ricken, R., Quiring, V., Herrmann, H., &#38; Silberhorn, C. (2017). A two-channel, spectrally degenerate polarization entangled source on chip. <i>Npj Quantum Information</i>. <a href=\"https://doi.org/10.1038/s41534-016-0005-z\">https://doi.org/10.1038/s41534-016-0005-z</a>"},"publication":"npj Quantum Information","date_created":"2019-05-07T14:55:55Z","department":[{"_id":"15"},{"_id":"288"}],"type":"journal_article"},{"publication":"Physical Review A","citation":{"mla":"Burenkov, I. A., et al. “Full Statistical Mode Reconstruction of a Light Field via a Photon-Number-Resolved Measurement.” <i>Physical Review A</i>, 2017, doi:<a href=\"https://doi.org/10.1103/physreva.95.053806\">10.1103/physreva.95.053806</a>.","ama":"Burenkov IA, Sharma AK, Gerrits T, et al. Full statistical mode reconstruction of a light field via a photon-number-resolved measurement. <i>Physical Review A</i>. 2017. doi:<a href=\"https://doi.org/10.1103/physreva.95.053806\">10.1103/physreva.95.053806</a>","bibtex":"@article{Burenkov_Sharma_Gerrits_Harder_Bartley_Silberhorn_Goldschmidt_Polyakov_2017, title={Full statistical mode reconstruction of a light field via a photon-number-resolved measurement}, DOI={<a href=\"https://doi.org/10.1103/physreva.95.053806\">10.1103/physreva.95.053806</a>}, journal={Physical Review A}, author={Burenkov, I. A. and Sharma, A. K. and Gerrits, T. and Harder, G. and Bartley, Tim and Silberhorn, Christine and Goldschmidt, E. A. and Polyakov, S. V.}, year={2017} }","apa":"Burenkov, I. A., Sharma, A. K., Gerrits, T., Harder, G., Bartley, T., Silberhorn, C., … Polyakov, S. V. (2017). Full statistical mode reconstruction of a light field via a photon-number-resolved measurement. <i>Physical Review A</i>. <a href=\"https://doi.org/10.1103/physreva.95.053806\">https://doi.org/10.1103/physreva.95.053806</a>","ieee":"I. A. Burenkov <i>et al.</i>, “Full statistical mode reconstruction of a light field via a photon-number-resolved measurement,” <i>Physical Review A</i>, 2017.","short":"I.A. Burenkov, A.K. Sharma, T. Gerrits, G. Harder, T. Bartley, C. Silberhorn, E.A. Goldschmidt, S.V. Polyakov, Physical Review A (2017).","chicago":"Burenkov, I. A., A. K. Sharma, T. Gerrits, G. Harder, Tim Bartley, Christine Silberhorn, E. A. Goldschmidt, and S. V. Polyakov. “Full Statistical Mode Reconstruction of a Light Field via a Photon-Number-Resolved Measurement.” <i>Physical Review A</i>, 2017. <a href=\"https://doi.org/10.1103/physreva.95.053806\">https://doi.org/10.1103/physreva.95.053806</a>."},"date_created":"2019-05-17T14:03:03Z","type":"journal_article","department":[{"_id":"15"}],"year":"2017","title":"Full statistical mode reconstruction of a light field via a photon-number-resolved measurement","status":"public","publication_identifier":{"issn":["2469-9926","2469-9934"]},"author":[{"last_name":"Burenkov","first_name":"I. A.","full_name":"Burenkov, I. A."},{"last_name":"Sharma","first_name":"A. K.","full_name":"Sharma, A. K."},{"last_name":"Gerrits","first_name":"T.","full_name":"Gerrits, T."},{"first_name":"G.","last_name":"Harder","full_name":"Harder, G."},{"id":"49683","full_name":"Bartley, Tim","first_name":"Tim","last_name":"Bartley"},{"id":"26263","full_name":"Silberhorn, Christine","last_name":"Silberhorn","first_name":"Christine"},{"last_name":"Goldschmidt","first_name":"E. A.","full_name":"Goldschmidt, E. A."},{"full_name":"Polyakov, S. V.","first_name":"S. V.","last_name":"Polyakov"}],"date_updated":"2020-02-26T14:39:21Z","publication_status":"published","_id":"9831","language":[{"iso":"eng"}],"doi":"10.1103/physreva.95.053806","user_id":"49683"},{"citation":{"bibtex":"@article{Meyer-Scott_Montaut_Tiedau_Sansoni_Herrmann_Bartley_Silberhorn_2017, title={Limits on the heralding efficiencies and spectral purities of spectrally filtered single photons from photon-pair sources}, DOI={<a href=\"https://doi.org/10.1103/physreva.95.061803\">10.1103/physreva.95.061803</a>}, journal={Physical Review A}, author={Meyer-Scott, Evan and Montaut, Nicola and Tiedau, Johannes and Sansoni, Linda and Herrmann, Harald and Bartley, Tim and Silberhorn, Christine}, year={2017} }","ama":"Meyer-Scott E, Montaut N, Tiedau J, et al. Limits on the heralding efficiencies and spectral purities of spectrally filtered single photons from photon-pair sources. <i>Physical Review A</i>. 2017. doi:<a href=\"https://doi.org/10.1103/physreva.95.061803\">10.1103/physreva.95.061803</a>","mla":"Meyer-Scott, Evan, et al. “Limits on the Heralding Efficiencies and Spectral Purities of Spectrally Filtered Single Photons from Photon-Pair Sources.” <i>Physical Review A</i>, 2017, doi:<a href=\"https://doi.org/10.1103/physreva.95.061803\">10.1103/physreva.95.061803</a>.","chicago":"Meyer-Scott, Evan, Nicola Montaut, Johannes Tiedau, Linda Sansoni, Harald Herrmann, Tim Bartley, and Christine Silberhorn. “Limits on the Heralding Efficiencies and Spectral Purities of Spectrally Filtered Single Photons from Photon-Pair Sources.” <i>Physical Review A</i>, 2017. <a href=\"https://doi.org/10.1103/physreva.95.061803\">https://doi.org/10.1103/physreva.95.061803</a>.","short":"E. Meyer-Scott, N. Montaut, J. Tiedau, L. Sansoni, H. Herrmann, T. Bartley, C. Silberhorn, Physical Review A (2017).","ieee":"E. Meyer-Scott <i>et al.</i>, “Limits on the heralding efficiencies and spectral purities of spectrally filtered single photons from photon-pair sources,” <i>Physical Review A</i>, 2017.","apa":"Meyer-Scott, E., Montaut, N., Tiedau, J., Sansoni, L., Herrmann, H., Bartley, T., &#38; Silberhorn, C. (2017). Limits on the heralding efficiencies and spectral purities of spectrally filtered single photons from photon-pair sources. <i>Physical Review A</i>. <a href=\"https://doi.org/10.1103/physreva.95.061803\">https://doi.org/10.1103/physreva.95.061803</a>"},"publication":"Physical Review A","department":[{"_id":"15"}],"type":"journal_article","date_created":"2019-05-17T14:07:47Z","publication_status":"published","date_updated":"2020-02-26T14:38:33Z","author":[{"full_name":"Meyer-Scott, Evan","first_name":"Evan","last_name":"Meyer-Scott"},{"full_name":"Montaut, Nicola","first_name":"Nicola","last_name":"Montaut"},{"first_name":"Johannes","last_name":"Tiedau","full_name":"Tiedau, Johannes"},{"full_name":"Sansoni, Linda","first_name":"Linda","last_name":"Sansoni"},{"last_name":"Herrmann","first_name":"Harald","full_name":"Herrmann, Harald","id":"216"},{"first_name":"Tim","last_name":"Bartley","full_name":"Bartley, Tim","id":"49683"},{"full_name":"Silberhorn, Christine","first_name":"Christine","last_name":"Silberhorn","id":"26263"}],"publication_identifier":{"issn":["2469-9926","2469-9934"]},"status":"public","title":"Limits on the heralding efficiencies and spectral purities of spectrally filtered single photons from photon-pair sources","year":"2017","user_id":"49683","doi":"10.1103/physreva.95.061803","language":[{"iso":"eng"}],"_id":"9834"},{"publication":"Nanoscaled Films and Layers","citation":{"short":"T. Riedl, J. Lindner, in: L. Nanai (Ed.), Nanoscaled Films and Layers, InTech, 2017.","chicago":"Riedl, Thomas, and Jörg Lindner. “Heteroepitaxy of III–V Zinc Blende Semiconductors on Nanopatterned Substrates.” In <i>Nanoscaled Films and Layers</i>, edited by L. Nanai. InTech, 2017. <a href=\"https://doi.org/10.5772/67572\">https://doi.org/10.5772/67572</a>.","ieee":"T. Riedl and J. Lindner, “Heteroepitaxy of III–V Zinc Blende Semiconductors on Nanopatterned Substrates,” in <i>Nanoscaled Films and Layers</i>, L. Nanai, Ed. InTech, 2017.","apa":"Riedl, T., &#38; Lindner, J. (2017). Heteroepitaxy of III–V Zinc Blende Semiconductors on Nanopatterned Substrates. In L. Nanai (Ed.), <i>Nanoscaled Films and Layers</i>. InTech. <a href=\"https://doi.org/10.5772/67572\">https://doi.org/10.5772/67572</a>","bibtex":"@inbook{Riedl_Lindner_2017, title={Heteroepitaxy of III–V Zinc Blende Semiconductors on Nanopatterned Substrates}, DOI={<a href=\"https://doi.org/10.5772/67572\">10.5772/67572</a>}, booktitle={Nanoscaled Films and Layers}, publisher={InTech}, author={Riedl, Thomas and Lindner, Jörg}, editor={Nanai, L.Editor}, year={2017} }","ama":"Riedl T, Lindner J. Heteroepitaxy of III–V Zinc Blende Semiconductors on Nanopatterned Substrates. In: Nanai L, ed. <i>Nanoscaled Films and Layers</i>. InTech; 2017. doi:<a href=\"https://doi.org/10.5772/67572\">10.5772/67572</a>","mla":"Riedl, Thomas, and Jörg Lindner. “Heteroepitaxy of III–V Zinc Blende Semiconductors on Nanopatterned Substrates.” <i>Nanoscaled Films and Layers</i>, edited by L. Nanai, InTech, 2017, doi:<a href=\"https://doi.org/10.5772/67572\">10.5772/67572</a>."},"abstract":[{"lang":"eng","text":"In the last decade, zinc blende structure III–V semiconductors have been increasingly utilized for the realization of high‐performance optoelectronic applications because of their tunable bandgaps, high carrier mobility and the absence of piezoelectric fields. However, the integration of III–V devices on the Si platform commonly used for CMOS electronic \r\ncircuits still poses a challenge, due to the large densities of mismatch‐related defects in heteroepitaxial III–V layers grown on planar Si substrates. A promising method to obtain thin III–V layers of high crystalline quality is the growth on nanopatterned substrates. In this approach, defects can be effectively eliminated by elastic lattice relaxation in three \r\ndimensions or confined close to the substrate interface by using aspect‐ratio trapping masks. As a result, an etch pit density as low as 3.3 × 10^5 cm^−2 and a flat surface of submicron GaAs layers have been accomplished by growth onto a SiO2 nanohole film patterned Si(001) substrate, where the threading defects are trapped at the SiO2 mask sidewalls. An open issue that remains to be resolved is to gain a better understanding of the interplay between mask shape, growth conditions and formation of coalescence defects during mask overgrowth in order to achieve thin device quality III–V layers"}],"date_created":"2018-08-20T13:09:20Z","type":"book_chapter","department":[{"_id":"286"},{"_id":"15"}],"year":"2017","status":"public","title":"Heteroepitaxy of III–V Zinc Blende Semiconductors on Nanopatterned Substrates","publication_identifier":{"isbn":["9789535131434","9789535131441"]},"author":[{"id":"36950","last_name":"Riedl","first_name":"Thomas","full_name":"Riedl, Thomas"},{"full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg","id":"20797"}],"publication_status":"published","date_updated":"2022-01-06T06:59:59Z","_id":"3950","language":[{"iso":"eng"}],"publisher":"InTech","user_id":"55706","doi":"10.5772/67572","editor":[{"first_name":"L.","last_name":"Nanai","full_name":"Nanai, L."}]},{"_id":"3951","user_id":"55706","conference":{"end_date":"2017-03-24","location":"Barcelona (Spain)","start_date":"2017-03-21","name":"Europhotonics Spring School 2017"},"author":[{"full_name":"Brassat, Katharina","first_name":"Katharina","last_name":"Brassat","id":"11305"},{"first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797"}],"year":"2017","status":"public","title":"Joining self-assembly techniques: A route to hierarchical nanopores","date_updated":"2022-01-06T06:59:59Z","date_created":"2018-08-20T13:17:16Z","department":[{"_id":"286"},{"_id":"15"}],"type":"conference","citation":{"ieee":"K. Brassat and J. Lindner, “Joining self-assembly techniques: A route to hierarchical nanopores,” presented at the Europhotonics Spring School 2017, Barcelona (Spain), 2017.","apa":"Brassat, K., &#38; Lindner, J. (2017). Joining self-assembly techniques: A route to hierarchical nanopores. Presented at the Europhotonics Spring School 2017, Barcelona (Spain).","short":"K. Brassat, J. Lindner, in: 2017.","chicago":"Brassat, Katharina, and Jörg Lindner. “Joining Self-Assembly Techniques: A Route to Hierarchical Nanopores,” 2017.","mla":"Brassat, Katharina, and Jörg Lindner. <i>Joining Self-Assembly Techniques: A Route to Hierarchical Nanopores</i>. 2017.","bibtex":"@inproceedings{Brassat_Lindner_2017, title={Joining self-assembly techniques: A route to hierarchical nanopores}, author={Brassat, Katharina and Lindner, Jörg}, year={2017} }","ama":"Brassat K, Lindner J. Joining self-assembly techniques: A route to hierarchical nanopores. In: ; 2017."}},{"date_updated":"2022-01-06T06:59:59Z","conference":{"location":"Warsaw (Poland)","name":"E-MRS Fall Meeting 2017","start_date":"2017-09-18","end_date":"2017-09-21"},"author":[{"id":"11305","last_name":"Brassat","first_name":"Katharina","full_name":"Brassat, Katharina"},{"first_name":"Daniel","last_name":"Kool","full_name":"Kool, Daniel","id":"44586"},{"last_name":"Bürger","first_name":"Julius","full_name":"Bürger, Julius","id":"46952"},{"id":"20797","full_name":"Lindner, Jörg","first_name":"Jörg","last_name":"Lindner"}],"title":"Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques","year":"2017","status":"public","user_id":"55706","_id":"3952","citation":{"mla":"Brassat, Katharina, et al. <i>Micro- and Nanopatterned Surfaces with Tailored Chemical and Topographical Contrast by Self-Assembly Techniques</i>. 2017.","bibtex":"@inproceedings{Brassat_Kool_Bürger_Lindner_2017, title={Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques}, author={Brassat, Katharina and Kool, Daniel and Bürger, Julius and Lindner, Jörg}, year={2017} }","ama":"Brassat K, Kool D, Bürger J, Lindner J. Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques. In: ; 2017.","ieee":"K. Brassat, D. Kool, J. Bürger, and J. Lindner, “Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques,” presented at the E-MRS Fall Meeting 2017, Warsaw (Poland), 2017.","apa":"Brassat, K., Kool, D., Bürger, J., &#38; Lindner, J. (2017). Micro- and nanopatterned surfaces with tailored chemical and topographical contrast by self-assembly techniques. Presented at the E-MRS Fall Meeting 2017, Warsaw (Poland).","chicago":"Brassat, Katharina, Daniel Kool, Julius Bürger, and Jörg Lindner. “Micro- and Nanopatterned Surfaces with Tailored Chemical and Topographical Contrast by Self-Assembly Techniques,” 2017.","short":"K. Brassat, D. Kool, J. Bürger, J. Lindner, in: 2017."},"department":[{"_id":"286"},{"_id":"15"}],"type":"conference","date_created":"2018-08-20T13:24:15Z"},{"citation":{"chicago":"Brassat, Katharina, A. Keller, G. Grundmeier, W. Bremser, O. Strube, and Jörg Lindner. “Tailored Antidot Patterns Created by Nanosphere Lithography for Bioapplications,” 2017.","short":"K. Brassat, A. Keller, G. Grundmeier, W. Bremser, O. Strube, J. Lindner, in: 2017.","ieee":"K. Brassat, A. Keller, G. Grundmeier, W. Bremser, O. Strube, and J. Lindner, “Tailored antidot patterns created by nanosphere lithography for bioapplications,” presented at the E-MRS Spring Meeting 2017, Straßburg (France), 2017.","apa":"Brassat, K., Keller, A., Grundmeier, G., Bremser, W., Strube, O., &#38; Lindner, J. (2017). Tailored antidot patterns created by nanosphere lithography for bioapplications. Presented at the E-MRS Spring Meeting 2017, Straßburg (France).","bibtex":"@inproceedings{Brassat_Keller_Grundmeier_Bremser_Strube_Lindner_2017, title={Tailored antidot patterns created by nanosphere lithography for bioapplications}, author={Brassat, Katharina and Keller, A. and Grundmeier, G. and Bremser, W. and Strube, O. and Lindner, Jörg}, year={2017} }","ama":"Brassat K, Keller A, Grundmeier G, Bremser W, Strube O, Lindner J. Tailored antidot patterns created by nanosphere lithography for bioapplications. In: ; 2017.","mla":"Brassat, Katharina, et al. <i>Tailored Antidot Patterns Created by Nanosphere Lithography for Bioapplications</i>. 2017."},"type":"conference","department":[{"_id":"286"},{"_id":"15"},{"_id":"2"}],"date_created":"2018-08-20T13:26:32Z","date_updated":"2022-01-06T06:59:59Z","title":"Tailored antidot patterns created by nanosphere lithography for bioapplications","year":"2017","status":"public","author":[{"last_name":"Brassat","first_name":"Katharina","full_name":"Brassat, Katharina","id":"11305"},{"last_name":"Keller","first_name":"A.","full_name":"Keller, A."},{"full_name":"Grundmeier, G.","first_name":"G.","last_name":"Grundmeier"},{"first_name":"W.","last_name":"Bremser","full_name":"Bremser, W."},{"first_name":"O.","last_name":"Strube","full_name":"Strube, O."},{"first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797"}],"conference":{"end_date":"2017-05-26","location":"Straßburg (France)","start_date":"2017-05-22","name":"E-MRS Spring Meeting 2017"},"user_id":"55706","_id":"3953"},{"citation":{"apa":"Kismann, M., Riedl, T., &#38; Lindner, J. (2017). Morphological properties of nanopillar patterned Si surfaces obtained by nanosphere lithography and metal-assisted wet-chemical etching. Presented at the E-MRS Spring Meeting 2017, Straßburg (France).","ieee":"M. Kismann, T. Riedl, and J. Lindner, “Morphological properties of nanopillar patterned Si surfaces obtained by nanosphere lithography and metal-assisted wet-chemical etching.” 2017.","chicago":"Kismann, Michael, Thomas Riedl, and Jörg Lindner. “Morphological Properties of Nanopillar Patterned Si Surfaces Obtained by Nanosphere Lithography and Metal-Assisted Wet-Chemical Etching.” Poster P.9.1, 2017.","short":"M. Kismann, T. Riedl, J. Lindner, (2017).","mla":"Kismann, Michael, et al. <i>Morphological Properties of Nanopillar Patterned Si Surfaces Obtained by Nanosphere Lithography and Metal-Assisted Wet-Chemical Etching</i>. 2017.","ama":"Kismann M, Riedl T, Lindner J. Morphological properties of nanopillar patterned Si surfaces obtained by nanosphere lithography and metal-assisted wet-chemical etching. 2017.","bibtex":"@article{Kismann_Riedl_Lindner_2017, series={Poster P.9.1}, title={Morphological properties of nanopillar patterned Si surfaces obtained by nanosphere lithography and metal-assisted wet-chemical etching}, author={Kismann, Michael and Riedl, Thomas and Lindner, Jörg}, year={2017}, collection={Poster P.9.1} }"},"type":"conference","department":[{"_id":"286"},{"_id":"15"}],"date_created":"2018-08-20T13:28:53Z","date_updated":"2022-01-06T06:59:59Z","year":"2017","title":"Morphological properties of nanopillar patterned Si surfaces obtained by nanosphere lithography and metal-assisted wet-chemical etching","status":"public","author":[{"first_name":"Michael","last_name":"Kismann","full_name":"Kismann, Michael"},{"first_name":"Thomas","last_name":"Riedl","full_name":"Riedl, Thomas","id":"36950"},{"id":"20797","last_name":"Lindner","first_name":"Jörg","full_name":"Lindner, Jörg"}],"conference":{"end_date":"2017-05-26","start_date":"2017-05-22","name":"E-MRS Spring Meeting 2017","location":"Straßburg (France)"},"user_id":"55706","series_title":"Poster P.9.1","_id":"3954"},{"date_created":"2018-08-20T13:31:50Z","type":"conference","department":[{"_id":"286"},{"_id":"292"},{"_id":"15"}],"citation":{"short":"V. Kunnathully, T. Riedl, A. Karlisch, D. Reuter, J. Lindner, in: 2017.","chicago":"Kunnathully, Vinay, Thomas Riedl, A. Karlisch, Dirk Reuter, and Jörg Lindner. “InAs Heteroepitaxy on GaAs Patterned by Nanosphere Lithography,” 2017.","ieee":"V. Kunnathully, T. Riedl, A. Karlisch, D. Reuter, and J. Lindner, “InAs heteroepitaxy on GaAs patterned by nanosphere lithography,” presented at the E-MRS Fall Meeting 2017, Warsaw (Poland), 2017.","apa":"Kunnathully, V., Riedl, T., Karlisch, A., Reuter, D., &#38; Lindner, J. (2017). InAs heteroepitaxy on GaAs patterned by nanosphere lithography. Presented at the E-MRS Fall Meeting 2017, Warsaw (Poland).","bibtex":"@inproceedings{Kunnathully_Riedl_Karlisch_Reuter_Lindner_2017, title={InAs heteroepitaxy on GaAs patterned by nanosphere lithography}, author={Kunnathully, Vinay and Riedl, Thomas and Karlisch, A. and Reuter, Dirk and Lindner, Jörg}, year={2017} }","ama":"Kunnathully V, Riedl T, Karlisch A, Reuter D, Lindner J. InAs heteroepitaxy on GaAs patterned by nanosphere lithography. In: ; 2017.","mla":"Kunnathully, Vinay, et al. <i>InAs Heteroepitaxy on GaAs Patterned by Nanosphere Lithography</i>. 2017."},"_id":"3955","user_id":"55706","status":"public","title":"InAs heteroepitaxy on GaAs patterned by nanosphere lithography","year":"2017","conference":{"end_date":"2017-09-21","location":"Warsaw (Poland)","start_date":"2017-09-18","name":"E-MRS Fall Meeting 2017"},"author":[{"last_name":"Kunnathully","first_name":"Vinay","full_name":"Kunnathully, Vinay"},{"id":"36950","last_name":"Riedl","first_name":"Thomas","full_name":"Riedl, Thomas"},{"full_name":"Karlisch, A.","last_name":"Karlisch","first_name":"A."},{"full_name":"Reuter, Dirk","first_name":"Dirk","last_name":"Reuter","id":"37763"},{"full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg","id":"20797"}],"date_updated":"2022-01-06T06:59:59Z"},{"_id":"3987","language":[{"iso":"eng"}],"user_id":"55706","title":"Group III arsenide heteroepitaxy on Si(111) using SiNx nanohole masks patterned by nanosphere lithography","status":"public","year":"2017","conference":{"location":"Warsaq (Poland)","name":"E-MRS Fall Meeting 2017","start_date":"2017-09-18","end_date":"2017-09-21"},"author":[{"id":"36950","last_name":"Riedl","first_name":"Thomas","full_name":"Riedl, Thomas"},{"full_name":"Kunnathully, Vinay ","last_name":"Kunnathully","first_name":"Vinay "},{"full_name":"Karlisch, A.","last_name":"Karlisch","first_name":"A."},{"id":"37763","full_name":"Reuter, Dirk","last_name":"Reuter","first_name":"Dirk"},{"full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg","id":"20797"}],"date_updated":"2022-01-06T07:00:04Z","publication_status":"published","date_created":"2018-08-21T11:35:05Z","type":"conference","department":[{"_id":"292"},{"_id":"286"},{"_id":"15"}],"citation":{"short":"T. Riedl, V. Kunnathully, A. Karlisch, D. Reuter, J. Lindner, in: 2017.","ama":"Riedl T, Kunnathully V, Karlisch A, Reuter D, Lindner J. Group III arsenide heteroepitaxy on Si(111) using SiNx nanohole masks patterned by nanosphere lithography. In: ; 2017.","chicago":"Riedl, Thomas, Vinay  Kunnathully, A. Karlisch, Dirk Reuter, and Jörg Lindner. “Group III Arsenide Heteroepitaxy on Si(111) Using SiNx Nanohole Masks Patterned by Nanosphere Lithography,” 2017.","bibtex":"@inproceedings{Riedl_Kunnathully_Karlisch_Reuter_Lindner_2017, title={Group III arsenide heteroepitaxy on Si(111) using SiNx nanohole masks patterned by nanosphere lithography}, author={Riedl, Thomas and Kunnathully, Vinay  and Karlisch, A. and Reuter, Dirk and Lindner, Jörg}, year={2017} }","mla":"Riedl, Thomas, et al. <i>Group III Arsenide Heteroepitaxy on Si(111) Using SiNx Nanohole Masks Patterned by Nanosphere Lithography</i>. 2017.","apa":"Riedl, T., Kunnathully, V., Karlisch, A., Reuter, D., &#38; Lindner, J. (2017). Group III arsenide heteroepitaxy on Si(111) using SiNx nanohole masks patterned by nanosphere lithography. Presented at the E-MRS Fall Meeting 2017, Warsaq (Poland).","ieee":"T. Riedl, V. Kunnathully, A. Karlisch, D. Reuter, and J. Lindner, “Group III arsenide heteroepitaxy on Si(111) using SiNx nanohole masks patterned by nanosphere lithography,” presented at the E-MRS Fall Meeting 2017, Warsaq (Poland), 2017."}},{"date_updated":"2022-01-06T07:00:04Z","author":[{"first_name":"Thomas","last_name":"Riedl","full_name":"Riedl, Thomas","id":"36950"},{"full_name":"Kunnathully, Vinay","last_name":"Kunnathully","first_name":"Vinay"},{"full_name":"Karlisch, A.","last_name":"Karlisch","first_name":"A."},{"id":"37763","last_name":"Reuter","first_name":"Dirk","full_name":"Reuter, Dirk"},{"full_name":"Weber, N.","first_name":"N.","last_name":"Weber"},{"full_name":"Meier, Cedrik","orcid":"https://orcid.org/0000-0002-3787-3572","last_name":"Meier","first_name":"Cedrik","id":"20798"},{"full_name":"Schierholz, R.","first_name":"R.","last_name":"Schierholz"},{"first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797"}],"conference":{"end_date":"2017-05-26","start_date":"2017-05-22","name":"E-MRS Spring Meeting 2017","location":"Straßburg (France)"},"year":"2017","status":"public","title":"Morphology, structure and enhanced PL of molecular beam epitaxial In0.2Ga0.8As layers on nanopillar patterned GaAs","user_id":"20798","_id":"3988","language":[{"iso":"eng"}],"series_title":"contributed talk N.16.1","citation":{"mla":"Riedl, Thomas, et al. <i>Morphology, Structure and Enhanced PL of Molecular Beam Epitaxial In0.2Ga0.8As Layers on Nanopillar Patterned GaAs</i>. 2017.","bibtex":"@article{Riedl_Kunnathully_Karlisch_Reuter_Weber_Meier_Schierholz_Lindner_2017, series={contributed talk N.16.1}, title={Morphology, structure and enhanced PL of molecular beam epitaxial In0.2Ga0.8As layers on nanopillar patterned GaAs}, author={Riedl, Thomas and Kunnathully, Vinay and Karlisch, A. and Reuter, Dirk and Weber, N. and Meier, Cedrik and Schierholz, R. and Lindner, Jörg}, year={2017}, collection={contributed talk N.16.1} }","ama":"Riedl T, Kunnathully V, Karlisch A, et al. Morphology, structure and enhanced PL of molecular beam epitaxial In0.2Ga0.8As layers on nanopillar patterned GaAs. 2017.","ieee":"T. Riedl <i>et al.</i>, “Morphology, structure and enhanced PL of molecular beam epitaxial In0.2Ga0.8As layers on nanopillar patterned GaAs.” 2017.","apa":"Riedl, T., Kunnathully, V., Karlisch, A., Reuter, D., Weber, N., Meier, C., … Lindner, J. (2017). Morphology, structure and enhanced PL of molecular beam epitaxial In0.2Ga0.8As layers on nanopillar patterned GaAs. Presented at the E-MRS Spring Meeting 2017, Straßburg (France).","short":"T. Riedl, V. Kunnathully, A. Karlisch, D. Reuter, N. Weber, C. Meier, R. Schierholz, J. Lindner, (2017).","chicago":"Riedl, Thomas, Vinay Kunnathully, A. Karlisch, Dirk Reuter, N. Weber, Cedrik Meier, R. Schierholz, and Jörg Lindner. “Morphology, Structure and Enhanced PL of Molecular Beam Epitaxial In0.2Ga0.8As Layers on Nanopillar Patterned GaAs.” Contributed Talk N.16.1, 2017."},"department":[{"_id":"286"},{"_id":"292"},{"_id":"287"},{"_id":"15"},{"_id":"35"},{"_id":"230"}],"type":"conference","date_created":"2018-08-21T11:39:30Z"},{"title":"Strain and strain energy in axial-heteroepitaxial GaAs/InAs nanopillars analyzed by atomistic and continuum elastic calculations","status":"public","year":"2017","conference":{"location":"Strasburg (France)","name":"E-MRS Spring Meeting 2017","start_date":"2017-05-22","end_date":"2017-05-26"},"author":[{"first_name":"Thomas","last_name":"Riedl","full_name":"Riedl, Thomas","id":"36950"},{"id":"20797","last_name":"Lindner","first_name":"Jörg","full_name":"Lindner, Jörg"}],"date_updated":"2022-01-06T07:00:04Z","_id":"3989","series_title":"poster N.15.54","user_id":"55706","citation":{"bibtex":"@article{Riedl_Lindner_2017, series={poster N.15.54}, title={Strain and strain energy in axial-heteroepitaxial GaAs/InAs nanopillars analyzed by atomistic and continuum elastic calculations}, author={Riedl, Thomas and Lindner, Jörg}, year={2017}, collection={poster N.15.54} }","ama":"Riedl T, Lindner J. Strain and strain energy in axial-heteroepitaxial GaAs/InAs nanopillars analyzed by atomistic and continuum elastic calculations. 2017.","mla":"Riedl, Thomas, and Jörg Lindner. <i>Strain and Strain Energy in Axial-Heteroepitaxial GaAs/InAs Nanopillars Analyzed by Atomistic and Continuum Elastic Calculations</i>. 2017.","chicago":"Riedl, Thomas, and Jörg Lindner. “Strain and Strain Energy in Axial-Heteroepitaxial GaAs/InAs Nanopillars Analyzed by Atomistic and Continuum Elastic Calculations.” Poster N.15.54, 2017.","short":"T. Riedl, J. Lindner, (2017).","ieee":"T. Riedl and J. Lindner, “Strain and strain energy in axial-heteroepitaxial GaAs/InAs nanopillars analyzed by atomistic and continuum elastic calculations.” 2017.","apa":"Riedl, T., &#38; Lindner, J. (2017). Strain and strain energy in axial-heteroepitaxial GaAs/InAs nanopillars analyzed by atomistic and continuum elastic calculations. Presented at the E-MRS Spring Meeting 2017, Strasburg (France)."},"date_created":"2018-08-21T11:41:36Z","type":"conference","department":[{"_id":"286"},{"_id":"15"}]},{"language":[{"iso":"eng"}],"_id":"3990","series_title":"poster V.14.62","user_id":"55706","author":[{"full_name":"Riedl, Thomas","first_name":"Thomas","last_name":"Riedl"},{"first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg","id":"20797"}],"conference":{"start_date":"2017-05-22","name":"E-MRS Spring Meeting 2017","location":"Strasburg (France)","end_date":"2017-05-26"},"title":"The influence of the sphere material on the opening size distribution of nanosphere lithography masks","status":"public","year":"2017","date_updated":"2022-01-06T07:00:05Z","date_created":"2018-08-21T11:43:10Z","department":[{"_id":"286"},{"_id":"15"}],"type":"conference","citation":{"bibtex":"@article{Riedl_Lindner_2017, series={poster V.14.62}, title={The influence of the sphere material on the opening size distribution of nanosphere lithography masks}, author={Riedl, Thomas and Lindner, Jörg}, year={2017}, collection={poster V.14.62} }","short":"T. Riedl, J. Lindner, (2017).","ama":"Riedl T, Lindner J. The influence of the sphere material on the opening size distribution of nanosphere lithography masks. 2017.","chicago":"Riedl, Thomas, and Jörg Lindner. “The Influence of the Sphere Material on the Opening Size Distribution of Nanosphere Lithography Masks.” Poster V.14.62, 2017.","ieee":"T. Riedl and J. Lindner, “The influence of the sphere material on the opening size distribution of nanosphere lithography masks.” 2017.","mla":"Riedl, Thomas, and Jörg Lindner. <i>The Influence of the Sphere Material on the Opening Size Distribution of Nanosphere Lithography Masks</i>. 2017.","apa":"Riedl, T., &#38; Lindner, J. (2017). The influence of the sphere material on the opening size distribution of nanosphere lithography masks. Presented at the E-MRS Spring Meeting 2017, Strasburg (France)."}},{"department":[{"_id":"286"},{"_id":"15"}],"type":"conference","date_created":"2018-08-21T11:44:47Z","citation":{"bibtex":"@article{Riedl_Kunnathully_Lindner_2017, series={poster V.14.72}, title={Evolution of the opening size of nanosphere lithography masks during thermal annealing}, author={Riedl, Thomas and Kunnathully, Vinay and Lindner, Jörg}, year={2017}, collection={poster V.14.72} }","chicago":"Riedl, Thomas, Vinay Kunnathully, and Jörg Lindner. “Evolution of the Opening Size of Nanosphere Lithography Masks during Thermal Annealing.” Poster V.14.72, 2017.","short":"T. Riedl, V. Kunnathully, J. Lindner, (2017).","ama":"Riedl T, Kunnathully V, Lindner J. Evolution of the opening size of nanosphere lithography masks during thermal annealing. 2017.","ieee":"T. Riedl, V. Kunnathully, and J. Lindner, “Evolution of the opening size of nanosphere lithography masks during thermal annealing.” 2017.","apa":"Riedl, T., Kunnathully, V., &#38; Lindner, J. (2017). Evolution of the opening size of nanosphere lithography masks during thermal annealing. Presented at the E-MRS Spring Meeting 2017, Straßburg (France).","mla":"Riedl, Thomas, et al. <i>Evolution of the Opening Size of Nanosphere Lithography Masks during Thermal Annealing</i>. 2017."},"user_id":"55706","language":[{"iso":"eng"}],"_id":"3991","series_title":"poster V.14.72","date_updated":"2022-01-06T07:00:05Z","author":[{"id":"36950","full_name":"Riedl, Thomas","first_name":"Thomas","last_name":"Riedl"},{"first_name":"Vinay","last_name":"Kunnathully","full_name":"Kunnathully, Vinay"},{"id":"20797","first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg"}],"conference":{"location":"Straßburg (France)","name":"E-MRS Spring Meeting 2017","start_date":"2017-05-22","end_date":"2017-05-26"},"title":"Evolution of the opening size of nanosphere lithography masks during thermal annealing","year":"2017","status":"public"},{"intvolume":"         9","publication_status":"published","date_updated":"2022-01-06T07:00:05Z","publication_identifier":{"issn":["1944-8244","1944-8252"]},"author":[{"first_name":"Torsten","last_name":"Rieger","full_name":"Rieger, Torsten"},{"id":"36950","first_name":"Thomas","last_name":"Riedl","full_name":"Riedl, Thomas"},{"full_name":"Neumann, Elmar","last_name":"Neumann","first_name":"Elmar"},{"full_name":"Grützmacher, Detlev","last_name":"Grützmacher","first_name":"Detlev"},{"id":"20797","first_name":"Jörg","last_name":"Lindner","full_name":"Lindner, Jörg"},{"full_name":"Pawlis, Alexander","last_name":"Pawlis","first_name":"Alexander"}],"year":"2017","status":"public","title":"Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence","volume":9,"user_id":"55706","doi":"10.1021/acsami.6b15824","_id":"3992","publisher":"American Chemical Society (ACS)","page":"8371-8377","citation":{"ama":"Rieger T, Riedl T, Neumann E, Grützmacher D, Lindner J, Pawlis A. Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence. <i>ACS Applied Materials &#38; Interfaces</i>. 2017;9(9):8371-8377. doi:<a href=\"https://doi.org/10.1021/acsami.6b15824\">10.1021/acsami.6b15824</a>","short":"T. Rieger, T. Riedl, E. Neumann, D. Grützmacher, J. Lindner, A. Pawlis, ACS Applied Materials &#38; Interfaces 9 (2017) 8371–8377.","chicago":"Rieger, Torsten, Thomas Riedl, Elmar Neumann, Detlev Grützmacher, Jörg Lindner, and Alexander Pawlis. “Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence.” <i>ACS Applied Materials &#38; Interfaces</i> 9, no. 9 (2017): 8371–77. <a href=\"https://doi.org/10.1021/acsami.6b15824\">https://doi.org/10.1021/acsami.6b15824</a>.","bibtex":"@article{Rieger_Riedl_Neumann_Grützmacher_Lindner_Pawlis_2017, title={Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence}, volume={9}, DOI={<a href=\"https://doi.org/10.1021/acsami.6b15824\">10.1021/acsami.6b15824</a>}, number={9}, journal={ACS Applied Materials &#38; Interfaces}, publisher={American Chemical Society (ACS)}, author={Rieger, Torsten and Riedl, Thomas and Neumann, Elmar and Grützmacher, Detlev and Lindner, Jörg and Pawlis, Alexander}, year={2017}, pages={8371–8377} }","mla":"Rieger, Torsten, et al. “Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence.” <i>ACS Applied Materials &#38; Interfaces</i>, vol. 9, no. 9, American Chemical Society (ACS), 2017, pp. 8371–77, doi:<a href=\"https://doi.org/10.1021/acsami.6b15824\">10.1021/acsami.6b15824</a>.","apa":"Rieger, T., Riedl, T., Neumann, E., Grützmacher, D., Lindner, J., &#38; Pawlis, A. (2017). Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence. <i>ACS Applied Materials &#38; Interfaces</i>, <i>9</i>(9), 8371–8377. <a href=\"https://doi.org/10.1021/acsami.6b15824\">https://doi.org/10.1021/acsami.6b15824</a>","ieee":"T. Rieger, T. Riedl, E. Neumann, D. Grützmacher, J. Lindner, and A. Pawlis, “Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence,” <i>ACS Applied Materials &#38; Interfaces</i>, vol. 9, no. 9, pp. 8371–8377, 2017."},"publication":"ACS Applied Materials & Interfaces","issue":"9","department":[{"_id":"286"},{"_id":"15"}],"type":"journal_article","date_created":"2018-08-21T11:45:23Z"}]