@article{24112,
  author       = {{Niendorf, Thomas and Brenne, Florian and Hoyer, Kay-Peter and Schwarze, Dieter and Schaper, Mirko and Grothe, Richard and Wiesener, Markus and Grundmeier, Guido and Maier, Hans Jürgen}},
  issn         = {{1073-5623}},
  journal      = {{Metallurgical and Materials Transactions A}},
  pages        = {{2829--2833}},
  title        = {{{Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications}}},
  doi          = {{10.1007/s11661-015-2932-2}},
  year         = {{2015}},
}

@article{62811,
  abstract     = {{The photo-conversion efficiency and stability of back-illuminated dye sensitised solar cells with titanium foil based photoanodes are enhanced by a simple nitric acid treatment through which the foil is passivated. This treatment changes the morphology of the titanium foil and increases its electrochemical double layer capacitance.}},
  author       = {{Linnemann, Julia and Giorgio, J. and Wagner, K. and Mathieson, G. and Wallace, G. G. and Officer, D. L.}},
  issn         = {{2050-7488}},
  journal      = {{Journal of Materials Chemistry A}},
  keywords     = {{dye sensitized solar cells, DSSCs}},
  number       = {{7}},
  pages        = {{3266--3270}},
  publisher    = {{Royal Society of Chemistry (RSC)}},
  title        = {{{A simple one step process for enhancement of titanium foil dye sensitised solar cell anodes}}},
  doi          = {{10.1039/c4ta05407e}},
  volume       = {{3}},
  year         = {{2015}},
}

@article{20944,
  abstract     = {{Joining metals using electrochemical support (ECUF) is a new process for cold pressure welding sheets and parts. This new process is based on an electrochemical in-line surface treatment followed by incremental pilger rolling. The ECUF process intends to cold pressure weld materials under optimized conditions. Oxide layers on metal surfaces are known to inhibit the formation of cold pressure welds. The in-line electrochemical treatment will be used to remove these surface oxides for specific engineering metals and alloys. Hence, an improved pressure weld formation at lower forces and smaller reduction ratios is expected for the electrochemically treated surfaces. Using a more flexible pressure welding process, the number of applications could be greatly improved. First tests with copper were performed to analyse the efficiency of the proposed electrochemical surface treatments. Two electrochemical treatments, the cathodic oxide-reduction and cyclovoltammetric oxide-reduction, were compared with conventional treatments (degreasing and scratch brushing) regarding their influence on the cold pressure welding process of copper. The weld strength of lap welds has been investigated as well as the necessary reduction threshold to form a weld. It was found that the electrochemical oxide reduction resulted in higher weld strength. The results of scanning electron microscopy (SEM) and energy dispersive analysis of X-rays (EDX) indicate that surface oxides were successfully removed by the electrochemical surface treatments. (C) 2014 Elsevier B.V. All rights reserved.}},
  author       = {{Ebbert, Christoph and Schmidt, H. C. and Rodman, D. and Nuernberger, F. and Homberg, W. and Maier, H. J. and Grundmeier, Guido}},
  issn         = {{0924-0136}},
  journal      = {{JOURNAL OF MATERIALS PROCESSING TECHNOLOGY}},
  number       = {{10}},
  pages        = {{2179--2187}},
  title        = {{{Joining with electrochemical support (ECUF): Cold pressure welding of copper}}},
  doi          = {{10.1016/j.jmatprotec.2014.04.015}},
  volume       = {{214}},
  year         = {{2014}},
}

@article{23637,
  author       = {{Steinrück, Hans-Georg and Schiener, Andreas and Schindler, Torben and Will, Johannes and Magerl, Andreas and Konovalov, Oleg and Li Destri, Giovanni and Seeck, Oliver H. and Mezger, Markus and Haddad, Julia and Deutsch, Moshe and Checco, Antonio and Ocko, Benjamin M.}},
  issn         = {{1936-0851}},
  journal      = {{ACS Nano}},
  pages        = {{12676--12681}},
  title        = {{{Nanoscale Structure of Si/SiO2/Organics Interfaces}}},
  doi          = {{10.1021/nn5056223}},
  volume       = {{8}},
  year         = {{2014}},
}

@article{23638,
  author       = {{Khassanov, Artoem and Schmaltz, Thomas and Steinrück, Hans-Georg and Magerl, Andreas and Hirsch, Andreas and Halik, Marcus}},
  issn         = {{2196-7350}},
  journal      = {{Advanced Materials Interfaces}},
  pages        = {{1400238}},
  title        = {{{Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film Memory Transistors}}},
  doi          = {{10.1002/admi.201400238}},
  volume       = {{1}},
  year         = {{2014}},
}

@article{23639,
  author       = {{Schmaltz, Thomas and Khassanov, Artoem and Steinrück, Hans-Georg and Magerl, Andreas and Hirsch, Andreas and Halik, Marcus}},
  issn         = {{2040-3364}},
  journal      = {{Nanoscale}},
  pages        = {{13022--13027}},
  title        = {{{Tuning the molecular order of C60-based self-assembled monolayers in field-effect transistors}}},
  doi          = {{10.1039/c4nr03557g}},
  volume       = {{6}},
  year         = {{2014}},
}

@article{23640,
  author       = {{Steinrück, Hans-Georg and Magerl, A. and Deutsch, M. and Ocko, B. M.}},
  issn         = {{0031-9007}},
  journal      = {{Physical Review Letters}},
  pages        = {{156101}},
  title        = {{{Pseudorotational Epitaxy of Self-Assembled Octadecyltrichlorosilane Monolayers on Sapphire (0001)}}},
  doi          = {{10.1103/physrevlett.113.156101}},
  volume       = {{113}},
  year         = {{2014}},
}

@article{22683,
  author       = {{Bald, Ilko and Keller, Adrian}},
  issn         = {{1420-3049}},
  journal      = {{Molecules}},
  pages        = {{13803--13823}},
  title        = {{{Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy}}},
  doi          = {{10.3390/molecules190913803}},
  volume       = {{19}},
  year         = {{2014}},
}

@article{22580,
  author       = {{König, Dennis and Naujoks, Dennis and de los Arcos de Pedro, Maria Teresa and Grosse-Kreul, Simon and Ludwig, Alfred}},
  issn         = {{1438-1656}},
  journal      = {{Advanced Engineering Materials}},
  pages        = {{669--673}},
  title        = {{{X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films}}},
  doi          = {{10.1002/adem.201400317}},
  year         = {{2014}},
}

@article{22585,
  author       = {{de los Arcos de Pedro, Maria Teresa and Schröder, Raphael and Gonzalvo, Yolanda Aranda and Gathen, Volker Schulz-von der and Winter, Jörg}},
  issn         = {{0963-0252}},
  journal      = {{Plasma Sources Science and Technology}},
  title        = {{{Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate}}},
  doi          = {{10.1088/0963-0252/23/5/054008}},
  year         = {{2014}},
}

@article{22586,
  author       = {{Eren, Baran and Marot, Laurent and Steiner, Roland and de los Arcos de Pedro, Maria Teresa and Düggelin, Marcel and Mathys, Daniel and Goldie, Kenneth N. and Olivieri, Vesna and Meyer, Ernst}},
  issn         = {{0009-2614}},
  journal      = {{Chemical Physics Letters}},
  pages        = {{82--87}},
  title        = {{{Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology}}},
  doi          = {{10.1016/j.cplett.2014.06.042}},
  year         = {{2014}},
}

@article{22587,
  author       = {{Machura, P D and Hecimovic, A and Gallian, S and Winter, J and de los Arcos de Pedro, Maria Teresa}},
  issn         = {{0963-0252}},
  journal      = {{Plasma Sources Science and Technology}},
  title        = {{{Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges}}},
  doi          = {{10.1088/0963-0252/23/6/065043}},
  year         = {{2014}},
}

@article{22588,
  author       = {{Marinov, D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A and Rousseau, A}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure}}},
  doi          = {{10.1088/0022-3727/47/47/475204}},
  year         = {{2014}},
}

@article{22590,
  author       = {{Xu, Ke and Dang, Van-Son and Ney, Andreas and de los Arcos de Pedro, Maria Teresa and Devi, Anjana}},
  issn         = {{1533-4880}},
  journal      = {{Journal of Nanoscience and Nanotechnology}},
  pages        = {{5095--5102}},
  title        = {{{Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition}}},
  doi          = {{10.1166/jnn.2014.8848}},
  year         = {{2014}},
}

@article{20945,
  abstract     = {{Calcium-Silicate-Hydrates (C-S-H) are the main binding phases in most concrete which is the primarily used composite construction material in the world. However, a big lack is cleaving between the actual knowledge about C-S-H, compared to what could be reached using state-of-the-art technologies of modern research. In this article, the formation of a C-S-H phase on a native oxide covered silicon wafer is investigated by means of in-situ attenuated total reflection infrared (ATR-IR) and ex-situ surface-enhanced Raman spectroscopy (SERS). The total thickness of the C-S-H phase is determined by X-ray photoelectron spectroscopy (XPS) to be 3 nm. The formation appears to be reversible depending on the environment pH value and can be performed at room temperature. Based on density functional theory (DFT) calculations, it is shown that the C-S-H phase in the presence of water will change its chemical composition in order to reach the thermodynamic ground state of the system. This change is achieved by a metal-proton exchange reaction. The stoichiometry of these metal-proton exchange reactions is nearly independent of the environment pH value. Electrokinetic measurements yield isoelectric points of 2.0 and 2.6 for the native oxide covered silicon wafer (SiO2) and the C-S-H phase. This is consistent with a predominance of Si-O sites at the C-S-H/water interface. (C) 2013 Elsevier B. V. All rights reserved.}},
  author       = {{Ebbert, Christoph and Grundmeier, Guido and Buitkamp, Nadine and Kroeger, Alexander and Messerschmidt, Florian and Thissen, Peter}},
  issn         = {{1873-5584}},
  journal      = {{APPLIED SURFACE SCIENCE}},
  pages        = {{207--214}},
  title        = {{{Toward a microscopic understanding of the calcium-silicate-hydrates/water interface}}},
  doi          = {{10.1016/j.apsusc.2013.11.045}},
  volume       = {{290}},
  year         = {{2014}},
}

@article{20946,
  abstract     = {{In the current work, we study the silver ion release potential and the water uptake through a SiOxCyHz-polymer which is grown from the precursor hexamethyldisiloxane (HMDSO) in radiofrequency (RF) plasma. These layers were deposited on top of two dimensional (2D) ensembles of silver nanoparticles (AgNPs) with nominal thickness of 2 nm on a 20 nm RF-sputtered polytetrafluoroethylene (PTFE) thin film. The composition of the plasma-polymerized HMDSO barriers was varied by changing the oxygen flow during the polymerization process and their thickness was varied as well. Morphology and optical properties of the nanocomposites were investigated using transmission electron microscopy (TEM) and UV-Visible spectroscopy (UV-Vis), respectively. The concentration of the silver ions released from the nanocomposites after immersion in water for several time intervals was measured using inductively coupled plasma mass spectrometry (ICP-MS). Contact angle analysis and electrochemical impedance spectroscopy (EIS) measurements were also performed and results show a strong dependence of the coatings properties and their water uptake on the oxygen content in the coating films and their thickness. Plasma polymerization with increasing the oxygen flow leads to the formation of more hydrophilic thin films with a higher Ag ion release potential. Increasing the thickness of the coatings reduced the amount of the released ions and the rate of the release process was slowed down. This indicates that by tailoring the structure and the thickness of the plasma-polymerized coating films, one can tune the silver ion release properties of Ag/polymer nanocomposites.}},
  author       = {{Alissawi, N. and Peter, T. and Strunskus, T. and Ebbert, Christoph and Grundmeier, Guido and Faupel, F.}},
  issn         = {{1572-896X}},
  journal      = {{JOURNAL OF NANOPARTICLE RESEARCH}},
  number       = {{11}},
  title        = {{{Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites}}},
  doi          = {{10.1007/s11051-013-2080-9}},
  volume       = {{15}},
  year         = {{2013}},
}

@article{23641,
  author       = {{Wang, Zhenxing and Mohammadzadeh, Saeideh and Schmaltz, Thomas and Kirschner, Johannes and Khassanov, Artoem and Eigler, Siegfried and Mundloch, Udo and Backes, Claudia and Steinrück, Hans-Georg and Magerl, Andreas and Hauke, Frank and Hirsch, Andreas and Halik, Marcus}},
  issn         = {{1936-0851}},
  journal      = {{ACS Nano}},
  pages        = {{11427--11434}},
  title        = {{{Region-Selective Self-Assembly of Functionalized Carbon Allotropes from Solution}}},
  doi          = {{10.1021/nn405488n}},
  volume       = {{7}},
  year         = {{2013}},
}

@article{23642,
  author       = {{Schmaltz, Thomas and Amin, Atefeh Y. and Khassanov, Artoem and Meyer-Friedrichsen, Timo and Steinrück, Hans-Georg and Magerl, Andreas and Segura, Juan José and Voitchovsky, Kislon and Stellacci, Francesco and Halik, Marcus}},
  issn         = {{0935-9648}},
  journal      = {{Advanced Materials}},
  pages        = {{4511--4514}},
  title        = {{{Low-Voltage Self-Assembled Monolayer Field-Effect Transistors on Flexible Substrates}}},
  doi          = {{10.1002/adma.201301176}},
  volume       = {{25}},
  year         = {{2013}},
}

@article{23643,
  author       = {{Will, J. and Gröschel, A. and Kot, D. and Schubert, M. A. and Bergmann, C. and Steinrück, Hans-Georg and Kissinger, G. and Magerl, A.}},
  issn         = {{0021-8979}},
  journal      = {{Journal of Applied Physics}},
  pages        = {{073508}},
  title        = {{{Oxygen diffusivity in silicon derived from dynamical X-ray diffraction}}},
  doi          = {{10.1063/1.4792747}},
  volume       = {{7}},
  year         = {{2013}},
}

@article{22584,
  author       = {{Dang, Van-Son and Parala, Harish and Kim, Jin Hyun and Xu, Ke and Srinivasan, Nagendra B. and Edengeiser, Eugen and Havenith, Martina and Wieck, Andreas D. and de los Arcos de Pedro, Maria Teresa and Fischer, Roland. A. and Devi, Anjana}},
  issn         = {{1862-6300}},
  journal      = {{physica status solidi (a)}},
  pages        = {{416--424}},
  title        = {{{Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition}}},
  doi          = {{10.1002/pssa.201330115}},
  year         = {{2013}},
}

