@article{23643,
  author       = {{Will, J. and Gröschel, A. and Kot, D. and Schubert, M. A. and Bergmann, C. and Steinrück, Hans-Georg and Kissinger, G. and Magerl, A.}},
  issn         = {{0021-8979}},
  journal      = {{Journal of Applied Physics}},
  pages        = {{073508}},
  title        = {{{Oxygen diffusivity in silicon derived from dynamical X-ray diffraction}}},
  doi          = {{10.1063/1.4792747}},
  volume       = {{7}},
  year         = {{2013}},
}

@article{22584,
  author       = {{Dang, Van-Son and Parala, Harish and Kim, Jin Hyun and Xu, Ke and Srinivasan, Nagendra B. and Edengeiser, Eugen and Havenith, Martina and Wieck, Andreas D. and de los Arcos de Pedro, Maria Teresa and Fischer, Roland. A. and Devi, Anjana}},
  issn         = {{1862-6300}},
  journal      = {{physica status solidi (a)}},
  pages        = {{416--424}},
  title        = {{{Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition}}},
  doi          = {{10.1002/pssa.201330115}},
  year         = {{2013}},
}

@article{22589,
  author       = {{Srinivasan, Nagendra B. and Thiede, Tobias B. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Becker, Hans-Werner and Devi, Anjana and Fischer, Roland A.}},
  issn         = {{1862-6300}},
  journal      = {{physica status solidi (a)}},
  pages        = {{260--266}},
  title        = {{{MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics}}},
  doi          = {{10.1002/pssa.201330127}},
  year         = {{2013}},
}

@article{22596,
  author       = {{Xu, Ke and Chaudhuri, Ayan Roy and Parala, Harish and Schwendt, Dominik and de los Arcos de Pedro, Maria Teresa and Osten, H. Jörg and Devi, Anjana}},
  issn         = {{2050-7526}},
  journal      = {{Journal of Materials Chemistry C}},
  title        = {{{Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties}}},
  doi          = {{10.1039/c3tc30401a}},
  year         = {{2013}},
}

@article{22593,
  author       = {{Srinivasan, N.B. and Thiede, T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski, M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}},
  issn         = {{0257-8972}},
  journal      = {{Surface and Coatings Technology}},
  pages        = {{130--136}},
  title        = {{{Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}}},
  doi          = {{10.1016/j.surfcoat.2013.06.024}},
  year         = {{2013}},
}

@article{22594,
  author       = {{Will, Andreas and de los Arcos de Pedro, Maria Teresa and Corbella, Carles and Hecimovic, Ante and Machura, Patrick D and Winter, Jörg and von Keudell, Achim}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum}}},
  doi          = {{10.1088/0022-3727/46/8/084009}},
  year         = {{2013}},
}

@article{22591,
  author       = {{Corbella, Carles and Grosse-Kreul, Simon and Kreiter, Oliver and de los Arcos de Pedro, Maria Teresa and Benedikt, Jan and von Keudell, Achim}},
  issn         = {{0034-6748}},
  journal      = {{Review of Scientific Instruments}},
  title        = {{{Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces}}},
  doi          = {{10.1063/1.4826066}},
  year         = {{2013}},
}

@article{22595,
  author       = {{Winter, J and Hecimovic, A and de los Arcos de Pedro, Maria Teresa and Böke, M and Schulz-von der Gathen, V}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity}}},
  doi          = {{10.1088/0022-3727/46/8/084007}},
  year         = {{2013}},
}

@article{22592,
  author       = {{Rügner, Katja and Reuter, Rüdiger and Ellerweg, Dirk and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim and Benedikt, Jan}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  pages        = {{1061--1073}},
  title        = {{{Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure}}},
  doi          = {{10.1002/ppap.201300059}},
  year         = {{2013}},
}

@article{22597,
  author       = {{Banerjee, Manish and Srinivasan, Nagendra Babu and Zhu, Huaizhi and Kim, Sun Ja and Xu, Ke and Winter, Manuela and Becker, Hans-Werner and Rogalla, Detlef and de los Arcos de Pedro, Maria Teresa and Bekermann, Daniela and Barreca, Davide and Fischer, Roland A. and Devi, Anjana}},
  issn         = {{1528-7483}},
  journal      = {{Crystal Growth & Design}},
  pages        = {{5079--5089}},
  title        = {{{Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors}}},
  doi          = {{10.1021/cg3010147}},
  year         = {{2012}},
}

@article{22602,
  author       = {{Milanov, Andrian P. and Xu, Ke and Cwik, Stefan and Parala, Harish and de los Arcos de Pedro, Maria Teresa and Becker, Hans-Werner and Rogalla, Detlef and Cross, Richard and Paul, Shashi and Devi, Anjana}},
  issn         = {{1477-9226}},
  journal      = {{Dalton Transactions}},
  title        = {{{Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors}}},
  doi          = {{10.1039/c2dt31219k}},
  year         = {{2012}},
}

@article{22604,
  author       = {{Reuter, Rüdiger and Rügner, Katja and Ellerweg, Dirk and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim and Benedikt, Jan}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  pages        = {{1116--1124}},
  title        = {{{The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure}}},
  doi          = {{10.1002/ppap.201100146}},
  year         = {{2012}},
}

@article{22599,
  author       = {{Ehiasarian, A. P. and Hecimovic, A. and de los Arcos de Pedro, Maria Teresa and New, R. and Schulz-von der Gathen, V. and Böke, M. and Winter, J.}},
  issn         = {{0003-6951}},
  journal      = {{Applied Physics Letters}},
  title        = {{{High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization}}},
  doi          = {{10.1063/1.3692172}},
  year         = {{2012}},
}

@article{22601,
  author       = {{Marot, L. and de los Arcos de Pedro, Maria Teresa and Bünzli, A.M. and Wäckerlin, C. and Steiner, R. and Oelhafen, P. and Meyer, E. and Mathys, D. and Spätig, P. and Covarel, G.}},
  issn         = {{0257-8972}},
  journal      = {{Surface and Coatings Technology}},
  pages        = {{223--228}},
  title        = {{{Nanocomposites of carbon nanotubes embedded in a (Ti,Al)N coated film}}},
  doi          = {{10.1016/j.surfcoat.2012.09.053}},
  year         = {{2012}},
}

@article{22603,
  author       = {{Prenzel, Marina and de los Arcos de Pedro, Maria Teresa and Kortmann, Annika and Winter, Jörg and von Keudell, Achim}},
  issn         = {{0021-8979}},
  journal      = {{Journal of Applied Physics}},
  title        = {{{Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films}}},
  doi          = {{10.1063/1.4767383}},
  year         = {{2012}},
}

@article{22600,
  author       = {{Hecimovic, A and de los Arcos de Pedro, Maria Teresa and Schulz-von der Gathen, V and Böke, M and Winter, J}},
  issn         = {{0963-0252}},
  journal      = {{Plasma Sources Science and Technology}},
  title        = {{{Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges}}},
  doi          = {{10.1088/0963-0252/21/3/035017}},
  year         = {{2012}},
}

@article{22605,
  author       = {{Schröder, D and Bahre, H and Knake, N and Winter, J and de los Arcos de Pedro, Maria Teresa and Schulz-von der Gathen, V}},
  issn         = {{0963-0252}},
  journal      = {{Plasma Sources Science and Technology}},
  title        = {{{Influence of target surfaces on the atomic oxygen distribution in the effluent of a micro-scaled atmospheric pressure plasma jet}}},
  doi          = {{10.1088/0963-0252/21/2/024007}},
  year         = {{2012}},
}

@article{62808,
  abstract     = {{Conventional alkaline solutions used for capacitive performance of electrodeposited cobalt hydroxides have a number of disadvantages as they are corrosive, environmentally unfriendly and provide a small working potential range. In this study, the capacitive properties of electrodeposited cobalt hydroxide/oxide were investigated in 1 M Na2SO4 solution with pH 5.5 by means of cyclic voltammetry, galvanostatic charging/discharging experiments and electrochemical impedance spectroscopy. The capacitance of the cobalt hydroxide/oxide was demonstrated to have high values of 141 F g−1 at scan rate 8 mV s−1 in this 1 M Na2SO4 solution. The anodic potential range is extended by 0.8–1.3 V vs. Ag/AgCl. A good cyclic stability and reversibility were observed.}},
  author       = {{Fedorov, Fedor S. and Linnemann, Julia and Tschulik, Kristina and Giebeler, Lars and Uhlemann, Margitta and Gebert, Annett}},
  issn         = {{0013-4686}},
  journal      = {{Electrochimica Acta}},
  keywords     = {{electrodeposition, cobalt hydroxide, supercapacitors}},
  pages        = {{166--170}},
  publisher    = {{Elsevier BV}},
  title        = {{{Capacitance performance of cobalt hydroxide-based capacitors with utilization of near-neutral electrolytes}}},
  doi          = {{10.1016/j.electacta.2012.11.123}},
  volume       = {{90}},
  year         = {{2012}},
}

@article{13548,
  author       = {{Thissen, Peter and Thissen, Vera and Wippermann, Stefan and Chabal, Yves J. and Grundmeier, Guido and Schmidt, Wolf Gero}},
  issn         = {{0039-6028}},
  journal      = {{Surface Science}},
  pages        = {{902--907}},
  title        = {{{pH-dependent structure and energetics of H2O/MgO(100)}}},
  doi          = {{10.1016/j.susc.2012.01.018}},
  volume       = {{606}},
  year         = {{2012}},
}

@article{20947,
  abstract     = {{Alkylphosphonic acids of different alkyl chain lengths were adsorbed on electrochemically polished NiTi surfaces from ethanolic solutions. The electropolishing process led to passive films mainly composed of Ti-oxyhydroxide. The surface showed nanoscopic etching pits with a depths of about 2 nm and a diameter of about 20 nm. The interfacial binding mechanism of the phosphonic acid group to the oxyhydroxide surface and the ordering of the monolayer were spectroscopically analysed by means of infrared reflection absorption FTIR-spectroscopy with (PM-IRRAS) and without (IRRAS) photoelastic modulation. The comparison of IRRAS and PM-IRRAS data of the long chain octadecylphosphonic acid monolayer proved that the binding mechanism of the phosphonic acid group to the oxyhydroxide surface is based on a mono-or bidentate bond, which is not stable in the presence of high water activities. An alkyl chain length of 17 CH2 groups is required for the formation of self-assembled monolayers, which are stable in aqueous environments. These long chain aliphatic organophosphonic acid monolayers were shown to inhibit anodic and cathodic surface reactions. (C) 2010 Elsevier B.V. All rights reserved.}},
  author       = {{Maxisch, M. and Ebbert, Christoph and Torun, B. and Fink, N. and de los Arcos, T. and Lackmann, J. and Maier, H. J. and Grundmeier, Guido}},
  issn         = {{1873-5584}},
  journal      = {{APPLIED SURFACE SCIENCE}},
  number       = {{6}},
  pages        = {{2011--2018}},
  title        = {{{PM-IRRAS studies of the adsorption and stability of organophosphonate monolayers on passivated NiTi surfaces}}},
  doi          = {{10.1016/j.apsusc.2010.09.044}},
  volume       = {{257}},
  year         = {{2011}},
}