---
_id: '24112'
author:
- first_name: Thomas
full_name: Niendorf, Thomas
last_name: Niendorf
- first_name: Florian
full_name: Brenne, Florian
last_name: Brenne
- first_name: Kay-Peter
full_name: Hoyer, Kay-Peter
id: '48411'
last_name: Hoyer
- first_name: Dieter
full_name: Schwarze, Dieter
last_name: Schwarze
- first_name: Mirko
full_name: Schaper, Mirko
id: '43720'
last_name: Schaper
- first_name: Richard
full_name: Grothe, Richard
last_name: Grothe
- first_name: Markus
full_name: Wiesener, Markus
last_name: Wiesener
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Hans Jürgen
full_name: Maier, Hans Jürgen
last_name: Maier
citation:
ama: 'Niendorf T, Brenne F, Hoyer K-P, et al. Processing of New Materials by Additive
Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications.
Metallurgical and Materials Transactions A. Published online 2015:2829-2833.
doi:10.1007/s11661-015-2932-2'
apa: 'Niendorf, T., Brenne, F., Hoyer, K.-P., Schwarze, D., Schaper, M., Grothe,
R., Wiesener, M., Grundmeier, G., & Maier, H. J. (2015). Processing of New
Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical
Applications. Metallurgical and Materials Transactions A, 2829–2833. https://doi.org/10.1007/s11661-015-2932-2'
bibtex: '@article{Niendorf_Brenne_Hoyer_Schwarze_Schaper_Grothe_Wiesener_Grundmeier_Maier_2015,
title={Processing of New Materials by Additive Manufacturing: Iron-Based Alloys
Containing Silver for Biomedical Applications}, DOI={10.1007/s11661-015-2932-2},
journal={Metallurgical and Materials Transactions A}, author={Niendorf, Thomas
and Brenne, Florian and Hoyer, Kay-Peter and Schwarze, Dieter and Schaper, Mirko
and Grothe, Richard and Wiesener, Markus and Grundmeier, Guido and Maier, Hans
Jürgen}, year={2015}, pages={2829–2833} }'
chicago: 'Niendorf, Thomas, Florian Brenne, Kay-Peter Hoyer, Dieter Schwarze, Mirko
Schaper, Richard Grothe, Markus Wiesener, Guido Grundmeier, and Hans Jürgen Maier.
“Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing
Silver for Biomedical Applications.” Metallurgical and Materials Transactions
A, 2015, 2829–33. https://doi.org/10.1007/s11661-015-2932-2.'
ieee: 'T. Niendorf et al., “Processing of New Materials by Additive Manufacturing:
Iron-Based Alloys Containing Silver for Biomedical Applications,” Metallurgical
and Materials Transactions A, pp. 2829–2833, 2015, doi: 10.1007/s11661-015-2932-2.'
mla: 'Niendorf, Thomas, et al. “Processing of New Materials by Additive Manufacturing:
Iron-Based Alloys Containing Silver for Biomedical Applications.” Metallurgical
and Materials Transactions A, 2015, pp. 2829–33, doi:10.1007/s11661-015-2932-2.'
short: T. Niendorf, F. Brenne, K.-P. Hoyer, D. Schwarze, M. Schaper, R. Grothe,
M. Wiesener, G. Grundmeier, H.J. Maier, Metallurgical and Materials Transactions
A (2015) 2829–2833.
date_created: 2021-09-10T07:22:01Z
date_updated: 2023-06-01T14:23:33Z
department:
- _id: '9'
- _id: '158'
- _id: '302'
doi: 10.1007/s11661-015-2932-2
language:
- iso: eng
page: 2829-2833
publication: Metallurgical and Materials Transactions A
publication_identifier:
issn:
- 1073-5623
- 1543-1940
publication_status: published
quality_controlled: '1'
status: public
title: 'Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing
Silver for Biomedical Applications'
type: journal_article
user_id: '43720'
year: '2015'
...
---
_id: '62811'
abstract:
- lang: eng
text: The photo-conversion efficiency and stability of back-illuminated dye sensitised
solar cells with titanium foil based photoanodes are enhanced by a simple nitric
acid treatment through which the foil is passivated. This treatment changes the
morphology of the titanium foil and increases its electrochemical double layer
capacitance.
article_type: original
author:
- first_name: Julia
full_name: Linnemann, Julia
id: '116779'
last_name: Linnemann
orcid: 0000-0001-6883-5424
- first_name: J.
full_name: Giorgio, J.
last_name: Giorgio
- first_name: K.
full_name: Wagner, K.
last_name: Wagner
- first_name: G.
full_name: Mathieson, G.
last_name: Mathieson
- first_name: G. G.
full_name: Wallace, G. G.
last_name: Wallace
- first_name: D. L.
full_name: Officer, D. L.
last_name: Officer
citation:
ama: Linnemann J, Giorgio J, Wagner K, Mathieson G, Wallace GG, Officer DL. A simple
one step process for enhancement of titanium foil dye sensitised solar cell anodes.
Journal of Materials Chemistry A. 2015;3(7):3266-3270. doi:10.1039/c4ta05407e
apa: Linnemann, J., Giorgio, J., Wagner, K., Mathieson, G., Wallace, G. G., &
Officer, D. L. (2015). A simple one step process for enhancement of titanium foil
dye sensitised solar cell anodes. Journal of Materials Chemistry A, 3(7),
3266–3270. https://doi.org/10.1039/c4ta05407e
bibtex: '@article{Linnemann_Giorgio_Wagner_Mathieson_Wallace_Officer_2015, title={A
simple one step process for enhancement of titanium foil dye sensitised solar
cell anodes}, volume={3}, DOI={10.1039/c4ta05407e},
number={7}, journal={Journal of Materials Chemistry A}, publisher={Royal Society
of Chemistry (RSC)}, author={Linnemann, Julia and Giorgio, J. and Wagner, K. and
Mathieson, G. and Wallace, G. G. and Officer, D. L.}, year={2015}, pages={3266–3270}
}'
chicago: 'Linnemann, Julia, J. Giorgio, K. Wagner, G. Mathieson, G. G. Wallace,
and D. L. Officer. “A Simple One Step Process for Enhancement of Titanium Foil
Dye Sensitised Solar Cell Anodes.” Journal of Materials Chemistry A 3,
no. 7 (2015): 3266–70. https://doi.org/10.1039/c4ta05407e.'
ieee: 'J. Linnemann, J. Giorgio, K. Wagner, G. Mathieson, G. G. Wallace, and D.
L. Officer, “A simple one step process for enhancement of titanium foil dye sensitised
solar cell anodes,” Journal of Materials Chemistry A, vol. 3, no. 7, pp.
3266–3270, 2015, doi: 10.1039/c4ta05407e.'
mla: Linnemann, Julia, et al. “A Simple One Step Process for Enhancement of Titanium
Foil Dye Sensitised Solar Cell Anodes.” Journal of Materials Chemistry A,
vol. 3, no. 7, Royal Society of Chemistry (RSC), 2015, pp. 3266–70, doi:10.1039/c4ta05407e.
short: J. Linnemann, J. Giorgio, K. Wagner, G. Mathieson, G.G. Wallace, D.L. Officer,
Journal of Materials Chemistry A 3 (2015) 3266–3270.
date_created: 2025-12-03T15:55:21Z
date_updated: 2025-12-03T16:34:56Z
department:
- _id: '985'
doi: 10.1039/c4ta05407e
extern: '1'
intvolume: ' 3'
issue: '7'
keyword:
- dye sensitized solar cells
- DSSCs
language:
- iso: eng
page: 3266-3270
publication: Journal of Materials Chemistry A
publication_identifier:
issn:
- 2050-7488
- 2050-7496
publication_status: published
publisher: Royal Society of Chemistry (RSC)
quality_controlled: '1'
status: public
title: A simple one step process for enhancement of titanium foil dye sensitised solar
cell anodes
type: journal_article
user_id: '116779'
volume: 3
year: '2015'
...
---
_id: '20944'
abstract:
- lang: eng
text: Joining metals using electrochemical support (ECUF) is a new process for cold
pressure welding sheets and parts. This new process is based on an electrochemical
in-line surface treatment followed by incremental pilger rolling. The ECUF process
intends to cold pressure weld materials under optimized conditions. Oxide layers
on metal surfaces are known to inhibit the formation of cold pressure welds. The
in-line electrochemical treatment will be used to remove these surface oxides
for specific engineering metals and alloys. Hence, an improved pressure weld formation
at lower forces and smaller reduction ratios is expected for the electrochemically
treated surfaces. Using a more flexible pressure welding process, the number of
applications could be greatly improved. First tests with copper were performed
to analyse the efficiency of the proposed electrochemical surface treatments.
Two electrochemical treatments, the cathodic oxide-reduction and cyclovoltammetric
oxide-reduction, were compared with conventional treatments (degreasing and scratch
brushing) regarding their influence on the cold pressure welding process of copper.
The weld strength of lap welds has been investigated as well as the necessary
reduction threshold to form a weld. It was found that the electrochemical oxide
reduction resulted in higher weld strength. The results of scanning electron microscopy
(SEM) and energy dispersive analysis of X-rays (EDX) indicate that surface oxides
were successfully removed by the electrochemical surface treatments. (C) 2014
Elsevier B.V. All rights reserved.
author:
- first_name: Christoph
full_name: Ebbert, Christoph
id: '7266'
last_name: Ebbert
- first_name: H. C.
full_name: Schmidt, H. C.
last_name: Schmidt
- first_name: D.
full_name: Rodman, D.
last_name: Rodman
- first_name: F.
full_name: Nuernberger, F.
last_name: Nuernberger
- first_name: W.
full_name: Homberg, W.
last_name: Homberg
- first_name: H. J.
full_name: Maier, H. J.
last_name: Maier
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: 'Ebbert C, Schmidt HC, Rodman D, et al. Joining with electrochemical support
(ECUF): Cold pressure welding of copper. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY.
2014;214(10):2179-2187. doi:10.1016/j.jmatprotec.2014.04.015'
apa: 'Ebbert, C., Schmidt, H. C., Rodman, D., Nuernberger, F., Homberg, W., Maier,
H. J., & Grundmeier, G. (2014). Joining with electrochemical support (ECUF):
Cold pressure welding of copper. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY,
214(10), 2179–2187. https://doi.org/10.1016/j.jmatprotec.2014.04.015'
bibtex: '@article{Ebbert_Schmidt_Rodman_Nuernberger_Homberg_Maier_Grundmeier_2014,
title={Joining with electrochemical support (ECUF): Cold pressure welding of copper},
volume={214}, DOI={10.1016/j.jmatprotec.2014.04.015},
number={10}, journal={JOURNAL OF MATERIALS PROCESSING TECHNOLOGY}, author={Ebbert,
Christoph and Schmidt, H. C. and Rodman, D. and Nuernberger, F. and Homberg, W.
and Maier, H. J. and Grundmeier, Guido}, year={2014}, pages={2179–2187} }'
chicago: 'Ebbert, Christoph, H. C. Schmidt, D. Rodman, F. Nuernberger, W. Homberg,
H. J. Maier, and Guido Grundmeier. “Joining with Electrochemical Support (ECUF):
Cold Pressure Welding of Copper.” JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
214, no. 10 (2014): 2179–87. https://doi.org/10.1016/j.jmatprotec.2014.04.015.'
ieee: 'C. Ebbert et al., “Joining with electrochemical support (ECUF): Cold
pressure welding of copper,” JOURNAL OF MATERIALS PROCESSING TECHNOLOGY,
vol. 214, no. 10, pp. 2179–2187, 2014.'
mla: 'Ebbert, Christoph, et al. “Joining with Electrochemical Support (ECUF): Cold
Pressure Welding of Copper.” JOURNAL OF MATERIALS PROCESSING TECHNOLOGY,
vol. 214, no. 10, 2014, pp. 2179–87, doi:10.1016/j.jmatprotec.2014.04.015.'
short: C. Ebbert, H.C. Schmidt, D. Rodman, F. Nuernberger, W. Homberg, H.J. Maier,
G. Grundmeier, JOURNAL OF MATERIALS PROCESSING TECHNOLOGY 214 (2014) 2179–2187.
date_created: 2021-01-13T10:12:50Z
date_updated: 2022-01-06T06:54:41Z
department:
- _id: '35'
- _id: '302'
- _id: '321'
doi: 10.1016/j.jmatprotec.2014.04.015
external_id:
isi:
- '000338814500023'
intvolume: ' 214'
isi: '1'
issue: '10'
language:
- iso: eng
page: 2179-2187
publication: JOURNAL OF MATERIALS PROCESSING TECHNOLOGY
publication_identifier:
issn:
- 0924-0136
publication_status: published
quality_controlled: '1'
status: public
title: 'Joining with electrochemical support (ECUF): Cold pressure welding of copper'
type: journal_article
user_id: '7266'
volume: 214
year: '2014'
...
---
_id: '23637'
author:
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
id: '84268'
last_name: Steinrück
orcid: 0000-0001-6373-0877
- first_name: Andreas
full_name: Schiener, Andreas
last_name: Schiener
- first_name: Torben
full_name: Schindler, Torben
last_name: Schindler
- first_name: Johannes
full_name: Will, Johannes
last_name: Will
- first_name: Andreas
full_name: Magerl, Andreas
last_name: Magerl
- first_name: Oleg
full_name: Konovalov, Oleg
last_name: Konovalov
- first_name: Giovanni
full_name: Li Destri, Giovanni
last_name: Li Destri
- first_name: Oliver H.
full_name: Seeck, Oliver H.
last_name: Seeck
- first_name: Markus
full_name: Mezger, Markus
last_name: Mezger
- first_name: Julia
full_name: Haddad, Julia
last_name: Haddad
- first_name: Moshe
full_name: Deutsch, Moshe
last_name: Deutsch
- first_name: Antonio
full_name: Checco, Antonio
last_name: Checco
- first_name: Benjamin M.
full_name: Ocko, Benjamin M.
last_name: Ocko
citation:
ama: Steinrück H-G, Schiener A, Schindler T, et al. Nanoscale Structure of Si/SiO2/Organics
Interfaces. ACS Nano. 2014;8:12676-12681. doi:10.1021/nn5056223
apa: Steinrück, H.-G., Schiener, A., Schindler, T., Will, J., Magerl, A., Konovalov,
O., Li Destri, G., Seeck, O. H., Mezger, M., Haddad, J., Deutsch, M., Checco,
A., & Ocko, B. M. (2014). Nanoscale Structure of Si/SiO2/Organics Interfaces.
ACS Nano, 8, 12676–12681. https://doi.org/10.1021/nn5056223
bibtex: '@article{Steinrück_Schiener_Schindler_Will_Magerl_Konovalov_Li Destri_Seeck_Mezger_Haddad_et
al._2014, title={Nanoscale Structure of Si/SiO2/Organics Interfaces}, volume={8},
DOI={10.1021/nn5056223}, journal={ACS
Nano}, author={Steinrück, Hans-Georg and Schiener, Andreas and Schindler, Torben
and Will, Johannes and Magerl, Andreas and Konovalov, Oleg and Li Destri, Giovanni
and Seeck, Oliver H. and Mezger, Markus and Haddad, Julia and et al.}, year={2014},
pages={12676–12681} }'
chicago: 'Steinrück, Hans-Georg, Andreas Schiener, Torben Schindler, Johannes Will,
Andreas Magerl, Oleg Konovalov, Giovanni Li Destri, et al. “Nanoscale Structure
of Si/SiO2/Organics Interfaces.” ACS Nano 8 (2014): 12676–81. https://doi.org/10.1021/nn5056223.'
ieee: 'H.-G. Steinrück et al., “Nanoscale Structure of Si/SiO2/Organics Interfaces,”
ACS Nano, vol. 8, pp. 12676–12681, 2014, doi: 10.1021/nn5056223.'
mla: Steinrück, Hans-Georg, et al. “Nanoscale Structure of Si/SiO2/Organics Interfaces.”
ACS Nano, vol. 8, 2014, pp. 12676–81, doi:10.1021/nn5056223.
short: H.-G. Steinrück, A. Schiener, T. Schindler, J. Will, A. Magerl, O. Konovalov,
G. Li Destri, O.H. Seeck, M. Mezger, J. Haddad, M. Deutsch, A. Checco, B.M. Ocko,
ACS Nano 8 (2014) 12676–12681.
date_created: 2021-09-01T09:48:49Z
date_updated: 2022-01-06T06:55:57Z
department:
- _id: '633'
doi: 10.1021/nn5056223
intvolume: ' 8'
language:
- iso: eng
page: 12676-12681
publication: ACS Nano
publication_identifier:
issn:
- 1936-0851
- 1936-086X
publication_status: published
status: public
title: Nanoscale Structure of Si/SiO2/Organics Interfaces
type: journal_article
user_id: '84268'
volume: 8
year: '2014'
...
---
_id: '23638'
author:
- first_name: Artoem
full_name: Khassanov, Artoem
last_name: Khassanov
- first_name: Thomas
full_name: Schmaltz, Thomas
last_name: Schmaltz
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
id: '84268'
last_name: Steinrück
orcid: 0000-0001-6373-0877
- first_name: Andreas
full_name: Magerl, Andreas
last_name: Magerl
- first_name: Andreas
full_name: Hirsch, Andreas
last_name: Hirsch
- first_name: Marcus
full_name: Halik, Marcus
last_name: Halik
citation:
ama: Khassanov A, Schmaltz T, Steinrück H-G, Magerl A, Hirsch A, Halik M. Interface
Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film
Memory Transistors. Advanced Materials Interfaces. 2014;1:1400238. doi:10.1002/admi.201400238
apa: Khassanov, A., Schmaltz, T., Steinrück, H.-G., Magerl, A., Hirsch, A., &
Halik, M. (2014). Interface Engineering of Molecular Charge Storage Dielectric
Layers for Organic Thin-Film Memory Transistors. Advanced Materials Interfaces,
1, 1400238. https://doi.org/10.1002/admi.201400238
bibtex: '@article{Khassanov_Schmaltz_Steinrück_Magerl_Hirsch_Halik_2014, title={Interface
Engineering of Molecular Charge Storage Dielectric Layers for Organic Thin-Film
Memory Transistors}, volume={1}, DOI={10.1002/admi.201400238},
journal={Advanced Materials Interfaces}, author={Khassanov, Artoem and Schmaltz,
Thomas and Steinrück, Hans-Georg and Magerl, Andreas and Hirsch, Andreas and Halik,
Marcus}, year={2014}, pages={1400238} }'
chicago: 'Khassanov, Artoem, Thomas Schmaltz, Hans-Georg Steinrück, Andreas Magerl,
Andreas Hirsch, and Marcus Halik. “Interface Engineering of Molecular Charge Storage
Dielectric Layers for Organic Thin-Film Memory Transistors.” Advanced Materials
Interfaces 1 (2014): 1400238. https://doi.org/10.1002/admi.201400238.'
ieee: 'A. Khassanov, T. Schmaltz, H.-G. Steinrück, A. Magerl, A. Hirsch, and M.
Halik, “Interface Engineering of Molecular Charge Storage Dielectric Layers for
Organic Thin-Film Memory Transistors,” Advanced Materials Interfaces, vol.
1, p. 1400238, 2014, doi: 10.1002/admi.201400238.'
mla: Khassanov, Artoem, et al. “Interface Engineering of Molecular Charge Storage
Dielectric Layers for Organic Thin-Film Memory Transistors.” Advanced Materials
Interfaces, vol. 1, 2014, p. 1400238, doi:10.1002/admi.201400238.
short: A. Khassanov, T. Schmaltz, H.-G. Steinrück, A. Magerl, A. Hirsch, M. Halik,
Advanced Materials Interfaces 1 (2014) 1400238.
date_created: 2021-09-01T09:48:56Z
date_updated: 2022-01-06T06:55:57Z
department:
- _id: '633'
doi: 10.1002/admi.201400238
intvolume: ' 1'
language:
- iso: eng
page: '1400238'
publication: Advanced Materials Interfaces
publication_identifier:
issn:
- 2196-7350
publication_status: published
status: public
title: Interface Engineering of Molecular Charge Storage Dielectric Layers for Organic
Thin-Film Memory Transistors
type: journal_article
user_id: '84268'
volume: 1
year: '2014'
...
---
_id: '23639'
author:
- first_name: Thomas
full_name: Schmaltz, Thomas
last_name: Schmaltz
- first_name: Artoem
full_name: Khassanov, Artoem
last_name: Khassanov
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
id: '84268'
last_name: Steinrück
orcid: 0000-0001-6373-0877
- first_name: Andreas
full_name: Magerl, Andreas
last_name: Magerl
- first_name: Andreas
full_name: Hirsch, Andreas
last_name: Hirsch
- first_name: Marcus
full_name: Halik, Marcus
last_name: Halik
citation:
ama: Schmaltz T, Khassanov A, Steinrück H-G, Magerl A, Hirsch A, Halik M. Tuning
the molecular order of C60-based self-assembled monolayers in field-effect transistors.
Nanoscale. 2014;6:13022-13027. doi:10.1039/c4nr03557g
apa: Schmaltz, T., Khassanov, A., Steinrück, H.-G., Magerl, A., Hirsch, A., &
Halik, M. (2014). Tuning the molecular order of C60-based self-assembled monolayers
in field-effect transistors. Nanoscale, 6, 13022–13027. https://doi.org/10.1039/c4nr03557g
bibtex: '@article{Schmaltz_Khassanov_Steinrück_Magerl_Hirsch_Halik_2014, title={Tuning
the molecular order of C60-based self-assembled monolayers in field-effect transistors},
volume={6}, DOI={10.1039/c4nr03557g},
journal={Nanoscale}, author={Schmaltz, Thomas and Khassanov, Artoem and Steinrück,
Hans-Georg and Magerl, Andreas and Hirsch, Andreas and Halik, Marcus}, year={2014},
pages={13022–13027} }'
chicago: 'Schmaltz, Thomas, Artoem Khassanov, Hans-Georg Steinrück, Andreas Magerl,
Andreas Hirsch, and Marcus Halik. “Tuning the Molecular Order of C60-Based Self-Assembled
Monolayers in Field-Effect Transistors.” Nanoscale 6 (2014): 13022–27.
https://doi.org/10.1039/c4nr03557g.'
ieee: 'T. Schmaltz, A. Khassanov, H.-G. Steinrück, A. Magerl, A. Hirsch, and M.
Halik, “Tuning the molecular order of C60-based self-assembled monolayers in field-effect
transistors,” Nanoscale, vol. 6, pp. 13022–13027, 2014, doi: 10.1039/c4nr03557g.'
mla: Schmaltz, Thomas, et al. “Tuning the Molecular Order of C60-Based Self-Assembled
Monolayers in Field-Effect Transistors.” Nanoscale, vol. 6, 2014, pp. 13022–27,
doi:10.1039/c4nr03557g.
short: T. Schmaltz, A. Khassanov, H.-G. Steinrück, A. Magerl, A. Hirsch, M. Halik,
Nanoscale 6 (2014) 13022–13027.
date_created: 2021-09-01T09:49:02Z
date_updated: 2022-01-06T06:55:57Z
department:
- _id: '633'
doi: 10.1039/c4nr03557g
intvolume: ' 6'
language:
- iso: eng
page: 13022-13027
publication: Nanoscale
publication_identifier:
issn:
- 2040-3364
- 2040-3372
publication_status: published
status: public
title: Tuning the molecular order of C60-based self-assembled monolayers in field-effect
transistors
type: journal_article
user_id: '84268'
volume: 6
year: '2014'
...
---
_id: '23640'
author:
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
id: '84268'
last_name: Steinrück
orcid: 0000-0001-6373-0877
- first_name: A.
full_name: Magerl, A.
last_name: Magerl
- first_name: M.
full_name: Deutsch, M.
last_name: Deutsch
- first_name: B. M.
full_name: Ocko, B. M.
last_name: Ocko
citation:
ama: Steinrück H-G, Magerl A, Deutsch M, Ocko BM. Pseudorotational Epitaxy of Self-Assembled
Octadecyltrichlorosilane Monolayers on Sapphire (0001). Physical Review Letters.
2014;113:156101. doi:10.1103/physrevlett.113.156101
apa: Steinrück, H.-G., Magerl, A., Deutsch, M., & Ocko, B. M. (2014). Pseudorotational
Epitaxy of Self-Assembled Octadecyltrichlorosilane Monolayers on Sapphire (0001).
Physical Review Letters, 113, 156101. https://doi.org/10.1103/physrevlett.113.156101
bibtex: '@article{Steinrück_Magerl_Deutsch_Ocko_2014, title={Pseudorotational Epitaxy
of Self-Assembled Octadecyltrichlorosilane Monolayers on Sapphire (0001)}, volume={113},
DOI={10.1103/physrevlett.113.156101},
journal={Physical Review Letters}, author={Steinrück, Hans-Georg and Magerl, A.
and Deutsch, M. and Ocko, B. M.}, year={2014}, pages={156101} }'
chicago: 'Steinrück, Hans-Georg, A. Magerl, M. Deutsch, and B. M. Ocko. “Pseudorotational
Epitaxy of Self-Assembled Octadecyltrichlorosilane Monolayers on Sapphire (0001).”
Physical Review Letters 113 (2014): 156101. https://doi.org/10.1103/physrevlett.113.156101.'
ieee: 'H.-G. Steinrück, A. Magerl, M. Deutsch, and B. M. Ocko, “Pseudorotational
Epitaxy of Self-Assembled Octadecyltrichlorosilane Monolayers on Sapphire (0001),”
Physical Review Letters, vol. 113, p. 156101, 2014, doi: 10.1103/physrevlett.113.156101.'
mla: Steinrück, Hans-Georg, et al. “Pseudorotational Epitaxy of Self-Assembled Octadecyltrichlorosilane
Monolayers on Sapphire (0001).” Physical Review Letters, vol. 113, 2014,
p. 156101, doi:10.1103/physrevlett.113.156101.
short: H.-G. Steinrück, A. Magerl, M. Deutsch, B.M. Ocko, Physical Review Letters
113 (2014) 156101.
date_created: 2021-09-01T09:49:09Z
date_updated: 2022-01-06T06:55:57Z
department:
- _id: '633'
doi: 10.1103/physrevlett.113.156101
intvolume: ' 113'
language:
- iso: eng
page: '156101'
publication: Physical Review Letters
publication_identifier:
issn:
- 0031-9007
- 1079-7114
publication_status: published
status: public
title: Pseudorotational Epitaxy of Self-Assembled Octadecyltrichlorosilane Monolayers
on Sapphire (0001)
type: journal_article
user_id: '84268'
volume: 113
year: '2014'
...
---
_id: '22683'
author:
- first_name: Ilko
full_name: Bald, Ilko
last_name: Bald
- first_name: Adrian
full_name: Keller, Adrian
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
citation:
ama: Bald I, Keller A. Molecular Processes Studied at a Single-Molecule Level Using
DNA Origami Nanostructures and Atomic Force Microscopy. Molecules. 2014;19:13803-13823.
doi:10.3390/molecules190913803
apa: Bald, I., & Keller, A. (2014). Molecular Processes Studied at a Single-Molecule
Level Using DNA Origami Nanostructures and Atomic Force Microscopy. Molecules,
19, 13803–13823. https://doi.org/10.3390/molecules190913803
bibtex: '@article{Bald_Keller_2014, title={Molecular Processes Studied at a Single-Molecule
Level Using DNA Origami Nanostructures and Atomic Force Microscopy}, volume={19},
DOI={10.3390/molecules190913803},
journal={Molecules}, author={Bald, Ilko and Keller, Adrian}, year={2014}, pages={13803–13823}
}'
chicago: 'Bald, Ilko, and Adrian Keller. “Molecular Processes Studied at a Single-Molecule
Level Using DNA Origami Nanostructures and Atomic Force Microscopy.” Molecules
19 (2014): 13803–23. https://doi.org/10.3390/molecules190913803.'
ieee: I. Bald and A. Keller, “Molecular Processes Studied at a Single-Molecule Level
Using DNA Origami Nanostructures and Atomic Force Microscopy,” Molecules,
vol. 19, pp. 13803–13823, 2014.
mla: Bald, Ilko, and Adrian Keller. “Molecular Processes Studied at a Single-Molecule
Level Using DNA Origami Nanostructures and Atomic Force Microscopy.” Molecules,
vol. 19, 2014, pp. 13803–23, doi:10.3390/molecules190913803.
short: I. Bald, A. Keller, Molecules 19 (2014) 13803–13823.
date_created: 2021-07-08T13:01:44Z
date_updated: 2022-01-06T06:55:38Z
department:
- _id: '302'
doi: 10.3390/molecules190913803
intvolume: ' 19'
language:
- iso: eng
page: 13803-13823
publication: Molecules
publication_identifier:
issn:
- 1420-3049
publication_status: published
status: public
title: Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures
and Atomic Force Microscopy
type: journal_article
user_id: '48864'
volume: 19
year: '2014'
...
---
_id: '22580'
author:
- first_name: Dennis
full_name: König, Dennis
last_name: König
- first_name: Dennis
full_name: Naujoks, Dennis
last_name: Naujoks
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Simon
full_name: Grosse-Kreul, Simon
last_name: Grosse-Kreul
- first_name: Alfred
full_name: Ludwig, Alfred
last_name: Ludwig
citation:
ama: König D, Naujoks D, de los Arcos de Pedro MT, Grosse-Kreul S, Ludwig A. X-Ray
Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its
Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory
Thin Films. Advanced Engineering Materials. Published online 2014:669-673.
doi:10.1002/adem.201400317
apa: König, D., Naujoks, D., de los Arcos de Pedro, M. T., Grosse-Kreul, S., &
Ludwig, A. (2014). X-Ray Photoelectron Spectroscopy Investigations of the Surface
Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape
Memory Thin Films. Advanced Engineering Materials, 669–673. https://doi.org/10.1002/adem.201400317
bibtex: '@article{König_Naujoks_de los Arcos de Pedro_Grosse-Kreul_Ludwig_2014,
title={X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction
Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape
Memory Thin Films}, DOI={10.1002/adem.201400317},
journal={Advanced Engineering Materials}, author={König, Dennis and Naujoks, Dennis
and de los Arcos de Pedro, Maria Teresa and Grosse-Kreul, Simon and Ludwig, Alfred},
year={2014}, pages={669–673} }'
chicago: König, Dennis, Dennis Naujoks, Maria Teresa de los Arcos de Pedro, Simon
Grosse-Kreul, and Alfred Ludwig. “X-Ray Photoelectron Spectroscopy Investigations
of the Surface Reaction Layer and Its Effects on the Transformation Properties
of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films.” Advanced Engineering Materials,
2014, 669–73. https://doi.org/10.1002/adem.201400317.
ieee: 'D. König, D. Naujoks, M. T. de los Arcos de Pedro, S. Grosse-Kreul, and A.
Ludwig, “X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction
Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape
Memory Thin Films,” Advanced Engineering Materials, pp. 669–673, 2014,
doi: 10.1002/adem.201400317.'
mla: König, Dennis, et al. “X-Ray Photoelectron Spectroscopy Investigations of the
Surface Reaction Layer and Its Effects on the Transformation Properties of Nanoscale
Ti51Ni38Cu11Shape Memory Thin Films.” Advanced Engineering Materials, 2014,
pp. 669–73, doi:10.1002/adem.201400317.
short: D. König, D. Naujoks, M.T. de los Arcos de Pedro, S. Grosse-Kreul, A. Ludwig,
Advanced Engineering Materials (2014) 669–673.
date_created: 2021-07-07T09:14:25Z
date_updated: 2023-01-24T08:20:08Z
department:
- _id: '302'
doi: 10.1002/adem.201400317
extern: '1'
language:
- iso: eng
page: 669-673
publication: Advanced Engineering Materials
publication_identifier:
issn:
- 1438-1656
publication_status: published
status: public
title: X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer
and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape
Memory Thin Films
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22585'
article_number: '054008'
author:
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Raphael
full_name: Schröder, Raphael
last_name: Schröder
- first_name: Yolanda Aranda
full_name: Gonzalvo, Yolanda Aranda
last_name: Gonzalvo
- first_name: Volker Schulz-von der
full_name: Gathen, Volker Schulz-von der
last_name: Gathen
- first_name: Jörg
full_name: Winter, Jörg
last_name: Winter
citation:
ama: de los Arcos de Pedro MT, Schröder R, Gonzalvo YA, Gathen VS der, Winter J.
Description of HiPIMS plasma regimes in terms of composition, spoke formation
and deposition rate. Plasma Sources Science and Technology. Published online
2014. doi:10.1088/0963-0252/23/5/054008
apa: de los Arcos de Pedro, M. T., Schröder, R., Gonzalvo, Y. A., Gathen, V. S.
der, & Winter, J. (2014). Description of HiPIMS plasma regimes in terms of
composition, spoke formation and deposition rate. Plasma Sources Science and
Technology, Article 054008. https://doi.org/10.1088/0963-0252/23/5/054008
bibtex: '@article{de los Arcos de Pedro_Schröder_Gonzalvo_Gathen_Winter_2014, title={Description
of HiPIMS plasma regimes in terms of composition, spoke formation and deposition
rate}, DOI={10.1088/0963-0252/23/5/054008},
number={054008}, journal={Plasma Sources Science and Technology}, author={de los
Arcos de Pedro, Maria Teresa and Schröder, Raphael and Gonzalvo, Yolanda Aranda
and Gathen, Volker Schulz-von der and Winter, Jörg}, year={2014} }'
chicago: Arcos de Pedro, Maria Teresa de los, Raphael Schröder, Yolanda Aranda Gonzalvo,
Volker Schulz-von der Gathen, and Jörg Winter. “Description of HiPIMS Plasma Regimes
in Terms of Composition, Spoke Formation and Deposition Rate.” Plasma Sources
Science and Technology, 2014. https://doi.org/10.1088/0963-0252/23/5/054008.
ieee: 'M. T. de los Arcos de Pedro, R. Schröder, Y. A. Gonzalvo, V. S. der Gathen,
and J. Winter, “Description of HiPIMS plasma regimes in terms of composition,
spoke formation and deposition rate,” Plasma Sources Science and Technology,
Art. no. 054008, 2014, doi: 10.1088/0963-0252/23/5/054008.'
mla: de los Arcos de Pedro, Maria Teresa, et al. “Description of HiPIMS Plasma Regimes
in Terms of Composition, Spoke Formation and Deposition Rate.” Plasma Sources
Science and Technology, 054008, 2014, doi:10.1088/0963-0252/23/5/054008.
short: M.T. de los Arcos de Pedro, R. Schröder, Y.A. Gonzalvo, V.S. der Gathen,
J. Winter, Plasma Sources Science and Technology (2014).
date_created: 2021-07-07T11:10:18Z
date_updated: 2023-01-24T08:20:25Z
department:
- _id: '302'
doi: 10.1088/0963-0252/23/5/054008
extern: '1'
language:
- iso: eng
publication: Plasma Sources Science and Technology
publication_identifier:
issn:
- 0963-0252
- 1361-6595
publication_status: published
status: public
title: Description of HiPIMS plasma regimes in terms of composition, spoke formation
and deposition rate
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22586'
author:
- first_name: Baran
full_name: Eren, Baran
last_name: Eren
- first_name: Laurent
full_name: Marot, Laurent
last_name: Marot
- first_name: Roland
full_name: Steiner, Roland
last_name: Steiner
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Marcel
full_name: Düggelin, Marcel
last_name: Düggelin
- first_name: Daniel
full_name: Mathys, Daniel
last_name: Mathys
- first_name: Kenneth N.
full_name: Goldie, Kenneth N.
last_name: Goldie
- first_name: Vesna
full_name: Olivieri, Vesna
last_name: Olivieri
- first_name: Ernst
full_name: Meyer, Ernst
last_name: Meyer
citation:
ama: 'Eren B, Marot L, Steiner R, et al. Carbon nanotube growth on AlN support:
Comparison between Ni and Fe chemical states and morphology. Chemical Physics
Letters. Published online 2014:82-87. doi:10.1016/j.cplett.2014.06.042'
apa: 'Eren, B., Marot, L., Steiner, R., de los Arcos de Pedro, M. T., Düggelin,
M., Mathys, D., Goldie, K. N., Olivieri, V., & Meyer, E. (2014). Carbon nanotube
growth on AlN support: Comparison between Ni and Fe chemical states and morphology.
Chemical Physics Letters, 82–87. https://doi.org/10.1016/j.cplett.2014.06.042'
bibtex: '@article{Eren_Marot_Steiner_de los Arcos de Pedro_Düggelin_Mathys_Goldie_Olivieri_Meyer_2014,
title={Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical
states and morphology}, DOI={10.1016/j.cplett.2014.06.042},
journal={Chemical Physics Letters}, author={Eren, Baran and Marot, Laurent and
Steiner, Roland and de los Arcos de Pedro, Maria Teresa and Düggelin, Marcel and
Mathys, Daniel and Goldie, Kenneth N. and Olivieri, Vesna and Meyer, Ernst}, year={2014},
pages={82–87} }'
chicago: 'Eren, Baran, Laurent Marot, Roland Steiner, Maria Teresa de los Arcos
de Pedro, Marcel Düggelin, Daniel Mathys, Kenneth N. Goldie, Vesna Olivieri, and
Ernst Meyer. “Carbon Nanotube Growth on AlN Support: Comparison between Ni and
Fe Chemical States and Morphology.” Chemical Physics Letters, 2014, 82–87.
https://doi.org/10.1016/j.cplett.2014.06.042.'
ieee: 'B. Eren et al., “Carbon nanotube growth on AlN support: Comparison
between Ni and Fe chemical states and morphology,” Chemical Physics Letters,
pp. 82–87, 2014, doi: 10.1016/j.cplett.2014.06.042.'
mla: 'Eren, Baran, et al. “Carbon Nanotube Growth on AlN Support: Comparison between
Ni and Fe Chemical States and Morphology.” Chemical Physics Letters, 2014,
pp. 82–87, doi:10.1016/j.cplett.2014.06.042.'
short: B. Eren, L. Marot, R. Steiner, M.T. de los Arcos de Pedro, M. Düggelin, D.
Mathys, K.N. Goldie, V. Olivieri, E. Meyer, Chemical Physics Letters (2014) 82–87.
date_created: 2021-07-07T11:10:35Z
date_updated: 2023-01-24T08:20:49Z
department:
- _id: '302'
doi: 10.1016/j.cplett.2014.06.042
extern: '1'
language:
- iso: eng
page: 82-87
publication: Chemical Physics Letters
publication_identifier:
issn:
- 0009-2614
publication_status: published
status: public
title: 'Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical
states and morphology'
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22587'
article_number: '065043'
author:
- first_name: P D
full_name: Machura, P D
last_name: Machura
- first_name: A
full_name: Hecimovic, A
last_name: Hecimovic
- first_name: S
full_name: Gallian, S
last_name: Gallian
- first_name: J
full_name: Winter, J
last_name: Winter
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
citation:
ama: Machura PD, Hecimovic A, Gallian S, Winter J, de los Arcos de Pedro MT. Simultaneous
characterization of static and induced magnetic fields in high power impulse magnetron
sputtering discharges. Plasma Sources Science and Technology. Published
online 2014. doi:10.1088/0963-0252/23/6/065043
apa: Machura, P. D., Hecimovic, A., Gallian, S., Winter, J., & de los Arcos
de Pedro, M. T. (2014). Simultaneous characterization of static and induced magnetic
fields in high power impulse magnetron sputtering discharges. Plasma Sources
Science and Technology, Article 065043. https://doi.org/10.1088/0963-0252/23/6/065043
bibtex: '@article{Machura_Hecimovic_Gallian_Winter_de los Arcos de Pedro_2014, title={Simultaneous
characterization of static and induced magnetic fields in high power impulse magnetron
sputtering discharges}, DOI={10.1088/0963-0252/23/6/065043},
number={065043}, journal={Plasma Sources Science and Technology}, author={Machura,
P D and Hecimovic, A and Gallian, S and Winter, J and de los Arcos de Pedro, Maria
Teresa}, year={2014} }'
chicago: Machura, P D, A Hecimovic, S Gallian, J Winter, and Maria Teresa de los
Arcos de Pedro. “Simultaneous Characterization of Static and Induced Magnetic
Fields in High Power Impulse Magnetron Sputtering Discharges.” Plasma Sources
Science and Technology, 2014. https://doi.org/10.1088/0963-0252/23/6/065043.
ieee: 'P. D. Machura, A. Hecimovic, S. Gallian, J. Winter, and M. T. de los Arcos
de Pedro, “Simultaneous characterization of static and induced magnetic fields
in high power impulse magnetron sputtering discharges,” Plasma Sources Science
and Technology, Art. no. 065043, 2014, doi: 10.1088/0963-0252/23/6/065043.'
mla: Machura, P. D., et al. “Simultaneous Characterization of Static and Induced
Magnetic Fields in High Power Impulse Magnetron Sputtering Discharges.” Plasma
Sources Science and Technology, 065043, 2014, doi:10.1088/0963-0252/23/6/065043.
short: P.D. Machura, A. Hecimovic, S. Gallian, J. Winter, M.T. de los Arcos de Pedro,
Plasma Sources Science and Technology (2014).
date_created: 2021-07-07T11:10:48Z
date_updated: 2023-01-24T08:21:04Z
department:
- _id: '302'
doi: 10.1088/0963-0252/23/6/065043
extern: '1'
language:
- iso: eng
publication: Plasma Sources Science and Technology
publication_identifier:
issn:
- 0963-0252
- 1361-6595
publication_status: published
status: public
title: Simultaneous characterization of static and induced magnetic fields in high
power impulse magnetron sputtering discharges
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22588'
article_number: '475204'
author:
- first_name: D
full_name: Marinov, D
last_name: Marinov
- first_name: O
full_name: Guaitella, O
last_name: Guaitella
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: A
full_name: von Keudell, A
last_name: von Keudell
- first_name: A
full_name: Rousseau, A
last_name: Rousseau
citation:
ama: 'Marinov D, Guaitella O, de los Arcos de Pedro MT, von Keudell A, Rousseau
A. Adsorption and reactivity of nitrogen atoms on silica surface under plasma
exposure. Journal of Physics D: Applied Physics. Published online 2014.
doi:10.1088/0022-3727/47/47/475204'
apa: 'Marinov, D., Guaitella, O., de los Arcos de Pedro, M. T., von Keudell, A.,
& Rousseau, A. (2014). Adsorption and reactivity of nitrogen atoms on silica
surface under plasma exposure. Journal of Physics D: Applied Physics, Article
475204. https://doi.org/10.1088/0022-3727/47/47/475204'
bibtex: '@article{Marinov_Guaitella_de los Arcos de Pedro_von Keudell_Rousseau_2014,
title={Adsorption and reactivity of nitrogen atoms on silica surface under plasma
exposure}, DOI={10.1088/0022-3727/47/47/475204},
number={475204}, journal={Journal of Physics D: Applied Physics}, author={Marinov,
D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A
and Rousseau, A}, year={2014} }'
chicago: 'Marinov, D, O Guaitella, Maria Teresa de los Arcos de Pedro, A von Keudell,
and A Rousseau. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface
under Plasma Exposure.” Journal of Physics D: Applied Physics, 2014. https://doi.org/10.1088/0022-3727/47/47/475204.'
ieee: 'D. Marinov, O. Guaitella, M. T. de los Arcos de Pedro, A. von Keudell, and
A. Rousseau, “Adsorption and reactivity of nitrogen atoms on silica surface under
plasma exposure,” Journal of Physics D: Applied Physics, Art. no. 475204,
2014, doi: 10.1088/0022-3727/47/47/475204.'
mla: 'Marinov, D., et al. “Adsorption and Reactivity of Nitrogen Atoms on Silica
Surface under Plasma Exposure.” Journal of Physics D: Applied Physics,
475204, 2014, doi:10.1088/0022-3727/47/47/475204.'
short: 'D. Marinov, O. Guaitella, M.T. de los Arcos de Pedro, A. von Keudell, A.
Rousseau, Journal of Physics D: Applied Physics (2014).'
date_created: 2021-07-07T11:11:00Z
date_updated: 2023-01-24T08:21:18Z
department:
- _id: '302'
doi: 10.1088/0022-3727/47/47/475204
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
issn:
- 0022-3727
- 1361-6463
publication_status: published
status: public
title: Adsorption and reactivity of nitrogen atoms on silica surface under plasma
exposure
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22590'
author:
- first_name: Ke
full_name: Xu, Ke
last_name: Xu
- first_name: Van-Son
full_name: Dang, Van-Son
last_name: Dang
- first_name: Andreas
full_name: Ney, Andreas
last_name: Ney
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: Xu K, Dang V-S, Ney A, de los Arcos de Pedro MT, Devi A. Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB>
Thin Films Grown by Metalorganic Chemical Vapour Deposition. Journal of Nanoscience
and Nanotechnology. Published online 2014:5095-5102. doi:10.1166/jnn.2014.8848
apa: Xu, K., Dang, V.-S., Ney, A., de los Arcos de Pedro, M. T., & Devi, A.
(2014). Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB>
Thin Films Grown by Metalorganic Chemical Vapour Deposition. Journal of Nanoscience
and Nanotechnology, 5095–5102. https://doi.org/10.1166/jnn.2014.8848
bibtex: '@article{Xu_Dang_Ney_de los Arcos de Pedro_Devi_2014, title={Nanostructured
Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by
Metalorganic Chemical Vapour Deposition}, DOI={10.1166/jnn.2014.8848},
journal={Journal of Nanoscience and Nanotechnology}, author={Xu, Ke and Dang,
Van-Son and Ney, Andreas and de los Arcos de Pedro, Maria Teresa and Devi, Anjana},
year={2014}, pages={5095–5102} }'
chicago: Xu, Ke, Van-Son Dang, Andreas Ney, Maria Teresa de los Arcos de Pedro,
and Anjana Devi. “Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB>
Thin Films Grown by Metalorganic Chemical Vapour Deposition.” Journal of Nanoscience
and Nanotechnology, 2014, 5095–5102. https://doi.org/10.1166/jnn.2014.8848.
ieee: 'K. Xu, V.-S. Dang, A. Ney, M. T. de los Arcos de Pedro, and A. Devi, “Nanostructured
Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by
Metalorganic Chemical Vapour Deposition,” Journal of Nanoscience and Nanotechnology,
pp. 5095–5102, 2014, doi: 10.1166/jnn.2014.8848.'
mla: Xu, Ke, et al. “Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB>
Thin Films Grown by Metalorganic Chemical Vapour Deposition.” Journal of Nanoscience
and Nanotechnology, 2014, pp. 5095–102, doi:10.1166/jnn.2014.8848.
short: K. Xu, V.-S. Dang, A. Ney, M.T. de los Arcos de Pedro, A. Devi, Journal of
Nanoscience and Nanotechnology (2014) 5095–5102.
date_created: 2021-07-07T11:11:37Z
date_updated: 2023-01-24T08:21:36Z
department:
- _id: '302'
doi: 10.1166/jnn.2014.8848
extern: '1'
language:
- iso: eng
page: 5095-5102
publication: Journal of Nanoscience and Nanotechnology
publication_identifier:
issn:
- 1533-4880
- 1533-4899
publication_status: published
status: public
title: Nanostructured Er2O3 Thin Films Grown by Metalorganic
Chemical Vapour Deposition
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '20945'
abstract:
- lang: eng
text: Calcium-Silicate-Hydrates (C-S-H) are the main binding phases in most concrete
which is the primarily used composite construction material in the world. However,
a big lack is cleaving between the actual knowledge about C-S-H, compared to what
could be reached using state-of-the-art technologies of modern research. In this
article, the formation of a C-S-H phase on a native oxide covered silicon wafer
is investigated by means of in-situ attenuated total reflection infrared (ATR-IR)
and ex-situ surface-enhanced Raman spectroscopy (SERS). The total thickness of
the C-S-H phase is determined by X-ray photoelectron spectroscopy (XPS) to be
3 nm. The formation appears to be reversible depending on the environment pH value
and can be performed at room temperature. Based on density functional theory (DFT)
calculations, it is shown that the C-S-H phase in the presence of water will change
its chemical composition in order to reach the thermodynamic ground state of the
system. This change is achieved by a metal-proton exchange reaction. The stoichiometry
of these metal-proton exchange reactions is nearly independent of the environment
pH value. Electrokinetic measurements yield isoelectric points of 2.0 and 2.6
for the native oxide covered silicon wafer (SiO2) and the C-S-H phase. This is
consistent with a predominance of Si-O sites at the C-S-H/water interface. (C)
2013 Elsevier B. V. All rights reserved.
author:
- first_name: Christoph
full_name: Ebbert, Christoph
id: '7266'
last_name: Ebbert
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Nadine
full_name: Buitkamp, Nadine
id: '1449'
last_name: Buitkamp
- first_name: Alexander
full_name: Kroeger, Alexander
last_name: Kroeger
- first_name: Florian
full_name: Messerschmidt, Florian
last_name: Messerschmidt
- first_name: Peter
full_name: Thissen, Peter
last_name: Thissen
citation:
ama: Ebbert C, Grundmeier G, Buitkamp N, Kroeger A, Messerschmidt F, Thissen P.
Toward a microscopic understanding of the calcium-silicate-hydrates/water interface.
APPLIED SURFACE SCIENCE. 2014;290:207-214. doi:10.1016/j.apsusc.2013.11.045
apa: Ebbert, C., Grundmeier, G., Buitkamp, N., Kroeger, A., Messerschmidt, F., &
Thissen, P. (2014). Toward a microscopic understanding of the calcium-silicate-hydrates/water
interface. APPLIED SURFACE SCIENCE, 290, 207–214. https://doi.org/10.1016/j.apsusc.2013.11.045
bibtex: '@article{Ebbert_Grundmeier_Buitkamp_Kroeger_Messerschmidt_Thissen_2014,
title={Toward a microscopic understanding of the calcium-silicate-hydrates/water
interface}, volume={290}, DOI={10.1016/j.apsusc.2013.11.045},
journal={APPLIED SURFACE SCIENCE}, author={Ebbert, Christoph and Grundmeier, Guido
and Buitkamp, Nadine and Kroeger, Alexander and Messerschmidt, Florian and Thissen,
Peter}, year={2014}, pages={207–214} }'
chicago: 'Ebbert, Christoph, Guido Grundmeier, Nadine Buitkamp, Alexander Kroeger,
Florian Messerschmidt, and Peter Thissen. “Toward a Microscopic Understanding
of the Calcium-Silicate-Hydrates/Water Interface.” APPLIED SURFACE SCIENCE
290 (2014): 207–14. https://doi.org/10.1016/j.apsusc.2013.11.045.'
ieee: 'C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, and
P. Thissen, “Toward a microscopic understanding of the calcium-silicate-hydrates/water
interface,” APPLIED SURFACE SCIENCE, vol. 290, pp. 207–214, 2014, doi:
10.1016/j.apsusc.2013.11.045.'
mla: Ebbert, Christoph, et al. “Toward a Microscopic Understanding of the Calcium-Silicate-Hydrates/Water
Interface.” APPLIED SURFACE SCIENCE, vol. 290, 2014, pp. 207–14, doi:10.1016/j.apsusc.2013.11.045.
short: C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, P. Thissen,
APPLIED SURFACE SCIENCE 290 (2014) 207–214.
date_created: 2021-01-13T10:12:51Z
date_updated: 2025-11-18T12:05:39Z
department:
- _id: '35'
- _id: '302'
- _id: '321'
doi: 10.1016/j.apsusc.2013.11.045
external_id:
isi:
- '000329060100032'
intvolume: ' 290'
isi: '1'
language:
- iso: eng
page: 207-214
publication: APPLIED SURFACE SCIENCE
publication_identifier:
eissn:
- 1873-5584
issn:
- 0169-4332
publication_status: published
quality_controlled: '1'
status: public
title: Toward a microscopic understanding of the calcium-silicate-hydrates/water interface
type: journal_article
user_id: '7266'
volume: 290
year: '2014'
...
---
_id: '20946'
abstract:
- lang: eng
text: In the current work, we study the silver ion release potential and the water
uptake through a SiOxCyHz-polymer which is grown from the precursor hexamethyldisiloxane
(HMDSO) in radiofrequency (RF) plasma. These layers were deposited on top of two
dimensional (2D) ensembles of silver nanoparticles (AgNPs) with nominal thickness
of 2 nm on a 20 nm RF-sputtered polytetrafluoroethylene (PTFE) thin film. The
composition of the plasma-polymerized HMDSO barriers was varied by changing the
oxygen flow during the polymerization process and their thickness was varied as
well. Morphology and optical properties of the nanocomposites were investigated
using transmission electron microscopy (TEM) and UV-Visible spectroscopy (UV-Vis),
respectively. The concentration of the silver ions released from the nanocomposites
after immersion in water for several time intervals was measured using inductively
coupled plasma mass spectrometry (ICP-MS). Contact angle analysis and electrochemical
impedance spectroscopy (EIS) measurements were also performed and results show
a strong dependence of the coatings properties and their water uptake on the oxygen
content in the coating films and their thickness. Plasma polymerization with increasing
the oxygen flow leads to the formation of more hydrophilic thin films with a higher
Ag ion release potential. Increasing the thickness of the coatings reduced the
amount of the released ions and the rate of the release process was slowed down.
This indicates that by tailoring the structure and the thickness of the plasma-polymerized
coating films, one can tune the silver ion release properties of Ag/polymer nanocomposites.
article_number: '2080'
author:
- first_name: N.
full_name: Alissawi, N.
last_name: Alissawi
- first_name: T.
full_name: Peter, T.
last_name: Peter
- first_name: T.
full_name: Strunskus, T.
last_name: Strunskus
- first_name: Christoph
full_name: Ebbert, Christoph
id: '7266'
last_name: Ebbert
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: F.
full_name: Faupel, F.
last_name: Faupel
citation:
ama: Alissawi N, Peter T, Strunskus T, Ebbert C, Grundmeier G, Faupel F. Plasma-polymerized
HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites.
JOURNAL OF NANOPARTICLE RESEARCH. 2013;15(11). doi:10.1007/s11051-013-2080-9
apa: Alissawi, N., Peter, T., Strunskus, T., Ebbert, C., Grundmeier, G., & Faupel,
F. (2013). Plasma-polymerized HMDSO coatings to adjust the silver ion release
properties of Ag/polymer nanocomposites. JOURNAL OF NANOPARTICLE RESEARCH,
15(11). https://doi.org/10.1007/s11051-013-2080-9
bibtex: '@article{Alissawi_Peter_Strunskus_Ebbert_Grundmeier_Faupel_2013, title={Plasma-polymerized
HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites},
volume={15}, DOI={10.1007/s11051-013-2080-9},
number={112080}, journal={JOURNAL OF NANOPARTICLE RESEARCH}, author={Alissawi,
N. and Peter, T. and Strunskus, T. and Ebbert, Christoph and Grundmeier, Guido
and Faupel, F.}, year={2013} }'
chicago: Alissawi, N., T. Peter, T. Strunskus, Christoph Ebbert, Guido Grundmeier,
and F. Faupel. “Plasma-Polymerized HMDSO Coatings to Adjust the Silver Ion Release
Properties of Ag/Polymer Nanocomposites.” JOURNAL OF NANOPARTICLE RESEARCH
15, no. 11 (2013). https://doi.org/10.1007/s11051-013-2080-9.
ieee: N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, and F. Faupel,
“Plasma-polymerized HMDSO coatings to adjust the silver ion release properties
of Ag/polymer nanocomposites,” JOURNAL OF NANOPARTICLE RESEARCH, vol. 15,
no. 11, 2013.
mla: Alissawi, N., et al. “Plasma-Polymerized HMDSO Coatings to Adjust the Silver
Ion Release Properties of Ag/Polymer Nanocomposites.” JOURNAL OF NANOPARTICLE
RESEARCH, vol. 15, no. 11, 2080, 2013, doi:10.1007/s11051-013-2080-9.
short: N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, F. Faupel,
JOURNAL OF NANOPARTICLE RESEARCH 15 (2013).
date_created: 2021-01-13T10:12:52Z
date_updated: 2022-01-06T06:54:41Z
department:
- _id: '35'
- _id: '302'
- _id: '321'
doi: 10.1007/s11051-013-2080-9
external_id:
isi:
- '000326054400001'
intvolume: ' 15'
isi: '1'
issue: '11'
language:
- iso: eng
publication: JOURNAL OF NANOPARTICLE RESEARCH
publication_identifier:
eissn:
- 1572-896X
issn:
- 1388-0764
publication_status: published
quality_controlled: '1'
status: public
title: Plasma-polymerized HMDSO coatings to adjust the silver ion release properties
of Ag/polymer nanocomposites
type: journal_article
user_id: '7266'
volume: 15
year: '2013'
...
---
_id: '23641'
author:
- first_name: Zhenxing
full_name: Wang, Zhenxing
last_name: Wang
- first_name: Saeideh
full_name: Mohammadzadeh, Saeideh
last_name: Mohammadzadeh
- first_name: Thomas
full_name: Schmaltz, Thomas
last_name: Schmaltz
- first_name: Johannes
full_name: Kirschner, Johannes
last_name: Kirschner
- first_name: Artoem
full_name: Khassanov, Artoem
last_name: Khassanov
- first_name: Siegfried
full_name: Eigler, Siegfried
last_name: Eigler
- first_name: Udo
full_name: Mundloch, Udo
last_name: Mundloch
- first_name: Claudia
full_name: Backes, Claudia
last_name: Backes
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
id: '84268'
last_name: Steinrück
orcid: 0000-0001-6373-0877
- first_name: Andreas
full_name: Magerl, Andreas
last_name: Magerl
- first_name: Frank
full_name: Hauke, Frank
last_name: Hauke
- first_name: Andreas
full_name: Hirsch, Andreas
last_name: Hirsch
- first_name: Marcus
full_name: Halik, Marcus
last_name: Halik
citation:
ama: Wang Z, Mohammadzadeh S, Schmaltz T, et al. Region-Selective Self-Assembly
of Functionalized Carbon Allotropes from Solution. ACS Nano. 2013;7:11427-11434.
doi:10.1021/nn405488n
apa: Wang, Z., Mohammadzadeh, S., Schmaltz, T., Kirschner, J., Khassanov, A., Eigler,
S., Mundloch, U., Backes, C., Steinrück, H.-G., Magerl, A., Hauke, F., Hirsch,
A., & Halik, M. (2013). Region-Selective Self-Assembly of Functionalized Carbon
Allotropes from Solution. ACS Nano, 7, 11427–11434. https://doi.org/10.1021/nn405488n
bibtex: '@article{Wang_Mohammadzadeh_Schmaltz_Kirschner_Khassanov_Eigler_Mundloch_Backes_Steinrück_Magerl_et
al._2013, title={Region-Selective Self-Assembly of Functionalized Carbon Allotropes
from Solution}, volume={7}, DOI={10.1021/nn405488n},
journal={ACS Nano}, author={Wang, Zhenxing and Mohammadzadeh, Saeideh and Schmaltz,
Thomas and Kirschner, Johannes and Khassanov, Artoem and Eigler, Siegfried and
Mundloch, Udo and Backes, Claudia and Steinrück, Hans-Georg and Magerl, Andreas
and et al.}, year={2013}, pages={11427–11434} }'
chicago: 'Wang, Zhenxing, Saeideh Mohammadzadeh, Thomas Schmaltz, Johannes Kirschner,
Artoem Khassanov, Siegfried Eigler, Udo Mundloch, et al. “Region-Selective Self-Assembly
of Functionalized Carbon Allotropes from Solution.” ACS Nano 7 (2013):
11427–34. https://doi.org/10.1021/nn405488n.'
ieee: 'Z. Wang et al., “Region-Selective Self-Assembly of Functionalized
Carbon Allotropes from Solution,” ACS Nano, vol. 7, pp. 11427–11434, 2013,
doi: 10.1021/nn405488n.'
mla: Wang, Zhenxing, et al. “Region-Selective Self-Assembly of Functionalized Carbon
Allotropes from Solution.” ACS Nano, vol. 7, 2013, pp. 11427–34, doi:10.1021/nn405488n.
short: Z. Wang, S. Mohammadzadeh, T. Schmaltz, J. Kirschner, A. Khassanov, S. Eigler,
U. Mundloch, C. Backes, H.-G. Steinrück, A. Magerl, F. Hauke, A. Hirsch, M. Halik,
ACS Nano 7 (2013) 11427–11434.
date_created: 2021-09-01T09:49:14Z
date_updated: 2022-01-06T06:55:57Z
department:
- _id: '633'
doi: 10.1021/nn405488n
intvolume: ' 7'
language:
- iso: eng
page: 11427-11434
publication: ACS Nano
publication_identifier:
issn:
- 1936-0851
- 1936-086X
publication_status: published
status: public
title: Region-Selective Self-Assembly of Functionalized Carbon Allotropes from Solution
type: journal_article
user_id: '84268'
volume: 7
year: '2013'
...
---
_id: '23642'
author:
- first_name: Thomas
full_name: Schmaltz, Thomas
last_name: Schmaltz
- first_name: Atefeh Y.
full_name: Amin, Atefeh Y.
last_name: Amin
- first_name: Artoem
full_name: Khassanov, Artoem
last_name: Khassanov
- first_name: Timo
full_name: Meyer-Friedrichsen, Timo
last_name: Meyer-Friedrichsen
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
id: '84268'
last_name: Steinrück
orcid: 0000-0001-6373-0877
- first_name: Andreas
full_name: Magerl, Andreas
last_name: Magerl
- first_name: Juan José
full_name: Segura, Juan José
last_name: Segura
- first_name: Kislon
full_name: Voitchovsky, Kislon
last_name: Voitchovsky
- first_name: Francesco
full_name: Stellacci, Francesco
last_name: Stellacci
- first_name: Marcus
full_name: Halik, Marcus
last_name: Halik
citation:
ama: Schmaltz T, Amin AY, Khassanov A, et al. Low-Voltage Self-Assembled Monolayer
Field-Effect Transistors on Flexible Substrates. Advanced Materials. 2013;25:4511-4514.
doi:10.1002/adma.201301176
apa: Schmaltz, T., Amin, A. Y., Khassanov, A., Meyer-Friedrichsen, T., Steinrück,
H.-G., Magerl, A., Segura, J. J., Voitchovsky, K., Stellacci, F., & Halik,
M. (2013). Low-Voltage Self-Assembled Monolayer Field-Effect Transistors on Flexible
Substrates. Advanced Materials, 25, 4511–4514. https://doi.org/10.1002/adma.201301176
bibtex: '@article{Schmaltz_Amin_Khassanov_Meyer-Friedrichsen_Steinrück_Magerl_Segura_Voitchovsky_Stellacci_Halik_2013,
title={Low-Voltage Self-Assembled Monolayer Field-Effect Transistors on Flexible
Substrates}, volume={25}, DOI={10.1002/adma.201301176},
journal={Advanced Materials}, author={Schmaltz, Thomas and Amin, Atefeh Y. and
Khassanov, Artoem and Meyer-Friedrichsen, Timo and Steinrück, Hans-Georg and Magerl,
Andreas and Segura, Juan José and Voitchovsky, Kislon and Stellacci, Francesco
and Halik, Marcus}, year={2013}, pages={4511–4514} }'
chicago: 'Schmaltz, Thomas, Atefeh Y. Amin, Artoem Khassanov, Timo Meyer-Friedrichsen,
Hans-Georg Steinrück, Andreas Magerl, Juan José Segura, Kislon Voitchovsky, Francesco
Stellacci, and Marcus Halik. “Low-Voltage Self-Assembled Monolayer Field-Effect
Transistors on Flexible Substrates.” Advanced Materials 25 (2013): 4511–14.
https://doi.org/10.1002/adma.201301176.'
ieee: 'T. Schmaltz et al., “Low-Voltage Self-Assembled Monolayer Field-Effect
Transistors on Flexible Substrates,” Advanced Materials, vol. 25, pp. 4511–4514,
2013, doi: 10.1002/adma.201301176.'
mla: Schmaltz, Thomas, et al. “Low-Voltage Self-Assembled Monolayer Field-Effect
Transistors on Flexible Substrates.” Advanced Materials, vol. 25, 2013,
pp. 4511–14, doi:10.1002/adma.201301176.
short: T. Schmaltz, A.Y. Amin, A. Khassanov, T. Meyer-Friedrichsen, H.-G. Steinrück,
A. Magerl, J.J. Segura, K. Voitchovsky, F. Stellacci, M. Halik, Advanced Materials
25 (2013) 4511–4514.
date_created: 2021-09-01T09:49:22Z
date_updated: 2022-01-06T06:55:57Z
department:
- _id: '633'
doi: 10.1002/adma.201301176
intvolume: ' 25'
language:
- iso: eng
page: 4511-4514
publication: Advanced Materials
publication_identifier:
issn:
- 0935-9648
publication_status: published
status: public
title: Low-Voltage Self-Assembled Monolayer Field-Effect Transistors on Flexible Substrates
type: journal_article
user_id: '84268'
volume: 25
year: '2013'
...
---
_id: '23643'
author:
- first_name: J.
full_name: Will, J.
last_name: Will
- first_name: A.
full_name: Gröschel, A.
last_name: Gröschel
- first_name: D.
full_name: Kot, D.
last_name: Kot
- first_name: M. A.
full_name: Schubert, M. A.
last_name: Schubert
- first_name: C.
full_name: Bergmann, C.
last_name: Bergmann
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
id: '84268'
last_name: Steinrück
orcid: 0000-0001-6373-0877
- first_name: G.
full_name: Kissinger, G.
last_name: Kissinger
- first_name: A.
full_name: Magerl, A.
last_name: Magerl
citation:
ama: Will J, Gröschel A, Kot D, et al. Oxygen diffusivity in silicon derived from
dynamical X-ray diffraction. Journal of Applied Physics. 2013;7:073508.
doi:10.1063/1.4792747
apa: Will, J., Gröschel, A., Kot, D., Schubert, M. A., Bergmann, C., Steinrück,
H.-G., Kissinger, G., & Magerl, A. (2013). Oxygen diffusivity in silicon derived
from dynamical X-ray diffraction. Journal of Applied Physics, 7,
073508. https://doi.org/10.1063/1.4792747
bibtex: '@article{Will_Gröschel_Kot_Schubert_Bergmann_Steinrück_Kissinger_Magerl_2013,
title={Oxygen diffusivity in silicon derived from dynamical X-ray diffraction},
volume={7}, DOI={10.1063/1.4792747},
journal={Journal of Applied Physics}, author={Will, J. and Gröschel, A. and Kot,
D. and Schubert, M. A. and Bergmann, C. and Steinrück, Hans-Georg and Kissinger,
G. and Magerl, A.}, year={2013}, pages={073508} }'
chicago: 'Will, J., A. Gröschel, D. Kot, M. A. Schubert, C. Bergmann, Hans-Georg
Steinrück, G. Kissinger, and A. Magerl. “Oxygen Diffusivity in Silicon Derived
from Dynamical X-Ray Diffraction.” Journal of Applied Physics 7 (2013):
073508. https://doi.org/10.1063/1.4792747.'
ieee: 'J. Will et al., “Oxygen diffusivity in silicon derived from dynamical
X-ray diffraction,” Journal of Applied Physics, vol. 7, p. 073508, 2013,
doi: 10.1063/1.4792747.'
mla: Will, J., et al. “Oxygen Diffusivity in Silicon Derived from Dynamical X-Ray
Diffraction.” Journal of Applied Physics, vol. 7, 2013, p. 073508, doi:10.1063/1.4792747.
short: J. Will, A. Gröschel, D. Kot, M.A. Schubert, C. Bergmann, H.-G. Steinrück,
G. Kissinger, A. Magerl, Journal of Applied Physics 7 (2013) 073508.
date_created: 2021-09-01T09:49:28Z
date_updated: 2022-01-06T06:55:57Z
department:
- _id: '633'
doi: 10.1063/1.4792747
intvolume: ' 7'
language:
- iso: eng
page: '073508'
publication: Journal of Applied Physics
publication_identifier:
issn:
- 0021-8979
- 1089-7550
publication_status: published
status: public
title: Oxygen diffusivity in silicon derived from dynamical X-ray diffraction
type: journal_article
user_id: '84268'
volume: 7
year: '2013'
...
---
_id: '22584'
author:
- first_name: Van-Son
full_name: Dang, Van-Son
last_name: Dang
- first_name: Harish
full_name: Parala, Harish
last_name: Parala
- first_name: Jin Hyun
full_name: Kim, Jin Hyun
last_name: Kim
- first_name: Ke
full_name: Xu, Ke
last_name: Xu
- first_name: Nagendra B.
full_name: Srinivasan, Nagendra B.
last_name: Srinivasan
- first_name: Eugen
full_name: Edengeiser, Eugen
last_name: Edengeiser
- first_name: Martina
full_name: Havenith, Martina
last_name: Havenith
- first_name: Andreas D.
full_name: Wieck, Andreas D.
last_name: Wieck
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Roland. A.
full_name: Fischer, Roland. A.
last_name: Fischer
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: Dang V-S, Parala H, Kim JH, et al. Electrical and optical properties of TiO2thin
films prepared by plasma-enhanced atomic layer deposition. physica status solidi
(a). Published online 2013:416-424. doi:10.1002/pssa.201330115
apa: Dang, V.-S., Parala, H., Kim, J. H., Xu, K., Srinivasan, N. B., Edengeiser,
E., Havenith, M., Wieck, A. D., de los Arcos de Pedro, M. T., Fischer, Roland.
A., & Devi, A. (2013). Electrical and optical properties of TiO2thin films
prepared by plasma-enhanced atomic layer deposition. Physica Status Solidi
(a), 416–424. https://doi.org/10.1002/pssa.201330115
bibtex: '@article{Dang_Parala_Kim_Xu_Srinivasan_Edengeiser_Havenith_Wieck_de los
Arcos de Pedro_Fischer_et al._2013, title={Electrical and optical properties of
TiO2thin films prepared by plasma-enhanced atomic layer deposition}, DOI={10.1002/pssa.201330115},
journal={physica status solidi (a)}, author={Dang, Van-Son and Parala, Harish
and Kim, Jin Hyun and Xu, Ke and Srinivasan, Nagendra B. and Edengeiser, Eugen
and Havenith, Martina and Wieck, Andreas D. and de los Arcos de Pedro, Maria Teresa
and Fischer, Roland. A. and et al.}, year={2013}, pages={416–424} }'
chicago: Dang, Van-Son, Harish Parala, Jin Hyun Kim, Ke Xu, Nagendra B. Srinivasan,
Eugen Edengeiser, Martina Havenith, et al. “Electrical and Optical Properties
of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” Physica
Status Solidi (a), 2013, 416–24. https://doi.org/10.1002/pssa.201330115.
ieee: 'V.-S. Dang et al., “Electrical and optical properties of TiO2thin
films prepared by plasma-enhanced atomic layer deposition,” physica status
solidi (a), pp. 416–424, 2013, doi: 10.1002/pssa.201330115.'
mla: Dang, Van-Son, et al. “Electrical and Optical Properties of TiO2thin Films
Prepared by Plasma-Enhanced Atomic Layer Deposition.” Physica Status Solidi
(a), 2013, pp. 416–24, doi:10.1002/pssa.201330115.
short: V.-S. Dang, H. Parala, J.H. Kim, K. Xu, N.B. Srinivasan, E. Edengeiser, M.
Havenith, A.D. Wieck, M.T. de los Arcos de Pedro, Roland.A. Fischer, A. Devi,
Physica Status Solidi (a) (2013) 416–424.
date_created: 2021-07-07T11:09:32Z
date_updated: 2023-01-24T08:21:54Z
department:
- _id: '302'
doi: 10.1002/pssa.201330115
extern: '1'
language:
- iso: eng
page: 416-424
publication: physica status solidi (a)
publication_identifier:
issn:
- 1862-6300
publication_status: published
status: public
title: Electrical and optical properties of TiO2thin films prepared by plasma-enhanced
atomic layer deposition
type: journal_article
user_id: '54556'
year: '2013'
...