[{"user_id":"71051","department":[{"_id":"304"}],"project":[{"name":"Computing Resources Provided by the Paderborn Center for Parallel Computing","_id":"52"}],"_id":"13209","language":[{"iso":"eng"}],"type":"journal_article","publication":"J. Phys. Chem. C","status":"public","abstract":[{"lang":"eng","text":"We performed ab initio calculations to study oxygen and hydrogen point defects in the CuInSe2 (CISe) solar-cell material. We found that H interstitial defects (when one H atom is surrounded by four Se atoms) and HCu (when a H atom is replacing a Cu atom) are the most stable defects. Whereas these H substitutional defects remain neutral, H interstitial defects act as donor defects and are detrimental to the cell performance. The incorporation of H2 into the CISe lattice, on the other hand, is harmless to the p-type conductivity. Oxygen atoms tend to either substitute Se atoms in the CISe lattice or form interstitial defects, though the formation of substitutional defects is more favorable. All oxygen point defects have high formation energies, which results in a low concentration of these defects in CISe. However, the presence of oxygen in the system leads to the formation of secondary phases such as In2O3 and InCuO2. In addition to the point defects, we studied the adsorption of H2O molecules on a defect-free surface and a surface with a (2VCu + InCu) defect using the ab initio thermodynamics technique. Our results indicate that the dissociative water adsorption on the CISe surface is energetically unfavorable. Furthermore, in order to obtain a water-free surface, the surface with defects has to be calcined at a higher temperature compared to the defect-free surface."}],"author":[{"first_name":"Sudhir","last_name":"Sahoo","full_name":"Sahoo, Sudhir"},{"first_name":"Ramya","id":"71692","full_name":"Kormath Madam Raghupathy, Ramya","orcid":"https://orcid.org/0000-0003-4667-9744","last_name":"Kormath Madam Raghupathy"},{"first_name":"Thomas","id":"49079","full_name":"Kühne, Thomas","last_name":"Kühne"},{"last_name":"Mirhosseini","orcid":"https://orcid.org/0000-0001-6179-1545","full_name":"Mirhosseini, Hossein","id":"71051","first_name":"Hossein"}],"date_created":"2019-09-13T12:53:01Z","volume":122,"date_updated":"2022-07-21T09:43:25Z","doi":"10.1021/acs.jpcc.8b06709","title":"Theoretical Investigation of Interaction of CuInSe2 Absorber Material with Oxygen, Hydrogen, and Water","issue":"37","publication_status":"published","citation":{"ama":"Sahoo S, Kormath Madam Raghupathy R, Kühne T, Mirhosseini H. Theoretical Investigation of Interaction of CuInSe2 Absorber Material with Oxygen, Hydrogen, and Water. <i>J Phys Chem C</i>. 2018;122(37):21202-21209. doi:<a href=\"https://doi.org/10.1021/acs.jpcc.8b06709\">10.1021/acs.jpcc.8b06709</a>","ieee":"S. Sahoo, R. Kormath Madam Raghupathy, T. Kühne, and H. Mirhosseini, “Theoretical Investigation of Interaction of CuInSe2 Absorber Material with Oxygen, Hydrogen, and Water,” <i>J. Phys. Chem. C</i>, vol. 122, no. 37, pp. 21202–21209, 2018, doi: <a href=\"https://doi.org/10.1021/acs.jpcc.8b06709\">10.1021/acs.jpcc.8b06709</a>.","chicago":"Sahoo, Sudhir, Ramya Kormath Madam Raghupathy, Thomas Kühne, and Hossein Mirhosseini. “Theoretical Investigation of Interaction of CuInSe2 Absorber Material with Oxygen, Hydrogen, and Water.” <i>J. Phys. Chem. C</i> 122, no. 37 (2018): 21202–9. <a href=\"https://doi.org/10.1021/acs.jpcc.8b06709\">https://doi.org/10.1021/acs.jpcc.8b06709</a>.","bibtex":"@article{Sahoo_Kormath Madam Raghupathy_Kühne_Mirhosseini_2018, title={Theoretical Investigation of Interaction of CuInSe2 Absorber Material with Oxygen, Hydrogen, and Water}, volume={122}, DOI={<a href=\"https://doi.org/10.1021/acs.jpcc.8b06709\">10.1021/acs.jpcc.8b06709</a>}, number={37}, journal={J. Phys. Chem. C}, author={Sahoo, Sudhir and Kormath Madam Raghupathy, Ramya and Kühne, Thomas and Mirhosseini, Hossein}, year={2018}, pages={21202–21209} }","short":"S. Sahoo, R. Kormath Madam Raghupathy, T. Kühne, H. Mirhosseini, J. Phys. Chem. C 122 (2018) 21202–21209.","mla":"Sahoo, Sudhir, et al. “Theoretical Investigation of Interaction of CuInSe2 Absorber Material with Oxygen, Hydrogen, and Water.” <i>J. Phys. Chem. C</i>, vol. 122, no. 37, 2018, pp. 21202–09, doi:<a href=\"https://doi.org/10.1021/acs.jpcc.8b06709\">10.1021/acs.jpcc.8b06709</a>.","apa":"Sahoo, S., Kormath Madam Raghupathy, R., Kühne, T., &#38; Mirhosseini, H. (2018). Theoretical Investigation of Interaction of CuInSe2 Absorber Material with Oxygen, Hydrogen, and Water. <i>J. Phys. Chem. C</i>, <i>122</i>(37), 21202–21209. <a href=\"https://doi.org/10.1021/acs.jpcc.8b06709\">https://doi.org/10.1021/acs.jpcc.8b06709</a>"},"page":"21202-21209","intvolume":"       122","year":"2018"},{"title":"Database screening of ternary chalcogenides for p-type transparent conductors","doi":"10.1021/acs.chemmater.8b02719","date_updated":"2022-07-21T09:42:32Z","publisher":"American Chemical Society","volume":30,"date_created":"2019-09-13T12:53:02Z","author":[{"last_name":"Kormath Madam Raghupathy","orcid":"https://orcid.org/0000-0003-4667-9744","full_name":"Kormath Madam Raghupathy, Ramya","id":"71692","first_name":"Ramya"},{"first_name":"Hendrik","full_name":"Wiebeler, Hendrik","last_name":"Wiebeler"},{"first_name":"Thomas","id":"49079","full_name":"Kühne, Thomas","last_name":"Kühne"},{"full_name":"Felser, Claudia","last_name":"Felser","first_name":"Claudia"},{"first_name":"Hossein","last_name":"Mirhosseini","orcid":"https://orcid.org/0000-0001-6179-1545","id":"71051","full_name":"Mirhosseini, Hossein"}],"year":"2018","page":"6794-6800","intvolume":"        30","citation":{"ieee":"R. Kormath Madam Raghupathy, H. Wiebeler, T. Kühne, C. Felser, and H. Mirhosseini, “Database screening of ternary chalcogenides for p-type transparent conductors,” <i>Chemistry of Materials</i>, vol. 30, no. 19, pp. 6794–6800, 2018, doi: <a href=\"https://doi.org/10.1021/acs.chemmater.8b02719\">10.1021/acs.chemmater.8b02719</a>.","chicago":"Kormath Madam Raghupathy, Ramya, Hendrik Wiebeler, Thomas Kühne, Claudia Felser, and Hossein Mirhosseini. “Database Screening of Ternary Chalcogenides for P-Type Transparent Conductors.” <i>Chemistry of Materials</i> 30, no. 19 (2018): 6794–6800. <a href=\"https://doi.org/10.1021/acs.chemmater.8b02719\">https://doi.org/10.1021/acs.chemmater.8b02719</a>.","ama":"Kormath Madam Raghupathy R, Wiebeler H, Kühne T, Felser C, Mirhosseini H. Database screening of ternary chalcogenides for p-type transparent conductors. <i>Chemistry of Materials</i>. 2018;30(19):6794-6800. doi:<a href=\"https://doi.org/10.1021/acs.chemmater.8b02719\">10.1021/acs.chemmater.8b02719</a>","apa":"Kormath Madam Raghupathy, R., Wiebeler, H., Kühne, T., Felser, C., &#38; Mirhosseini, H. (2018). Database screening of ternary chalcogenides for p-type transparent conductors. <i>Chemistry of Materials</i>, <i>30</i>(19), 6794–6800. <a href=\"https://doi.org/10.1021/acs.chemmater.8b02719\">https://doi.org/10.1021/acs.chemmater.8b02719</a>","bibtex":"@article{Kormath Madam Raghupathy_Wiebeler_Kühne_Felser_Mirhosseini_2018, title={Database screening of ternary chalcogenides for p-type transparent conductors}, volume={30}, DOI={<a href=\"https://doi.org/10.1021/acs.chemmater.8b02719\">10.1021/acs.chemmater.8b02719</a>}, number={19}, journal={Chemistry of Materials}, publisher={American Chemical Society}, author={Kormath Madam Raghupathy, Ramya and Wiebeler, Hendrik and Kühne, Thomas and Felser, Claudia and Mirhosseini, Hossein}, year={2018}, pages={6794–6800} }","short":"R. Kormath Madam Raghupathy, H. Wiebeler, T. Kühne, C. Felser, H. Mirhosseini, Chemistry of Materials 30 (2018) 6794–6800.","mla":"Kormath Madam Raghupathy, Ramya, et al. “Database Screening of Ternary Chalcogenides for P-Type Transparent Conductors.” <i>Chemistry of Materials</i>, vol. 30, no. 19, American Chemical Society, 2018, pp. 6794–800, doi:<a href=\"https://doi.org/10.1021/acs.chemmater.8b02719\">10.1021/acs.chemmater.8b02719</a>."},"publication_status":"published","issue":"19","language":[{"iso":"eng"}],"_id":"13210","project":[{"name":"Computing Resources Provided by the Paderborn Center for Parallel Computing","_id":"52"}],"department":[{"_id":"304"}],"user_id":"71051","abstract":[{"lang":"eng","text":"In this work, we investigated ternary chalcogenide semiconductors to identify promising p-type transparent conducting materials (TCMs). High-throughput calculations were employed to find the compounds that satisfies our screening criteria. Our screening strategy was based on the size of band gaps, the values of hole effective masses, and p-type dopability. Our search led to the identification of seven promising compounds (IrSbS, Ba2GeSe4, Ba2SiSe4, Ba(BSe3)2, VCu3S4, NbCu3Se4, and CuBS2) as potential TCM candidates. In addition, branch point energy and optical absorption spectra calculations support our findings. Our results open a new direction for the design and development of p-type TCMs."}],"status":"public","publication":"Chemistry of Materials","type":"journal_article"},{"status":"public","type":"journal_article","publication":"Macromolecular Rapid Communications","language":[{"iso":"eng"}],"article_number":"1800674","article_type":"original","keyword":["Materials Chemistry","Polymers and Plastics","Organic Chemistry"],"user_id":"94","department":[{"_id":"163"}],"_id":"32444","citation":{"apa":"Li, J., Yu, X., Herberg, A., &#38; Kuckling, D. (2018). Biomolecule Sensor Based on Azlactone‐Modified Hydrogel Films. <i>Macromolecular Rapid Communications</i>, <i>40</i>(7), Article 1800674. <a href=\"https://doi.org/10.1002/marc.201800674\">https://doi.org/10.1002/marc.201800674</a>","bibtex":"@article{Li_Yu_Herberg_Kuckling_2018, title={Biomolecule Sensor Based on Azlactone‐Modified Hydrogel Films}, volume={40}, DOI={<a href=\"https://doi.org/10.1002/marc.201800674\">10.1002/marc.201800674</a>}, number={71800674}, journal={Macromolecular Rapid Communications}, publisher={Wiley}, author={Li, Jie and Yu, Xiaoqian and Herberg, Artjom and Kuckling, Dirk}, year={2018} }","short":"J. Li, X. Yu, A. Herberg, D. Kuckling, Macromolecular Rapid Communications 40 (2018).","mla":"Li, Jie, et al. “Biomolecule Sensor Based on Azlactone‐Modified Hydrogel Films.” <i>Macromolecular Rapid Communications</i>, vol. 40, no. 7, 1800674, Wiley, 2018, doi:<a href=\"https://doi.org/10.1002/marc.201800674\">10.1002/marc.201800674</a>.","ieee":"J. Li, X. Yu, A. Herberg, and D. Kuckling, “Biomolecule Sensor Based on Azlactone‐Modified Hydrogel Films,” <i>Macromolecular Rapid Communications</i>, vol. 40, no. 7, Art. no. 1800674, 2018, doi: <a href=\"https://doi.org/10.1002/marc.201800674\">10.1002/marc.201800674</a>.","chicago":"Li, Jie, Xiaoqian Yu, Artjom Herberg, and Dirk Kuckling. “Biomolecule Sensor Based on Azlactone‐Modified Hydrogel Films.” <i>Macromolecular Rapid Communications</i> 40, no. 7 (2018). <a href=\"https://doi.org/10.1002/marc.201800674\">https://doi.org/10.1002/marc.201800674</a>.","ama":"Li J, Yu X, Herberg A, Kuckling D. Biomolecule Sensor Based on Azlactone‐Modified Hydrogel Films. <i>Macromolecular Rapid Communications</i>. 2018;40(7). doi:<a href=\"https://doi.org/10.1002/marc.201800674\">10.1002/marc.201800674</a>"},"intvolume":"        40","year":"2018","issue":"7","publication_status":"published","publication_identifier":{"issn":["1022-1336","1521-3927"]},"doi":"10.1002/marc.201800674","title":"Biomolecule Sensor Based on Azlactone‐Modified Hydrogel Films","date_created":"2022-07-28T09:41:44Z","author":[{"full_name":"Li, Jie","last_name":"Li","first_name":"Jie"},{"first_name":"Xiaoqian","last_name":"Yu","full_name":"Yu, Xiaoqian"},{"first_name":"Artjom","full_name":"Herberg, Artjom","id":"94","last_name":"Herberg"},{"first_name":"Dirk","last_name":"Kuckling","id":"287","full_name":"Kuckling, Dirk"}],"volume":40,"publisher":"Wiley","date_updated":"2022-07-28T09:44:55Z"},{"article_type":"original","article_number":"78","user_id":"466","department":[{"_id":"2"},{"_id":"315"}],"_id":"35330","status":"public","type":"journal_article","doi":"10.3390/gels4030078","author":[{"first_name":"Katja","full_name":"Steck, Katja","last_name":"Steck"},{"id":"466","full_name":"Schmidt, Claudia","last_name":"Schmidt","orcid":"0000-0003-3179-9997","first_name":"Claudia"},{"last_name":"Stubenrauch","full_name":"Stubenrauch, Cosima","first_name":"Cosima"}],"volume":4,"date_updated":"2023-01-07T10:33:24Z","citation":{"bibtex":"@article{Steck_Schmidt_Stubenrauch_2018, title={The Twofold Role of 12-Hydroxyoctadecanoic Acid (12-HOA) in a Ternary Water—Surfactant—12-HOA System: Gelator and Co-Surfactant}, volume={4}, DOI={<a href=\"https://doi.org/10.3390/gels4030078\">10.3390/gels4030078</a>}, number={378}, journal={Gels}, publisher={MDPI AG}, author={Steck, Katja and Schmidt, Claudia and Stubenrauch, Cosima}, year={2018} }","short":"K. Steck, C. Schmidt, C. Stubenrauch, Gels 4 (2018).","mla":"Steck, Katja, et al. “The Twofold Role of 12-Hydroxyoctadecanoic Acid (12-HOA) in a Ternary Water—Surfactant—12-HOA System: Gelator and Co-Surfactant.” <i>Gels</i>, vol. 4, no. 3, 78, MDPI AG, 2018, doi:<a href=\"https://doi.org/10.3390/gels4030078\">10.3390/gels4030078</a>.","apa":"Steck, K., Schmidt, C., &#38; Stubenrauch, C. (2018). The Twofold Role of 12-Hydroxyoctadecanoic Acid (12-HOA) in a Ternary Water—Surfactant—12-HOA System: Gelator and Co-Surfactant. <i>Gels</i>, <i>4</i>(3), Article 78. <a href=\"https://doi.org/10.3390/gels4030078\">https://doi.org/10.3390/gels4030078</a>","ieee":"K. Steck, C. Schmidt, and C. Stubenrauch, “The Twofold Role of 12-Hydroxyoctadecanoic Acid (12-HOA) in a Ternary Water—Surfactant—12-HOA System: Gelator and Co-Surfactant,” <i>Gels</i>, vol. 4, no. 3, Art. no. 78, 2018, doi: <a href=\"https://doi.org/10.3390/gels4030078\">10.3390/gels4030078</a>.","chicago":"Steck, Katja, Claudia Schmidt, and Cosima Stubenrauch. “The Twofold Role of 12-Hydroxyoctadecanoic Acid (12-HOA) in a Ternary Water—Surfactant—12-HOA System: Gelator and Co-Surfactant.” <i>Gels</i> 4, no. 3 (2018). <a href=\"https://doi.org/10.3390/gels4030078\">https://doi.org/10.3390/gels4030078</a>.","ama":"Steck K, Schmidt C, Stubenrauch C. The Twofold Role of 12-Hydroxyoctadecanoic Acid (12-HOA) in a Ternary Water—Surfactant—12-HOA System: Gelator and Co-Surfactant. <i>Gels</i>. 2018;4(3). doi:<a href=\"https://doi.org/10.3390/gels4030078\">10.3390/gels4030078</a>"},"intvolume":"         4","publication_status":"published","publication_identifier":{"issn":["2310-2861"]},"language":[{"iso":"eng"}],"keyword":["Polymers and Plastics","Organic Chemistry","Biomaterials","Bioengineering"],"abstract":[{"text":"<jats:p>Gelled lyotropic liquid crystals can be formed by adding a gelator to a mixture of surfactant and solvent. If the gel network and the liquid-crystalline phase coexist without influencing each other, the self-assembly is called orthogonal. In this study, the influence of the organogelator 12-hydroxyoctadecanoic acid (12-HOA) on the lamellar and hexagonal liquid crystalline phases of the binary system H2O–C12E7 (heptaethylene glycol monododecyl ether) is investigated. More precisely, we added 12-HOA at mass fractions from 0.015 to 0.05 and studied the resulting phase diagram of the system H2O–C12E7 by visual observation of birefringence and by 2H NMR spectroscopy. In addition, the dynamic shear moduli of the samples were measured in order to examine their gel character. The results show that 12-HOA is partly acting as co-surfactant, manifested by the destabilization of the hexagonal phase and the stabilization of the lamellar phase. The higher the total surfactant concentration, the more 12-HOA is incorporated in the surfactant layer. Accordingly, its gelation capacity is substantially reduced in the surfactant solution compared to the system 12-HOA–n-decane, and large amounts of gelator are required for gels to form, especially in the lamellar phase.</jats:p>","lang":"eng"}],"publication":"Gels","title":"The Twofold Role of 12-Hydroxyoctadecanoic Acid (12-HOA) in a Ternary Water—Surfactant—12-HOA System: Gelator and Co-Surfactant","date_created":"2023-01-06T12:51:42Z","publisher":"MDPI AG","year":"2018","issue":"3","quality_controlled":"1"},{"title":"Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal","doi":"10.1134/s1811238218010010","date_updated":"2023-01-10T13:09:51Z","volume":60,"author":[{"last_name":"Atorf","full_name":"Atorf, Bernhard","first_name":"Bernhard"},{"first_name":"Simon","full_name":"Friesen, Simon","last_name":"Friesen"},{"first_name":"Roman","full_name":"Rennerich, Roman","last_name":"Rennerich"},{"last_name":"Mühlenbernd","full_name":"Mühlenbernd, Holger","first_name":"Holger"},{"orcid":"0000-0002-8662-1101","last_name":"Zentgraf","id":"30525","full_name":"Zentgraf, Thomas","first_name":"Thomas"},{"full_name":"Kitzerow, Heinz-Siegfried","id":"254","last_name":"Kitzerow","first_name":"Heinz-Siegfried"}],"date_created":"2019-04-04T06:39:21Z","year":"2018","intvolume":"        60","page":"55-62","citation":{"ama":"Atorf B, Friesen S, Rennerich R, Mühlenbernd H, Zentgraf T, Kitzerow H-S. Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal. <i>Polymer Science, Series C</i>. 2018;60:55-62. doi:<a href=\"https://doi.org/10.1134/s1811238218010010\">10.1134/s1811238218010010</a>","ieee":"B. Atorf, S. Friesen, R. Rennerich, H. Mühlenbernd, T. Zentgraf, and H.-S. Kitzerow, “Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal,” <i>Polymer Science, Series C</i>, vol. 60, pp. 55–62, 2018, doi: <a href=\"https://doi.org/10.1134/s1811238218010010\">10.1134/s1811238218010010</a>.","chicago":"Atorf, Bernhard, Simon Friesen, Roman Rennerich, Holger Mühlenbernd, Thomas Zentgraf, and Heinz-Siegfried Kitzerow. “Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal.” <i>Polymer Science, Series C</i> 60 (2018): 55–62. <a href=\"https://doi.org/10.1134/s1811238218010010\">https://doi.org/10.1134/s1811238218010010</a>.","apa":"Atorf, B., Friesen, S., Rennerich, R., Mühlenbernd, H., Zentgraf, T., &#38; Kitzerow, H.-S. (2018). Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal. <i>Polymer Science, Series C</i>, <i>60</i>, 55–62. <a href=\"https://doi.org/10.1134/s1811238218010010\">https://doi.org/10.1134/s1811238218010010</a>","short":"B. Atorf, S. Friesen, R. Rennerich, H. Mühlenbernd, T. Zentgraf, H.-S. Kitzerow, Polymer Science, Series C 60 (2018) 55–62.","bibtex":"@article{Atorf_Friesen_Rennerich_Mühlenbernd_Zentgraf_Kitzerow_2018, title={Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal}, volume={60}, DOI={<a href=\"https://doi.org/10.1134/s1811238218010010\">10.1134/s1811238218010010</a>}, journal={Polymer Science, Series C}, author={Atorf, Bernhard and Friesen, Simon and Rennerich, Roman and Mühlenbernd, Holger and Zentgraf, Thomas and Kitzerow, Heinz-Siegfried}, year={2018}, pages={55–62} }","mla":"Atorf, Bernhard, et al. “Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal.” <i>Polymer Science, Series C</i>, vol. 60, 2018, pp. 55–62, doi:<a href=\"https://doi.org/10.1134/s1811238218010010\">10.1134/s1811238218010010</a>."},"publication_identifier":{"issn":["1811-2382","1555-614X"]},"publication_status":"published","language":[{"iso":"eng"}],"_id":"8798","department":[{"_id":"15"},{"_id":"230"},{"_id":"289"},{"_id":"313"}],"user_id":"14931","status":"public","publication":"Polymer Science, Series C","type":"journal_article"},{"language":[{"iso":"eng"}],"user_id":"14931","department":[{"_id":"15"},{"_id":"230"},{"_id":"313"}],"_id":"1764","status":"public","type":"journal_article","publication":"The Journal of Physical Chemistry C","doi":"10.1021/acs.jpcc.7b12609","title":"Switchable Plasmonic Holograms Utilizing the Electro-Optic Effect of a Liquid-Crystal Circular Polarizer","date_created":"2018-03-23T13:12:39Z","author":[{"first_name":"Bernhard","last_name":"Atorf","full_name":"Atorf, Bernhard"},{"first_name":"Hoda","last_name":"Rasouli","full_name":"Rasouli, Hoda"},{"full_name":"Mühlenbernd, Holger","last_name":"Mühlenbernd","first_name":"Holger"},{"last_name":"Reineke","full_name":"Reineke, Bernhard J.","first_name":"Bernhard J."},{"orcid":"0000-0002-8662-1101","last_name":"Zentgraf","full_name":"Zentgraf, Thomas","id":"30525","first_name":"Thomas"},{"last_name":"Kitzerow","full_name":"Kitzerow, Heinz-Siegfried","id":"254","first_name":"Heinz-Siegfried"}],"volume":122,"date_updated":"2023-01-10T13:17:01Z","publisher":"American Chemical Society (ACS)","citation":{"chicago":"Atorf, Bernhard, Hoda Rasouli, Holger Mühlenbernd, Bernhard J. Reineke, Thomas Zentgraf, and Heinz-Siegfried Kitzerow. “Switchable Plasmonic Holograms Utilizing the Electro-Optic Effect of a Liquid-Crystal Circular Polarizer.” <i>The Journal of Physical Chemistry C</i> 122, no. 8 (2018): 4600–4606. <a href=\"https://doi.org/10.1021/acs.jpcc.7b12609\">https://doi.org/10.1021/acs.jpcc.7b12609</a>.","ieee":"B. Atorf, H. Rasouli, H. Mühlenbernd, B. J. Reineke, T. Zentgraf, and H.-S. Kitzerow, “Switchable Plasmonic Holograms Utilizing the Electro-Optic Effect of a Liquid-Crystal Circular Polarizer,” <i>The Journal of Physical Chemistry C</i>, vol. 122, no. 8, pp. 4600–4606, 2018, doi: <a href=\"https://doi.org/10.1021/acs.jpcc.7b12609\">10.1021/acs.jpcc.7b12609</a>.","ama":"Atorf B, Rasouli H, Mühlenbernd H, Reineke BJ, Zentgraf T, Kitzerow H-S. Switchable Plasmonic Holograms Utilizing the Electro-Optic Effect of a Liquid-Crystal Circular Polarizer. <i>The Journal of Physical Chemistry C</i>. 2018;122(8):4600-4606. doi:<a href=\"https://doi.org/10.1021/acs.jpcc.7b12609\">10.1021/acs.jpcc.7b12609</a>","short":"B. Atorf, H. Rasouli, H. Mühlenbernd, B.J. Reineke, T. Zentgraf, H.-S. Kitzerow, The Journal of Physical Chemistry C 122 (2018) 4600–4606.","mla":"Atorf, Bernhard, et al. “Switchable Plasmonic Holograms Utilizing the Electro-Optic Effect of a Liquid-Crystal Circular Polarizer.” <i>The Journal of Physical Chemistry C</i>, vol. 122, no. 8, American Chemical Society (ACS), 2018, pp. 4600–06, doi:<a href=\"https://doi.org/10.1021/acs.jpcc.7b12609\">10.1021/acs.jpcc.7b12609</a>.","bibtex":"@article{Atorf_Rasouli_Mühlenbernd_Reineke_Zentgraf_Kitzerow_2018, title={Switchable Plasmonic Holograms Utilizing the Electro-Optic Effect of a Liquid-Crystal Circular Polarizer}, volume={122}, DOI={<a href=\"https://doi.org/10.1021/acs.jpcc.7b12609\">10.1021/acs.jpcc.7b12609</a>}, number={8}, journal={The Journal of Physical Chemistry C}, publisher={American Chemical Society (ACS)}, author={Atorf, Bernhard and Rasouli, Hoda and Mühlenbernd, Holger and Reineke, Bernhard J. and Zentgraf, Thomas and Kitzerow, Heinz-Siegfried}, year={2018}, pages={4600–4606} }","apa":"Atorf, B., Rasouli, H., Mühlenbernd, H., Reineke, B. J., Zentgraf, T., &#38; Kitzerow, H.-S. (2018). Switchable Plasmonic Holograms Utilizing the Electro-Optic Effect of a Liquid-Crystal Circular Polarizer. <i>The Journal of Physical Chemistry C</i>, <i>122</i>(8), 4600–4606. <a href=\"https://doi.org/10.1021/acs.jpcc.7b12609\">https://doi.org/10.1021/acs.jpcc.7b12609</a>"},"intvolume":"       122","page":"4600-4606","year":"2018","issue":"8","publication_status":"published","publication_identifier":{"issn":["1932-7447","1932-7455"]}},{"publication":"Polymer Science, Series C","type":"journal_article","status":"public","department":[{"_id":"313"},{"_id":"15"},{"_id":"289"},{"_id":"230"}],"user_id":"254","_id":"13871","language":[{"iso":"eng"}],"publication_identifier":{"issn":["1811-2382","1555-614X"]},"publication_status":"published","page":"55-62","citation":{"ama":"Atorf B, Friesen S, Rennerich R, Mühlenbernd H, Zentgraf T, Kitzerow H-S. Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal. <i>Polymer Science, Series C</i>. Published online 2018:55-62. doi:<a href=\"https://doi.org/10.1134/s1811238218010010\">10.1134/s1811238218010010</a>","ieee":"B. Atorf, S. Friesen, R. Rennerich, H. Mühlenbernd, T. Zentgraf, and H.-S. Kitzerow, “Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal,” <i>Polymer Science, Series C</i>, pp. 55–62, 2018, doi: <a href=\"https://doi.org/10.1134/s1811238218010010\">10.1134/s1811238218010010</a>.","chicago":"Atorf, Bernhard, Simon Friesen, Roman Rennerich, Holger Mühlenbernd, Thomas Zentgraf, and Heinz-Siegfried Kitzerow. “Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal.” <i>Polymer Science, Series C</i>, 2018, 55–62. <a href=\"https://doi.org/10.1134/s1811238218010010\">https://doi.org/10.1134/s1811238218010010</a>.","apa":"Atorf, B., Friesen, S., Rennerich, R., Mühlenbernd, H., Zentgraf, T., &#38; Kitzerow, H.-S. (2018). Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal. <i>Polymer Science, Series C</i>, 55–62. <a href=\"https://doi.org/10.1134/s1811238218010010\">https://doi.org/10.1134/s1811238218010010</a>","mla":"Atorf, Bernhard, et al. “Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal.” <i>Polymer Science, Series C</i>, 2018, pp. 55–62, doi:<a href=\"https://doi.org/10.1134/s1811238218010010\">10.1134/s1811238218010010</a>.","short":"B. Atorf, S. Friesen, R. Rennerich, H. Mühlenbernd, T. Zentgraf, H.-S. Kitzerow, Polymer Science, Series C (2018) 55–62.","bibtex":"@article{Atorf_Friesen_Rennerich_Mühlenbernd_Zentgraf_Kitzerow_2018, title={Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal}, DOI={<a href=\"https://doi.org/10.1134/s1811238218010010\">10.1134/s1811238218010010</a>}, journal={Polymer Science, Series C}, author={Atorf, Bernhard and Friesen, Simon and Rennerich, Roman and Mühlenbernd, Holger and Zentgraf, Thomas and Kitzerow, Heinz-Siegfried}, year={2018}, pages={55–62} }"},"year":"2018","author":[{"first_name":"Bernhard","full_name":"Atorf, Bernhard","last_name":"Atorf"},{"first_name":"Simon","last_name":"Friesen","full_name":"Friesen, Simon"},{"first_name":"Roman","last_name":"Rennerich","full_name":"Rennerich, Roman"},{"first_name":"Holger","full_name":"Mühlenbernd, Holger","last_name":"Mühlenbernd"},{"first_name":"Thomas","id":"30525","full_name":"Zentgraf, Thomas","orcid":"0000-0002-8662-1101","last_name":"Zentgraf"},{"first_name":"Heinz-Siegfried","last_name":"Kitzerow","id":"254","full_name":"Kitzerow, Heinz-Siegfried"}],"date_created":"2019-10-15T21:32:19Z","date_updated":"2023-01-10T14:15:19Z","doi":"10.1134/s1811238218010010","title":"Switchable Plasmonic Metasurface Utilizing the Electro-Optic Kerr Effect of a Blue Phase Liquid Crystal"},{"publication":"Organic Electronics","type":"journal_article","status":"public","department":[{"_id":"313"},{"_id":"230"}],"user_id":"254","_id":"22244","language":[{"iso":"eng"}],"publication_identifier":{"issn":["1566-1199"]},"publication_status":"published","page":"266-275","citation":{"apa":"Vollbrecht, J., Oechsle, P., Stepen, A., Hoffmann, F., Paradies, J., Meyers, T., Hilleringmann, U., Schmidtke, J., &#38; Kitzerow, H.-S. (2018). Liquid crystalline dithienothiophene derivatives for organic electronics. <i>Organic Electronics</i>, 266–275. <a href=\"https://doi.org/10.1016/j.orgel.2018.06.002\">https://doi.org/10.1016/j.orgel.2018.06.002</a>","mla":"Vollbrecht, Joachim, et al. “Liquid Crystalline Dithienothiophene Derivatives for Organic Electronics.” <i>Organic Electronics</i>, 2018, pp. 266–75, doi:<a href=\"https://doi.org/10.1016/j.orgel.2018.06.002\">10.1016/j.orgel.2018.06.002</a>.","short":"J. Vollbrecht, P. Oechsle, A. Stepen, F. Hoffmann, J. Paradies, T. Meyers, U. Hilleringmann, J. Schmidtke, H.-S. Kitzerow, Organic Electronics (2018) 266–275.","bibtex":"@article{Vollbrecht_Oechsle_Stepen_Hoffmann_Paradies_Meyers_Hilleringmann_Schmidtke_Kitzerow_2018, title={Liquid crystalline dithienothiophene derivatives for organic electronics}, DOI={<a href=\"https://doi.org/10.1016/j.orgel.2018.06.002\">10.1016/j.orgel.2018.06.002</a>}, journal={Organic Electronics}, author={Vollbrecht, Joachim and Oechsle, Peter and Stepen, Arne and Hoffmann, Florian and Paradies, Jan and Meyers, Thorsten and Hilleringmann, Ulrich and Schmidtke, Jürgen and Kitzerow, Heinz-Siegfried}, year={2018}, pages={266–275} }","ama":"Vollbrecht J, Oechsle P, Stepen A, et al. Liquid crystalline dithienothiophene derivatives for organic electronics. <i>Organic Electronics</i>. Published online 2018:266-275. doi:<a href=\"https://doi.org/10.1016/j.orgel.2018.06.002\">10.1016/j.orgel.2018.06.002</a>","chicago":"Vollbrecht, Joachim, Peter Oechsle, Arne Stepen, Florian Hoffmann, Jan Paradies, Thorsten Meyers, Ulrich Hilleringmann, Jürgen Schmidtke, and Heinz-Siegfried Kitzerow. “Liquid Crystalline Dithienothiophene Derivatives for Organic Electronics.” <i>Organic Electronics</i>, 2018, 266–75. <a href=\"https://doi.org/10.1016/j.orgel.2018.06.002\">https://doi.org/10.1016/j.orgel.2018.06.002</a>.","ieee":"J. Vollbrecht <i>et al.</i>, “Liquid crystalline dithienothiophene derivatives for organic electronics,” <i>Organic Electronics</i>, pp. 266–275, 2018, doi: <a href=\"https://doi.org/10.1016/j.orgel.2018.06.002\">10.1016/j.orgel.2018.06.002</a>."},"year":"2018","date_created":"2021-05-26T10:42:53Z","author":[{"first_name":"Joachim","full_name":"Vollbrecht, Joachim","last_name":"Vollbrecht"},{"first_name":"Peter","full_name":"Oechsle, Peter","last_name":"Oechsle"},{"first_name":"Arne","full_name":"Stepen, Arne","last_name":"Stepen"},{"first_name":"Florian","last_name":"Hoffmann","full_name":"Hoffmann, Florian"},{"first_name":"Jan","orcid":"0000-0002-3698-668X","last_name":"Paradies","id":"53339","full_name":"Paradies, Jan"},{"first_name":"Thorsten","last_name":"Meyers","full_name":"Meyers, Thorsten"},{"full_name":"Hilleringmann, Ulrich","last_name":"Hilleringmann","first_name":"Ulrich"},{"last_name":"Schmidtke","full_name":"Schmidtke, Jürgen","first_name":"Jürgen"},{"first_name":"Heinz-Siegfried","last_name":"Kitzerow","full_name":"Kitzerow, Heinz-Siegfried","id":"254"}],"date_updated":"2023-01-10T14:14:19Z","doi":"10.1016/j.orgel.2018.06.002","title":"Liquid crystalline dithienothiophene derivatives for organic electronics"},{"publication_status":"published","publication_identifier":{"issn":["1559-128X","2155-3165"]},"year":"2018","citation":{"ieee":"X. Wu, M. Muntzeck, M. T. de los Arcos de Pedro, G. Grundmeier, R. Wilhelm, and T. Wagner, “Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids,” <i>Applied Optics</i>, Art. no. 9215, 2018, doi: <a href=\"https://doi.org/10.1364/ao.57.009215\">10.1364/ao.57.009215</a>.","chicago":"Wu, Xia, Maren Muntzeck, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, René Wilhelm, and Thorsten Wagner. “Determination of the Refractive Indices of Ionic Liquids by Ellipsometry, and Their Application as Immersion Liquids.” <i>Applied Optics</i>, 2018. <a href=\"https://doi.org/10.1364/ao.57.009215\">https://doi.org/10.1364/ao.57.009215</a>.","ama":"Wu X, Muntzeck M, de los Arcos de Pedro MT, Grundmeier G, Wilhelm R, Wagner T. Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids. <i>Applied Optics</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1364/ao.57.009215\">10.1364/ao.57.009215</a>","bibtex":"@article{Wu_Muntzeck_de los Arcos de Pedro_Grundmeier_Wilhelm_Wagner_2018, title={Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids}, DOI={<a href=\"https://doi.org/10.1364/ao.57.009215\">10.1364/ao.57.009215</a>}, number={9215}, journal={Applied Optics}, author={Wu, Xia and Muntzeck, Maren and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Wilhelm, René and Wagner, Thorsten}, year={2018} }","mla":"Wu, Xia, et al. “Determination of the Refractive Indices of Ionic Liquids by Ellipsometry, and Their Application as Immersion Liquids.” <i>Applied Optics</i>, 9215, 2018, doi:<a href=\"https://doi.org/10.1364/ao.57.009215\">10.1364/ao.57.009215</a>.","short":"X. Wu, M. Muntzeck, M.T. de los Arcos de Pedro, G. Grundmeier, R. Wilhelm, T. Wagner, Applied Optics (2018).","apa":"Wu, X., Muntzeck, M., de los Arcos de Pedro, M. T., Grundmeier, G., Wilhelm, R., &#38; Wagner, T. (2018). Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids. <i>Applied Optics</i>, Article 9215. <a href=\"https://doi.org/10.1364/ao.57.009215\">https://doi.org/10.1364/ao.57.009215</a>"},"date_updated":"2023-01-24T08:11:01Z","date_created":"2021-07-07T09:05:36Z","author":[{"first_name":"Xia","full_name":"Wu, Xia","last_name":"Wu"},{"first_name":"Maren","last_name":"Muntzeck","full_name":"Muntzeck, Maren"},{"first_name":"Maria Teresa","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro"},{"last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido","first_name":"Guido"},{"first_name":"René","last_name":"Wilhelm","full_name":"Wilhelm, René"},{"first_name":"Thorsten","full_name":"Wagner, Thorsten","last_name":"Wagner"}],"title":"Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids","doi":"10.1364/ao.57.009215","type":"journal_article","publication":"Applied Optics","status":"public","_id":"22562","user_id":"54556","department":[{"_id":"302"}],"article_number":"9215","language":[{"iso":"eng"}]},{"publication":"Dalton Transactions","type":"journal_article","abstract":[{"lang":"eng","text":"<p>Development of two new neodymium containing precursors and their successful implementation in the MOCVD of luminescent Nd<sub>2</sub>S<sub>3</sub> thin films.</p>"}],"status":"public","_id":"22540","department":[{"_id":"302"}],"user_id":"54556","language":[{"iso":"eng"}],"publication_identifier":{"issn":["1477-9226","1477-9234"]},"publication_status":"published","year":"2018","page":"2926-2938","citation":{"ama":"Cwik S, Beer SMJ, Schmidt M, et al. Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides. <i>Dalton Transactions</i>. Published online 2018:2926-2938. doi:<a href=\"https://doi.org/10.1039/c8dt04317e\">10.1039/c8dt04317e</a>","ieee":"S. Cwik <i>et al.</i>, “Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides,” <i>Dalton Transactions</i>, pp. 2926–2938, 2018, doi: <a href=\"https://doi.org/10.1039/c8dt04317e\">10.1039/c8dt04317e</a>.","chicago":"Cwik, Stefan, Sebastian M. J. Beer, Marcel Schmidt, Nils C. Gerhardt, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Jana Weßing, et al. “Luminescent Nd2S3 Thin Films: A New Chemical Vapour Deposition Route towards Rare-Earth Sulphides.” <i>Dalton Transactions</i>, 2018, 2926–38. <a href=\"https://doi.org/10.1039/c8dt04317e\">https://doi.org/10.1039/c8dt04317e</a>.","bibtex":"@article{Cwik_Beer_Schmidt_Gerhardt_de los Arcos de Pedro_Rogalla_Weßing_Giner_Hofmann_Grundmeier_et al._2018, title={Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides}, DOI={<a href=\"https://doi.org/10.1039/c8dt04317e\">10.1039/c8dt04317e</a>}, journal={Dalton Transactions}, author={Cwik, Stefan and Beer, Sebastian M. J. and Schmidt, Marcel and Gerhardt, Nils C. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Weßing, Jana and Giner, Ignacio and Hofmann, Martin and Grundmeier, Guido and et al.}, year={2018}, pages={2926–2938} }","mla":"Cwik, Stefan, et al. “Luminescent Nd2S3 Thin Films: A New Chemical Vapour Deposition Route towards Rare-Earth Sulphides.” <i>Dalton Transactions</i>, 2018, pp. 2926–38, doi:<a href=\"https://doi.org/10.1039/c8dt04317e\">10.1039/c8dt04317e</a>.","short":"S. Cwik, S.M.J. Beer, M. Schmidt, N.C. Gerhardt, M.T. de los Arcos de Pedro, D. Rogalla, J. Weßing, I. Giner, M. Hofmann, G. Grundmeier, A.D. Wieck, A. Devi, Dalton Transactions (2018) 2926–2938.","apa":"Cwik, S., Beer, S. M. J., Schmidt, M., Gerhardt, N. C., de los Arcos de Pedro, M. T., Rogalla, D., Weßing, J., Giner, I., Hofmann, M., Grundmeier, G., Wieck, A. D., &#38; Devi, A. (2018). Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides. <i>Dalton Transactions</i>, 2926–2938. <a href=\"https://doi.org/10.1039/c8dt04317e\">https://doi.org/10.1039/c8dt04317e</a>"},"date_updated":"2023-01-24T08:35:36Z","date_created":"2021-07-07T08:40:12Z","author":[{"first_name":"Stefan","full_name":"Cwik, Stefan","last_name":"Cwik"},{"full_name":"Beer, Sebastian M. J.","last_name":"Beer","first_name":"Sebastian M. J."},{"full_name":"Schmidt, Marcel","last_name":"Schmidt","first_name":"Marcel"},{"last_name":"Gerhardt","full_name":"Gerhardt, Nils C.","first_name":"Nils C."},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"last_name":"Rogalla","full_name":"Rogalla, Detlef","first_name":"Detlef"},{"last_name":"Weßing","full_name":"Weßing, Jana","first_name":"Jana"},{"first_name":"Ignacio","full_name":"Giner, Ignacio","last_name":"Giner"},{"first_name":"Martin","full_name":"Hofmann, Martin","last_name":"Hofmann"},{"first_name":"Guido","id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier"},{"first_name":"Andreas D.","last_name":"Wieck","full_name":"Wieck, Andreas D."},{"first_name":"Anjana","full_name":"Devi, Anjana","last_name":"Devi"}],"title":"Luminescent Nd2S3 thin films: a new chemical vapour deposition route towards rare-earth sulphides","doi":"10.1039/c8dt04317e"},{"language":[{"iso":"eng"}],"user_id":"54556","department":[{"_id":"302"}],"_id":"22542","status":"public","type":"journal_article","publication":"Journal of Coatings Technology and Research","doi":"10.1007/s11998-018-0138-4","title":"Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD","author":[{"full_name":"Kirchheim, Dennis","last_name":"Kirchheim","first_name":"Dennis"},{"first_name":"Stefan","last_name":"Wilski","full_name":"Wilski, Stefan"},{"full_name":"Jaritz, Montgomery","last_name":"Jaritz","first_name":"Montgomery"},{"first_name":"Felix","last_name":"Mitschker","full_name":"Mitschker, Felix"},{"first_name":"Moritz","last_name":"Oberberg","full_name":"Oberberg, Moritz"},{"last_name":"Trieschmann","full_name":"Trieschmann, Jan","first_name":"Jan"},{"first_name":"Lars","last_name":"Banko","full_name":"Banko, Lars"},{"last_name":"Brochhagen","full_name":"Brochhagen, Markus","first_name":"Markus"},{"first_name":"Rabea","last_name":"Schreckenberg","full_name":"Schreckenberg, Rabea"},{"last_name":"Hopmann","full_name":"Hopmann, Christian","first_name":"Christian"},{"first_name":"Marc","full_name":"Böke, Marc","last_name":"Böke"},{"full_name":"Benedikt, Jan","last_name":"Benedikt","first_name":"Jan"},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido","first_name":"Guido"},{"first_name":"Dario","last_name":"Grochla","full_name":"Grochla, Dario"},{"full_name":"Ludwig, Alfred","last_name":"Ludwig","first_name":"Alfred"},{"first_name":"Thomas","last_name":"Mussenbrock","full_name":"Mussenbrock, Thomas"},{"last_name":"Brinkmann","full_name":"Brinkmann, Ralf Peter","first_name":"Ralf Peter"},{"last_name":"Awakowicz","full_name":"Awakowicz, Peter","first_name":"Peter"},{"first_name":"Rainer","last_name":"Dahlmann","full_name":"Dahlmann, Rainer"}],"date_created":"2021-07-07T08:41:15Z","date_updated":"2023-01-24T08:36:23Z","citation":{"ieee":"D. Kirchheim <i>et al.</i>, “Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD,” <i>Journal of Coatings Technology and Research</i>, pp. 573–583, 2018, doi: <a href=\"https://doi.org/10.1007/s11998-018-0138-4\">10.1007/s11998-018-0138-4</a>.","chicago":"Kirchheim, Dennis, Stefan Wilski, Montgomery Jaritz, Felix Mitschker, Moritz Oberberg, Jan Trieschmann, Lars Banko, et al. “Improved Homogeneity of Plasma and Coating Properties Using a Lance Matrix Gas Distribution in MW-PECVD.” <i>Journal of Coatings Technology and Research</i>, 2018, 573–83. <a href=\"https://doi.org/10.1007/s11998-018-0138-4\">https://doi.org/10.1007/s11998-018-0138-4</a>.","ama":"Kirchheim D, Wilski S, Jaritz M, et al. Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD. <i>Journal of Coatings Technology and Research</i>. Published online 2018:573-583. doi:<a href=\"https://doi.org/10.1007/s11998-018-0138-4\">10.1007/s11998-018-0138-4</a>","apa":"Kirchheim, D., Wilski, S., Jaritz, M., Mitschker, F., Oberberg, M., Trieschmann, J., Banko, L., Brochhagen, M., Schreckenberg, R., Hopmann, C., Böke, M., Benedikt, J., de los Arcos de Pedro, M. T., Grundmeier, G., Grochla, D., Ludwig, A., Mussenbrock, T., Brinkmann, R. P., Awakowicz, P., &#38; Dahlmann, R. (2018). Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD. <i>Journal of Coatings Technology and Research</i>, 573–583. <a href=\"https://doi.org/10.1007/s11998-018-0138-4\">https://doi.org/10.1007/s11998-018-0138-4</a>","mla":"Kirchheim, Dennis, et al. “Improved Homogeneity of Plasma and Coating Properties Using a Lance Matrix Gas Distribution in MW-PECVD.” <i>Journal of Coatings Technology and Research</i>, 2018, pp. 573–83, doi:<a href=\"https://doi.org/10.1007/s11998-018-0138-4\">10.1007/s11998-018-0138-4</a>.","bibtex":"@article{Kirchheim_Wilski_Jaritz_Mitschker_Oberberg_Trieschmann_Banko_Brochhagen_Schreckenberg_Hopmann_et al._2018, title={Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD}, DOI={<a href=\"https://doi.org/10.1007/s11998-018-0138-4\">10.1007/s11998-018-0138-4</a>}, journal={Journal of Coatings Technology and Research}, author={Kirchheim, Dennis and Wilski, Stefan and Jaritz, Montgomery and Mitschker, Felix and Oberberg, Moritz and Trieschmann, Jan and Banko, Lars and Brochhagen, Markus and Schreckenberg, Rabea and Hopmann, Christian and et al.}, year={2018}, pages={573–583} }","short":"D. Kirchheim, S. Wilski, M. Jaritz, F. Mitschker, M. Oberberg, J. Trieschmann, L. Banko, M. Brochhagen, R. Schreckenberg, C. Hopmann, M. Böke, J. Benedikt, M.T. de los Arcos de Pedro, G. Grundmeier, D. Grochla, A. Ludwig, T. Mussenbrock, R.P. Brinkmann, P. Awakowicz, R. Dahlmann, Journal of Coatings Technology and Research (2018) 573–583."},"page":"573-583","year":"2018","publication_status":"published","publication_identifier":{"issn":["1547-0091","1935-3804"]}},{"year":"2018","citation":{"ama":"Zanders D, Ciftyurek E, Hoppe C, et al. Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. <i>Advanced Materials Interfaces</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>","chicago":"Zanders, David, Engin Ciftyurek, Christian Hoppe, Maria Teresa de los Arcos de Pedro, Aleksander Kostka, Detlef Rogalla, Guido Grundmeier, Klaus Dieter Schierbaum, and Anjana Devi. “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.” <i>Advanced Materials Interfaces</i>, 2018. <a href=\"https://doi.org/10.1002/admi.201801540\">https://doi.org/10.1002/admi.201801540</a>.","ieee":"D. Zanders <i>et al.</i>, “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties,” <i>Advanced Materials Interfaces</i>, Art. no. 1801540, 2018, doi: <a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>.","short":"D. Zanders, E. Ciftyurek, C. Hoppe, M.T. de los Arcos de Pedro, A. Kostka, D. Rogalla, G. Grundmeier, K.D. Schierbaum, A. Devi, Advanced Materials Interfaces (2018).","mla":"Zanders, David, et al. “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties.” <i>Advanced Materials Interfaces</i>, 1801540, 2018, doi:<a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>.","bibtex":"@article{Zanders_Ciftyurek_Hoppe_de los Arcos de Pedro_Kostka_Rogalla_Grundmeier_Schierbaum_Devi_2018, title={Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties}, DOI={<a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>}, number={1801540}, journal={Advanced Materials Interfaces}, author={Zanders, David and Ciftyurek, Engin and Hoppe, Christian and de los Arcos de Pedro, Maria Teresa and Kostka, Aleksander and Rogalla, Detlef and Grundmeier, Guido and Schierbaum, Klaus Dieter and Devi, Anjana}, year={2018} }","apa":"Zanders, D., Ciftyurek, E., Hoppe, C., de los Arcos de Pedro, M. T., Kostka, A., Rogalla, D., Grundmeier, G., Schierbaum, K. D., &#38; Devi, A. (2018). Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. <i>Advanced Materials Interfaces</i>, Article 1801540. <a href=\"https://doi.org/10.1002/admi.201801540\">https://doi.org/10.1002/admi.201801540</a>"},"publication_status":"published","publication_identifier":{"issn":["2196-7350","2196-7350"]},"title":"Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties","doi":"10.1002/admi.201801540","date_updated":"2023-01-24T08:36:44Z","date_created":"2021-07-07T08:50:07Z","author":[{"full_name":"Zanders, David","last_name":"Zanders","first_name":"David"},{"first_name":"Engin","full_name":"Ciftyurek, Engin","last_name":"Ciftyurek"},{"first_name":"Christian","last_name":"Hoppe","full_name":"Hoppe, Christian"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Aleksander","last_name":"Kostka","full_name":"Kostka, Aleksander"},{"first_name":"Detlef","last_name":"Rogalla","full_name":"Rogalla, Detlef"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"},{"full_name":"Schierbaum, Klaus Dieter","last_name":"Schierbaum","first_name":"Klaus Dieter"},{"last_name":"Devi","full_name":"Devi, Anjana","first_name":"Anjana"}],"status":"public","type":"journal_article","publication":"Advanced Materials Interfaces","article_number":"1801540","language":[{"iso":"eng"}],"_id":"22546","user_id":"54556","department":[{"_id":"302"}]},{"type":"journal_article","publication":"ACS Applied Materials & Interfaces","status":"public","_id":"22550","user_id":"54556","department":[{"_id":"302"}],"language":[{"iso":"eng"}],"publication_status":"published","publication_identifier":{"issn":["1944-8244","1944-8252"]},"year":"2018","citation":{"ama":"Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>. Published online 2018:7422-7434. doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>","chicago":"Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, 7422–34. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>.","ieee":"M. Gebhard <i>et al.</i>, “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” <i>ACS Applied Materials &#38; Interfaces</i>, pp. 7422–7434, 2018, doi: <a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","apa":"Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., &#38; Devi, A. (2018). PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>, 7422–7434. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>","mla":"Gebhard, Maximilian, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, pp. 7422–34, doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","bibtex":"@article{Gebhard_Mai_Banko_Mitschker_Hoppe_Jaritz_Kirchheim_Zekorn_de los Arcos de Pedro_Grochla_et al._2018, title={PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads}, DOI={<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>}, journal={ACS Applied Materials &#38; Interfaces}, author={Gebhard, Maximilian and Mai, Lukas and Banko, Lars and Mitschker, Felix and Hoppe, Christian and Jaritz, Montgomery and Kirchheim, Dennis and Zekorn, Christoph and de los Arcos de Pedro, Maria Teresa and Grochla, Dario and et al.}, year={2018}, pages={7422–7434} }","short":"M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials &#38; Interfaces (2018) 7422–7434."},"page":"7422-7434","date_updated":"2023-01-24T08:38:00Z","date_created":"2021-07-07T08:59:20Z","author":[{"full_name":"Gebhard, Maximilian","last_name":"Gebhard","first_name":"Maximilian"},{"last_name":"Mai","full_name":"Mai, Lukas","first_name":"Lukas"},{"first_name":"Lars","last_name":"Banko","full_name":"Banko, Lars"},{"last_name":"Mitschker","full_name":"Mitschker, Felix","first_name":"Felix"},{"last_name":"Hoppe","full_name":"Hoppe, Christian","first_name":"Christian"},{"last_name":"Jaritz","full_name":"Jaritz, Montgomery","first_name":"Montgomery"},{"last_name":"Kirchheim","full_name":"Kirchheim, Dennis","first_name":"Dennis"},{"first_name":"Christoph","full_name":"Zekorn, Christoph","last_name":"Zekorn"},{"first_name":"Maria Teresa","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro"},{"first_name":"Dario","full_name":"Grochla, Dario","last_name":"Grochla"},{"full_name":"Dahlmann, Rainer","last_name":"Dahlmann","first_name":"Rainer"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"},{"first_name":"Peter","last_name":"Awakowicz","full_name":"Awakowicz, Peter"},{"full_name":"Ludwig, Alfred","last_name":"Ludwig","first_name":"Alfred"},{"last_name":"Devi","full_name":"Devi, Anjana","first_name":"Anjana"}],"title":"PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads","doi":"10.1021/acsami.7b14916"},{"title":"PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads","doi":"10.1021/acsami.7b14916","date_updated":"2023-01-24T08:37:41Z","date_created":"2021-07-07T08:59:10Z","author":[{"first_name":"Maximilian","last_name":"Gebhard","full_name":"Gebhard, Maximilian"},{"full_name":"Mai, Lukas","last_name":"Mai","first_name":"Lukas"},{"first_name":"Lars","last_name":"Banko","full_name":"Banko, Lars"},{"full_name":"Mitschker, Felix","last_name":"Mitschker","first_name":"Felix"},{"full_name":"Hoppe, Christian","last_name":"Hoppe","first_name":"Christian"},{"first_name":"Montgomery","full_name":"Jaritz, Montgomery","last_name":"Jaritz"},{"full_name":"Kirchheim, Dennis","last_name":"Kirchheim","first_name":"Dennis"},{"full_name":"Zekorn, Christoph","last_name":"Zekorn","first_name":"Christoph"},{"first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa"},{"first_name":"Dario","full_name":"Grochla, Dario","last_name":"Grochla"},{"first_name":"Rainer","last_name":"Dahlmann","full_name":"Dahlmann, Rainer"},{"first_name":"Guido","id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier"},{"first_name":"Peter","full_name":"Awakowicz, Peter","last_name":"Awakowicz"},{"first_name":"Alfred","full_name":"Ludwig, Alfred","last_name":"Ludwig"},{"first_name":"Anjana","last_name":"Devi","full_name":"Devi, Anjana"}],"year":"2018","citation":{"apa":"Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., &#38; Devi, A. (2018). PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>, 7422–7434. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>","short":"M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials &#38; Interfaces (2018) 7422–7434.","mla":"Gebhard, Maximilian, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, pp. 7422–34, doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","bibtex":"@article{Gebhard_Mai_Banko_Mitschker_Hoppe_Jaritz_Kirchheim_Zekorn_de los Arcos de Pedro_Grochla_et al._2018, title={PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads}, DOI={<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>}, journal={ACS Applied Materials &#38; Interfaces}, author={Gebhard, Maximilian and Mai, Lukas and Banko, Lars and Mitschker, Felix and Hoppe, Christian and Jaritz, Montgomery and Kirchheim, Dennis and Zekorn, Christoph and de los Arcos de Pedro, Maria Teresa and Grochla, Dario and et al.}, year={2018}, pages={7422–7434} }","chicago":"Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, 7422–34. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>.","ieee":"M. Gebhard <i>et al.</i>, “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” <i>ACS Applied Materials &#38; Interfaces</i>, pp. 7422–7434, 2018, doi: <a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","ama":"Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>. Published online 2018:7422-7434. doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>"},"page":"7422-7434","publication_status":"published","publication_identifier":{"issn":["1944-8244","1944-8252"]},"language":[{"iso":"eng"}],"_id":"22549","user_id":"54556","department":[{"_id":"302"}],"status":"public","type":"journal_article","publication":"ACS Applied Materials & Interfaces"},{"year":"2018","citation":{"short":"M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials &#38; Interfaces (2018) 7422–7434.","mla":"Gebhard, Maximilian, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, pp. 7422–34, doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","bibtex":"@article{Gebhard_Mai_Banko_Mitschker_Hoppe_Jaritz_Kirchheim_Zekorn_de los Arcos de Pedro_Grochla_et al._2018, title={PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads}, DOI={<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>}, journal={ACS Applied Materials &#38; Interfaces}, author={Gebhard, Maximilian and Mai, Lukas and Banko, Lars and Mitschker, Felix and Hoppe, Christian and Jaritz, Montgomery and Kirchheim, Dennis and Zekorn, Christoph and de los Arcos de Pedro, Maria Teresa and Grochla, Dario and et al.}, year={2018}, pages={7422–7434} }","apa":"Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., &#38; Devi, A. (2018). PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>, 7422–7434. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>","chicago":"Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, 7422–34. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>.","ieee":"M. Gebhard <i>et al.</i>, “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” <i>ACS Applied Materials &#38; Interfaces</i>, pp. 7422–7434, 2018, doi: <a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","ama":"Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>. Published online 2018:7422-7434. doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>"},"page":"7422-7434","publication_status":"published","publication_identifier":{"issn":["1944-8244","1944-8252"]},"title":"PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads","doi":"10.1021/acsami.7b14916","date_updated":"2023-01-24T08:38:19Z","author":[{"first_name":"Maximilian","full_name":"Gebhard, Maximilian","last_name":"Gebhard"},{"first_name":"Lukas","last_name":"Mai","full_name":"Mai, Lukas"},{"first_name":"Lars","last_name":"Banko","full_name":"Banko, Lars"},{"first_name":"Felix","full_name":"Mitschker, Felix","last_name":"Mitschker"},{"first_name":"Christian","last_name":"Hoppe","full_name":"Hoppe, Christian"},{"full_name":"Jaritz, Montgomery","last_name":"Jaritz","first_name":"Montgomery"},{"first_name":"Dennis","full_name":"Kirchheim, Dennis","last_name":"Kirchheim"},{"last_name":"Zekorn","full_name":"Zekorn, Christoph","first_name":"Christoph"},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"first_name":"Dario","last_name":"Grochla","full_name":"Grochla, Dario"},{"first_name":"Rainer","full_name":"Dahlmann, Rainer","last_name":"Dahlmann"},{"first_name":"Guido","full_name":"Grundmeier, Guido","id":"194","last_name":"Grundmeier"},{"full_name":"Awakowicz, Peter","last_name":"Awakowicz","first_name":"Peter"},{"full_name":"Ludwig, Alfred","last_name":"Ludwig","first_name":"Alfred"},{"last_name":"Devi","full_name":"Devi, Anjana","first_name":"Anjana"}],"date_created":"2021-07-07T08:59:35Z","status":"public","type":"journal_article","publication":"ACS Applied Materials & Interfaces","language":[{"iso":"eng"}],"_id":"22551","user_id":"54556","department":[{"_id":"302"}]},{"publication":"Contributions to Plasma Physics","type":"journal_article","status":"public","_id":"22548","department":[{"_id":"302"}],"user_id":"54556","language":[{"iso":"eng"}],"publication_identifier":{"issn":["0863-1042"]},"publication_status":"published","year":"2018","page":"377-383","citation":{"short":"J. Dietrich, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier, Contributions to Plasma Physics (2018) 377–383.","mla":"Dietrich, J., et al. “Combined in Situ Infrared Reflection Absorption Spectroscopy-Quartz Crystal Microbalance Investigation of the Initial Growth Stages of Plasma-Deposited SiO                            x                         on Polypropylene.” <i>Contributions to Plasma Physics</i>, 2018, pp. 377–83, doi:<a href=\"https://doi.org/10.1002/ctpp.201700036\">10.1002/ctpp.201700036</a>.","bibtex":"@article{Dietrich_Hoppe_de los Arcos de Pedro_Grundmeier_2018, title={Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene}, DOI={<a href=\"https://doi.org/10.1002/ctpp.201700036\">10.1002/ctpp.201700036</a>}, journal={Contributions to Plasma Physics}, author={Dietrich, J. and Hoppe, C. and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2018}, pages={377–383} }","apa":"Dietrich, J., Hoppe, C., de los Arcos de Pedro, M. T., &#38; Grundmeier, G. (2018). Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene. <i>Contributions to Plasma Physics</i>, 377–383. <a href=\"https://doi.org/10.1002/ctpp.201700036\">https://doi.org/10.1002/ctpp.201700036</a>","ama":"Dietrich J, Hoppe C, de los Arcos de Pedro MT, Grundmeier G. Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene. <i>Contributions to Plasma Physics</i>. Published online 2018:377-383. doi:<a href=\"https://doi.org/10.1002/ctpp.201700036\">10.1002/ctpp.201700036</a>","chicago":"Dietrich, J., C. Hoppe, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Combined in Situ Infrared Reflection Absorption Spectroscopy-Quartz Crystal Microbalance Investigation of the Initial Growth Stages of Plasma-Deposited SiO                            x                         on Polypropylene.” <i>Contributions to Plasma Physics</i>, 2018, 377–83. <a href=\"https://doi.org/10.1002/ctpp.201700036\">https://doi.org/10.1002/ctpp.201700036</a>.","ieee":"J. Dietrich, C. Hoppe, M. T. de los Arcos de Pedro, and G. Grundmeier, “Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene,” <i>Contributions to Plasma Physics</i>, pp. 377–383, 2018, doi: <a href=\"https://doi.org/10.1002/ctpp.201700036\">10.1002/ctpp.201700036</a>."},"date_updated":"2023-01-24T08:37:20Z","author":[{"last_name":"Dietrich","full_name":"Dietrich, J.","first_name":"J."},{"last_name":"Hoppe","full_name":"Hoppe, C.","first_name":"C."},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"}],"date_created":"2021-07-07T08:57:20Z","title":"Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene","doi":"10.1002/ctpp.201700036"},{"date_updated":"2023-01-24T08:37:01Z","author":[{"full_name":"Budde, Maik","last_name":"Budde","first_name":"Maik"},{"full_name":"Corbella, Carles","last_name":"Corbella","first_name":"Carles"},{"full_name":"Große-Kreul, Simon","last_name":"Große-Kreul","first_name":"Simon"},{"first_name":"Maria Teresa","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"Achim","full_name":"von Keudell, Achim","last_name":"von Keudell"}],"date_created":"2021-07-07T08:50:38Z","title":"Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas","doi":"10.1002/ppap.201700230","publication_status":"published","publication_identifier":{"issn":["1612-8850"]},"year":"2018","citation":{"apa":"Budde, M., Corbella, C., Große-Kreul, S., de los Arcos de Pedro, M. T., Grundmeier, G., &#38; von Keudell, A. (2018). Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. <i>Plasma Processes and Polymers</i>, Article 1700230. <a href=\"https://doi.org/10.1002/ppap.201700230\">https://doi.org/10.1002/ppap.201700230</a>","short":"M. Budde, C. Corbella, S. Große-Kreul, M.T. de los Arcos de Pedro, G. Grundmeier, A. von Keudell, Plasma Processes and Polymers (2018).","bibtex":"@article{Budde_Corbella_Große-Kreul_de los Arcos de Pedro_Grundmeier_von Keudell_2018, title={Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas}, DOI={<a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>}, number={1700230}, journal={Plasma Processes and Polymers}, author={Budde, Maik and Corbella, Carles and Große-Kreul, Simon and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and von Keudell, Achim}, year={2018} }","mla":"Budde, Maik, et al. “Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” <i>Plasma Processes and Polymers</i>, 1700230, 2018, doi:<a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>.","ieee":"M. Budde, C. Corbella, S. Große-Kreul, M. T. de los Arcos de Pedro, G. Grundmeier, and A. von Keudell, “Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas,” <i>Plasma Processes and Polymers</i>, Art. no. 1700230, 2018, doi: <a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>.","chicago":"Budde, Maik, Carles Corbella, Simon Große-Kreul, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, and Achim von Keudell. “Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” <i>Plasma Processes and Polymers</i>, 2018. <a href=\"https://doi.org/10.1002/ppap.201700230\">https://doi.org/10.1002/ppap.201700230</a>.","ama":"Budde M, Corbella C, Große-Kreul S, de los Arcos de Pedro MT, Grundmeier G, von Keudell A. Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. <i>Plasma Processes and Polymers</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>"},"_id":"22547","user_id":"54556","department":[{"_id":"302"}],"article_number":"1700230","language":[{"iso":"eng"}],"type":"journal_article","publication":"Plasma Processes and Polymers","status":"public"},{"publication":"RSC Advances","type":"journal_article","abstract":[{"lang":"eng","text":"<p>A new water assisted atomic layer deposition (ALD) process was developed using the yttrium tris-guanidinate precursor which resulted in device quality thin films.</p>"}],"status":"public","_id":"22557","department":[{"_id":"302"}],"user_id":"54556","language":[{"iso":"eng"}],"publication_identifier":{"issn":["2046-2069"]},"publication_status":"published","year":"2018","page":"4987-4994","citation":{"apa":"Mai, L., Boysen, N., Subaşı, E., de los Arcos de Pedro, M. T., Rogalla, D., Grundmeier, G., Bock, C., Lu, H.-L., &#38; Devi, A. (2018). Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. <i>RSC Advances</i>, 4987–4994. <a href=\"https://doi.org/10.1039/c7ra13417g\">https://doi.org/10.1039/c7ra13417g</a>","mla":"Mai, Lukas, et al. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” <i>RSC Advances</i>, 2018, pp. 4987–94, doi:<a href=\"https://doi.org/10.1039/c7ra13417g\">10.1039/c7ra13417g</a>.","bibtex":"@article{Mai_Boysen_Subaşı_de los Arcos de Pedro_Rogalla_Grundmeier_Bock_Lu_Devi_2018, title={Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties}, DOI={<a href=\"https://doi.org/10.1039/c7ra13417g\">10.1039/c7ra13417g</a>}, journal={RSC Advances}, author={Mai, Lukas and Boysen, Nils and Subaşı, Ersoy and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Grundmeier, Guido and Bock, Claudia and Lu, Hong-Liang and Devi, Anjana}, year={2018}, pages={4987–4994} }","short":"L. Mai, N. Boysen, E. Subaşı, M.T. de los Arcos de Pedro, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. Devi, RSC Advances (2018) 4987–4994.","ieee":"L. Mai <i>et al.</i>, “Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties,” <i>RSC Advances</i>, pp. 4987–4994, 2018, doi: <a href=\"https://doi.org/10.1039/c7ra13417g\">10.1039/c7ra13417g</a>.","chicago":"Mai, Lukas, Nils Boysen, Ersoy Subaşı, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Guido Grundmeier, Claudia Bock, Hong-Liang Lu, and Anjana Devi. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” <i>RSC Advances</i>, 2018, 4987–94. <a href=\"https://doi.org/10.1039/c7ra13417g\">https://doi.org/10.1039/c7ra13417g</a>.","ama":"Mai L, Boysen N, Subaşı E, et al. Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. <i>RSC Advances</i>. Published online 2018:4987-4994. doi:<a href=\"https://doi.org/10.1039/c7ra13417g\">10.1039/c7ra13417g</a>"},"date_updated":"2023-01-24T08:39:45Z","author":[{"last_name":"Mai","full_name":"Mai, Lukas","first_name":"Lukas"},{"last_name":"Boysen","full_name":"Boysen, Nils","first_name":"Nils"},{"full_name":"Subaşı, Ersoy","last_name":"Subaşı","first_name":"Ersoy"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"Detlef","last_name":"Rogalla","full_name":"Rogalla, Detlef"},{"first_name":"Guido","last_name":"Grundmeier","id":"194","full_name":"Grundmeier, Guido"},{"first_name":"Claudia","last_name":"Bock","full_name":"Bock, Claudia"},{"first_name":"Hong-Liang","full_name":"Lu, Hong-Liang","last_name":"Lu"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"date_created":"2021-07-07T09:02:26Z","title":"Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties","doi":"10.1039/c7ra13417g"},{"date_created":"2021-07-07T09:02:43Z","author":[{"full_name":"Mitschker, F","last_name":"Mitschker","first_name":"F"},{"last_name":"Schücke","full_name":"Schücke, L","first_name":"L"},{"last_name":"Hoppe","full_name":"Hoppe, Ch","first_name":"Ch"},{"first_name":"M","full_name":"Jaritz, M","last_name":"Jaritz"},{"first_name":"R","full_name":"Dahlmann, R","last_name":"Dahlmann"},{"first_name":"Maria Teresa","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro"},{"full_name":"Hopmann, Ch","last_name":"Hopmann","first_name":"Ch"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"P","full_name":"Awakowicz, P","last_name":"Awakowicz"}],"date_updated":"2023-01-24T08:40:05Z","doi":"10.1088/1361-6463/aac0ab","title":"Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)","publication_status":"published","publication_identifier":{"issn":["0022-3727","1361-6463"]},"citation":{"chicago":"Mitschker, F, L Schücke, Ch Hoppe, M Jaritz, R Dahlmann, Maria Teresa de los Arcos de Pedro, Ch Hopmann, Guido Grundmeier, and P Awakowicz. “Comparative Study on the Deposition of Silicon Oxide Permeation Barrier Coatings for Polymers Using Hexamethyldisilazane (HMDSN) and Hexamethyldisiloxane (HMDSO).” <i>Journal of Physics D: Applied Physics</i>, 2018. <a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">https://doi.org/10.1088/1361-6463/aac0ab</a>.","ieee":"F. Mitschker <i>et al.</i>, “Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO),” <i>Journal of Physics D: Applied Physics</i>, Art. no. 235201, 2018, doi: <a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">10.1088/1361-6463/aac0ab</a>.","ama":"Mitschker F, Schücke L, Hoppe C, et al. Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). <i>Journal of Physics D: Applied Physics</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">10.1088/1361-6463/aac0ab</a>","bibtex":"@article{Mitschker_Schücke_Hoppe_Jaritz_Dahlmann_de los Arcos de Pedro_Hopmann_Grundmeier_Awakowicz_2018, title={Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO)}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">10.1088/1361-6463/aac0ab</a>}, number={235201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Schücke, L and Hoppe, Ch and Jaritz, M and Dahlmann, R and de los Arcos de Pedro, Maria Teresa and Hopmann, Ch and Grundmeier, Guido and Awakowicz, P}, year={2018} }","short":"F. Mitschker, L. Schücke, C. Hoppe, M. Jaritz, R. Dahlmann, M.T. de los Arcos de Pedro, C. Hopmann, G. Grundmeier, P. Awakowicz, Journal of Physics D: Applied Physics (2018).","mla":"Mitschker, F., et al. “Comparative Study on the Deposition of Silicon Oxide Permeation Barrier Coatings for Polymers Using Hexamethyldisilazane (HMDSN) and Hexamethyldisiloxane (HMDSO).” <i>Journal of Physics D: Applied Physics</i>, 235201, 2018, doi:<a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">10.1088/1361-6463/aac0ab</a>.","apa":"Mitschker, F., Schücke, L., Hoppe, C., Jaritz, M., Dahlmann, R., de los Arcos de Pedro, M. T., Hopmann, C., Grundmeier, G., &#38; Awakowicz, P. (2018). Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). <i>Journal of Physics D: Applied Physics</i>, Article 235201. <a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">https://doi.org/10.1088/1361-6463/aac0ab</a>"},"year":"2018","user_id":"54556","department":[{"_id":"302"}],"_id":"22558","language":[{"iso":"eng"}],"article_number":"235201","type":"journal_article","publication":"Journal of Physics D: Applied Physics","status":"public"},{"title":"Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET","doi":"10.1088/1361-6463/aab1dd","date_updated":"2023-01-24T08:40:21Z","date_created":"2021-07-07T09:03:03Z","author":[{"full_name":"Mitschker, F","last_name":"Mitschker","first_name":"F"},{"full_name":"Wißing, J","last_name":"Wißing","first_name":"J"},{"first_name":"Ch","full_name":"Hoppe, Ch","last_name":"Hoppe"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"P","last_name":"Awakowicz","full_name":"Awakowicz, P"}],"year":"2018","citation":{"apa":"Mitschker, F., Wißing, J., Hoppe, C., de los Arcos de Pedro, M. T., Grundmeier, G., &#38; Awakowicz, P. (2018). Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET. <i>Journal of Physics D: Applied Physics</i>, Article 145201. <a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">https://doi.org/10.1088/1361-6463/aab1dd</a>","mla":"Mitschker, F., et al. “Influence of Average Ion Energy and Atomic Oxygen Flux per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings on PET.” <i>Journal of Physics D: Applied Physics</i>, 145201, 2018, doi:<a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">10.1088/1361-6463/aab1dd</a>.","bibtex":"@article{Mitschker_Wißing_Hoppe_de los Arcos de Pedro_Grundmeier_Awakowicz_2018, title={Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">10.1088/1361-6463/aab1dd</a>}, number={145201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Wißing, J and Hoppe, Ch and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Awakowicz, P}, year={2018} }","short":"F. Mitschker, J. Wißing, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier, P. Awakowicz, Journal of Physics D: Applied Physics (2018).","chicago":"Mitschker, F, J Wißing, Ch Hoppe, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, and P Awakowicz. “Influence of Average Ion Energy and Atomic Oxygen Flux per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings on PET.” <i>Journal of Physics D: Applied Physics</i>, 2018. <a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">https://doi.org/10.1088/1361-6463/aab1dd</a>.","ieee":"F. Mitschker, J. Wißing, C. Hoppe, M. T. de los Arcos de Pedro, G. Grundmeier, and P. Awakowicz, “Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 145201, 2018, doi: <a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">10.1088/1361-6463/aab1dd</a>.","ama":"Mitschker F, Wißing J, Hoppe C, de los Arcos de Pedro MT, Grundmeier G, Awakowicz P. Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET. <i>Journal of Physics D: Applied Physics</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">10.1088/1361-6463/aab1dd</a>"},"publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","article_number":"145201","language":[{"iso":"eng"}],"_id":"22559","department":[{"_id":"302"}],"user_id":"54556","status":"public","publication":"Journal of Physics D: Applied Physics","type":"journal_article"}]