@inproceedings{4004,
  author       = {{Brassat, Katharina and Rüdiger, Arne and Bürger, Julius and Bremser, W. and Strube, Oliver and Lindner, Jörg}},
  location     = {{Warsaw (Poland)}},
  title        = {{{Enzyme mediated autodeposition of protein particles on nanosphere lithographically nanostructured surfaces }}},
  year         = {{2016}},
}

@inproceedings{4005,
  author       = {{Brassat, Katharina and Bürger, Julius and Reinecke, Melanie  and Briese, Dennis and Duschik, K. and Schaper, Mirko and Lindner, Jörg}},
  location     = {{Warsaw (Poland)}},
  title        = {{{Arrangement of perovskitic semiconductor nanoparticles using soft lithography }}},
  year         = {{2016}},
}

@inproceedings{4006,
  author       = {{Brassat, Katharina and Rüdiger, Arne and Bürger, Julius and Bremser, W.  and Strube, O. and Lindner, Jörg}},
  location     = {{Warsaw (Poland)}},
  title        = {{{Site-selective protein immobilization on regular antidot patterns fabricated by nanosphere lithography }}},
  year         = {{2016}},
}

@inproceedings{4007,
  author       = {{Brassat, Katharina and Kool, Daniel and Lindner, Jörg}},
  location     = {{Warsaw (Poland)}},
  title        = {{{Hierarchically ordered nanopore structures formed by combined nanosphere and block copolymer lithography }}},
  year         = {{2016}},
}

@inproceedings{4008,
  author       = {{Brassat, Katharina and Lindner, Jörg}},
  location     = {{Porquerolles (France)}},
  title        = {{{Sub-20 nm surface patterning by block copolymer lithography }}},
  year         = {{2016}},
}

@inproceedings{4009,
  author       = {{Brodehl, Christoph and Greulich-Weber, Siegmund and Lindner, Jörg}},
  location     = {{Lille (France)}},
  title        = {{{Fabricating metasurface-based optical devices with a low-cost technique}}},
  year         = {{2016}},
}

@inproceedings{4010,
  author       = {{Puglisi, R.A. and Bongiorno, C.  and Brassat, Katharina and Garozzo, Christina and La Magna, A.  and Lindner, Jörg}},
  location     = {{Warsaw (Poland)}},
  title        = {{{High-resolution TEM and STEM-EELS studies of colloidal Au nanoparticles self-assembled in nanometric SiO2 nanopore arrays fabricated by block-copolymer lithography }}},
  year         = {{2016}},
}

@inproceedings{4011,
  author       = {{Riedl, Thomas and Lindner, Jörg}},
  location     = {{Warsaw (Poland)}},
  title        = {{{Automated SEM image analysis of the opening size distribution of nanosphere lithography masks and their origins }}},
  year         = {{2016}},
}

@inproceedings{4012,
  author       = {{Riedl, Thomas and Lindner, Jörg}},
  location     = {{Regensburg (Germany)}},
  title        = {{{Theoretical analysis of strain and misfit dislocation stability in axial-heteroepitaxial GaAs/InAs nanopillars}}},
  year         = {{2016}},
}

@inproceedings{4013,
  author       = {{Riedl, Thomas and Kemper, R.M. and As, Donald and Lindner, Jörg}},
  location     = {{Regensburg}},
  title        = {{{Stability of misfit dislocations in axial-heteroepitaxial 3CSiC/c-GaN nanopillars and nanomesas}}},
  year         = {{2016}},
}

@inproceedings{4014,
  author       = {{Rieger, T. and Riedl, Thomas and Lindner, Jörg and Pawlis, A.}},
  location     = {{Montpellier (France)}},
  title        = {{{Enhancement of the critical thickness of CdSe/ZnSe quantum wells via the strain compensation technique}}},
  year         = {{2016}},
}

@inproceedings{4015,
  author       = {{As, Donald and Kemper, R.M. and Riedl, Thomas and Lindner, Jörg}},
  location     = {{Regensburg}},
  title        = {{{Cubic GaN on pre-patterned 3C-SiC/Si (001) substrates}}},
  year         = {{2016}},
}

@inproceedings{4016,
  author       = {{Brassat, Katharina}},
  location     = {{Berlin (Germany)}},
  title        = {{{Hierarchical self-assembly by colloidal and block copolymer lithography }}},
  year         = {{2016}},
}

@inproceedings{4017,
  author       = {{Brassat, Katharina and Brodehl, Christoph and Lindner, Jörg}},
  location     = {{Cluj-Napoca (Romania)}},
  title        = {{{Nanopatterning of surfaces with nanosphere lithography, block copolymer lithography and combinations of both }}},
  year         = {{2016}},
}

@inproceedings{4018,
  author       = {{Brassat, Katharina and Brodehl, Christoph and Lindner, Jörg}},
  location     = {{Warsaw (Poland)}},
  title        = {{{Self-assembled nanogap electrodes for the directed assembly of nanoparticles}}},
  year         = {{2015}},
}

@inproceedings{4019,
  author       = {{Brassat, Katharina and Brodehl, Christoph and Lindner, Jörg}},
  location     = {{Paderborn (Germany)}},
  title        = {{{Self-assembled Nanogap Electrodes in Microfluidic Channels}}},
  year         = {{2015}},
}

@inproceedings{4020,
  author       = {{Brodehl, Christoph and Riedl, Thomas and Greulich-Weber, Siegmund and Lindner, Jörg}},
  location     = {{Lille (France)}},
  title        = {{{Three-dimensional analysis of mask-clogging effects on the morphology of nanoparticles fabricated by nanosphere lithography}}},
  year         = {{2015}},
}

@inproceedings{4021,
  author       = {{Brodehl, Christoph and Greulich-Weber, Siegmund and Lindner, Jörg}},
  location     = {{Paderborn}},
  title        = {{{How to create billions of tailored plasmonic nanoparticles in half an hour}}},
  year         = {{2015}},
}

@inproceedings{4022,
  author       = {{Drude, Dennis and Brassat, Katharina and Brodehl, Christoph and Lindner, Jörg}},
  location     = {{Warsaw (Poland)}},
  title        = {{{Correlation between defect densities in colloidal nanosphere masks and experimental parameters}}},
  year         = {{2015}},
}

@article{4023,
  author       = {{Brodehl, Christoph and Greulich-Weber, Siegmund and Lindner, Jörg}},
  issn         = {{1946-4274}},
  journal      = {{MRS Proceedings}},
  publisher    = {{Cambridge University Press (CUP)}},
  title        = {{{An Algorithm for Tailoring of Nanoparticles by Double Angle Resolved Nanosphere Lithography}}},
  doi          = {{10.1557/opl.2015.77}},
  volume       = {{1748}},
  year         = {{2015}},
}