---
_id: '3949'
author:
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Lindner J. Nanoscale materials and interface design by self-organization.
    In: ; 2018.'
  apa: Lindner, J. (2018). Nanoscale materials and interface design by self-organization.
    Presented at the Festkörpertag des Zentrums für Festkörperchemie und Neue Materialien,
    Universität Hannover.
  bibtex: '@inproceedings{Lindner_2018, title={Nanoscale materials and interface design
    by self-organization}, author={Lindner, Jörg}, year={2018} }'
  chicago: Lindner, Jörg. “Nanoscale Materials and Interface Design by Self-Organization,”
    2018.
  ieee: J. Lindner, “Nanoscale materials and interface design by self-organization,”
    presented at the Festkörpertag des Zentrums für Festkörperchemie und Neue Materialien,
    Universität Hannover, 2018.
  mla: Lindner, Jörg. <i>Nanoscale Materials and Interface Design by Self-Organization</i>.
    2018.
  short: 'J. Lindner, in: 2018.'
conference:
  end_date: 2018-02-02
  location: Universität Hannover
  name: Festkörpertag des Zentrums für Festkörperchemie und Neue Materialien
  start_date: 2018-02-02
date_created: 2018-08-20T13:02:39Z
date_updated: 2022-01-06T06:59:58Z
department:
- _id: '286'
- _id: '15'
status: public
title: Nanoscale materials and interface design by self-organization
type: conference
user_id: '55706'
year: '2018'
...
---
_id: '3950'
abstract:
- lang: eng
  text: "In the last decade, zinc blende structure III–V semiconductors have been
    increasingly utilized for the realization of high‐performance optoelectronic applications
    because of their tunable bandgaps, high carrier mobility and the absence of piezoelectric
    fields. However, the integration of III–V devices on the Si platform commonly
    used for CMOS electronic \r\ncircuits still poses a challenge, due to the large
    densities of mismatch‐related defects in heteroepitaxial III–V layers grown on
    planar Si substrates. A promising method to obtain thin III–V layers of high crystalline
    quality is the growth on nanopatterned substrates. In this approach, defects can
    be effectively eliminated by elastic lattice relaxation in three \r\ndimensions
    or confined close to the substrate interface by using aspect‐ratio trapping masks.
    As a result, an etch pit density as low as 3.3 × 10^5 cm^−2 and a flat surface
    of submicron GaAs layers have been accomplished by growth onto a SiO2 nanohole
    film patterned Si(001) substrate, where the threading defects are trapped at the
    SiO2 mask sidewalls. An open issue that remains to be resolved is to gain a better
    understanding of the interplay between mask shape, growth conditions and formation
    of coalescence defects during mask overgrowth in order to achieve thin device
    quality III–V layers"
author:
- first_name: Thomas
  full_name: Riedl, Thomas
  id: '36950'
  last_name: Riedl
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Riedl T, Lindner J. Heteroepitaxy of III–V Zinc Blende Semiconductors on Nanopatterned
    Substrates. In: Nanai L, ed. <i>Nanoscaled Films and Layers</i>. InTech; 2017.
    doi:<a href="https://doi.org/10.5772/67572">10.5772/67572</a>'
  apa: Riedl, T., &#38; Lindner, J. (2017). Heteroepitaxy of III–V Zinc Blende Semiconductors
    on Nanopatterned Substrates. In L. Nanai (Ed.), <i>Nanoscaled Films and Layers</i>.
    InTech. <a href="https://doi.org/10.5772/67572">https://doi.org/10.5772/67572</a>
  bibtex: '@inbook{Riedl_Lindner_2017, title={Heteroepitaxy of III–V Zinc Blende Semiconductors
    on Nanopatterned Substrates}, DOI={<a href="https://doi.org/10.5772/67572">10.5772/67572</a>},
    booktitle={Nanoscaled Films and Layers}, publisher={InTech}, author={Riedl, Thomas
    and Lindner, Jörg}, editor={Nanai, L.Editor}, year={2017} }'
  chicago: Riedl, Thomas, and Jörg Lindner. “Heteroepitaxy of III–V Zinc Blende Semiconductors
    on Nanopatterned Substrates.” In <i>Nanoscaled Films and Layers</i>, edited by
    L. Nanai. InTech, 2017. <a href="https://doi.org/10.5772/67572">https://doi.org/10.5772/67572</a>.
  ieee: T. Riedl and J. Lindner, “Heteroepitaxy of III–V Zinc Blende Semiconductors
    on Nanopatterned Substrates,” in <i>Nanoscaled Films and Layers</i>, L. Nanai,
    Ed. InTech, 2017.
  mla: Riedl, Thomas, and Jörg Lindner. “Heteroepitaxy of III–V Zinc Blende Semiconductors
    on Nanopatterned Substrates.” <i>Nanoscaled Films and Layers</i>, edited by L.
    Nanai, InTech, 2017, doi:<a href="https://doi.org/10.5772/67572">10.5772/67572</a>.
  short: 'T. Riedl, J. Lindner, in: L. Nanai (Ed.), Nanoscaled Films and Layers, InTech,
    2017.'
date_created: 2018-08-20T13:09:20Z
date_updated: 2022-01-06T06:59:59Z
department:
- _id: '286'
- _id: '15'
doi: 10.5772/67572
editor:
- first_name: L.
  full_name: Nanai, L.
  last_name: Nanai
language:
- iso: eng
publication: Nanoscaled Films and Layers
publication_identifier:
  isbn:
  - '9789535131434'
  - '9789535131441'
publication_status: published
publisher: InTech
status: public
title: Heteroepitaxy of III–V Zinc Blende Semiconductors on Nanopatterned Substrates
type: book_chapter
user_id: '55706'
year: '2017'
...
---
_id: '3951'
author:
- first_name: Katharina
  full_name: Brassat, Katharina
  id: '11305'
  last_name: Brassat
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Brassat K, Lindner J. Joining self-assembly techniques: A route to hierarchical
    nanopores. In: ; 2017.'
  apa: 'Brassat, K., &#38; Lindner, J. (2017). Joining self-assembly techniques: A
    route to hierarchical nanopores. Presented at the Europhotonics Spring School
    2017, Barcelona (Spain).'
  bibtex: '@inproceedings{Brassat_Lindner_2017, title={Joining self-assembly techniques:
    A route to hierarchical nanopores}, author={Brassat, Katharina and Lindner, Jörg},
    year={2017} }'
  chicago: 'Brassat, Katharina, and Jörg Lindner. “Joining Self-Assembly Techniques:
    A Route to Hierarchical Nanopores,” 2017.'
  ieee: 'K. Brassat and J. Lindner, “Joining self-assembly techniques: A route to
    hierarchical nanopores,” presented at the Europhotonics Spring School 2017, Barcelona
    (Spain), 2017.'
  mla: 'Brassat, Katharina, and Jörg Lindner. <i>Joining Self-Assembly Techniques:
    A Route to Hierarchical Nanopores</i>. 2017.'
  short: 'K. Brassat, J. Lindner, in: 2017.'
conference:
  end_date: 2017-03-24
  location: Barcelona (Spain)
  name: Europhotonics Spring School 2017
  start_date: 2017-03-21
date_created: 2018-08-20T13:17:16Z
date_updated: 2022-01-06T06:59:59Z
department:
- _id: '286'
- _id: '15'
status: public
title: 'Joining self-assembly techniques: A route to hierarchical nanopores'
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '3952'
author:
- first_name: Katharina
  full_name: Brassat, Katharina
  id: '11305'
  last_name: Brassat
- first_name: Daniel
  full_name: Kool, Daniel
  id: '44586'
  last_name: Kool
- first_name: Julius
  full_name: Bürger, Julius
  id: '46952'
  last_name: Bürger
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Brassat K, Kool D, Bürger J, Lindner J. Micro- and nanopatterned surfaces
    with tailored chemical and topographical contrast by self-assembly techniques.
    In: ; 2017.'
  apa: Brassat, K., Kool, D., Bürger, J., &#38; Lindner, J. (2017). Micro- and nanopatterned
    surfaces with tailored chemical and topographical contrast by self-assembly techniques.
    Presented at the E-MRS Fall Meeting 2017, Warsaw (Poland).
  bibtex: '@inproceedings{Brassat_Kool_Bürger_Lindner_2017, title={Micro- and nanopatterned
    surfaces with tailored chemical and topographical contrast by self-assembly techniques},
    author={Brassat, Katharina and Kool, Daniel and Bürger, Julius and Lindner, Jörg},
    year={2017} }'
  chicago: Brassat, Katharina, Daniel Kool, Julius Bürger, and Jörg Lindner. “Micro-
    and Nanopatterned Surfaces with Tailored Chemical and Topographical Contrast by
    Self-Assembly Techniques,” 2017.
  ieee: K. Brassat, D. Kool, J. Bürger, and J. Lindner, “Micro- and nanopatterned
    surfaces with tailored chemical and topographical contrast by self-assembly techniques,”
    presented at the E-MRS Fall Meeting 2017, Warsaw (Poland), 2017.
  mla: Brassat, Katharina, et al. <i>Micro- and Nanopatterned Surfaces with Tailored
    Chemical and Topographical Contrast by Self-Assembly Techniques</i>. 2017.
  short: 'K. Brassat, D. Kool, J. Bürger, J. Lindner, in: 2017.'
conference:
  end_date: 2017-09-21
  location: Warsaw (Poland)
  name: E-MRS Fall Meeting 2017
  start_date: 2017-09-18
date_created: 2018-08-20T13:24:15Z
date_updated: 2022-01-06T06:59:59Z
department:
- _id: '286'
- _id: '15'
status: public
title: Micro- and nanopatterned surfaces with tailored chemical and topographical
  contrast by self-assembly techniques
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '3953'
author:
- first_name: Katharina
  full_name: Brassat, Katharina
  id: '11305'
  last_name: Brassat
- first_name: A.
  full_name: Keller, A.
  last_name: Keller
- first_name: G.
  full_name: Grundmeier, G.
  last_name: Grundmeier
- first_name: W.
  full_name: Bremser, W.
  last_name: Bremser
- first_name: O.
  full_name: Strube, O.
  last_name: Strube
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Brassat K, Keller A, Grundmeier G, Bremser W, Strube O, Lindner J. Tailored
    antidot patterns created by nanosphere lithography for bioapplications. In: ;
    2017.'
  apa: Brassat, K., Keller, A., Grundmeier, G., Bremser, W., Strube, O., &#38; Lindner,
    J. (2017). Tailored antidot patterns created by nanosphere lithography for bioapplications.
    Presented at the E-MRS Spring Meeting 2017, Straßburg (France).
  bibtex: '@inproceedings{Brassat_Keller_Grundmeier_Bremser_Strube_Lindner_2017, title={Tailored
    antidot patterns created by nanosphere lithography for bioapplications}, author={Brassat,
    Katharina and Keller, A. and Grundmeier, G. and Bremser, W. and Strube, O. and
    Lindner, Jörg}, year={2017} }'
  chicago: Brassat, Katharina, A. Keller, G. Grundmeier, W. Bremser, O. Strube, and
    Jörg Lindner. “Tailored Antidot Patterns Created by Nanosphere Lithography for
    Bioapplications,” 2017.
  ieee: K. Brassat, A. Keller, G. Grundmeier, W. Bremser, O. Strube, and J. Lindner,
    “Tailored antidot patterns created by nanosphere lithography for bioapplications,”
    presented at the E-MRS Spring Meeting 2017, Straßburg (France), 2017.
  mla: Brassat, Katharina, et al. <i>Tailored Antidot Patterns Created by Nanosphere
    Lithography for Bioapplications</i>. 2017.
  short: 'K. Brassat, A. Keller, G. Grundmeier, W. Bremser, O. Strube, J. Lindner,
    in: 2017.'
conference:
  end_date: 2017-05-26
  location: Straßburg (France)
  name: E-MRS Spring Meeting 2017
  start_date: 2017-05-22
date_created: 2018-08-20T13:26:32Z
date_updated: 2022-01-06T06:59:59Z
department:
- _id: '286'
- _id: '15'
- _id: '2'
status: public
title: Tailored antidot patterns created by nanosphere lithography for bioapplications
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '3954'
author:
- first_name: Michael
  full_name: Kismann, Michael
  last_name: Kismann
- first_name: Thomas
  full_name: Riedl, Thomas
  id: '36950'
  last_name: Riedl
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: Kismann M, Riedl T, Lindner J. Morphological properties of nanopillar patterned
    Si surfaces obtained by nanosphere lithography and metal-assisted wet-chemical
    etching. 2017.
  apa: Kismann, M., Riedl, T., &#38; Lindner, J. (2017). Morphological properties
    of nanopillar patterned Si surfaces obtained by nanosphere lithography and metal-assisted
    wet-chemical etching. Presented at the E-MRS Spring Meeting 2017, Straßburg (France).
  bibtex: '@article{Kismann_Riedl_Lindner_2017, series={Poster P.9.1}, title={Morphological
    properties of nanopillar patterned Si surfaces obtained by nanosphere lithography
    and metal-assisted wet-chemical etching}, author={Kismann, Michael and Riedl,
    Thomas and Lindner, Jörg}, year={2017}, collection={Poster P.9.1} }'
  chicago: Kismann, Michael, Thomas Riedl, and Jörg Lindner. “Morphological Properties
    of Nanopillar Patterned Si Surfaces Obtained by Nanosphere Lithography and Metal-Assisted
    Wet-Chemical Etching.” Poster P.9.1, 2017.
  ieee: M. Kismann, T. Riedl, and J. Lindner, “Morphological properties of nanopillar
    patterned Si surfaces obtained by nanosphere lithography and metal-assisted wet-chemical
    etching.” 2017.
  mla: Kismann, Michael, et al. <i>Morphological Properties of Nanopillar Patterned
    Si Surfaces Obtained by Nanosphere Lithography and Metal-Assisted Wet-Chemical
    Etching</i>. 2017.
  short: M. Kismann, T. Riedl, J. Lindner, (2017).
conference:
  end_date: 2017-05-26
  location: Straßburg (France)
  name: E-MRS Spring Meeting 2017
  start_date: 2017-05-22
date_created: 2018-08-20T13:28:53Z
date_updated: 2022-01-06T06:59:59Z
department:
- _id: '286'
- _id: '15'
series_title: Poster P.9.1
status: public
title: Morphological properties of nanopillar patterned Si surfaces obtained by nanosphere
  lithography and metal-assisted wet-chemical etching
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '3955'
author:
- first_name: Vinay
  full_name: Kunnathully, Vinay
  last_name: Kunnathully
- first_name: Thomas
  full_name: Riedl, Thomas
  id: '36950'
  last_name: Riedl
- first_name: A.
  full_name: Karlisch, A.
  last_name: Karlisch
- first_name: Dirk
  full_name: Reuter, Dirk
  id: '37763'
  last_name: Reuter
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Kunnathully V, Riedl T, Karlisch A, Reuter D, Lindner J. InAs heteroepitaxy
    on GaAs patterned by nanosphere lithography. In: ; 2017.'
  apa: Kunnathully, V., Riedl, T., Karlisch, A., Reuter, D., &#38; Lindner, J. (2017).
    InAs heteroepitaxy on GaAs patterned by nanosphere lithography. Presented at the
    E-MRS Fall Meeting 2017, Warsaw (Poland).
  bibtex: '@inproceedings{Kunnathully_Riedl_Karlisch_Reuter_Lindner_2017, title={InAs
    heteroepitaxy on GaAs patterned by nanosphere lithography}, author={Kunnathully,
    Vinay and Riedl, Thomas and Karlisch, A. and Reuter, Dirk and Lindner, Jörg},
    year={2017} }'
  chicago: Kunnathully, Vinay, Thomas Riedl, A. Karlisch, Dirk Reuter, and Jörg Lindner.
    “InAs Heteroepitaxy on GaAs Patterned by Nanosphere Lithography,” 2017.
  ieee: V. Kunnathully, T. Riedl, A. Karlisch, D. Reuter, and J. Lindner, “InAs heteroepitaxy
    on GaAs patterned by nanosphere lithography,” presented at the E-MRS Fall Meeting
    2017, Warsaw (Poland), 2017.
  mla: Kunnathully, Vinay, et al. <i>InAs Heteroepitaxy on GaAs Patterned by Nanosphere
    Lithography</i>. 2017.
  short: 'V. Kunnathully, T. Riedl, A. Karlisch, D. Reuter, J. Lindner, in: 2017.'
conference:
  end_date: 2017-09-21
  location: Warsaw (Poland)
  name: E-MRS Fall Meeting 2017
  start_date: 2017-09-18
date_created: 2018-08-20T13:31:50Z
date_updated: 2022-01-06T06:59:59Z
department:
- _id: '286'
- _id: '292'
- _id: '15'
status: public
title: InAs heteroepitaxy on GaAs patterned by nanosphere lithography
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '3987'
author:
- first_name: Thomas
  full_name: Riedl, Thomas
  id: '36950'
  last_name: Riedl
- first_name: 'Vinay '
  full_name: 'Kunnathully, Vinay '
  last_name: Kunnathully
- first_name: A.
  full_name: Karlisch, A.
  last_name: Karlisch
- first_name: Dirk
  full_name: Reuter, Dirk
  id: '37763'
  last_name: Reuter
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Riedl T, Kunnathully V, Karlisch A, Reuter D, Lindner J. Group III arsenide
    heteroepitaxy on Si(111) using SiNx nanohole masks patterned by nanosphere lithography.
    In: ; 2017.'
  apa: Riedl, T., Kunnathully, V., Karlisch, A., Reuter, D., &#38; Lindner, J. (2017).
    Group III arsenide heteroepitaxy on Si(111) using SiNx nanohole masks patterned
    by nanosphere lithography. Presented at the E-MRS Fall Meeting 2017, Warsaq (Poland).
  bibtex: '@inproceedings{Riedl_Kunnathully_Karlisch_Reuter_Lindner_2017, title={Group
    III arsenide heteroepitaxy on Si(111) using SiNx nanohole masks patterned by nanosphere
    lithography}, author={Riedl, Thomas and Kunnathully, Vinay  and Karlisch, A. and
    Reuter, Dirk and Lindner, Jörg}, year={2017} }'
  chicago: Riedl, Thomas, Vinay  Kunnathully, A. Karlisch, Dirk Reuter, and Jörg Lindner.
    “Group III Arsenide Heteroepitaxy on Si(111) Using SiNx Nanohole Masks Patterned
    by Nanosphere Lithography,” 2017.
  ieee: T. Riedl, V. Kunnathully, A. Karlisch, D. Reuter, and J. Lindner, “Group III
    arsenide heteroepitaxy on Si(111) using SiNx nanohole masks patterned by nanosphere
    lithography,” presented at the E-MRS Fall Meeting 2017, Warsaq (Poland), 2017.
  mla: Riedl, Thomas, et al. <i>Group III Arsenide Heteroepitaxy on Si(111) Using
    SiNx Nanohole Masks Patterned by Nanosphere Lithography</i>. 2017.
  short: 'T. Riedl, V. Kunnathully, A. Karlisch, D. Reuter, J. Lindner, in: 2017.'
conference:
  end_date: 2017-09-21
  location: Warsaq (Poland)
  name: E-MRS Fall Meeting 2017
  start_date: 2017-09-18
date_created: 2018-08-21T11:35:05Z
date_updated: 2022-01-06T07:00:04Z
department:
- _id: '292'
- _id: '286'
- _id: '15'
language:
- iso: eng
publication_status: published
status: public
title: Group III arsenide heteroepitaxy on Si(111) using SiNx nanohole masks patterned
  by nanosphere lithography
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '3988'
author:
- first_name: Thomas
  full_name: Riedl, Thomas
  id: '36950'
  last_name: Riedl
- first_name: Vinay
  full_name: Kunnathully, Vinay
  last_name: Kunnathully
- first_name: A.
  full_name: Karlisch, A.
  last_name: Karlisch
- first_name: Dirk
  full_name: Reuter, Dirk
  id: '37763'
  last_name: Reuter
- first_name: N.
  full_name: Weber, N.
  last_name: Weber
- first_name: Cedrik
  full_name: Meier, Cedrik
  id: '20798'
  last_name: Meier
  orcid: https://orcid.org/0000-0002-3787-3572
- first_name: R.
  full_name: Schierholz, R.
  last_name: Schierholz
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: Riedl T, Kunnathully V, Karlisch A, et al. Morphology, structure and enhanced
    PL of molecular beam epitaxial In0.2Ga0.8As layers on nanopillar patterned GaAs.
    2017.
  apa: Riedl, T., Kunnathully, V., Karlisch, A., Reuter, D., Weber, N., Meier, C.,
    … Lindner, J. (2017). Morphology, structure and enhanced PL of molecular beam
    epitaxial In0.2Ga0.8As layers on nanopillar patterned GaAs. Presented at the E-MRS
    Spring Meeting 2017, Straßburg (France).
  bibtex: '@article{Riedl_Kunnathully_Karlisch_Reuter_Weber_Meier_Schierholz_Lindner_2017,
    series={contributed talk N.16.1}, title={Morphology, structure and enhanced PL
    of molecular beam epitaxial In0.2Ga0.8As layers on nanopillar patterned GaAs},
    author={Riedl, Thomas and Kunnathully, Vinay and Karlisch, A. and Reuter, Dirk
    and Weber, N. and Meier, Cedrik and Schierholz, R. and Lindner, Jörg}, year={2017},
    collection={contributed talk N.16.1} }'
  chicago: Riedl, Thomas, Vinay Kunnathully, A. Karlisch, Dirk Reuter, N. Weber, Cedrik
    Meier, R. Schierholz, and Jörg Lindner. “Morphology, Structure and Enhanced PL
    of Molecular Beam Epitaxial In0.2Ga0.8As Layers on Nanopillar Patterned GaAs.”
    Contributed Talk N.16.1, 2017.
  ieee: T. Riedl <i>et al.</i>, “Morphology, structure and enhanced PL of molecular
    beam epitaxial In0.2Ga0.8As layers on nanopillar patterned GaAs.” 2017.
  mla: Riedl, Thomas, et al. <i>Morphology, Structure and Enhanced PL of Molecular
    Beam Epitaxial In0.2Ga0.8As Layers on Nanopillar Patterned GaAs</i>. 2017.
  short: T. Riedl, V. Kunnathully, A. Karlisch, D. Reuter, N. Weber, C. Meier, R.
    Schierholz, J. Lindner, (2017).
conference:
  end_date: 2017-05-26
  location: Straßburg (France)
  name: E-MRS Spring Meeting 2017
  start_date: 2017-05-22
date_created: 2018-08-21T11:39:30Z
date_updated: 2022-01-06T07:00:04Z
department:
- _id: '286'
- _id: '292'
- _id: '287'
- _id: '15'
- _id: '35'
- _id: '230'
language:
- iso: eng
series_title: contributed talk N.16.1
status: public
title: Morphology, structure and enhanced PL of molecular beam epitaxial In0.2Ga0.8As
  layers on nanopillar patterned GaAs
type: conference
user_id: '20798'
year: '2017'
...
---
_id: '3989'
author:
- first_name: Thomas
  full_name: Riedl, Thomas
  id: '36950'
  last_name: Riedl
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: Riedl T, Lindner J. Strain and strain energy in axial-heteroepitaxial GaAs/InAs
    nanopillars analyzed by atomistic and continuum elastic calculations. 2017.
  apa: Riedl, T., &#38; Lindner, J. (2017). Strain and strain energy in axial-heteroepitaxial
    GaAs/InAs nanopillars analyzed by atomistic and continuum elastic calculations.
    Presented at the E-MRS Spring Meeting 2017, Strasburg (France).
  bibtex: '@article{Riedl_Lindner_2017, series={poster N.15.54}, title={Strain and
    strain energy in axial-heteroepitaxial GaAs/InAs nanopillars analyzed by atomistic
    and continuum elastic calculations}, author={Riedl, Thomas and Lindner, Jörg},
    year={2017}, collection={poster N.15.54} }'
  chicago: Riedl, Thomas, and Jörg Lindner. “Strain and Strain Energy in Axial-Heteroepitaxial
    GaAs/InAs Nanopillars Analyzed by Atomistic and Continuum Elastic Calculations.”
    Poster N.15.54, 2017.
  ieee: T. Riedl and J. Lindner, “Strain and strain energy in axial-heteroepitaxial
    GaAs/InAs nanopillars analyzed by atomistic and continuum elastic calculations.”
    2017.
  mla: Riedl, Thomas, and Jörg Lindner. <i>Strain and Strain Energy in Axial-Heteroepitaxial
    GaAs/InAs Nanopillars Analyzed by Atomistic and Continuum Elastic Calculations</i>.
    2017.
  short: T. Riedl, J. Lindner, (2017).
conference:
  end_date: 2017-05-26
  location: Strasburg (France)
  name: E-MRS Spring Meeting 2017
  start_date: 2017-05-22
date_created: 2018-08-21T11:41:36Z
date_updated: 2022-01-06T07:00:04Z
department:
- _id: '286'
- _id: '15'
series_title: poster N.15.54
status: public
title: Strain and strain energy in axial-heteroepitaxial GaAs/InAs nanopillars analyzed
  by atomistic and continuum elastic calculations
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '3990'
author:
- first_name: Thomas
  full_name: Riedl, Thomas
  last_name: Riedl
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: Riedl T, Lindner J. The influence of the sphere material on the opening size
    distribution of nanosphere lithography masks. 2017.
  apa: Riedl, T., &#38; Lindner, J. (2017). The influence of the sphere material on
    the opening size distribution of nanosphere lithography masks. Presented at the
    E-MRS Spring Meeting 2017, Strasburg (France).
  bibtex: '@article{Riedl_Lindner_2017, series={poster V.14.62}, title={The influence
    of the sphere material on the opening size distribution of nanosphere lithography
    masks}, author={Riedl, Thomas and Lindner, Jörg}, year={2017}, collection={poster
    V.14.62} }'
  chicago: Riedl, Thomas, and Jörg Lindner. “The Influence of the Sphere Material
    on the Opening Size Distribution of Nanosphere Lithography Masks.” Poster V.14.62,
    2017.
  ieee: T. Riedl and J. Lindner, “The influence of the sphere material on the opening
    size distribution of nanosphere lithography masks.” 2017.
  mla: Riedl, Thomas, and Jörg Lindner. <i>The Influence of the Sphere Material on
    the Opening Size Distribution of Nanosphere Lithography Masks</i>. 2017.
  short: T. Riedl, J. Lindner, (2017).
conference:
  end_date: 2017-05-26
  location: Strasburg (France)
  name: E-MRS Spring Meeting 2017
  start_date: 2017-05-22
date_created: 2018-08-21T11:43:10Z
date_updated: 2022-01-06T07:00:05Z
department:
- _id: '286'
- _id: '15'
language:
- iso: eng
series_title: poster V.14.62
status: public
title: The influence of the sphere material on the opening size distribution of nanosphere
  lithography masks
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '3991'
author:
- first_name: Thomas
  full_name: Riedl, Thomas
  id: '36950'
  last_name: Riedl
- first_name: Vinay
  full_name: Kunnathully, Vinay
  last_name: Kunnathully
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: Riedl T, Kunnathully V, Lindner J. Evolution of the opening size of nanosphere
    lithography masks during thermal annealing. 2017.
  apa: Riedl, T., Kunnathully, V., &#38; Lindner, J. (2017). Evolution of the opening
    size of nanosphere lithography masks during thermal annealing. Presented at the
    E-MRS Spring Meeting 2017, Straßburg (France).
  bibtex: '@article{Riedl_Kunnathully_Lindner_2017, series={poster V.14.72}, title={Evolution
    of the opening size of nanosphere lithography masks during thermal annealing},
    author={Riedl, Thomas and Kunnathully, Vinay and Lindner, Jörg}, year={2017},
    collection={poster V.14.72} }'
  chicago: Riedl, Thomas, Vinay Kunnathully, and Jörg Lindner. “Evolution of the Opening
    Size of Nanosphere Lithography Masks during Thermal Annealing.” Poster V.14.72,
    2017.
  ieee: T. Riedl, V. Kunnathully, and J. Lindner, “Evolution of the opening size of
    nanosphere lithography masks during thermal annealing.” 2017.
  mla: Riedl, Thomas, et al. <i>Evolution of the Opening Size of Nanosphere Lithography
    Masks during Thermal Annealing</i>. 2017.
  short: T. Riedl, V. Kunnathully, J. Lindner, (2017).
conference:
  end_date: 2017-05-26
  location: Straßburg (France)
  name: E-MRS Spring Meeting 2017
  start_date: 2017-05-22
date_created: 2018-08-21T11:44:47Z
date_updated: 2022-01-06T07:00:05Z
department:
- _id: '286'
- _id: '15'
language:
- iso: eng
series_title: poster V.14.72
status: public
title: Evolution of the opening size of nanosphere lithography masks during thermal
  annealing
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '3992'
author:
- first_name: Torsten
  full_name: Rieger, Torsten
  last_name: Rieger
- first_name: Thomas
  full_name: Riedl, Thomas
  id: '36950'
  last_name: Riedl
- first_name: Elmar
  full_name: Neumann, Elmar
  last_name: Neumann
- first_name: Detlev
  full_name: Grützmacher, Detlev
  last_name: Grützmacher
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
- first_name: Alexander
  full_name: Pawlis, Alexander
  last_name: Pawlis
citation:
  ama: 'Rieger T, Riedl T, Neumann E, Grützmacher D, Lindner J, Pawlis A. Strain Compensation
    in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental Evidence.
    <i>ACS Applied Materials &#38; Interfaces</i>. 2017;9(9):8371-8377. doi:<a href="https://doi.org/10.1021/acsami.6b15824">10.1021/acsami.6b15824</a>'
  apa: 'Rieger, T., Riedl, T., Neumann, E., Grützmacher, D., Lindner, J., &#38; Pawlis,
    A. (2017). Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model
    and Experimental Evidence. <i>ACS Applied Materials &#38; Interfaces</i>, <i>9</i>(9),
    8371–8377. <a href="https://doi.org/10.1021/acsami.6b15824">https://doi.org/10.1021/acsami.6b15824</a>'
  bibtex: '@article{Rieger_Riedl_Neumann_Grützmacher_Lindner_Pawlis_2017, title={Strain
    Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental
    Evidence}, volume={9}, DOI={<a href="https://doi.org/10.1021/acsami.6b15824">10.1021/acsami.6b15824</a>},
    number={9}, journal={ACS Applied Materials &#38; Interfaces}, publisher={American
    Chemical Society (ACS)}, author={Rieger, Torsten and Riedl, Thomas and Neumann,
    Elmar and Grützmacher, Detlev and Lindner, Jörg and Pawlis, Alexander}, year={2017},
    pages={8371–8377} }'
  chicago: 'Rieger, Torsten, Thomas Riedl, Elmar Neumann, Detlev Grützmacher, Jörg
    Lindner, and Alexander Pawlis. “Strain Compensation in Single ZnSe/CdSe Quantum
    Wells: Analytical Model and Experimental Evidence.” <i>ACS Applied Materials &#38;
    Interfaces</i> 9, no. 9 (2017): 8371–77. <a href="https://doi.org/10.1021/acsami.6b15824">https://doi.org/10.1021/acsami.6b15824</a>.'
  ieee: 'T. Rieger, T. Riedl, E. Neumann, D. Grützmacher, J. Lindner, and A. Pawlis,
    “Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and Experimental
    Evidence,” <i>ACS Applied Materials &#38; Interfaces</i>, vol. 9, no. 9, pp. 8371–8377,
    2017.'
  mla: 'Rieger, Torsten, et al. “Strain Compensation in Single ZnSe/CdSe Quantum Wells:
    Analytical Model and Experimental Evidence.” <i>ACS Applied Materials &#38; Interfaces</i>,
    vol. 9, no. 9, American Chemical Society (ACS), 2017, pp. 8371–77, doi:<a href="https://doi.org/10.1021/acsami.6b15824">10.1021/acsami.6b15824</a>.'
  short: T. Rieger, T. Riedl, E. Neumann, D. Grützmacher, J. Lindner, A. Pawlis, ACS
    Applied Materials &#38; Interfaces 9 (2017) 8371–8377.
date_created: 2018-08-21T11:45:23Z
date_updated: 2022-01-06T07:00:05Z
department:
- _id: '286'
- _id: '15'
doi: 10.1021/acsami.6b15824
intvolume: '         9'
issue: '9'
page: 8371-8377
publication: ACS Applied Materials & Interfaces
publication_identifier:
  issn:
  - 1944-8244
  - 1944-8252
publication_status: published
publisher: American Chemical Society (ACS)
status: public
title: 'Strain Compensation in Single ZnSe/CdSe Quantum Wells: Analytical Model and
  Experimental Evidence'
type: journal_article
user_id: '55706'
volume: 9
year: '2017'
...
---
_id: '3999'
author:
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
- first_name: Thomas
  full_name: Riedl, Thomas
  id: '36950'
  last_name: Riedl
citation:
  ama: 'Lindner J, Riedl T. Strain effects on the heteroepitaxy of III-V compound
    semiconductors on nanopatterned surfaces. In: ; 2017.'
  apa: Lindner, J., &#38; Riedl, T. (2017). Strain effects on the heteroepitaxy of
    III-V compound semiconductors on nanopatterned surfaces. Presented at the E-MRS
    Fall Meeting 2017, Warsaw ( Poland).
  bibtex: '@inproceedings{Lindner_Riedl_2017, title={Strain effects on the heteroepitaxy
    of III-V compound semiconductors on nanopatterned surfaces}, author={Lindner,
    Jörg and Riedl, Thomas}, year={2017} }'
  chicago: Lindner, Jörg, and Thomas Riedl. “Strain Effects on the Heteroepitaxy of
    III-V Compound Semiconductors on Nanopatterned Surfaces,” 2017.
  ieee: J. Lindner and T. Riedl, “Strain effects on the heteroepitaxy of III-V compound
    semiconductors on nanopatterned surfaces,” presented at the E-MRS Fall Meeting
    2017, Warsaw ( Poland), 2017.
  mla: Lindner, Jörg, and Thomas Riedl. <i>Strain Effects on the Heteroepitaxy of
    III-V Compound Semiconductors on Nanopatterned Surfaces</i>. 2017.
  short: 'J. Lindner, T. Riedl, in: 2017.'
conference:
  end_date: 2017-09-21
  location: Warsaw ( Poland)
  name: E-MRS Fall Meeting 2017
  start_date: 2017-09-18
date_created: 2018-08-21T12:06:17Z
date_updated: 2022-01-06T07:00:06Z
department:
- _id: '286'
- _id: '15'
language:
- iso: eng
status: public
title: Strain effects on the heteroepitaxy of III-V compound semiconductors on nanopatterned
  surfaces
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '4000'
author:
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Lindner J. Ion Beam Modification of Self-Organized Nanostructures. In: ; 2017.'
  apa: Lindner, J. (2017). Ion Beam Modification of Self-Organized Nanostructures.
    Presented at the International Workshop on Inelastic Ion-Surface Collisions, Dresden
    (Germany).
  bibtex: '@inproceedings{Lindner_2017, title={Ion Beam Modification of Self-Organized
    Nanostructures}, author={Lindner, Jörg}, year={2017} }'
  chicago: Lindner, Jörg. “Ion Beam Modification of Self-Organized Nanostructures,”
    2017.
  ieee: J. Lindner, “Ion Beam Modification of Self-Organized Nanostructures,” presented
    at the International Workshop on Inelastic Ion-Surface Collisions, Dresden (Germany),
    2017.
  mla: Lindner, Jörg. <i>Ion Beam Modification of Self-Organized Nanostructures</i>.
    2017.
  short: 'J. Lindner, in: 2017.'
conference:
  end_date: 2017-09-22
  location: Dresden (Germany)
  name: International Workshop on Inelastic Ion-Surface Collisions
  start_date: 2017-09-17
date_created: 2018-08-21T12:07:53Z
date_updated: 2022-01-06T07:00:06Z
department:
- _id: '286'
- _id: '15'
language:
- iso: eng
status: public
title: Ion Beam Modification of Self-Organized Nanostructures
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '4001'
author:
- first_name: Katharina
  full_name: Brassat, Katharina
  id: '11305'
  last_name: Brassat
- first_name: A.
  full_name: Keller, A.
  last_name: Keller
- first_name: 'G. '
  full_name: 'Grundmeier, G. '
  last_name: Grundmeier
- first_name: W.
  full_name: Bremser, W.
  last_name: Bremser
- first_name: O.
  full_name: Strube, O.
  last_name: Strube
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Brassat K, Keller A, Grundmeier G, Bremser W, Strube O, Lindner J. Bioinspired
    material design by hierarchical self-assembly on prepatterned surfaces . In: ;
    2017.'
  apa: Brassat, K., Keller, A., Grundmeier, G., Bremser, W., Strube, O., &#38; Lindner,
    J. (2017). Bioinspired material design by hierarchical self-assembly on prepatterned
    surfaces . Presented at the E-MRS Spring Meeting 2017, Straßbourg (France).
  bibtex: '@inproceedings{Brassat_Keller_Grundmeier_Bremser_Strube_Lindner_2017, title={Bioinspired
    material design by hierarchical self-assembly on prepatterned surfaces }, author={Brassat,
    Katharina and Keller, A. and Grundmeier, G.  and Bremser, W. and Strube, O. and
    Lindner, Jörg}, year={2017} }'
  chicago: Brassat, Katharina, A. Keller, G.  Grundmeier, W. Bremser, O. Strube, and
    Jörg Lindner. “Bioinspired Material Design by Hierarchical Self-Assembly on Prepatterned
    Surfaces ,” 2017.
  ieee: K. Brassat, A. Keller, G. Grundmeier, W. Bremser, O. Strube, and J. Lindner,
    “Bioinspired material design by hierarchical self-assembly on prepatterned surfaces
    ,” presented at the E-MRS Spring Meeting 2017, Straßbourg (France), 2017.
  mla: Brassat, Katharina, et al. <i>Bioinspired Material Design by Hierarchical Self-Assembly
    on Prepatterned Surfaces </i>. 2017.
  short: 'K. Brassat, A. Keller, G. Grundmeier, W. Bremser, O. Strube, J. Lindner,
    in: 2017.'
conference:
  end_date: 2017-05-26
  location: Straßbourg (France)
  name: E-MRS Spring Meeting 2017
  start_date: 2017-05-22
date_created: 2018-08-21T12:10:02Z
date_updated: 2022-01-06T07:00:06Z
department:
- _id: '286'
- _id: '15'
language:
- iso: eng
status: public
title: 'Bioinspired material design by hierarchical self-assembly on prepatterned
  surfaces '
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '4003'
author:
- first_name: Katharina
  full_name: Brassat, Katharina
  id: '11305'
  last_name: Brassat
- first_name: Christoph
  full_name: Brodehl, Christoph
  id: '30380'
  last_name: Brodehl
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Brassat K, Brodehl C, Lindner J. Regular surface nanopatterning with nanosphere
    lithography, block copolymer lithography and cominations of both. In: ; 2017.'
  apa: Brassat, K., Brodehl, C., &#38; Lindner, J. (2017). Regular surface nanopatterning
    with nanosphere lithography, block copolymer lithography and cominations of both.
    Presented at the BraMat 2017, Brasov (Romania).
  bibtex: '@inproceedings{Brassat_Brodehl_Lindner_2017, title={Regular surface nanopatterning
    with nanosphere lithography, block copolymer lithography and cominations of both},
    author={Brassat, Katharina and Brodehl, Christoph and Lindner, Jörg}, year={2017}
    }'
  chicago: Brassat, Katharina, Christoph Brodehl, and Jörg Lindner. “Regular Surface
    Nanopatterning with Nanosphere Lithography, Block Copolymer Lithography and Cominations
    of Both,” 2017.
  ieee: K. Brassat, C. Brodehl, and J. Lindner, “Regular surface nanopatterning with
    nanosphere lithography, block copolymer lithography and cominations of both,”
    presented at the BraMat 2017, Brasov (Romania), 2017.
  mla: Brassat, Katharina, et al. <i>Regular Surface Nanopatterning with Nanosphere
    Lithography, Block Copolymer Lithography and Cominations of Both</i>. 2017.
  short: 'K. Brassat, C. Brodehl, J. Lindner, in: 2017.'
conference:
  end_date: 2017-03-11
  location: Brasov (Romania)
  name: BraMat 2017
  start_date: 2017-03-09
date_created: 2018-08-21T12:13:19Z
date_updated: 2022-01-06T07:00:06Z
department:
- _id: '286'
- _id: '15'
language:
- iso: eng
status: public
title: Regular surface nanopatterning with nanosphere lithography, block copolymer
  lithography and cominations of both
type: conference
user_id: '55706'
year: '2017'
...
---
_id: '3997'
abstract:
- lang: eng
  text: "Switchable two dimensional liquid crystal diffraction gratings are promising
    can-\r\ndidates in beam steering devices, multiplexers and holographic displays.
    For these areas of applications a high degree of integration in optical systems
    is much sought-after. In the context of diffraction gratings this means that the
    angle of diffraction should be rather high, which typically poses a problem as
    the fabrication of small grating periods is challenging. In this paper, we propose
    the use of nanosphere lithography (NSL) for the fabrication of two-dimensionally\r\nstructured
    electrodes with a periodicity of a few micrometers. NSL is based on the self-assembly
    of micro- or nanometer sized spheres into monolayers. It allows for easy substrate
    structuring on wafer scale. The manufactured electrode is combined with a liquid
    crystalline polymer-stabilized blue phase, which facilitates sub-millisecond electrical
    switching of the diffraction efficiency at adiffractionangle of 21.4°."
article_type: original
author:
- first_name: M.
  full_name: Wahle, M.
  last_name: Wahle
- first_name: Katharina
  full_name: Brassat, Katharina
  id: '11305'
  last_name: Brassat
- first_name: J.
  full_name: Ebel, J.
  last_name: Ebel
- first_name: Julius
  full_name: Bürger, Julius
  id: '46952'
  last_name: Bürger
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
- first_name: Heinz-Siegfried
  full_name: Kitzerow, Heinz-Siegfried
  id: '254'
  last_name: Kitzerow
citation:
  ama: Wahle M, Brassat K, Ebel J, Bürger J, Lindner J, Kitzerow H-S. Two-dimensional
    switchable blue phase gratings manufactured by nanosphere lithography. <i>Optics
    Express 25</i>. 2017;25(19):22608-22619. doi:<a href="https://doi.org/10.1364/OE.25.022607">10.1364/OE.25.022607</a>
  apa: Wahle, M., Brassat, K., Ebel, J., Bürger, J., Lindner, J., &#38; Kitzerow,
    H.-S. (2017). Two-dimensional switchable blue phase gratings manufactured by nanosphere
    lithography. <i>Optics Express 25</i>, <i>25</i>(19), 22608–22619. <a href="https://doi.org/10.1364/OE.25.022607">https://doi.org/10.1364/OE.25.022607</a>
  bibtex: '@article{Wahle_Brassat_Ebel_Bürger_Lindner_Kitzerow_2017, title={Two-dimensional
    switchable blue phase gratings manufactured by nanosphere lithography}, volume={25},
    DOI={<a href="https://doi.org/10.1364/OE.25.022607">10.1364/OE.25.022607</a>},
    number={19}, journal={Optics Express 25}, author={Wahle, M. and Brassat, Katharina
    and Ebel, J. and Bürger, Julius and Lindner, Jörg and Kitzerow, Heinz-Siegfried},
    year={2017}, pages={22608–22619} }'
  chicago: 'Wahle, M., Katharina Brassat, J. Ebel, Julius Bürger, Jörg Lindner, and
    Heinz-Siegfried Kitzerow. “Two-Dimensional Switchable Blue Phase Gratings Manufactured
    by Nanosphere Lithography.” <i>Optics Express 25</i> 25, no. 19 (2017): 22608–19.
    <a href="https://doi.org/10.1364/OE.25.022607">https://doi.org/10.1364/OE.25.022607</a>.'
  ieee: 'M. Wahle, K. Brassat, J. Ebel, J. Bürger, J. Lindner, and H.-S. Kitzerow,
    “Two-dimensional switchable blue phase gratings manufactured by nanosphere lithography,”
    <i>Optics Express 25</i>, vol. 25, no. 19, pp. 22608–22619, 2017, doi: <a href="https://doi.org/10.1364/OE.25.022607">10.1364/OE.25.022607</a>.'
  mla: Wahle, M., et al. “Two-Dimensional Switchable Blue Phase Gratings Manufactured
    by Nanosphere Lithography.” <i>Optics Express 25</i>, vol. 25, no. 19, 2017, pp.
    22608–19, doi:<a href="https://doi.org/10.1364/OE.25.022607">10.1364/OE.25.022607</a>.
  short: M. Wahle, K. Brassat, J. Ebel, J. Bürger, J. Lindner, H.-S. Kitzerow, Optics
    Express 25 25 (2017) 22608–22619.
date_created: 2018-08-21T12:04:28Z
date_updated: 2023-01-10T13:16:11Z
ddc:
- '530'
department:
- _id: '2'
- _id: '286'
- _id: '230'
- _id: '15'
- _id: '313'
doi: 10.1364/OE.25.022607
file:
- access_level: closed
  content_type: application/pdf
  creator: hclaudia
  date_created: 2018-08-21T12:02:06Z
  date_updated: 2018-08-21T12:02:06Z
  file_id: '3998'
  file_name: Two-dimensional switchable blue phase gratings manufactured by nanosphere
    lithography.pdf
  file_size: 4327427
  relation: main_file
  success: 1
file_date_updated: 2018-08-21T12:02:06Z
has_accepted_license: '1'
intvolume: '        25'
issue: '19'
language:
- iso: eng
page: 22608-22619
publication: Optics Express 25
publication_status: published
status: public
title: Two-dimensional switchable blue phase gratings manufactured by nanosphere lithography
type: journal_article
user_id: '14931'
volume: 25
year: '2017'
...
---
_id: '4002'
author:
- first_name: Heinz-Siegfried
  full_name: Kitzerow, Heinz-Siegfried
  id: '254'
  last_name: Kitzerow
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: 'Kitzerow H-S, Lindner J. Plasmonic nanostructures: spectroscopy and electron
    microscopy. In: ; 2017.'
  apa: 'Kitzerow, H.-S., &#38; Lindner, J. (2017). <i>Plasmonic nanostructures: spectroscopy
    and electron microscopy</i>. Europhotonics Spring School 2017, Barcelona (Spain).'
  bibtex: '@inproceedings{Kitzerow_Lindner_2017, title={Plasmonic nanostructures:
    spectroscopy and electron microscopy}, author={Kitzerow, Heinz-Siegfried and Lindner,
    Jörg}, year={2017} }'
  chicago: 'Kitzerow, Heinz-Siegfried, and Jörg Lindner. “Plasmonic Nanostructures:
    Spectroscopy and Electron Microscopy,” 2017.'
  ieee: 'H.-S. Kitzerow and J. Lindner, “Plasmonic nanostructures: spectroscopy and
    electron microscopy,” presented at the Europhotonics Spring School 2017, Barcelona
    (Spain), 2017.'
  mla: 'Kitzerow, Heinz-Siegfried, and Jörg Lindner. <i>Plasmonic Nanostructures:
    Spectroscopy and Electron Microscopy</i>. 2017.'
  short: 'H.-S. Kitzerow, J. Lindner, in: 2017.'
conference:
  end_date: 2017-03-24
  location: Barcelona (Spain)
  name: Europhotonics Spring School 2017
  start_date: 2017-03-21
date_created: 2018-08-21T12:11:46Z
date_updated: 2023-01-24T17:21:44Z
department:
- _id: '286'
- _id: '15'
- _id: '313'
- _id: '230'
language:
- iso: eng
status: public
title: 'Plasmonic nanostructures: spectroscopy and electron microscopy'
type: conference
user_id: '254'
year: '2017'
...
---
_id: '3956'
abstract:
- lang: eng
  text: "In this article we present an integration technique for low-voltage DNTT-based
    TFTs for flexible electronic applications.\r\nTherefore, a high-k nanocomposite
    combining the flexibility of its polymericmatrix and the high permittivity\r\nof
    the incorporated inorganic material was used as gate dielectric layer. The influence
    of a conventional\r\nphotolithography process upon the dielectric layer is analyzed
    regarding electrical instabilities in the device characteristics.\r\nThe impact
    of an implemented sacrificial layer to reduce chemical stress to the insulating
    film during\r\nphotolithography is evaluated. Furthermore, first inverter circuits
    were integrated and electrically characterized.\r\nAdditionally, the implementation
    of this sacrificial layer can be used for future complementary circuit design."
article_type: original
author:
- first_name: Thorsten
  full_name: Meyers, Thorsten
  last_name: Meyers
- first_name: Fábio F.
  full_name: Vidor, Fábio F.
  last_name: Vidor
- first_name: Katharina
  full_name: Brassat, Katharina
  id: '11305'
  last_name: Brassat
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
- first_name: Ulrich
  full_name: Hilleringmann, Ulrich
  last_name: Hilleringmann
citation:
  ama: Meyers T, Vidor FF, Brassat K, Lindner J, Hilleringmann U. Low-voltage DNTT-based
    thin-film transistors and inverters for flexible electronics. <i>Microelectronic
    Engineering</i>. 2016;174:35-39. doi:<a href="https://doi.org/10.1016/j.mee.2016.12.018">10.1016/j.mee.2016.12.018</a>
  apa: Meyers, T., Vidor, F. F., Brassat, K., Lindner, J., &#38; Hilleringmann, U.
    (2016). Low-voltage DNTT-based thin-film transistors and inverters for flexible
    electronics. <i>Microelectronic Engineering</i>, <i>174</i>, 35–39. <a href="https://doi.org/10.1016/j.mee.2016.12.018">https://doi.org/10.1016/j.mee.2016.12.018</a>
  bibtex: '@article{Meyers_Vidor_Brassat_Lindner_Hilleringmann_2016, title={Low-voltage
    DNTT-based thin-film transistors and inverters for flexible electronics}, volume={174},
    DOI={<a href="https://doi.org/10.1016/j.mee.2016.12.018">10.1016/j.mee.2016.12.018</a>},
    journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Meyers,
    Thorsten and Vidor, Fábio F. and Brassat, Katharina and Lindner, Jörg and Hilleringmann,
    Ulrich}, year={2016}, pages={35–39} }'
  chicago: 'Meyers, Thorsten, Fábio F. Vidor, Katharina Brassat, Jörg Lindner, and
    Ulrich Hilleringmann. “Low-Voltage DNTT-Based Thin-Film Transistors and Inverters
    for Flexible Electronics.” <i>Microelectronic Engineering</i> 174 (2016): 35–39.
    <a href="https://doi.org/10.1016/j.mee.2016.12.018">https://doi.org/10.1016/j.mee.2016.12.018</a>.'
  ieee: T. Meyers, F. F. Vidor, K. Brassat, J. Lindner, and U. Hilleringmann, “Low-voltage
    DNTT-based thin-film transistors and inverters for flexible electronics,” <i>Microelectronic
    Engineering</i>, vol. 174, pp. 35–39, 2016.
  mla: Meyers, Thorsten, et al. “Low-Voltage DNTT-Based Thin-Film Transistors and
    Inverters for Flexible Electronics.” <i>Microelectronic Engineering</i>, vol.
    174, Elsevier BV, 2016, pp. 35–39, doi:<a href="https://doi.org/10.1016/j.mee.2016.12.018">10.1016/j.mee.2016.12.018</a>.
  short: T. Meyers, F.F. Vidor, K. Brassat, J. Lindner, U. Hilleringmann, Microelectronic
    Engineering 174 (2016) 35–39.
date_created: 2018-08-20T13:33:05Z
date_updated: 2022-01-06T07:00:00Z
ddc:
- '530'
department:
- _id: '286'
- _id: '15'
doi: 10.1016/j.mee.2016.12.018
file:
- access_level: closed
  content_type: application/pdf
  creator: hclaudia
  date_created: 2018-08-20T13:35:02Z
  date_updated: 2018-08-20T13:35:02Z
  file_id: '3957'
  file_name: Now-voltage DNTT-based thin-film transistors and inverters for flexible
    electronics.pdf
  file_size: 758984
  relation: main_file
  success: 1
file_date_updated: 2018-08-20T13:35:02Z
has_accepted_license: '1'
intvolume: '       174'
language:
- iso: eng
page: 35-39
publication: Microelectronic Engineering
publication_identifier:
  issn:
  - 0167-9317
publication_status: published
publisher: Elsevier BV
status: public
title: Low-voltage DNTT-based thin-film transistors and inverters for flexible electronics
type: journal_article
user_id: '55706'
volume: 174
year: '2016'
...