@article{20944,
  abstract     = {{Joining metals using electrochemical support (ECUF) is a new process for cold pressure welding sheets and parts. This new process is based on an electrochemical in-line surface treatment followed by incremental pilger rolling. The ECUF process intends to cold pressure weld materials under optimized conditions. Oxide layers on metal surfaces are known to inhibit the formation of cold pressure welds. The in-line electrochemical treatment will be used to remove these surface oxides for specific engineering metals and alloys. Hence, an improved pressure weld formation at lower forces and smaller reduction ratios is expected for the electrochemically treated surfaces. Using a more flexible pressure welding process, the number of applications could be greatly improved. First tests with copper were performed to analyse the efficiency of the proposed electrochemical surface treatments. Two electrochemical treatments, the cathodic oxide-reduction and cyclovoltammetric oxide-reduction, were compared with conventional treatments (degreasing and scratch brushing) regarding their influence on the cold pressure welding process of copper. The weld strength of lap welds has been investigated as well as the necessary reduction threshold to form a weld. It was found that the electrochemical oxide reduction resulted in higher weld strength. The results of scanning electron microscopy (SEM) and energy dispersive analysis of X-rays (EDX) indicate that surface oxides were successfully removed by the electrochemical surface treatments. (C) 2014 Elsevier B.V. All rights reserved.}},
  author       = {{Ebbert, Christoph and Schmidt, H. C. and Rodman, D. and Nuernberger, F. and Homberg, W. and Maier, H. J. and Grundmeier, Guido}},
  issn         = {{0924-0136}},
  journal      = {{JOURNAL OF MATERIALS PROCESSING TECHNOLOGY}},
  number       = {{10}},
  pages        = {{2179--2187}},
  title        = {{{Joining with electrochemical support (ECUF): Cold pressure welding of copper}}},
  doi          = {{10.1016/j.jmatprotec.2014.04.015}},
  volume       = {{214}},
  year         = {{2014}},
}

@article{22683,
  author       = {{Bald, Ilko and Keller, Adrian}},
  issn         = {{1420-3049}},
  journal      = {{Molecules}},
  pages        = {{13803--13823}},
  title        = {{{Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy}}},
  doi          = {{10.3390/molecules190913803}},
  volume       = {{19}},
  year         = {{2014}},
}

@article{22580,
  author       = {{König, Dennis and Naujoks, Dennis and de los Arcos de Pedro, Maria Teresa and Grosse-Kreul, Simon and Ludwig, Alfred}},
  issn         = {{1438-1656}},
  journal      = {{Advanced Engineering Materials}},
  pages        = {{669--673}},
  title        = {{{X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films}}},
  doi          = {{10.1002/adem.201400317}},
  year         = {{2014}},
}

@article{22585,
  author       = {{de los Arcos de Pedro, Maria Teresa and Schröder, Raphael and Gonzalvo, Yolanda Aranda and Gathen, Volker Schulz-von der and Winter, Jörg}},
  issn         = {{0963-0252}},
  journal      = {{Plasma Sources Science and Technology}},
  title        = {{{Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate}}},
  doi          = {{10.1088/0963-0252/23/5/054008}},
  year         = {{2014}},
}

@article{22586,
  author       = {{Eren, Baran and Marot, Laurent and Steiner, Roland and de los Arcos de Pedro, Maria Teresa and Düggelin, Marcel and Mathys, Daniel and Goldie, Kenneth N. and Olivieri, Vesna and Meyer, Ernst}},
  issn         = {{0009-2614}},
  journal      = {{Chemical Physics Letters}},
  pages        = {{82--87}},
  title        = {{{Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology}}},
  doi          = {{10.1016/j.cplett.2014.06.042}},
  year         = {{2014}},
}

@article{22587,
  author       = {{Machura, P D and Hecimovic, A and Gallian, S and Winter, J and de los Arcos de Pedro, Maria Teresa}},
  issn         = {{0963-0252}},
  journal      = {{Plasma Sources Science and Technology}},
  title        = {{{Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges}}},
  doi          = {{10.1088/0963-0252/23/6/065043}},
  year         = {{2014}},
}

@article{22588,
  author       = {{Marinov, D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A and Rousseau, A}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure}}},
  doi          = {{10.1088/0022-3727/47/47/475204}},
  year         = {{2014}},
}

@article{22590,
  author       = {{Xu, Ke and Dang, Van-Son and Ney, Andreas and de los Arcos de Pedro, Maria Teresa and Devi, Anjana}},
  issn         = {{1533-4880}},
  journal      = {{Journal of Nanoscience and Nanotechnology}},
  pages        = {{5095--5102}},
  title        = {{{Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition}}},
  doi          = {{10.1166/jnn.2014.8848}},
  year         = {{2014}},
}

@article{20945,
  abstract     = {{Calcium-Silicate-Hydrates (C-S-H) are the main binding phases in most concrete which is the primarily used composite construction material in the world. However, a big lack is cleaving between the actual knowledge about C-S-H, compared to what could be reached using state-of-the-art technologies of modern research. In this article, the formation of a C-S-H phase on a native oxide covered silicon wafer is investigated by means of in-situ attenuated total reflection infrared (ATR-IR) and ex-situ surface-enhanced Raman spectroscopy (SERS). The total thickness of the C-S-H phase is determined by X-ray photoelectron spectroscopy (XPS) to be 3 nm. The formation appears to be reversible depending on the environment pH value and can be performed at room temperature. Based on density functional theory (DFT) calculations, it is shown that the C-S-H phase in the presence of water will change its chemical composition in order to reach the thermodynamic ground state of the system. This change is achieved by a metal-proton exchange reaction. The stoichiometry of these metal-proton exchange reactions is nearly independent of the environment pH value. Electrokinetic measurements yield isoelectric points of 2.0 and 2.6 for the native oxide covered silicon wafer (SiO2) and the C-S-H phase. This is consistent with a predominance of Si-O sites at the C-S-H/water interface. (C) 2013 Elsevier B. V. All rights reserved.}},
  author       = {{Ebbert, Christoph and Grundmeier, Guido and Buitkamp, Nadine and Kroeger, Alexander and Messerschmidt, Florian and Thissen, Peter}},
  issn         = {{1873-5584}},
  journal      = {{APPLIED SURFACE SCIENCE}},
  pages        = {{207--214}},
  title        = {{{Toward a microscopic understanding of the calcium-silicate-hydrates/water interface}}},
  doi          = {{10.1016/j.apsusc.2013.11.045}},
  volume       = {{290}},
  year         = {{2014}},
}

@article{20946,
  abstract     = {{In the current work, we study the silver ion release potential and the water uptake through a SiOxCyHz-polymer which is grown from the precursor hexamethyldisiloxane (HMDSO) in radiofrequency (RF) plasma. These layers were deposited on top of two dimensional (2D) ensembles of silver nanoparticles (AgNPs) with nominal thickness of 2 nm on a 20 nm RF-sputtered polytetrafluoroethylene (PTFE) thin film. The composition of the plasma-polymerized HMDSO barriers was varied by changing the oxygen flow during the polymerization process and their thickness was varied as well. Morphology and optical properties of the nanocomposites were investigated using transmission electron microscopy (TEM) and UV-Visible spectroscopy (UV-Vis), respectively. The concentration of the silver ions released from the nanocomposites after immersion in water for several time intervals was measured using inductively coupled plasma mass spectrometry (ICP-MS). Contact angle analysis and electrochemical impedance spectroscopy (EIS) measurements were also performed and results show a strong dependence of the coatings properties and their water uptake on the oxygen content in the coating films and their thickness. Plasma polymerization with increasing the oxygen flow leads to the formation of more hydrophilic thin films with a higher Ag ion release potential. Increasing the thickness of the coatings reduced the amount of the released ions and the rate of the release process was slowed down. This indicates that by tailoring the structure and the thickness of the plasma-polymerized coating films, one can tune the silver ion release properties of Ag/polymer nanocomposites.}},
  author       = {{Alissawi, N. and Peter, T. and Strunskus, T. and Ebbert, Christoph and Grundmeier, Guido and Faupel, F.}},
  issn         = {{1572-896X}},
  journal      = {{JOURNAL OF NANOPARTICLE RESEARCH}},
  number       = {{11}},
  title        = {{{Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites}}},
  doi          = {{10.1007/s11051-013-2080-9}},
  volume       = {{15}},
  year         = {{2013}},
}

@article{22584,
  author       = {{Dang, Van-Son and Parala, Harish and Kim, Jin Hyun and Xu, Ke and Srinivasan, Nagendra B. and Edengeiser, Eugen and Havenith, Martina and Wieck, Andreas D. and de los Arcos de Pedro, Maria Teresa and Fischer, Roland. A. and Devi, Anjana}},
  issn         = {{1862-6300}},
  journal      = {{physica status solidi (a)}},
  pages        = {{416--424}},
  title        = {{{Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition}}},
  doi          = {{10.1002/pssa.201330115}},
  year         = {{2013}},
}

@article{22589,
  author       = {{Srinivasan, Nagendra B. and Thiede, Tobias B. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Becker, Hans-Werner and Devi, Anjana and Fischer, Roland A.}},
  issn         = {{1862-6300}},
  journal      = {{physica status solidi (a)}},
  pages        = {{260--266}},
  title        = {{{MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics}}},
  doi          = {{10.1002/pssa.201330127}},
  year         = {{2013}},
}

@article{22596,
  author       = {{Xu, Ke and Chaudhuri, Ayan Roy and Parala, Harish and Schwendt, Dominik and de los Arcos de Pedro, Maria Teresa and Osten, H. Jörg and Devi, Anjana}},
  issn         = {{2050-7526}},
  journal      = {{Journal of Materials Chemistry C}},
  title        = {{{Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water: process optimization, film analysis and electrical properties}}},
  doi          = {{10.1039/c3tc30401a}},
  year         = {{2013}},
}

@article{22593,
  author       = {{Srinivasan, N.B. and Thiede, T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski, M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}},
  issn         = {{0257-8972}},
  journal      = {{Surface and Coatings Technology}},
  pages        = {{130--136}},
  title        = {{{Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}}},
  doi          = {{10.1016/j.surfcoat.2013.06.024}},
  year         = {{2013}},
}

@article{22594,
  author       = {{Will, Andreas and de los Arcos de Pedro, Maria Teresa and Corbella, Carles and Hecimovic, Ante and Machura, Patrick D and Winter, Jörg and von Keudell, Achim}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum}}},
  doi          = {{10.1088/0022-3727/46/8/084009}},
  year         = {{2013}},
}

@article{22591,
  author       = {{Corbella, Carles and Grosse-Kreul, Simon and Kreiter, Oliver and de los Arcos de Pedro, Maria Teresa and Benedikt, Jan and von Keudell, Achim}},
  issn         = {{0034-6748}},
  journal      = {{Review of Scientific Instruments}},
  title        = {{{Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces}}},
  doi          = {{10.1063/1.4826066}},
  year         = {{2013}},
}

@article{22595,
  author       = {{Winter, J and Hecimovic, A and de los Arcos de Pedro, Maria Teresa and Böke, M and Schulz-von der Gathen, V}},
  issn         = {{0022-3727}},
  journal      = {{Journal of Physics D: Applied Physics}},
  title        = {{{Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity}}},
  doi          = {{10.1088/0022-3727/46/8/084007}},
  year         = {{2013}},
}

@article{22592,
  author       = {{Rügner, Katja and Reuter, Rüdiger and Ellerweg, Dirk and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim and Benedikt, Jan}},
  issn         = {{1612-8850}},
  journal      = {{Plasma Processes and Polymers}},
  pages        = {{1061--1073}},
  title        = {{{Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure}}},
  doi          = {{10.1002/ppap.201300059}},
  year         = {{2013}},
}

@article{22597,
  author       = {{Banerjee, Manish and Srinivasan, Nagendra Babu and Zhu, Huaizhi and Kim, Sun Ja and Xu, Ke and Winter, Manuela and Becker, Hans-Werner and Rogalla, Detlef and de los Arcos de Pedro, Maria Teresa and Bekermann, Daniela and Barreca, Davide and Fischer, Roland A. and Devi, Anjana}},
  issn         = {{1528-7483}},
  journal      = {{Crystal Growth & Design}},
  pages        = {{5079--5089}},
  title        = {{{Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors}}},
  doi          = {{10.1021/cg3010147}},
  year         = {{2012}},
}

@article{22602,
  author       = {{Milanov, Andrian P. and Xu, Ke and Cwik, Stefan and Parala, Harish and de los Arcos de Pedro, Maria Teresa and Becker, Hans-Werner and Rogalla, Detlef and Cross, Richard and Paul, Shashi and Devi, Anjana}},
  issn         = {{1477-9226}},
  journal      = {{Dalton Transactions}},
  title        = {{{Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors}}},
  doi          = {{10.1039/c2dt31219k}},
  year         = {{2012}},
}