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Determination of the refractive indices of ionic liquids by ellipsometry, and their application as immersion liquids. <i>Applied Optics</i>, Article 9215. <a href=\"https://doi.org/10.1364/ao.57.009215\">https://doi.org/10.1364/ao.57.009215</a>","chicago":"Wu, Xia, Maren Muntzeck, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, René Wilhelm, and Thorsten Wagner. “Determination of the Refractive Indices of Ionic Liquids by Ellipsometry, and Their Application as Immersion Liquids.” <i>Applied Optics</i>, 2018. <a href=\"https://doi.org/10.1364/ao.57.009215\">https://doi.org/10.1364/ao.57.009215</a>.","short":"X. Wu, M. Muntzeck, M.T. de los Arcos de Pedro, G. Grundmeier, R. Wilhelm, T. 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Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties. <i>Advanced Materials Interfaces</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>","ieee":"D. Zanders <i>et al.</i>, “Validation of a Terminally Amino Functionalized Tetra‐Alkyl Sn(IV) Precursor in Metal–Organic Chemical Vapor Deposition of SnO            2            Thin Films: Study of Film Growth Characteristics, Optical, and Electrical Properties,” <i>Advanced Materials Interfaces</i>, Art. no. 1801540, 2018, doi: <a href=\"https://doi.org/10.1002/admi.201801540\">10.1002/admi.201801540</a>.","apa":"Zanders, D., Ciftyurek, E., Hoppe, C., de los Arcos de Pedro, M. T., Kostka, A., Rogalla, D., Grundmeier, G., Schierbaum, K. D., &#38; Devi, A. (2018). 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Hoppe, M.T. de los Arcos de Pedro, A. Kostka, D. Rogalla, G. Grundmeier, K.D. Schierbaum, A. 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PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>. 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Gebhard <i>et al.</i>, “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” <i>ACS Applied Materials &#38; Interfaces</i>, pp. 7422–7434, 2018, doi: <a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","chicago":"Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, 7422–34. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>.","short":"M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials &#38; Interfaces (2018) 7422–7434."}},{"type":"journal_article","department":[{"_id":"302"}],"date_created":"2021-07-07T08:59:10Z","publication":"ACS Applied Materials & Interfaces","citation":{"mla":"Gebhard, Maximilian, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, pp. 7422–34, doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","ama":"Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>. Published online 2018:7422-7434. doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>","bibtex":"@article{Gebhard_Mai_Banko_Mitschker_Hoppe_Jaritz_Kirchheim_Zekorn_de los Arcos de Pedro_Grochla_et al._2018, title={PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads}, DOI={<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>}, journal={ACS Applied Materials &#38; Interfaces}, author={Gebhard, Maximilian and Mai, Lukas and Banko, Lars and Mitschker, Felix and Hoppe, Christian and Jaritz, Montgomery and Kirchheim, Dennis and Zekorn, Christoph and de los Arcos de Pedro, Maria Teresa and Grochla, Dario and et al.}, year={2018}, pages={7422–7434} }","apa":"Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., &#38; Devi, A. (2018). PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>, 7422–7434. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>","ieee":"M. Gebhard <i>et al.</i>, “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” <i>ACS Applied Materials &#38; Interfaces</i>, pp. 7422–7434, 2018, doi: <a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","chicago":"Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, 7422–34. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>.","short":"M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials &#38; Interfaces (2018) 7422–7434."},"doi":"10.1021/acsami.7b14916","user_id":"54556","page":"7422-7434","_id":"22549","language":[{"iso":"eng"}],"date_updated":"2023-01-24T08:37:41Z","publication_status":"published","year":"2018","status":"public","title":"PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads","publication_identifier":{"issn":["1944-8244","1944-8252"]},"author":[{"full_name":"Gebhard, Maximilian","first_name":"Maximilian","last_name":"Gebhard"},{"first_name":"Lukas","last_name":"Mai","full_name":"Mai, Lukas"},{"last_name":"Banko","first_name":"Lars","full_name":"Banko, Lars"},{"first_name":"Felix","last_name":"Mitschker","full_name":"Mitschker, Felix"},{"full_name":"Hoppe, Christian","last_name":"Hoppe","first_name":"Christian"},{"full_name":"Jaritz, Montgomery","last_name":"Jaritz","first_name":"Montgomery"},{"last_name":"Kirchheim","first_name":"Dennis","full_name":"Kirchheim, Dennis"},{"full_name":"Zekorn, Christoph","last_name":"Zekorn","first_name":"Christoph"},{"full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa","id":"54556"},{"full_name":"Grochla, Dario","first_name":"Dario","last_name":"Grochla"},{"full_name":"Dahlmann, Rainer","first_name":"Rainer","last_name":"Dahlmann"},{"id":"194","full_name":"Grundmeier, Guido","first_name":"Guido","last_name":"Grundmeier"},{"full_name":"Awakowicz, Peter","first_name":"Peter","last_name":"Awakowicz"},{"last_name":"Ludwig","first_name":"Alfred","full_name":"Ludwig, Alfred"},{"last_name":"Devi","first_name":"Anjana","full_name":"Devi, Anjana"}]},{"author":[{"last_name":"Gebhard","first_name":"Maximilian","full_name":"Gebhard, Maximilian"},{"full_name":"Mai, Lukas","last_name":"Mai","first_name":"Lukas"},{"full_name":"Banko, Lars","first_name":"Lars","last_name":"Banko"},{"full_name":"Mitschker, Felix","first_name":"Felix","last_name":"Mitschker"},{"first_name":"Christian","last_name":"Hoppe","full_name":"Hoppe, Christian"},{"last_name":"Jaritz","first_name":"Montgomery","full_name":"Jaritz, Montgomery"},{"full_name":"Kirchheim, Dennis","last_name":"Kirchheim","first_name":"Dennis"},{"full_name":"Zekorn, Christoph","last_name":"Zekorn","first_name":"Christoph"},{"id":"54556","first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa"},{"full_name":"Grochla, Dario","first_name":"Dario","last_name":"Grochla"},{"full_name":"Dahlmann, Rainer","last_name":"Dahlmann","first_name":"Rainer"},{"id":"194","full_name":"Grundmeier, Guido","first_name":"Guido","last_name":"Grundmeier"},{"last_name":"Awakowicz","first_name":"Peter","full_name":"Awakowicz, Peter"},{"full_name":"Ludwig, Alfred","last_name":"Ludwig","first_name":"Alfred"},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"publication_identifier":{"issn":["1944-8244","1944-8252"]},"year":"2018","title":"PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads","status":"public","publication_status":"published","date_updated":"2023-01-24T08:38:19Z","_id":"22551","language":[{"iso":"eng"}],"page":"7422-7434","user_id":"54556","doi":"10.1021/acsami.7b14916","citation":{"ama":"Gebhard M, Mai L, Banko L, et al. PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>. Published online 2018:7422-7434. doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>","bibtex":"@article{Gebhard_Mai_Banko_Mitschker_Hoppe_Jaritz_Kirchheim_Zekorn_de los Arcos de Pedro_Grochla_et al._2018, title={PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads}, DOI={<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>}, journal={ACS Applied Materials &#38; Interfaces}, author={Gebhard, Maximilian and Mai, Lukas and Banko, Lars and Mitschker, Felix and Hoppe, Christian and Jaritz, Montgomery and Kirchheim, Dennis and Zekorn, Christoph and de los Arcos de Pedro, Maria Teresa and Grochla, Dario and et al.}, year={2018}, pages={7422–7434} }","mla":"Gebhard, Maximilian, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, pp. 7422–34, doi:<a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>.","chicago":"Gebhard, Maximilian, Lukas Mai, Lars Banko, Felix Mitschker, Christian Hoppe, Montgomery Jaritz, Dennis Kirchheim, et al. “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads.” <i>ACS Applied Materials &#38; Interfaces</i>, 2018, 7422–34. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>.","short":"M. Gebhard, L. Mai, L. Banko, F. Mitschker, C. Hoppe, M. Jaritz, D. Kirchheim, C. Zekorn, M.T. de los Arcos de Pedro, D. Grochla, R. Dahlmann, G. Grundmeier, P. Awakowicz, A. Ludwig, A. Devi, ACS Applied Materials &#38; Interfaces (2018) 7422–7434.","apa":"Gebhard, M., Mai, L., Banko, L., Mitschker, F., Hoppe, C., Jaritz, M., Kirchheim, D., Zekorn, C., de los Arcos de Pedro, M. T., Grochla, D., Dahlmann, R., Grundmeier, G., Awakowicz, P., Ludwig, A., &#38; Devi, A. (2018). PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads. <i>ACS Applied Materials &#38; Interfaces</i>, 7422–7434. <a href=\"https://doi.org/10.1021/acsami.7b14916\">https://doi.org/10.1021/acsami.7b14916</a>","ieee":"M. Gebhard <i>et al.</i>, “PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads,” <i>ACS Applied Materials &#38; Interfaces</i>, pp. 7422–7434, 2018, doi: <a href=\"https://doi.org/10.1021/acsami.7b14916\">10.1021/acsami.7b14916</a>."},"publication":"ACS Applied Materials & Interfaces","date_created":"2021-07-07T08:59:35Z","department":[{"_id":"302"}],"type":"journal_article"},{"doi":"10.1002/ctpp.201700036","user_id":"54556","page":"377-383","_id":"22548","language":[{"iso":"eng"}],"date_updated":"2023-01-24T08:37:20Z","publication_status":"published","status":"public","year":"2018","title":"Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene","author":[{"full_name":"Dietrich, J.","first_name":"J.","last_name":"Dietrich"},{"last_name":"Hoppe","first_name":"C.","full_name":"Hoppe, C."},{"first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"}],"publication_identifier":{"issn":["0863-1042"]},"type":"journal_article","department":[{"_id":"302"}],"date_created":"2021-07-07T08:57:20Z","publication":"Contributions to Plasma Physics","citation":{"ama":"Dietrich J, Hoppe C, de los Arcos de Pedro MT, Grundmeier G. Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene. <i>Contributions to Plasma Physics</i>. Published online 2018:377-383. doi:<a href=\"https://doi.org/10.1002/ctpp.201700036\">10.1002/ctpp.201700036</a>","bibtex":"@article{Dietrich_Hoppe_de los Arcos de Pedro_Grundmeier_2018, title={Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene}, DOI={<a href=\"https://doi.org/10.1002/ctpp.201700036\">10.1002/ctpp.201700036</a>}, journal={Contributions to Plasma Physics}, author={Dietrich, J. and Hoppe, C. and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2018}, pages={377–383} }","mla":"Dietrich, J., et al. “Combined in Situ Infrared Reflection Absorption Spectroscopy-Quartz Crystal Microbalance Investigation of the Initial Growth Stages of Plasma-Deposited SiO                            x                         on Polypropylene.” <i>Contributions to Plasma Physics</i>, 2018, pp. 377–83, doi:<a href=\"https://doi.org/10.1002/ctpp.201700036\">10.1002/ctpp.201700036</a>.","chicago":"Dietrich, J., C. Hoppe, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Combined in Situ Infrared Reflection Absorption Spectroscopy-Quartz Crystal Microbalance Investigation of the Initial Growth Stages of Plasma-Deposited SiO                            x                         on Polypropylene.” <i>Contributions to Plasma Physics</i>, 2018, 377–83. <a href=\"https://doi.org/10.1002/ctpp.201700036\">https://doi.org/10.1002/ctpp.201700036</a>.","short":"J. Dietrich, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier, Contributions to Plasma Physics (2018) 377–383.","apa":"Dietrich, J., Hoppe, C., de los Arcos de Pedro, M. T., &#38; Grundmeier, G. (2018). Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene. <i>Contributions to Plasma Physics</i>, 377–383. <a href=\"https://doi.org/10.1002/ctpp.201700036\">https://doi.org/10.1002/ctpp.201700036</a>","ieee":"J. Dietrich, C. Hoppe, M. T. de los Arcos de Pedro, and G. Grundmeier, “Combined in situ infrared reflection absorption spectroscopy-quartz crystal microbalance investigation of the initial growth stages of plasma-deposited SiO                            x                         on polypropylene,” <i>Contributions to Plasma Physics</i>, pp. 377–383, 2018, doi: <a href=\"https://doi.org/10.1002/ctpp.201700036\">10.1002/ctpp.201700036</a>."}},{"citation":{"mla":"Budde, Maik, et al. “Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” <i>Plasma Processes and Polymers</i>, 1700230, 2018, doi:<a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>.","bibtex":"@article{Budde_Corbella_Große-Kreul_de los Arcos de Pedro_Grundmeier_von Keudell_2018, title={Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas}, DOI={<a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>}, number={1700230}, journal={Plasma Processes and Polymers}, author={Budde, Maik and Corbella, Carles and Große-Kreul, Simon and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and von Keudell, Achim}, year={2018} }","ama":"Budde M, Corbella C, Große-Kreul S, de los Arcos de Pedro MT, Grundmeier G, von Keudell A. Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. <i>Plasma Processes and Polymers</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>","ieee":"M. Budde, C. Corbella, S. Große-Kreul, M. T. de los Arcos de Pedro, G. Grundmeier, and A. von Keudell, “Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas,” <i>Plasma Processes and Polymers</i>, Art. no. 1700230, 2018, doi: <a href=\"https://doi.org/10.1002/ppap.201700230\">10.1002/ppap.201700230</a>.","apa":"Budde, M., Corbella, C., Große-Kreul, S., de los Arcos de Pedro, M. T., Grundmeier, G., &#38; von Keudell, A. (2018). Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas. <i>Plasma Processes and Polymers</i>, Article 1700230. <a href=\"https://doi.org/10.1002/ppap.201700230\">https://doi.org/10.1002/ppap.201700230</a>","chicago":"Budde, Maik, Carles Corbella, Simon Große-Kreul, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, and Achim von Keudell. “Decoupling of Ion- and Photon-Activation Mechanisms in Polymer Surfaces Exposed to Low-Temperature Plasmas.” <i>Plasma Processes and Polymers</i>, 2018. <a href=\"https://doi.org/10.1002/ppap.201700230\">https://doi.org/10.1002/ppap.201700230</a>.","short":"M. Budde, C. Corbella, S. Große-Kreul, M.T. de los Arcos de Pedro, G. Grundmeier, A. von Keudell, Plasma Processes and Polymers (2018)."},"publication":"Plasma Processes and Polymers","department":[{"_id":"302"}],"type":"journal_article","date_created":"2021-07-07T08:50:38Z","publication_status":"published","date_updated":"2023-01-24T08:37:01Z","publication_identifier":{"issn":["1612-8850"]},"author":[{"first_name":"Maik","last_name":"Budde","full_name":"Budde, Maik"},{"first_name":"Carles","last_name":"Corbella","full_name":"Corbella, Carles"},{"first_name":"Simon","last_name":"Große-Kreul","full_name":"Große-Kreul, Simon"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"id":"194","full_name":"Grundmeier, Guido","first_name":"Guido","last_name":"Grundmeier"},{"full_name":"von Keudell, Achim","last_name":"von Keudell","first_name":"Achim"}],"status":"public","year":"2018","title":"Decoupling of ion- and photon-activation mechanisms in polymer surfaces exposed to low-temperature plasmas","user_id":"54556","doi":"10.1002/ppap.201700230","_id":"22547","language":[{"iso":"eng"}],"article_number":"1700230"},{"user_id":"54556","doi":"10.1039/c7ra13417g","page":"4987-4994","_id":"22557","language":[{"iso":"eng"}],"publication_status":"published","date_updated":"2023-01-24T08:39:45Z","status":"public","year":"2018","title":"Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties","author":[{"last_name":"Mai","first_name":"Lukas","full_name":"Mai, Lukas"},{"full_name":"Boysen, Nils","first_name":"Nils","last_name":"Boysen"},{"first_name":"Ersoy","last_name":"Subaşı","full_name":"Subaşı, Ersoy"},{"last_name":"de los Arcos de Pedro","first_name":"Maria Teresa","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556"},{"full_name":"Rogalla, Detlef","last_name":"Rogalla","first_name":"Detlef"},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"},{"full_name":"Bock, Claudia","last_name":"Bock","first_name":"Claudia"},{"first_name":"Hong-Liang","last_name":"Lu","full_name":"Lu, Hong-Liang"},{"last_name":"Devi","first_name":"Anjana","full_name":"Devi, Anjana"}],"publication_identifier":{"issn":["2046-2069"]},"type":"journal_article","department":[{"_id":"302"}],"date_created":"2021-07-07T09:02:26Z","abstract":[{"lang":"eng","text":"<p>A new water assisted atomic layer deposition (ALD) process was developed using the yttrium tris-guanidinate precursor which resulted in device quality thin films.</p>"}],"publication":"RSC Advances","citation":{"ieee":"L. Mai <i>et al.</i>, “Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties,” <i>RSC Advances</i>, pp. 4987–4994, 2018, doi: <a href=\"https://doi.org/10.1039/c7ra13417g\">10.1039/c7ra13417g</a>.","apa":"Mai, L., Boysen, N., Subaşı, E., de los Arcos de Pedro, M. T., Rogalla, D., Grundmeier, G., Bock, C., Lu, H.-L., &#38; Devi, A. (2018). Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. <i>RSC Advances</i>, 4987–4994. <a href=\"https://doi.org/10.1039/c7ra13417g\">https://doi.org/10.1039/c7ra13417g</a>","chicago":"Mai, Lukas, Nils Boysen, Ersoy Subaşı, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Guido Grundmeier, Claudia Bock, Hong-Liang Lu, and Anjana Devi. “Water Assisted Atomic Layer Deposition of Yttrium Oxide Using Tris(N,N′-Diisopropyl-2-Dimethylamido-Guanidinato) Yttrium(Iii): Process Development, Film Characterization and Functional Properties.” <i>RSC Advances</i>, 2018, 4987–94. <a href=\"https://doi.org/10.1039/c7ra13417g\">https://doi.org/10.1039/c7ra13417g</a>.","short":"L. Mai, N. Boysen, E. Subaşı, M.T. de los Arcos de Pedro, D. Rogalla, G. Grundmeier, C. Bock, H.-L. Lu, A. 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Water assisted atomic layer deposition of yttrium oxide using tris(N,N′-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties. <i>RSC Advances</i>. 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Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). <i>Journal of Physics D: Applied Physics</i>. 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Comparative study on the deposition of silicon oxide permeation barrier coatings for polymers using hexamethyldisilazane (HMDSN) and hexamethyldisiloxane (HMDSO). <i>Journal of Physics D: Applied Physics</i>, Article 235201. <a href=\"https://doi.org/10.1088/1361-6463/aac0ab\">https://doi.org/10.1088/1361-6463/aac0ab</a>","ieee":"F. 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Analysis of polymer/oxide interfaces under ambient conditions – An experimental perspective. <i>Applied Surface Science</i>, 581–594. <a href=\"https://doi.org/10.1016/j.apsusc.2018.02.155\">https://doi.org/10.1016/j.apsusc.2018.02.155</a>","ieee":"A. González-Orive, I. Giner, M. T. de los Arcos de Pedro, A. Keller, and G. Grundmeier, “Analysis of polymer/oxide interfaces under ambient conditions – An experimental perspective,” <i>Applied Surface Science</i>, pp. 581–594, 2018, doi: <a href=\"https://doi.org/10.1016/j.apsusc.2018.02.155\">10.1016/j.apsusc.2018.02.155</a>.","chicago":"González-Orive, A., I. Giner, Maria Teresa de los Arcos de Pedro, A. Keller, and G. Grundmeier. “Analysis of Polymer/Oxide Interfaces under Ambient Conditions – An Experimental Perspective.” <i>Applied Surface Science</i>, 2018, 581–94. <a href=\"https://doi.org/10.1016/j.apsusc.2018.02.155\">https://doi.org/10.1016/j.apsusc.2018.02.155</a>.","short":"A. González-Orive, I. Giner, M.T. de los Arcos de Pedro, A. Keller, G. Grundmeier, Applied Surface Science (2018) 581–594."}},{"publication":"Progress in Organic Coatings","citation":{"bibtex":"@article{Wolk_Rosenthal_Weiß_Voigt_Wesendahl_Hartmann_Grundmeier_Wilhelm_Meschut_Tiemann_et al._2018, title={Graphene oxide as flexibilizer for epoxy amine resins}, DOI={<a href=\"https://doi.org/10.1016/j.porgcoat.2018.05.028\">10.1016/j.porgcoat.2018.05.028</a>}, journal={Progress in Organic Coatings}, author={Wolk, Andreas and Rosenthal, Marta and Weiß, Julia and Voigt, Markus and Wesendahl, Jan-Niklas and Hartmann, Marc and Grundmeier, Guido and Wilhelm, Rene and Meschut, Gerson and Tiemann, Michael and et al.}, year={2018}, pages={280–289} }","ama":"Wolk A, Rosenthal M, Weiß J, et al. Graphene oxide as flexibilizer for epoxy amine resins. <i>Progress in Organic Coatings</i>. Published online 2018:280-289. doi:<a href=\"https://doi.org/10.1016/j.porgcoat.2018.05.028\">10.1016/j.porgcoat.2018.05.028</a>","mla":"Wolk, Andreas, et al. “Graphene Oxide as Flexibilizer for Epoxy Amine Resins.” <i>Progress in Organic Coatings</i>, 2018, pp. 280–89, doi:<a href=\"https://doi.org/10.1016/j.porgcoat.2018.05.028\">10.1016/j.porgcoat.2018.05.028</a>.","chicago":"Wolk, Andreas, Marta Rosenthal, Julia Weiß, Markus Voigt, Jan-Niklas Wesendahl, Marc Hartmann, Guido Grundmeier, et al. “Graphene Oxide as Flexibilizer for Epoxy Amine Resins.” <i>Progress in Organic Coatings</i>, 2018, 280–89. <a href=\"https://doi.org/10.1016/j.porgcoat.2018.05.028\">https://doi.org/10.1016/j.porgcoat.2018.05.028</a>.","short":"A. Wolk, M. Rosenthal, J. Weiß, M. Voigt, J.-N. Wesendahl, M. Hartmann, G. Grundmeier, R. Wilhelm, G. Meschut, M. Tiemann, W. Bremser, Progress in Organic Coatings (2018) 280–289.","ieee":"A. Wolk <i>et al.</i>, “Graphene oxide as flexibilizer for epoxy amine resins,” <i>Progress in Organic Coatings</i>, pp. 280–289, 2018, doi: <a href=\"https://doi.org/10.1016/j.porgcoat.2018.05.028\">10.1016/j.porgcoat.2018.05.028</a>.","apa":"Wolk, A., Rosenthal, M., Weiß, J., Voigt, M., Wesendahl, J.-N., Hartmann, M., Grundmeier, G., Wilhelm, R., Meschut, G., Tiemann, M., &#38; Bremser, W. (2018). Graphene oxide as flexibilizer for epoxy amine resins. <i>Progress in Organic Coatings</i>, 280–289. <a href=\"https://doi.org/10.1016/j.porgcoat.2018.05.028\">https://doi.org/10.1016/j.porgcoat.2018.05.028</a>"},"quality_controlled":"1","abstract":[{"text":"Different types of reduced graphene oxide and graphene oxide particles have been studied regarding their influence on the curing behaviour of epoxy-amine resins. Especially the specific surface area of reduced graphene oxide was selectively influenced by controlled drying of the material. The different types of reduced graphene oxide particles were used to produce epoxy-amine composites that significantly change their curing behaviour and mechanical properties. A variety of surface areas and compositions were prepared by combination of a fast heating rate and different drying methods. The combination of freeze drying with a fast heating rate leads to a large specific surface area of 680 m2/g. The morphologies of the particles were observed by scanning electron microscope and the BET surface area was measured with nitrogen-physisorption. The exfoliation quality was measured by XRD. The generated graphene oxide and thermally reduced graphene oxide particles were mixed with epoxy-amine resin. The curing behaviour was studied with rheological and differential scanning calorimetry (DSC) measurements. We observed that different surface functionalities lowers the Glass transition temperature and the gel time of an epoxy-amine curing system. In addition, we found that generated graphene oxide acts as flexibilizer. An increase of the deformation from 2.5 mm to 3.1 mm was measured by Erichsen Cupping Test.","lang":"eng"}],"date_created":"2021-10-08T10:49:57Z","type":"journal_article","department":[{"_id":"35"},{"_id":"307"},{"_id":"302"},{"_id":"301"},{"_id":"2"},{"_id":"321"},{"_id":"157"}],"year":"2018","status":"public","title":"Graphene oxide as flexibilizer for epoxy amine resins","author":[{"last_name":"Wolk","first_name":"Andreas","full_name":"Wolk, Andreas"},{"last_name":"Rosenthal","first_name":"Marta","full_name":"Rosenthal, Marta"},{"full_name":"Weiß, Julia","last_name":"Weiß","first_name":"Julia"},{"id":"15182","full_name":"Voigt, Markus","last_name":"Voigt","first_name":"Markus"},{"full_name":"Wesendahl, Jan-Niklas","first_name":"Jan-Niklas","last_name":"Wesendahl"},{"last_name":"Hartmann","first_name":"Marc","full_name":"Hartmann, Marc"},{"id":"194","first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido"},{"full_name":"Wilhelm, Rene","last_name":"Wilhelm","first_name":"Rene"},{"id":"32056","full_name":"Meschut, Gerson","orcid":"0000-0002-2763-1246","last_name":"Meschut","first_name":"Gerson"},{"first_name":"Michael","last_name":"Tiemann","orcid":"0000-0003-1711-2722","full_name":"Tiemann, Michael","id":"23547"},{"full_name":"Bremser, Wolfgang","last_name":"Bremser","first_name":"Wolfgang","id":"32"}],"publication_identifier":{"issn":["0300-9440"]},"publication_status":"published","date_updated":"2023-06-06T14:33:05Z","article_type":"original","page":"280-289","language":[{"iso":"eng"}],"_id":"25911","user_id":"14931","doi":"10.1016/j.porgcoat.2018.05.028"},{"doi":"10.1002/maco.201709478","user_id":"48411","page":"1028-1036","language":[{"iso":"eng"}],"_id":"24109","date_updated":"2022-01-06T06:56:07Z","publication_status":"published","status":"public","year":"2017","title":"Corrosion properties of bioresorbable FeMn-Ag alloys prepared by selective laser melting","author":[{"first_name":"Markus","last_name":"Wiesener","full_name":"Wiesener, Markus"},{"first_name":"K.","last_name":"Peters","full_name":"Peters, K."},{"last_name":"Taube","first_name":"Alexander","full_name":"Taube, Alexander"},{"id":"48864","full_name":"Keller, Adrian","first_name":"Adrian","last_name":"Keller","orcid":"0000-0001-7139-3110"},{"id":"48411","full_name":"Hoyer, Kay-Peter","last_name":"Hoyer","first_name":"Kay-Peter"},{"full_name":"Niendorf, Thomas","last_name":"Niendorf","first_name":"Thomas"},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"}],"publication_identifier":{"issn":["0947-5117"]},"type":"journal_article","department":[{"_id":"9"},{"_id":"158"},{"_id":"302"}],"date_created":"2021-09-10T07:18:41Z","publication":"Materials and Corrosion","citation":{"chicago":"Wiesener, Markus, K. Peters, Alexander Taube, Adrian Keller, Kay-Peter Hoyer, Thomas Niendorf, and Guido Grundmeier. “Corrosion Properties of Bioresorbable FeMn-Ag Alloys Prepared by Selective Laser Melting.” <i>Materials and Corrosion</i>, 2017, 1028–36. <a href=\"https://doi.org/10.1002/maco.201709478\">https://doi.org/10.1002/maco.201709478</a>.","short":"M. Wiesener, K. Peters, A. Taube, A. Keller, K.-P. Hoyer, T. Niendorf, G. Grundmeier, Materials and Corrosion (2017) 1028–1036.","apa":"Wiesener, M., Peters, K., Taube, A., Keller, A., Hoyer, K.-P., Niendorf, T., &#38; Grundmeier, G. (2017). Corrosion properties of bioresorbable FeMn-Ag alloys prepared by selective laser melting. <i>Materials and Corrosion</i>, 1028–1036. <a href=\"https://doi.org/10.1002/maco.201709478\">https://doi.org/10.1002/maco.201709478</a>","ieee":"M. Wiesener <i>et al.</i>, “Corrosion properties of bioresorbable FeMn-Ag alloys prepared by selective laser melting,” <i>Materials and Corrosion</i>, pp. 1028–1036, 2017, doi: <a href=\"https://doi.org/10.1002/maco.201709478\">10.1002/maco.201709478</a>.","ama":"Wiesener M, Peters K, Taube A, et al. Corrosion properties of bioresorbable FeMn-Ag alloys prepared by selective laser melting. <i>Materials and Corrosion</i>. Published online 2017:1028-1036. doi:<a href=\"https://doi.org/10.1002/maco.201709478\">10.1002/maco.201709478</a>","bibtex":"@article{Wiesener_Peters_Taube_Keller_Hoyer_Niendorf_Grundmeier_2017, title={Corrosion properties of bioresorbable FeMn-Ag alloys prepared by selective laser melting}, DOI={<a href=\"https://doi.org/10.1002/maco.201709478\">10.1002/maco.201709478</a>}, journal={Materials and Corrosion}, author={Wiesener, Markus and Peters, K. and Taube, Alexander and Keller, Adrian and Hoyer, Kay-Peter and Niendorf, Thomas and Grundmeier, Guido}, year={2017}, pages={1028–1036} }","mla":"Wiesener, Markus, et al. “Corrosion Properties of Bioresorbable FeMn-Ag Alloys Prepared by Selective Laser Melting.” <i>Materials and Corrosion</i>, 2017, pp. 1028–36, doi:<a href=\"https://doi.org/10.1002/maco.201709478\">10.1002/maco.201709478</a>."}},{"date_created":"2021-07-08T12:38:10Z","type":"journal_article","department":[{"_id":"302"}],"publication":"Small","citation":{"ama":"Ramakrishnan S, Krainer G, Grundmeier G, Schlierf M, Keller A. Cation-Induced Stabilization and Denaturation of DNA Origami Nanostructures in Urea and Guanidinium Chloride. <i>Small</i>. 2017;13:1702100. doi:<a href=\"https://doi.org/10.1002/smll.201702100\">10.1002/smll.201702100</a>","bibtex":"@article{Ramakrishnan_Krainer_Grundmeier_Schlierf_Keller_2017, title={Cation-Induced Stabilization and Denaturation of DNA Origami Nanostructures in Urea and Guanidinium Chloride}, volume={13}, DOI={<a href=\"https://doi.org/10.1002/smll.201702100\">10.1002/smll.201702100</a>}, journal={Small}, author={Ramakrishnan, Saminathan and Krainer, Georg and Grundmeier, Guido and Schlierf, Michael and Keller, Adrian}, year={2017}, pages={1702100} }","mla":"Ramakrishnan, Saminathan, et al. “Cation-Induced Stabilization and Denaturation of DNA Origami Nanostructures in Urea and Guanidinium Chloride.” <i>Small</i>, vol. 13, 2017, p. 1702100, doi:<a href=\"https://doi.org/10.1002/smll.201702100\">10.1002/smll.201702100</a>.","chicago":"Ramakrishnan, Saminathan, Georg Krainer, Guido Grundmeier, Michael Schlierf, and Adrian Keller. “Cation-Induced Stabilization and Denaturation of DNA Origami Nanostructures in Urea and Guanidinium Chloride.” <i>Small</i> 13 (2017): 1702100. <a href=\"https://doi.org/10.1002/smll.201702100\">https://doi.org/10.1002/smll.201702100</a>.","short":"S. Ramakrishnan, G. Krainer, G. Grundmeier, M. Schlierf, A. Keller, Small 13 (2017) 1702100.","apa":"Ramakrishnan, S., Krainer, G., Grundmeier, G., Schlierf, M., &#38; Keller, A. (2017). Cation-Induced Stabilization and Denaturation of DNA Origami Nanostructures in Urea and Guanidinium Chloride. <i>Small</i>, <i>13</i>, 1702100. <a href=\"https://doi.org/10.1002/smll.201702100\">https://doi.org/10.1002/smll.201702100</a>","ieee":"S. Ramakrishnan, G. Krainer, G. Grundmeier, M. Schlierf, and A. Keller, “Cation-Induced Stabilization and Denaturation of DNA Origami Nanostructures in Urea and Guanidinium Chloride,” <i>Small</i>, vol. 13, p. 1702100, 2017."},"page":"1702100","language":[{"iso":"eng"}],"_id":"22668","user_id":"48864","doi":"10.1002/smll.201702100","volume":13,"year":"2017","status":"public","title":"Cation-Induced Stabilization and Denaturation of DNA Origami Nanostructures in Urea and Guanidinium Chloride","author":[{"last_name":"Ramakrishnan","first_name":"Saminathan","full_name":"Ramakrishnan, Saminathan"},{"full_name":"Krainer, Georg","first_name":"Georg","last_name":"Krainer"},{"first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194"},{"first_name":"Michael","last_name":"Schlierf","full_name":"Schlierf, Michael"},{"full_name":"Keller, Adrian","orcid":"0000-0001-7139-3110","first_name":"Adrian","last_name":"Keller","id":"48864"}],"publication_identifier":{"issn":["1613-6810"]},"publication_status":"published","date_updated":"2022-01-06T06:55:38Z","intvolume":"        13"},{"type":"journal_article","department":[{"_id":"302"}],"date_created":"2021-07-08T12:39:31Z","publication":"Applied Surface Science","citation":{"ama":"Mosebach B, Ozkaya B, Giner I, Keller A, Grundmeier G. Analysis of acid-base interactions at Al 2 O 3 (11-20) interfaces by means of single molecule force spectroscopy. <i>Applied Surface Science</i>. 2017;420:296-302. doi:<a href=\"https://doi.org/10.1016/j.apsusc.2017.05.105\">10.1016/j.apsusc.2017.05.105</a>","bibtex":"@article{Mosebach_Ozkaya_Giner_Keller_Grundmeier_2017, title={Analysis of acid-base interactions at Al 2 O 3 (11-20) interfaces by means of single molecule force spectroscopy}, volume={420}, DOI={<a href=\"https://doi.org/10.1016/j.apsusc.2017.05.105\">10.1016/j.apsusc.2017.05.105</a>}, journal={Applied Surface Science}, author={Mosebach, Bastian and Ozkaya, Berkem and Giner, Ignacio and Keller, Adrian and Grundmeier, Guido}, year={2017}, pages={296–302} }","mla":"Mosebach, Bastian, et al. “Analysis of Acid-Base Interactions at Al 2 O 3 (11-20) Interfaces by Means of Single Molecule Force Spectroscopy.” <i>Applied Surface Science</i>, vol. 420, 2017, pp. 296–302, doi:<a href=\"https://doi.org/10.1016/j.apsusc.2017.05.105\">10.1016/j.apsusc.2017.05.105</a>.","short":"B. Mosebach, B. Ozkaya, I. Giner, A. Keller, G. Grundmeier, Applied Surface Science 420 (2017) 296–302.","chicago":"Mosebach, Bastian, Berkem Ozkaya, Ignacio Giner, Adrian Keller, and Guido Grundmeier. “Analysis of Acid-Base Interactions at Al 2 O 3 (11-20) Interfaces by Means of Single Molecule Force Spectroscopy.” <i>Applied Surface Science</i> 420 (2017): 296–302. <a href=\"https://doi.org/10.1016/j.apsusc.2017.05.105\">https://doi.org/10.1016/j.apsusc.2017.05.105</a>.","apa":"Mosebach, B., Ozkaya, B., Giner, I., Keller, A., &#38; Grundmeier, G. (2017). Analysis of acid-base interactions at Al 2 O 3 (11-20) interfaces by means of single molecule force spectroscopy. <i>Applied Surface Science</i>, <i>420</i>, 296–302. <a href=\"https://doi.org/10.1016/j.apsusc.2017.05.105\">https://doi.org/10.1016/j.apsusc.2017.05.105</a>","ieee":"B. Mosebach, B. Ozkaya, I. Giner, A. Keller, and G. Grundmeier, “Analysis of acid-base interactions at Al 2 O 3 (11-20) interfaces by means of single molecule force spectroscopy,” <i>Applied Surface Science</i>, vol. 420, pp. 296–302, 2017."},"user_id":"48864","doi":"10.1016/j.apsusc.2017.05.105","volume":420,"page":"296-302","_id":"22669","language":[{"iso":"eng"}],"publication_status":"published","date_updated":"2022-01-06T06:55:38Z","intvolume":"       420","year":"2017","title":"Analysis of acid-base interactions at Al 2 O 3 (11-20) interfaces by means of single molecule force spectroscopy","status":"public","author":[{"full_name":"Mosebach, Bastian","first_name":"Bastian","last_name":"Mosebach"},{"full_name":"Ozkaya, Berkem","last_name":"Ozkaya","first_name":"Berkem"},{"full_name":"Giner, Ignacio","first_name":"Ignacio","last_name":"Giner"},{"last_name":"Keller","orcid":"0000-0001-7139-3110","first_name":"Adrian","full_name":"Keller, Adrian","id":"48864"},{"full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido","id":"194"}],"publication_identifier":{"issn":["0169-4332"]}}]
