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Schulz-von der Gathen, Journal of Physics D: Applied Physics (2015).","mla":"Schröder, Daniel, et al. “Characteristics of a Propagating, Self-Pulsing, Constricted ‘γ-Mode-like’ Discharge.” Journal of Physics D: Applied Physics, 055206, 2015, doi:10.1088/0022-3727/48/5/055206.","bibtex":"@article{Schröder_Burhenn_de los Arcos de Pedro_Schulz-von der Gathen_2015, title={Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge}, DOI={10.1088/0022-3727/48/5/055206}, number={055206}, journal={Journal of Physics D: Applied Physics}, author={Schröder, Daniel and Burhenn, Sebastian and de los Arcos de Pedro, Maria Teresa and Schulz-von der Gathen, Volker}, year={2015} }"},"publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","title":"Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge","doi":"10.1088/0022-3727/48/5/055206","date_updated":"2023-01-24T08:19:53Z","date_created":"2021-07-07T09:15:40Z","author":[{"full_name":"Schröder, Daniel","last_name":"Schröder","first_name":"Daniel"},{"last_name":"Burhenn","full_name":"Burhenn, Sebastian","first_name":"Sebastian"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"last_name":"Schulz-von der Gathen","full_name":"Schulz-von der Gathen, Volker","first_name":"Volker"}],"status":"public","publication":"Journal of Physics D: Applied Physics","type":"journal_article","article_number":"055206","extern":"1","language":[{"iso":"eng"}],"_id":"22583","department":[{"_id":"302"}],"user_id":"54556"},{"year":"2015","citation":{"mla":"Marcak, Adrian, et al. “Note: Ion-Induced Secondary Electron Emission from Oxidized Metal Surfaces Measured in a Particle Beam Reactor.” Review of Scientific Instruments, 106102, 2015, doi:10.1063/1.4932309.","bibtex":"@article{Marcak_Corbella_de los Arcos de Pedro_von Keudell_2015, title={Note: Ion-induced secondary electron emission from oxidized metal surfaces measured in a particle beam reactor}, DOI={10.1063/1.4932309}, number={106102}, journal={Review of Scientific Instruments}, author={Marcak, Adrian and Corbella, Carles and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim}, year={2015} }","short":"A. Marcak, C. Corbella, M.T. de los Arcos de Pedro, A. von Keudell, Review of Scientific Instruments (2015).","apa":"Marcak, A., Corbella, C., de los Arcos de Pedro, M. T., & von Keudell, A. (2015). Note: Ion-induced secondary electron emission from oxidized metal surfaces measured in a particle beam reactor. Review of Scientific Instruments, Article 106102. https://doi.org/10.1063/1.4932309","ama":"Marcak A, Corbella C, de los Arcos de Pedro MT, von Keudell A. Note: Ion-induced secondary electron emission from oxidized metal surfaces measured in a particle beam reactor. Review of Scientific Instruments. Published online 2015. doi:10.1063/1.4932309","chicago":"Marcak, Adrian, Carles Corbella, Maria Teresa de los Arcos de Pedro, and Achim von Keudell. “Note: Ion-Induced Secondary Electron Emission from Oxidized Metal Surfaces Measured in a Particle Beam Reactor.” Review of Scientific Instruments, 2015. https://doi.org/10.1063/1.4932309.","ieee":"A. Marcak, C. Corbella, M. T. de los Arcos de Pedro, and A. von Keudell, “Note: Ion-induced secondary electron emission from oxidized metal surfaces measured in a particle beam reactor,” Review of Scientific Instruments, Art. no. 106102, 2015, doi: 10.1063/1.4932309."},"publication_status":"published","publication_identifier":{"issn":["0034-6748","1089-7623"]},"title":"Note: Ion-induced secondary electron emission from oxidized metal surfaces measured in a particle beam reactor","doi":"10.1063/1.4932309","date_updated":"2023-01-24T08:19:23Z","date_created":"2021-07-07T09:15:01Z","author":[{"last_name":"Marcak","full_name":"Marcak, Adrian","first_name":"Adrian"},{"last_name":"Corbella","full_name":"Corbella, Carles","first_name":"Carles"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"Achim","full_name":"von Keudell, Achim","last_name":"von Keudell"}],"status":"public","type":"journal_article","publication":"Review of Scientific Instruments","article_number":"106102","language":[{"iso":"eng"}],"_id":"22581","user_id":"54556","department":[{"_id":"302"}]},{"title":"Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications","doi":"10.1007/s11661-015-2932-2","date_updated":"2023-06-01T14:23:33Z","author":[{"first_name":"Thomas","last_name":"Niendorf","full_name":"Niendorf, Thomas"},{"first_name":"Florian","full_name":"Brenne, Florian","last_name":"Brenne"},{"last_name":"Hoyer","id":"48411","full_name":"Hoyer, Kay-Peter","first_name":"Kay-Peter"},{"full_name":"Schwarze, Dieter","last_name":"Schwarze","first_name":"Dieter"},{"first_name":"Mirko","last_name":"Schaper","full_name":"Schaper, Mirko","id":"43720"},{"full_name":"Grothe, Richard","last_name":"Grothe","first_name":"Richard"},{"last_name":"Wiesener","full_name":"Wiesener, Markus","first_name":"Markus"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"},{"last_name":"Maier","full_name":"Maier, Hans Jürgen","first_name":"Hans Jürgen"}],"date_created":"2021-09-10T07:22:01Z","year":"2015","citation":{"mla":"Niendorf, Thomas, et al. “Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications.” Metallurgical and Materials Transactions A, 2015, pp. 2829–33, doi:10.1007/s11661-015-2932-2.","short":"T. Niendorf, F. Brenne, K.-P. Hoyer, D. Schwarze, M. Schaper, R. Grothe, M. Wiesener, G. Grundmeier, H.J. Maier, Metallurgical and Materials Transactions A (2015) 2829–2833.","bibtex":"@article{Niendorf_Brenne_Hoyer_Schwarze_Schaper_Grothe_Wiesener_Grundmeier_Maier_2015, title={Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications}, DOI={10.1007/s11661-015-2932-2}, journal={Metallurgical and Materials Transactions A}, author={Niendorf, Thomas and Brenne, Florian and Hoyer, Kay-Peter and Schwarze, Dieter and Schaper, Mirko and Grothe, Richard and Wiesener, Markus and Grundmeier, Guido and Maier, Hans Jürgen}, year={2015}, pages={2829–2833} }","apa":"Niendorf, T., Brenne, F., Hoyer, K.-P., Schwarze, D., Schaper, M., Grothe, R., Wiesener, M., Grundmeier, G., & Maier, H. J. (2015). Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications. Metallurgical and Materials Transactions A, 2829–2833. https://doi.org/10.1007/s11661-015-2932-2","chicago":"Niendorf, Thomas, Florian Brenne, Kay-Peter Hoyer, Dieter Schwarze, Mirko Schaper, Richard Grothe, Markus Wiesener, Guido Grundmeier, and Hans Jürgen Maier. “Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications.” Metallurgical and Materials Transactions A, 2015, 2829–33. https://doi.org/10.1007/s11661-015-2932-2.","ieee":"T. Niendorf et al., “Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications,” Metallurgical and Materials Transactions A, pp. 2829–2833, 2015, doi: 10.1007/s11661-015-2932-2.","ama":"Niendorf T, Brenne F, Hoyer K-P, et al. Processing of New Materials by Additive Manufacturing: Iron-Based Alloys Containing Silver for Biomedical Applications. Metallurgical and Materials Transactions A. Published online 2015:2829-2833. doi:10.1007/s11661-015-2932-2"},"page":"2829-2833","publication_status":"published","quality_controlled":"1","publication_identifier":{"issn":["1073-5623","1543-1940"]},"language":[{"iso":"eng"}],"_id":"24112","user_id":"43720","department":[{"_id":"9"},{"_id":"158"},{"_id":"302"}],"status":"public","type":"journal_article","publication":"Metallurgical and Materials Transactions A"},{"isi":"1","department":[{"_id":"35"},{"_id":"302"},{"_id":"321"}],"user_id":"7266","_id":"20944","status":"public","type":"journal_article","doi":"10.1016/j.jmatprotec.2014.04.015","volume":214,"author":[{"id":"7266","full_name":"Ebbert, Christoph","last_name":"Ebbert","first_name":"Christoph"},{"first_name":"H. C.","last_name":"Schmidt","full_name":"Schmidt, H. C."},{"last_name":"Rodman","full_name":"Rodman, D.","first_name":"D."},{"first_name":"F.","last_name":"Nuernberger","full_name":"Nuernberger, F."},{"last_name":"Homberg","full_name":"Homberg, W.","first_name":"W."},{"last_name":"Maier","full_name":"Maier, H. J.","first_name":"H. J."},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"}],"date_updated":"2022-01-06T06:54:41Z","page":"2179-2187","intvolume":" 214","citation":{"short":"C. Ebbert, H.C. Schmidt, D. Rodman, F. Nuernberger, W. Homberg, H.J. Maier, G. Grundmeier, JOURNAL OF MATERIALS PROCESSING TECHNOLOGY 214 (2014) 2179–2187.","bibtex":"@article{Ebbert_Schmidt_Rodman_Nuernberger_Homberg_Maier_Grundmeier_2014, title={Joining with electrochemical support (ECUF): Cold pressure welding of copper}, volume={214}, DOI={10.1016/j.jmatprotec.2014.04.015}, number={10}, journal={JOURNAL OF MATERIALS PROCESSING TECHNOLOGY}, author={Ebbert, Christoph and Schmidt, H. C. and Rodman, D. and Nuernberger, F. and Homberg, W. and Maier, H. J. and Grundmeier, Guido}, year={2014}, pages={2179–2187} }","mla":"Ebbert, Christoph, et al. “Joining with Electrochemical Support (ECUF): Cold Pressure Welding of Copper.” JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, vol. 214, no. 10, 2014, pp. 2179–87, doi:10.1016/j.jmatprotec.2014.04.015.","apa":"Ebbert, C., Schmidt, H. C., Rodman, D., Nuernberger, F., Homberg, W., Maier, H. J., & Grundmeier, G. (2014). Joining with electrochemical support (ECUF): Cold pressure welding of copper. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 214(10), 2179–2187. https://doi.org/10.1016/j.jmatprotec.2014.04.015","ama":"Ebbert C, Schmidt HC, Rodman D, et al. Joining with electrochemical support (ECUF): Cold pressure welding of copper. JOURNAL OF MATERIALS PROCESSING TECHNOLOGY. 2014;214(10):2179-2187. doi:10.1016/j.jmatprotec.2014.04.015","chicago":"Ebbert, Christoph, H. C. Schmidt, D. Rodman, F. Nuernberger, W. Homberg, H. J. Maier, and Guido Grundmeier. “Joining with Electrochemical Support (ECUF): Cold Pressure Welding of Copper.” JOURNAL OF MATERIALS PROCESSING TECHNOLOGY 214, no. 10 (2014): 2179–87. https://doi.org/10.1016/j.jmatprotec.2014.04.015.","ieee":"C. Ebbert et al., “Joining with electrochemical support (ECUF): Cold pressure welding of copper,” JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, vol. 214, no. 10, pp. 2179–2187, 2014."},"publication_identifier":{"issn":["0924-0136"]},"publication_status":"published","language":[{"iso":"eng"}],"external_id":{"isi":["000338814500023"]},"abstract":[{"text":"Joining metals using electrochemical support (ECUF) is a new process for cold pressure welding sheets and parts. This new process is based on an electrochemical in-line surface treatment followed by incremental pilger rolling. The ECUF process intends to cold pressure weld materials under optimized conditions. Oxide layers on metal surfaces are known to inhibit the formation of cold pressure welds. The in-line electrochemical treatment will be used to remove these surface oxides for specific engineering metals and alloys. Hence, an improved pressure weld formation at lower forces and smaller reduction ratios is expected for the electrochemically treated surfaces. Using a more flexible pressure welding process, the number of applications could be greatly improved. First tests with copper were performed to analyse the efficiency of the proposed electrochemical surface treatments. Two electrochemical treatments, the cathodic oxide-reduction and cyclovoltammetric oxide-reduction, were compared with conventional treatments (degreasing and scratch brushing) regarding their influence on the cold pressure welding process of copper. The weld strength of lap welds has been investigated as well as the necessary reduction threshold to form a weld. It was found that the electrochemical oxide reduction resulted in higher weld strength. The results of scanning electron microscopy (SEM) and energy dispersive analysis of X-rays (EDX) indicate that surface oxides were successfully removed by the electrochemical surface treatments. (C) 2014 Elsevier B.V. All rights reserved.","lang":"eng"}],"publication":"JOURNAL OF MATERIALS PROCESSING TECHNOLOGY","title":"Joining with electrochemical support (ECUF): Cold pressure welding of copper","date_created":"2021-01-13T10:12:50Z","year":"2014","issue":"10","quality_controlled":"1"},{"doi":"10.3390/molecules190913803","title":"Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy","date_created":"2021-07-08T13:01:44Z","author":[{"first_name":"Ilko","last_name":"Bald","full_name":"Bald, Ilko"},{"first_name":"Adrian","full_name":"Keller, Adrian","id":"48864","last_name":"Keller","orcid":"0000-0001-7139-3110"}],"volume":19,"date_updated":"2022-01-06T06:55:38Z","citation":{"ama":"Bald I, Keller A. Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy. Molecules. 2014;19:13803-13823. doi:10.3390/molecules190913803","ieee":"I. Bald and A. Keller, “Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy,” Molecules, vol. 19, pp. 13803–13823, 2014.","chicago":"Bald, Ilko, and Adrian Keller. “Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy.” Molecules 19 (2014): 13803–23. https://doi.org/10.3390/molecules190913803.","bibtex":"@article{Bald_Keller_2014, title={Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy}, volume={19}, DOI={10.3390/molecules190913803}, journal={Molecules}, author={Bald, Ilko and Keller, Adrian}, year={2014}, pages={13803–13823} }","short":"I. Bald, A. Keller, Molecules 19 (2014) 13803–13823.","mla":"Bald, Ilko, and Adrian Keller. “Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy.” Molecules, vol. 19, 2014, pp. 13803–23, doi:10.3390/molecules190913803.","apa":"Bald, I., & Keller, A. (2014). Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy. Molecules, 19, 13803–13823. https://doi.org/10.3390/molecules190913803"},"intvolume":" 19","page":"13803-13823","year":"2014","publication_status":"published","publication_identifier":{"issn":["1420-3049"]},"language":[{"iso":"eng"}],"user_id":"48864","department":[{"_id":"302"}],"_id":"22683","status":"public","type":"journal_article","publication":"Molecules"},{"department":[{"_id":"302"}],"user_id":"54556","_id":"22580","extern":"1","language":[{"iso":"eng"}],"publication":"Advanced Engineering Materials","type":"journal_article","status":"public","date_created":"2021-07-07T09:14:25Z","author":[{"full_name":"König, Dennis","last_name":"König","first_name":"Dennis"},{"first_name":"Dennis","last_name":"Naujoks","full_name":"Naujoks, Dennis"},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"full_name":"Grosse-Kreul, Simon","last_name":"Grosse-Kreul","first_name":"Simon"},{"first_name":"Alfred","last_name":"Ludwig","full_name":"Ludwig, Alfred"}],"date_updated":"2023-01-24T08:20:08Z","doi":"10.1002/adem.201400317","title":"X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films","publication_identifier":{"issn":["1438-1656"]},"publication_status":"published","page":"669-673","citation":{"chicago":"König, Dennis, Dennis Naujoks, Maria Teresa de los Arcos de Pedro, Simon Grosse-Kreul, and Alfred Ludwig. “X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and Its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films.” Advanced Engineering Materials, 2014, 669–73. https://doi.org/10.1002/adem.201400317.","ieee":"D. König, D. Naujoks, M. T. de los Arcos de Pedro, S. Grosse-Kreul, and A. Ludwig, “X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films,” Advanced Engineering Materials, pp. 669–673, 2014, doi: 10.1002/adem.201400317.","ama":"König D, Naujoks D, de los Arcos de Pedro MT, Grosse-Kreul S, Ludwig A. X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films. Advanced Engineering Materials. Published online 2014:669-673. doi:10.1002/adem.201400317","bibtex":"@article{König_Naujoks_de los Arcos de Pedro_Grosse-Kreul_Ludwig_2014, title={X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films}, DOI={10.1002/adem.201400317}, journal={Advanced Engineering Materials}, author={König, Dennis and Naujoks, Dennis and de los Arcos de Pedro, Maria Teresa and Grosse-Kreul, Simon and Ludwig, Alfred}, year={2014}, pages={669–673} }","mla":"König, Dennis, et al. “X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and Its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films.” Advanced Engineering Materials, 2014, pp. 669–73, doi:10.1002/adem.201400317.","short":"D. König, D. Naujoks, M.T. de los Arcos de Pedro, S. Grosse-Kreul, A. Ludwig, Advanced Engineering Materials (2014) 669–673.","apa":"König, D., Naujoks, D., de los Arcos de Pedro, M. T., Grosse-Kreul, S., & Ludwig, A. (2014). X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films. Advanced Engineering Materials, 669–673. https://doi.org/10.1002/adem.201400317"},"year":"2014"},{"extern":"1","language":[{"iso":"eng"}],"article_number":"054008","user_id":"54556","department":[{"_id":"302"}],"_id":"22585","status":"public","type":"journal_article","publication":"Plasma Sources Science and Technology","doi":"10.1088/0963-0252/23/5/054008","title":"Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate","author":[{"first_name":"Maria Teresa","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro"},{"full_name":"Schröder, Raphael","last_name":"Schröder","first_name":"Raphael"},{"last_name":"Gonzalvo","full_name":"Gonzalvo, Yolanda Aranda","first_name":"Yolanda Aranda"},{"first_name":"Volker Schulz-von der","last_name":"Gathen","full_name":"Gathen, Volker Schulz-von der"},{"first_name":"Jörg","full_name":"Winter, Jörg","last_name":"Winter"}],"date_created":"2021-07-07T11:10:18Z","date_updated":"2023-01-24T08:20:25Z","citation":{"ama":"de los Arcos de Pedro MT, Schröder R, Gonzalvo YA, Gathen VS der, Winter J. Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate. Plasma Sources Science and Technology. Published online 2014. doi:10.1088/0963-0252/23/5/054008","ieee":"M. T. de los Arcos de Pedro, R. Schröder, Y. A. Gonzalvo, V. S. der Gathen, and J. Winter, “Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate,” Plasma Sources Science and Technology, Art. no. 054008, 2014, doi: 10.1088/0963-0252/23/5/054008.","chicago":"Arcos de Pedro, Maria Teresa de los, Raphael Schröder, Yolanda Aranda Gonzalvo, Volker Schulz-von der Gathen, and Jörg Winter. “Description of HiPIMS Plasma Regimes in Terms of Composition, Spoke Formation and Deposition Rate.” Plasma Sources Science and Technology, 2014. https://doi.org/10.1088/0963-0252/23/5/054008.","apa":"de los Arcos de Pedro, M. T., Schröder, R., Gonzalvo, Y. A., Gathen, V. S. der, & Winter, J. (2014). Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate. Plasma Sources Science and Technology, Article 054008. https://doi.org/10.1088/0963-0252/23/5/054008","mla":"de los Arcos de Pedro, Maria Teresa, et al. “Description of HiPIMS Plasma Regimes in Terms of Composition, Spoke Formation and Deposition Rate.” Plasma Sources Science and Technology, 054008, 2014, doi:10.1088/0963-0252/23/5/054008.","bibtex":"@article{de los Arcos de Pedro_Schröder_Gonzalvo_Gathen_Winter_2014, title={Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate}, DOI={10.1088/0963-0252/23/5/054008}, number={054008}, journal={Plasma Sources Science and Technology}, author={de los Arcos de Pedro, Maria Teresa and Schröder, Raphael and Gonzalvo, Yolanda Aranda and Gathen, Volker Schulz-von der and Winter, Jörg}, year={2014} }","short":"M.T. de los Arcos de Pedro, R. Schröder, Y.A. Gonzalvo, V.S. der Gathen, J. Winter, Plasma Sources Science and Technology (2014)."},"year":"2014","publication_status":"published","publication_identifier":{"issn":["0963-0252","1361-6595"]}},{"date_updated":"2023-01-24T08:20:49Z","author":[{"last_name":"Eren","full_name":"Eren, Baran","first_name":"Baran"},{"full_name":"Marot, Laurent","last_name":"Marot","first_name":"Laurent"},{"full_name":"Steiner, Roland","last_name":"Steiner","first_name":"Roland"},{"first_name":"Maria Teresa","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro"},{"first_name":"Marcel","last_name":"Düggelin","full_name":"Düggelin, Marcel"},{"first_name":"Daniel","last_name":"Mathys","full_name":"Mathys, Daniel"},{"full_name":"Goldie, Kenneth N.","last_name":"Goldie","first_name":"Kenneth N."},{"full_name":"Olivieri, Vesna","last_name":"Olivieri","first_name":"Vesna"},{"first_name":"Ernst","last_name":"Meyer","full_name":"Meyer, Ernst"}],"date_created":"2021-07-07T11:10:35Z","title":"Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology","doi":"10.1016/j.cplett.2014.06.042","publication_identifier":{"issn":["0009-2614"]},"publication_status":"published","year":"2014","page":"82-87","citation":{"apa":"Eren, B., Marot, L., Steiner, R., de los Arcos de Pedro, M. T., Düggelin, M., Mathys, D., Goldie, K. N., Olivieri, V., & Meyer, E. (2014). Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology. Chemical Physics Letters, 82–87. https://doi.org/10.1016/j.cplett.2014.06.042","short":"B. Eren, L. Marot, R. Steiner, M.T. de los Arcos de Pedro, M. Düggelin, D. Mathys, K.N. Goldie, V. Olivieri, E. Meyer, Chemical Physics Letters (2014) 82–87.","mla":"Eren, Baran, et al. “Carbon Nanotube Growth on AlN Support: Comparison between Ni and Fe Chemical States and Morphology.” Chemical Physics Letters, 2014, pp. 82–87, doi:10.1016/j.cplett.2014.06.042.","bibtex":"@article{Eren_Marot_Steiner_de los Arcos de Pedro_Düggelin_Mathys_Goldie_Olivieri_Meyer_2014, title={Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology}, DOI={10.1016/j.cplett.2014.06.042}, journal={Chemical Physics Letters}, author={Eren, Baran and Marot, Laurent and Steiner, Roland and de los Arcos de Pedro, Maria Teresa and Düggelin, Marcel and Mathys, Daniel and Goldie, Kenneth N. and Olivieri, Vesna and Meyer, Ernst}, year={2014}, pages={82–87} }","ama":"Eren B, Marot L, Steiner R, et al. Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology. Chemical Physics Letters. Published online 2014:82-87. doi:10.1016/j.cplett.2014.06.042","ieee":"B. Eren et al., “Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology,” Chemical Physics Letters, pp. 82–87, 2014, doi: 10.1016/j.cplett.2014.06.042.","chicago":"Eren, Baran, Laurent Marot, Roland Steiner, Maria Teresa de los Arcos de Pedro, Marcel Düggelin, Daniel Mathys, Kenneth N. Goldie, Vesna Olivieri, and Ernst Meyer. “Carbon Nanotube Growth on AlN Support: Comparison between Ni and Fe Chemical States and Morphology.” Chemical Physics Letters, 2014, 82–87. https://doi.org/10.1016/j.cplett.2014.06.042."},"_id":"22586","department":[{"_id":"302"}],"user_id":"54556","extern":"1","language":[{"iso":"eng"}],"publication":"Chemical Physics Letters","type":"journal_article","status":"public"},{"article_number":"065043","extern":"1","language":[{"iso":"eng"}],"_id":"22587","user_id":"54556","department":[{"_id":"302"}],"status":"public","type":"journal_article","publication":"Plasma Sources Science and Technology","title":"Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges","doi":"10.1088/0963-0252/23/6/065043","date_updated":"2023-01-24T08:21:04Z","date_created":"2021-07-07T11:10:48Z","author":[{"full_name":"Machura, P D","last_name":"Machura","first_name":"P D"},{"last_name":"Hecimovic","full_name":"Hecimovic, A","first_name":"A"},{"last_name":"Gallian","full_name":"Gallian, S","first_name":"S"},{"first_name":"J","last_name":"Winter","full_name":"Winter, J"},{"first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556"}],"year":"2014","citation":{"ieee":"P. D. Machura, A. Hecimovic, S. Gallian, J. Winter, and M. T. de los Arcos de Pedro, “Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges,” Plasma Sources Science and Technology, Art. no. 065043, 2014, doi: 10.1088/0963-0252/23/6/065043.","chicago":"Machura, P D, A Hecimovic, S Gallian, J Winter, and Maria Teresa de los Arcos de Pedro. “Simultaneous Characterization of Static and Induced Magnetic Fields in High Power Impulse Magnetron Sputtering Discharges.” Plasma Sources Science and Technology, 2014. https://doi.org/10.1088/0963-0252/23/6/065043.","ama":"Machura PD, Hecimovic A, Gallian S, Winter J, de los Arcos de Pedro MT. Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges. Plasma Sources Science and Technology. Published online 2014. doi:10.1088/0963-0252/23/6/065043","apa":"Machura, P. D., Hecimovic, A., Gallian, S., Winter, J., & de los Arcos de Pedro, M. T. (2014). Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges. Plasma Sources Science and Technology, Article 065043. https://doi.org/10.1088/0963-0252/23/6/065043","short":"P.D. Machura, A. Hecimovic, S. Gallian, J. Winter, M.T. de los Arcos de Pedro, Plasma Sources Science and Technology (2014).","mla":"Machura, P. D., et al. “Simultaneous Characterization of Static and Induced Magnetic Fields in High Power Impulse Magnetron Sputtering Discharges.” Plasma Sources Science and Technology, 065043, 2014, doi:10.1088/0963-0252/23/6/065043.","bibtex":"@article{Machura_Hecimovic_Gallian_Winter_de los Arcos de Pedro_2014, title={Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges}, DOI={10.1088/0963-0252/23/6/065043}, number={065043}, journal={Plasma Sources Science and Technology}, author={Machura, P D and Hecimovic, A and Gallian, S and Winter, J and de los Arcos de Pedro, Maria Teresa}, year={2014} }"},"publication_status":"published","publication_identifier":{"issn":["0963-0252","1361-6595"]}},{"article_number":"475204","language":[{"iso":"eng"}],"extern":"1","_id":"22588","user_id":"54556","department":[{"_id":"302"}],"status":"public","type":"journal_article","publication":"Journal of Physics D: Applied Physics","title":"Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure","doi":"10.1088/0022-3727/47/47/475204","date_updated":"2023-01-24T08:21:18Z","date_created":"2021-07-07T11:11:00Z","author":[{"first_name":"D","full_name":"Marinov, D","last_name":"Marinov"},{"last_name":"Guaitella","full_name":"Guaitella, O","first_name":"O"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"A","last_name":"von Keudell","full_name":"von Keudell, A"},{"full_name":"Rousseau, A","last_name":"Rousseau","first_name":"A"}],"year":"2014","citation":{"apa":"Marinov, D., Guaitella, O., de los Arcos de Pedro, M. T., von Keudell, A., & Rousseau, A. (2014). Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure. Journal of Physics D: Applied Physics, Article 475204. https://doi.org/10.1088/0022-3727/47/47/475204","bibtex":"@article{Marinov_Guaitella_de los Arcos de Pedro_von Keudell_Rousseau_2014, title={Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure}, DOI={10.1088/0022-3727/47/47/475204}, number={475204}, journal={Journal of Physics D: Applied Physics}, author={Marinov, D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A and Rousseau, A}, year={2014} }","mla":"Marinov, D., et al. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface under Plasma Exposure.” Journal of Physics D: Applied Physics, 475204, 2014, doi:10.1088/0022-3727/47/47/475204.","short":"D. Marinov, O. Guaitella, M.T. de los Arcos de Pedro, A. von Keudell, A. Rousseau, Journal of Physics D: Applied Physics (2014).","ama":"Marinov D, Guaitella O, de los Arcos de Pedro MT, von Keudell A, Rousseau A. Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure. Journal of Physics D: Applied Physics. Published online 2014. doi:10.1088/0022-3727/47/47/475204","chicago":"Marinov, D, O Guaitella, Maria Teresa de los Arcos de Pedro, A von Keudell, and A Rousseau. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface under Plasma Exposure.” Journal of Physics D: Applied Physics, 2014. https://doi.org/10.1088/0022-3727/47/47/475204.","ieee":"D. Marinov, O. Guaitella, M. T. de los Arcos de Pedro, A. von Keudell, and A. Rousseau, “Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure,” Journal of Physics D: Applied Physics, Art. no. 475204, 2014, doi: 10.1088/0022-3727/47/47/475204."},"publication_status":"published","publication_identifier":{"issn":["0022-3727","1361-6463"]}},{"extern":"1","language":[{"iso":"eng"}],"_id":"22590","department":[{"_id":"302"}],"user_id":"54556","status":"public","publication":"Journal of Nanoscience and Nanotechnology","type":"journal_article","title":"Nanostructured Er2O3 Thin Films Grown by Metalorganic Chemical Vapour Deposition","doi":"10.1166/jnn.2014.8848","date_updated":"2023-01-24T08:21:36Z","author":[{"last_name":"Xu","full_name":"Xu, Ke","first_name":"Ke"},{"last_name":"Dang","full_name":"Dang, Van-Son","first_name":"Van-Son"},{"first_name":"Andreas","full_name":"Ney, Andreas","last_name":"Ney"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"first_name":"Anjana","full_name":"Devi, Anjana","last_name":"Devi"}],"date_created":"2021-07-07T11:11:37Z","year":"2014","page":"5095-5102","citation":{"ama":"Xu K, Dang V-S, Ney A, de los Arcos de Pedro MT, Devi A. Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition. Journal of Nanoscience and Nanotechnology. Published online 2014:5095-5102. doi:10.1166/jnn.2014.8848","chicago":"Xu, Ke, Van-Son Dang, Andreas Ney, Maria Teresa de los Arcos de Pedro, and Anjana Devi. “Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition.” Journal of Nanoscience and Nanotechnology, 2014, 5095–5102. https://doi.org/10.1166/jnn.2014.8848.","ieee":"K. Xu, V.-S. Dang, A. Ney, M. T. de los Arcos de Pedro, and A. Devi, “Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition,” Journal of Nanoscience and Nanotechnology, pp. 5095–5102, 2014, doi: 10.1166/jnn.2014.8848.","short":"K. Xu, V.-S. Dang, A. Ney, M.T. de los Arcos de Pedro, A. Devi, Journal of Nanoscience and Nanotechnology (2014) 5095–5102.","mla":"Xu, Ke, et al. “Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition.” Journal of Nanoscience and Nanotechnology, 2014, pp. 5095–102, doi:10.1166/jnn.2014.8848.","bibtex":"@article{Xu_Dang_Ney_de los Arcos de Pedro_Devi_2014, title={Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition}, DOI={10.1166/jnn.2014.8848}, journal={Journal of Nanoscience and Nanotechnology}, author={Xu, Ke and Dang, Van-Son and Ney, Andreas and de los Arcos de Pedro, Maria Teresa and Devi, Anjana}, year={2014}, pages={5095–5102} }","apa":"Xu, K., Dang, V.-S., Ney, A., de los Arcos de Pedro, M. T., & Devi, A. (2014). Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition. Journal of Nanoscience and Nanotechnology, 5095–5102. https://doi.org/10.1166/jnn.2014.8848"},"publication_identifier":{"issn":["1533-4880","1533-4899"]},"publication_status":"published"},{"type":"journal_article","status":"public","_id":"20945","department":[{"_id":"35"},{"_id":"302"},{"_id":"321"}],"user_id":"7266","isi":"1","publication_identifier":{"issn":["0169-4332"],"eissn":["1873-5584"]},"publication_status":"published","page":"207-214","intvolume":" 290","citation":{"bibtex":"@article{Ebbert_Grundmeier_Buitkamp_Kroeger_Messerschmidt_Thissen_2014, title={Toward a microscopic understanding of the calcium-silicate-hydrates/water interface}, volume={290}, DOI={10.1016/j.apsusc.2013.11.045}, journal={APPLIED SURFACE SCIENCE}, author={Ebbert, Christoph and Grundmeier, Guido and Buitkamp, Nadine and Kroeger, Alexander and Messerschmidt, Florian and Thissen, Peter}, year={2014}, pages={207–214} }","mla":"Ebbert, Christoph, et al. “Toward a Microscopic Understanding of the Calcium-Silicate-Hydrates/Water Interface.” APPLIED SURFACE SCIENCE, vol. 290, 2014, pp. 207–14, doi:10.1016/j.apsusc.2013.11.045.","short":"C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, P. Thissen, APPLIED SURFACE SCIENCE 290 (2014) 207–214.","apa":"Ebbert, C., Grundmeier, G., Buitkamp, N., Kroeger, A., Messerschmidt, F., & Thissen, P. (2014). Toward a microscopic understanding of the calcium-silicate-hydrates/water interface. APPLIED SURFACE SCIENCE, 290, 207–214. https://doi.org/10.1016/j.apsusc.2013.11.045","ama":"Ebbert C, Grundmeier G, Buitkamp N, Kroeger A, Messerschmidt F, Thissen P. Toward a microscopic understanding of the calcium-silicate-hydrates/water interface. APPLIED SURFACE SCIENCE. 2014;290:207-214. doi:10.1016/j.apsusc.2013.11.045","chicago":"Ebbert, Christoph, Guido Grundmeier, Nadine Buitkamp, Alexander Kroeger, Florian Messerschmidt, and Peter Thissen. “Toward a Microscopic Understanding of the Calcium-Silicate-Hydrates/Water Interface.” APPLIED SURFACE SCIENCE 290 (2014): 207–14. https://doi.org/10.1016/j.apsusc.2013.11.045.","ieee":"C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, and P. Thissen, “Toward a microscopic understanding of the calcium-silicate-hydrates/water interface,” APPLIED SURFACE SCIENCE, vol. 290, pp. 207–214, 2014, doi: 10.1016/j.apsusc.2013.11.045."},"date_updated":"2025-11-18T12:05:39Z","volume":290,"author":[{"id":"7266","full_name":"Ebbert, Christoph","last_name":"Ebbert","first_name":"Christoph"},{"full_name":"Grundmeier, Guido","id":"194","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"Nadine","full_name":"Buitkamp, Nadine","id":"1449","last_name":"Buitkamp"},{"first_name":"Alexander","full_name":"Kroeger, Alexander","last_name":"Kroeger"},{"first_name":"Florian","last_name":"Messerschmidt","full_name":"Messerschmidt, Florian"},{"last_name":"Thissen","full_name":"Thissen, Peter","first_name":"Peter"}],"doi":"10.1016/j.apsusc.2013.11.045","publication":"APPLIED SURFACE SCIENCE","abstract":[{"text":"Calcium-Silicate-Hydrates (C-S-H) are the main binding phases in most concrete which is the primarily used composite construction material in the world. However, a big lack is cleaving between the actual knowledge about C-S-H, compared to what could be reached using state-of-the-art technologies of modern research. In this article, the formation of a C-S-H phase on a native oxide covered silicon wafer is investigated by means of in-situ attenuated total reflection infrared (ATR-IR) and ex-situ surface-enhanced Raman spectroscopy (SERS). The total thickness of the C-S-H phase is determined by X-ray photoelectron spectroscopy (XPS) to be 3 nm. The formation appears to be reversible depending on the environment pH value and can be performed at room temperature. Based on density functional theory (DFT) calculations, it is shown that the C-S-H phase in the presence of water will change its chemical composition in order to reach the thermodynamic ground state of the system. This change is achieved by a metal-proton exchange reaction. The stoichiometry of these metal-proton exchange reactions is nearly independent of the environment pH value. Electrokinetic measurements yield isoelectric points of 2.0 and 2.6 for the native oxide covered silicon wafer (SiO2) and the C-S-H phase. This is consistent with a predominance of Si-O sites at the C-S-H/water interface. (C) 2013 Elsevier B. V. All rights reserved.","lang":"eng"}],"external_id":{"isi":["000329060100032"]},"language":[{"iso":"eng"}],"quality_controlled":"1","year":"2014","date_created":"2021-01-13T10:12:51Z","title":"Toward a microscopic understanding of the calcium-silicate-hydrates/water interface"}]