[{"citation":{"chicago":"Marinov, D, O Guaitella, Maria Teresa de los Arcos de Pedro, A von Keudell, and A Rousseau. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface under Plasma Exposure.” <i>Journal of Physics D: Applied Physics</i>, 2014. <a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">https://doi.org/10.1088/0022-3727/47/47/475204</a>.","ieee":"D. Marinov, O. Guaitella, M. T. de los Arcos de Pedro, A. von Keudell, and A. Rousseau, “Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 475204, 2014, doi: <a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>.","ama":"Marinov D, Guaitella O, de los Arcos de Pedro MT, von Keudell A, Rousseau A. Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure. <i>Journal of Physics D: Applied Physics</i>. Published online 2014. doi:<a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>","apa":"Marinov, D., Guaitella, O., de los Arcos de Pedro, M. T., von Keudell, A., &#38; Rousseau, A. (2014). Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure. <i>Journal of Physics D: Applied Physics</i>, Article 475204. <a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">https://doi.org/10.1088/0022-3727/47/47/475204</a>","bibtex":"@article{Marinov_Guaitella_de los Arcos de Pedro_von Keudell_Rousseau_2014, title={Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure}, DOI={<a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>}, number={475204}, journal={Journal of Physics D: Applied Physics}, author={Marinov, D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A and Rousseau, A}, year={2014} }","mla":"Marinov, D., et al. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface under Plasma Exposure.” <i>Journal of Physics D: Applied Physics</i>, 475204, 2014, doi:<a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>.","short":"D. Marinov, O. Guaitella, M.T. de los Arcos de Pedro, A. von Keudell, A. Rousseau, Journal of Physics D: Applied Physics (2014)."},"year":"2014","publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","doi":"10.1088/0022-3727/47/47/475204","title":"Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure","author":[{"first_name":"D","full_name":"Marinov, D","last_name":"Marinov"},{"full_name":"Guaitella, O","last_name":"Guaitella","first_name":"O"},{"first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556"},{"first_name":"A","last_name":"von Keudell","full_name":"von Keudell, A"},{"full_name":"Rousseau, A","last_name":"Rousseau","first_name":"A"}],"date_created":"2021-07-07T11:11:00Z","date_updated":"2023-01-24T08:21:18Z","status":"public","publication":"Journal of Physics D: Applied Physics","type":"journal_article","language":[{"iso":"eng"}],"extern":"1","article_number":"475204","department":[{"_id":"302"}],"user_id":"54556","_id":"22588"},{"title":"Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition","doi":"10.1166/jnn.2014.8848","date_updated":"2023-01-24T08:21:36Z","date_created":"2021-07-07T11:11:37Z","author":[{"last_name":"Xu","full_name":"Xu, Ke","first_name":"Ke"},{"first_name":"Van-Son","last_name":"Dang","full_name":"Dang, Van-Son"},{"full_name":"Ney, Andreas","last_name":"Ney","first_name":"Andreas"},{"first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa"},{"first_name":"Anjana","full_name":"Devi, Anjana","last_name":"Devi"}],"year":"2014","citation":{"ieee":"K. Xu, V.-S. Dang, A. Ney, M. T. de los Arcos de Pedro, and A. Devi, “Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition,” <i>Journal of Nanoscience and Nanotechnology</i>, pp. 5095–5102, 2014, doi: <a href=\"https://doi.org/10.1166/jnn.2014.8848\">10.1166/jnn.2014.8848</a>.","chicago":"Xu, Ke, Van-Son Dang, Andreas Ney, Maria Teresa de los Arcos de Pedro, and Anjana Devi. “Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition.” <i>Journal of Nanoscience and Nanotechnology</i>, 2014, 5095–5102. <a href=\"https://doi.org/10.1166/jnn.2014.8848\">https://doi.org/10.1166/jnn.2014.8848</a>.","ama":"Xu K, Dang V-S, Ney A, de los Arcos de Pedro MT, Devi A. Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition. <i>Journal of Nanoscience and Nanotechnology</i>. Published online 2014:5095-5102. doi:<a href=\"https://doi.org/10.1166/jnn.2014.8848\">10.1166/jnn.2014.8848</a>","short":"K. Xu, V.-S. Dang, A. Ney, M.T. de los Arcos de Pedro, A. Devi, Journal of Nanoscience and Nanotechnology (2014) 5095–5102.","mla":"Xu, Ke, et al. “Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition.” <i>Journal of Nanoscience and Nanotechnology</i>, 2014, pp. 5095–102, doi:<a href=\"https://doi.org/10.1166/jnn.2014.8848\">10.1166/jnn.2014.8848</a>.","bibtex":"@article{Xu_Dang_Ney_de los Arcos de Pedro_Devi_2014, title={Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition}, DOI={<a href=\"https://doi.org/10.1166/jnn.2014.8848\">10.1166/jnn.2014.8848</a>}, journal={Journal of Nanoscience and Nanotechnology}, author={Xu, Ke and Dang, Van-Son and Ney, Andreas and de los Arcos de Pedro, Maria Teresa and Devi, Anjana}, year={2014}, pages={5095–5102} }","apa":"Xu, K., Dang, V.-S., Ney, A., de los Arcos de Pedro, M. T., &#38; Devi, A. (2014). Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition. <i>Journal of Nanoscience and Nanotechnology</i>, 5095–5102. <a href=\"https://doi.org/10.1166/jnn.2014.8848\">https://doi.org/10.1166/jnn.2014.8848</a>"},"page":"5095-5102","publication_status":"published","publication_identifier":{"issn":["1533-4880","1533-4899"]},"language":[{"iso":"eng"}],"extern":"1","_id":"22590","user_id":"54556","department":[{"_id":"302"}],"status":"public","type":"journal_article","publication":"Journal of Nanoscience and Nanotechnology"},{"year":"2014","quality_controlled":"1","title":"Toward a microscopic understanding of the calcium-silicate-hydrates/water interface","date_created":"2021-01-13T10:12:51Z","abstract":[{"text":"Calcium-Silicate-Hydrates (C-S-H) are the main binding phases in most concrete which is the primarily used composite construction material in the world. However, a big lack is cleaving between the actual knowledge about C-S-H, compared to what could be reached using state-of-the-art technologies of modern research. In this article, the formation of a C-S-H phase on a native oxide covered silicon wafer is investigated by means of in-situ attenuated total reflection infrared (ATR-IR) and ex-situ surface-enhanced Raman spectroscopy (SERS). The total thickness of the C-S-H phase is determined by X-ray photoelectron spectroscopy (XPS) to be 3 nm. The formation appears to be reversible depending on the environment pH value and can be performed at room temperature. Based on density functional theory (DFT) calculations, it is shown that the C-S-H phase in the presence of water will change its chemical composition in order to reach the thermodynamic ground state of the system. This change is achieved by a metal-proton exchange reaction. The stoichiometry of these metal-proton exchange reactions is nearly independent of the environment pH value. Electrokinetic measurements yield isoelectric points of 2.0 and 2.6 for the native oxide covered silicon wafer (SiO2) and the C-S-H phase. This is consistent with a predominance of Si-O sites at the C-S-H/water interface. (C) 2013 Elsevier B. V. All rights reserved.","lang":"eng"}],"publication":"APPLIED SURFACE SCIENCE","language":[{"iso":"eng"}],"external_id":{"isi":["000329060100032"]},"citation":{"ieee":"C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, and P. Thissen, “Toward a microscopic understanding of the calcium-silicate-hydrates/water interface,” <i>APPLIED SURFACE SCIENCE</i>, vol. 290, pp. 207–214, 2014, doi: <a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">10.1016/j.apsusc.2013.11.045</a>.","chicago":"Ebbert, Christoph, Guido Grundmeier, Nadine Buitkamp, Alexander Kroeger, Florian Messerschmidt, and Peter Thissen. “Toward a Microscopic Understanding of the Calcium-Silicate-Hydrates/Water Interface.” <i>APPLIED SURFACE SCIENCE</i> 290 (2014): 207–14. <a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">https://doi.org/10.1016/j.apsusc.2013.11.045</a>.","ama":"Ebbert C, Grundmeier G, Buitkamp N, Kroeger A, Messerschmidt F, Thissen P. Toward a microscopic understanding of the calcium-silicate-hydrates/water interface. <i>APPLIED SURFACE SCIENCE</i>. 2014;290:207-214. doi:<a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">10.1016/j.apsusc.2013.11.045</a>","short":"C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, P. Thissen, APPLIED SURFACE SCIENCE 290 (2014) 207–214.","bibtex":"@article{Ebbert_Grundmeier_Buitkamp_Kroeger_Messerschmidt_Thissen_2014, title={Toward a microscopic understanding of the calcium-silicate-hydrates/water interface}, volume={290}, DOI={<a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">10.1016/j.apsusc.2013.11.045</a>}, journal={APPLIED SURFACE SCIENCE}, author={Ebbert, Christoph and Grundmeier, Guido and Buitkamp, Nadine and Kroeger, Alexander and Messerschmidt, Florian and Thissen, Peter}, year={2014}, pages={207–214} }","mla":"Ebbert, Christoph, et al. “Toward a Microscopic Understanding of the Calcium-Silicate-Hydrates/Water Interface.” <i>APPLIED SURFACE SCIENCE</i>, vol. 290, 2014, pp. 207–14, doi:<a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">10.1016/j.apsusc.2013.11.045</a>.","apa":"Ebbert, C., Grundmeier, G., Buitkamp, N., Kroeger, A., Messerschmidt, F., &#38; Thissen, P. (2014). Toward a microscopic understanding of the calcium-silicate-hydrates/water interface. <i>APPLIED SURFACE SCIENCE</i>, <i>290</i>, 207–214. <a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">https://doi.org/10.1016/j.apsusc.2013.11.045</a>"},"intvolume":"       290","page":"207-214","publication_status":"published","publication_identifier":{"issn":["0169-4332"],"eissn":["1873-5584"]},"doi":"10.1016/j.apsusc.2013.11.045","date_updated":"2025-11-18T12:05:39Z","author":[{"last_name":"Ebbert","id":"7266","full_name":"Ebbert, Christoph","first_name":"Christoph"},{"last_name":"Grundmeier","full_name":"Grundmeier, Guido","id":"194","first_name":"Guido"},{"last_name":"Buitkamp","full_name":"Buitkamp, Nadine","id":"1449","first_name":"Nadine"},{"first_name":"Alexander","last_name":"Kroeger","full_name":"Kroeger, Alexander"},{"full_name":"Messerschmidt, Florian","last_name":"Messerschmidt","first_name":"Florian"},{"first_name":"Peter","full_name":"Thissen, Peter","last_name":"Thissen"}],"volume":290,"status":"public","type":"journal_article","isi":"1","_id":"20945","user_id":"7266","department":[{"_id":"35"},{"_id":"302"},{"_id":"321"}]},{"publication":"JOURNAL OF NANOPARTICLE RESEARCH","abstract":[{"text":"In the current work, we study the silver ion release potential and the water uptake through a SiOxCyHz-polymer which is grown from the precursor hexamethyldisiloxane (HMDSO) in radiofrequency (RF) plasma. These layers were deposited on top of two dimensional (2D) ensembles of silver nanoparticles (AgNPs) with nominal thickness of 2 nm on a 20 nm RF-sputtered polytetrafluoroethylene (PTFE) thin film. The composition of the plasma-polymerized HMDSO barriers was varied by changing the oxygen flow during the polymerization process and their thickness was varied as well. Morphology and optical properties of the nanocomposites were investigated using transmission electron microscopy (TEM) and UV-Visible spectroscopy (UV-Vis), respectively. The concentration of the silver ions released from the nanocomposites after immersion in water for several time intervals was measured using inductively coupled plasma mass spectrometry (ICP-MS). Contact angle analysis and electrochemical impedance spectroscopy (EIS) measurements were also performed and results show a strong dependence of the coatings properties and their water uptake on the oxygen content in the coating films and their thickness. Plasma polymerization with increasing the oxygen flow leads to the formation of more hydrophilic thin films with a higher Ag ion release potential. Increasing the thickness of the coatings reduced the amount of the released ions and the rate of the release process was slowed down. This indicates that by tailoring the structure and the thickness of the plasma-polymerized coating films, one can tune the silver ion release properties of Ag/polymer nanocomposites.","lang":"eng"}],"external_id":{"isi":["000326054400001"]},"language":[{"iso":"eng"}],"quality_controlled":"1","issue":"11","year":"2013","date_created":"2021-01-13T10:12:52Z","title":"Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites","type":"journal_article","status":"public","_id":"20946","user_id":"7266","department":[{"_id":"35"},{"_id":"302"},{"_id":"321"}],"isi":"1","article_number":"2080","publication_status":"published","publication_identifier":{"eissn":["1572-896X"],"issn":["1388-0764"]},"citation":{"ama":"Alissawi N, Peter T, Strunskus T, Ebbert C, Grundmeier G, Faupel F. Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites. <i>JOURNAL OF NANOPARTICLE RESEARCH</i>. 2013;15(11). doi:<a href=\"https://doi.org/10.1007/s11051-013-2080-9\">10.1007/s11051-013-2080-9</a>","chicago":"Alissawi, N., T. Peter, T. Strunskus, Christoph Ebbert, Guido Grundmeier, and F. Faupel. “Plasma-Polymerized HMDSO Coatings to Adjust the Silver Ion Release Properties of Ag/Polymer Nanocomposites.” <i>JOURNAL OF NANOPARTICLE RESEARCH</i> 15, no. 11 (2013). <a href=\"https://doi.org/10.1007/s11051-013-2080-9\">https://doi.org/10.1007/s11051-013-2080-9</a>.","ieee":"N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, and F. Faupel, “Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites,” <i>JOURNAL OF NANOPARTICLE RESEARCH</i>, vol. 15, no. 11, 2013.","short":"N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, F. Faupel, JOURNAL OF NANOPARTICLE RESEARCH 15 (2013).","bibtex":"@article{Alissawi_Peter_Strunskus_Ebbert_Grundmeier_Faupel_2013, title={Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites}, volume={15}, DOI={<a href=\"https://doi.org/10.1007/s11051-013-2080-9\">10.1007/s11051-013-2080-9</a>}, number={112080}, journal={JOURNAL OF NANOPARTICLE RESEARCH}, author={Alissawi, N. and Peter, T. and Strunskus, T. and Ebbert, Christoph and Grundmeier, Guido and Faupel, F.}, year={2013} }","mla":"Alissawi, N., et al. “Plasma-Polymerized HMDSO Coatings to Adjust the Silver Ion Release Properties of Ag/Polymer Nanocomposites.” <i>JOURNAL OF NANOPARTICLE RESEARCH</i>, vol. 15, no. 11, 2080, 2013, doi:<a href=\"https://doi.org/10.1007/s11051-013-2080-9\">10.1007/s11051-013-2080-9</a>.","apa":"Alissawi, N., Peter, T., Strunskus, T., Ebbert, C., Grundmeier, G., &#38; Faupel, F. (2013). Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites. <i>JOURNAL OF NANOPARTICLE RESEARCH</i>, <i>15</i>(11). <a href=\"https://doi.org/10.1007/s11051-013-2080-9\">https://doi.org/10.1007/s11051-013-2080-9</a>"},"intvolume":"        15","date_updated":"2022-01-06T06:54:41Z","author":[{"first_name":"N.","full_name":"Alissawi, N.","last_name":"Alissawi"},{"last_name":"Peter","full_name":"Peter, T.","first_name":"T."},{"full_name":"Strunskus, T.","last_name":"Strunskus","first_name":"T."},{"first_name":"Christoph","last_name":"Ebbert","id":"7266","full_name":"Ebbert, Christoph"},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"},{"first_name":"F.","full_name":"Faupel, F.","last_name":"Faupel"}],"volume":15,"doi":"10.1007/s11051-013-2080-9"},{"language":[{"iso":"eng"}],"extern":"1","user_id":"54556","department":[{"_id":"302"}],"_id":"22584","status":"public","type":"journal_article","publication":"physica status solidi (a)","doi":"10.1002/pssa.201330115","title":"Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition","date_created":"2021-07-07T11:09:32Z","author":[{"last_name":"Dang","full_name":"Dang, Van-Son","first_name":"Van-Son"},{"first_name":"Harish","last_name":"Parala","full_name":"Parala, Harish"},{"full_name":"Kim, Jin Hyun","last_name":"Kim","first_name":"Jin Hyun"},{"last_name":"Xu","full_name":"Xu, Ke","first_name":"Ke"},{"full_name":"Srinivasan, Nagendra B.","last_name":"Srinivasan","first_name":"Nagendra B."},{"first_name":"Eugen","last_name":"Edengeiser","full_name":"Edengeiser, Eugen"},{"last_name":"Havenith","full_name":"Havenith, Martina","first_name":"Martina"},{"first_name":"Andreas D.","last_name":"Wieck","full_name":"Wieck, Andreas D."},{"first_name":"Maria Teresa","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro"},{"first_name":"Roland. A.","last_name":"Fischer","full_name":"Fischer, Roland. A."},{"first_name":"Anjana","full_name":"Devi, Anjana","last_name":"Devi"}],"date_updated":"2023-01-24T08:21:54Z","citation":{"ieee":"V.-S. Dang <i>et al.</i>, “Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition,” <i>physica status solidi (a)</i>, pp. 416–424, 2013, doi: <a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>.","chicago":"Dang, Van-Son, Harish Parala, Jin Hyun Kim, Ke Xu, Nagendra B. Srinivasan, Eugen Edengeiser, Martina Havenith, et al. “Electrical and Optical Properties of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” <i>Physica Status Solidi (a)</i>, 2013, 416–24. <a href=\"https://doi.org/10.1002/pssa.201330115\">https://doi.org/10.1002/pssa.201330115</a>.","ama":"Dang V-S, Parala H, Kim JH, et al. Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition. <i>physica status solidi (a)</i>. Published online 2013:416-424. doi:<a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>","mla":"Dang, Van-Son, et al. “Electrical and Optical Properties of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” <i>Physica Status Solidi (a)</i>, 2013, pp. 416–24, doi:<a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>.","bibtex":"@article{Dang_Parala_Kim_Xu_Srinivasan_Edengeiser_Havenith_Wieck_de los Arcos de Pedro_Fischer_et al._2013, title={Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition}, DOI={<a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>}, journal={physica status solidi (a)}, author={Dang, Van-Son and Parala, Harish and Kim, Jin Hyun and Xu, Ke and Srinivasan, Nagendra B. and Edengeiser, Eugen and Havenith, Martina and Wieck, Andreas D. and de los Arcos de Pedro, Maria Teresa and Fischer, Roland. A. and et al.}, year={2013}, pages={416–424} }","short":"V.-S. Dang, H. Parala, J.H. Kim, K. Xu, N.B. Srinivasan, E. Edengeiser, M. Havenith, A.D. Wieck, M.T. de los Arcos de Pedro, Roland.A. Fischer, A. Devi, Physica Status Solidi (a) (2013) 416–424.","apa":"Dang, V.-S., Parala, H., Kim, J. H., Xu, K., Srinivasan, N. B., Edengeiser, E., Havenith, M., Wieck, A. D., de los Arcos de Pedro, M. T., Fischer, Roland. A., &#38; Devi, A. (2013). Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition. <i>Physica Status Solidi (a)</i>, 416–424. <a href=\"https://doi.org/10.1002/pssa.201330115\">https://doi.org/10.1002/pssa.201330115</a>"},"page":"416-424","year":"2013","publication_status":"published","publication_identifier":{"issn":["1862-6300"]}},{"date_created":"2021-07-07T11:11:23Z","author":[{"first_name":"Nagendra B.","full_name":"Srinivasan, Nagendra B.","last_name":"Srinivasan"},{"first_name":"Tobias B.","full_name":"Thiede, Tobias B.","last_name":"Thiede"},{"first_name":"Maria Teresa","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro"},{"full_name":"Rogalla, Detlef","last_name":"Rogalla","first_name":"Detlef"},{"first_name":"Hans-Werner","full_name":"Becker, Hans-Werner","last_name":"Becker"},{"first_name":"Anjana","full_name":"Devi, Anjana","last_name":"Devi"},{"first_name":"Roland A.","last_name":"Fischer","full_name":"Fischer, Roland A."}],"date_updated":"2023-01-24T08:22:27Z","doi":"10.1002/pssa.201330127","title":"MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics","publication_status":"published","publication_identifier":{"issn":["1862-6300"]},"citation":{"mla":"Srinivasan, Nagendra B., et al. “MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and Film Characteristics.” <i>Physica Status Solidi (a)</i>, 2013, pp. 260–66, doi:<a href=\"https://doi.org/10.1002/pssa.201330127\">10.1002/pssa.201330127</a>.","bibtex":"@article{Srinivasan_Thiede_de los Arcos de Pedro_Rogalla_Becker_Devi_Fischer_2013, title={MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics}, DOI={<a href=\"https://doi.org/10.1002/pssa.201330127\">10.1002/pssa.201330127</a>}, journal={physica status solidi (a)}, author={Srinivasan, Nagendra B. and Thiede, Tobias B. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Becker, Hans-Werner and Devi, Anjana and Fischer, Roland A.}, year={2013}, pages={260–266} }","short":"N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, D. Rogalla, H.-W. Becker, A. Devi, R.A. Fischer, Physica Status Solidi (a) (2013) 260–266.","apa":"Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Rogalla, D., Becker, H.-W., Devi, A., &#38; Fischer, R. A. (2013). MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics. <i>Physica Status Solidi (a)</i>, 260–266. <a href=\"https://doi.org/10.1002/pssa.201330127\">https://doi.org/10.1002/pssa.201330127</a>","ama":"Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics. <i>physica status solidi (a)</i>. Published online 2013:260-266. doi:<a href=\"https://doi.org/10.1002/pssa.201330127\">10.1002/pssa.201330127</a>","ieee":"N. B. 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Thiede, Maria Teresa de los Arcos de Pedro, V. Gwildies, M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, and R.A. Fischer. “Transition Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.” <i>Surface and Coatings Technology</i>, 2013, 130–36. <a href=\"https://doi.org/10.1016/j.surfcoat.2013.06.024\">https://doi.org/10.1016/j.surfcoat.2013.06.024</a>.","ieee":"N. B. Srinivasan <i>et al.</i>, “Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors,” <i>Surface and Coatings Technology</i>, pp. 130–136, 2013, doi: <a href=\"https://doi.org/10.1016/j.surfcoat.2013.06.024\">10.1016/j.surfcoat.2013.06.024</a>.","ama":"Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. <i>Surface and Coatings Technology</i>. 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Covarel. “Nanocomposites of Carbon Nanotubes Embedded in a (Ti,Al)N Coated Film.” <i>Surface and Coatings Technology</i>, 2012, 223–28. <a href=\"https://doi.org/10.1016/j.surfcoat.2012.09.053\">https://doi.org/10.1016/j.surfcoat.2012.09.053</a>."},"page":"223-228","year":"2012","author":[{"first_name":"L.","full_name":"Marot, L.","last_name":"Marot"},{"first_name":"Maria Teresa","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro"},{"first_name":"A.M.","last_name":"Bünzli","full_name":"Bünzli, A.M."},{"first_name":"C.","last_name":"Wäckerlin","full_name":"Wäckerlin, C."},{"full_name":"Steiner, R.","last_name":"Steiner","first_name":"R."},{"first_name":"P.","full_name":"Oelhafen, P.","last_name":"Oelhafen"},{"first_name":"E.","last_name":"Meyer","full_name":"Meyer, E."},{"last_name":"Mathys","full_name":"Mathys, D.","first_name":"D."},{"last_name":"Spätig","full_name":"Spätig, P.","first_name":"P."},{"first_name":"G.","last_name":"Covarel","full_name":"Covarel, G."}],"date_created":"2021-07-07T11:26:42Z","date_updated":"2023-01-24T08:25:27Z","doi":"10.1016/j.surfcoat.2012.09.053","title":"Nanocomposites of carbon nanotubes embedded in a (Ti,Al)N coated film","type":"journal_article","publication":"Surface and Coatings Technology","status":"public","user_id":"54556","department":[{"_id":"302"}],"_id":"22601","language":[{"iso":"eng"}],"extern":"1"},{"article_number":"103306","language":[{"iso":"eng"}],"extern":"1","_id":"22603","user_id":"54556","department":[{"_id":"302"}],"status":"public","type":"journal_article","publication":"Journal of Applied Physics","title":"Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films","doi":"10.1063/1.4767383","date_updated":"2023-01-24T08:25:58Z","date_created":"2021-07-07T11:30:38Z","author":[{"full_name":"Prenzel, Marina","last_name":"Prenzel","first_name":"Marina"},{"first_name":"Maria Teresa","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro"},{"full_name":"Kortmann, Annika","last_name":"Kortmann","first_name":"Annika"},{"full_name":"Winter, Jörg","last_name":"Winter","first_name":"Jörg"},{"full_name":"von Keudell, Achim","last_name":"von Keudell","first_name":"Achim"}],"year":"2012","citation":{"ama":"Prenzel M, de los Arcos de Pedro MT, Kortmann A, Winter J, von Keudell A. Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films. <i>Journal of Applied Physics</i>. Published online 2012. doi:<a href=\"https://doi.org/10.1063/1.4767383\">10.1063/1.4767383</a>","chicago":"Prenzel, Marina, Maria Teresa de los Arcos de Pedro, Annika Kortmann, Jörg Winter, and Achim von Keudell. “Embedded Argon as a Tool for Sampling Local Structure in Thin Plasma Deposited Aluminum Oxide Films.” <i>Journal of Applied Physics</i>, 2012. <a href=\"https://doi.org/10.1063/1.4767383\">https://doi.org/10.1063/1.4767383</a>.","ieee":"M. Prenzel, M. T. de los Arcos de Pedro, A. Kortmann, J. 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Winter, A. von Keudell, Journal of Applied Physics (2012).","mla":"Prenzel, Marina, et al. “Embedded Argon as a Tool for Sampling Local Structure in Thin Plasma Deposited Aluminum Oxide Films.” <i>Journal of Applied Physics</i>, 103306, 2012, doi:<a href=\"https://doi.org/10.1063/1.4767383\">10.1063/1.4767383</a>.","apa":"Prenzel, M., de los Arcos de Pedro, M. T., Kortmann, A., Winter, J., &#38; von Keudell, A. (2012). Embedded argon as a tool for sampling local structure in thin plasma deposited aluminum oxide films. <i>Journal of Applied Physics</i>, Article 103306. <a href=\"https://doi.org/10.1063/1.4767383\">https://doi.org/10.1063/1.4767383</a>"},"publication_status":"published","publication_identifier":{"issn":["0021-8979","1089-7550"]}},{"author":[{"first_name":"A","last_name":"Hecimovic","full_name":"Hecimovic, A"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"last_name":"Schulz-von der Gathen","full_name":"Schulz-von der Gathen, V","first_name":"V"},{"first_name":"M","full_name":"Böke, M","last_name":"Böke"},{"last_name":"Winter","full_name":"Winter, J","first_name":"J"}],"date_created":"2021-07-07T11:23:01Z","date_updated":"2023-01-24T08:25:05Z","doi":"10.1088/0963-0252/21/3/035017","title":"Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges","publication_identifier":{"issn":["0963-0252","1361-6595"]},"publication_status":"published","citation":{"mla":"Hecimovic, A., et al. “Temporal Evolution of the Radial Plasma Emissivity Profile in HIPIMS Plasma Discharges.” <i>Plasma Sources Science and Technology</i>, 035017, 2012, doi:<a href=\"https://doi.org/10.1088/0963-0252/21/3/035017\">10.1088/0963-0252/21/3/035017</a>.","short":"A. Hecimovic, M.T. de los Arcos de Pedro, V. Schulz-von der Gathen, M. Böke, J. Winter, Plasma Sources Science and Technology (2012).","bibtex":"@article{Hecimovic_de los Arcos de Pedro_Schulz-von der Gathen_Böke_Winter_2012, title={Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges}, DOI={<a href=\"https://doi.org/10.1088/0963-0252/21/3/035017\">10.1088/0963-0252/21/3/035017</a>}, number={035017}, journal={Plasma Sources Science and Technology}, author={Hecimovic, A and de los Arcos de Pedro, Maria Teresa and Schulz-von der Gathen, V and Böke, M and Winter, J}, year={2012} }","apa":"Hecimovic, A., de los Arcos de Pedro, M. T., Schulz-von der Gathen, V., Böke, M., &#38; Winter, J. (2012). Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges. <i>Plasma Sources Science and Technology</i>, Article 035017. <a href=\"https://doi.org/10.1088/0963-0252/21/3/035017\">https://doi.org/10.1088/0963-0252/21/3/035017</a>","ieee":"A. Hecimovic, M. T. de los Arcos de Pedro, V. Schulz-von der Gathen, M. Böke, and J. Winter, “Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges,” <i>Plasma Sources Science and Technology</i>, Art. no. 035017, 2012, doi: <a href=\"https://doi.org/10.1088/0963-0252/21/3/035017\">10.1088/0963-0252/21/3/035017</a>.","chicago":"Hecimovic, A, Maria Teresa de los Arcos de Pedro, V Schulz-von der Gathen, M Böke, and J Winter. “Temporal Evolution of the Radial Plasma Emissivity Profile in HIPIMS Plasma Discharges.” <i>Plasma Sources Science and Technology</i>, 2012. <a href=\"https://doi.org/10.1088/0963-0252/21/3/035017\">https://doi.org/10.1088/0963-0252/21/3/035017</a>.","ama":"Hecimovic A, de los Arcos de Pedro MT, Schulz-von der Gathen V, Böke M, Winter J. Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma discharges. <i>Plasma Sources Science and Technology</i>. Published online 2012. doi:<a href=\"https://doi.org/10.1088/0963-0252/21/3/035017\">10.1088/0963-0252/21/3/035017</a>"},"year":"2012","department":[{"_id":"302"}],"user_id":"54556","_id":"22600","language":[{"iso":"eng"}],"extern":"1","article_number":"035017","publication":"Plasma Sources Science and Technology","type":"journal_article","status":"public"},{"date_updated":"2023-01-24T08:26:27Z","date_created":"2021-07-07T11:31:09Z","author":[{"last_name":"Schröder","full_name":"Schröder, D","first_name":"D"},{"first_name":"H","last_name":"Bahre","full_name":"Bahre, H"},{"first_name":"N","full_name":"Knake, N","last_name":"Knake"},{"first_name":"J","last_name":"Winter","full_name":"Winter, J"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"last_name":"Schulz-von der Gathen","full_name":"Schulz-von der Gathen, V","first_name":"V"}],"title":"Influence of target surfaces on the atomic oxygen distribution in the effluent of a micro-scaled atmospheric pressure plasma jet","doi":"10.1088/0963-0252/21/2/024007","publication_identifier":{"issn":["0963-0252","1361-6595"]},"publication_status":"published","year":"2012","citation":{"ieee":"D. Schröder, H. Bahre, N. Knake, J. Winter, M. T. de los Arcos de Pedro, and V. Schulz-von der Gathen, “Influence of target surfaces on the atomic oxygen distribution in the effluent of a micro-scaled atmospheric pressure plasma jet,” <i>Plasma Sources Science and Technology</i>, Art. no. 024007, 2012, doi: <a href=\"https://doi.org/10.1088/0963-0252/21/2/024007\">10.1088/0963-0252/21/2/024007</a>.","chicago":"Schröder, D, H Bahre, N Knake, J Winter, Maria Teresa de los Arcos de Pedro, and V Schulz-von der Gathen. “Influence of Target Surfaces on the Atomic Oxygen Distribution in the Effluent of a Micro-Scaled Atmospheric Pressure Plasma Jet.” <i>Plasma Sources Science and Technology</i>, 2012. <a href=\"https://doi.org/10.1088/0963-0252/21/2/024007\">https://doi.org/10.1088/0963-0252/21/2/024007</a>.","ama":"Schröder D, Bahre H, Knake N, Winter J, de los Arcos de Pedro MT, Schulz-von der Gathen V. 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