[{"status":"public","volume":214,"user_id":"7266","_id":"20944","page":"2179-2187","quality_controlled":"1","citation":{"mla":"Ebbert, Christoph, et al. “Joining with Electrochemical Support (ECUF): Cold Pressure Welding of Copper.” <i>JOURNAL OF MATERIALS PROCESSING TECHNOLOGY</i>, vol. 214, no. 10, 2014, pp. 2179–87, doi:<a href=\"https://doi.org/10.1016/j.jmatprotec.2014.04.015\">10.1016/j.jmatprotec.2014.04.015</a>.","ama":"Ebbert C, Schmidt HC, Rodman D, et al. Joining with electrochemical support (ECUF): Cold pressure welding of copper. <i>JOURNAL OF MATERIALS PROCESSING TECHNOLOGY</i>. 2014;214(10):2179-2187. doi:<a href=\"https://doi.org/10.1016/j.jmatprotec.2014.04.015\">10.1016/j.jmatprotec.2014.04.015</a>","bibtex":"@article{Ebbert_Schmidt_Rodman_Nuernberger_Homberg_Maier_Grundmeier_2014, title={Joining with electrochemical support (ECUF): Cold pressure welding of copper}, volume={214}, DOI={<a href=\"https://doi.org/10.1016/j.jmatprotec.2014.04.015\">10.1016/j.jmatprotec.2014.04.015</a>}, number={10}, journal={JOURNAL OF MATERIALS PROCESSING TECHNOLOGY}, author={Ebbert, Christoph and Schmidt, H. C. and Rodman, D. and Nuernberger, F. and Homberg, W. and Maier, H. J. and Grundmeier, Guido}, year={2014}, pages={2179–2187} }","apa":"Ebbert, C., Schmidt, H. C., Rodman, D., Nuernberger, F., Homberg, W., Maier, H. J., &#38; Grundmeier, G. (2014). Joining with electrochemical support (ECUF): Cold pressure welding of copper. <i>JOURNAL OF MATERIALS PROCESSING TECHNOLOGY</i>, <i>214</i>(10), 2179–2187. <a href=\"https://doi.org/10.1016/j.jmatprotec.2014.04.015\">https://doi.org/10.1016/j.jmatprotec.2014.04.015</a>","ieee":"C. Ebbert <i>et al.</i>, “Joining with electrochemical support (ECUF): Cold pressure welding of copper,” <i>JOURNAL OF MATERIALS PROCESSING TECHNOLOGY</i>, vol. 214, no. 10, pp. 2179–2187, 2014.","chicago":"Ebbert, Christoph, H. C. Schmidt, D. Rodman, F. Nuernberger, W. Homberg, H. J. Maier, and Guido Grundmeier. “Joining with Electrochemical Support (ECUF): Cold Pressure Welding of Copper.” <i>JOURNAL OF MATERIALS PROCESSING TECHNOLOGY</i> 214, no. 10 (2014): 2179–87. <a href=\"https://doi.org/10.1016/j.jmatprotec.2014.04.015\">https://doi.org/10.1016/j.jmatprotec.2014.04.015</a>.","short":"C. Ebbert, H.C. Schmidt, D. Rodman, F. Nuernberger, W. Homberg, H.J. Maier, G. Grundmeier, JOURNAL OF MATERIALS PROCESSING TECHNOLOGY 214 (2014) 2179–2187."},"isi":"1","external_id":{"isi":["000338814500023"]},"intvolume":"       214","date_updated":"2022-01-06T06:54:41Z","publication_status":"published","author":[{"id":"7266","first_name":"Christoph","last_name":"Ebbert","full_name":"Ebbert, Christoph"},{"full_name":"Schmidt, H. C.","last_name":"Schmidt","first_name":"H. C."},{"full_name":"Rodman, D.","last_name":"Rodman","first_name":"D."},{"last_name":"Nuernberger","first_name":"F.","full_name":"Nuernberger, F."},{"first_name":"W.","last_name":"Homberg","full_name":"Homberg, W."},{"first_name":"H. J.","last_name":"Maier","full_name":"Maier, H. J."},{"id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier","first_name":"Guido"}],"publication_identifier":{"issn":["0924-0136"]},"title":"Joining with electrochemical support (ECUF): Cold pressure welding of copper","year":"2014","doi":"10.1016/j.jmatprotec.2014.04.015","language":[{"iso":"eng"}],"abstract":[{"text":"Joining metals using electrochemical support (ECUF) is a new process for cold pressure welding sheets and parts. This new process is based on an electrochemical in-line surface treatment followed by incremental pilger rolling. The ECUF process intends to cold pressure weld materials under optimized conditions. Oxide layers on metal surfaces are known to inhibit the formation of cold pressure welds. The in-line electrochemical treatment will be used to remove these surface oxides for specific engineering metals and alloys. Hence, an improved pressure weld formation at lower forces and smaller reduction ratios is expected for the electrochemically treated surfaces. Using a more flexible pressure welding process, the number of applications could be greatly improved. First tests with copper were performed to analyse the efficiency of the proposed electrochemical surface treatments. Two electrochemical treatments, the cathodic oxide-reduction and cyclovoltammetric oxide-reduction, were compared with conventional treatments (degreasing and scratch brushing) regarding their influence on the cold pressure welding process of copper. The weld strength of lap welds has been investigated as well as the necessary reduction threshold to form a weld. It was found that the electrochemical oxide reduction resulted in higher weld strength. The results of scanning electron microscopy (SEM) and energy dispersive analysis of X-rays (EDX) indicate that surface oxides were successfully removed by the electrochemical surface treatments. (C) 2014 Elsevier B.V. All rights reserved.","lang":"eng"}],"issue":"10","publication":"JOURNAL OF MATERIALS PROCESSING TECHNOLOGY","department":[{"_id":"35"},{"_id":"302"},{"_id":"321"}],"type":"journal_article","date_created":"2021-01-13T10:12:50Z"},{"publication":"Molecules","citation":{"ieee":"I. Bald and A. Keller, “Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy,” <i>Molecules</i>, vol. 19, pp. 13803–13823, 2014.","apa":"Bald, I., &#38; Keller, A. (2014). Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy. <i>Molecules</i>, <i>19</i>, 13803–13823. <a href=\"https://doi.org/10.3390/molecules190913803\">https://doi.org/10.3390/molecules190913803</a>","short":"I. Bald, A. Keller, Molecules 19 (2014) 13803–13823.","chicago":"Bald, Ilko, and Adrian Keller. “Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy.” <i>Molecules</i> 19 (2014): 13803–23. <a href=\"https://doi.org/10.3390/molecules190913803\">https://doi.org/10.3390/molecules190913803</a>.","mla":"Bald, Ilko, and Adrian Keller. “Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy.” <i>Molecules</i>, vol. 19, 2014, pp. 13803–23, doi:<a href=\"https://doi.org/10.3390/molecules190913803\">10.3390/molecules190913803</a>.","bibtex":"@article{Bald_Keller_2014, title={Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy}, volume={19}, DOI={<a href=\"https://doi.org/10.3390/molecules190913803\">10.3390/molecules190913803</a>}, journal={Molecules}, author={Bald, Ilko and Keller, Adrian}, year={2014}, pages={13803–13823} }","ama":"Bald I, Keller A. Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy. <i>Molecules</i>. 2014;19:13803-13823. doi:<a href=\"https://doi.org/10.3390/molecules190913803\">10.3390/molecules190913803</a>"},"type":"journal_article","department":[{"_id":"302"}],"date_created":"2021-07-08T13:01:44Z","date_updated":"2022-01-06T06:55:38Z","publication_status":"published","intvolume":"        19","year":"2014","title":"Molecular Processes Studied at a Single-Molecule Level Using DNA Origami Nanostructures and Atomic Force Microscopy","status":"public","publication_identifier":{"issn":["1420-3049"]},"author":[{"last_name":"Bald","first_name":"Ilko","full_name":"Bald, Ilko"},{"id":"48864","orcid":"0000-0001-7139-3110","first_name":"Adrian","last_name":"Keller","full_name":"Keller, Adrian"}],"doi":"10.3390/molecules190913803","user_id":"48864","volume":19,"page":"13803-13823","language":[{"iso":"eng"}],"_id":"22683"},{"doi":"10.1002/adem.201400317","user_id":"54556","_id":"22580","language":[{"iso":"eng"}],"page":"669-673","date_updated":"2023-01-24T08:20:08Z","publication_status":"published","author":[{"last_name":"König","first_name":"Dennis","full_name":"König, Dennis"},{"last_name":"Naujoks","first_name":"Dennis","full_name":"Naujoks, Dennis"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"full_name":"Grosse-Kreul, Simon","last_name":"Grosse-Kreul","first_name":"Simon"},{"last_name":"Ludwig","first_name":"Alfred","full_name":"Ludwig, Alfred"}],"publication_identifier":{"issn":["1438-1656"]},"year":"2014","title":"X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films","status":"public","department":[{"_id":"302"}],"type":"journal_article","date_created":"2021-07-07T09:14:25Z","extern":"1","citation":{"bibtex":"@article{König_Naujoks_de los Arcos de Pedro_Grosse-Kreul_Ludwig_2014, title={X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films}, DOI={<a href=\"https://doi.org/10.1002/adem.201400317\">10.1002/adem.201400317</a>}, journal={Advanced Engineering Materials}, author={König, Dennis and Naujoks, Dennis and de los Arcos de Pedro, Maria Teresa and Grosse-Kreul, Simon and Ludwig, Alfred}, year={2014}, pages={669–673} }","ama":"König D, Naujoks D, de los Arcos de Pedro MT, Grosse-Kreul S, Ludwig A. X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films. <i>Advanced Engineering Materials</i>. Published online 2014:669-673. doi:<a href=\"https://doi.org/10.1002/adem.201400317\">10.1002/adem.201400317</a>","mla":"König, Dennis, et al. “X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and Its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films.” <i>Advanced Engineering Materials</i>, 2014, pp. 669–73, doi:<a href=\"https://doi.org/10.1002/adem.201400317\">10.1002/adem.201400317</a>.","chicago":"König, Dennis, Dennis Naujoks, Maria Teresa de los Arcos de Pedro, Simon Grosse-Kreul, and Alfred Ludwig. “X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and Its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films.” <i>Advanced Engineering Materials</i>, 2014, 669–73. <a href=\"https://doi.org/10.1002/adem.201400317\">https://doi.org/10.1002/adem.201400317</a>.","short":"D. König, D. Naujoks, M.T. de los Arcos de Pedro, S. Grosse-Kreul, A. Ludwig, Advanced Engineering Materials (2014) 669–673.","ieee":"D. König, D. Naujoks, M. T. de los Arcos de Pedro, S. Grosse-Kreul, and A. Ludwig, “X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films,” <i>Advanced Engineering Materials</i>, pp. 669–673, 2014, doi: <a href=\"https://doi.org/10.1002/adem.201400317\">10.1002/adem.201400317</a>.","apa":"König, D., Naujoks, D., de los Arcos de Pedro, M. T., Grosse-Kreul, S., &#38; Ludwig, A. (2014). X-Ray Photoelectron Spectroscopy Investigations of the Surface Reaction Layer and its Effects on the Transformation Properties of Nanoscale Ti51Ni38Cu11Shape Memory Thin Films. <i>Advanced Engineering Materials</i>, 669–673. <a href=\"https://doi.org/10.1002/adem.201400317\">https://doi.org/10.1002/adem.201400317</a>"},"publication":"Advanced Engineering Materials"},{"status":"public","title":"Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate","year":"2014","publication_identifier":{"issn":["0963-0252","1361-6595"]},"author":[{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"full_name":"Schröder, Raphael","first_name":"Raphael","last_name":"Schröder"},{"full_name":"Gonzalvo, Yolanda Aranda","first_name":"Yolanda Aranda","last_name":"Gonzalvo"},{"full_name":"Gathen, Volker Schulz-von der","last_name":"Gathen","first_name":"Volker Schulz-von der"},{"full_name":"Winter, Jörg","first_name":"Jörg","last_name":"Winter"}],"publication_status":"published","date_updated":"2023-01-24T08:20:25Z","article_number":"054008","language":[{"iso":"eng"}],"_id":"22585","user_id":"54556","doi":"10.1088/0963-0252/23/5/054008","publication":"Plasma Sources Science and Technology","citation":{"chicago":"Arcos de Pedro, Maria Teresa de los, Raphael Schröder, Yolanda Aranda Gonzalvo, Volker Schulz-von der Gathen, and Jörg Winter. “Description of HiPIMS Plasma Regimes in Terms of Composition, Spoke Formation and Deposition Rate.” <i>Plasma Sources Science and Technology</i>, 2014. <a href=\"https://doi.org/10.1088/0963-0252/23/5/054008\">https://doi.org/10.1088/0963-0252/23/5/054008</a>.","short":"M.T. de los Arcos de Pedro, R. Schröder, Y.A. Gonzalvo, V.S. der Gathen, J. Winter, Plasma Sources Science and Technology (2014).","ieee":"M. T. de los Arcos de Pedro, R. Schröder, Y. A. Gonzalvo, V. S. der Gathen, and J. Winter, “Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate,” <i>Plasma Sources Science and Technology</i>, Art. no. 054008, 2014, doi: <a href=\"https://doi.org/10.1088/0963-0252/23/5/054008\">10.1088/0963-0252/23/5/054008</a>.","apa":"de los Arcos de Pedro, M. T., Schröder, R., Gonzalvo, Y. A., Gathen, V. S. der, &#38; Winter, J. (2014). Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate. <i>Plasma Sources Science and Technology</i>, Article 054008. <a href=\"https://doi.org/10.1088/0963-0252/23/5/054008\">https://doi.org/10.1088/0963-0252/23/5/054008</a>","bibtex":"@article{de los Arcos de Pedro_Schröder_Gonzalvo_Gathen_Winter_2014, title={Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate}, DOI={<a href=\"https://doi.org/10.1088/0963-0252/23/5/054008\">10.1088/0963-0252/23/5/054008</a>}, number={054008}, journal={Plasma Sources Science and Technology}, author={de los Arcos de Pedro, Maria Teresa and Schröder, Raphael and Gonzalvo, Yolanda Aranda and Gathen, Volker Schulz-von der and Winter, Jörg}, year={2014} }","ama":"de los Arcos de Pedro MT, Schröder R, Gonzalvo YA, Gathen VS der, Winter J. Description of HiPIMS plasma regimes in terms of composition, spoke formation and deposition rate. <i>Plasma Sources Science and Technology</i>. Published online 2014. doi:<a href=\"https://doi.org/10.1088/0963-0252/23/5/054008\">10.1088/0963-0252/23/5/054008</a>","mla":"de los Arcos de Pedro, Maria Teresa, et al. “Description of HiPIMS Plasma Regimes in Terms of Composition, Spoke Formation and Deposition Rate.” <i>Plasma Sources Science and Technology</i>, 054008, 2014, doi:<a href=\"https://doi.org/10.1088/0963-0252/23/5/054008\">10.1088/0963-0252/23/5/054008</a>."},"extern":"1","date_created":"2021-07-07T11:10:18Z","type":"journal_article","department":[{"_id":"302"}]},{"title":"Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology","status":"public","year":"2014","publication_identifier":{"issn":["0009-2614"]},"author":[{"first_name":"Baran","last_name":"Eren","full_name":"Eren, Baran"},{"full_name":"Marot, Laurent","last_name":"Marot","first_name":"Laurent"},{"first_name":"Roland","last_name":"Steiner","full_name":"Steiner, Roland"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa","last_name":"de los Arcos de Pedro"},{"full_name":"Düggelin, Marcel","last_name":"Düggelin","first_name":"Marcel"},{"first_name":"Daniel","last_name":"Mathys","full_name":"Mathys, Daniel"},{"full_name":"Goldie, Kenneth N.","first_name":"Kenneth N.","last_name":"Goldie"},{"full_name":"Olivieri, Vesna","first_name":"Vesna","last_name":"Olivieri"},{"full_name":"Meyer, Ernst","last_name":"Meyer","first_name":"Ernst"}],"publication_status":"published","date_updated":"2023-01-24T08:20:49Z","page":"82-87","_id":"22586","language":[{"iso":"eng"}],"user_id":"54556","doi":"10.1016/j.cplett.2014.06.042","publication":"Chemical Physics Letters","citation":{"mla":"Eren, Baran, et al. “Carbon Nanotube Growth on AlN Support: Comparison between Ni and Fe Chemical States and Morphology.” <i>Chemical Physics Letters</i>, 2014, pp. 82–87, doi:<a href=\"https://doi.org/10.1016/j.cplett.2014.06.042\">10.1016/j.cplett.2014.06.042</a>.","ama":"Eren B, Marot L, Steiner R, et al. Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology. <i>Chemical Physics Letters</i>. Published online 2014:82-87. doi:<a href=\"https://doi.org/10.1016/j.cplett.2014.06.042\">10.1016/j.cplett.2014.06.042</a>","bibtex":"@article{Eren_Marot_Steiner_de los Arcos de Pedro_Düggelin_Mathys_Goldie_Olivieri_Meyer_2014, title={Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology}, DOI={<a href=\"https://doi.org/10.1016/j.cplett.2014.06.042\">10.1016/j.cplett.2014.06.042</a>}, journal={Chemical Physics Letters}, author={Eren, Baran and Marot, Laurent and Steiner, Roland and de los Arcos de Pedro, Maria Teresa and Düggelin, Marcel and Mathys, Daniel and Goldie, Kenneth N. and Olivieri, Vesna and Meyer, Ernst}, year={2014}, pages={82–87} }","apa":"Eren, B., Marot, L., Steiner, R., de los Arcos de Pedro, M. T., Düggelin, M., Mathys, D., Goldie, K. N., Olivieri, V., &#38; Meyer, E. (2014). Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology. <i>Chemical Physics Letters</i>, 82–87. <a href=\"https://doi.org/10.1016/j.cplett.2014.06.042\">https://doi.org/10.1016/j.cplett.2014.06.042</a>","ieee":"B. Eren <i>et al.</i>, “Carbon nanotube growth on AlN support: Comparison between Ni and Fe chemical states and morphology,” <i>Chemical Physics Letters</i>, pp. 82–87, 2014, doi: <a href=\"https://doi.org/10.1016/j.cplett.2014.06.042\">10.1016/j.cplett.2014.06.042</a>.","chicago":"Eren, Baran, Laurent Marot, Roland Steiner, Maria Teresa de los Arcos de Pedro, Marcel Düggelin, Daniel Mathys, Kenneth N. Goldie, Vesna Olivieri, and Ernst Meyer. “Carbon Nanotube Growth on AlN Support: Comparison between Ni and Fe Chemical States and Morphology.” <i>Chemical Physics Letters</i>, 2014, 82–87. <a href=\"https://doi.org/10.1016/j.cplett.2014.06.042\">https://doi.org/10.1016/j.cplett.2014.06.042</a>.","short":"B. Eren, L. Marot, R. Steiner, M.T. de los Arcos de Pedro, M. Düggelin, D. Mathys, K.N. Goldie, V. Olivieri, E. Meyer, Chemical Physics Letters (2014) 82–87."},"extern":"1","date_created":"2021-07-07T11:10:35Z","type":"journal_article","department":[{"_id":"302"}]},{"extern":"1","citation":{"ama":"Machura PD, Hecimovic A, Gallian S, Winter J, de los Arcos de Pedro MT. Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges. <i>Plasma Sources Science and Technology</i>. Published online 2014. doi:<a href=\"https://doi.org/10.1088/0963-0252/23/6/065043\">10.1088/0963-0252/23/6/065043</a>","bibtex":"@article{Machura_Hecimovic_Gallian_Winter_de los Arcos de Pedro_2014, title={Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges}, DOI={<a href=\"https://doi.org/10.1088/0963-0252/23/6/065043\">10.1088/0963-0252/23/6/065043</a>}, number={065043}, journal={Plasma Sources Science and Technology}, author={Machura, P D and Hecimovic, A and Gallian, S and Winter, J and de los Arcos de Pedro, Maria Teresa}, year={2014} }","mla":"Machura, P. D., et al. “Simultaneous Characterization of Static and Induced Magnetic Fields in High Power Impulse Magnetron Sputtering Discharges.” <i>Plasma Sources Science and Technology</i>, 065043, 2014, doi:<a href=\"https://doi.org/10.1088/0963-0252/23/6/065043\">10.1088/0963-0252/23/6/065043</a>.","chicago":"Machura, P D, A Hecimovic, S Gallian, J Winter, and Maria Teresa de los Arcos de Pedro. “Simultaneous Characterization of Static and Induced Magnetic Fields in High Power Impulse Magnetron Sputtering Discharges.” <i>Plasma Sources Science and Technology</i>, 2014. <a href=\"https://doi.org/10.1088/0963-0252/23/6/065043\">https://doi.org/10.1088/0963-0252/23/6/065043</a>.","short":"P.D. Machura, A. Hecimovic, S. Gallian, J. Winter, M.T. de los Arcos de Pedro, Plasma Sources Science and Technology (2014).","apa":"Machura, P. D., Hecimovic, A., Gallian, S., Winter, J., &#38; de los Arcos de Pedro, M. T. (2014). Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges. <i>Plasma Sources Science and Technology</i>, Article 065043. <a href=\"https://doi.org/10.1088/0963-0252/23/6/065043\">https://doi.org/10.1088/0963-0252/23/6/065043</a>","ieee":"P. D. Machura, A. Hecimovic, S. Gallian, J. Winter, and M. T. de los Arcos de Pedro, “Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges,” <i>Plasma Sources Science and Technology</i>, Art. no. 065043, 2014, doi: <a href=\"https://doi.org/10.1088/0963-0252/23/6/065043\">10.1088/0963-0252/23/6/065043</a>."},"publication":"Plasma Sources Science and Technology","department":[{"_id":"302"}],"type":"journal_article","date_created":"2021-07-07T11:10:48Z","publication_status":"published","date_updated":"2023-01-24T08:21:04Z","author":[{"first_name":"P D","last_name":"Machura","full_name":"Machura, P D"},{"first_name":"A","last_name":"Hecimovic","full_name":"Hecimovic, A"},{"last_name":"Gallian","first_name":"S","full_name":"Gallian, S"},{"last_name":"Winter","first_name":"J","full_name":"Winter, J"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"}],"publication_identifier":{"issn":["0963-0252","1361-6595"]},"status":"public","year":"2014","title":"Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges","user_id":"54556","doi":"10.1088/0963-0252/23/6/065043","_id":"22587","language":[{"iso":"eng"}],"article_number":"065043"},{"publication_status":"published","date_updated":"2023-01-24T08:21:18Z","author":[{"last_name":"Marinov","first_name":"D","full_name":"Marinov, D"},{"first_name":"O","last_name":"Guaitella","full_name":"Guaitella, O"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa","last_name":"de los Arcos de Pedro"},{"full_name":"von Keudell, A","last_name":"von Keudell","first_name":"A"},{"full_name":"Rousseau, A","last_name":"Rousseau","first_name":"A"}],"publication_identifier":{"issn":["0022-3727","1361-6463"]},"status":"public","year":"2014","title":"Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure","user_id":"54556","doi":"10.1088/0022-3727/47/47/475204","_id":"22588","language":[{"iso":"eng"}],"article_number":"475204","extern":"1","citation":{"ama":"Marinov D, Guaitella O, de los Arcos de Pedro MT, von Keudell A, Rousseau A. Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure. <i>Journal of Physics D: Applied Physics</i>. Published online 2014. doi:<a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>","bibtex":"@article{Marinov_Guaitella_de los Arcos de Pedro_von Keudell_Rousseau_2014, title={Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure}, DOI={<a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>}, number={475204}, journal={Journal of Physics D: Applied Physics}, author={Marinov, D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A and Rousseau, A}, year={2014} }","mla":"Marinov, D., et al. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface under Plasma Exposure.” <i>Journal of Physics D: Applied Physics</i>, 475204, 2014, doi:<a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>.","chicago":"Marinov, D, O Guaitella, Maria Teresa de los Arcos de Pedro, A von Keudell, and A Rousseau. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface under Plasma Exposure.” <i>Journal of Physics D: Applied Physics</i>, 2014. <a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">https://doi.org/10.1088/0022-3727/47/47/475204</a>.","short":"D. Marinov, O. Guaitella, M.T. de los Arcos de Pedro, A. von Keudell, A. Rousseau, Journal of Physics D: Applied Physics (2014).","apa":"Marinov, D., Guaitella, O., de los Arcos de Pedro, M. T., von Keudell, A., &#38; Rousseau, A. (2014). Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure. <i>Journal of Physics D: Applied Physics</i>, Article 475204. <a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">https://doi.org/10.1088/0022-3727/47/47/475204</a>","ieee":"D. Marinov, O. Guaitella, M. T. de los Arcos de Pedro, A. von Keudell, and A. Rousseau, “Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 475204, 2014, doi: <a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>."},"publication":"Journal of Physics D: Applied Physics","department":[{"_id":"302"}],"type":"journal_article","date_created":"2021-07-07T11:11:00Z"},{"date_created":"2021-07-07T11:11:37Z","department":[{"_id":"302"}],"type":"journal_article","citation":{"apa":"Xu, K., Dang, V.-S., Ney, A., de los Arcos de Pedro, M. T., &#38; Devi, A. (2014). Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition. <i>Journal of Nanoscience and Nanotechnology</i>, 5095–5102. <a href=\"https://doi.org/10.1166/jnn.2014.8848\">https://doi.org/10.1166/jnn.2014.8848</a>","ieee":"K. Xu, V.-S. Dang, A. Ney, M. T. de los Arcos de Pedro, and A. Devi, “Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition,” <i>Journal of Nanoscience and Nanotechnology</i>, pp. 5095–5102, 2014, doi: <a href=\"https://doi.org/10.1166/jnn.2014.8848\">10.1166/jnn.2014.8848</a>.","chicago":"Xu, Ke, Van-Son Dang, Andreas Ney, Maria Teresa de los Arcos de Pedro, and Anjana Devi. “Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition.” <i>Journal of Nanoscience and Nanotechnology</i>, 2014, 5095–5102. <a href=\"https://doi.org/10.1166/jnn.2014.8848\">https://doi.org/10.1166/jnn.2014.8848</a>.","short":"K. Xu, V.-S. Dang, A. Ney, M.T. de los Arcos de Pedro, A. Devi, Journal of Nanoscience and Nanotechnology (2014) 5095–5102.","mla":"Xu, Ke, et al. “Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition.” <i>Journal of Nanoscience and Nanotechnology</i>, 2014, pp. 5095–102, doi:<a href=\"https://doi.org/10.1166/jnn.2014.8848\">10.1166/jnn.2014.8848</a>.","ama":"Xu K, Dang V-S, Ney A, de los Arcos de Pedro MT, Devi A. Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition. <i>Journal of Nanoscience and Nanotechnology</i>. Published online 2014:5095-5102. doi:<a href=\"https://doi.org/10.1166/jnn.2014.8848\">10.1166/jnn.2014.8848</a>","bibtex":"@article{Xu_Dang_Ney_de los Arcos de Pedro_Devi_2014, title={Nanostructured Er&#60;SUB&#62;2&#60;/SUB&#62;O&#60;SUB&#62;3&#60;/SUB&#62; Thin Films Grown by Metalorganic Chemical Vapour Deposition}, DOI={<a href=\"https://doi.org/10.1166/jnn.2014.8848\">10.1166/jnn.2014.8848</a>}, journal={Journal of Nanoscience and Nanotechnology}, author={Xu, Ke and Dang, Van-Son and Ney, Andreas and de los Arcos de Pedro, Maria Teresa and Devi, Anjana}, year={2014}, pages={5095–5102} }"},"publication":"Journal of Nanoscience and Nanotechnology","extern":"1","language":[{"iso":"eng"}],"_id":"22590","page":"5095-5102","doi":"10.1166/jnn.2014.8848","user_id":"54556","publication_identifier":{"issn":["1533-4880","1533-4899"]},"author":[{"first_name":"Ke","last_name":"Xu","full_name":"Xu, Ke"},{"full_name":"Dang, Van-Son","last_name":"Dang","first_name":"Van-Son"},{"full_name":"Ney, Andreas","first_name":"Andreas","last_name":"Ney"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa","last_name":"de los Arcos de Pedro"},{"last_name":"Devi","first_name":"Anjana","full_name":"Devi, Anjana"}],"year":"2014","title":"Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by Metalorganic Chemical Vapour Deposition","status":"public","date_updated":"2023-01-24T08:21:36Z","publication_status":"published"},{"department":[{"_id":"35"},{"_id":"302"},{"_id":"321"}],"type":"journal_article","date_created":"2021-01-13T10:12:51Z","abstract":[{"text":"Calcium-Silicate-Hydrates (C-S-H) are the main binding phases in most concrete which is the primarily used composite construction material in the world. However, a big lack is cleaving between the actual knowledge about C-S-H, compared to what could be reached using state-of-the-art technologies of modern research. In this article, the formation of a C-S-H phase on a native oxide covered silicon wafer is investigated by means of in-situ attenuated total reflection infrared (ATR-IR) and ex-situ surface-enhanced Raman spectroscopy (SERS). The total thickness of the C-S-H phase is determined by X-ray photoelectron spectroscopy (XPS) to be 3 nm. The formation appears to be reversible depending on the environment pH value and can be performed at room temperature. Based on density functional theory (DFT) calculations, it is shown that the C-S-H phase in the presence of water will change its chemical composition in order to reach the thermodynamic ground state of the system. This change is achieved by a metal-proton exchange reaction. The stoichiometry of these metal-proton exchange reactions is nearly independent of the environment pH value. Electrokinetic measurements yield isoelectric points of 2.0 and 2.6 for the native oxide covered silicon wafer (SiO2) and the C-S-H phase. This is consistent with a predominance of Si-O sites at the C-S-H/water interface. (C) 2013 Elsevier B. V. All rights reserved.","lang":"eng"}],"publication":"APPLIED SURFACE SCIENCE","doi":"10.1016/j.apsusc.2013.11.045","language":[{"iso":"eng"}],"intvolume":"       290","publication_status":"published","date_updated":"2025-11-18T12:05:39Z","author":[{"id":"7266","first_name":"Christoph","last_name":"Ebbert","full_name":"Ebbert, Christoph"},{"full_name":"Grundmeier, Guido","first_name":"Guido","last_name":"Grundmeier","id":"194"},{"last_name":"Buitkamp","first_name":"Nadine","full_name":"Buitkamp, Nadine","id":"1449"},{"last_name":"Kroeger","first_name":"Alexander","full_name":"Kroeger, Alexander"},{"last_name":"Messerschmidt","first_name":"Florian","full_name":"Messerschmidt, Florian"},{"full_name":"Thissen, Peter","first_name":"Peter","last_name":"Thissen"}],"publication_identifier":{"issn":["0169-4332"],"eissn":["1873-5584"]},"year":"2014","title":"Toward a microscopic understanding of the calcium-silicate-hydrates/water interface","external_id":{"isi":["000329060100032"]},"quality_controlled":"1","citation":{"bibtex":"@article{Ebbert_Grundmeier_Buitkamp_Kroeger_Messerschmidt_Thissen_2014, title={Toward a microscopic understanding of the calcium-silicate-hydrates/water interface}, volume={290}, DOI={<a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">10.1016/j.apsusc.2013.11.045</a>}, journal={APPLIED SURFACE SCIENCE}, author={Ebbert, Christoph and Grundmeier, Guido and Buitkamp, Nadine and Kroeger, Alexander and Messerschmidt, Florian and Thissen, Peter}, year={2014}, pages={207–214} }","ama":"Ebbert C, Grundmeier G, Buitkamp N, Kroeger A, Messerschmidt F, Thissen P. Toward a microscopic understanding of the calcium-silicate-hydrates/water interface. <i>APPLIED SURFACE SCIENCE</i>. 2014;290:207-214. doi:<a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">10.1016/j.apsusc.2013.11.045</a>","mla":"Ebbert, Christoph, et al. “Toward a Microscopic Understanding of the Calcium-Silicate-Hydrates/Water Interface.” <i>APPLIED SURFACE SCIENCE</i>, vol. 290, 2014, pp. 207–14, doi:<a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">10.1016/j.apsusc.2013.11.045</a>.","chicago":"Ebbert, Christoph, Guido Grundmeier, Nadine Buitkamp, Alexander Kroeger, Florian Messerschmidt, and Peter Thissen. “Toward a Microscopic Understanding of the Calcium-Silicate-Hydrates/Water Interface.” <i>APPLIED SURFACE SCIENCE</i> 290 (2014): 207–14. <a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">https://doi.org/10.1016/j.apsusc.2013.11.045</a>.","short":"C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, P. Thissen, APPLIED SURFACE SCIENCE 290 (2014) 207–214.","ieee":"C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, and P. Thissen, “Toward a microscopic understanding of the calcium-silicate-hydrates/water interface,” <i>APPLIED SURFACE SCIENCE</i>, vol. 290, pp. 207–214, 2014, doi: <a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">10.1016/j.apsusc.2013.11.045</a>.","apa":"Ebbert, C., Grundmeier, G., Buitkamp, N., Kroeger, A., Messerschmidt, F., &#38; Thissen, P. (2014). Toward a microscopic understanding of the calcium-silicate-hydrates/water interface. <i>APPLIED SURFACE SCIENCE</i>, <i>290</i>, 207–214. <a href=\"https://doi.org/10.1016/j.apsusc.2013.11.045\">https://doi.org/10.1016/j.apsusc.2013.11.045</a>"},"isi":"1","volume":290,"user_id":"7266","_id":"20945","page":"207-214","status":"public"},{"publication":"JOURNAL OF NANOPARTICLE RESEARCH","issue":"11","abstract":[{"text":"In the current work, we study the silver ion release potential and the water uptake through a SiOxCyHz-polymer which is grown from the precursor hexamethyldisiloxane (HMDSO) in radiofrequency (RF) plasma. These layers were deposited on top of two dimensional (2D) ensembles of silver nanoparticles (AgNPs) with nominal thickness of 2 nm on a 20 nm RF-sputtered polytetrafluoroethylene (PTFE) thin film. The composition of the plasma-polymerized HMDSO barriers was varied by changing the oxygen flow during the polymerization process and their thickness was varied as well. Morphology and optical properties of the nanocomposites were investigated using transmission electron microscopy (TEM) and UV-Visible spectroscopy (UV-Vis), respectively. The concentration of the silver ions released from the nanocomposites after immersion in water for several time intervals was measured using inductively coupled plasma mass spectrometry (ICP-MS). Contact angle analysis and electrochemical impedance spectroscopy (EIS) measurements were also performed and results show a strong dependence of the coatings properties and their water uptake on the oxygen content in the coating films and their thickness. Plasma polymerization with increasing the oxygen flow leads to the formation of more hydrophilic thin films with a higher Ag ion release potential. Increasing the thickness of the coatings reduced the amount of the released ions and the rate of the release process was slowed down. This indicates that by tailoring the structure and the thickness of the plasma-polymerized coating films, one can tune the silver ion release properties of Ag/polymer nanocomposites.","lang":"eng"}],"date_created":"2021-01-13T10:12:52Z","type":"journal_article","department":[{"_id":"35"},{"_id":"302"},{"_id":"321"}],"title":"Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites","year":"2013","author":[{"first_name":"N.","last_name":"Alissawi","full_name":"Alissawi, N."},{"full_name":"Peter, T.","last_name":"Peter","first_name":"T."},{"last_name":"Strunskus","first_name":"T.","full_name":"Strunskus, T."},{"id":"7266","first_name":"Christoph","last_name":"Ebbert","full_name":"Ebbert, Christoph"},{"id":"194","first_name":"Guido","last_name":"Grundmeier","full_name":"Grundmeier, Guido"},{"last_name":"Faupel","first_name":"F.","full_name":"Faupel, F."}],"publication_identifier":{"eissn":["1572-896X"],"issn":["1388-0764"]},"date_updated":"2022-01-06T06:54:41Z","publication_status":"published","intvolume":"        15","article_number":"2080","language":[{"iso":"eng"}],"doi":"10.1007/s11051-013-2080-9","isi":"1","citation":{"apa":"Alissawi, N., Peter, T., Strunskus, T., Ebbert, C., Grundmeier, G., &#38; Faupel, F. (2013). Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites. <i>JOURNAL OF NANOPARTICLE RESEARCH</i>, <i>15</i>(11). <a href=\"https://doi.org/10.1007/s11051-013-2080-9\">https://doi.org/10.1007/s11051-013-2080-9</a>","ieee":"N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, and F. Faupel, “Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites,” <i>JOURNAL OF NANOPARTICLE RESEARCH</i>, vol. 15, no. 11, 2013.","chicago":"Alissawi, N., T. Peter, T. Strunskus, Christoph Ebbert, Guido Grundmeier, and F. Faupel. “Plasma-Polymerized HMDSO Coatings to Adjust the Silver Ion Release Properties of Ag/Polymer Nanocomposites.” <i>JOURNAL OF NANOPARTICLE RESEARCH</i> 15, no. 11 (2013). <a href=\"https://doi.org/10.1007/s11051-013-2080-9\">https://doi.org/10.1007/s11051-013-2080-9</a>.","short":"N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, F. Faupel, JOURNAL OF NANOPARTICLE RESEARCH 15 (2013).","mla":"Alissawi, N., et al. “Plasma-Polymerized HMDSO Coatings to Adjust the Silver Ion Release Properties of Ag/Polymer Nanocomposites.” <i>JOURNAL OF NANOPARTICLE RESEARCH</i>, vol. 15, no. 11, 2080, 2013, doi:<a href=\"https://doi.org/10.1007/s11051-013-2080-9\">10.1007/s11051-013-2080-9</a>.","ama":"Alissawi N, Peter T, Strunskus T, Ebbert C, Grundmeier G, Faupel F. Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites. <i>JOURNAL OF NANOPARTICLE RESEARCH</i>. 2013;15(11). doi:<a href=\"https://doi.org/10.1007/s11051-013-2080-9\">10.1007/s11051-013-2080-9</a>","bibtex":"@article{Alissawi_Peter_Strunskus_Ebbert_Grundmeier_Faupel_2013, title={Plasma-polymerized HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites}, volume={15}, DOI={<a href=\"https://doi.org/10.1007/s11051-013-2080-9\">10.1007/s11051-013-2080-9</a>}, number={112080}, journal={JOURNAL OF NANOPARTICLE RESEARCH}, author={Alissawi, N. and Peter, T. and Strunskus, T. and Ebbert, Christoph and Grundmeier, Guido and Faupel, F.}, year={2013} }"},"quality_controlled":"1","external_id":{"isi":["000326054400001"]},"status":"public","_id":"20946","user_id":"7266","volume":15},{"user_id":"54556","doi":"10.1002/pssa.201330115","language":[{"iso":"eng"}],"_id":"22584","page":"416-424","publication_status":"published","date_updated":"2023-01-24T08:21:54Z","author":[{"full_name":"Dang, Van-Son","last_name":"Dang","first_name":"Van-Son"},{"first_name":"Harish","last_name":"Parala","full_name":"Parala, Harish"},{"full_name":"Kim, Jin Hyun","last_name":"Kim","first_name":"Jin Hyun"},{"full_name":"Xu, Ke","first_name":"Ke","last_name":"Xu"},{"first_name":"Nagendra B.","last_name":"Srinivasan","full_name":"Srinivasan, Nagendra B."},{"full_name":"Edengeiser, Eugen","first_name":"Eugen","last_name":"Edengeiser"},{"last_name":"Havenith","first_name":"Martina","full_name":"Havenith, Martina"},{"full_name":"Wieck, Andreas D.","first_name":"Andreas D.","last_name":"Wieck"},{"full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa","id":"54556"},{"last_name":"Fischer","first_name":"Roland. A.","full_name":"Fischer, Roland. A."},{"full_name":"Devi, Anjana","last_name":"Devi","first_name":"Anjana"}],"publication_identifier":{"issn":["1862-6300"]},"year":"2013","title":"Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition","status":"public","department":[{"_id":"302"}],"type":"journal_article","date_created":"2021-07-07T11:09:32Z","extern":"1","citation":{"short":"V.-S. Dang, H. Parala, J.H. Kim, K. Xu, N.B. Srinivasan, E. Edengeiser, M. Havenith, A.D. Wieck, M.T. de los Arcos de Pedro, Roland.A. Fischer, A. Devi, Physica Status Solidi (a) (2013) 416–424.","chicago":"Dang, Van-Son, Harish Parala, Jin Hyun Kim, Ke Xu, Nagendra B. Srinivasan, Eugen Edengeiser, Martina Havenith, et al. “Electrical and Optical Properties of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” <i>Physica Status Solidi (a)</i>, 2013, 416–24. <a href=\"https://doi.org/10.1002/pssa.201330115\">https://doi.org/10.1002/pssa.201330115</a>.","apa":"Dang, V.-S., Parala, H., Kim, J. H., Xu, K., Srinivasan, N. B., Edengeiser, E., Havenith, M., Wieck, A. D., de los Arcos de Pedro, M. T., Fischer, Roland. A., &#38; Devi, A. (2013). Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition. <i>Physica Status Solidi (a)</i>, 416–424. <a href=\"https://doi.org/10.1002/pssa.201330115\">https://doi.org/10.1002/pssa.201330115</a>","ieee":"V.-S. Dang <i>et al.</i>, “Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition,” <i>physica status solidi (a)</i>, pp. 416–424, 2013, doi: <a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>.","ama":"Dang V-S, Parala H, Kim JH, et al. Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition. <i>physica status solidi (a)</i>. Published online 2013:416-424. doi:<a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>","bibtex":"@article{Dang_Parala_Kim_Xu_Srinivasan_Edengeiser_Havenith_Wieck_de los Arcos de Pedro_Fischer_et al._2013, title={Electrical and optical properties of TiO2thin films prepared by plasma-enhanced atomic layer deposition}, DOI={<a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>}, journal={physica status solidi (a)}, author={Dang, Van-Son and Parala, Harish and Kim, Jin Hyun and Xu, Ke and Srinivasan, Nagendra B. and Edengeiser, Eugen and Havenith, Martina and Wieck, Andreas D. and de los Arcos de Pedro, Maria Teresa and Fischer, Roland. A. and et al.}, year={2013}, pages={416–424} }","mla":"Dang, Van-Son, et al. “Electrical and Optical Properties of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” <i>Physica Status Solidi (a)</i>, 2013, pp. 416–24, doi:<a href=\"https://doi.org/10.1002/pssa.201330115\">10.1002/pssa.201330115</a>."},"publication":"physica status solidi (a)"},{"user_id":"54556","doi":"10.1002/pssa.201330127","page":"260-266","_id":"22589","language":[{"iso":"eng"}],"publication_status":"published","date_updated":"2023-01-24T08:22:27Z","title":"MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics","year":"2013","status":"public","publication_identifier":{"issn":["1862-6300"]},"author":[{"full_name":"Srinivasan, Nagendra B.","last_name":"Srinivasan","first_name":"Nagendra B."},{"last_name":"Thiede","first_name":"Tobias B.","full_name":"Thiede, Tobias B."},{"full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","id":"54556"},{"last_name":"Rogalla","first_name":"Detlef","full_name":"Rogalla, Detlef"},{"first_name":"Hans-Werner","last_name":"Becker","full_name":"Becker, Hans-Werner"},{"full_name":"Devi, Anjana","first_name":"Anjana","last_name":"Devi"},{"last_name":"Fischer","first_name":"Roland A.","full_name":"Fischer, Roland A."}],"type":"journal_article","department":[{"_id":"302"}],"date_created":"2021-07-07T11:11:23Z","extern":"1","publication":"physica status solidi (a)","citation":{"ieee":"N. B. Srinivasan <i>et al.</i>, “MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics,” <i>physica status solidi (a)</i>, pp. 260–266, 2013, doi: <a href=\"https://doi.org/10.1002/pssa.201330127\">10.1002/pssa.201330127</a>.","apa":"Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Rogalla, D., Becker, H.-W., Devi, A., &#38; Fischer, R. A. (2013). MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics. <i>Physica Status Solidi (a)</i>, 260–266. <a href=\"https://doi.org/10.1002/pssa.201330127\">https://doi.org/10.1002/pssa.201330127</a>","short":"N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, D. Rogalla, H.-W. Becker, A. Devi, R.A. Fischer, Physica Status Solidi (a) (2013) 260–266.","chicago":"Srinivasan, Nagendra B., Tobias B. Thiede, Maria Teresa de los Arcos de Pedro, Detlef Rogalla, Hans-Werner Becker, Anjana Devi, and Roland A. Fischer. “MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and Film Characteristics.” <i>Physica Status Solidi (a)</i>, 2013, 260–66. <a href=\"https://doi.org/10.1002/pssa.201330127\">https://doi.org/10.1002/pssa.201330127</a>.","mla":"Srinivasan, Nagendra B., et al. “MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and Film Characteristics.” <i>Physica Status Solidi (a)</i>, 2013, pp. 260–66, doi:<a href=\"https://doi.org/10.1002/pssa.201330127\">10.1002/pssa.201330127</a>.","bibtex":"@article{Srinivasan_Thiede_de los Arcos de Pedro_Rogalla_Becker_Devi_Fischer_2013, title={MOCVD of tungsten nitride thin films: Comparison of precursor performance and film characteristics}, DOI={<a href=\"https://doi.org/10.1002/pssa.201330127\">10.1002/pssa.201330127</a>}, journal={physica status solidi (a)}, author={Srinivasan, Nagendra B. and Thiede, Tobias B. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Becker, Hans-Werner and Devi, Anjana and Fischer, Roland A.}, year={2013}, pages={260–266} }","ama":"Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. 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Published online 2013:130-136. doi:<a href=\"https://doi.org/10.1016/j.surfcoat.2013.06.024\">10.1016/j.surfcoat.2013.06.024</a>","bibtex":"@article{Srinivasan_Thiede_de los Arcos de Pedro_Gwildies_Krasnopolski_Becker_Rogalla_Devi_Fischer_2013, title={Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}, DOI={<a href=\"https://doi.org/10.1016/j.surfcoat.2013.06.024\">10.1016/j.surfcoat.2013.06.024</a>}, journal={Surface and Coatings Technology}, author={Srinivasan, N.B. and Thiede, T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski, M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}, year={2013}, pages={130–136} }"},"publication":"Surface and Coatings Technology","extern":"1"},{"doi":"10.1088/0022-3727/46/8/084009","user_id":"54556","article_number":"084009","language":[{"iso":"eng"}],"_id":"22594","date_updated":"2023-01-24T08:23:28Z","publication_status":"published","title":"Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum","status":"public","year":"2013","author":[{"full_name":"Will, Andreas","last_name":"Will","first_name":"Andreas"},{"first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556"},{"full_name":"Corbella, Carles","last_name":"Corbella","first_name":"Carles"},{"last_name":"Hecimovic","first_name":"Ante","full_name":"Hecimovic, Ante"},{"full_name":"Machura, Patrick D","first_name":"Patrick D","last_name":"Machura"},{"full_name":"Winter, Jörg","last_name":"Winter","first_name":"Jörg"},{"full_name":"von Keudell, Achim","last_name":"von Keudell","first_name":"Achim"}],"publication_identifier":{"issn":["0022-3727","1361-6463"]},"type":"journal_article","department":[{"_id":"302"}],"date_created":"2021-07-07T11:13:47Z","extern":"1","publication":"Journal of Physics D: Applied Physics","citation":{"apa":"Will, A., de los Arcos de Pedro, M. 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Published online 2013. doi:<a href=\"https://doi.org/10.1088/0022-3727/46/8/084009\">10.1088/0022-3727/46/8/084009</a>","bibtex":"@article{Will_de los Arcos de Pedro_Corbella_Hecimovic_Machura_Winter_von Keudell_2013, title={Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum}, DOI={<a href=\"https://doi.org/10.1088/0022-3727/46/8/084009\">10.1088/0022-3727/46/8/084009</a>}, number={084009}, journal={Journal of Physics D: Applied Physics}, author={Will, Andreas and de los Arcos de Pedro, Maria Teresa and Corbella, Carles and Hecimovic, Ante and Machura, Patrick D and Winter, Jörg and von Keudell, Achim}, year={2013} }"}},{"date_updated":"2023-01-24T08:22:42Z","publication_status":"published","year":"2013","title":"Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces","status":"public","author":[{"full_name":"Corbella, Carles","first_name":"Carles","last_name":"Corbella"},{"full_name":"Grosse-Kreul, Simon","first_name":"Simon","last_name":"Grosse-Kreul"},{"last_name":"Kreiter","first_name":"Oliver","full_name":"Kreiter, Oliver"},{"id":"54556","first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa"},{"full_name":"Benedikt, Jan","last_name":"Benedikt","first_name":"Jan"},{"first_name":"Achim","last_name":"von Keudell","full_name":"von Keudell, Achim"}],"publication_identifier":{"issn":["0034-6748","1089-7623"]},"doi":"10.1063/1.4826066","user_id":"54556","article_number":"103303","_id":"22591","language":[{"iso":"eng"}],"extern":"1","publication":"Review of Scientific Instruments","citation":{"ieee":"C. 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Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure. <i>Plasma Processes and Polymers</i>, 1061–1073. <a href=\"https://doi.org/10.1002/ppap.201300059\">https://doi.org/10.1002/ppap.201300059</a>","chicago":"Rügner, Katja, Rüdiger Reuter, Dirk Ellerweg, Maria Teresa de los Arcos de Pedro, Achim von Keudell, and Jan Benedikt. “Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure.” <i>Plasma Processes and Polymers</i>, 2013, 1061–73. <a href=\"https://doi.org/10.1002/ppap.201300059\">https://doi.org/10.1002/ppap.201300059</a>.","short":"K. Rügner, R. Reuter, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell, J. 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Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors. <i>Crystal Growth &#38; Design</i>. Published online 2012:5079-5089. doi:<a href=\"https://doi.org/10.1021/cg3010147\">10.1021/cg3010147</a>","mla":"Banerjee, Manish, et al. “Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors.” <i>Crystal Growth &#38; Design</i>, 2012, pp. 5079–89, doi:<a href=\"https://doi.org/10.1021/cg3010147\">10.1021/cg3010147</a>.","chicago":"Banerjee, Manish, Nagendra Babu Srinivasan, Huaizhi Zhu, Sun Ja Kim, Ke Xu, Manuela Winter, Hans-Werner Becker, et al. “Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors.” <i>Crystal Growth &#38; Design</i>, 2012, 5079–89. <a href=\"https://doi.org/10.1021/cg3010147\">https://doi.org/10.1021/cg3010147</a>.","short":"M. Banerjee, N.B. Srinivasan, H. Zhu, S.J. Kim, K. Xu, M. Winter, H.-W. Becker, D. 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Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors. <i>Crystal Growth &#38; Design</i>, 5079–5089. <a href=\"https://doi.org/10.1021/cg3010147\">https://doi.org/10.1021/cg3010147</a>"},"publication":"Crystal Growth & Design","extern":"1"},{"type":"journal_article","department":[{"_id":"302"}],"date_created":"2021-07-07T11:26:57Z","extern":"1","publication":"Dalton Transactions","citation":{"short":"A.P. Milanov, K. Xu, S. Cwik, H. Parala, M.T. de los Arcos de Pedro, H.-W. Becker, D. Rogalla, R. Cross, S. Paul, A. 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Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors. <i>Dalton Transactions</i>, Article 13936. <a href=\"https://doi.org/10.1039/c2dt31219k\">https://doi.org/10.1039/c2dt31219k</a>","bibtex":"@article{Milanov_Xu_Cwik_Parala_de los Arcos de Pedro_Becker_Rogalla_Cross_Paul_Devi_2012, title={Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors}, DOI={<a href=\"https://doi.org/10.1039/c2dt31219k\">10.1039/c2dt31219k</a>}, number={13936}, journal={Dalton Transactions}, author={Milanov, Andrian P. and Xu, Ke and Cwik, Stefan and Parala, Harish and de los Arcos de Pedro, Maria Teresa and Becker, Hans-Werner and Rogalla, Detlef and Cross, Richard and Paul, Shashi and Devi, Anjana}, year={2012} }","ama":"Milanov AP, Xu K, Cwik S, et al. Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth precursors. <i>Dalton Transactions</i>. 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