---
_id: '63436'
article_number: acsanm.5c04857
author:
- first_name: Sivoney Ferreira
full_name: de Souza, Sivoney Ferreira
last_name: de Souza
- first_name: Christina
full_name: Beresowski, Christina
last_name: Beresowski
- first_name: Sabine
full_name: Kosmella, Sabine
last_name: Kosmella
- first_name: João
full_name: Ameixa, João
last_name: Ameixa
- first_name: Bhanu Kiran
full_name: Pothineni, Bhanu Kiran
last_name: Pothineni
- first_name: Adrian Clemens
full_name: Keller, Adrian Clemens
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
- first_name: Matthias
full_name: Hartlieb, Matthias
last_name: Hartlieb
- first_name: Andreas
full_name: Taubert, Andreas
last_name: Taubert
- first_name: Ilko
full_name: Bald, Ilko
last_name: Bald
citation:
ama: de Souza SF, Beresowski C, Kosmella S, et al. Nanocellulose Membranes for Plasmon-Enhanced
Removal of Organic Pollutants from Water. ACS Applied Nano Materials. Published
online 2026. doi:10.1021/acsanm.5c04857
apa: de Souza, S. F., Beresowski, C., Kosmella, S., Ameixa, J., Pothineni, B. K.,
Keller, A. C., Hartlieb, M., Taubert, A., & Bald, I. (2026). Nanocellulose
Membranes for Plasmon-Enhanced Removal of Organic Pollutants from Water. ACS
Applied Nano Materials, Article acsanm.5c04857. https://doi.org/10.1021/acsanm.5c04857
bibtex: '@article{de Souza_Beresowski_Kosmella_Ameixa_Pothineni_Keller_Hartlieb_Taubert_Bald_2026,
title={Nanocellulose Membranes for Plasmon-Enhanced Removal of Organic Pollutants
from Water}, DOI={10.1021/acsanm.5c04857},
number={acsanm.5c04857}, journal={ACS Applied Nano Materials}, publisher={American
Chemical Society (ACS)}, author={de Souza, Sivoney Ferreira and Beresowski, Christina
and Kosmella, Sabine and Ameixa, João and Pothineni, Bhanu Kiran and Keller, Adrian
Clemens and Hartlieb, Matthias and Taubert, Andreas and Bald, Ilko}, year={2026}
}'
chicago: Souza, Sivoney Ferreira de, Christina Beresowski, Sabine Kosmella, João
Ameixa, Bhanu Kiran Pothineni, Adrian Clemens Keller, Matthias Hartlieb, Andreas
Taubert, and Ilko Bald. “Nanocellulose Membranes for Plasmon-Enhanced Removal
of Organic Pollutants from Water.” ACS Applied Nano Materials, 2026. https://doi.org/10.1021/acsanm.5c04857.
ieee: 'S. F. de Souza et al., “Nanocellulose Membranes for Plasmon-Enhanced
Removal of Organic Pollutants from Water,” ACS Applied Nano Materials,
Art. no. acsanm.5c04857, 2026, doi: 10.1021/acsanm.5c04857.'
mla: de Souza, Sivoney Ferreira, et al. “Nanocellulose Membranes for Plasmon-Enhanced
Removal of Organic Pollutants from Water.” ACS Applied Nano Materials,
acsanm.5c04857, American Chemical Society (ACS), 2026, doi:10.1021/acsanm.5c04857.
short: S.F. de Souza, C. Beresowski, S. Kosmella, J. Ameixa, B.K. Pothineni, A.C.
Keller, M. Hartlieb, A. Taubert, I. Bald, ACS Applied Nano Materials (2026).
date_created: 2026-01-05T08:23:24Z
date_updated: 2026-01-05T08:23:51Z
department:
- _id: '302'
doi: 10.1021/acsanm.5c04857
language:
- iso: eng
publication: ACS Applied Nano Materials
publication_identifier:
issn:
- 2574-0970
- 2574-0970
publication_status: published
publisher: American Chemical Society (ACS)
status: public
title: Nanocellulose Membranes for Plasmon-Enhanced Removal of Organic Pollutants
from Water
type: journal_article
user_id: '48864'
year: '2026'
...
---
_id: '62726'
abstract:
- lang: eng
text: Surface-assisted DNA lattice assembly is used in the synthesis of
functional surfaces and as a model of supramolecular network formation. Here,
competitive DNA binding of different cation species is investigated...
author:
- first_name: Xiaodan
full_name: Xu, Xiaodan
last_name: Xu
- first_name: Bhanu Kiran
full_name: Pothineni, Bhanu Kiran
last_name: Pothineni
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Satoru
full_name: Tsushima, Satoru
last_name: Tsushima
- first_name: Adrian Clemens
full_name: Keller, Adrian Clemens
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
citation:
ama: Xu X, Pothineni BK, Grundmeier G, Tsushima S, Keller AC. On the role of cation-DNA
interactions in surface-assisted DNA lattice assembly. Nanoscale. Published
online 2026. doi:10.1039/d5nr03695j
apa: Xu, X., Pothineni, B. K., Grundmeier, G., Tsushima, S., & Keller, A. C.
(2026). On the role of cation-DNA interactions in surface-assisted DNA lattice
assembly. Nanoscale. https://doi.org/10.1039/d5nr03695j
bibtex: '@article{Xu_Pothineni_Grundmeier_Tsushima_Keller_2026, title={On the role
of cation-DNA interactions in surface-assisted DNA lattice assembly}, DOI={10.1039/d5nr03695j}, journal={Nanoscale},
publisher={Royal Society of Chemistry (RSC)}, author={Xu, Xiaodan and Pothineni,
Bhanu Kiran and Grundmeier, Guido and Tsushima, Satoru and Keller, Adrian Clemens},
year={2026} }'
chicago: Xu, Xiaodan, Bhanu Kiran Pothineni, Guido Grundmeier, Satoru Tsushima,
and Adrian Clemens Keller. “On the Role of Cation-DNA Interactions in Surface-Assisted
DNA Lattice Assembly.” Nanoscale, 2026. https://doi.org/10.1039/d5nr03695j.
ieee: 'X. Xu, B. K. Pothineni, G. Grundmeier, S. Tsushima, and A. C. Keller, “On
the role of cation-DNA interactions in surface-assisted DNA lattice assembly,”
Nanoscale, 2026, doi: 10.1039/d5nr03695j.'
mla: Xu, Xiaodan, et al. “On the Role of Cation-DNA Interactions in Surface-Assisted
DNA Lattice Assembly.” Nanoscale, Royal Society of Chemistry (RSC), 2026,
doi:10.1039/d5nr03695j.
short: X. Xu, B.K. Pothineni, G. Grundmeier, S. Tsushima, A.C. Keller, Nanoscale
(2026).
date_created: 2025-12-01T13:48:42Z
date_updated: 2026-01-06T10:42:32Z
department:
- _id: '302'
doi: 10.1039/d5nr03695j
language:
- iso: eng
publication: Nanoscale
publication_identifier:
issn:
- 2040-3364
- 2040-3372
publication_status: published
publisher: Royal Society of Chemistry (RSC)
status: public
title: On the role of cation-DNA interactions in surface-assisted DNA lattice assembly
type: journal_article
user_id: '48864'
year: '2026'
...
---
_id: '64982'
author:
- first_name: Kai
full_name: Lingnau, Kai
last_name: Lingnau
- first_name: Chantal
full_name: Theile-Rasche, Chantal
last_name: Theile-Rasche
- first_name: Klaus
full_name: Vissing, Klaus
last_name: Vissing
- first_name: Elmar
full_name: Moritzer, Elmar
id: '20531'
last_name: Moritzer
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Martin
full_name: Wiesing, Martin
last_name: Wiesing
citation:
ama: Lingnau K, Theile-Rasche C, Vissing K, Moritzer E, Grundmeier G, Wiesing M.
Mechanisms of deposit formation in injection moulding cavities and the role of
tool coatings and internal release agents. Surface and Coatings Technology.
2026;524:133280. doi:10.1016/j.surfcoat.2026.133280
apa: Lingnau, K., Theile-Rasche, C., Vissing, K., Moritzer, E., Grundmeier, G.,
& Wiesing, M. (2026). Mechanisms of deposit formation in injection moulding
cavities and the role of tool coatings and internal release agents. Surface
and Coatings Technology, 524, 133280. https://doi.org/10.1016/j.surfcoat.2026.133280
bibtex: '@article{Lingnau_Theile-Rasche_Vissing_Moritzer_Grundmeier_Wiesing_2026,
title={Mechanisms of deposit formation in injection moulding cavities and the
role of tool coatings and internal release agents}, volume={524}, DOI={10.1016/j.surfcoat.2026.133280},
journal={Surface and Coatings Technology}, author={Lingnau, Kai and Theile-Rasche,
Chantal and Vissing, Klaus and Moritzer, Elmar and Grundmeier, Guido and Wiesing,
Martin}, year={2026}, pages={133280} }'
chicago: 'Lingnau, Kai, Chantal Theile-Rasche, Klaus Vissing, Elmar Moritzer, Guido
Grundmeier, and Martin Wiesing. “Mechanisms of Deposit Formation in Injection
Moulding Cavities and the Role of Tool Coatings and Internal Release Agents.”
Surface and Coatings Technology 524 (2026): 133280. https://doi.org/10.1016/j.surfcoat.2026.133280.'
ieee: 'K. Lingnau, C. Theile-Rasche, K. Vissing, E. Moritzer, G. Grundmeier, and
M. Wiesing, “Mechanisms of deposit formation in injection moulding cavities and
the role of tool coatings and internal release agents,” Surface and Coatings
Technology, vol. 524, p. 133280, 2026, doi: 10.1016/j.surfcoat.2026.133280.'
mla: Lingnau, Kai, et al. “Mechanisms of Deposit Formation in Injection Moulding
Cavities and the Role of Tool Coatings and Internal Release Agents.” Surface
and Coatings Technology, vol. 524, 2026, p. 133280, doi:10.1016/j.surfcoat.2026.133280.
short: K. Lingnau, C. Theile-Rasche, K. Vissing, E. Moritzer, G. Grundmeier, M.
Wiesing, Surface and Coatings Technology 524 (2026) 133280.
date_created: 2026-03-16T12:20:48Z
date_updated: 2026-03-16T12:51:54Z
department:
- _id: '9'
- _id: '367'
- _id: '302'
doi: 10.1016/j.surfcoat.2026.133280
extern: '1'
intvolume: ' 524'
keyword:
- Plasmabeschichtung
- Spritzgießen
- Spritzgießwerkzeug
- Trennschicht
- ultraTrenn
- Werkzeugbeschichtung
language:
- iso: eng
page: '133280'
publication: Surface and Coatings Technology
publication_identifier:
issn:
- '02578972'
quality_controlled: '1'
status: public
title: Mechanisms of deposit formation in injection moulding cavities and the role
of tool coatings and internal release agents
type: journal_article
user_id: '59363'
volume: 524
year: '2026'
...
---
_id: '65082'
abstract:
- lang: eng
text: Encoding information in molecular arrangements on DNA origami nanostructures
(DONs) provides the basis for novel concepts in molecular data storage and computing.
To preserve their integrity over long timescales, the information‐carrying DONs
are often stored in a frozen state. Here, we investigate the effect of repeated
freeze–thaw (F/T) cycles on the structural and functional integrity of DONs carrying
biotin (Bt) modifications. Streptavidin (SAv) binding is used to visualize the
stored information by atomic force microscopy (AFM) before and after 40 F/T cycles.
Two strategies are compared by F/T cycling of (I) SAv‐bound DONs and (II) SAv‐free
DONs that are exposed to SAv directly before AFM imaging. Our results reveal that
while the DONs retain their overall shape, F/T cycling induces a small amount
of damage, leading to slightly reduced SAv binding. Adding glycerol at mM concentrations
efficiently protects the DONs and restores the original SAv binding yields. Nevertheless,
SAv exposure after F/T cycling leads to slightly higher and more consistent SAv
binding yields and a lower background of nonspecifically adsorbed SAv compared
to Strategy I. This makes information readout by AFM more efficient and renders
Strategy II more convenient for long‐term storage of information‐carrying DONs
with repeated information readout.
article_number: e202500161
author:
- first_name: Xinyang
full_name: Li, Xinyang
last_name: Li
- first_name: Lukas
full_name: Rabbe, Lukas
last_name: Rabbe
- first_name: Jacqueline
full_name: Linneweber, Jacqueline
last_name: Linneweber
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Adrian Clemens
full_name: Keller, Adrian Clemens
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
citation:
ama: Li X, Rabbe L, Linneweber J, Grundmeier G, Keller AC. Stability of Information‐Carrying
DNA Origami Nanostructures During Repeated Freeze–Thaw Cycles. Chemistry–Methods.
2026;6(3). doi:10.1002/cmtd.202500161
apa: Li, X., Rabbe, L., Linneweber, J., Grundmeier, G., & Keller, A. C. (2026).
Stability of Information‐Carrying DNA Origami Nanostructures During Repeated Freeze–Thaw
Cycles. Chemistry–Methods, 6(3), Article e202500161. https://doi.org/10.1002/cmtd.202500161
bibtex: '@article{Li_Rabbe_Linneweber_Grundmeier_Keller_2026, title={Stability of
Information‐Carrying DNA Origami Nanostructures During Repeated Freeze–Thaw Cycles},
volume={6}, DOI={10.1002/cmtd.202500161},
number={3e202500161}, journal={Chemistry–Methods}, publisher={Wiley}, author={Li,
Xinyang and Rabbe, Lukas and Linneweber, Jacqueline and Grundmeier, Guido and
Keller, Adrian Clemens}, year={2026} }'
chicago: Li, Xinyang, Lukas Rabbe, Jacqueline Linneweber, Guido Grundmeier, and
Adrian Clemens Keller. “Stability of Information‐Carrying DNA Origami Nanostructures
During Repeated Freeze–Thaw Cycles.” Chemistry–Methods 6, no. 3 (2026).
https://doi.org/10.1002/cmtd.202500161.
ieee: 'X. Li, L. Rabbe, J. Linneweber, G. Grundmeier, and A. C. Keller, “Stability
of Information‐Carrying DNA Origami Nanostructures During Repeated Freeze–Thaw
Cycles,” Chemistry–Methods, vol. 6, no. 3, Art. no. e202500161, 2026, doi:
10.1002/cmtd.202500161.'
mla: Li, Xinyang, et al. “Stability of Information‐Carrying DNA Origami Nanostructures
During Repeated Freeze–Thaw Cycles.” Chemistry–Methods, vol. 6, no. 3,
e202500161, Wiley, 2026, doi:10.1002/cmtd.202500161.
short: X. Li, L. Rabbe, J. Linneweber, G. Grundmeier, A.C. Keller, Chemistry–Methods
6 (2026).
date_created: 2026-03-23T07:12:13Z
date_updated: 2026-03-23T07:12:53Z
department:
- _id: '302'
doi: 10.1002/cmtd.202500161
intvolume: ' 6'
issue: '3'
language:
- iso: eng
publication: Chemistry–Methods
publication_identifier:
issn:
- 2628-9725
- 2628-9725
publication_status: published
publisher: Wiley
status: public
title: Stability of Information‐Carrying DNA Origami Nanostructures During Repeated
Freeze–Thaw Cycles
type: journal_article
user_id: '48864'
volume: 6
year: '2026'
...
---
_id: '65108'
abstract:
- lang: eng
text: "Abstract\r\n Lithographic
surface patterning is a cornerstone of modern materials and device fabrication.
Although the available lithography techniques are constantly being advanced to
push the feature sizes down to the few-nanometer scale, such developments are
associated with many technological and economic challenges. Combining established
top-down lithography with bottom-up self-assembly strategies has the potential
to overcome those challenges and enable the manipulation of matter with molecular
precision. One of the most exciting approaches in this regard is to harness the
programmability of DNA self-assembly to create precise DNA nanostructure masks
to be used in the lithographic patterning of diverse substrates. DNA nanotechnology
has provided us with a versatile toolbox for the high-yield synthesis of 2D and
3D nanostructures with complex, user-defined shapes at unprecedented molecular
accuracy. Consequently, the last decade has seen intense research efforts aimed
at transferring such DNA nanostructure shapes into functional organic and inorganic
materials and we have now arrived at a point where sophisticated molecular lithography
approaches utilize DNA nanostructure masks for the fabrication of plasmonic surfaces
for metamaterials and sensing applications. This review summarizes how the spatial
information of such DNA nanostructure masks can be transferred into various organic
and inorganic materials through selective etching and deposition steps. The review
also discusses recent developments toward all-purpose molecular lithography schemes
and highlights promising extensions of the discussed methods toward new materials
systems and application fields."
author:
- first_name: Adrian Clemens
full_name: Keller, Adrian Clemens
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
- first_name: Veikko
full_name: Linko, Veikko
last_name: Linko
citation:
ama: 'Keller AC, Linko V. Molecular lithography with DNA nanostructures: Methods
and applications. Journal of Physics D: Applied Physics. Published online
2026. doi:10.1088/1361-6463/ae5667'
apa: 'Keller, A. C., & Linko, V. (2026). Molecular lithography with DNA nanostructures:
Methods and applications. Journal of Physics D: Applied Physics. https://doi.org/10.1088/1361-6463/ae5667'
bibtex: '@article{Keller_Linko_2026, title={Molecular lithography with DNA nanostructures:
Methods and applications}, DOI={10.1088/1361-6463/ae5667},
journal={Journal of Physics D: Applied Physics}, publisher={IOP Publishing}, author={Keller,
Adrian Clemens and Linko, Veikko}, year={2026} }'
chicago: 'Keller, Adrian Clemens, and Veikko Linko. “Molecular Lithography with
DNA Nanostructures: Methods and Applications.” Journal of Physics D: Applied
Physics, 2026. https://doi.org/10.1088/1361-6463/ae5667.'
ieee: 'A. C. Keller and V. Linko, “Molecular lithography with DNA nanostructures:
Methods and applications,” Journal of Physics D: Applied Physics, 2026,
doi: 10.1088/1361-6463/ae5667.'
mla: 'Keller, Adrian Clemens, and Veikko Linko. “Molecular Lithography with DNA
Nanostructures: Methods and Applications.” Journal of Physics D: Applied Physics,
IOP Publishing, 2026, doi:10.1088/1361-6463/ae5667.'
short: 'A.C. Keller, V. Linko, Journal of Physics D: Applied Physics (2026).'
date_created: 2026-03-25T07:43:24Z
date_updated: 2026-03-25T07:44:52Z
department:
- _id: '302'
doi: 10.1088/1361-6463/ae5667
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
issn:
- 0022-3727
- 1361-6463
publication_status: published
publisher: IOP Publishing
status: public
title: 'Molecular lithography with DNA nanostructures: Methods and applications'
type: journal_article
user_id: '48864'
year: '2026'
...
---
_id: '65490'
abstract:
- lang: eng
text: In recent years, nanostructures assembled by DNA have found promising
applications in optics, medicine, and sensing. DNA origami in particular provides
unique self‐assembly properties, not only enabling a vast variety of functionalization
schemes but also presenting a promising route to fabricate large‐scale, bottom‐up
nanostructured arrays. This approach has comparable precision to electron beam
lithography but avoids slow and expensive patterning steps. However, self‐assembly
of lattices with high order and well‐defined periodicity requires careful tuning
of the deposition parameters and interactions involved, which has been done mostly
on mica so far. As mica is not compatible with standard microfabrication processes,
we investigate here the assembly of DNA origami lattices on the most general microfabrication
material, that is, silicon wafers, which has turned out to be rather challenging.
We study how the forming of polycrystalline 2D‐fishnet‐type lattices is influenced
by different incubation conditions and strengths of the origami–origami and origami‐surface
interactions, with the aim to create large‐scale single‐crystalline lattices.
The lattices are characterized by atomic force microscopy and analyzed for precision
of formation, achievable domain size, and surface coverage of well‐formed lattices.
Thanks to the silicon substrate, these DNA origami lattices can be further combined
with traditional microfabrication processes to turn them, for example, into metamaterials
with novel optical properties.
article_number: e202500813
author:
- first_name: Heini
full_name: Järvinen, Heini
last_name: Järvinen
- first_name: Johannes M.
full_name: Parikka, Johannes M.
last_name: Parikka
- first_name: R. P. Thiwangi N.
full_name: Rajapaksha, R. P. Thiwangi N.
last_name: Rajapaksha
- first_name: Adrian Clemens
full_name: Keller, Adrian Clemens
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
- first_name: J. Jussi
full_name: Toppari, J. Jussi
last_name: Toppari
citation:
ama: Järvinen H, Parikka JM, Rajapaksha RPTN, Keller AC, Toppari JJ. Towards Single‐Crystalline
DNA Origami Lattices on Silicon Wafers for Bottom‐Up Nanofabrication. Small
Structures. 2026;7(4). doi:10.1002/sstr.202500813
apa: Järvinen, H., Parikka, J. M., Rajapaksha, R. P. T. N., Keller, A. C., &
Toppari, J. J. (2026). Towards Single‐Crystalline DNA Origami Lattices on Silicon
Wafers for Bottom‐Up Nanofabrication. Small Structures, 7(4), Article
e202500813. https://doi.org/10.1002/sstr.202500813
bibtex: '@article{Järvinen_Parikka_Rajapaksha_Keller_Toppari_2026, title={Towards
Single‐Crystalline DNA Origami Lattices on Silicon Wafers for Bottom‐Up Nanofabrication},
volume={7}, DOI={10.1002/sstr.202500813},
number={4e202500813}, journal={Small Structures}, publisher={Wiley}, author={Järvinen,
Heini and Parikka, Johannes M. and Rajapaksha, R. P. Thiwangi N. and Keller, Adrian
Clemens and Toppari, J. Jussi}, year={2026} }'
chicago: Järvinen, Heini, Johannes M. Parikka, R. P. Thiwangi N. Rajapaksha, Adrian
Clemens Keller, and J. Jussi Toppari. “Towards Single‐Crystalline DNA Origami
Lattices on Silicon Wafers for Bottom‐Up Nanofabrication.” Small Structures
7, no. 4 (2026). https://doi.org/10.1002/sstr.202500813.
ieee: 'H. Järvinen, J. M. Parikka, R. P. T. N. Rajapaksha, A. C. Keller, and J.
J. Toppari, “Towards Single‐Crystalline DNA Origami Lattices on Silicon Wafers
for Bottom‐Up Nanofabrication,” Small Structures, vol. 7, no. 4, Art. no.
e202500813, 2026, doi: 10.1002/sstr.202500813.'
mla: Järvinen, Heini, et al. “Towards Single‐Crystalline DNA Origami Lattices on
Silicon Wafers for Bottom‐Up Nanofabrication.” Small Structures, vol. 7,
no. 4, e202500813, Wiley, 2026, doi:10.1002/sstr.202500813.
short: H. Järvinen, J.M. Parikka, R.P.T.N. Rajapaksha, A.C. Keller, J.J. Toppari,
Small Structures 7 (2026).
date_created: 2026-04-22T16:17:08Z
date_updated: 2026-04-22T16:17:22Z
department:
- _id: '302'
doi: 10.1002/sstr.202500813
intvolume: ' 7'
issue: '4'
language:
- iso: eng
publication: Small Structures
publication_identifier:
issn:
- 2688-4062
- 2688-4062
publication_status: published
publisher: Wiley
status: public
title: Towards Single‐Crystalline DNA Origami Lattices on Silicon Wafers for Bottom‐Up
Nanofabrication
type: journal_article
user_id: '48864'
volume: 7
year: '2026'
...
---
_id: '65545'
abstract:
- lang: eng
text: "ABSTRACT\r\n Ligation of
staple strands in DNA origami nanostructures (DONs) can yield enhanced structural
stability in critical environments. This process can be viewed as performing hundreds
of parallel reactions programmed on a self‐assembled nanoscale platform. While
previous studies have focused on investigating the collective results of the chemical
or enzymatic ligation reactions, herein, the global quantitative analysis of individual
ligation reactions is achieved using quantitative PCR (qPCR). By mapping enzymatic
ligation efficiency on a trapezoidal substructure representing one‐third of a
triangular DON, ligation is shown to preferentially occur at the trapezoid edges
rather than at inner sites. Excellent agreement between the experimental ligation
yields and docking simulations suggests that this is a result of variations in
the ligase docking probability. Ligation products involving more than two consecutive
sequences can be generated with each enzyme‐catalyzed reaction as an independent
event. Interestingly, the sharp contrast between the edges vs. the inner sites
has been abolished by changing the reaction conditions and performing the ligation
in a DMSO co‐solvent system. This analytic method provides unprecedented insight
into the multiple ligation reactions occurring in parallel within complex DONs
and will be an invaluable tool in the translation of DONs from the lab to real‐world
applications."
article_number: e08136
author:
- first_name: Konrad
full_name: Hacker, Konrad
last_name: Hacker
- first_name: Emilia
full_name: Juricke, Emilia
id: '68157'
last_name: Juricke
- first_name: Carolin
full_name: Münch, Carolin
last_name: Münch
- first_name: Antonio
full_name: Suma, Antonio
last_name: Suma
- first_name: Adrian Clemens
full_name: Keller, Adrian Clemens
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
- first_name: Yixin
full_name: Zhang, Yixin
last_name: Zhang
citation:
ama: Hacker K, Juricke E, Münch C, Suma A, Keller AC, Zhang Y. Global Quantitative
Analysis of Ligation Reactions in Self‐Assembled DNA Nanostructures at the Single‐Nick
Level. Small. Published online 2026. doi:10.1002/smll.202508136
apa: Hacker, K., Juricke, E., Münch, C., Suma, A., Keller, A. C., & Zhang, Y.
(2026). Global Quantitative Analysis of Ligation Reactions in Self‐Assembled DNA
Nanostructures at the Single‐Nick Level. Small, Article e08136. https://doi.org/10.1002/smll.202508136
bibtex: '@article{Hacker_Juricke_Münch_Suma_Keller_Zhang_2026, title={Global Quantitative
Analysis of Ligation Reactions in Self‐Assembled DNA Nanostructures at the Single‐Nick
Level}, DOI={10.1002/smll.202508136},
number={e08136}, journal={Small}, publisher={Wiley}, author={Hacker, Konrad and
Juricke, Emilia and Münch, Carolin and Suma, Antonio and Keller, Adrian Clemens
and Zhang, Yixin}, year={2026} }'
chicago: Hacker, Konrad, Emilia Juricke, Carolin Münch, Antonio Suma, Adrian Clemens
Keller, and Yixin Zhang. “Global Quantitative Analysis of Ligation Reactions in
Self‐Assembled DNA Nanostructures at the Single‐Nick Level.” Small, 2026.
https://doi.org/10.1002/smll.202508136.
ieee: 'K. Hacker, E. Juricke, C. Münch, A. Suma, A. C. Keller, and Y. Zhang, “Global
Quantitative Analysis of Ligation Reactions in Self‐Assembled DNA Nanostructures
at the Single‐Nick Level,” Small, Art. no. e08136, 2026, doi: 10.1002/smll.202508136.'
mla: Hacker, Konrad, et al. “Global Quantitative Analysis of Ligation Reactions
in Self‐Assembled DNA Nanostructures at the Single‐Nick Level.” Small,
e08136, Wiley, 2026, doi:10.1002/smll.202508136.
short: K. Hacker, E. Juricke, C. Münch, A. Suma, A.C. Keller, Y. Zhang, Small (2026).
date_created: 2026-05-02T10:20:10Z
date_updated: 2026-05-02T10:20:35Z
department:
- _id: '302'
doi: 10.1002/smll.202508136
language:
- iso: eng
publication: Small
publication_identifier:
issn:
- 1613-6810
- 1613-6829
publication_status: published
publisher: Wiley
status: public
title: Global Quantitative Analysis of Ligation Reactions in Self‐Assembled DNA Nanostructures
at the Single‐Nick Level
type: journal_article
user_id: '48864'
year: '2026'
...
---
_id: '65553'
article_number: '104360'
author:
- first_name: Sandra Alicja
full_name: Golebiowska, Sandra Alicja
id: '69524'
last_name: Golebiowska
orcid: 0009-0001-1261-9455
- first_name: Dennis
full_name: Meinderink, Dennis
last_name: Meinderink
- first_name: Christoph
full_name: Ebbert, Christoph
id: '7266'
last_name: Ebbert
- first_name: Sabrina
full_name: Kollmann, Sabrina
last_name: Kollmann
- first_name: Vanessa
full_name: Neßlinger, Vanessa
id: '54649'
last_name: Neßlinger
orcid: 0000-0001-9416-1646
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Golebiowska SA, Meinderink D, Ebbert C, Kollmann S, Neßlinger V, Grundmeier
G. Two-electrode electrochemical impedance spectroscopy at polymer/oxide interfaces.
International Journal of Adhesion and Adhesives. 2026;149. doi:10.1016/j.ijadhadh.2026.104360
apa: Golebiowska, S. A., Meinderink, D., Ebbert, C., Kollmann, S., Neßlinger, V.,
& Grundmeier, G. (2026). Two-electrode electrochemical impedance spectroscopy
at polymer/oxide interfaces. International Journal of Adhesion and Adhesives,
149, Article 104360. https://doi.org/10.1016/j.ijadhadh.2026.104360
bibtex: '@article{Golebiowska_Meinderink_Ebbert_Kollmann_Neßlinger_Grundmeier_2026,
title={Two-electrode electrochemical impedance spectroscopy at polymer/oxide interfaces},
volume={149}, DOI={10.1016/j.ijadhadh.2026.104360},
number={104360}, journal={International Journal of Adhesion and Adhesives}, publisher={Elsevier
BV}, author={Golebiowska, Sandra Alicja and Meinderink, Dennis and Ebbert, Christoph
and Kollmann, Sabrina and Neßlinger, Vanessa and Grundmeier, Guido}, year={2026}
}'
chicago: Golebiowska, Sandra Alicja, Dennis Meinderink, Christoph Ebbert, Sabrina
Kollmann, Vanessa Neßlinger, and Guido Grundmeier. “Two-Electrode Electrochemical
Impedance Spectroscopy at Polymer/Oxide Interfaces.” International Journal
of Adhesion and Adhesives 149 (2026). https://doi.org/10.1016/j.ijadhadh.2026.104360.
ieee: 'S. A. Golebiowska, D. Meinderink, C. Ebbert, S. Kollmann, V. Neßlinger, and
G. Grundmeier, “Two-electrode electrochemical impedance spectroscopy at polymer/oxide
interfaces,” International Journal of Adhesion and Adhesives, vol. 149,
Art. no. 104360, 2026, doi: 10.1016/j.ijadhadh.2026.104360.'
mla: Golebiowska, Sandra Alicja, et al. “Two-Electrode Electrochemical Impedance
Spectroscopy at Polymer/Oxide Interfaces.” International Journal of Adhesion
and Adhesives, vol. 149, 104360, Elsevier BV, 2026, doi:10.1016/j.ijadhadh.2026.104360.
short: S.A. Golebiowska, D. Meinderink, C. Ebbert, S. Kollmann, V. Neßlinger, G.
Grundmeier, International Journal of Adhesion and Adhesives 149 (2026).
date_created: 2026-05-05T06:04:19Z
date_updated: 2026-05-05T06:05:56Z
department:
- _id: '35'
- _id: '302'
- _id: '321'
doi: 10.1016/j.ijadhadh.2026.104360
intvolume: ' 149'
language:
- iso: eng
publication: International Journal of Adhesion and Adhesives
publication_identifier:
issn:
- 0143-7496
publication_status: published
publisher: Elsevier BV
status: public
title: Two-electrode electrochemical impedance spectroscopy at polymer/oxide interfaces
type: journal_article
user_id: '7266'
volume: 149
year: '2026'
...
---
_id: '66040'
abstract:
- lang: eng
text: 'Magnetron-sputtered CNx thin films are primarily employed as hard,
low-friction protective and tribological coatings, as solar cells, and for catalytic
applications. Lower growth rates and a reduced N content, favoring graphitic sp2
structures, hinder industrial scalability due to prolonged deposition times and
produce softer, less dense films with inferior hardness, elasticity, and wear
resistance. Carbon nitride films deposited by magnetron sputtering exhibit growth
behavior strongly influenced by plasma–surface interactions. However, nitrogen
resputtering and reduced film growth rates are commonly attributed to chemical
etching by positive ions. We propose an additional, unreported power-dependent
mechanism involving negative ions formed at the carbon target. These ions are
accelerated through the plasma sheath, reaching the substrate with high kinetic
energy and inducing both chemical and physical resputtering. This effect is localized
to the geometrical projection of the target, as shown by spatially resolved analysis:
ellipsometry reveals thickness reduction, and x-ray photoelectron spectroscopy
and Raman spectroscopy indicate nitrogen depletion within this region. Correlation
between stoichiometry and structural signatures confirms the decisive role of
negative ions in modifying the film composition and microstructure. At the same
time, the composition of the gas mixture exerts only a minor effect.'
article_number: '243301'
author:
- first_name: Christian
full_name: Wieschhoff, Christian
last_name: Wieschhoff
- first_name: Chantal
full_name: Theile-Rasche, Chantal
last_name: Theile-Rasche
- first_name: Fuzeng
full_name: Wang, Fuzeng
last_name: Wang
- first_name: Michael
full_name: Prib, Michael
last_name: Prib
- first_name: Viktoria Daniela Dorothea
full_name: Moldt, Viktoria Daniela Dorothea
last_name: Moldt
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Nieves López
full_name: Salas, Nieves López
last_name: Salas
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
citation:
ama: Wieschhoff C, Theile-Rasche C, Wang F, et al. Influence of negative ions on
the stoichiometry and structure of carbon nitride films deposited by reactive
magnetron sputtering. Journal of Applied Physics. 2026;139(24). doi:10.1063/5.0335780
apa: Wieschhoff, C., Theile-Rasche, C., Wang, F., Prib, M., Moldt, V. D. D., Grundmeier,
G., Salas, N. L., & de los Arcos de Pedro, M. T. (2026). Influence of negative
ions on the stoichiometry and structure of carbon nitride films deposited by reactive
magnetron sputtering. Journal of Applied Physics, 139(24), Article
243301. https://doi.org/10.1063/5.0335780
bibtex: '@article{Wieschhoff_Theile-Rasche_Wang_Prib_Moldt_Grundmeier_Salas_de los
Arcos de Pedro_2026, title={Influence of negative ions on the stoichiometry and
structure of carbon nitride films deposited by reactive magnetron sputtering},
volume={139}, DOI={10.1063/5.0335780},
number={24243301}, journal={Journal of Applied Physics}, publisher={AIP Publishing},
author={Wieschhoff, Christian and Theile-Rasche, Chantal and Wang, Fuzeng and
Prib, Michael and Moldt, Viktoria Daniela Dorothea and Grundmeier, Guido and Salas,
Nieves López and de los Arcos de Pedro, Maria Teresa}, year={2026} }'
chicago: Wieschhoff, Christian, Chantal Theile-Rasche, Fuzeng Wang, Michael Prib,
Viktoria Daniela Dorothea Moldt, Guido Grundmeier, Nieves López Salas, and Maria
Teresa de los Arcos de Pedro. “Influence of Negative Ions on the Stoichiometry
and Structure of Carbon Nitride Films Deposited by Reactive Magnetron Sputtering.”
Journal of Applied Physics 139, no. 24 (2026). https://doi.org/10.1063/5.0335780.
ieee: 'C. Wieschhoff et al., “Influence of negative ions on the stoichiometry
and structure of carbon nitride films deposited by reactive magnetron sputtering,”
Journal of Applied Physics, vol. 139, no. 24, Art. no. 243301, 2026, doi:
10.1063/5.0335780.'
mla: Wieschhoff, Christian, et al. “Influence of Negative Ions on the Stoichiometry
and Structure of Carbon Nitride Films Deposited by Reactive Magnetron Sputtering.”
Journal of Applied Physics, vol. 139, no. 24, 243301, AIP Publishing, 2026,
doi:10.1063/5.0335780.
short: C. Wieschhoff, C. Theile-Rasche, F. Wang, M. Prib, V.D.D. Moldt, G. Grundmeier,
N.L. Salas, M.T. de los Arcos de Pedro, Journal of Applied Physics 139 (2026).
date_created: 2026-06-25T12:15:04Z
date_updated: 2026-06-25T12:18:17Z
department:
- _id: '302'
doi: 10.1063/5.0335780
intvolume: ' 139'
issue: '24'
language:
- iso: eng
publication: Journal of Applied Physics
publication_identifier:
issn:
- 0021-8979
- 1089-7550
publication_status: published
publisher: AIP Publishing
status: public
title: Influence of negative ions on the stoichiometry and structure of carbon nitride
films deposited by reactive magnetron sputtering
type: journal_article
user_id: '54556'
volume: 139
year: '2026'
...
---
_id: '66041'
article_number: acssensors.6c01100
author:
- first_name: Sven
full_name: Voth, Sven
last_name: Voth
- first_name: Zhenyu
full_name: Zhao, Zhenyu
last_name: Zhao
- first_name: Dominik
full_name: Baier, Dominik
last_name: Baier
- first_name: Alexandra
full_name: Glass, Alexandra
last_name: Glass
- first_name: Hossam
full_name: Elgabarty, Hossam
last_name: Elgabarty
- first_name: Oskar J.
full_name: Sandberg, Oskar J.
last_name: Sandberg
- first_name: Guido
full_name: Grundmeier, Guido
last_name: Grundmeier
- first_name: Michael
full_name: Tiemann, Michael
last_name: Tiemann
- first_name: Jan-Henrik
full_name: Smått, Jan-Henrik
last_name: Smått
- first_name: Nicklas
full_name: Anttu, Nicklas
last_name: Anttu
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Christian
full_name: Weinberger, Christian
last_name: Weinberger
citation:
ama: 'Voth S, Zhao Z, Baier D, et al. Role of Irradiance in Light-Activated In
2 O 3
Gas Sensors: Why More Light Is Not Always Better. ACS Sensors.
Published online 2026. doi:10.1021/acssensors.6c01100'
apa: 'Voth, S., Zhao, Z., Baier, D., Glass, A., Elgabarty, H., Sandberg, O. J.,
Grundmeier, G., Tiemann, M., Smått, J.-H., Anttu, N., de los Arcos de Pedro, M.
T., & Weinberger, C. (2026). Role of Irradiance in Light-Activated In
2 O 3
Gas Sensors: Why More Light Is Not Always Better. ACS Sensors,
Article acssensors.6c01100. https://doi.org/10.1021/acssensors.6c01100'
bibtex: '@article{Voth_Zhao_Baier_Glass_Elgabarty_Sandberg_Grundmeier_Tiemann_Smått_Anttu_et
al._2026, title={Role of Irradiance in Light-Activated In 2
O 3 Gas Sensors:
Why More Light Is Not Always Better}, DOI={10.1021/acssensors.6c01100},
number={acssensors.6c01100}, journal={ACS Sensors}, publisher={American Chemical
Society (ACS)}, author={Voth, Sven and Zhao, Zhenyu and Baier, Dominik and Glass,
Alexandra and Elgabarty, Hossam and Sandberg, Oskar J. and Grundmeier, Guido and
Tiemann, Michael and Smått, Jan-Henrik and Anttu, Nicklas and et al.}, year={2026}
}'
chicago: 'Voth, Sven, Zhenyu Zhao, Dominik Baier, Alexandra Glass, Hossam Elgabarty,
Oskar J. Sandberg, Guido Grundmeier, et al. “Role of Irradiance in Light-Activated
In 2 O 3
Gas Sensors: Why More Light Is Not Always Better.” ACS Sensors,
2026. https://doi.org/10.1021/acssensors.6c01100.'
ieee: 'S. Voth et al., “Role of Irradiance in Light-Activated In
2 O 3
Gas Sensors: Why More Light Is Not Always Better,” ACS Sensors,
Art. no. acssensors.6c01100, 2026, doi: 10.1021/acssensors.6c01100.'
mla: 'Voth, Sven, et al. “Role of Irradiance in Light-Activated In
2 O 3
Gas Sensors: Why More Light Is Not Always Better.” ACS Sensors,
acssensors.6c01100, American Chemical Society (ACS), 2026, doi:10.1021/acssensors.6c01100.'
short: S. Voth, Z. Zhao, D. Baier, A. Glass, H. Elgabarty, O.J. Sandberg, G. Grundmeier,
M. Tiemann, J.-H. Smått, N. Anttu, M.T. de los Arcos de Pedro, C. Weinberger,
ACS Sensors (2026).
date_created: 2026-06-25T12:16:32Z
date_updated: 2026-06-25T12:18:13Z
department:
- _id: '302'
doi: 10.1021/acssensors.6c01100
language:
- iso: eng
publication: ACS Sensors
publication_identifier:
issn:
- 2379-3694
- 2379-3694
publication_status: published
publisher: American Chemical Society (ACS)
status: public
title: 'Role of Irradiance in Light-Activated In 2 O 3 Gas
Sensors: Why More Light Is Not Always Better'
type: journal_article
user_id: '54556'
year: '2026'
...
---
_id: '66042'
article_number: '166755'
author:
- first_name: Syeda
full_name: Qudsia, Syeda
last_name: Qudsia
- first_name: Alexander
full_name: Weiss, Alexander
last_name: Weiss
- first_name: Saara
full_name: Sirkiä, Saara
last_name: Sirkiä
- first_name: Fuzeng
full_name: Wang, Fuzeng
last_name: Wang
- first_name: Emil
full_name: Rosqvist, Emil
last_name: Rosqvist
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Christian
full_name: Weinberger, Christian
last_name: Weinberger
- first_name: Janne
full_name: Halme, Janne
last_name: Halme
- first_name: Marianna
full_name: Kemell, Marianna
last_name: Kemell
- first_name: Jan-Henrik
full_name: Smått, Jan-Henrik
last_name: Smått
citation:
ama: Qudsia S, Weiss A, Sirkiä S, et al. Influence of deposition temperature and
thickness of ALD-TiO2 on planar perovskite solar cell performance. Applied
Surface Science. 2026;736. doi:10.1016/j.apsusc.2026.166755
apa: Qudsia, S., Weiss, A., Sirkiä, S., Wang, F., Rosqvist, E., de los Arcos de
Pedro, M. T., Weinberger, C., Halme, J., Kemell, M., & Smått, J.-H. (2026).
Influence of deposition temperature and thickness of ALD-TiO2 on planar perovskite
solar cell performance. Applied Surface Science, 736, Article 166755.
https://doi.org/10.1016/j.apsusc.2026.166755
bibtex: '@article{Qudsia_Weiss_Sirkiä_Wang_Rosqvist_de los Arcos de Pedro_Weinberger_Halme_Kemell_Smått_2026,
title={Influence of deposition temperature and thickness of ALD-TiO2 on planar
perovskite solar cell performance}, volume={736}, DOI={10.1016/j.apsusc.2026.166755},
number={166755}, journal={Applied Surface Science}, publisher={Elsevier BV}, author={Qudsia,
Syeda and Weiss, Alexander and Sirkiä, Saara and Wang, Fuzeng and Rosqvist, Emil
and de los Arcos de Pedro, Maria Teresa and Weinberger, Christian and Halme, Janne
and Kemell, Marianna and Smått, Jan-Henrik}, year={2026} }'
chicago: Qudsia, Syeda, Alexander Weiss, Saara Sirkiä, Fuzeng Wang, Emil Rosqvist,
Maria Teresa de los Arcos de Pedro, Christian Weinberger, Janne Halme, Marianna
Kemell, and Jan-Henrik Smått. “Influence of Deposition Temperature and Thickness
of ALD-TiO2 on Planar Perovskite Solar Cell Performance.” Applied Surface Science
736 (2026). https://doi.org/10.1016/j.apsusc.2026.166755.
ieee: 'S. Qudsia et al., “Influence of deposition temperature and thickness
of ALD-TiO2 on planar perovskite solar cell performance,” Applied Surface Science,
vol. 736, Art. no. 166755, 2026, doi: 10.1016/j.apsusc.2026.166755.'
mla: Qudsia, Syeda, et al. “Influence of Deposition Temperature and Thickness of
ALD-TiO2 on Planar Perovskite Solar Cell Performance.” Applied Surface Science,
vol. 736, 166755, Elsevier BV, 2026, doi:10.1016/j.apsusc.2026.166755.
short: S. Qudsia, A. Weiss, S. Sirkiä, F. Wang, E. Rosqvist, M.T. de los Arcos de
Pedro, C. Weinberger, J. Halme, M. Kemell, J.-H. Smått, Applied Surface Science
736 (2026).
date_created: 2026-06-25T12:17:25Z
date_updated: 2026-06-25T12:18:05Z
department:
- _id: '302'
doi: 10.1016/j.apsusc.2026.166755
intvolume: ' 736'
language:
- iso: eng
publication: Applied Surface Science
publication_identifier:
issn:
- 0169-4332
publication_status: published
publisher: Elsevier BV
status: public
title: Influence of deposition temperature and thickness of ALD-TiO2 on planar perovskite
solar cell performance
type: journal_article
user_id: '54556'
volume: 736
year: '2026'
...
---
_id: '66092'
abstract:
- lang: eng
text: "\r\n DNA origami nanostructures (DONs) have promising
applications in biomedicine and biosensing, which often require their efficient
binding to target cells. By immobilizing the glycopeptide antibiotic vancomycin
on DONs, DON binding to Gram‐positive and Gram‐negative bacteria can be facilitated.
Here, we investigate how this multivalent binding is affected by the number and
arrangement of the vancomycin modifications on two‐dimensional DONs. We find that
for both Gram‐positive\r\n Bacillus subtilis\r\n
\ and Gram‐negative\r\n Escherichia
coli\r\n , binding increases with the number
of vancomycin modifications per DON. In general, binding to\r\n E.
coli\r\n is stronger than to\r\n B.
subtilis\r\n , which may be attributed to differences
in the architectures of the cell envelopes. Interestingly, for both bacteria,
the total number of vancomycin modifications appears to be more important than
their arrangement, as DONs with 18 vancomycin molecules on one side show similar
binding as DONs with 18 vancomycin molecules distributed over both sides. This
enables the attachment of multiple probe molecules to the vancomycin‐free side
of the DONs for enhancing detection efficiency without compromising binding affinity.
These results may thus provide guidelines for the design and synthesis of vancomycin‐modified
DONs for antimicrobial drug delivery and pathogen detection.\r\n "
article_number: e70436
author:
- first_name: Özge
full_name: Coşkuner Leineweber, Özge
last_name: Coşkuner Leineweber
- first_name: Ulrike
full_name: Hofmann, Ulrike
last_name: Hofmann
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Yixin
full_name: Zhang, Yixin
last_name: Zhang
- first_name: Adrian Clemens
full_name: Keller, Adrian Clemens
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
citation:
ama: Coşkuner Leineweber Ö, Hofmann U, Grundmeier G, Zhang Y, Keller AC. Vancomycin‐Mediated
Binding of DNA Origami Nanostructures to Gram‐Positive and Gram‐Negative Bacteria.
ChemBioChem. 2026;27(13). doi:10.1002/cbic.70436
apa: Coşkuner Leineweber, Ö., Hofmann, U., Grundmeier, G., Zhang, Y., & Keller,
A. C. (2026). Vancomycin‐Mediated Binding of DNA Origami Nanostructures to Gram‐Positive
and Gram‐Negative Bacteria. ChemBioChem, 27(13), Article e70436.
https://doi.org/10.1002/cbic.70436
bibtex: '@article{Coşkuner Leineweber_Hofmann_Grundmeier_Zhang_Keller_2026, title={Vancomycin‐Mediated
Binding of DNA Origami Nanostructures to Gram‐Positive and Gram‐Negative Bacteria},
volume={27}, DOI={10.1002/cbic.70436},
number={13e70436}, journal={ChemBioChem}, publisher={Wiley}, author={Coşkuner
Leineweber, Özge and Hofmann, Ulrike and Grundmeier, Guido and Zhang, Yixin and
Keller, Adrian Clemens}, year={2026} }'
chicago: Coşkuner Leineweber, Özge, Ulrike Hofmann, Guido Grundmeier, Yixin Zhang,
and Adrian Clemens Keller. “Vancomycin‐Mediated Binding of DNA Origami Nanostructures
to Gram‐Positive and Gram‐Negative Bacteria.” ChemBioChem 27, no. 13 (2026).
https://doi.org/10.1002/cbic.70436.
ieee: 'Ö. Coşkuner Leineweber, U. Hofmann, G. Grundmeier, Y. Zhang, and A. C. Keller,
“Vancomycin‐Mediated Binding of DNA Origami Nanostructures to Gram‐Positive and
Gram‐Negative Bacteria,” ChemBioChem, vol. 27, no. 13, Art. no. e70436,
2026, doi: 10.1002/cbic.70436.'
mla: Coşkuner Leineweber, Özge, et al. “Vancomycin‐Mediated Binding of DNA Origami
Nanostructures to Gram‐Positive and Gram‐Negative Bacteria.” ChemBioChem,
vol. 27, no. 13, e70436, Wiley, 2026, doi:10.1002/cbic.70436.
short: Ö. Coşkuner Leineweber, U. Hofmann, G. Grundmeier, Y. Zhang, A.C. Keller,
ChemBioChem 27 (2026).
date_created: 2026-06-30T12:44:05Z
date_updated: 2026-06-30T13:01:42Z
department:
- _id: '302'
doi: 10.1002/cbic.70436
intvolume: ' 27'
issue: '13'
language:
- iso: eng
publication: ChemBioChem
publication_identifier:
issn:
- 1439-4227
- 1439-7633
publication_status: published
publisher: Wiley
status: public
title: Vancomycin‐Mediated Binding of DNA Origami Nanostructures to Gram‐Positive
and Gram‐Negative Bacteria
type: journal_article
user_id: '48864'
volume: 27
year: '2026'
...
---
_id: '59421'
author:
- first_name: Johannes
full_name: Parikka, Johannes
last_name: Parikka
- first_name: Bhanu Kiran
full_name: Pothineni, Bhanu Kiran
last_name: Pothineni
- first_name: Heini
full_name: Järvinen, Heini
last_name: Järvinen
- first_name: Kosti
full_name: Tapio, Kosti
last_name: Tapio
- first_name: Adrian
full_name: Keller, Adrian
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
- first_name: J. Jussi
full_name: Toppari, J. Jussi
last_name: Toppari
citation:
ama: 'Parikka J, Pothineni BK, Järvinen H, Tapio K, Keller A, Toppari JJ. Surface-Assisted
Assembly of DNA Origami Lattices on Silicon Wafers. In: Methods in Molecular
Biology. Springer US; 2025. doi:10.1007/978-1-0716-4394-5_7'
apa: Parikka, J., Pothineni, B. K., Järvinen, H., Tapio, K., Keller, A., & Toppari,
J. J. (2025). Surface-Assisted Assembly of DNA Origami Lattices on Silicon Wafers.
In Methods in Molecular Biology. Springer US. https://doi.org/10.1007/978-1-0716-4394-5_7
bibtex: '@inbook{Parikka_Pothineni_Järvinen_Tapio_Keller_Toppari_2025, place={New
York, NY}, title={Surface-Assisted Assembly of DNA Origami Lattices on Silicon
Wafers}, DOI={10.1007/978-1-0716-4394-5_7},
booktitle={Methods in Molecular Biology}, publisher={Springer US}, author={Parikka,
Johannes and Pothineni, Bhanu Kiran and Järvinen, Heini and Tapio, Kosti and Keller,
Adrian and Toppari, J. Jussi}, year={2025} }'
chicago: 'Parikka, Johannes, Bhanu Kiran Pothineni, Heini Järvinen, Kosti Tapio,
Adrian Keller, and J. Jussi Toppari. “Surface-Assisted Assembly of DNA Origami
Lattices on Silicon Wafers.” In Methods in Molecular Biology. New York,
NY: Springer US, 2025. https://doi.org/10.1007/978-1-0716-4394-5_7.'
ieee: 'J. Parikka, B. K. Pothineni, H. Järvinen, K. Tapio, A. Keller, and J. J.
Toppari, “Surface-Assisted Assembly of DNA Origami Lattices on Silicon Wafers,”
in Methods in Molecular Biology, New York, NY: Springer US, 2025.'
mla: Parikka, Johannes, et al. “Surface-Assisted Assembly of DNA Origami Lattices
on Silicon Wafers.” Methods in Molecular Biology, Springer US, 2025, doi:10.1007/978-1-0716-4394-5_7.
short: 'J. Parikka, B.K. Pothineni, H. Järvinen, K. Tapio, A. Keller, J.J. Toppari,
in: Methods in Molecular Biology, Springer US, New York, NY, 2025.'
date_created: 2025-04-08T09:06:14Z
date_updated: 2025-04-08T09:06:34Z
department:
- _id: '302'
doi: 10.1007/978-1-0716-4394-5_7
language:
- iso: eng
place: New York, NY
publication: Methods in Molecular Biology
publication_identifier:
isbn:
- '9781071643938'
- '9781071643945'
issn:
- 1064-3745
- 1940-6029
publication_status: published
publisher: Springer US
status: public
title: Surface-Assisted Assembly of DNA Origami Lattices on Silicon Wafers
type: book_chapter
user_id: '48864'
year: '2025'
...
---
_id: '59847'
abstract:
- lang: eng
text: "Abstract\r\n The surface-assisted
assembly of DNA origami lattices is a potent method for creating molecular lithography
masks. Lattice quality and assembly kinetics are controlled by various environmental
parameters, including the employed surface, the assembly temperature, and the
ionic composition of the buffer, with optimized parameter combinations resulting
in highly ordered lattices that can span surface areas of several cm2.
Established assembly protocols, however, employ assembly times ranging from hours
to days. Here, the assembly of highly ordered hexagonal DNA origami lattices at
mica surfaces is observed within few minutes using high-speed atomic force microscopy
(HS-AFM). A moderate increase in the DNA origami concentration enables this rapid
assembly. While forming a regular lattice takes 10 min at a DNA origami concentration
of 4 nM, this time is shortened to about 2 min at a concentration of 6 nM. Increasing
the DNA origami concentration any further does not result in shorter assembly
times, presumably because DNA origami arrival at the mica surface is diffusion-limited.
Over short length scales up to 1 µm, lattice order is independent of the DNA origami
concentration. However, at larger length scales of a few microns, a DNA origami
concentration of 10 nM yields slightly better order than lower and higher concentrations.
Therefore, 10 nM can be considered the optimum concentration for the rapid assembly
of highly ordered DNA origami lattices. These results thus represent an important
step toward the industrial-scale application of DNA origami-based lithography
masks."
article_number: '77'
author:
- first_name: Bhanu Kiran
full_name: Pothineni, Bhanu Kiran
last_name: Pothineni
- first_name: Jörg
full_name: Barner, Jörg
last_name: Barner
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: David
full_name: Contreras, David
last_name: Contreras
- first_name: Mario
full_name: Castro, Mario
last_name: Castro
- first_name: Adrian
full_name: Keller, Adrian
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
citation:
ama: Pothineni BK, Barner J, Grundmeier G, Contreras D, Castro M, Keller A. Rapid
assembly of highly ordered DNA origami lattices at mica surfaces. Discover
Nano. 2025;20(1). doi:10.1186/s11671-025-04254-2
apa: Pothineni, B. K., Barner, J., Grundmeier, G., Contreras, D., Castro, M., &
Keller, A. (2025). Rapid assembly of highly ordered DNA origami lattices at mica
surfaces. Discover Nano, 20(1), Article 77. https://doi.org/10.1186/s11671-025-04254-2
bibtex: '@article{Pothineni_Barner_Grundmeier_Contreras_Castro_Keller_2025, title={Rapid
assembly of highly ordered DNA origami lattices at mica surfaces}, volume={20},
DOI={10.1186/s11671-025-04254-2},
number={177}, journal={Discover Nano}, publisher={Springer Science and Business
Media LLC}, author={Pothineni, Bhanu Kiran and Barner, Jörg and Grundmeier, Guido
and Contreras, David and Castro, Mario and Keller, Adrian}, year={2025} }'
chicago: Pothineni, Bhanu Kiran, Jörg Barner, Guido Grundmeier, David Contreras,
Mario Castro, and Adrian Keller. “Rapid Assembly of Highly Ordered DNA Origami
Lattices at Mica Surfaces.” Discover Nano 20, no. 1 (2025). https://doi.org/10.1186/s11671-025-04254-2.
ieee: 'B. K. Pothineni, J. Barner, G. Grundmeier, D. Contreras, M. Castro, and A.
Keller, “Rapid assembly of highly ordered DNA origami lattices at mica surfaces,”
Discover Nano, vol. 20, no. 1, Art. no. 77, 2025, doi: 10.1186/s11671-025-04254-2.'
mla: Pothineni, Bhanu Kiran, et al. “Rapid Assembly of Highly Ordered DNA Origami
Lattices at Mica Surfaces.” Discover Nano, vol. 20, no. 1, 77, Springer
Science and Business Media LLC, 2025, doi:10.1186/s11671-025-04254-2.
short: B.K. Pothineni, J. Barner, G. Grundmeier, D. Contreras, M. Castro, A. Keller,
Discover Nano 20 (2025).
date_created: 2025-05-08T07:17:29Z
date_updated: 2025-05-08T07:17:54Z
department:
- _id: '302'
doi: 10.1186/s11671-025-04254-2
intvolume: ' 20'
issue: '1'
language:
- iso: eng
publication: Discover Nano
publication_identifier:
issn:
- 2731-9229
publication_status: published
publisher: Springer Science and Business Media LLC
status: public
title: Rapid assembly of highly ordered DNA origami lattices at mica surfaces
type: journal_article
user_id: '48864'
volume: 20
year: '2025'
...
---
_id: '59992'
abstract:
- lang: eng
text: The immobilization of DNA origami nanostructures on solid surfaces
is an important prerequisite for their application in many biosensors. So far,
DNA origami immobilization has been investigated in detail only...
author:
- first_name: Xiaodan
full_name: Xu, Xiaodan
last_name: Xu
- first_name: Sandra Alicja
full_name: Golebiowska, Sandra Alicja
id: '69524'
last_name: Golebiowska
- first_name: Teresa
full_name: de los Arcos, Teresa
last_name: de los Arcos
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Adrian
full_name: Keller, Adrian
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
citation:
ama: Xu X, Golebiowska SA, de los Arcos T, Grundmeier G, Keller A. DNA origami adsorption
at single-crystalline TiO2 surfaces. RSC Applied Interfaces. Published
online 2025. doi:10.1039/d5lf00109a
apa: Xu, X., Golebiowska, S. A., de los Arcos, T., Grundmeier, G., & Keller,
A. (2025). DNA origami adsorption at single-crystalline TiO2 surfaces. RSC
Applied Interfaces. https://doi.org/10.1039/d5lf00109a
bibtex: '@article{Xu_Golebiowska_de los Arcos_Grundmeier_Keller_2025, title={DNA
origami adsorption at single-crystalline TiO2 surfaces}, DOI={10.1039/d5lf00109a},
journal={RSC Applied Interfaces}, publisher={Royal Society of Chemistry (RSC)},
author={Xu, Xiaodan and Golebiowska, Sandra Alicja and de los Arcos, Teresa and
Grundmeier, Guido and Keller, Adrian}, year={2025} }'
chicago: Xu, Xiaodan, Sandra Alicja Golebiowska, Teresa de los Arcos, Guido Grundmeier,
and Adrian Keller. “DNA Origami Adsorption at Single-Crystalline TiO2 Surfaces.”
RSC Applied Interfaces, 2025. https://doi.org/10.1039/d5lf00109a.
ieee: 'X. Xu, S. A. Golebiowska, T. de los Arcos, G. Grundmeier, and A. Keller,
“DNA origami adsorption at single-crystalline TiO2 surfaces,” RSC Applied Interfaces,
2025, doi: 10.1039/d5lf00109a.'
mla: Xu, Xiaodan, et al. “DNA Origami Adsorption at Single-Crystalline TiO2 Surfaces.”
RSC Applied Interfaces, Royal Society of Chemistry (RSC), 2025, doi:10.1039/d5lf00109a.
short: X. Xu, S.A. Golebiowska, T. de los Arcos, G. Grundmeier, A. Keller, RSC Applied
Interfaces (2025).
date_created: 2025-05-19T09:30:44Z
date_updated: 2025-05-19T09:32:05Z
department:
- _id: '302'
doi: 10.1039/d5lf00109a
language:
- iso: eng
publication: RSC Applied Interfaces
publication_identifier:
issn:
- 2755-3701
publication_status: published
publisher: Royal Society of Chemistry (RSC)
status: public
title: DNA origami adsorption at single-crystalline TiO2 surfaces
type: journal_article
user_id: '48864'
year: '2025'
...
---
_id: '58613'
abstract:
- lang: eng
text: Self-assembled DNA origami lattices on silicon oxide surfaces have great potential
to serve as masks in molecular lithography. However, silicon oxide surfaces come
in many different forms and the type and history of the silicon oxide has a large
effect on its physicochemical surface properties. Therefore, we here investigate
DNA origami lattice formation on differently fabricated SiOx films on silicon
wafers after wet-chemical oxidation by RCA1. Despite having similar oxide compositions
and hydroxylation states, of all surfaces tested, only thermally grown SiOx performs
similarly well as native oxide. For the other SiOx films deposited by plasma-enhanced
chemical vapor deposition and magnetron sputtering, DNA origami adsorption is
strongly suppressed. This is attributed to an increased surface roughness and
a lower oxide density, respectively. Our results demonstrate that the employed
SiOx surface may decide over the outcome of an experiment and should be considered
as an additional parameter that may require optimization and fine-tuning before
high-quality lattices can be assembled. In particular, our observations suggest
that efficient DNA origami lattice assembly on SiOx surfaces requires a low surface
roughness and a high oxide density.
author:
- first_name: Bhanu Kiran
full_name: Pothineni, Bhanu Kiran
last_name: Pothineni
- first_name: Chantal
full_name: Theile-Rasche, Chantal
last_name: Theile-Rasche
- first_name: Hendrik
full_name: Müller, Hendrik
last_name: Müller
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Adrian
full_name: Keller, Adrian
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
citation:
ama: Pothineni BK, Theile-Rasche C, Müller H, Grundmeier G, de los Arcos de Pedro
MT, Keller A. DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces.
Chemistry – A European Journal. Published online 2025:e202404108. doi:10.1002/chem.202404108
apa: Pothineni, B. K., Theile-Rasche, C., Müller, H., Grundmeier, G., de los Arcos
de Pedro, M. T., & Keller, A. (2025). DNA Origami Adsorption and Lattice Formation
on Different SiOx Surfaces. Chemistry – A European Journal, e202404108.
https://doi.org/10.1002/chem.202404108
bibtex: '@article{Pothineni_Theile-Rasche_Müller_Grundmeier_de los Arcos de Pedro_Keller_2025,
title={DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces},
DOI={10.1002/chem.202404108},
journal={Chemistry – A European Journal}, author={Pothineni, Bhanu Kiran and Theile-Rasche,
Chantal and Müller, Hendrik and Grundmeier, Guido and de los Arcos de Pedro, Maria
Teresa and Keller, Adrian}, year={2025}, pages={e202404108} }'
chicago: Pothineni, Bhanu Kiran, Chantal Theile-Rasche, Hendrik Müller, Guido Grundmeier,
Maria Teresa de los Arcos de Pedro, and Adrian Keller. “DNA Origami Adsorption
and Lattice Formation on Different SiOx Surfaces.” Chemistry – A European Journal,
2025, e202404108. https://doi.org/10.1002/chem.202404108.
ieee: 'B. K. Pothineni, C. Theile-Rasche, H. Müller, G. Grundmeier, M. T. de los
Arcos de Pedro, and A. Keller, “DNA Origami Adsorption and Lattice Formation on
Different SiOx Surfaces,” Chemistry – A European Journal, p. e202404108,
2025, doi: 10.1002/chem.202404108.'
mla: Pothineni, Bhanu Kiran, et al. “DNA Origami Adsorption and Lattice Formation
on Different SiOx Surfaces.” Chemistry – A European Journal, 2025, p. e202404108,
doi:10.1002/chem.202404108.
short: B.K. Pothineni, C. Theile-Rasche, H. Müller, G. Grundmeier, M.T. de los Arcos
de Pedro, A. Keller, Chemistry – A European Journal (2025) e202404108.
date_created: 2025-02-12T14:49:48Z
date_updated: 2025-06-10T09:10:16Z
department:
- _id: '302'
doi: 10.1002/chem.202404108
language:
- iso: eng
page: e202404108
publication: Chemistry – A European Journal
status: public
title: DNA Origami Adsorption and Lattice Formation on Different SiOx Surfaces
type: journal_article
user_id: '48864'
year: '2025'
...
---
_id: '60082'
author:
- first_name: Adrian
full_name: Keller, Adrian
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
citation:
ama: Keller A. DNA origami nanostructures in biomedicine and the issue of stability.
Nucleic Acid Insights. 2025;2(2):61–75. doi:10.18609/nuc.2025.011
apa: Keller, A. (2025). DNA origami nanostructures in biomedicine and the issue
of stability. Nucleic Acid Insights, 2(2), 61–75. https://doi.org/10.18609/nuc.2025.011
bibtex: '@article{Keller_2025, title={DNA origami nanostructures in biomedicine
and the issue of stability}, volume={2}, DOI={10.18609/nuc.2025.011},
number={2}, journal={Nucleic Acid Insights}, author={Keller, Adrian}, year={2025},
pages={61–75} }'
chicago: 'Keller, Adrian. “DNA Origami Nanostructures in Biomedicine and the Issue
of Stability.” Nucleic Acid Insights 2, no. 2 (2025): 61–75. https://doi.org/10.18609/nuc.2025.011.'
ieee: 'A. Keller, “DNA origami nanostructures in biomedicine and the issue of stability,”
Nucleic Acid Insights, vol. 2, no. 2, pp. 61–75, 2025, doi: 10.18609/nuc.2025.011.'
mla: Keller, Adrian. “DNA Origami Nanostructures in Biomedicine and the Issue of
Stability.” Nucleic Acid Insights, vol. 2, no. 2, 2025, pp. 61–75, doi:10.18609/nuc.2025.011.
short: A. Keller, Nucleic Acid Insights 2 (2025) 61–75.
date_created: 2025-06-01T08:53:58Z
date_updated: 2025-06-10T09:09:28Z
ddc:
- '570'
department:
- _id: '302'
doi: 10.18609/nuc.2025.011
file:
- access_level: open_access
content_type: application/pdf
creator: adke
date_created: 2025-06-01T08:53:35Z
date_updated: 2025-06-01T08:53:35Z
file_id: '60083'
file_name: Keller_nai25.pdf
file_size: 701125
relation: main_file
file_date_updated: 2025-06-01T08:53:35Z
has_accepted_license: '1'
intvolume: ' 2'
issue: '2'
language:
- iso: eng
oa: '1'
page: 61–75
publication: Nucleic Acid Insights
status: public
title: DNA origami nanostructures in biomedicine and the issue of stability
type: journal_article
user_id: '48864'
volume: 2
year: '2025'
...
---
_id: '61821'
abstract:
- lang: eng
text: AbstractControlling the surface orientation
of DNA origami nanostructures (DON) is crucial for applications in nanotechnology
and materials science. While previous work utilized various DON modifications,
simple methods for controlling their landing orientation remain scarce. Here,
we demonstrate a straightforward approach to control the adsorption orientation
of chiral double‐L (CDL) DON on mica by tuning magnesium ion (Mg2⁺)
concentration and exploiting global shape distortions. Using atomic force microscopy
(AFM), we analyzed the resulting distribution of the mirror‐image orientations,
referred to as S and Z orientations, at both buffer/mica and air/mica interfaces
and identified conditions resulting in homogenous CDL orientation of 100% S. These
results demonstrate how DON conformation and ionic environments influence DON
orientation, offering insights for precise nanostructure deposition.
article_number: e202507613
author:
- first_name: Gangamallaiah
full_name: Velpula, Gangamallaiah
last_name: Velpula
- first_name: Emilia
full_name: Tomm, Emilia
last_name: Tomm
- first_name: Boxuan
full_name: Shen, Boxuan
last_name: Shen
- first_name: Kunal S.
full_name: Mali, Kunal S.
last_name: Mali
- first_name: Adrian Clemens
full_name: Keller, Adrian Clemens
id: '48864'
last_name: Keller
orcid: 0000-0001-7139-3110
- first_name: Steven
full_name: De Feyter, Steven
last_name: De Feyter
citation:
ama: Velpula G, Tomm E, Shen B, Mali KS, Keller AC, De Feyter S. Breaking of the
Up‐Down Symmetry of DNA Origami on a Solid Substrate. Angewandte Chemie International
Edition. Published online 2025. doi:10.1002/anie.202507613
apa: Velpula, G., Tomm, E., Shen, B., Mali, K. S., Keller, A. C., & De Feyter,
S. (2025). Breaking of the Up‐Down Symmetry of DNA Origami on a Solid Substrate.
Angewandte Chemie International Edition, Article e202507613. https://doi.org/10.1002/anie.202507613
bibtex: '@article{Velpula_Tomm_Shen_Mali_Keller_De Feyter_2025, title={Breaking
of the Up‐Down Symmetry of DNA Origami on a Solid Substrate}, DOI={10.1002/anie.202507613},
number={e202507613}, journal={Angewandte Chemie International Edition}, publisher={Wiley},
author={Velpula, Gangamallaiah and Tomm, Emilia and Shen, Boxuan and Mali, Kunal
S. and Keller, Adrian Clemens and De Feyter, Steven}, year={2025} }'
chicago: Velpula, Gangamallaiah, Emilia Tomm, Boxuan Shen, Kunal S. Mali, Adrian
Clemens Keller, and Steven De Feyter. “Breaking of the Up‐Down Symmetry of DNA
Origami on a Solid Substrate.” Angewandte Chemie International Edition,
2025. https://doi.org/10.1002/anie.202507613.
ieee: 'G. Velpula, E. Tomm, B. Shen, K. S. Mali, A. C. Keller, and S. De Feyter,
“Breaking of the Up‐Down Symmetry of DNA Origami on a Solid Substrate,” Angewandte
Chemie International Edition, Art. no. e202507613, 2025, doi: 10.1002/anie.202507613.'
mla: Velpula, Gangamallaiah, et al. “Breaking of the Up‐Down Symmetry of DNA Origami
on a Solid Substrate.” Angewandte Chemie International Edition, e202507613,
Wiley, 2025, doi:10.1002/anie.202507613.
short: G. Velpula, E. Tomm, B. Shen, K.S. Mali, A.C. Keller, S. De Feyter, Angewandte
Chemie International Edition (2025).
date_created: 2025-10-13T13:53:22Z
date_updated: 2025-10-13T13:55:05Z
department:
- _id: '302'
doi: 10.1002/anie.202507613
language:
- iso: eng
publication: Angewandte Chemie International Edition
publication_identifier:
issn:
- 1433-7851
- 1521-3773
publication_status: published
publisher: Wiley
status: public
title: Breaking of the Up‐Down Symmetry of DNA Origami on a Solid Substrate
type: journal_article
user_id: '48864'
year: '2025'
...
---
_id: '62876'
abstract:
- lang: eng
text: "ABSTRACT\r\n Spin‐coated
polylactide (PLA) thin films were exposed to nitrogen plasma for varying time
intervals. The progressive etching of the PLA film in direct contact with the
nitrogen plasma was monitored in situ using polarization modulated infrared reflection
absorption spectroscopy (PM‐IRRAS). No appreciative changes in composition were
seen with PM‐IRRAS, indicating that the etching did not significantly affect the
bulk composition. Atomic force microscopy characterization of the plasma‐etched
films showed that the PLA films are homogeneously etched. Subsequent ex situ XPS
analysis of the treated surface revealed the presence of C‐N bonds in the surface‐near
region that could be associated with amino and/or amide surface species. PLA films
were also alternatively exposed to nitrogen ion beams produced by an electron‐cyclotron‐resonance
(ECR) plasma source and were investigated in vacuo by XPS. This treatment revealed
the partial substitution of surface oxygen species by nitrogen, resulting in a
similar surface modification as in the plasma case. The comparison of XPS data
and water contact angle studies suggest that the activated surfaces show a reorientation
of macromolecular fragments in the surface‐near region depending on the polarity
of the phase with which they are in contact. Under ultra‐high vacuum (UHV) conditions,
the surface tends to lower its surface energy, while in contact with the aqueous
phase, subsurface polar groups orientate outwards, which enables the formation
of hydrogen bonds."
author:
- first_name: Sandra
full_name: Gołębiowska, Sandra
last_name: Gołębiowska
- first_name: Markus
full_name: Voigt, Markus
last_name: Voigt
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Gołębiowska S, Voigt M, de los Arcos de Pedro MT, Grundmeier G. In Situ PM‐IRRAS
and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide Thin Films.
Surface and Interface Analysis. 2025;57(7):499-509. doi:10.1002/sia.7406
apa: Gołębiowska, S., Voigt, M., de los Arcos de Pedro, M. T., & Grundmeier,
G. (2025). In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification
of Polylactide Thin Films. Surface and Interface Analysis, 57(7),
499–509. https://doi.org/10.1002/sia.7406
bibtex: '@article{Gołębiowska_Voigt_de los Arcos de Pedro_Grundmeier_2025, title={In
Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of Polylactide
Thin Films}, volume={57}, DOI={10.1002/sia.7406},
number={7}, journal={Surface and Interface Analysis}, publisher={Wiley}, author={Gołębiowska,
Sandra and Voigt, Markus and de los Arcos de Pedro, Maria Teresa and Grundmeier,
Guido}, year={2025}, pages={499–509} }'
chicago: 'Gołębiowska, Sandra, Markus Voigt, Maria Teresa de los Arcos de Pedro,
and Guido Grundmeier. “In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface
Modification of Polylactide Thin Films.” Surface and Interface Analysis
57, no. 7 (2025): 499–509. https://doi.org/10.1002/sia.7406.'
ieee: 'S. Gołębiowska, M. Voigt, M. T. de los Arcos de Pedro, and G. Grundmeier,
“In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of
Polylactide Thin Films,” Surface and Interface Analysis, vol. 57, no. 7,
pp. 499–509, 2025, doi: 10.1002/sia.7406.'
mla: Gołębiowska, Sandra, et al. “In Situ PM‐IRRAS and XPS Analysis of Nitrogen
Plasma Surface Modification of Polylactide Thin Films.” Surface and Interface
Analysis, vol. 57, no. 7, Wiley, 2025, pp. 499–509, doi:10.1002/sia.7406.
short: S. Gołębiowska, M. Voigt, M.T. de los Arcos de Pedro, G. Grundmeier, Surface
and Interface Analysis 57 (2025) 499–509.
date_created: 2025-12-04T13:12:03Z
date_updated: 2025-12-04T13:13:00Z
department:
- _id: '302'
doi: 10.1002/sia.7406
intvolume: ' 57'
issue: '7'
language:
- iso: eng
page: 499-509
publication: Surface and Interface Analysis
publication_identifier:
issn:
- 0142-2421
- 1096-9918
publication_status: published
publisher: Wiley
status: public
title: In Situ PM‐IRRAS and XPS Analysis of Nitrogen Plasma Surface Modification of
Polylactide Thin Films
type: journal_article
user_id: '54556'
volume: 57
year: '2025'
...
---
_id: '62875'
article_number: '140676'
author:
- first_name: Chantal
full_name: Theile-Rasche, Chantal
last_name: Theile-Rasche
- first_name: Fuzeng
full_name: Wang, Fuzeng
last_name: Wang
- first_name: Tim
full_name: Prüßner, Tim
last_name: Prüßner
- first_name: Marten
full_name: Huck, Marten
last_name: Huck
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
last_name: Steinrück
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Theile-Rasche C, Wang F, Prüßner T, et al. Evaluation of anti-adhesive and
corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications
in polymer processing. Thin Solid Films. 2025;820. doi:10.1016/j.tsf.2025.140676
apa: Theile-Rasche, C., Wang, F., Prüßner, T., Huck, M., Steinrück, H.-G., de los
Arcos de Pedro, M. T., & Grundmeier, G. (2025). Evaluation of anti-adhesive
and corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications
in polymer processing. Thin Solid Films, 820, Article 140676. https://doi.org/10.1016/j.tsf.2025.140676
bibtex: '@article{Theile-Rasche_Wang_Prüßner_Huck_Steinrück_de los Arcos de Pedro_Grundmeier_2025,
title={Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered
films for applications in polymer processing}, volume={820}, DOI={10.1016/j.tsf.2025.140676},
number={140676}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Theile-Rasche,
Chantal and Wang, Fuzeng and Prüßner, Tim and Huck, Marten and Steinrück, Hans-Georg
and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2025} }'
chicago: Theile-Rasche, Chantal, Fuzeng Wang, Tim Prüßner, Marten Huck, Hans-Georg
Steinrück, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Evaluation
of Anti-Adhesive and Corrosion Protection Properties of TiAlSiN-Magnetron-Sputtered
Films for Applications in Polymer Processing.” Thin Solid Films 820 (2025).
https://doi.org/10.1016/j.tsf.2025.140676.
ieee: 'C. Theile-Rasche et al., “Evaluation of anti-adhesive and corrosion
protection properties of TiAlSiN-magnetron-sputtered films for applications in
polymer processing,” Thin Solid Films, vol. 820, Art. no. 140676, 2025,
doi: 10.1016/j.tsf.2025.140676.'
mla: Theile-Rasche, Chantal, et al. “Evaluation of Anti-Adhesive and Corrosion Protection
Properties of TiAlSiN-Magnetron-Sputtered Films for Applications in Polymer Processing.”
Thin Solid Films, vol. 820, 140676, Elsevier BV, 2025, doi:10.1016/j.tsf.2025.140676.
short: C. Theile-Rasche, F. Wang, T. Prüßner, M. Huck, H.-G. Steinrück, M.T. de
los Arcos de Pedro, G. Grundmeier, Thin Solid Films 820 (2025).
date_created: 2025-12-04T13:11:23Z
date_updated: 2025-12-04T13:12:56Z
department:
- _id: '302'
doi: 10.1016/j.tsf.2025.140676
intvolume: ' 820'
language:
- iso: eng
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
publisher: Elsevier BV
status: public
title: Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered
films for applications in polymer processing
type: journal_article
user_id: '54556'
volume: 820
year: '2025'
...