---
_id: '22588'
article_number: '475204'
author:
- first_name: D
full_name: Marinov, D
last_name: Marinov
- first_name: O
full_name: Guaitella, O
last_name: Guaitella
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: A
full_name: von Keudell, A
last_name: von Keudell
- first_name: A
full_name: Rousseau, A
last_name: Rousseau
citation:
ama: 'Marinov D, Guaitella O, de los Arcos de Pedro MT, von Keudell A, Rousseau
A. Adsorption and reactivity of nitrogen atoms on silica surface under plasma
exposure. Journal of Physics D: Applied Physics. Published online 2014.
doi:10.1088/0022-3727/47/47/475204'
apa: 'Marinov, D., Guaitella, O., de los Arcos de Pedro, M. T., von Keudell, A.,
& Rousseau, A. (2014). Adsorption and reactivity of nitrogen atoms on silica
surface under plasma exposure. Journal of Physics D: Applied Physics, Article
475204. https://doi.org/10.1088/0022-3727/47/47/475204'
bibtex: '@article{Marinov_Guaitella_de los Arcos de Pedro_von Keudell_Rousseau_2014,
title={Adsorption and reactivity of nitrogen atoms on silica surface under plasma
exposure}, DOI={10.1088/0022-3727/47/47/475204},
number={475204}, journal={Journal of Physics D: Applied Physics}, author={Marinov,
D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A
and Rousseau, A}, year={2014} }'
chicago: 'Marinov, D, O Guaitella, Maria Teresa de los Arcos de Pedro, A von Keudell,
and A Rousseau. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface
under Plasma Exposure.” Journal of Physics D: Applied Physics, 2014. https://doi.org/10.1088/0022-3727/47/47/475204.'
ieee: 'D. Marinov, O. Guaitella, M. T. de los Arcos de Pedro, A. von Keudell, and
A. Rousseau, “Adsorption and reactivity of nitrogen atoms on silica surface under
plasma exposure,” Journal of Physics D: Applied Physics, Art. no. 475204,
2014, doi: 10.1088/0022-3727/47/47/475204.'
mla: 'Marinov, D., et al. “Adsorption and Reactivity of Nitrogen Atoms on Silica
Surface under Plasma Exposure.” Journal of Physics D: Applied Physics,
475204, 2014, doi:10.1088/0022-3727/47/47/475204.'
short: 'D. Marinov, O. Guaitella, M.T. de los Arcos de Pedro, A. von Keudell, A.
Rousseau, Journal of Physics D: Applied Physics (2014).'
date_created: 2021-07-07T11:11:00Z
date_updated: 2023-01-24T08:21:18Z
department:
- _id: '302'
doi: 10.1088/0022-3727/47/47/475204
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
issn:
- 0022-3727
- 1361-6463
publication_status: published
status: public
title: Adsorption and reactivity of nitrogen atoms on silica surface under plasma
exposure
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22590'
author:
- first_name: Ke
full_name: Xu, Ke
last_name: Xu
- first_name: Van-Son
full_name: Dang, Van-Son
last_name: Dang
- first_name: Andreas
full_name: Ney, Andreas
last_name: Ney
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: Xu K, Dang V-S, Ney A, de los Arcos de Pedro MT, Devi A. Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB>
Thin Films Grown by Metalorganic Chemical Vapour Deposition. Journal of Nanoscience
and Nanotechnology. Published online 2014:5095-5102. doi:10.1166/jnn.2014.8848
apa: Xu, K., Dang, V.-S., Ney, A., de los Arcos de Pedro, M. T., & Devi, A.
(2014). Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB>
Thin Films Grown by Metalorganic Chemical Vapour Deposition. Journal of Nanoscience
and Nanotechnology, 5095–5102. https://doi.org/10.1166/jnn.2014.8848
bibtex: '@article{Xu_Dang_Ney_de los Arcos de Pedro_Devi_2014, title={Nanostructured
Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by
Metalorganic Chemical Vapour Deposition}, DOI={10.1166/jnn.2014.8848},
journal={Journal of Nanoscience and Nanotechnology}, author={Xu, Ke and Dang,
Van-Son and Ney, Andreas and de los Arcos de Pedro, Maria Teresa and Devi, Anjana},
year={2014}, pages={5095–5102} }'
chicago: Xu, Ke, Van-Son Dang, Andreas Ney, Maria Teresa de los Arcos de Pedro,
and Anjana Devi. “Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB>
Thin Films Grown by Metalorganic Chemical Vapour Deposition.” Journal of Nanoscience
and Nanotechnology, 2014, 5095–5102. https://doi.org/10.1166/jnn.2014.8848.
ieee: 'K. Xu, V.-S. Dang, A. Ney, M. T. de los Arcos de Pedro, and A. Devi, “Nanostructured
Er<SUB>2</SUB>O<SUB>3</SUB> Thin Films Grown by
Metalorganic Chemical Vapour Deposition,” Journal of Nanoscience and Nanotechnology,
pp. 5095–5102, 2014, doi: 10.1166/jnn.2014.8848.'
mla: Xu, Ke, et al. “Nanostructured Er<SUB>2</SUB>O<SUB>3</SUB>
Thin Films Grown by Metalorganic Chemical Vapour Deposition.” Journal of Nanoscience
and Nanotechnology, 2014, pp. 5095–102, doi:10.1166/jnn.2014.8848.
short: K. Xu, V.-S. Dang, A. Ney, M.T. de los Arcos de Pedro, A. Devi, Journal of
Nanoscience and Nanotechnology (2014) 5095–5102.
date_created: 2021-07-07T11:11:37Z
date_updated: 2023-01-24T08:21:36Z
department:
- _id: '302'
doi: 10.1166/jnn.2014.8848
extern: '1'
language:
- iso: eng
page: 5095-5102
publication: Journal of Nanoscience and Nanotechnology
publication_identifier:
issn:
- 1533-4880
- 1533-4899
publication_status: published
status: public
title: Nanostructured Er2O3 Thin Films Grown by Metalorganic
Chemical Vapour Deposition
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '20945'
abstract:
- lang: eng
text: Calcium-Silicate-Hydrates (C-S-H) are the main binding phases in most concrete
which is the primarily used composite construction material in the world. However,
a big lack is cleaving between the actual knowledge about C-S-H, compared to what
could be reached using state-of-the-art technologies of modern research. In this
article, the formation of a C-S-H phase on a native oxide covered silicon wafer
is investigated by means of in-situ attenuated total reflection infrared (ATR-IR)
and ex-situ surface-enhanced Raman spectroscopy (SERS). The total thickness of
the C-S-H phase is determined by X-ray photoelectron spectroscopy (XPS) to be
3 nm. The formation appears to be reversible depending on the environment pH value
and can be performed at room temperature. Based on density functional theory (DFT)
calculations, it is shown that the C-S-H phase in the presence of water will change
its chemical composition in order to reach the thermodynamic ground state of the
system. This change is achieved by a metal-proton exchange reaction. The stoichiometry
of these metal-proton exchange reactions is nearly independent of the environment
pH value. Electrokinetic measurements yield isoelectric points of 2.0 and 2.6
for the native oxide covered silicon wafer (SiO2) and the C-S-H phase. This is
consistent with a predominance of Si-O sites at the C-S-H/water interface. (C)
2013 Elsevier B. V. All rights reserved.
author:
- first_name: Christoph
full_name: Ebbert, Christoph
id: '7266'
last_name: Ebbert
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: Nadine
full_name: Buitkamp, Nadine
id: '1449'
last_name: Buitkamp
- first_name: Alexander
full_name: Kroeger, Alexander
last_name: Kroeger
- first_name: Florian
full_name: Messerschmidt, Florian
last_name: Messerschmidt
- first_name: Peter
full_name: Thissen, Peter
last_name: Thissen
citation:
ama: Ebbert C, Grundmeier G, Buitkamp N, Kroeger A, Messerschmidt F, Thissen P.
Toward a microscopic understanding of the calcium-silicate-hydrates/water interface.
APPLIED SURFACE SCIENCE. 2014;290:207-214. doi:10.1016/j.apsusc.2013.11.045
apa: Ebbert, C., Grundmeier, G., Buitkamp, N., Kroeger, A., Messerschmidt, F., &
Thissen, P. (2014). Toward a microscopic understanding of the calcium-silicate-hydrates/water
interface. APPLIED SURFACE SCIENCE, 290, 207–214. https://doi.org/10.1016/j.apsusc.2013.11.045
bibtex: '@article{Ebbert_Grundmeier_Buitkamp_Kroeger_Messerschmidt_Thissen_2014,
title={Toward a microscopic understanding of the calcium-silicate-hydrates/water
interface}, volume={290}, DOI={10.1016/j.apsusc.2013.11.045},
journal={APPLIED SURFACE SCIENCE}, author={Ebbert, Christoph and Grundmeier, Guido
and Buitkamp, Nadine and Kroeger, Alexander and Messerschmidt, Florian and Thissen,
Peter}, year={2014}, pages={207–214} }'
chicago: 'Ebbert, Christoph, Guido Grundmeier, Nadine Buitkamp, Alexander Kroeger,
Florian Messerschmidt, and Peter Thissen. “Toward a Microscopic Understanding
of the Calcium-Silicate-Hydrates/Water Interface.” APPLIED SURFACE SCIENCE
290 (2014): 207–14. https://doi.org/10.1016/j.apsusc.2013.11.045.'
ieee: 'C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, and
P. Thissen, “Toward a microscopic understanding of the calcium-silicate-hydrates/water
interface,” APPLIED SURFACE SCIENCE, vol. 290, pp. 207–214, 2014, doi:
10.1016/j.apsusc.2013.11.045.'
mla: Ebbert, Christoph, et al. “Toward a Microscopic Understanding of the Calcium-Silicate-Hydrates/Water
Interface.” APPLIED SURFACE SCIENCE, vol. 290, 2014, pp. 207–14, doi:10.1016/j.apsusc.2013.11.045.
short: C. Ebbert, G. Grundmeier, N. Buitkamp, A. Kroeger, F. Messerschmidt, P. Thissen,
APPLIED SURFACE SCIENCE 290 (2014) 207–214.
date_created: 2021-01-13T10:12:51Z
date_updated: 2025-11-18T12:05:39Z
department:
- _id: '35'
- _id: '302'
- _id: '321'
doi: 10.1016/j.apsusc.2013.11.045
external_id:
isi:
- '000329060100032'
intvolume: ' 290'
isi: '1'
language:
- iso: eng
page: 207-214
publication: APPLIED SURFACE SCIENCE
publication_identifier:
eissn:
- 1873-5584
issn:
- 0169-4332
publication_status: published
quality_controlled: '1'
status: public
title: Toward a microscopic understanding of the calcium-silicate-hydrates/water interface
type: journal_article
user_id: '7266'
volume: 290
year: '2014'
...
---
_id: '20946'
abstract:
- lang: eng
text: In the current work, we study the silver ion release potential and the water
uptake through a SiOxCyHz-polymer which is grown from the precursor hexamethyldisiloxane
(HMDSO) in radiofrequency (RF) plasma. These layers were deposited on top of two
dimensional (2D) ensembles of silver nanoparticles (AgNPs) with nominal thickness
of 2 nm on a 20 nm RF-sputtered polytetrafluoroethylene (PTFE) thin film. The
composition of the plasma-polymerized HMDSO barriers was varied by changing the
oxygen flow during the polymerization process and their thickness was varied as
well. Morphology and optical properties of the nanocomposites were investigated
using transmission electron microscopy (TEM) and UV-Visible spectroscopy (UV-Vis),
respectively. The concentration of the silver ions released from the nanocomposites
after immersion in water for several time intervals was measured using inductively
coupled plasma mass spectrometry (ICP-MS). Contact angle analysis and electrochemical
impedance spectroscopy (EIS) measurements were also performed and results show
a strong dependence of the coatings properties and their water uptake on the oxygen
content in the coating films and their thickness. Plasma polymerization with increasing
the oxygen flow leads to the formation of more hydrophilic thin films with a higher
Ag ion release potential. Increasing the thickness of the coatings reduced the
amount of the released ions and the rate of the release process was slowed down.
This indicates that by tailoring the structure and the thickness of the plasma-polymerized
coating films, one can tune the silver ion release properties of Ag/polymer nanocomposites.
article_number: '2080'
author:
- first_name: N.
full_name: Alissawi, N.
last_name: Alissawi
- first_name: T.
full_name: Peter, T.
last_name: Peter
- first_name: T.
full_name: Strunskus, T.
last_name: Strunskus
- first_name: Christoph
full_name: Ebbert, Christoph
id: '7266'
last_name: Ebbert
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
- first_name: F.
full_name: Faupel, F.
last_name: Faupel
citation:
ama: Alissawi N, Peter T, Strunskus T, Ebbert C, Grundmeier G, Faupel F. Plasma-polymerized
HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites.
JOURNAL OF NANOPARTICLE RESEARCH. 2013;15(11). doi:10.1007/s11051-013-2080-9
apa: Alissawi, N., Peter, T., Strunskus, T., Ebbert, C., Grundmeier, G., & Faupel,
F. (2013). Plasma-polymerized HMDSO coatings to adjust the silver ion release
properties of Ag/polymer nanocomposites. JOURNAL OF NANOPARTICLE RESEARCH,
15(11). https://doi.org/10.1007/s11051-013-2080-9
bibtex: '@article{Alissawi_Peter_Strunskus_Ebbert_Grundmeier_Faupel_2013, title={Plasma-polymerized
HMDSO coatings to adjust the silver ion release properties of Ag/polymer nanocomposites},
volume={15}, DOI={10.1007/s11051-013-2080-9},
number={112080}, journal={JOURNAL OF NANOPARTICLE RESEARCH}, author={Alissawi,
N. and Peter, T. and Strunskus, T. and Ebbert, Christoph and Grundmeier, Guido
and Faupel, F.}, year={2013} }'
chicago: Alissawi, N., T. Peter, T. Strunskus, Christoph Ebbert, Guido Grundmeier,
and F. Faupel. “Plasma-Polymerized HMDSO Coatings to Adjust the Silver Ion Release
Properties of Ag/Polymer Nanocomposites.” JOURNAL OF NANOPARTICLE RESEARCH
15, no. 11 (2013). https://doi.org/10.1007/s11051-013-2080-9.
ieee: N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, and F. Faupel,
“Plasma-polymerized HMDSO coatings to adjust the silver ion release properties
of Ag/polymer nanocomposites,” JOURNAL OF NANOPARTICLE RESEARCH, vol. 15,
no. 11, 2013.
mla: Alissawi, N., et al. “Plasma-Polymerized HMDSO Coatings to Adjust the Silver
Ion Release Properties of Ag/Polymer Nanocomposites.” JOURNAL OF NANOPARTICLE
RESEARCH, vol. 15, no. 11, 2080, 2013, doi:10.1007/s11051-013-2080-9.
short: N. Alissawi, T. Peter, T. Strunskus, C. Ebbert, G. Grundmeier, F. Faupel,
JOURNAL OF NANOPARTICLE RESEARCH 15 (2013).
date_created: 2021-01-13T10:12:52Z
date_updated: 2022-01-06T06:54:41Z
department:
- _id: '35'
- _id: '302'
- _id: '321'
doi: 10.1007/s11051-013-2080-9
external_id:
isi:
- '000326054400001'
intvolume: ' 15'
isi: '1'
issue: '11'
language:
- iso: eng
publication: JOURNAL OF NANOPARTICLE RESEARCH
publication_identifier:
eissn:
- 1572-896X
issn:
- 1388-0764
publication_status: published
quality_controlled: '1'
status: public
title: Plasma-polymerized HMDSO coatings to adjust the silver ion release properties
of Ag/polymer nanocomposites
type: journal_article
user_id: '7266'
volume: 15
year: '2013'
...
---
_id: '22584'
author:
- first_name: Van-Son
full_name: Dang, Van-Son
last_name: Dang
- first_name: Harish
full_name: Parala, Harish
last_name: Parala
- first_name: Jin Hyun
full_name: Kim, Jin Hyun
last_name: Kim
- first_name: Ke
full_name: Xu, Ke
last_name: Xu
- first_name: Nagendra B.
full_name: Srinivasan, Nagendra B.
last_name: Srinivasan
- first_name: Eugen
full_name: Edengeiser, Eugen
last_name: Edengeiser
- first_name: Martina
full_name: Havenith, Martina
last_name: Havenith
- first_name: Andreas D.
full_name: Wieck, Andreas D.
last_name: Wieck
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Roland. A.
full_name: Fischer, Roland. A.
last_name: Fischer
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: Dang V-S, Parala H, Kim JH, et al. Electrical and optical properties of TiO2thin
films prepared by plasma-enhanced atomic layer deposition. physica status solidi
(a). Published online 2013:416-424. doi:10.1002/pssa.201330115
apa: Dang, V.-S., Parala, H., Kim, J. H., Xu, K., Srinivasan, N. B., Edengeiser,
E., Havenith, M., Wieck, A. D., de los Arcos de Pedro, M. T., Fischer, Roland.
A., & Devi, A. (2013). Electrical and optical properties of TiO2thin films
prepared by plasma-enhanced atomic layer deposition. Physica Status Solidi
(a), 416–424. https://doi.org/10.1002/pssa.201330115
bibtex: '@article{Dang_Parala_Kim_Xu_Srinivasan_Edengeiser_Havenith_Wieck_de los
Arcos de Pedro_Fischer_et al._2013, title={Electrical and optical properties of
TiO2thin films prepared by plasma-enhanced atomic layer deposition}, DOI={10.1002/pssa.201330115},
journal={physica status solidi (a)}, author={Dang, Van-Son and Parala, Harish
and Kim, Jin Hyun and Xu, Ke and Srinivasan, Nagendra B. and Edengeiser, Eugen
and Havenith, Martina and Wieck, Andreas D. and de los Arcos de Pedro, Maria Teresa
and Fischer, Roland. A. and et al.}, year={2013}, pages={416–424} }'
chicago: Dang, Van-Son, Harish Parala, Jin Hyun Kim, Ke Xu, Nagendra B. Srinivasan,
Eugen Edengeiser, Martina Havenith, et al. “Electrical and Optical Properties
of TiO2thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.” Physica
Status Solidi (a), 2013, 416–24. https://doi.org/10.1002/pssa.201330115.
ieee: 'V.-S. Dang et al., “Electrical and optical properties of TiO2thin
films prepared by plasma-enhanced atomic layer deposition,” physica status
solidi (a), pp. 416–424, 2013, doi: 10.1002/pssa.201330115.'
mla: Dang, Van-Son, et al. “Electrical and Optical Properties of TiO2thin Films
Prepared by Plasma-Enhanced Atomic Layer Deposition.” Physica Status Solidi
(a), 2013, pp. 416–24, doi:10.1002/pssa.201330115.
short: V.-S. Dang, H. Parala, J.H. Kim, K. Xu, N.B. Srinivasan, E. Edengeiser, M.
Havenith, A.D. Wieck, M.T. de los Arcos de Pedro, Roland.A. Fischer, A. Devi,
Physica Status Solidi (a) (2013) 416–424.
date_created: 2021-07-07T11:09:32Z
date_updated: 2023-01-24T08:21:54Z
department:
- _id: '302'
doi: 10.1002/pssa.201330115
extern: '1'
language:
- iso: eng
page: 416-424
publication: physica status solidi (a)
publication_identifier:
issn:
- 1862-6300
publication_status: published
status: public
title: Electrical and optical properties of TiO2thin films prepared by plasma-enhanced
atomic layer deposition
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22589'
author:
- first_name: Nagendra B.
full_name: Srinivasan, Nagendra B.
last_name: Srinivasan
- first_name: Tobias B.
full_name: Thiede, Tobias B.
last_name: Thiede
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Detlef
full_name: Rogalla, Detlef
last_name: Rogalla
- first_name: Hans-Werner
full_name: Becker, Hans-Werner
last_name: Becker
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
- first_name: Roland A.
full_name: Fischer, Roland A.
last_name: Fischer
citation:
ama: 'Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. MOCVD of tungsten
nitride thin films: Comparison of precursor performance and film characteristics.
physica status solidi (a). Published online 2013:260-266. doi:10.1002/pssa.201330127'
apa: 'Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Rogalla, D.,
Becker, H.-W., Devi, A., & Fischer, R. A. (2013). MOCVD of tungsten nitride
thin films: Comparison of precursor performance and film characteristics. Physica
Status Solidi (a), 260–266. https://doi.org/10.1002/pssa.201330127'
bibtex: '@article{Srinivasan_Thiede_de los Arcos de Pedro_Rogalla_Becker_Devi_Fischer_2013,
title={MOCVD of tungsten nitride thin films: Comparison of precursor performance
and film characteristics}, DOI={10.1002/pssa.201330127},
journal={physica status solidi (a)}, author={Srinivasan, Nagendra B. and Thiede,
Tobias B. and de los Arcos de Pedro, Maria Teresa and Rogalla, Detlef and Becker,
Hans-Werner and Devi, Anjana and Fischer, Roland A.}, year={2013}, pages={260–266}
}'
chicago: 'Srinivasan, Nagendra B., Tobias B. Thiede, Maria Teresa de los Arcos de
Pedro, Detlef Rogalla, Hans-Werner Becker, Anjana Devi, and Roland A. Fischer.
“MOCVD of Tungsten Nitride Thin Films: Comparison of Precursor Performance and
Film Characteristics.” Physica Status Solidi (a), 2013, 260–66. https://doi.org/10.1002/pssa.201330127.'
ieee: 'N. B. Srinivasan et al., “MOCVD of tungsten nitride thin films: Comparison
of precursor performance and film characteristics,” physica status solidi (a),
pp. 260–266, 2013, doi: 10.1002/pssa.201330127.'
mla: 'Srinivasan, Nagendra B., et al. “MOCVD of Tungsten Nitride Thin Films: Comparison
of Precursor Performance and Film Characteristics.” Physica Status Solidi (a),
2013, pp. 260–66, doi:10.1002/pssa.201330127.'
short: N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, D. Rogalla, H.-W.
Becker, A. Devi, R.A. Fischer, Physica Status Solidi (a) (2013) 260–266.
date_created: 2021-07-07T11:11:23Z
date_updated: 2023-01-24T08:22:27Z
department:
- _id: '302'
doi: 10.1002/pssa.201330127
extern: '1'
language:
- iso: eng
page: 260-266
publication: physica status solidi (a)
publication_identifier:
issn:
- 1862-6300
publication_status: published
status: public
title: 'MOCVD of tungsten nitride thin films: Comparison of precursor performance
and film characteristics'
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22596'
article_number: '3939'
author:
- first_name: Ke
full_name: Xu, Ke
last_name: Xu
- first_name: Ayan Roy
full_name: Chaudhuri, Ayan Roy
last_name: Chaudhuri
- first_name: Harish
full_name: Parala, Harish
last_name: Parala
- first_name: Dominik
full_name: Schwendt, Dominik
last_name: Schwendt
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: H. Jörg
full_name: Osten, H. Jörg
last_name: Osten
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: 'Xu K, Chaudhuri AR, Parala H, et al. Atomic layer deposition of Er2O3 thin
films from Er tris-guanidinate and water: process optimization, film analysis
and electrical properties. Journal of Materials Chemistry C. Published
online 2013. doi:10.1039/c3tc30401a'
apa: 'Xu, K., Chaudhuri, A. R., Parala, H., Schwendt, D., de los Arcos de Pedro,
M. T., Osten, H. J., & Devi, A. (2013). Atomic layer deposition of Er2O3 thin
films from Er tris-guanidinate and water: process optimization, film analysis
and electrical properties. Journal of Materials Chemistry C, Article 3939.
https://doi.org/10.1039/c3tc30401a'
bibtex: '@article{Xu_Chaudhuri_Parala_Schwendt_de los Arcos de Pedro_Osten_Devi_2013,
title={Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and
water: process optimization, film analysis and electrical properties}, DOI={10.1039/c3tc30401a}, number={3939},
journal={Journal of Materials Chemistry C}, author={Xu, Ke and Chaudhuri, Ayan
Roy and Parala, Harish and Schwendt, Dominik and de los Arcos de Pedro, Maria
Teresa and Osten, H. Jörg and Devi, Anjana}, year={2013} }'
chicago: 'Xu, Ke, Ayan Roy Chaudhuri, Harish Parala, Dominik Schwendt, Maria Teresa
de los Arcos de Pedro, H. Jörg Osten, and Anjana Devi. “Atomic Layer Deposition
of Er2O3 Thin Films from Er Tris-Guanidinate and Water: Process Optimization,
Film Analysis and Electrical Properties.” Journal of Materials Chemistry C,
2013. https://doi.org/10.1039/c3tc30401a.'
ieee: 'K. Xu et al., “Atomic layer deposition of Er2O3 thin films from Er
tris-guanidinate and water: process optimization, film analysis and electrical
properties,” Journal of Materials Chemistry C, Art. no. 3939, 2013, doi:
10.1039/c3tc30401a.'
mla: 'Xu, Ke, et al. “Atomic Layer Deposition of Er2O3 Thin Films from Er Tris-Guanidinate
and Water: Process Optimization, Film Analysis and Electrical Properties.” Journal
of Materials Chemistry C, 3939, 2013, doi:10.1039/c3tc30401a.'
short: K. Xu, A.R. Chaudhuri, H. Parala, D. Schwendt, M.T. de los Arcos de Pedro,
H.J. Osten, A. Devi, Journal of Materials Chemistry C (2013).
date_created: 2021-07-07T11:14:22Z
date_updated: 2023-01-24T08:24:04Z
department:
- _id: '302'
doi: 10.1039/c3tc30401a
extern: '1'
language:
- iso: eng
publication: Journal of Materials Chemistry C
publication_identifier:
issn:
- 2050-7526
- 2050-7534
publication_status: published
status: public
title: 'Atomic layer deposition of Er2O3 thin films from Er tris-guanidinate and water:
process optimization, film analysis and electrical properties'
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22593'
author:
- first_name: N.B.
full_name: Srinivasan, N.B.
last_name: Srinivasan
- first_name: T.B.
full_name: Thiede, T.B.
last_name: Thiede
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: V.
full_name: Gwildies, V.
last_name: Gwildies
- first_name: M.
full_name: Krasnopolski, M.
last_name: Krasnopolski
- first_name: H.-W.
full_name: Becker, H.-W.
last_name: Becker
- first_name: D.
full_name: Rogalla, D.
last_name: Rogalla
- first_name: A.
full_name: Devi, A.
last_name: Devi
- first_name: R.A.
full_name: Fischer, R.A.
last_name: Fischer
citation:
ama: Srinivasan NB, Thiede TB, de los Arcos de Pedro MT, et al. Transition metal
nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2]
(M=Mo, W) as precursors. Surface and Coatings Technology. Published online
2013:130-136. doi:10.1016/j.surfcoat.2013.06.024
apa: Srinivasan, N. B., Thiede, T. B., de los Arcos de Pedro, M. T., Gwildies, V.,
Krasnopolski, M., Becker, H.-W., Rogalla, D., Devi, A., & Fischer, R. A. (2013).
Transition metal nitride thin films grown by MOCVD using amidinato based complexes
[M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors. Surface and Coatings Technology,
130–136. https://doi.org/10.1016/j.surfcoat.2013.06.024
bibtex: '@article{Srinivasan_Thiede_de los Arcos de Pedro_Gwildies_Krasnopolski_Becker_Rogalla_Devi_Fischer_2013,
title={Transition metal nitride thin films grown by MOCVD using amidinato based
complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors}, DOI={10.1016/j.surfcoat.2013.06.024},
journal={Surface and Coatings Technology}, author={Srinivasan, N.B. and Thiede,
T.B. and de los Arcos de Pedro, Maria Teresa and Gwildies, V. and Krasnopolski,
M. and Becker, H.-W. and Rogalla, D. and Devi, A. and Fischer, R.A.}, year={2013},
pages={130–136} }'
chicago: Srinivasan, N.B., T.B. Thiede, Maria Teresa de los Arcos de Pedro, V. Gwildies,
M. Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, and R.A. Fischer. “Transition
Metal Nitride Thin Films Grown by MOCVD Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2]
(M=Mo, W) as Precursors.” Surface and Coatings Technology, 2013, 130–36.
https://doi.org/10.1016/j.surfcoat.2013.06.024.
ieee: 'N. B. Srinivasan et al., “Transition metal nitride thin films grown
by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as
precursors,” Surface and Coatings Technology, pp. 130–136, 2013, doi: 10.1016/j.surfcoat.2013.06.024.'
mla: Srinivasan, N. B., et al. “Transition Metal Nitride Thin Films Grown by MOCVD
Using Amidinato Based Complexes [M(NtBu)2{(IPrN)2CMe}2] (M=Mo, W) as Precursors.”
Surface and Coatings Technology, 2013, pp. 130–36, doi:10.1016/j.surfcoat.2013.06.024.
short: N.B. Srinivasan, T.B. Thiede, M.T. de los Arcos de Pedro, V. Gwildies, M.
Krasnopolski, H.-W. Becker, D. Rogalla, A. Devi, R.A. Fischer, Surface and Coatings
Technology (2013) 130–136.
date_created: 2021-07-07T11:13:33Z
date_updated: 2023-01-24T08:23:13Z
department:
- _id: '302'
doi: 10.1016/j.surfcoat.2013.06.024
extern: '1'
language:
- iso: eng
page: 130-136
publication: Surface and Coatings Technology
publication_identifier:
issn:
- 0257-8972
publication_status: published
status: public
title: Transition metal nitride thin films grown by MOCVD using amidinato based complexes
[M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22594'
article_number: '084009'
author:
- first_name: Andreas
full_name: Will, Andreas
last_name: Will
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Carles
full_name: Corbella, Carles
last_name: Corbella
- first_name: Ante
full_name: Hecimovic, Ante
last_name: Hecimovic
- first_name: Patrick D
full_name: Machura, Patrick D
last_name: Machura
- first_name: Jörg
full_name: Winter, Jörg
last_name: Winter
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
citation:
ama: 'Will A, de los Arcos de Pedro MT, Corbella C, et al. Target implantation and
redeposition processes during high-power impulse magnetron sputtering of aluminum.
Journal of Physics D: Applied Physics. Published online 2013. doi:10.1088/0022-3727/46/8/084009'
apa: 'Will, A., de los Arcos de Pedro, M. T., Corbella, C., Hecimovic, A., Machura,
P. D., Winter, J., & von Keudell, A. (2013). Target implantation and redeposition
processes during high-power impulse magnetron sputtering of aluminum. Journal
of Physics D: Applied Physics, Article 084009. https://doi.org/10.1088/0022-3727/46/8/084009'
bibtex: '@article{Will_de los Arcos de Pedro_Corbella_Hecimovic_Machura_Winter_von
Keudell_2013, title={Target implantation and redeposition processes during high-power
impulse magnetron sputtering of aluminum}, DOI={10.1088/0022-3727/46/8/084009},
number={084009}, journal={Journal of Physics D: Applied Physics}, author={Will,
Andreas and de los Arcos de Pedro, Maria Teresa and Corbella, Carles and Hecimovic,
Ante and Machura, Patrick D and Winter, Jörg and von Keudell, Achim}, year={2013}
}'
chicago: 'Will, Andreas, Maria Teresa de los Arcos de Pedro, Carles Corbella, Ante
Hecimovic, Patrick D Machura, Jörg Winter, and Achim von Keudell. “Target Implantation
and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.”
Journal of Physics D: Applied Physics, 2013. https://doi.org/10.1088/0022-3727/46/8/084009.'
ieee: 'A. Will et al., “Target implantation and redeposition processes during
high-power impulse magnetron sputtering of aluminum,” Journal of Physics D:
Applied Physics, Art. no. 084009, 2013, doi: 10.1088/0022-3727/46/8/084009.'
mla: 'Will, Andreas, et al. “Target Implantation and Redeposition Processes during
High-Power Impulse Magnetron Sputtering of Aluminum.” Journal of Physics D:
Applied Physics, 084009, 2013, doi:10.1088/0022-3727/46/8/084009.'
short: 'A. Will, M.T. de los Arcos de Pedro, C. Corbella, A. Hecimovic, P.D. Machura,
J. Winter, A. von Keudell, Journal of Physics D: Applied Physics (2013).'
date_created: 2021-07-07T11:13:47Z
date_updated: 2023-01-24T08:23:28Z
department:
- _id: '302'
doi: 10.1088/0022-3727/46/8/084009
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
issn:
- 0022-3727
- 1361-6463
publication_status: published
status: public
title: Target implantation and redeposition processes during high-power impulse magnetron
sputtering of aluminum
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22591'
article_number: '103303'
author:
- first_name: Carles
full_name: Corbella, Carles
last_name: Corbella
- first_name: Simon
full_name: Grosse-Kreul, Simon
last_name: Grosse-Kreul
- first_name: Oliver
full_name: Kreiter, Oliver
last_name: Kreiter
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Jan
full_name: Benedikt, Jan
last_name: Benedikt
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
citation:
ama: Corbella C, Grosse-Kreul S, Kreiter O, de los Arcos de Pedro MT, Benedikt J,
von Keudell A. Particle beam experiments for the analysis of reactive sputtering
processes in metals and polymer surfaces. Review of Scientific Instruments.
Published online 2013. doi:10.1063/1.4826066
apa: Corbella, C., Grosse-Kreul, S., Kreiter, O., de los Arcos de Pedro, M. T.,
Benedikt, J., & von Keudell, A. (2013). Particle beam experiments for the
analysis of reactive sputtering processes in metals and polymer surfaces. Review
of Scientific Instruments, Article 103303. https://doi.org/10.1063/1.4826066
bibtex: '@article{Corbella_Grosse-Kreul_Kreiter_de los Arcos de Pedro_Benedikt_von
Keudell_2013, title={Particle beam experiments for the analysis of reactive sputtering
processes in metals and polymer surfaces}, DOI={10.1063/1.4826066},
number={103303}, journal={Review of Scientific Instruments}, author={Corbella,
Carles and Grosse-Kreul, Simon and Kreiter, Oliver and de los Arcos de Pedro,
Maria Teresa and Benedikt, Jan and von Keudell, Achim}, year={2013} }'
chicago: Corbella, Carles, Simon Grosse-Kreul, Oliver Kreiter, Maria Teresa de los
Arcos de Pedro, Jan Benedikt, and Achim von Keudell. “Particle Beam Experiments
for the Analysis of Reactive Sputtering Processes in Metals and Polymer Surfaces.”
Review of Scientific Instruments, 2013. https://doi.org/10.1063/1.4826066.
ieee: 'C. Corbella, S. Grosse-Kreul, O. Kreiter, M. T. de los Arcos de Pedro, J.
Benedikt, and A. von Keudell, “Particle beam experiments for the analysis of reactive
sputtering processes in metals and polymer surfaces,” Review of Scientific
Instruments, Art. no. 103303, 2013, doi: 10.1063/1.4826066.'
mla: Corbella, Carles, et al. “Particle Beam Experiments for the Analysis of Reactive
Sputtering Processes in Metals and Polymer Surfaces.” Review of Scientific
Instruments, 103303, 2013, doi:10.1063/1.4826066.
short: C. Corbella, S. Grosse-Kreul, O. Kreiter, M.T. de los Arcos de Pedro, J.
Benedikt, A. von Keudell, Review of Scientific Instruments (2013).
date_created: 2021-07-07T11:12:42Z
date_updated: 2023-01-24T08:22:42Z
department:
- _id: '302'
doi: 10.1063/1.4826066
extern: '1'
language:
- iso: eng
publication: Review of Scientific Instruments
publication_identifier:
issn:
- 0034-6748
- 1089-7623
publication_status: published
status: public
title: Particle beam experiments for the analysis of reactive sputtering processes
in metals and polymer surfaces
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22595'
article_number: '084007'
author:
- first_name: J
full_name: Winter, J
last_name: Winter
- first_name: A
full_name: Hecimovic, A
last_name: Hecimovic
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: M
full_name: Böke, M
last_name: Böke
- first_name: V
full_name: Schulz-von der Gathen, V
last_name: Schulz-von der Gathen
citation:
ama: 'Winter J, Hecimovic A, de los Arcos de Pedro MT, Böke M, Schulz-von der Gathen
V. Instabilities in high-power impulse magnetron plasmas: from stochasticity to
periodicity. Journal of Physics D: Applied Physics. Published online 2013.
doi:10.1088/0022-3727/46/8/084007'
apa: 'Winter, J., Hecimovic, A., de los Arcos de Pedro, M. T., Böke, M., & Schulz-von
der Gathen, V. (2013). Instabilities in high-power impulse magnetron plasmas:
from stochasticity to periodicity. Journal of Physics D: Applied Physics,
Article 084007. https://doi.org/10.1088/0022-3727/46/8/084007'
bibtex: '@article{Winter_Hecimovic_de los Arcos de Pedro_Böke_Schulz-von der Gathen_2013,
title={Instabilities in high-power impulse magnetron plasmas: from stochasticity
to periodicity}, DOI={10.1088/0022-3727/46/8/084007},
number={084007}, journal={Journal of Physics D: Applied Physics}, author={Winter,
J and Hecimovic, A and de los Arcos de Pedro, Maria Teresa and Böke, M and Schulz-von
der Gathen, V}, year={2013} }'
chicago: 'Winter, J, A Hecimovic, Maria Teresa de los Arcos de Pedro, M Böke, and
V Schulz-von der Gathen. “Instabilities in High-Power Impulse Magnetron Plasmas:
From Stochasticity to Periodicity.” Journal of Physics D: Applied Physics,
2013. https://doi.org/10.1088/0022-3727/46/8/084007.'
ieee: 'J. Winter, A. Hecimovic, M. T. de los Arcos de Pedro, M. Böke, and V. Schulz-von
der Gathen, “Instabilities in high-power impulse magnetron plasmas: from stochasticity
to periodicity,” Journal of Physics D: Applied Physics, Art. no. 084007,
2013, doi: 10.1088/0022-3727/46/8/084007.'
mla: 'Winter, J., et al. “Instabilities in High-Power Impulse Magnetron Plasmas:
From Stochasticity to Periodicity.” Journal of Physics D: Applied Physics,
084007, 2013, doi:10.1088/0022-3727/46/8/084007.'
short: 'J. Winter, A. Hecimovic, M.T. de los Arcos de Pedro, M. Böke, V. Schulz-von
der Gathen, Journal of Physics D: Applied Physics (2013).'
date_created: 2021-07-07T11:14:06Z
date_updated: 2023-01-24T08:23:42Z
department:
- _id: '302'
doi: 10.1088/0022-3727/46/8/084007
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
issn:
- 0022-3727
- 1361-6463
publication_status: published
status: public
title: 'Instabilities in high-power impulse magnetron plasmas: from stochasticity
to periodicity'
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22592'
author:
- first_name: Katja
full_name: Rügner, Katja
last_name: Rügner
- first_name: Rüdiger
full_name: Reuter, Rüdiger
last_name: Reuter
- first_name: Dirk
full_name: Ellerweg, Dirk
last_name: Ellerweg
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
- first_name: Jan
full_name: Benedikt, Jan
last_name: Benedikt
citation:
ama: Rügner K, Reuter R, Ellerweg D, de los Arcos de Pedro MT, von Keudell A, Benedikt
J. Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure.
Plasma Processes and Polymers. Published online 2013:1061-1073. doi:10.1002/ppap.201300059
apa: Rügner, K., Reuter, R., Ellerweg, D., de los Arcos de Pedro, M. T., von Keudell,
A., & Benedikt, J. (2013). Insight into the Reaction Scheme of SiO2 Film Deposition
at Atmospheric Pressure. Plasma Processes and Polymers, 1061–1073. https://doi.org/10.1002/ppap.201300059
bibtex: '@article{Rügner_Reuter_Ellerweg_de los Arcos de Pedro_von Keudell_Benedikt_2013,
title={Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric
Pressure}, DOI={10.1002/ppap.201300059},
journal={Plasma Processes and Polymers}, author={Rügner, Katja and Reuter, Rüdiger
and Ellerweg, Dirk and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim
and Benedikt, Jan}, year={2013}, pages={1061–1073} }'
chicago: Rügner, Katja, Rüdiger Reuter, Dirk Ellerweg, Maria Teresa de los Arcos
de Pedro, Achim von Keudell, and Jan Benedikt. “Insight into the Reaction Scheme
of SiO2 Film Deposition at Atmospheric Pressure.” Plasma Processes and Polymers,
2013, 1061–73. https://doi.org/10.1002/ppap.201300059.
ieee: 'K. Rügner, R. Reuter, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell,
and J. Benedikt, “Insight into the Reaction Scheme of SiO2 Film Deposition at
Atmospheric Pressure,” Plasma Processes and Polymers, pp. 1061–1073, 2013,
doi: 10.1002/ppap.201300059.'
mla: Rügner, Katja, et al. “Insight into the Reaction Scheme of SiO2 Film Deposition
at Atmospheric Pressure.” Plasma Processes and Polymers, 2013, pp. 1061–73,
doi:10.1002/ppap.201300059.
short: K. Rügner, R. Reuter, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell,
J. Benedikt, Plasma Processes and Polymers (2013) 1061–1073.
date_created: 2021-07-07T11:13:20Z
date_updated: 2023-01-24T08:22:58Z
department:
- _id: '302'
doi: 10.1002/ppap.201300059
extern: '1'
language:
- iso: eng
page: 1061-1073
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
publication_status: published
status: public
title: Insight into the Reaction Scheme of SiO2 Film Deposition at Atmospheric Pressure
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22597'
author:
- first_name: Manish
full_name: Banerjee, Manish
last_name: Banerjee
- first_name: Nagendra Babu
full_name: Srinivasan, Nagendra Babu
last_name: Srinivasan
- first_name: Huaizhi
full_name: Zhu, Huaizhi
last_name: Zhu
- first_name: Sun Ja
full_name: Kim, Sun Ja
last_name: Kim
- first_name: Ke
full_name: Xu, Ke
last_name: Xu
- first_name: Manuela
full_name: Winter, Manuela
last_name: Winter
- first_name: Hans-Werner
full_name: Becker, Hans-Werner
last_name: Becker
- first_name: Detlef
full_name: Rogalla, Detlef
last_name: Rogalla
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Daniela
full_name: Bekermann, Daniela
last_name: Bekermann
- first_name: Davide
full_name: Barreca, Davide
last_name: Barreca
- first_name: Roland A.
full_name: Fischer, Roland A.
last_name: Fischer
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: Banerjee M, Srinivasan NB, Zhu H, et al. Fabrication of ZrO2 and ZrN Films
by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors. Crystal
Growth & Design. Published online 2012:5079-5089. doi:10.1021/cg3010147
apa: Banerjee, M., Srinivasan, N. B., Zhu, H., Kim, S. J., Xu, K., Winter, M., Becker,
H.-W., Rogalla, D., de los Arcos de Pedro, M. T., Bekermann, D., Barreca, D.,
Fischer, R. A., & Devi, A. (2012). Fabrication of ZrO2 and ZrN Films by Metalorganic
Chemical Vapor Deposition Employing New Zr Precursors. Crystal Growth &
Design, 5079–5089. https://doi.org/10.1021/cg3010147
bibtex: '@article{Banerjee_Srinivasan_Zhu_Kim_Xu_Winter_Becker_Rogalla_de los Arcos
de Pedro_Bekermann_et al._2012, title={Fabrication of ZrO2 and ZrN Films by Metalorganic
Chemical Vapor Deposition Employing New Zr Precursors}, DOI={10.1021/cg3010147},
journal={Crystal Growth & Design}, author={Banerjee, Manish and Srinivasan,
Nagendra Babu and Zhu, Huaizhi and Kim, Sun Ja and Xu, Ke and Winter, Manuela
and Becker, Hans-Werner and Rogalla, Detlef and de los Arcos de Pedro, Maria Teresa
and Bekermann, Daniela and et al.}, year={2012}, pages={5079–5089} }'
chicago: Banerjee, Manish, Nagendra Babu Srinivasan, Huaizhi Zhu, Sun Ja Kim, Ke
Xu, Manuela Winter, Hans-Werner Becker, et al. “Fabrication of ZrO2 and ZrN Films
by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors.” Crystal
Growth & Design, 2012, 5079–89. https://doi.org/10.1021/cg3010147.
ieee: 'M. Banerjee et al., “Fabrication of ZrO2 and ZrN Films by Metalorganic
Chemical Vapor Deposition Employing New Zr Precursors,” Crystal Growth &
Design, pp. 5079–5089, 2012, doi: 10.1021/cg3010147.'
mla: Banerjee, Manish, et al. “Fabrication of ZrO2 and ZrN Films by Metalorganic
Chemical Vapor Deposition Employing New Zr Precursors.” Crystal Growth &
Design, 2012, pp. 5079–89, doi:10.1021/cg3010147.
short: M. Banerjee, N.B. Srinivasan, H. Zhu, S.J. Kim, K. Xu, M. Winter, H.-W. Becker,
D. Rogalla, M.T. de los Arcos de Pedro, D. Bekermann, D. Barreca, R.A. Fischer,
A. Devi, Crystal Growth & Design (2012) 5079–5089.
date_created: 2021-07-07T11:14:37Z
date_updated: 2023-01-24T08:24:20Z
department:
- _id: '302'
doi: 10.1021/cg3010147
extern: '1'
language:
- iso: eng
page: 5079-5089
publication: Crystal Growth & Design
publication_identifier:
issn:
- 1528-7483
- 1528-7505
publication_status: published
status: public
title: Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition
Employing New Zr Precursors
type: journal_article
user_id: '54556'
year: '2012'
...
---
_id: '22602'
article_number: '13936'
author:
- first_name: Andrian P.
full_name: Milanov, Andrian P.
last_name: Milanov
- first_name: Ke
full_name: Xu, Ke
last_name: Xu
- first_name: Stefan
full_name: Cwik, Stefan
last_name: Cwik
- first_name: Harish
full_name: Parala, Harish
last_name: Parala
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Hans-Werner
full_name: Becker, Hans-Werner
last_name: Becker
- first_name: Detlef
full_name: Rogalla, Detlef
last_name: Rogalla
- first_name: Richard
full_name: Cross, Richard
last_name: Cross
- first_name: Shashi
full_name: Paul, Shashi
last_name: Paul
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: Milanov AP, Xu K, Cwik S, et al. Sc2O3, Er2O3, and Y2O3 thin films by MOCVD
from volatile guanidinate class of rare-earth precursors. Dalton Transactions.
Published online 2012. doi:10.1039/c2dt31219k
apa: Milanov, A. P., Xu, K., Cwik, S., Parala, H., de los Arcos de Pedro, M. T.,
Becker, H.-W., Rogalla, D., Cross, R., Paul, S., & Devi, A. (2012). Sc2O3,
Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class of rare-earth
precursors. Dalton Transactions, Article 13936. https://doi.org/10.1039/c2dt31219k
bibtex: '@article{Milanov_Xu_Cwik_Parala_de los Arcos de Pedro_Becker_Rogalla_Cross_Paul_Devi_2012,
title={Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class
of rare-earth precursors}, DOI={10.1039/c2dt31219k},
number={13936}, journal={Dalton Transactions}, author={Milanov, Andrian P. and
Xu, Ke and Cwik, Stefan and Parala, Harish and de los Arcos de Pedro, Maria Teresa
and Becker, Hans-Werner and Rogalla, Detlef and Cross, Richard and Paul, Shashi
and Devi, Anjana}, year={2012} }'
chicago: Milanov, Andrian P., Ke Xu, Stefan Cwik, Harish Parala, Maria Teresa de
los Arcos de Pedro, Hans-Werner Becker, Detlef Rogalla, Richard Cross, Shashi
Paul, and Anjana Devi. “Sc2O3, Er2O3, and Y2O3 Thin Films by MOCVD from Volatile
Guanidinate Class of Rare-Earth Precursors.” Dalton Transactions, 2012.
https://doi.org/10.1039/c2dt31219k.
ieee: 'A. P. Milanov et al., “Sc2O3, Er2O3, and Y2O3 thin films by MOCVD
from volatile guanidinate class of rare-earth precursors,” Dalton Transactions,
Art. no. 13936, 2012, doi: 10.1039/c2dt31219k.'
mla: Milanov, Andrian P., et al. “Sc2O3, Er2O3, and Y2O3 Thin Films by MOCVD from
Volatile Guanidinate Class of Rare-Earth Precursors.” Dalton Transactions,
13936, 2012, doi:10.1039/c2dt31219k.
short: A.P. Milanov, K. Xu, S. Cwik, H. Parala, M.T. de los Arcos de Pedro, H.-W.
Becker, D. Rogalla, R. Cross, S. Paul, A. Devi, Dalton Transactions (2012).
date_created: 2021-07-07T11:26:57Z
date_updated: 2023-01-24T08:25:43Z
department:
- _id: '302'
doi: 10.1039/c2dt31219k
extern: '1'
language:
- iso: eng
publication: Dalton Transactions
publication_identifier:
issn:
- 1477-9226
- 1477-9234
publication_status: published
status: public
title: Sc2O3, Er2O3, and Y2O3 thin films by MOCVD from volatile guanidinate class
of rare-earth precursors
type: journal_article
user_id: '54556'
year: '2012'
...
---
_id: '22604'
author:
- first_name: Rüdiger
full_name: Reuter, Rüdiger
last_name: Reuter
- first_name: Katja
full_name: Rügner, Katja
last_name: Rügner
- first_name: Dirk
full_name: Ellerweg, Dirk
last_name: Ellerweg
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
- first_name: Jan
full_name: Benedikt, Jan
last_name: Benedikt
citation:
ama: Reuter R, Rügner K, Ellerweg D, de los Arcos de Pedro MT, von Keudell A, Benedikt
J. The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide
like Films from HMDSO at Atmospheric Pressure. Plasma Processes and Polymers.
Published online 2012:1116-1124. doi:10.1002/ppap.201100146
apa: Reuter, R., Rügner, K., Ellerweg, D., de los Arcos de Pedro, M. T., von Keudell,
A., & Benedikt, J. (2012). The Role of Oxygen and Surface Reactions in the
Deposition of Silicon Oxide like Films from HMDSO at Atmospheric Pressure. Plasma
Processes and Polymers, 1116–1124. https://doi.org/10.1002/ppap.201100146
bibtex: '@article{Reuter_Rügner_Ellerweg_de los Arcos de Pedro_von Keudell_Benedikt_2012,
title={The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide
like Films from HMDSO at Atmospheric Pressure}, DOI={10.1002/ppap.201100146},
journal={Plasma Processes and Polymers}, author={Reuter, Rüdiger and Rügner, Katja
and Ellerweg, Dirk and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim
and Benedikt, Jan}, year={2012}, pages={1116–1124} }'
chicago: Reuter, Rüdiger, Katja Rügner, Dirk Ellerweg, Maria Teresa de los Arcos
de Pedro, Achim von Keudell, and Jan Benedikt. “The Role of Oxygen and Surface
Reactions in the Deposition of Silicon Oxide like Films from HMDSO at Atmospheric
Pressure.” Plasma Processes and Polymers, 2012, 1116–24. https://doi.org/10.1002/ppap.201100146.
ieee: 'R. Reuter, K. Rügner, D. Ellerweg, M. T. de los Arcos de Pedro, A. von Keudell,
and J. Benedikt, “The Role of Oxygen and Surface Reactions in the Deposition of
Silicon Oxide like Films from HMDSO at Atmospheric Pressure,” Plasma Processes
and Polymers, pp. 1116–1124, 2012, doi: 10.1002/ppap.201100146.'
mla: Reuter, Rüdiger, et al. “The Role of Oxygen and Surface Reactions in the Deposition
of Silicon Oxide like Films from HMDSO at Atmospheric Pressure.” Plasma Processes
and Polymers, 2012, pp. 1116–24, doi:10.1002/ppap.201100146.
short: R. Reuter, K. Rügner, D. Ellerweg, M.T. de los Arcos de Pedro, A. von Keudell,
J. Benedikt, Plasma Processes and Polymers (2012) 1116–1124.
date_created: 2021-07-07T11:30:59Z
date_updated: 2023-01-24T08:26:12Z
department:
- _id: '302'
doi: 10.1002/ppap.201100146
extern: '1'
language:
- iso: eng
page: 1116-1124
publication: Plasma Processes and Polymers
publication_identifier:
issn:
- 1612-8850
publication_status: published
status: public
title: The Role of Oxygen and Surface Reactions in the Deposition of Silicon Oxide
like Films from HMDSO at Atmospheric Pressure
type: journal_article
user_id: '54556'
year: '2012'
...
---
_id: '22599'
article_number: '114101'
author:
- first_name: A. P.
full_name: Ehiasarian, A. P.
last_name: Ehiasarian
- first_name: A.
full_name: Hecimovic, A.
last_name: Hecimovic
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: R.
full_name: New, R.
last_name: New
- first_name: V.
full_name: Schulz-von der Gathen, V.
last_name: Schulz-von der Gathen
- first_name: M.
full_name: Böke, M.
last_name: Böke
- first_name: J.
full_name: Winter, J.
last_name: Winter
citation:
ama: 'Ehiasarian AP, Hecimovic A, de los Arcos de Pedro MT, et al. High power impulse
magnetron sputtering discharges: Instabilities and plasma self-organization. Applied
Physics Letters. Published online 2012. doi:10.1063/1.3692172'
apa: 'Ehiasarian, A. P., Hecimovic, A., de los Arcos de Pedro, M. T., New, R., Schulz-von
der Gathen, V., Böke, M., & Winter, J. (2012). High power impulse magnetron
sputtering discharges: Instabilities and plasma self-organization. Applied
Physics Letters, Article 114101. https://doi.org/10.1063/1.3692172'
bibtex: '@article{Ehiasarian_Hecimovic_de los Arcos de Pedro_New_Schulz-von der
Gathen_Böke_Winter_2012, title={High power impulse magnetron sputtering discharges:
Instabilities and plasma self-organization}, DOI={10.1063/1.3692172},
number={114101}, journal={Applied Physics Letters}, author={Ehiasarian, A. P.
and Hecimovic, A. and de los Arcos de Pedro, Maria Teresa and New, R. and Schulz-von
der Gathen, V. and Böke, M. and Winter, J.}, year={2012} }'
chicago: 'Ehiasarian, A. P., A. Hecimovic, Maria Teresa de los Arcos de Pedro, R.
New, V. Schulz-von der Gathen, M. Böke, and J. Winter. “High Power Impulse Magnetron
Sputtering Discharges: Instabilities and Plasma Self-Organization.” Applied
Physics Letters, 2012. https://doi.org/10.1063/1.3692172.'
ieee: 'A. P. Ehiasarian et al., “High power impulse magnetron sputtering
discharges: Instabilities and plasma self-organization,” Applied Physics Letters,
Art. no. 114101, 2012, doi: 10.1063/1.3692172.'
mla: 'Ehiasarian, A. P., et al. “High Power Impulse Magnetron Sputtering Discharges:
Instabilities and Plasma Self-Organization.” Applied Physics Letters, 114101,
2012, doi:10.1063/1.3692172.'
short: A.P. Ehiasarian, A. Hecimovic, M.T. de los Arcos de Pedro, R. New, V. Schulz-von
der Gathen, M. Böke, J. Winter, Applied Physics Letters (2012).
date_created: 2021-07-07T11:22:50Z
date_updated: 2023-01-24T08:24:51Z
department:
- _id: '302'
doi: 10.1063/1.3692172
extern: '1'
language:
- iso: eng
publication: Applied Physics Letters
publication_identifier:
issn:
- 0003-6951
- 1077-3118
publication_status: published
status: public
title: 'High power impulse magnetron sputtering discharges: Instabilities and plasma
self-organization'
type: journal_article
user_id: '54556'
year: '2012'
...
---
_id: '22601'
author:
- first_name: L.
full_name: Marot, L.
last_name: Marot
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: A.M.
full_name: Bünzli, A.M.
last_name: Bünzli
- first_name: C.
full_name: Wäckerlin, C.
last_name: Wäckerlin
- first_name: R.
full_name: Steiner, R.
last_name: Steiner
- first_name: P.
full_name: Oelhafen, P.
last_name: Oelhafen
- first_name: E.
full_name: Meyer, E.
last_name: Meyer
- first_name: D.
full_name: Mathys, D.
last_name: Mathys
- first_name: P.
full_name: Spätig, P.
last_name: Spätig
- first_name: G.
full_name: Covarel, G.
last_name: Covarel
citation:
ama: Marot L, de los Arcos de Pedro MT, Bünzli AM, et al. Nanocomposites of carbon
nanotubes embedded in a (Ti,Al)N coated film. Surface and Coatings Technology.
Published online 2012:223-228. doi:10.1016/j.surfcoat.2012.09.053
apa: Marot, L., de los Arcos de Pedro, M. T., Bünzli, A. M., Wäckerlin, C., Steiner,
R., Oelhafen, P., Meyer, E., Mathys, D., Spätig, P., & Covarel, G. (2012).
Nanocomposites of carbon nanotubes embedded in a (Ti,Al)N coated film. Surface
and Coatings Technology, 223–228. https://doi.org/10.1016/j.surfcoat.2012.09.053
bibtex: '@article{Marot_de los Arcos de Pedro_Bünzli_Wäckerlin_Steiner_Oelhafen_Meyer_Mathys_Spätig_Covarel_2012,
title={Nanocomposites of carbon nanotubes embedded in a (Ti,Al)N coated film},
DOI={10.1016/j.surfcoat.2012.09.053},
journal={Surface and Coatings Technology}, author={Marot, L. and de los Arcos
de Pedro, Maria Teresa and Bünzli, A.M. and Wäckerlin, C. and Steiner, R. and
Oelhafen, P. and Meyer, E. and Mathys, D. and Spätig, P. and Covarel, G.}, year={2012},
pages={223–228} }'
chicago: Marot, L., Maria Teresa de los Arcos de Pedro, A.M. Bünzli, C. Wäckerlin,
R. Steiner, P. Oelhafen, E. Meyer, D. Mathys, P. Spätig, and G. Covarel. “Nanocomposites
of Carbon Nanotubes Embedded in a (Ti,Al)N Coated Film.” Surface and Coatings
Technology, 2012, 223–28. https://doi.org/10.1016/j.surfcoat.2012.09.053.
ieee: 'L. Marot et al., “Nanocomposites of carbon nanotubes embedded in a
(Ti,Al)N coated film,” Surface and Coatings Technology, pp. 223–228, 2012,
doi: 10.1016/j.surfcoat.2012.09.053.'
mla: Marot, L., et al. “Nanocomposites of Carbon Nanotubes Embedded in a (Ti,Al)N
Coated Film.” Surface and Coatings Technology, 2012, pp. 223–28, doi:10.1016/j.surfcoat.2012.09.053.
short: L. Marot, M.T. de los Arcos de Pedro, A.M. Bünzli, C. Wäckerlin, R. Steiner,
P. Oelhafen, E. Meyer, D. Mathys, P. Spätig, G. Covarel, Surface and Coatings
Technology (2012) 223–228.
date_created: 2021-07-07T11:26:42Z
date_updated: 2023-01-24T08:25:27Z
department:
- _id: '302'
doi: 10.1016/j.surfcoat.2012.09.053
extern: '1'
language:
- iso: eng
page: 223-228
publication: Surface and Coatings Technology
publication_identifier:
issn:
- 0257-8972
publication_status: published
status: public
title: Nanocomposites of carbon nanotubes embedded in a (Ti,Al)N coated film
type: journal_article
user_id: '54556'
year: '2012'
...
---
_id: '22603'
article_number: '103306'
author:
- first_name: Marina
full_name: Prenzel, Marina
last_name: Prenzel
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Annika
full_name: Kortmann, Annika
last_name: Kortmann
- first_name: Jörg
full_name: Winter, Jörg
last_name: Winter
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
citation:
ama: Prenzel M, de los Arcos de Pedro MT, Kortmann A, Winter J, von Keudell A. Embedded
argon as a tool for sampling local structure in thin plasma deposited aluminum
oxide films. Journal of Applied Physics. Published online 2012. doi:10.1063/1.4767383
apa: Prenzel, M., de los Arcos de Pedro, M. T., Kortmann, A., Winter, J., &
von Keudell, A. (2012). Embedded argon as a tool for sampling local structure
in thin plasma deposited aluminum oxide films. Journal of Applied Physics,
Article 103306. https://doi.org/10.1063/1.4767383
bibtex: '@article{Prenzel_de los Arcos de Pedro_Kortmann_Winter_von Keudell_2012,
title={Embedded argon as a tool for sampling local structure in thin plasma deposited
aluminum oxide films}, DOI={10.1063/1.4767383},
number={103306}, journal={Journal of Applied Physics}, author={Prenzel, Marina
and de los Arcos de Pedro, Maria Teresa and Kortmann, Annika and Winter, Jörg
and von Keudell, Achim}, year={2012} }'
chicago: Prenzel, Marina, Maria Teresa de los Arcos de Pedro, Annika Kortmann, Jörg
Winter, and Achim von Keudell. “Embedded Argon as a Tool for Sampling Local Structure
in Thin Plasma Deposited Aluminum Oxide Films.” Journal of Applied Physics,
2012. https://doi.org/10.1063/1.4767383.
ieee: 'M. Prenzel, M. T. de los Arcos de Pedro, A. Kortmann, J. Winter, and A. von
Keudell, “Embedded argon as a tool for sampling local structure in thin plasma
deposited aluminum oxide films,” Journal of Applied Physics, Art. no. 103306,
2012, doi: 10.1063/1.4767383.'
mla: Prenzel, Marina, et al. “Embedded Argon as a Tool for Sampling Local Structure
in Thin Plasma Deposited Aluminum Oxide Films.” Journal of Applied Physics,
103306, 2012, doi:10.1063/1.4767383.
short: M. Prenzel, M.T. de los Arcos de Pedro, A. Kortmann, J. Winter, A. von Keudell,
Journal of Applied Physics (2012).
date_created: 2021-07-07T11:30:38Z
date_updated: 2023-01-24T08:25:58Z
department:
- _id: '302'
doi: 10.1063/1.4767383
extern: '1'
language:
- iso: eng
publication: Journal of Applied Physics
publication_identifier:
issn:
- 0021-8979
- 1089-7550
publication_status: published
status: public
title: Embedded argon as a tool for sampling local structure in thin plasma deposited
aluminum oxide films
type: journal_article
user_id: '54556'
year: '2012'
...
---
_id: '22600'
article_number: '035017'
author:
- first_name: A
full_name: Hecimovic, A
last_name: Hecimovic
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: V
full_name: Schulz-von der Gathen, V
last_name: Schulz-von der Gathen
- first_name: M
full_name: Böke, M
last_name: Böke
- first_name: J
full_name: Winter, J
last_name: Winter
citation:
ama: Hecimovic A, de los Arcos de Pedro MT, Schulz-von der Gathen V, Böke M, Winter
J. Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma
discharges. Plasma Sources Science and Technology. Published online 2012.
doi:10.1088/0963-0252/21/3/035017
apa: Hecimovic, A., de los Arcos de Pedro, M. T., Schulz-von der Gathen, V., Böke,
M., & Winter, J. (2012). Temporal evolution of the radial plasma emissivity
profile in HIPIMS plasma discharges. Plasma Sources Science and Technology,
Article 035017. https://doi.org/10.1088/0963-0252/21/3/035017
bibtex: '@article{Hecimovic_de los Arcos de Pedro_Schulz-von der Gathen_Böke_Winter_2012,
title={Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma
discharges}, DOI={10.1088/0963-0252/21/3/035017},
number={035017}, journal={Plasma Sources Science and Technology}, author={Hecimovic,
A and de los Arcos de Pedro, Maria Teresa and Schulz-von der Gathen, V and Böke,
M and Winter, J}, year={2012} }'
chicago: Hecimovic, A, Maria Teresa de los Arcos de Pedro, V Schulz-von der Gathen,
M Böke, and J Winter. “Temporal Evolution of the Radial Plasma Emissivity Profile
in HIPIMS Plasma Discharges.” Plasma Sources Science and Technology, 2012.
https://doi.org/10.1088/0963-0252/21/3/035017.
ieee: 'A. Hecimovic, M. T. de los Arcos de Pedro, V. Schulz-von der Gathen, M. Böke,
and J. Winter, “Temporal evolution of the radial plasma emissivity profile in
HIPIMS plasma discharges,” Plasma Sources Science and Technology, Art.
no. 035017, 2012, doi: 10.1088/0963-0252/21/3/035017.'
mla: Hecimovic, A., et al. “Temporal Evolution of the Radial Plasma Emissivity Profile
in HIPIMS Plasma Discharges.” Plasma Sources Science and Technology, 035017,
2012, doi:10.1088/0963-0252/21/3/035017.
short: A. Hecimovic, M.T. de los Arcos de Pedro, V. Schulz-von der Gathen, M. Böke,
J. Winter, Plasma Sources Science and Technology (2012).
date_created: 2021-07-07T11:23:01Z
date_updated: 2023-01-24T08:25:05Z
department:
- _id: '302'
doi: 10.1088/0963-0252/21/3/035017
extern: '1'
language:
- iso: eng
publication: Plasma Sources Science and Technology
publication_identifier:
issn:
- 0963-0252
- 1361-6595
publication_status: published
status: public
title: Temporal evolution of the radial plasma emissivity profile in HIPIMS plasma
discharges
type: journal_article
user_id: '54556'
year: '2012'
...
---
_id: '22605'
article_number: '024007'
author:
- first_name: D
full_name: Schröder, D
last_name: Schröder
- first_name: H
full_name: Bahre, H
last_name: Bahre
- first_name: N
full_name: Knake, N
last_name: Knake
- first_name: J
full_name: Winter, J
last_name: Winter
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: V
full_name: Schulz-von der Gathen, V
last_name: Schulz-von der Gathen
citation:
ama: Schröder D, Bahre H, Knake N, Winter J, de los Arcos de Pedro MT, Schulz-von
der Gathen V. Influence of target surfaces on the atomic oxygen distribution in
the effluent of a micro-scaled atmospheric pressure plasma jet. Plasma Sources
Science and Technology. Published online 2012. doi:10.1088/0963-0252/21/2/024007
apa: Schröder, D., Bahre, H., Knake, N., Winter, J., de los Arcos de Pedro, M. T.,
& Schulz-von der Gathen, V. (2012). Influence of target surfaces on the atomic
oxygen distribution in the effluent of a micro-scaled atmospheric pressure plasma
jet. Plasma Sources Science and Technology, Article 024007. https://doi.org/10.1088/0963-0252/21/2/024007
bibtex: '@article{Schröder_Bahre_Knake_Winter_de los Arcos de Pedro_Schulz-von der
Gathen_2012, title={Influence of target surfaces on the atomic oxygen distribution
in the effluent of a micro-scaled atmospheric pressure plasma jet}, DOI={10.1088/0963-0252/21/2/024007},
number={024007}, journal={Plasma Sources Science and Technology}, author={Schröder,
D and Bahre, H and Knake, N and Winter, J and de los Arcos de Pedro, Maria Teresa
and Schulz-von der Gathen, V}, year={2012} }'
chicago: Schröder, D, H Bahre, N Knake, J Winter, Maria Teresa de los Arcos de Pedro,
and V Schulz-von der Gathen. “Influence of Target Surfaces on the Atomic Oxygen
Distribution in the Effluent of a Micro-Scaled Atmospheric Pressure Plasma Jet.”
Plasma Sources Science and Technology, 2012. https://doi.org/10.1088/0963-0252/21/2/024007.
ieee: 'D. Schröder, H. Bahre, N. Knake, J. Winter, M. T. de los Arcos de Pedro,
and V. Schulz-von der Gathen, “Influence of target surfaces on the atomic oxygen
distribution in the effluent of a micro-scaled atmospheric pressure plasma jet,”
Plasma Sources Science and Technology, Art. no. 024007, 2012, doi: 10.1088/0963-0252/21/2/024007.'
mla: Schröder, D., et al. “Influence of Target Surfaces on the Atomic Oxygen Distribution
in the Effluent of a Micro-Scaled Atmospheric Pressure Plasma Jet.” Plasma
Sources Science and Technology, 024007, 2012, doi:10.1088/0963-0252/21/2/024007.
short: D. Schröder, H. Bahre, N. Knake, J. Winter, M.T. de los Arcos de Pedro, V.
Schulz-von der Gathen, Plasma Sources Science and Technology (2012).
date_created: 2021-07-07T11:31:09Z
date_updated: 2023-01-24T08:26:27Z
department:
- _id: '302'
doi: 10.1088/0963-0252/21/2/024007
extern: '1'
language:
- iso: eng
publication: Plasma Sources Science and Technology
publication_identifier:
issn:
- 0963-0252
- 1361-6595
publication_status: published
status: public
title: Influence of target surfaces on the atomic oxygen distribution in the effluent
of a micro-scaled atmospheric pressure plasma jet
type: journal_article
user_id: '54556'
year: '2012'
...