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Grundmeier, “UHV AFM based colloidal probe studies of adhesive properties of VAlN hard coatings,” <i>Applied Surface Science</i>, pp. 767–774, 2017, doi: <a href=\"https://doi.org/10.1016/j.apsusc.2017.09.208\">10.1016/j.apsusc.2017.09.208</a>.","chicago":"Wiesing, M., Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “UHV AFM Based Colloidal Probe Studies of Adhesive Properties of VAlN Hard Coatings.” <i>Applied Surface Science</i>, 2017, 767–74. <a href=\"https://doi.org/10.1016/j.apsusc.2017.09.208\">https://doi.org/10.1016/j.apsusc.2017.09.208</a>.","ama":"Wiesing M, de los Arcos de Pedro MT, Grundmeier G. UHV AFM based colloidal probe studies of adhesive properties of VAlN hard coatings. <i>Applied Surface Science</i>. 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UHV AFM based colloidal probe studies of adhesive properties of VAlN hard coatings. <i>Applied Surface Science</i>, 767–774. <a href=\"https://doi.org/10.1016/j.apsusc.2017.09.208\">https://doi.org/10.1016/j.apsusc.2017.09.208</a>"},"year":"2017","publication_identifier":{"issn":["0169-4332"]},"publication_status":"published"},{"date_updated":"2023-01-24T08:15:24Z","author":[{"full_name":"Mitschker, F","last_name":"Mitschker","first_name":"F"},{"full_name":"Steves, S","last_name":"Steves","first_name":"S"},{"last_name":"Gebhard","full_name":"Gebhard, M","first_name":"M"},{"full_name":"Rudolph, M","last_name":"Rudolph","first_name":"M"},{"first_name":"L","full_name":"Schücke, L","last_name":"Schücke"},{"last_name":"Kirchheim","full_name":"Kirchheim, D","first_name":"D"},{"last_name":"Jaritz","full_name":"Jaritz, M","first_name":"M"},{"first_name":"M","last_name":"Brochhagen","full_name":"Brochhagen, M"},{"first_name":"Ch","last_name":"Hoppe","full_name":"Hoppe, Ch"},{"full_name":"Dahlmann, R","last_name":"Dahlmann","first_name":"R"},{"full_name":"Böke, M","last_name":"Böke","first_name":"M"},{"last_name":"Benedikt","full_name":"Benedikt, J","first_name":"J"},{"first_name":"I","full_name":"Giner, I","last_name":"Giner"},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"first_name":"Ch","last_name":"Hopmann","full_name":"Hopmann, Ch"},{"full_name":"Grundmeier, G","last_name":"Grundmeier","first_name":"G"},{"full_name":"Devi, A","last_name":"Devi","first_name":"A"},{"first_name":"P","last_name":"Awakowicz","full_name":"Awakowicz, P"}],"date_created":"2021-07-07T09:09:32Z","title":"Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence","doi":"10.1088/1361-6463/aa6e28","publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","year":"2017","citation":{"mla":"Mitschker, F., et al. “Influence of PE-CVD and PE-ALD on Defect Formation in Permeation Barrier Films on PET and Correlation to Atomic Oxygen Fluence.” <i>Journal of Physics D: Applied Physics</i>, 235201, 2017, doi:<a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">10.1088/1361-6463/aa6e28</a>.","bibtex":"@article{Mitschker_Steves_Gebhard_Rudolph_Schücke_Kirchheim_Jaritz_Brochhagen_Hoppe_Dahlmann_et al._2017, title={Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">10.1088/1361-6463/aa6e28</a>}, number={235201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Steves, S and Gebhard, M and Rudolph, M and Schücke, L and Kirchheim, D and Jaritz, M and Brochhagen, M and Hoppe, Ch and Dahlmann, R and et al.}, year={2017} }","short":"F. Mitschker, S. Steves, M. Gebhard, M. Rudolph, L. Schücke, D. Kirchheim, M. Jaritz, M. Brochhagen, C. Hoppe, R. Dahlmann, M. Böke, J. Benedikt, I. Giner, M.T. de los Arcos de Pedro, C. Hopmann, G. Grundmeier, A. Devi, P. Awakowicz, Journal of Physics D: Applied Physics (2017).","apa":"Mitschker, F., Steves, S., Gebhard, M., Rudolph, M., Schücke, L., Kirchheim, D., Jaritz, M., Brochhagen, M., Hoppe, C., Dahlmann, R., Böke, M., Benedikt, J., Giner, I., de los Arcos de Pedro, M. T., Hopmann, C., Grundmeier, G., Devi, A., &#38; Awakowicz, P. (2017). Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence. <i>Journal of Physics D: Applied Physics</i>, Article 235201. <a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">https://doi.org/10.1088/1361-6463/aa6e28</a>","chicago":"Mitschker, F, S Steves, M Gebhard, M Rudolph, L Schücke, D Kirchheim, M Jaritz, et al. “Influence of PE-CVD and PE-ALD on Defect Formation in Permeation Barrier Films on PET and Correlation to Atomic Oxygen Fluence.” <i>Journal of Physics D: Applied Physics</i>, 2017. <a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">https://doi.org/10.1088/1361-6463/aa6e28</a>.","ieee":"F. Mitschker <i>et al.</i>, “Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 235201, 2017, doi: <a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">10.1088/1361-6463/aa6e28</a>.","ama":"Mitschker F, Steves S, Gebhard M, et al. Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence. <i>Journal of Physics D: Applied Physics</i>. 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Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development. <i>Chemistry - A European Journal</i>. Published online 2017:10768-10772. doi:<a href=\"https://doi.org/10.1002/chem.201702939\">10.1002/chem.201702939</a>","ieee":"L. Mai <i>et al.</i>, “Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development,” <i>Chemistry - A European Journal</i>, pp. 10768–10772, 2017, doi: <a href=\"https://doi.org/10.1002/chem.201702939\">10.1002/chem.201702939</a>.","chicago":"Mai, Lukas, Maximilian Gebhard, Maria Teresa de los Arcos de Pedro, Ignacio Giner, Felix Mitschker, Manuela Winter, Harish Parala, Peter Awakowicz, Guido Grundmeier, and Anjana Devi. “Unearthing [3-(Dimethylamino)Propyl]Aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development.” <i>Chemistry - A European Journal</i>, 2017, 10768–72. <a href=\"https://doi.org/10.1002/chem.201702939\">https://doi.org/10.1002/chem.201702939</a>.","bibtex":"@article{Mai_Gebhard_de los Arcos de Pedro_Giner_Mitschker_Winter_Parala_Awakowicz_Grundmeier_Devi_2017, title={Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development}, DOI={<a href=\"https://doi.org/10.1002/chem.201702939\">10.1002/chem.201702939</a>}, journal={Chemistry - A European Journal}, author={Mai, Lukas and Gebhard, Maximilian and de los Arcos de Pedro, Maria Teresa and Giner, Ignacio and Mitschker, Felix and Winter, Manuela and Parala, Harish and Awakowicz, Peter and Grundmeier, Guido and Devi, Anjana}, year={2017}, pages={10768–10772} }","short":"L. Mai, M. Gebhard, M.T. de los Arcos de Pedro, I. Giner, F. Mitschker, M. Winter, H. Parala, P. Awakowicz, G. Grundmeier, A. Devi, Chemistry - A European Journal (2017) 10768–10772.","mla":"Mai, Lukas, et al. “Unearthing [3-(Dimethylamino)Propyl]Aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development.” <i>Chemistry - A European Journal</i>, 2017, pp. 10768–72, doi:<a href=\"https://doi.org/10.1002/chem.201702939\">10.1002/chem.201702939</a>.","apa":"Mai, L., Gebhard, M., de los Arcos de Pedro, M. T., Giner, I., Mitschker, F., Winter, M., Parala, H., Awakowicz, P., Grundmeier, G., &#38; Devi, A. (2017). Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development. <i>Chemistry - A European Journal</i>, 10768–10772. <a href=\"https://doi.org/10.1002/chem.201702939\">https://doi.org/10.1002/chem.201702939</a>"},"page":"10768-10772","year":"2017"},{"status":"public","type":"journal_article","publication":"Journal of Applied Physics","language":[{"iso":"eng"}],"article_number":"171912","user_id":"54556","department":[{"_id":"302"}],"_id":"22569","citation":{"short":"V. Layes, S. Monje, C. Corbella, V. 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T., Awakowicz, P., &#38; Grundmeier, G. (2017). Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. <i>Journal of Physics D: Applied Physics</i>, Article 204002. <a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">https://doi.org/10.1088/1361-6463/aa69e5</a>","mla":"Hoppe, C., et al. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>, 204002, 2017, doi:<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>.","short":"C. Hoppe, F. Mitschker, I. Giner, M.T. de los Arcos de Pedro, P. Awakowicz, G. 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Published online 2017. doi:<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>"}},{"doi":"10.1063/1.4976999","title":"Species transport on the target during high power impulse magnetron sputtering","author":[{"last_name":"Layes","full_name":"Layes, V.","first_name":"V."},{"first_name":"S.","full_name":"Monje, S.","last_name":"Monje"},{"first_name":"C.","full_name":"Corbella, C.","last_name":"Corbella"},{"first_name":"J.","full_name":"Trieschmann, J.","last_name":"Trieschmann"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"first_name":"A.","full_name":"von Keudell, A.","last_name":"von Keudell"}],"date_created":"2021-07-07T09:08:37Z","date_updated":"2023-01-24T08:13:37Z","citation":{"ama":"Layes V, Monje S, Corbella C, Trieschmann J, de los Arcos de Pedro MT, von Keudell A. 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Published online 2017."},"ipn":"EP000003124573A1","title":"Liquid crystal medium and liquid crystal display","date_updated":"2023-01-28T18:48:35Z","ipc":"EP000003124573A1","author":[{"first_name":"D.","last_name":"Wilkes","full_name":"Wilkes, D."},{"first_name":"M.","full_name":"Wittek, M.","last_name":"Wittek"},{"first_name":"A.","full_name":"Hoischen, A.","last_name":"Hoischen"},{"first_name":"Heinz-Siegfried","id":"254","full_name":"Kitzerow, Heinz-Siegfried","last_name":"Kitzerow"},{"last_name":"Nordendorf","full_name":"Nordendorf, G.","first_name":"G."},{"full_name":"Schmidtke, J.","last_name":"Schmidtke","first_name":"J."}],"date_created":"2023-01-28T18:47:33Z","status":"public","type":"patent","publication_date":"2017-02-01","_id":"40638","user_id":"254","department":[{"_id":"313"},{"_id":"230"},{"_id":"638"}]}]