[{"title":"Full-Swing, High-Gain Inverters Based on ZnSnO JFETs and MESFETs","doi":"10.1109/ted.2019.2922696","publisher":"Institute of Electrical and Electronics Engineers (IEEE)","date_updated":"2023-01-24T17:21:37Z","author":[{"last_name":"Lahr","full_name":"Lahr, Oliver","first_name":"Oliver"},{"first_name":"Zhipeng","last_name":"Zhang","full_name":"Zhang, Zhipeng"},{"first_name":"Frank","last_name":"Grotjahn","full_name":"Grotjahn, Frank"},{"full_name":"Schlupp, Peter","last_name":"Schlupp","first_name":"Peter"},{"last_name":"Vogt","full_name":"Vogt, Sofie","first_name":"Sofie"},{"last_name":"von Wenckstern","full_name":"von Wenckstern, Holger","first_name":"Holger"},{"first_name":"Andreas","last_name":"Thiede","id":"538","full_name":"Thiede, Andreas"},{"first_name":"Marius","last_name":"Grundmann","full_name":"Grundmann, Marius"}],"date_created":"2023-01-24T17:20:18Z","volume":66,"year":"2019","citation":{"mla":"Lahr, Oliver, et al. “Full-Swing, High-Gain Inverters Based on ZnSnO JFETs and MESFETs.” <i>IEEE Transactions on Electron Devices</i>, vol. 66, no. 8, Institute of Electrical and Electronics Engineers (IEEE), 2019, pp. 3376–81, doi:<a href=\"https://doi.org/10.1109/ted.2019.2922696\">10.1109/ted.2019.2922696</a>.","short":"O. Lahr, Z. Zhang, F. Grotjahn, P. Schlupp, S. Vogt, H. von Wenckstern, A. Thiede, M. Grundmann, IEEE Transactions on Electron Devices 66 (2019) 3376–3381.","bibtex":"@article{Lahr_Zhang_Grotjahn_Schlupp_Vogt_von Wenckstern_Thiede_Grundmann_2019, title={Full-Swing, High-Gain Inverters Based on ZnSnO JFETs and MESFETs}, volume={66}, DOI={<a href=\"https://doi.org/10.1109/ted.2019.2922696\">10.1109/ted.2019.2922696</a>}, number={8}, journal={IEEE Transactions on Electron Devices}, publisher={Institute of Electrical and Electronics Engineers (IEEE)}, author={Lahr, Oliver and Zhang, Zhipeng and Grotjahn, Frank and Schlupp, Peter and Vogt, Sofie and von Wenckstern, Holger and Thiede, Andreas and Grundmann, Marius}, year={2019}, pages={3376–3381} }","apa":"Lahr, O., Zhang, Z., Grotjahn, F., Schlupp, P., Vogt, S., von Wenckstern, H., Thiede, A., &#38; Grundmann, M. (2019). Full-Swing, High-Gain Inverters Based on ZnSnO JFETs and MESFETs. <i>IEEE Transactions on Electron Devices</i>, <i>66</i>(8), 3376–3381. <a href=\"https://doi.org/10.1109/ted.2019.2922696\">https://doi.org/10.1109/ted.2019.2922696</a>","ama":"Lahr O, Zhang Z, Grotjahn F, et al. Full-Swing, High-Gain Inverters Based on ZnSnO JFETs and MESFETs. <i>IEEE Transactions on Electron Devices</i>. 2019;66(8):3376-3381. doi:<a href=\"https://doi.org/10.1109/ted.2019.2922696\">10.1109/ted.2019.2922696</a>","ieee":"O. Lahr <i>et al.</i>, “Full-Swing, High-Gain Inverters Based on ZnSnO JFETs and MESFETs,” <i>IEEE Transactions on Electron Devices</i>, vol. 66, no. 8, pp. 3376–3381, 2019, doi: <a href=\"https://doi.org/10.1109/ted.2019.2922696\">10.1109/ted.2019.2922696</a>.","chicago":"Lahr, Oliver, Zhipeng Zhang, Frank Grotjahn, Peter Schlupp, Sofie Vogt, Holger von Wenckstern, Andreas Thiede, and Marius Grundmann. “Full-Swing, High-Gain Inverters Based on ZnSnO JFETs and MESFETs.” <i>IEEE Transactions on Electron Devices</i> 66, no. 8 (2019): 3376–81. <a href=\"https://doi.org/10.1109/ted.2019.2922696\">https://doi.org/10.1109/ted.2019.2922696</a>."},"intvolume":"        66","page":"3376-3381","publication_status":"published","publication_identifier":{"issn":["0018-9383","1557-9646"]},"issue":"8","keyword":["Electrical and Electronic Engineering","Electronic","Optical and Magnetic Materials"],"language":[{"iso":"eng"}],"_id":"39649","user_id":"158","department":[{"_id":"51"}],"abstract":[{"lang":"eng","text":"Metal-semiconductor and junction n-channel field-effect transistors (MESFETs and JFETs) have been fabricated on glass substrates using room temperature deposited amorphous zinc-tin oxide (ZTO) channel layers. Characteristics of transistors and inverter circuits are compared. Best FET devices exhibit ON-to- OFF current ratios over eight orders of magnitude, subthreshold swings as low as 250 mV/dec and field-effect mobilities of 5 cm 2 /Vs. Furthermore, all devices show long-term stability over a period of more than 200 days. Inverters fabricated using either MESFETs or JFETs exhibit remarkable peak gain magnitude values of 350 and voltage uncertainty levels as low as 260 mV for an operating voltage of 5 V. A Schottky diode FET logic (SDFL) approach is applied to shift the switching voltage which is a requirement for cascading of inverters for realization of ring oscillators."}],"status":"public","type":"journal_article","publication":"IEEE Transactions on Electron Devices"},{"doi":"10.1109/16.381978","title":"Optoelectronic system integration on silicon: waveguides, photodetectors, and VLSI CMOS circuits on one chip","volume":42,"date_created":"2023-01-25T09:22:34Z","author":[{"last_name":"Hilleringmann","id":"20179","full_name":"Hilleringmann, Ulrich","first_name":"Ulrich"},{"first_name":"K.","last_name":"Goser","full_name":"Goser, K."}],"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","date_updated":"2023-03-21T09:51:52Z","intvolume":"        42","page":"841-846","citation":{"chicago":"Hilleringmann, Ulrich, and K. Goser. “Optoelectronic System Integration on Silicon: Waveguides, Photodetectors, and VLSI CMOS Circuits on One Chip.” <i>IEEE Transactions on Electron Devices</i> 42, no. 5 (2002): 841–46. <a href=\"https://doi.org/10.1109/16.381978\">https://doi.org/10.1109/16.381978</a>.","ieee":"U. Hilleringmann and K. Goser, “Optoelectronic system integration on silicon: waveguides, photodetectors, and VLSI CMOS circuits on one chip,” <i>IEEE Transactions on Electron Devices</i>, vol. 42, no. 5, pp. 841–846, 2002, doi: <a href=\"https://doi.org/10.1109/16.381978\">10.1109/16.381978</a>.","ama":"Hilleringmann U, Goser K. Optoelectronic system integration on silicon: waveguides, photodetectors, and VLSI CMOS circuits on one chip. <i>IEEE Transactions on Electron Devices</i>. 2002;42(5):841-846. doi:<a href=\"https://doi.org/10.1109/16.381978\">10.1109/16.381978</a>","apa":"Hilleringmann, U., &#38; Goser, K. (2002). Optoelectronic system integration on silicon: waveguides, photodetectors, and VLSI CMOS circuits on one chip. <i>IEEE Transactions on Electron Devices</i>, <i>42</i>(5), 841–846. <a href=\"https://doi.org/10.1109/16.381978\">https://doi.org/10.1109/16.381978</a>","mla":"Hilleringmann, Ulrich, and K. Goser. “Optoelectronic System Integration on Silicon: Waveguides, Photodetectors, and VLSI CMOS Circuits on One Chip.” <i>IEEE Transactions on Electron Devices</i>, vol. 42, no. 5, Institute of Electrical and Electronics Engineers (IEEE), 2002, pp. 841–46, doi:<a href=\"https://doi.org/10.1109/16.381978\">10.1109/16.381978</a>.","bibtex":"@article{Hilleringmann_Goser_2002, title={Optoelectronic system integration on silicon: waveguides, photodetectors, and VLSI CMOS circuits on one chip}, volume={42}, DOI={<a href=\"https://doi.org/10.1109/16.381978\">10.1109/16.381978</a>}, number={5}, journal={IEEE Transactions on Electron Devices}, publisher={Institute of Electrical and Electronics Engineers (IEEE)}, author={Hilleringmann, Ulrich and Goser, K.}, year={2002}, pages={841–846} }","short":"U. Hilleringmann, K. Goser, IEEE Transactions on Electron Devices 42 (2002) 841–846."},"year":"2002","issue":"5","publication_identifier":{"issn":["0018-9383"]},"publication_status":"published","language":[{"iso":"eng"}],"keyword":["Electrical and Electronic Engineering","Electronic","Optical and Magnetic Materials"],"department":[{"_id":"59"}],"user_id":"20179","_id":"39904","status":"public","publication":"IEEE Transactions on Electron Devices","type":"journal_article"},{"doi":"10.1109/16.658845","title":"Matching analysis of deposition defined 50-nm MOSFET's","date_created":"2023-01-24T09:23:56Z","author":[{"first_name":"J.T.","last_name":"Horstmann","full_name":"Horstmann, J.T."},{"full_name":"Hilleringmann, Ulrich","id":"20179","last_name":"Hilleringmann","first_name":"Ulrich"},{"full_name":"Goser, K.F.","last_name":"Goser","first_name":"K.F."}],"volume":45,"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","date_updated":"2023-03-21T09:45:40Z","citation":{"ama":"Horstmann JT, Hilleringmann U, Goser KF. Matching analysis of deposition defined 50-nm MOSFET’s. <i>IEEE Transactions on Electron Devices</i>. 2002;45(1):299-306. doi:<a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>","chicago":"Horstmann, J.T., Ulrich Hilleringmann, and K.F. Goser. “Matching Analysis of Deposition Defined 50-Nm MOSFET’s.” <i>IEEE Transactions on Electron Devices</i> 45, no. 1 (2002): 299–306. <a href=\"https://doi.org/10.1109/16.658845\">https://doi.org/10.1109/16.658845</a>.","ieee":"J. T. Horstmann, U. Hilleringmann, and K. F. Goser, “Matching analysis of deposition defined 50-nm MOSFET’s,” <i>IEEE Transactions on Electron Devices</i>, vol. 45, no. 1, pp. 299–306, 2002, doi: <a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>.","apa":"Horstmann, J. T., Hilleringmann, U., &#38; Goser, K. F. (2002). Matching analysis of deposition defined 50-nm MOSFET’s. <i>IEEE Transactions on Electron Devices</i>, <i>45</i>(1), 299–306. <a href=\"https://doi.org/10.1109/16.658845\">https://doi.org/10.1109/16.658845</a>","short":"J.T. Horstmann, U. Hilleringmann, K.F. Goser, IEEE Transactions on Electron Devices 45 (2002) 299–306.","bibtex":"@article{Horstmann_Hilleringmann_Goser_2002, title={Matching analysis of deposition defined 50-nm MOSFET’s}, volume={45}, DOI={<a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>}, number={1}, journal={IEEE Transactions on Electron Devices}, publisher={Institute of Electrical and Electronics Engineers (IEEE)}, author={Horstmann, J.T. and Hilleringmann, Ulrich and Goser, K.F.}, year={2002}, pages={299–306} }","mla":"Horstmann, J. T., et al. “Matching Analysis of Deposition Defined 50-Nm MOSFET’s.” <i>IEEE Transactions on Electron Devices</i>, vol. 45, no. 1, Institute of Electrical and Electronics Engineers (IEEE), 2002, pp. 299–306, doi:<a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>."},"intvolume":"        45","page":"299-306","year":"2002","issue":"1","publication_status":"published","publication_identifier":{"issn":["0018-9383"]},"language":[{"iso":"eng"}],"keyword":["Electrical and Electronic Engineering","Electronic","Optical and Magnetic Materials"],"user_id":"20179","department":[{"_id":"59"}],"_id":"39348","status":"public","type":"journal_article","publication":"IEEE Transactions on Electron Devices"},{"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","date_updated":"2023-03-21T09:58:01Z","author":[{"full_name":"Horstmann, J.T.","last_name":"Horstmann","first_name":"J.T."},{"first_name":"Ulrich","last_name":"Hilleringmann","full_name":"Hilleringmann, Ulrich","id":"20179"},{"last_name":"Goser","full_name":"Goser, K.F.","first_name":"K.F."}],"date_created":"2023-01-25T09:14:43Z","volume":45,"title":"Matching analysis of deposition defined 50-nm MOSFET's","doi":"10.1109/16.658845","publication_status":"published","publication_identifier":{"issn":["0018-9383"]},"issue":"1","year":"2002","citation":{"short":"J.T. Horstmann, U. Hilleringmann, K.F. Goser, IEEE Transactions on Electron Devices 45 (2002) 299–306.","mla":"Horstmann, J. T., et al. “Matching Analysis of Deposition Defined 50-Nm MOSFET’s.” <i>IEEE Transactions on Electron Devices</i>, vol. 45, no. 1, Institute of Electrical and Electronics Engineers (IEEE), 2002, pp. 299–306, doi:<a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>.","bibtex":"@article{Horstmann_Hilleringmann_Goser_2002, title={Matching analysis of deposition defined 50-nm MOSFET’s}, volume={45}, DOI={<a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>}, number={1}, journal={IEEE Transactions on Electron Devices}, publisher={Institute of Electrical and Electronics Engineers (IEEE)}, author={Horstmann, J.T. and Hilleringmann, Ulrich and Goser, K.F.}, year={2002}, pages={299–306} }","apa":"Horstmann, J. T., Hilleringmann, U., &#38; Goser, K. F. (2002). Matching analysis of deposition defined 50-nm MOSFET’s. <i>IEEE Transactions on Electron Devices</i>, <i>45</i>(1), 299–306. <a href=\"https://doi.org/10.1109/16.658845\">https://doi.org/10.1109/16.658845</a>","chicago":"Horstmann, J.T., Ulrich Hilleringmann, and K.F. Goser. “Matching Analysis of Deposition Defined 50-Nm MOSFET’s.” <i>IEEE Transactions on Electron Devices</i> 45, no. 1 (2002): 299–306. <a href=\"https://doi.org/10.1109/16.658845\">https://doi.org/10.1109/16.658845</a>.","ieee":"J. T. Horstmann, U. Hilleringmann, and K. F. Goser, “Matching analysis of deposition defined 50-nm MOSFET’s,” <i>IEEE Transactions on Electron Devices</i>, vol. 45, no. 1, pp. 299–306, 2002, doi: <a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>.","ama":"Horstmann JT, Hilleringmann U, Goser KF. Matching analysis of deposition defined 50-nm MOSFET’s. <i>IEEE Transactions on Electron Devices</i>. 2002;45(1):299-306. doi:<a href=\"https://doi.org/10.1109/16.658845\">10.1109/16.658845</a>"},"intvolume":"        45","page":"299-306","_id":"39891","user_id":"20179","department":[{"_id":"59"}],"keyword":["Electrical and Electronic Engineering","Electronic","Optical and Magnetic Materials"],"language":[{"iso":"eng"}],"type":"journal_article","publication":"IEEE Transactions on Electron Devices","status":"public"}]