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J. (2017). Linear and nonlinear behaviour of near-IR intersubband transitions of cubic GaN/AlN multi quantum well structures. <i>Journal of Crystal Growth</i>, <i>477</i>, 149–153. <a href=\"https://doi.org/10.1016/j.jcrysgro.2017.01.022\">https://doi.org/10.1016/j.jcrysgro.2017.01.022</a>","ieee":"T. Wecker <i>et al.</i>, “Linear and nonlinear behaviour of near-IR intersubband transitions of cubic GaN/AlN multi quantum well structures,” <i>Journal of Crystal Growth</i>, vol. 477, pp. 149–153, 2017."},"type":"journal_article","date_created":"2018-10-24T08:02:12Z"},{"author":[{"last_name":"Ritzmann","first_name":"Julian","full_name":"Ritzmann, Julian"},{"full_name":"Schott, Rüdiger","first_name":"Rüdiger","last_name":"Schott"},{"first_name":"Katherine","last_name":"Gross","full_name":"Gross, Katherine"},{"id":"37763","last_name":"Reuter","first_name":"Dirk","full_name":"Reuter, Dirk"},{"last_name":"Ludwig","first_name":"Arne","full_name":"Ludwig, Arne"},{"full_name":"Wieck, Andreas D.","first_name":"Andreas D.","last_name":"Wieck"}],"publication_identifier":{"issn":["0022-0248"]},"year":"2017","title":"Overcoming Ehrlich-Schwöbel barrier in (1 1 1)A GaAs molecular beam epitaxy","status":"public","intvolume":"       481","publication_status":"published","date_updated":"2022-01-06T07:03:26Z","language":[{"iso":"eng"}],"_id":"7020","publisher":"Elsevier BV","page":"7-10","volume":481,"user_id":"42514","doi":"10.1016/j.jcrysgro.2017.10.029","citation":{"apa":"Ritzmann, J., Schott, R., Gross, K., Reuter, D., Ludwig, A., &#38; Wieck, A. D. (2017). Overcoming Ehrlich-Schwöbel barrier in (1 1 1)A GaAs molecular beam epitaxy. <i>Journal of Crystal Growth</i>, <i>481</i>, 7–10. <a href=\"https://doi.org/10.1016/j.jcrysgro.2017.10.029\">https://doi.org/10.1016/j.jcrysgro.2017.10.029</a>","ieee":"J. Ritzmann, R. Schott, K. Gross, D. Reuter, A. Ludwig, and A. D. Wieck, “Overcoming Ehrlich-Schwöbel barrier in (1 1 1)A GaAs molecular beam epitaxy,” <i>Journal of Crystal Growth</i>, vol. 481, pp. 7–10, 2017.","short":"J. Ritzmann, R. Schott, K. Gross, D. Reuter, A. Ludwig, A.D. Wieck, Journal of Crystal Growth 481 (2017) 7–10.","chicago":"Ritzmann, Julian, Rüdiger Schott, Katherine Gross, Dirk Reuter, Arne Ludwig, and Andreas D. Wieck. “Overcoming Ehrlich-Schwöbel Barrier in (1 1 1)A GaAs Molecular Beam Epitaxy.” <i>Journal of Crystal Growth</i> 481 (2017): 7–10. <a href=\"https://doi.org/10.1016/j.jcrysgro.2017.10.029\">https://doi.org/10.1016/j.jcrysgro.2017.10.029</a>.","mla":"Ritzmann, Julian, et al. “Overcoming Ehrlich-Schwöbel Barrier in (1 1 1)A GaAs Molecular Beam Epitaxy.” <i>Journal of Crystal Growth</i>, vol. 481, Elsevier BV, 2017, pp. 7–10, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2017.10.029\">10.1016/j.jcrysgro.2017.10.029</a>.","ama":"Ritzmann J, Schott R, Gross K, Reuter D, Ludwig A, Wieck AD. Overcoming Ehrlich-Schwöbel barrier in (1 1 1)A GaAs molecular beam epitaxy. <i>Journal of Crystal Growth</i>. 2017;481:7-10. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2017.10.029\">10.1016/j.jcrysgro.2017.10.029</a>","bibtex":"@article{Ritzmann_Schott_Gross_Reuter_Ludwig_Wieck_2017, title={Overcoming Ehrlich-Schwöbel barrier in (1 1 1)A GaAs molecular beam epitaxy}, volume={481}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2017.10.029\">10.1016/j.jcrysgro.2017.10.029</a>}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Ritzmann, Julian and Schott, Rüdiger and Gross, Katherine and Reuter, Dirk and Ludwig, Arne and Wieck, Andreas D.}, year={2017}, pages={7–10} }"},"publication":"Journal of Crystal Growth","date_created":"2019-01-28T09:35:48Z","department":[{"_id":"15"},{"_id":"230"}],"type":"journal_article"},{"publication":"Journal of Crystal Growth","citation":{"bibtex":"@article{Scholz_Schott_Labud_Somsen_Reuter_Ludwig_Wieck_2017, title={Focused ion beam supported growth of monocrystalline wurtzite InAs nanowires grown by molecular beam epitaxy}, volume={470}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2017.04.013\">10.1016/j.jcrysgro.2017.04.013</a>}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Scholz, Sven and Schott, Rüdiger and Labud, Patrick A. and Somsen, Christoph and Reuter, Dirk and Ludwig, Arne and Wieck, Andreas D.}, year={2017}, pages={46–50} }","ama":"Scholz S, Schott R, Labud PA, et al. Focused ion beam supported growth of monocrystalline wurtzite InAs nanowires grown by molecular beam epitaxy. <i>Journal of Crystal Growth</i>. 2017;470:46-50. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2017.04.013\">10.1016/j.jcrysgro.2017.04.013</a>","mla":"Scholz, Sven, et al. “Focused Ion Beam Supported Growth of Monocrystalline Wurtzite InAs Nanowires Grown by Molecular Beam Epitaxy.” <i>Journal of Crystal Growth</i>, vol. 470, Elsevier BV, 2017, pp. 46–50, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2017.04.013\">10.1016/j.jcrysgro.2017.04.013</a>.","short":"S. Scholz, R. Schott, P.A. Labud, C. Somsen, D. Reuter, A. Ludwig, A.D. Wieck, Journal of Crystal Growth 470 (2017) 46–50.","chicago":"Scholz, Sven, Rüdiger Schott, Patrick A. Labud, Christoph Somsen, Dirk Reuter, Arne Ludwig, and Andreas D. Wieck. “Focused Ion Beam Supported Growth of Monocrystalline Wurtzite InAs Nanowires Grown by Molecular Beam Epitaxy.” <i>Journal of Crystal Growth</i> 470 (2017): 46–50. <a href=\"https://doi.org/10.1016/j.jcrysgro.2017.04.013\">https://doi.org/10.1016/j.jcrysgro.2017.04.013</a>.","ieee":"S. Scholz <i>et al.</i>, “Focused ion beam supported growth of monocrystalline wurtzite InAs nanowires grown by molecular beam epitaxy,” <i>Journal of Crystal Growth</i>, vol. 470, pp. 46–50, 2017.","apa":"Scholz, S., Schott, R., Labud, P. A., Somsen, C., Reuter, D., Ludwig, A., &#38; Wieck, A. D. (2017). Focused ion beam supported growth of monocrystalline wurtzite InAs nanowires grown by molecular beam epitaxy. <i>Journal of Crystal Growth</i>, <i>470</i>, 46–50. <a href=\"https://doi.org/10.1016/j.jcrysgro.2017.04.013\">https://doi.org/10.1016/j.jcrysgro.2017.04.013</a>"},"type":"journal_article","department":[{"_id":"15"},{"_id":"230"}],"date_created":"2019-01-28T10:09:48Z","date_updated":"2022-01-06T07:03:26Z","publication_status":"published","intvolume":"       470","year":"2017","title":"Focused ion beam supported growth of monocrystalline wurtzite InAs nanowires grown by molecular beam epitaxy","status":"public","publication_identifier":{"issn":["0022-0248"]},"author":[{"full_name":"Scholz, Sven","first_name":"Sven","last_name":"Scholz"},{"last_name":"Schott","first_name":"Rüdiger","full_name":"Schott, Rüdiger"},{"first_name":"Patrick A.","last_name":"Labud","full_name":"Labud, Patrick A."},{"full_name":"Somsen, Christoph","last_name":"Somsen","first_name":"Christoph"},{"id":"37763","full_name":"Reuter, Dirk","last_name":"Reuter","first_name":"Dirk"},{"first_name":"Arne","last_name":"Ludwig","full_name":"Ludwig, Arne"},{"last_name":"Wieck","first_name":"Andreas D.","full_name":"Wieck, Andreas D."}],"doi":"10.1016/j.jcrysgro.2017.04.013","user_id":"42514","volume":470,"page":"46-50","_id":"7027","publisher":"Elsevier BV","language":[{"iso":"eng"}]},{"date_created":"2019-01-28T09:53:20Z","department":[{"_id":"15"},{"_id":"230"}],"type":"journal_article","citation":{"bibtex":"@article{Sharma_Reuter_2016, title={A modified gradient approach for the growth of low-density InAs quantum dot molecules by molecular beam epitaxy}, volume={477}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2016.11.117\">10.1016/j.jcrysgro.2016.11.117</a>}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Sharma, Nandlal and Reuter, Dirk}, year={2016}, pages={225–229} }","ama":"Sharma N, Reuter D. A modified gradient approach for the growth of low-density InAs quantum dot molecules by molecular beam epitaxy. <i>Journal of Crystal Growth</i>. 2016;477:225-229. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2016.11.117\">10.1016/j.jcrysgro.2016.11.117</a>","mla":"Sharma, Nandlal, and Dirk Reuter. “A Modified Gradient Approach for the Growth of Low-Density InAs Quantum Dot Molecules by Molecular Beam Epitaxy.” <i>Journal of Crystal Growth</i>, vol. 477, Elsevier BV, 2016, pp. 225–29, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2016.11.117\">10.1016/j.jcrysgro.2016.11.117</a>.","chicago":"Sharma, Nandlal, and Dirk Reuter. “A Modified Gradient Approach for the Growth of Low-Density InAs Quantum Dot Molecules by Molecular Beam Epitaxy.” <i>Journal of Crystal Growth</i> 477 (2016): 225–29. <a href=\"https://doi.org/10.1016/j.jcrysgro.2016.11.117\">https://doi.org/10.1016/j.jcrysgro.2016.11.117</a>.","short":"N. Sharma, D. Reuter, Journal of Crystal Growth 477 (2016) 225–229.","ieee":"N. Sharma and D. Reuter, “A modified gradient approach for the growth of low-density InAs quantum dot molecules by molecular beam epitaxy,” <i>Journal of Crystal Growth</i>, vol. 477, pp. 225–229, 2016.","apa":"Sharma, N., &#38; Reuter, D. (2016). A modified gradient approach for the growth of low-density InAs quantum dot molecules by molecular beam epitaxy. <i>Journal of Crystal Growth</i>, <i>477</i>, 225–229. <a href=\"https://doi.org/10.1016/j.jcrysgro.2016.11.117\">https://doi.org/10.1016/j.jcrysgro.2016.11.117</a>"},"publication":"Journal of Crystal Growth","publisher":"Elsevier BV","_id":"7024","language":[{"iso":"eng"}],"page":"225-229","volume":477,"user_id":"42514","doi":"10.1016/j.jcrysgro.2016.11.117","publication_identifier":{"issn":["0022-0248"]},"author":[{"first_name":"Nandlal","last_name":"Sharma","full_name":"Sharma, Nandlal"},{"id":"37763","full_name":"Reuter, Dirk","first_name":"Dirk","last_name":"Reuter"}],"title":"A modified gradient approach for the growth of low-density InAs quantum dot molecules by molecular beam epitaxy","status":"public","year":"2016","intvolume":"       477","publication_status":"published","date_updated":"2022-01-06T07:03:26Z"},{"language":[{"iso":"eng"}],"doi":"10.1016/j.jcrysgro.2012.12.058","author":[{"full_name":"Bürger, M.","first_name":"M.","last_name":"Bürger"},{"full_name":"Kemper, R.M.","last_name":"Kemper","first_name":"R.M."},{"last_name":"Bader","first_name":"C.A.","full_name":"Bader, C.A."},{"full_name":"Ruth, M.","first_name":"M.","last_name":"Ruth"},{"full_name":"Declair, S.","last_name":"Declair","first_name":"S."},{"first_name":"Cedrik","orcid":"https://orcid.org/0000-0002-3787-3572","last_name":"Meier","full_name":"Meier, Cedrik","id":"20798"},{"full_name":"Förstner, Jens","orcid":"0000-0001-7059-9862","first_name":"Jens","last_name":"Förstner","id":"158"},{"full_name":"As, D.J.","first_name":"D.J.","last_name":"As"}],"publication_identifier":{"issn":["0022-0248"]},"title":"Cubic GaN quantum dots embedded in zinc-blende AlN microdisks","year":"2013","article_type":"original","intvolume":"       378","publication_status":"published","date_updated":"2022-01-06T07:00:00Z","date_created":"2018-08-21T07:33:08Z","file":[{"date_created":"2018-08-21T07:34:05Z","creator":"hclaudia","content_type":"application/pdf","success":1,"file_id":"3960","date_updated":"2018-08-21T07:34:05Z","relation":"main_file","file_size":532153,"access_level":"closed","file_name":"2013-01 Bürger,Kemper,Bader,Ruth,Declair,Meier,Förstner,As_Cubic GaN quantum dots embedded in zinc-blende AlN microdisks.pdf"}],"department":[{"_id":"15"}],"keyword":["tet_topic_qd","tet_topic_microdisk"],"type":"journal_article","publication":"Journal of Crystal Growth","abstract":[{"lang":"eng","text":"Microresonators containing quantum dots find application in devices like single photon emitters for quantum information technology as well as low threshold laser devices. We demonstrate the fabrication of 60 nm thin zinc-blende AlN microdisks including cubic GaN quantum dots using dry chemical etching techniques. Scanning electron microscopy analysis reveals the morphology with smooth surfaces of the microdisks. Micro-photoluminescence measurements exhibit optically active quantum dots. Furthermore this is the first report of resonator modes in the emission spectrum of a cubic AlN microdisk."}],"publisher":"Elsevier BV","_id":"3959","page":"287-290","volume":378,"user_id":"55706","ddc":["530"],"status":"public","has_accepted_license":"1","citation":{"bibtex":"@article{Bürger_Kemper_Bader_Ruth_Declair_Meier_Förstner_As_2013, title={Cubic GaN quantum dots embedded in zinc-blende AlN microdisks}, volume={378}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2012.12.058\">10.1016/j.jcrysgro.2012.12.058</a>}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Bürger, M. and Kemper, R.M. and Bader, C.A. and Ruth, M. and Declair, S. and Meier, Cedrik and Förstner, Jens and As, D.J.}, year={2013}, pages={287–290} }","ama":"Bürger M, Kemper RM, Bader CA, et al. Cubic GaN quantum dots embedded in zinc-blende AlN microdisks. <i>Journal of Crystal Growth</i>. 2013;378:287-290. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2012.12.058\">10.1016/j.jcrysgro.2012.12.058</a>","mla":"Bürger, M., et al. “Cubic GaN Quantum Dots Embedded in Zinc-Blende AlN Microdisks.” <i>Journal of Crystal Growth</i>, vol. 378, Elsevier BV, 2013, pp. 287–90, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2012.12.058\">10.1016/j.jcrysgro.2012.12.058</a>.","short":"M. Bürger, R.M. Kemper, C.A. Bader, M. Ruth, S. Declair, C. Meier, J. Förstner, D.J. As, Journal of Crystal Growth 378 (2013) 287–290.","chicago":"Bürger, M., R.M. Kemper, C.A. Bader, M. Ruth, S. Declair, Cedrik Meier, Jens Förstner, and D.J. As. “Cubic GaN Quantum Dots Embedded in Zinc-Blende AlN Microdisks.” <i>Journal of Crystal Growth</i> 378 (2013): 287–90. <a href=\"https://doi.org/10.1016/j.jcrysgro.2012.12.058\">https://doi.org/10.1016/j.jcrysgro.2012.12.058</a>.","ieee":"M. Bürger <i>et al.</i>, “Cubic GaN quantum dots embedded in zinc-blende AlN microdisks,” <i>Journal of Crystal Growth</i>, vol. 378, pp. 287–290, 2013.","apa":"Bürger, M., Kemper, R. M., Bader, C. A., Ruth, M., Declair, S., Meier, C., … As, D. J. (2013). Cubic GaN quantum dots embedded in zinc-blende AlN microdisks. <i>Journal of Crystal Growth</i>, <i>378</i>, 287–290. <a href=\"https://doi.org/10.1016/j.jcrysgro.2012.12.058\">https://doi.org/10.1016/j.jcrysgro.2012.12.058</a>"},"file_date_updated":"2018-08-21T07:34:05Z"},{"doi":"10.1016/j.jcrysgro.2012.10.011","language":[{"iso":"eng"}],"article_type":"original","intvolume":"       378","publication_status":"published","date_updated":"2025-12-16T08:12:58Z","publication_identifier":{"issn":["0022-0248"]},"author":[{"first_name":"R.M.","last_name":"Kemper","full_name":"Kemper, R.M."},{"full_name":"Hiller, L.","first_name":"L.","last_name":"Hiller"},{"full_name":"Stauden, T.","last_name":"Stauden","first_name":"T."},{"full_name":"Pezoldt, J.","first_name":"J.","last_name":"Pezoldt"},{"last_name":"Duschik","first_name":"K.","full_name":"Duschik, K."},{"first_name":"T.","last_name":"Niendorf","full_name":"Niendorf, T."},{"last_name":"Maier","first_name":"H.J.","full_name":"Maier, H.J."},{"full_name":"Meertens, D.","last_name":"Meertens","first_name":"D."},{"first_name":"K.","last_name":"Tillmann","full_name":"Tillmann, K."},{"last_name":"As","first_name":"D.J.","full_name":"As, D.J."},{"full_name":"Lindner, Jörg","last_name":"Lindner","first_name":"Jörg","id":"20797"}],"year":"2012","title":"Growth of cubic GaN on 3C–SiC/Si (001) nanostructures","department":[{"_id":"15"},{"_id":"286"},{"_id":"35"},{"_id":"230"}],"type":"journal_article","date_created":"2018-08-23T12:59:44Z","file":[{"date_created":"2018-08-23T13:01:13Z","creator":"hclaudia","file_id":"4105","content_type":"application/pdf","success":1,"file_name":"Growth of cubic GaN on 3C-SiC-Si 001 nanostructures.pdf","file_size":3716730,"access_level":"closed","relation":"main_file","date_updated":"2018-08-23T13:01:13Z"}],"abstract":[{"text":"We report on the molecular beam epitaxy growth of cubic GaN on 3C–SiC (001) nanostructures. Transmission electron microscopy (TEM) studies show phase-pure cubic GaN crystals with a low defect density on top of the post shaped 3C–SiC nanostructures and GaN grown on their sidewalls, which is dominated by {111} planar defects. The nanostructures, aligned parallel and perpendicular to the [110] directions of the substrate, are located in anti-phase domains of the 3C–SiC/Si (001) substrate. These anti-phase domains strongly influence the optimum growth of GaN layers in these regions. TEM measurements demonstrate a different stacking fault density in the cubic GaN epilayer in these areas.","lang":"eng"}],"publication":"Journal of Crystal Growth","volume":378,"user_id":"16199","ddc":["530"],"_id":"4104","publisher":"Elsevier BV","page":"291-294","has_accepted_license":"1","conference":{"location":"Nara (Japan)","name":"17th Int. Conference on MBE 2012"},"status":"public","citation":{"ieee":"R. M. Kemper <i>et al.</i>, “Growth of cubic GaN on 3C–SiC/Si (001) nanostructures,” <i>Journal of Crystal Growth</i>, vol. 378, pp. 291–294, 2012, doi: <a href=\"https://doi.org/10.1016/j.jcrysgro.2012.10.011\">10.1016/j.jcrysgro.2012.10.011</a>.","mla":"Kemper, R. M., et al. “Growth of Cubic GaN on 3C–SiC/Si (001) Nanostructures.” <i>Journal of Crystal Growth</i>, vol. 378, Elsevier BV, 2012, pp. 291–94, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2012.10.011\">10.1016/j.jcrysgro.2012.10.011</a>.","apa":"Kemper, R. M., Hiller, L., Stauden, T., Pezoldt, J., Duschik, K., Niendorf, T., Maier, H. J., Meertens, D., Tillmann, K., As, D. J., &#38; Lindner, J. (2012). Growth of cubic GaN on 3C–SiC/Si (001) nanostructures. <i>Journal of Crystal Growth</i>, <i>378</i>, 291–294. <a href=\"https://doi.org/10.1016/j.jcrysgro.2012.10.011\">https://doi.org/10.1016/j.jcrysgro.2012.10.011</a>","bibtex":"@article{Kemper_Hiller_Stauden_Pezoldt_Duschik_Niendorf_Maier_Meertens_Tillmann_As_et al._2012, title={Growth of cubic GaN on 3C–SiC/Si (001) nanostructures}, volume={378}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2012.10.011\">10.1016/j.jcrysgro.2012.10.011</a>}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Kemper, R.M. and Hiller, L. and Stauden, T. and Pezoldt, J. and Duschik, K. and Niendorf, T. and Maier, H.J. and Meertens, D. and Tillmann, K. and As, D.J. and et al.}, year={2012}, pages={291–294} }","chicago":"Kemper, R.M., L. Hiller, T. Stauden, J. Pezoldt, K. Duschik, T. Niendorf, H.J. Maier, et al. “Growth of Cubic GaN on 3C–SiC/Si (001) Nanostructures.” <i>Journal of Crystal Growth</i> 378 (2012): 291–94. <a href=\"https://doi.org/10.1016/j.jcrysgro.2012.10.011\">https://doi.org/10.1016/j.jcrysgro.2012.10.011</a>.","ama":"Kemper RM, Hiller L, Stauden T, et al. Growth of cubic GaN on 3C–SiC/Si (001) nanostructures. <i>Journal of Crystal Growth</i>. 2012;378:291-294. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2012.10.011\">10.1016/j.jcrysgro.2012.10.011</a>","short":"R.M. Kemper, L. Hiller, T. Stauden, J. Pezoldt, K. Duschik, T. Niendorf, H.J. Maier, D. Meertens, K. Tillmann, D.J. As, J. Lindner, Journal of Crystal Growth 378 (2012) 291–294."},"file_date_updated":"2018-08-23T13:01:13Z"},{"citation":{"mla":"Trunov, K., et al. “(100) GaAs/AlxGa1−xAs Heterostructures for Zeeman Spin Splitting Studies of Hole Quantum Wires.” <i>Journal of Crystal Growth</i>, vol. 323, no. 1, Elsevier BV, 2010, pp. 48–51, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.11.060\">10.1016/j.jcrysgro.2010.11.060</a>.","ama":"Trunov K, Reuter D, Ludwig A, et al. (100) GaAs/AlxGa1−xAs heterostructures for Zeeman spin splitting studies of hole quantum wires. <i>Journal of Crystal Growth</i>. 2010;323(1):48-51. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.11.060\">10.1016/j.jcrysgro.2010.11.060</a>","bibtex":"@article{Trunov_Reuter_Ludwig_Chen_Klochan_Micolich_Hamilton_Wieck_2010, title={(100) GaAs/AlxGa1−xAs heterostructures for Zeeman spin splitting studies of hole quantum wires}, volume={323}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.11.060\">10.1016/j.jcrysgro.2010.11.060</a>}, number={1}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Trunov, K. and Reuter, Dirk and Ludwig, A. and Chen, J.C.H. and Klochan, O. and Micolich, A.P. and Hamilton, A.R. and Wieck, A.D.}, year={2010}, pages={48–51} }","apa":"Trunov, K., Reuter, D., Ludwig, A., Chen, J. C. H., Klochan, O., Micolich, A. P., … Wieck, A. D. (2010). (100) GaAs/AlxGa1−xAs heterostructures for Zeeman spin splitting studies of hole quantum wires. <i>Journal of Crystal Growth</i>, <i>323</i>(1), 48–51. <a href=\"https://doi.org/10.1016/j.jcrysgro.2010.11.060\">https://doi.org/10.1016/j.jcrysgro.2010.11.060</a>","ieee":"K. Trunov <i>et al.</i>, “(100) GaAs/AlxGa1−xAs heterostructures for Zeeman spin splitting studies of hole quantum wires,” <i>Journal of Crystal Growth</i>, vol. 323, no. 1, pp. 48–51, 2010.","short":"K. Trunov, D. Reuter, A. Ludwig, J.C.H. Chen, O. Klochan, A.P. Micolich, A.R. Hamilton, A.D. Wieck, Journal of Crystal Growth 323 (2010) 48–51.","chicago":"Trunov, K., Dirk Reuter, A. Ludwig, J.C.H. Chen, O. Klochan, A.P. Micolich, A.R. Hamilton, and A.D. Wieck. “(100) GaAs/AlxGa1−xAs Heterostructures for Zeeman Spin Splitting Studies of Hole Quantum Wires.” <i>Journal of Crystal Growth</i> 323, no. 1 (2010): 48–51. <a href=\"https://doi.org/10.1016/j.jcrysgro.2010.11.060\">https://doi.org/10.1016/j.jcrysgro.2010.11.060</a>."},"user_id":"42514","volume":323,"page":"48-51","_id":"7705","publisher":"Elsevier BV","status":"public","type":"journal_article","department":[{"_id":"15"},{"_id":"230"}],"date_created":"2019-02-14T10:21:54Z","issue":"1","publication":"Journal of Crystal Growth","doi":"10.1016/j.jcrysgro.2010.11.060","language":[{"iso":"eng"}],"date_updated":"2022-01-06T07:03:45Z","publication_status":"published","intvolume":"       323","year":"2010","title":"(100) GaAs/AlxGa1−xAs heterostructures for Zeeman spin splitting studies of hole quantum wires","author":[{"full_name":"Trunov, K.","last_name":"Trunov","first_name":"K."},{"full_name":"Reuter, Dirk","first_name":"Dirk","last_name":"Reuter","id":"37763"},{"first_name":"A.","last_name":"Ludwig","full_name":"Ludwig, A."},{"last_name":"Chen","first_name":"J.C.H.","full_name":"Chen, J.C.H."},{"full_name":"Klochan, O.","last_name":"Klochan","first_name":"O."},{"full_name":"Micolich, A.P.","last_name":"Micolich","first_name":"A.P."},{"full_name":"Hamilton, A.R.","last_name":"Hamilton","first_name":"A.R."},{"full_name":"Wieck, A.D.","last_name":"Wieck","first_name":"A.D."}],"publication_identifier":{"issn":["0022-0248"]}},{"citation":{"bibtex":"@article{Kemper_Weinl_Mietze_Häberlen_Schupp_Tschumak_Lindner_Lischka_As_2010, title={Growth of cubic GaN on nano-patterned 3C-SiC/Si (001) substrates}, volume={323}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.12.042\">10.1016/j.jcrysgro.2010.12.042</a>}, number={1}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Kemper, R.M. and Weinl, M. and Mietze, C. and Häberlen, M. and Schupp, T. and Tschumak, E. and Lindner, Jörg and Lischka, K. and As, Donald }, year={2010}, pages={84–87} }","ama":"Kemper RM, Weinl M, Mietze C, et al. Growth of cubic GaN on nano-patterned 3C-SiC/Si (001) substrates. <i>Journal of Crystal Growth</i>. 2010;323(1):84-87. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.12.042\">10.1016/j.jcrysgro.2010.12.042</a>","mla":"Kemper, R. M., et al. “Growth of Cubic GaN on Nano-Patterned 3C-SiC/Si (001) Substrates.” <i>Journal of Crystal Growth</i>, vol. 323, no. 1, Elsevier BV, 2010, pp. 84–87, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.12.042\">10.1016/j.jcrysgro.2010.12.042</a>.","chicago":"Kemper, R.M., M. Weinl, C. Mietze, M. Häberlen, T. Schupp, E. Tschumak, Jörg Lindner, K. Lischka, and Donald  As. “Growth of Cubic GaN on Nano-Patterned 3C-SiC/Si (001) Substrates.” <i>Journal of Crystal Growth</i> 323, no. 1 (2010): 84–87. <a href=\"https://doi.org/10.1016/j.jcrysgro.2010.12.042\">https://doi.org/10.1016/j.jcrysgro.2010.12.042</a>.","short":"R.M. Kemper, M. Weinl, C. Mietze, M. Häberlen, T. Schupp, E. Tschumak, J. Lindner, K. Lischka, D. As, Journal of Crystal Growth 323 (2010) 84–87.","ieee":"R. M. Kemper <i>et al.</i>, “Growth of cubic GaN on nano-patterned 3C-SiC/Si (001) substrates,” <i>Journal of Crystal Growth</i>, vol. 323, no. 1, pp. 84–87, 2010.","apa":"Kemper, R. M., Weinl, M., Mietze, C., Häberlen, M., Schupp, T., Tschumak, E., … As, D. (2010). Growth of cubic GaN on nano-patterned 3C-SiC/Si (001) substrates. <i>Journal of Crystal Growth</i>, <i>323</i>(1), 84–87. <a href=\"https://doi.org/10.1016/j.jcrysgro.2010.12.042\">https://doi.org/10.1016/j.jcrysgro.2010.12.042</a>"},"file_date_updated":"2018-08-27T12:35:32Z","has_accepted_license":"1","status":"public","volume":323,"user_id":"55706","ddc":["530"],"_id":"4144","publisher":"Elsevier BV","page":"84-87","abstract":[{"text":"Non-polar relaxed cubic GaN was grown by molecular beam epitaxy (MBE) on nano-patterned 3C-SiC/Si \r\n(0 0 1)substrates with negligible hexagonal content and less defect density than in planar cubic GaN layers.Nano-patterning of 3C-SiC/Si(001) is achieved by self-ordered colloidal masks for the first time. The method presented here offers the possibility to create nano-patterned cubic GaN without the need for a GaN etching process andt hus isa potential alternative to the conventional top–down fabrication techniques.","lang":"eng"}],"issue":"1","publication":"Journal of Crystal Growth","department":[{"_id":"15"},{"_id":"286"}],"type":"journal_article","date_created":"2018-08-27T12:34:33Z","file":[{"date_updated":"2018-08-27T12:35:32Z","relation":"main_file","access_level":"closed","file_size":665964,"file_name":"Growth of cubic GaN on nano-patterned 3C-SiC (001) substrates.pdf","content_type":"application/pdf","success":1,"file_id":"4145","creator":"hclaudia","date_created":"2018-08-27T12:35:32Z"}],"article_type":"original","intvolume":"       323","publication_status":"published","date_updated":"2022-01-06T07:00:24Z","publication_identifier":{"issn":["0022-0248"]},"author":[{"last_name":"Kemper","first_name":"R.M.","full_name":"Kemper, R.M."},{"last_name":"Weinl","first_name":"M.","full_name":"Weinl, M."},{"full_name":"Mietze, C.","last_name":"Mietze","first_name":"C."},{"last_name":"Häberlen","first_name":"M.","full_name":"Häberlen, M."},{"full_name":"Schupp, T.","last_name":"Schupp","first_name":"T."},{"last_name":"Tschumak","first_name":"E.","full_name":"Tschumak, E."},{"id":"20797","last_name":"Lindner","first_name":"Jörg","full_name":"Lindner, Jörg"},{"last_name":"Lischka","first_name":"K.","full_name":"Lischka, K."},{"full_name":"As, Donald ","last_name":"As","first_name":"Donald "}],"title":"Growth of cubic GaN on nano-patterned 3C-SiC/Si (001) substrates","year":"2010","doi":"10.1016/j.jcrysgro.2010.12.042","language":[{"iso":"eng"}]},{"article_type":"original","intvolume":"       312","publication_status":"published","date_updated":"2022-01-06T07:00:37Z","author":[{"last_name":"Hao","first_name":"Rui","full_name":"Hao, Rui"},{"full_name":"Zhu, T.","last_name":"Zhu","first_name":"T."},{"full_name":"Häberlen, M.","first_name":"M.","last_name":"Häberlen"},{"full_name":"Chang, T.Y.","last_name":"Chang","first_name":"T.Y."},{"full_name":"Kappers, M.J.","last_name":"Kappers","first_name":"M.J."},{"full_name":"Oliver, R.A.","last_name":"Oliver","first_name":"R.A."},{"full_name":"Humphreys, C.J.","last_name":"Humphreys","first_name":"C.J."},{"full_name":"Moram, M.A.","last_name":"Moram","first_name":"M.A."}],"publication_identifier":{"issn":["0022-0248"]},"title":"The effects of annealing on non-polar (112¯0) a-plane GaN films","year":"2010","doi":"10.1016/j.jcrysgro.2010.08.041","language":[{"iso":"eng"}],"abstract":[{"lang":"eng","text":"Non-polar a -plane (1 1 2 ̄ 0) GaN films were grown on r-plane sapphire by metal–organic vapor phase epitaxy and were subsequently annealed for 90 min at 1070°C. Most dislocations were partial\r\ndislocations, which terminated basal plane stacking faults. Prior to annealing, these dislocations were\r\nrandomly distributed. After annealing, these dislocations moved into arrays oriented along the [0 0 0 1]\r\ndirection and aligned perpendicular to the film–substrate interface throughout their length, although\r\nthe total dislocation density remained unchanged. These changes were accompanied by broadening of\r\nthe symmetric X-ray diffraction 1 1 2 ̄ 0 w-scan widths. The mechanism of movement was identified as\r\ndislocation glide, occurring due to highly anisotropic stresses (confirmed by X-ray diffraction lattice\r\nparameter measurements) and evidenced by macroscopic slip bands observed on the sample surface.\r\nThere was also an increase in the density of unintentionally n-type doped electrically conductive\r\ninclined features present at the film–substrate interface (as observed in cross-section using scanning\r\ncapacitance microscopy), suggesting out-diffusion of impurities from the substrate along with prismatic\r\nstacking faults. These data suggest that annealing processes performed close to film growth\r\ntemperatures can affect both the microstructure and the electrical properties of non-polar GaN films."}],"issue":"23","publication":"Journal of Crystal Growth","department":[{"_id":"15"}],"type":"journal_article","date_created":"2018-08-28T12:49:39Z","file":[{"date_created":"2018-08-28T12:50:07Z","creator":"hclaudia","success":1,"content_type":"application/pdf","file_id":"4215","file_size":1218752,"access_level":"closed","file_name":"The effects of annealing on non-polar (11-20) a-plane GaN films.pdf","date_updated":"2018-08-28T12:50:07Z","relation":"main_file"}],"has_accepted_license":"1","status":"public","volume":312,"user_id":"55706","ddc":["530"],"publisher":"Elsevier BV","_id":"4214","page":"3536-3543","citation":{"mla":"Hao, Rui, et al. “The Effects of Annealing on Non-Polar (112¯0) a-Plane GaN Films.” <i>Journal of Crystal Growth</i>, vol. 312, no. 23, Elsevier BV, 2010, pp. 3536–43, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.08.041\">10.1016/j.jcrysgro.2010.08.041</a>.","ama":"Hao R, Zhu T, Häberlen M, et al. The effects of annealing on non-polar (112¯0) a-plane GaN films. <i>Journal of Crystal Growth</i>. 2010;312(23):3536-3543. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.08.041\">10.1016/j.jcrysgro.2010.08.041</a>","bibtex":"@article{Hao_Zhu_Häberlen_Chang_Kappers_Oliver_Humphreys_Moram_2010, title={The effects of annealing on non-polar (112¯0) a-plane GaN films}, volume={312}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.08.041\">10.1016/j.jcrysgro.2010.08.041</a>}, number={23}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Hao, Rui and Zhu, T. and Häberlen, M. and Chang, T.Y. and Kappers, M.J. and Oliver, R.A. and Humphreys, C.J. and Moram, M.A.}, year={2010}, pages={3536–3543} }","apa":"Hao, R., Zhu, T., Häberlen, M., Chang, T. Y., Kappers, M. J., Oliver, R. A., … Moram, M. A. (2010). The effects of annealing on non-polar (112¯0) a-plane GaN films. <i>Journal of Crystal Growth</i>, <i>312</i>(23), 3536–3543. <a href=\"https://doi.org/10.1016/j.jcrysgro.2010.08.041\">https://doi.org/10.1016/j.jcrysgro.2010.08.041</a>","ieee":"R. Hao <i>et al.</i>, “The effects of annealing on non-polar (112¯0) a-plane GaN films,” <i>Journal of Crystal Growth</i>, vol. 312, no. 23, pp. 3536–3543, 2010.","short":"R. Hao, T. Zhu, M. Häberlen, T.Y. Chang, M.J. Kappers, R.A. Oliver, C.J. Humphreys, M.A. Moram, Journal of Crystal Growth 312 (2010) 3536–3543.","chicago":"Hao, Rui, T. Zhu, M. Häberlen, T.Y. Chang, M.J. Kappers, R.A. Oliver, C.J. Humphreys, and M.A. Moram. “The Effects of Annealing on Non-Polar (112¯0) a-Plane GaN Films.” <i>Journal of Crystal Growth</i> 312, no. 23 (2010): 3536–43. <a href=\"https://doi.org/10.1016/j.jcrysgro.2010.08.041\">https://doi.org/10.1016/j.jcrysgro.2010.08.041</a>."},"file_date_updated":"2018-08-28T12:50:07Z"},{"status":"public","user_id":"16199","volume":312,"page":"2892-2895","_id":"13830","funded_apc":"1","project":[{"name":"Computing Resources Provided by the Paderborn Center for Parallel Computing","_id":"52"}],"citation":{"mla":"Rauls, E., et al. “Understanding the Cubic AlN Growth Plane from First Principles.” <i>Journal of Crystal Growth</i>, vol. 312, 2010, pp. 2892–95, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.07.027\">10.1016/j.jcrysgro.2010.07.027</a>.","ama":"Rauls E, Wiebe J, Schmidt WG. Understanding the cubic AlN growth plane from first principles. <i>Journal of Crystal Growth</i>. 2010;312:2892-2895. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.07.027\">10.1016/j.jcrysgro.2010.07.027</a>","bibtex":"@article{Rauls_Wiebe_Schmidt_2010, title={Understanding the cubic AlN growth plane from first principles}, volume={312}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2010.07.027\">10.1016/j.jcrysgro.2010.07.027</a>}, journal={Journal of Crystal Growth}, author={Rauls, E. and Wiebe, J. and Schmidt, Wolf Gero}, year={2010}, pages={2892–2895} }","apa":"Rauls, E., Wiebe, J., &#38; Schmidt, W. G. (2010). Understanding the cubic AlN growth plane from first principles. <i>Journal of Crystal Growth</i>, <i>312</i>, 2892–2895. <a href=\"https://doi.org/10.1016/j.jcrysgro.2010.07.027\">https://doi.org/10.1016/j.jcrysgro.2010.07.027</a>","ieee":"E. Rauls, J. Wiebe, and W. G. Schmidt, “Understanding the cubic AlN growth plane from first principles,” <i>Journal of Crystal Growth</i>, vol. 312, pp. 2892–2895, 2010, doi: <a href=\"https://doi.org/10.1016/j.jcrysgro.2010.07.027\">10.1016/j.jcrysgro.2010.07.027</a>.","chicago":"Rauls, E., J. Wiebe, and Wolf Gero Schmidt. “Understanding the Cubic AlN Growth Plane from First Principles.” <i>Journal of Crystal Growth</i> 312 (2010): 2892–95. <a href=\"https://doi.org/10.1016/j.jcrysgro.2010.07.027\">https://doi.org/10.1016/j.jcrysgro.2010.07.027</a>.","short":"E. Rauls, J. Wiebe, W.G. Schmidt, Journal of Crystal Growth 312 (2010) 2892–2895."},"publication_status":"published","date_updated":"2025-12-16T07:49:01Z","intvolume":"       312","year":"2010","title":"Understanding the cubic AlN growth plane from first principles","publication_identifier":{"issn":["0022-0248"]},"author":[{"full_name":"Rauls, E.","first_name":"E.","last_name":"Rauls"},{"full_name":"Wiebe, J.","last_name":"Wiebe","first_name":"J."},{"full_name":"Schmidt, Wolf Gero","orcid":"0000-0002-2717-5076","first_name":"Wolf Gero","last_name":"Schmidt","id":"468"}],"doi":"10.1016/j.jcrysgro.2010.07.027","language":[{"iso":"eng"}],"publication":"Journal of Crystal Growth","type":"journal_article","department":[{"_id":"15"},{"_id":"170"},{"_id":"295"},{"_id":"35"},{"_id":"230"}],"date_created":"2019-10-15T07:34:48Z"},{"language":[{"iso":"eng"}],"doi":"10.1016/j.jcrysgro.2009.12.048","title":"Structural characterization of cubic and hexagonal GaN thin films grown by IBA–MBE on SiC/Si","year":"2009","publication_identifier":{"issn":["0022-0248"]},"author":[{"full_name":"Häberlen, M.","last_name":"Häberlen","first_name":"M."},{"last_name":"Gerlach","first_name":"J.W.","full_name":"Gerlach, J.W."},{"full_name":"Murphy, B.","first_name":"B.","last_name":"Murphy"},{"last_name":"Lindner","first_name":"Jörg","full_name":"Lindner, Jörg","id":"20797"},{"first_name":"B.","last_name":"Stritzker","full_name":"Stritzker, B."}],"publication_status":"published","date_updated":"2022-01-06T07:00:32Z","article_type":"original","intvolume":"       312","file":[{"date_created":"2018-08-28T11:50:45Z","creator":"hclaudia","file_id":"4193","content_type":"application/pdf","success":1,"file_name":"Structural Characterization of Cubic and Hexagonal GaN Thin Films Grown by IBA-MBE on SiC-Si.pdf","file_size":828431,"access_level":"closed","relation":"main_file","date_updated":"2018-08-28T11:50:45Z"}],"date_created":"2018-08-28T11:50:05Z","type":"journal_article","department":[{"_id":"15"}],"publication":"Journal of Crystal Growth","issue":"6","abstract":[{"lang":"eng","text":"Buried ion beam synthesized 3C-SiC layers were revealed to the surface of silicon wafers to provide lattice matched substrates for GaN thin film epitaxy. Both epitaxial SiC/Si(1 1 1) and SiC/Si(0 0 1) growth surfaces with either six- or four-fold crystal symmetry, respectively, were formed. GaN thin film growth was achieved by ion beam assisted molecular beam epitaxy (IBA–MBE) which – owing to the energy and momentum transfer of the ions – allows to deposit epitaxial thin films at particularly low growth temperatures where both the stable hexagonal and the metastable cubic polytype of GaN can be formed. It is shown by X-ray diffraction (XRD) and cross-sectional transmission electron microscopy (XTEM) that using appropriate fluxes of Ga atoms both purely hexagonal and purely cubic GaN films can\r\nbe grown epitaxially on SiC/Si(1 1 1) and SiC/Si(0 0 1), respectively. Thereby Ga rich growth conditions seem to stabilize the formation of the cubic polytype. It is obvious from XTEM studies that the high density of crystal defects in the SiC layer is not transferred onto the growing GaN films and that the crystalline quality of GaN films improves with increasing film thickness. The influence of surface roughness and wettability, interfacial cavities and the nucleation of twin-type defects at the GaN/SiC interface on the crystalline quality of the GaN thin films is discussed."}],"page":"762-769","publisher":"Elsevier BV","_id":"4192","user_id":"55706","ddc":["530"],"volume":312,"status":"public","has_accepted_license":"1","file_date_updated":"2018-08-28T11:50:45Z","citation":{"ieee":"M. Häberlen, J. W. Gerlach, B. Murphy, J. Lindner, and B. Stritzker, “Structural characterization of cubic and hexagonal GaN thin films grown by IBA–MBE on SiC/Si,” <i>Journal of Crystal Growth</i>, vol. 312, no. 6, pp. 762–769, 2009.","apa":"Häberlen, M., Gerlach, J. W., Murphy, B., Lindner, J., &#38; Stritzker, B. (2009). Structural characterization of cubic and hexagonal GaN thin films grown by IBA–MBE on SiC/Si. <i>Journal of Crystal Growth</i>, <i>312</i>(6), 762–769. <a href=\"https://doi.org/10.1016/j.jcrysgro.2009.12.048\">https://doi.org/10.1016/j.jcrysgro.2009.12.048</a>","mla":"Häberlen, M., et al. “Structural Characterization of Cubic and Hexagonal GaN Thin Films Grown by IBA–MBE on SiC/Si.” <i>Journal of Crystal Growth</i>, vol. 312, no. 6, Elsevier BV, 2009, pp. 762–69, doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2009.12.048\">10.1016/j.jcrysgro.2009.12.048</a>.","bibtex":"@article{Häberlen_Gerlach_Murphy_Lindner_Stritzker_2009, title={Structural characterization of cubic and hexagonal GaN thin films grown by IBA–MBE on SiC/Si}, volume={312}, DOI={<a href=\"https://doi.org/10.1016/j.jcrysgro.2009.12.048\">10.1016/j.jcrysgro.2009.12.048</a>}, number={6}, journal={Journal of Crystal Growth}, publisher={Elsevier BV}, author={Häberlen, M. and Gerlach, J.W. and Murphy, B. and Lindner, Jörg and Stritzker, B.}, year={2009}, pages={762–769} }","chicago":"Häberlen, M., J.W. Gerlach, B. Murphy, Jörg Lindner, and B. Stritzker. “Structural Characterization of Cubic and Hexagonal GaN Thin Films Grown by IBA–MBE on SiC/Si.” <i>Journal of Crystal Growth</i> 312, no. 6 (2009): 762–69. <a href=\"https://doi.org/10.1016/j.jcrysgro.2009.12.048\">https://doi.org/10.1016/j.jcrysgro.2009.12.048</a>.","short":"M. Häberlen, J.W. Gerlach, B. Murphy, J. Lindner, B. Stritzker, Journal of Crystal Growth 312 (2009) 762–769.","ama":"Häberlen M, Gerlach JW, Murphy B, Lindner J, Stritzker B. Structural characterization of cubic and hexagonal GaN thin films grown by IBA–MBE on SiC/Si. <i>Journal of Crystal Growth</i>. 2009;312(6):762-769. doi:<a href=\"https://doi.org/10.1016/j.jcrysgro.2009.12.048\">10.1016/j.jcrysgro.2009.12.048</a>"}},{"_id":"7646","publisher":"Elsevier BV","page":"607-611","volume":298,"user_id":"20798","status":"public","citation":{"chicago":"Regolin, I., D. Sudfeld, S. Lüttjohann, V. Khorenko, W. Prost, J. Kästner, G. Dumpich, Cedrik Meier, A. Lorke, and F.-J. Tegude. “Growth and Characterisation of GaAs/InGaAs/GaAs Nanowhiskers on (111) GaAs.” <i>Journal of Crystal Growth</i> 298 (2006): 607–11. <a href=\"https://doi.org/10.1016/j.jcrysgro.2006.10.122\">https://doi.org/10.1016/j.jcrysgro.2006.10.122</a>.","short":"I. Regolin, D. Sudfeld, S. Lüttjohann, V. Khorenko, W. Prost, J. Kästner, G. Dumpich, C. Meier, A. Lorke, F.-J. Tegude, Journal of Crystal Growth 298 (2006) 607–611.","ama":"Regolin I, Sudfeld D, Lüttjohann S, et al. 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