[{"department":[{"_id":"302"}],"user_id":"54556","_id":"22559","language":[{"iso":"eng"}],"article_number":"145201","publication":"Journal of Physics D: Applied Physics","type":"journal_article","status":"public","author":[{"first_name":"F","full_name":"Mitschker, F","last_name":"Mitschker"},{"first_name":"J","last_name":"Wißing","full_name":"Wißing, J"},{"first_name":"Ch","full_name":"Hoppe, Ch","last_name":"Hoppe"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Guido","id":"194","full_name":"Grundmeier, Guido","last_name":"Grundmeier"},{"first_name":"P","last_name":"Awakowicz","full_name":"Awakowicz, P"}],"date_created":"2021-07-07T09:03:03Z","date_updated":"2023-01-24T08:40:21Z","doi":"10.1088/1361-6463/aab1dd","title":"Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET","publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","citation":{"bibtex":"@article{Mitschker_Wißing_Hoppe_de los Arcos de Pedro_Grundmeier_Awakowicz_2018, title={Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">10.1088/1361-6463/aab1dd</a>}, number={145201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Wißing, J and Hoppe, Ch and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido and Awakowicz, P}, year={2018} }","mla":"Mitschker, F., et al. “Influence of Average Ion Energy and Atomic Oxygen Flux per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings on PET.” <i>Journal of Physics D: Applied Physics</i>, 145201, 2018, doi:<a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">10.1088/1361-6463/aab1dd</a>.","short":"F. Mitschker, J. Wißing, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier, P. Awakowicz, Journal of Physics D: Applied Physics (2018).","apa":"Mitschker, F., Wißing, J., Hoppe, C., de los Arcos de Pedro, M. T., Grundmeier, G., &#38; Awakowicz, P. (2018). Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET. <i>Journal of Physics D: Applied Physics</i>, Article 145201. <a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">https://doi.org/10.1088/1361-6463/aab1dd</a>","ieee":"F. Mitschker, J. Wißing, C. Hoppe, M. T. de los Arcos de Pedro, G. Grundmeier, and P. Awakowicz, “Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 145201, 2018, doi: <a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">10.1088/1361-6463/aab1dd</a>.","chicago":"Mitschker, F, J Wißing, Ch Hoppe, Maria Teresa de los Arcos de Pedro, Guido Grundmeier, and P Awakowicz. “Influence of Average Ion Energy and Atomic Oxygen Flux per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings on PET.” <i>Journal of Physics D: Applied Physics</i>, 2018. <a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">https://doi.org/10.1088/1361-6463/aab1dd</a>.","ama":"Mitschker F, Wißing J, Hoppe C, de los Arcos de Pedro MT, Grundmeier G, Awakowicz P. Influence of average ion energy and atomic oxygen flux per Si atom on the formation of silicon oxide permeation barrier coatings on PET. <i>Journal of Physics D: Applied Physics</i>. Published online 2018. doi:<a href=\"https://doi.org/10.1088/1361-6463/aab1dd\">10.1088/1361-6463/aab1dd</a>"},"year":"2018"},{"publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","year":"2017","citation":{"ieee":"C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, and G. Grundmeier, “Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms,” <i>Journal of Physics D: Applied Physics</i>, 2017.","chicago":"Hoppe, Christian, F Mitschker, I Giner, T de los Arcos, P Awakowicz, and Guido Grundmeier. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>, 2017. <a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">https://doi.org/10.1088/1361-6463/aa69e5</a>.","ama":"Hoppe C, Mitschker F, Giner I, de los Arcos T, Awakowicz P, Grundmeier G. Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. <i>Journal of Physics D: Applied Physics</i>. 2017. doi:<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>","apa":"Hoppe, C., Mitschker, F., Giner, I., de los Arcos, T., Awakowicz, P., &#38; Grundmeier, G. (2017). Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. <i>Journal of Physics D: Applied Physics</i>. <a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">https://doi.org/10.1088/1361-6463/aa69e5</a>","short":"C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, G. Grundmeier, Journal of Physics D: Applied Physics (2017).","bibtex":"@article{Hoppe_Mitschker_Giner_de los Arcos_Awakowicz_Grundmeier_2017, title={Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>}, number={204002}, journal={Journal of Physics D: Applied Physics}, author={Hoppe, Christian and Mitschker, F and Giner, I and de los Arcos, T and Awakowicz, P and Grundmeier, Guido}, year={2017} }","mla":"Hoppe, Christian, et al. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>, 204002, 2017, doi:<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>."},"date_updated":"2022-01-06T06:55:42Z","date_created":"2021-07-27T14:19:04Z","author":[{"id":"27401","full_name":"Hoppe, Christian","last_name":"Hoppe","first_name":"Christian"},{"first_name":"F","full_name":"Mitschker, F","last_name":"Mitschker"},{"first_name":"I","full_name":"Giner, I","last_name":"Giner"},{"full_name":"de los Arcos, T","last_name":"de los Arcos","first_name":"T"},{"first_name":"P","full_name":"Awakowicz, P","last_name":"Awakowicz"},{"first_name":"Guido","full_name":"Grundmeier, Guido","id":"194","last_name":"Grundmeier"}],"title":"Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms","doi":"10.1088/1361-6463/aa69e5","publication":"Journal of Physics D: Applied Physics","type":"journal_article","status":"public","_id":"22849","user_id":"194","article_number":"204002","language":[{"iso":"eng"}]},{"date_updated":"2023-01-24T08:15:24Z","date_created":"2021-07-07T09:09:32Z","author":[{"last_name":"Mitschker","full_name":"Mitschker, F","first_name":"F"},{"full_name":"Steves, S","last_name":"Steves","first_name":"S"},{"first_name":"M","last_name":"Gebhard","full_name":"Gebhard, M"},{"first_name":"M","last_name":"Rudolph","full_name":"Rudolph, M"},{"first_name":"L","last_name":"Schücke","full_name":"Schücke, L"},{"last_name":"Kirchheim","full_name":"Kirchheim, D","first_name":"D"},{"last_name":"Jaritz","full_name":"Jaritz, M","first_name":"M"},{"first_name":"M","last_name":"Brochhagen","full_name":"Brochhagen, M"},{"last_name":"Hoppe","full_name":"Hoppe, Ch","first_name":"Ch"},{"last_name":"Dahlmann","full_name":"Dahlmann, R","first_name":"R"},{"full_name":"Böke, M","last_name":"Böke","first_name":"M"},{"last_name":"Benedikt","full_name":"Benedikt, J","first_name":"J"},{"last_name":"Giner","full_name":"Giner, I","first_name":"I"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Ch","last_name":"Hopmann","full_name":"Hopmann, Ch"},{"first_name":"G","last_name":"Grundmeier","full_name":"Grundmeier, G"},{"last_name":"Devi","full_name":"Devi, A","first_name":"A"},{"first_name":"P","last_name":"Awakowicz","full_name":"Awakowicz, P"}],"title":"Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence","doi":"10.1088/1361-6463/aa6e28","publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","year":"2017","citation":{"chicago":"Mitschker, F, S Steves, M Gebhard, M Rudolph, L Schücke, D Kirchheim, M Jaritz, et al. “Influence of PE-CVD and PE-ALD on Defect Formation in Permeation Barrier Films on PET and Correlation to Atomic Oxygen Fluence.” <i>Journal of Physics D: Applied Physics</i>, 2017. <a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">https://doi.org/10.1088/1361-6463/aa6e28</a>.","ieee":"F. Mitschker <i>et al.</i>, “Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 235201, 2017, doi: <a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">10.1088/1361-6463/aa6e28</a>.","ama":"Mitschker F, Steves S, Gebhard M, et al. Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence. <i>Journal of Physics D: Applied Physics</i>. Published online 2017. doi:<a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">10.1088/1361-6463/aa6e28</a>","short":"F. Mitschker, S. Steves, M. Gebhard, M. Rudolph, L. Schücke, D. Kirchheim, M. Jaritz, M. Brochhagen, C. Hoppe, R. Dahlmann, M. Böke, J. Benedikt, I. Giner, M.T. de los Arcos de Pedro, C. Hopmann, G. Grundmeier, A. Devi, P. Awakowicz, Journal of Physics D: Applied Physics (2017).","bibtex":"@article{Mitschker_Steves_Gebhard_Rudolph_Schücke_Kirchheim_Jaritz_Brochhagen_Hoppe_Dahlmann_et al._2017, title={Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">10.1088/1361-6463/aa6e28</a>}, number={235201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker, F and Steves, S and Gebhard, M and Rudolph, M and Schücke, L and Kirchheim, D and Jaritz, M and Brochhagen, M and Hoppe, Ch and Dahlmann, R and et al.}, year={2017} }","mla":"Mitschker, F., et al. “Influence of PE-CVD and PE-ALD on Defect Formation in Permeation Barrier Films on PET and Correlation to Atomic Oxygen Fluence.” <i>Journal of Physics D: Applied Physics</i>, 235201, 2017, doi:<a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">10.1088/1361-6463/aa6e28</a>.","apa":"Mitschker, F., Steves, S., Gebhard, M., Rudolph, M., Schücke, L., Kirchheim, D., Jaritz, M., Brochhagen, M., Hoppe, C., Dahlmann, R., Böke, M., Benedikt, J., Giner, I., de los Arcos de Pedro, M. T., Hopmann, C., Grundmeier, G., Devi, A., &#38; Awakowicz, P. (2017). Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films on PET and correlation to atomic oxygen fluence. <i>Journal of Physics D: Applied Physics</i>, Article 235201. <a href=\"https://doi.org/10.1088/1361-6463/aa6e28\">https://doi.org/10.1088/1361-6463/aa6e28</a>"},"_id":"22571","department":[{"_id":"302"}],"user_id":"54556","article_number":"235201","language":[{"iso":"eng"}],"publication":"Journal of Physics D: Applied Physics","type":"journal_article","status":"public"},{"language":[{"iso":"eng"}],"article_number":"204002","department":[{"_id":"302"}],"user_id":"54556","_id":"22566","status":"public","publication":"Journal of Physics D: Applied Physics","type":"journal_article","doi":"10.1088/1361-6463/aa69e5","title":"Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms","date_created":"2021-07-07T09:08:02Z","author":[{"full_name":"Hoppe, C","last_name":"Hoppe","first_name":"C"},{"first_name":"F","last_name":"Mitschker","full_name":"Mitschker, F"},{"full_name":"Giner, I","last_name":"Giner","first_name":"I"},{"full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"first_name":"P","last_name":"Awakowicz","full_name":"Awakowicz, P"},{"first_name":"G","full_name":"Grundmeier, G","last_name":"Grundmeier"}],"date_updated":"2023-01-24T08:13:17Z","citation":{"short":"C. Hoppe, F. Mitschker, I. Giner, M.T. de los Arcos de Pedro, P. Awakowicz, G. Grundmeier, Journal of Physics D: Applied Physics (2017).","bibtex":"@article{Hoppe_Mitschker_Giner_de los Arcos de Pedro_Awakowicz_Grundmeier_2017, title={Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms}, DOI={<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>}, number={204002}, journal={Journal of Physics D: Applied Physics}, author={Hoppe, C and Mitschker, F and Giner, I and de los Arcos de Pedro, Maria Teresa and Awakowicz, P and Grundmeier, G}, year={2017} }","mla":"Hoppe, C., et al. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>, 204002, 2017, doi:<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>.","apa":"Hoppe, C., Mitschker, F., Giner, I., de los Arcos de Pedro, M. T., Awakowicz, P., &#38; Grundmeier, G. (2017). Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. <i>Journal of Physics D: Applied Physics</i>, Article 204002. <a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">https://doi.org/10.1088/1361-6463/aa69e5</a>","ieee":"C. Hoppe, F. Mitschker, I. Giner, M. T. de los Arcos de Pedro, P. Awakowicz, and G. Grundmeier, “Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 204002, 2017, doi: <a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>.","chicago":"Hoppe, C, F Mitschker, I Giner, Maria Teresa de los Arcos de Pedro, P Awakowicz, and G Grundmeier. “Influence of Organic Surface Chemistry on the Nucleation of Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>, 2017. <a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">https://doi.org/10.1088/1361-6463/aa69e5</a>.","ama":"Hoppe C, Mitschker F, Giner I, de los Arcos de Pedro MT, Awakowicz P, Grundmeier G. Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms. <i>Journal of Physics D: Applied Physics</i>. Published online 2017. doi:<a href=\"https://doi.org/10.1088/1361-6463/aa69e5\">10.1088/1361-6463/aa69e5</a>"},"year":"2017","publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published"},{"article_number":"16LT01","language":[{"iso":"eng"}],"_id":"22576","user_id":"54556","department":[{"_id":"302"}],"status":"public","type":"journal_article","publication":"Journal of Physics D: Applied Physics","title":"Revising secondary electron yields of ion-sputtered metal oxides","doi":"10.1088/0022-3727/49/16/16lt01","date_updated":"2023-01-24T08:17:43Z","date_created":"2021-07-07T09:12:49Z","author":[{"full_name":"Corbella, Carles","last_name":"Corbella","first_name":"Carles"},{"first_name":"Adrian","last_name":"Marcak","full_name":"Marcak, Adrian"},{"first_name":"Maria Teresa","last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556"},{"first_name":"Achim","full_name":"von Keudell, Achim","last_name":"von Keudell"}],"year":"2016","citation":{"mla":"Corbella, Carles, et al. “Revising Secondary Electron Yields of Ion-Sputtered Metal Oxides.” <i>Journal of Physics D: Applied Physics</i>, 16LT01, 2016, doi:<a href=\"https://doi.org/10.1088/0022-3727/49/16/16lt01\">10.1088/0022-3727/49/16/16lt01</a>.","short":"C. Corbella, A. Marcak, M.T. de los Arcos de Pedro, A. von Keudell, Journal of Physics D: Applied Physics (2016).","bibtex":"@article{Corbella_Marcak_de los Arcos de Pedro_von Keudell_2016, title={Revising secondary electron yields of ion-sputtered metal oxides}, DOI={<a href=\"https://doi.org/10.1088/0022-3727/49/16/16lt01\">10.1088/0022-3727/49/16/16lt01</a>}, number={16LT01}, journal={Journal of Physics D: Applied Physics}, author={Corbella, Carles and Marcak, Adrian and de los Arcos de Pedro, Maria Teresa and von Keudell, Achim}, year={2016} }","apa":"Corbella, C., Marcak, A., de los Arcos de Pedro, M. T., &#38; von Keudell, A. (2016). Revising secondary electron yields of ion-sputtered metal oxides. <i>Journal of Physics D: Applied Physics</i>, Article 16LT01. <a href=\"https://doi.org/10.1088/0022-3727/49/16/16lt01\">https://doi.org/10.1088/0022-3727/49/16/16lt01</a>","chicago":"Corbella, Carles, Adrian Marcak, Maria Teresa de los Arcos de Pedro, and Achim von Keudell. “Revising Secondary Electron Yields of Ion-Sputtered Metal Oxides.” <i>Journal of Physics D: Applied Physics</i>, 2016. <a href=\"https://doi.org/10.1088/0022-3727/49/16/16lt01\">https://doi.org/10.1088/0022-3727/49/16/16lt01</a>.","ieee":"C. Corbella, A. Marcak, M. T. de los Arcos de Pedro, and A. von Keudell, “Revising secondary electron yields of ion-sputtered metal oxides,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 16LT01, 2016, doi: <a href=\"https://doi.org/10.1088/0022-3727/49/16/16lt01\">10.1088/0022-3727/49/16/16lt01</a>.","ama":"Corbella C, Marcak A, de los Arcos de Pedro MT, von Keudell A. Revising secondary electron yields of ion-sputtered metal oxides. <i>Journal of Physics D: Applied Physics</i>. Published online 2016. doi:<a href=\"https://doi.org/10.1088/0022-3727/49/16/16lt01\">10.1088/0022-3727/49/16/16lt01</a>"},"publication_status":"published","publication_identifier":{"issn":["0022-3727","1361-6463"]}},{"user_id":"54556","department":[{"_id":"302"}],"_id":"22583","language":[{"iso":"eng"}],"extern":"1","article_number":"055206","type":"journal_article","publication":"Journal of Physics D: Applied Physics","status":"public","date_created":"2021-07-07T09:15:40Z","author":[{"full_name":"Schröder, Daniel","last_name":"Schröder","first_name":"Daniel"},{"last_name":"Burhenn","full_name":"Burhenn, Sebastian","first_name":"Sebastian"},{"id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro","first_name":"Maria Teresa"},{"first_name":"Volker","full_name":"Schulz-von der Gathen, Volker","last_name":"Schulz-von der Gathen"}],"date_updated":"2023-01-24T08:19:53Z","doi":"10.1088/0022-3727/48/5/055206","title":"Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge","publication_status":"published","publication_identifier":{"issn":["0022-3727","1361-6463"]},"citation":{"ama":"Schröder D, Burhenn S, de los Arcos de Pedro MT, Schulz-von der Gathen V. Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge. <i>Journal of Physics D: Applied Physics</i>. Published online 2015. doi:<a href=\"https://doi.org/10.1088/0022-3727/48/5/055206\">10.1088/0022-3727/48/5/055206</a>","chicago":"Schröder, Daniel, Sebastian Burhenn, Maria Teresa de los Arcos de Pedro, and Volker Schulz-von der Gathen. “Characteristics of a Propagating, Self-Pulsing, Constricted ‘γ-Mode-like’ Discharge.” <i>Journal of Physics D: Applied Physics</i>, 2015. <a href=\"https://doi.org/10.1088/0022-3727/48/5/055206\">https://doi.org/10.1088/0022-3727/48/5/055206</a>.","ieee":"D. Schröder, S. Burhenn, M. T. de los Arcos de Pedro, and V. Schulz-von der Gathen, “Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 055206, 2015, doi: <a href=\"https://doi.org/10.1088/0022-3727/48/5/055206\">10.1088/0022-3727/48/5/055206</a>.","bibtex":"@article{Schröder_Burhenn_de los Arcos de Pedro_Schulz-von der Gathen_2015, title={Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge}, DOI={<a href=\"https://doi.org/10.1088/0022-3727/48/5/055206\">10.1088/0022-3727/48/5/055206</a>}, number={055206}, journal={Journal of Physics D: Applied Physics}, author={Schröder, Daniel and Burhenn, Sebastian and de los Arcos de Pedro, Maria Teresa and Schulz-von der Gathen, Volker}, year={2015} }","short":"D. Schröder, S. Burhenn, M.T. de los Arcos de Pedro, V. Schulz-von der Gathen, Journal of Physics D: Applied Physics (2015).","mla":"Schröder, Daniel, et al. “Characteristics of a Propagating, Self-Pulsing, Constricted ‘γ-Mode-like’ Discharge.” <i>Journal of Physics D: Applied Physics</i>, 055206, 2015, doi:<a href=\"https://doi.org/10.1088/0022-3727/48/5/055206\">10.1088/0022-3727/48/5/055206</a>.","apa":"Schröder, D., Burhenn, S., de los Arcos de Pedro, M. T., &#38; Schulz-von der Gathen, V. (2015). Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge. <i>Journal of Physics D: Applied Physics</i>, Article 055206. <a href=\"https://doi.org/10.1088/0022-3727/48/5/055206\">https://doi.org/10.1088/0022-3727/48/5/055206</a>"},"year":"2015"},{"citation":{"apa":"Marinov, D., Guaitella, O., de los Arcos de Pedro, M. T., von Keudell, A., &#38; Rousseau, A. (2014). Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure. <i>Journal of Physics D: Applied Physics</i>, Article 475204. <a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">https://doi.org/10.1088/0022-3727/47/47/475204</a>","bibtex":"@article{Marinov_Guaitella_de los Arcos de Pedro_von Keudell_Rousseau_2014, title={Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure}, DOI={<a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>}, number={475204}, journal={Journal of Physics D: Applied Physics}, author={Marinov, D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A and Rousseau, A}, year={2014} }","mla":"Marinov, D., et al. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface under Plasma Exposure.” <i>Journal of Physics D: Applied Physics</i>, 475204, 2014, doi:<a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>.","short":"D. Marinov, O. Guaitella, M.T. de los Arcos de Pedro, A. von Keudell, A. Rousseau, Journal of Physics D: Applied Physics (2014).","ama":"Marinov D, Guaitella O, de los Arcos de Pedro MT, von Keudell A, Rousseau A. Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure. <i>Journal of Physics D: Applied Physics</i>. Published online 2014. doi:<a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>","ieee":"D. Marinov, O. Guaitella, M. T. de los Arcos de Pedro, A. von Keudell, and A. Rousseau, “Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 475204, 2014, doi: <a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">10.1088/0022-3727/47/47/475204</a>.","chicago":"Marinov, D, O Guaitella, Maria Teresa de los Arcos de Pedro, A von Keudell, and A Rousseau. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface under Plasma Exposure.” <i>Journal of Physics D: Applied Physics</i>, 2014. <a href=\"https://doi.org/10.1088/0022-3727/47/47/475204\">https://doi.org/10.1088/0022-3727/47/47/475204</a>."},"year":"2014","publication_status":"published","publication_identifier":{"issn":["0022-3727","1361-6463"]},"doi":"10.1088/0022-3727/47/47/475204","title":"Adsorption and reactivity of nitrogen atoms on silica surface under plasma exposure","date_created":"2021-07-07T11:11:00Z","author":[{"first_name":"D","full_name":"Marinov, D","last_name":"Marinov"},{"first_name":"O","full_name":"Guaitella, O","last_name":"Guaitella"},{"last_name":"de los Arcos de Pedro","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","first_name":"Maria Teresa"},{"first_name":"A","last_name":"von Keudell","full_name":"von Keudell, A"},{"full_name":"Rousseau, A","last_name":"Rousseau","first_name":"A"}],"date_updated":"2023-01-24T08:21:18Z","status":"public","type":"journal_article","publication":"Journal of Physics D: Applied Physics","language":[{"iso":"eng"}],"extern":"1","article_number":"475204","user_id":"54556","department":[{"_id":"302"}],"_id":"22588"},{"status":"public","publication":"Journal of Physics D: Applied Physics","type":"journal_article","article_number":"084009","language":[{"iso":"eng"}],"extern":"1","_id":"22594","department":[{"_id":"302"}],"user_id":"54556","year":"2013","citation":{"short":"A. Will, M.T. de los Arcos de Pedro, C. Corbella, A. Hecimovic, P.D. Machura, J. Winter, A. von Keudell, Journal of Physics D: Applied Physics (2013).","bibtex":"@article{Will_de los Arcos de Pedro_Corbella_Hecimovic_Machura_Winter_von Keudell_2013, title={Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum}, DOI={<a href=\"https://doi.org/10.1088/0022-3727/46/8/084009\">10.1088/0022-3727/46/8/084009</a>}, number={084009}, journal={Journal of Physics D: Applied Physics}, author={Will, Andreas and de los Arcos de Pedro, Maria Teresa and Corbella, Carles and Hecimovic, Ante and Machura, Patrick D and Winter, Jörg and von Keudell, Achim}, year={2013} }","mla":"Will, Andreas, et al. “Target Implantation and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.” <i>Journal of Physics D: Applied Physics</i>, 084009, 2013, doi:<a href=\"https://doi.org/10.1088/0022-3727/46/8/084009\">10.1088/0022-3727/46/8/084009</a>.","apa":"Will, A., de los Arcos de Pedro, M. T., Corbella, C., Hecimovic, A., Machura, P. D., Winter, J., &#38; von Keudell, A. (2013). Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum. <i>Journal of Physics D: Applied Physics</i>, Article 084009. <a href=\"https://doi.org/10.1088/0022-3727/46/8/084009\">https://doi.org/10.1088/0022-3727/46/8/084009</a>","ama":"Will A, de los Arcos de Pedro MT, Corbella C, et al. Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum. <i>Journal of Physics D: Applied Physics</i>. Published online 2013. doi:<a href=\"https://doi.org/10.1088/0022-3727/46/8/084009\">10.1088/0022-3727/46/8/084009</a>","ieee":"A. Will <i>et al.</i>, “Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 084009, 2013, doi: <a href=\"https://doi.org/10.1088/0022-3727/46/8/084009\">10.1088/0022-3727/46/8/084009</a>.","chicago":"Will, Andreas, Maria Teresa de los Arcos de Pedro, Carles Corbella, Ante Hecimovic, Patrick D Machura, Jörg Winter, and Achim von Keudell. “Target Implantation and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.” <i>Journal of Physics D: Applied Physics</i>, 2013. <a href=\"https://doi.org/10.1088/0022-3727/46/8/084009\">https://doi.org/10.1088/0022-3727/46/8/084009</a>."},"publication_identifier":{"issn":["0022-3727","1361-6463"]},"publication_status":"published","title":"Target implantation and redeposition processes during high-power impulse magnetron sputtering of aluminum","doi":"10.1088/0022-3727/46/8/084009","date_updated":"2023-01-24T08:23:28Z","author":[{"first_name":"Andreas","full_name":"Will, Andreas","last_name":"Will"},{"last_name":"de los Arcos de Pedro","full_name":"de los Arcos de Pedro, Maria Teresa","id":"54556","first_name":"Maria Teresa"},{"first_name":"Carles","last_name":"Corbella","full_name":"Corbella, Carles"},{"last_name":"Hecimovic","full_name":"Hecimovic, Ante","first_name":"Ante"},{"first_name":"Patrick D","full_name":"Machura, Patrick D","last_name":"Machura"},{"first_name":"Jörg","full_name":"Winter, Jörg","last_name":"Winter"},{"last_name":"von Keudell","full_name":"von Keudell, Achim","first_name":"Achim"}],"date_created":"2021-07-07T11:13:47Z"},{"type":"journal_article","publication":"Journal of Physics D: Applied Physics","status":"public","user_id":"54556","department":[{"_id":"302"}],"_id":"22595","extern":"1","language":[{"iso":"eng"}],"article_number":"084007","publication_status":"published","publication_identifier":{"issn":["0022-3727","1361-6463"]},"citation":{"short":"J. Winter, A. Hecimovic, M.T. de los Arcos de Pedro, M. Böke, V. Schulz-von der Gathen, Journal of Physics D: Applied Physics (2013).","mla":"Winter, J., et al. “Instabilities in High-Power Impulse Magnetron Plasmas: From Stochasticity to Periodicity.” <i>Journal of Physics D: Applied Physics</i>, 084007, 2013, doi:<a href=\"https://doi.org/10.1088/0022-3727/46/8/084007\">10.1088/0022-3727/46/8/084007</a>.","bibtex":"@article{Winter_Hecimovic_de los Arcos de Pedro_Böke_Schulz-von der Gathen_2013, title={Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity}, DOI={<a href=\"https://doi.org/10.1088/0022-3727/46/8/084007\">10.1088/0022-3727/46/8/084007</a>}, number={084007}, journal={Journal of Physics D: Applied Physics}, author={Winter, J and Hecimovic, A and de los Arcos de Pedro, Maria Teresa and Böke, M and Schulz-von der Gathen, V}, year={2013} }","apa":"Winter, J., Hecimovic, A., de los Arcos de Pedro, M. T., Böke, M., &#38; Schulz-von der Gathen, V. (2013). Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity. <i>Journal of Physics D: Applied Physics</i>, Article 084007. <a href=\"https://doi.org/10.1088/0022-3727/46/8/084007\">https://doi.org/10.1088/0022-3727/46/8/084007</a>","chicago":"Winter, J, A Hecimovic, Maria Teresa de los Arcos de Pedro, M Böke, and V Schulz-von der Gathen. “Instabilities in High-Power Impulse Magnetron Plasmas: From Stochasticity to Periodicity.” <i>Journal of Physics D: Applied Physics</i>, 2013. <a href=\"https://doi.org/10.1088/0022-3727/46/8/084007\">https://doi.org/10.1088/0022-3727/46/8/084007</a>.","ieee":"J. Winter, A. Hecimovic, M. T. de los Arcos de Pedro, M. Böke, and V. Schulz-von der Gathen, “Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 084007, 2013, doi: <a href=\"https://doi.org/10.1088/0022-3727/46/8/084007\">10.1088/0022-3727/46/8/084007</a>.","ama":"Winter J, Hecimovic A, de los Arcos de Pedro MT, Böke M, Schulz-von der Gathen V. Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity. <i>Journal of Physics D: Applied Physics</i>. Published online 2013. doi:<a href=\"https://doi.org/10.1088/0022-3727/46/8/084007\">10.1088/0022-3727/46/8/084007</a>"},"year":"2013","date_created":"2021-07-07T11:14:06Z","author":[{"last_name":"Winter","full_name":"Winter, J","first_name":"J"},{"last_name":"Hecimovic","full_name":"Hecimovic, A","first_name":"A"},{"first_name":"Maria Teresa","id":"54556","full_name":"de los Arcos de Pedro, Maria Teresa","last_name":"de los Arcos de Pedro"},{"full_name":"Böke, M","last_name":"Böke","first_name":"M"},{"first_name":"V","full_name":"Schulz-von der Gathen, V","last_name":"Schulz-von der Gathen"}],"date_updated":"2023-01-24T08:23:42Z","doi":"10.1088/0022-3727/46/8/084007","title":"Instabilities in high-power impulse magnetron plasmas: from stochasticity to periodicity"},{"year":"2002","citation":{"chicago":"Sander, D, R Skomski, A Enders, C Schmidthals, Dirk Reuter, and J Kirschner. “The Correlation between Mechanical Stress and Magnetic Properties of Ultrathin Films.” <i>Journal of Physics D: Applied Physics</i>, 2002, 663–70. <a href=\"https://doi.org/10.1088/0022-3727/31/6/014\">https://doi.org/10.1088/0022-3727/31/6/014</a>.","ieee":"D. Sander, R. Skomski, A. Enders, C. Schmidthals, D. Reuter, and J. Kirschner, “The correlation between mechanical stress and magnetic properties of ultrathin films,” <i>Journal of Physics D: Applied Physics</i>, pp. 663–670, 2002.","ama":"Sander D, Skomski R, Enders A, Schmidthals C, Reuter D, Kirschner J. The correlation between mechanical stress and magnetic properties of ultrathin films. <i>Journal of Physics D: Applied Physics</i>. 2002:663-670. doi:<a href=\"https://doi.org/10.1088/0022-3727/31/6/014\">10.1088/0022-3727/31/6/014</a>","bibtex":"@article{Sander_Skomski_Enders_Schmidthals_Reuter_Kirschner_2002, title={The correlation between mechanical stress and magnetic properties of ultrathin films}, DOI={<a href=\"https://doi.org/10.1088/0022-3727/31/6/014\">10.1088/0022-3727/31/6/014</a>}, journal={Journal of Physics D: Applied Physics}, author={Sander, D and Skomski, R and Enders, A and Schmidthals, C and Reuter, Dirk and Kirschner, J}, year={2002}, pages={663–670} }","short":"D. Sander, R. Skomski, A. Enders, C. Schmidthals, D. Reuter, J. Kirschner, Journal of Physics D: Applied Physics (2002) 663–670.","mla":"Sander, D., et al. “The Correlation between Mechanical Stress and Magnetic Properties of Ultrathin Films.” <i>Journal of Physics D: Applied Physics</i>, 2002, pp. 663–70, doi:<a href=\"https://doi.org/10.1088/0022-3727/31/6/014\">10.1088/0022-3727/31/6/014</a>.","apa":"Sander, D., Skomski, R., Enders, A., Schmidthals, C., Reuter, D., &#38; Kirschner, J. (2002). The correlation between mechanical stress and magnetic properties of ultrathin films. <i>Journal of Physics D: Applied Physics</i>, 663–670. <a href=\"https://doi.org/10.1088/0022-3727/31/6/014\">https://doi.org/10.1088/0022-3727/31/6/014</a>"},"page":"663-670","publication_status":"published","publication_identifier":{"issn":["0022-3727","1361-6463"]},"title":"The correlation between mechanical stress and magnetic properties of ultrathin films","doi":"10.1088/0022-3727/31/6/014","date_updated":"2022-01-06T07:04:00Z","author":[{"first_name":"D","full_name":"Sander, D","last_name":"Sander"},{"first_name":"R","full_name":"Skomski, R","last_name":"Skomski"},{"last_name":"Enders","full_name":"Enders, A","first_name":"A"},{"first_name":"C","last_name":"Schmidthals","full_name":"Schmidthals, C"},{"first_name":"Dirk","full_name":"Reuter, Dirk","id":"37763","last_name":"Reuter"},{"last_name":"Kirschner","full_name":"Kirschner, J","first_name":"J"}],"date_created":"2019-04-01T08:38:47Z","status":"public","type":"journal_article","publication":"Journal of Physics D: Applied Physics","language":[{"iso":"eng"}],"_id":"8785","user_id":"42514","department":[{"_id":"15"},{"_id":"230"}]}]