---
_id: '22559'
article_number: '145201'
author:
- first_name: F
  full_name: Mitschker, F
  last_name: Mitschker
- first_name: J
  full_name: Wißing, J
  last_name: Wißing
- first_name: Ch
  full_name: Hoppe, Ch
  last_name: Hoppe
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Guido
  full_name: Grundmeier, Guido
  id: '194'
  last_name: Grundmeier
- first_name: P
  full_name: Awakowicz, P
  last_name: Awakowicz
citation:
  ama: 'Mitschker F, Wißing J, Hoppe C, de los Arcos de Pedro MT, Grundmeier G, Awakowicz
    P. Influence of average ion energy and atomic oxygen flux per Si atom on the formation
    of silicon oxide permeation barrier coatings on PET. <i>Journal of Physics D:
    Applied Physics</i>. Published online 2018. doi:<a href="https://doi.org/10.1088/1361-6463/aab1dd">10.1088/1361-6463/aab1dd</a>'
  apa: 'Mitschker, F., Wißing, J., Hoppe, C., de los Arcos de Pedro, M. T., Grundmeier,
    G., &#38; Awakowicz, P. (2018). Influence of average ion energy and atomic oxygen
    flux per Si atom on the formation of silicon oxide permeation barrier coatings
    on PET. <i>Journal of Physics D: Applied Physics</i>, Article 145201. <a href="https://doi.org/10.1088/1361-6463/aab1dd">https://doi.org/10.1088/1361-6463/aab1dd</a>'
  bibtex: '@article{Mitschker_Wißing_Hoppe_de los Arcos de Pedro_Grundmeier_Awakowicz_2018,
    title={Influence of average ion energy and atomic oxygen flux per Si atom on the
    formation of silicon oxide permeation barrier coatings on PET}, DOI={<a href="https://doi.org/10.1088/1361-6463/aab1dd">10.1088/1361-6463/aab1dd</a>},
    number={145201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker,
    F and Wißing, J and Hoppe, Ch and de los Arcos de Pedro, Maria Teresa and Grundmeier,
    Guido and Awakowicz, P}, year={2018} }'
  chicago: 'Mitschker, F, J Wißing, Ch Hoppe, Maria Teresa de los Arcos de Pedro,
    Guido Grundmeier, and P Awakowicz. “Influence of Average Ion Energy and Atomic
    Oxygen Flux per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings
    on PET.” <i>Journal of Physics D: Applied Physics</i>, 2018. <a href="https://doi.org/10.1088/1361-6463/aab1dd">https://doi.org/10.1088/1361-6463/aab1dd</a>.'
  ieee: 'F. Mitschker, J. Wißing, C. Hoppe, M. T. de los Arcos de Pedro, G. Grundmeier,
    and P. Awakowicz, “Influence of average ion energy and atomic oxygen flux per
    Si atom on the formation of silicon oxide permeation barrier coatings on PET,”
    <i>Journal of Physics D: Applied Physics</i>, Art. no. 145201, 2018, doi: <a href="https://doi.org/10.1088/1361-6463/aab1dd">10.1088/1361-6463/aab1dd</a>.'
  mla: 'Mitschker, F., et al. “Influence of Average Ion Energy and Atomic Oxygen Flux
    per Si Atom on the Formation of Silicon Oxide Permeation Barrier Coatings on PET.”
    <i>Journal of Physics D: Applied Physics</i>, 145201, 2018, doi:<a href="https://doi.org/10.1088/1361-6463/aab1dd">10.1088/1361-6463/aab1dd</a>.'
  short: 'F. Mitschker, J. Wißing, C. Hoppe, M.T. de los Arcos de Pedro, G. Grundmeier,
    P. Awakowicz, Journal of Physics D: Applied Physics (2018).'
date_created: 2021-07-07T09:03:03Z
date_updated: 2023-01-24T08:40:21Z
department:
- _id: '302'
doi: 10.1088/1361-6463/aab1dd
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Influence of average ion energy and atomic oxygen flux per Si atom on the formation
  of silicon oxide permeation barrier coatings on PET
type: journal_article
user_id: '54556'
year: '2018'
...
---
_id: '22849'
article_number: '204002'
author:
- first_name: Christian
  full_name: Hoppe, Christian
  id: '27401'
  last_name: Hoppe
- first_name: F
  full_name: Mitschker, F
  last_name: Mitschker
- first_name: I
  full_name: Giner, I
  last_name: Giner
- first_name: T
  full_name: de los Arcos, T
  last_name: de los Arcos
- first_name: P
  full_name: Awakowicz, P
  last_name: Awakowicz
- first_name: Guido
  full_name: Grundmeier, Guido
  id: '194'
  last_name: Grundmeier
citation:
  ama: 'Hoppe C, Mitschker F, Giner I, de los Arcos T, Awakowicz P, Grundmeier G.
    Influence of organic surface chemistry on the nucleation of plasma deposited SiOxfilms.
    <i>Journal of Physics D: Applied Physics</i>. 2017. doi:<a href="https://doi.org/10.1088/1361-6463/aa69e5">10.1088/1361-6463/aa69e5</a>'
  apa: 'Hoppe, C., Mitschker, F., Giner, I., de los Arcos, T., Awakowicz, P., &#38;
    Grundmeier, G. (2017). Influence of organic surface chemistry on the nucleation
    of plasma deposited SiOxfilms. <i>Journal of Physics D: Applied Physics</i>. <a
    href="https://doi.org/10.1088/1361-6463/aa69e5">https://doi.org/10.1088/1361-6463/aa69e5</a>'
  bibtex: '@article{Hoppe_Mitschker_Giner_de los Arcos_Awakowicz_Grundmeier_2017,
    title={Influence of organic surface chemistry on the nucleation of plasma deposited
    SiOxfilms}, DOI={<a href="https://doi.org/10.1088/1361-6463/aa69e5">10.1088/1361-6463/aa69e5</a>},
    number={204002}, journal={Journal of Physics D: Applied Physics}, author={Hoppe,
    Christian and Mitschker, F and Giner, I and de los Arcos, T and Awakowicz, P and
    Grundmeier, Guido}, year={2017} }'
  chicago: 'Hoppe, Christian, F Mitschker, I Giner, T de los Arcos, P Awakowicz, and
    Guido Grundmeier. “Influence of Organic Surface Chemistry on the Nucleation of
    Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>, 2017.
    <a href="https://doi.org/10.1088/1361-6463/aa69e5">https://doi.org/10.1088/1361-6463/aa69e5</a>.'
  ieee: 'C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, and G. Grundmeier,
    “Influence of organic surface chemistry on the nucleation of plasma deposited
    SiOxfilms,” <i>Journal of Physics D: Applied Physics</i>, 2017.'
  mla: 'Hoppe, Christian, et al. “Influence of Organic Surface Chemistry on the Nucleation
    of Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>,
    204002, 2017, doi:<a href="https://doi.org/10.1088/1361-6463/aa69e5">10.1088/1361-6463/aa69e5</a>.'
  short: 'C. Hoppe, F. Mitschker, I. Giner, T. de los Arcos, P. Awakowicz, G. Grundmeier,
    Journal of Physics D: Applied Physics (2017).'
date_created: 2021-07-27T14:19:04Z
date_updated: 2022-01-06T06:55:42Z
doi: 10.1088/1361-6463/aa69e5
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Influence of organic surface chemistry on the nucleation of plasma deposited
  SiOxfilms
type: journal_article
user_id: '194'
year: '2017'
...
---
_id: '22571'
article_number: '235201'
author:
- first_name: F
  full_name: Mitschker, F
  last_name: Mitschker
- first_name: S
  full_name: Steves, S
  last_name: Steves
- first_name: M
  full_name: Gebhard, M
  last_name: Gebhard
- first_name: M
  full_name: Rudolph, M
  last_name: Rudolph
- first_name: L
  full_name: Schücke, L
  last_name: Schücke
- first_name: D
  full_name: Kirchheim, D
  last_name: Kirchheim
- first_name: M
  full_name: Jaritz, M
  last_name: Jaritz
- first_name: M
  full_name: Brochhagen, M
  last_name: Brochhagen
- first_name: Ch
  full_name: Hoppe, Ch
  last_name: Hoppe
- first_name: R
  full_name: Dahlmann, R
  last_name: Dahlmann
- first_name: M
  full_name: Böke, M
  last_name: Böke
- first_name: J
  full_name: Benedikt, J
  last_name: Benedikt
- first_name: I
  full_name: Giner, I
  last_name: Giner
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Ch
  full_name: Hopmann, Ch
  last_name: Hopmann
- first_name: G
  full_name: Grundmeier, G
  last_name: Grundmeier
- first_name: A
  full_name: Devi, A
  last_name: Devi
- first_name: P
  full_name: Awakowicz, P
  last_name: Awakowicz
citation:
  ama: 'Mitschker F, Steves S, Gebhard M, et al. Influence of PE-CVD and PE-ALD on
    defect formation in permeation barrier films on PET and correlation to atomic
    oxygen fluence. <i>Journal of Physics D: Applied Physics</i>. Published online
    2017. doi:<a href="https://doi.org/10.1088/1361-6463/aa6e28">10.1088/1361-6463/aa6e28</a>'
  apa: 'Mitschker, F., Steves, S., Gebhard, M., Rudolph, M., Schücke, L., Kirchheim,
    D., Jaritz, M., Brochhagen, M., Hoppe, C., Dahlmann, R., Böke, M., Benedikt, J.,
    Giner, I., de los Arcos de Pedro, M. T., Hopmann, C., Grundmeier, G., Devi, A.,
    &#38; Awakowicz, P. (2017). Influence of PE-CVD and PE-ALD on defect formation
    in permeation barrier films on PET and correlation to atomic oxygen fluence. <i>Journal
    of Physics D: Applied Physics</i>, Article 235201. <a href="https://doi.org/10.1088/1361-6463/aa6e28">https://doi.org/10.1088/1361-6463/aa6e28</a>'
  bibtex: '@article{Mitschker_Steves_Gebhard_Rudolph_Schücke_Kirchheim_Jaritz_Brochhagen_Hoppe_Dahlmann_et
    al._2017, title={Influence of PE-CVD and PE-ALD on defect formation in permeation
    barrier films on PET and correlation to atomic oxygen fluence}, DOI={<a href="https://doi.org/10.1088/1361-6463/aa6e28">10.1088/1361-6463/aa6e28</a>},
    number={235201}, journal={Journal of Physics D: Applied Physics}, author={Mitschker,
    F and Steves, S and Gebhard, M and Rudolph, M and Schücke, L and Kirchheim, D
    and Jaritz, M and Brochhagen, M and Hoppe, Ch and Dahlmann, R and et al.}, year={2017}
    }'
  chicago: 'Mitschker, F, S Steves, M Gebhard, M Rudolph, L Schücke, D Kirchheim,
    M Jaritz, et al. “Influence of PE-CVD and PE-ALD on Defect Formation in Permeation
    Barrier Films on PET and Correlation to Atomic Oxygen Fluence.” <i>Journal of
    Physics D: Applied Physics</i>, 2017. <a href="https://doi.org/10.1088/1361-6463/aa6e28">https://doi.org/10.1088/1361-6463/aa6e28</a>.'
  ieee: 'F. Mitschker <i>et al.</i>, “Influence of PE-CVD and PE-ALD on defect formation
    in permeation barrier films on PET and correlation to atomic oxygen fluence,”
    <i>Journal of Physics D: Applied Physics</i>, Art. no. 235201, 2017, doi: <a href="https://doi.org/10.1088/1361-6463/aa6e28">10.1088/1361-6463/aa6e28</a>.'
  mla: 'Mitschker, F., et al. “Influence of PE-CVD and PE-ALD on Defect Formation
    in Permeation Barrier Films on PET and Correlation to Atomic Oxygen Fluence.”
    <i>Journal of Physics D: Applied Physics</i>, 235201, 2017, doi:<a href="https://doi.org/10.1088/1361-6463/aa6e28">10.1088/1361-6463/aa6e28</a>.'
  short: 'F. Mitschker, S. Steves, M. Gebhard, M. Rudolph, L. Schücke, D. Kirchheim,
    M. Jaritz, M. Brochhagen, C. Hoppe, R. Dahlmann, M. Böke, J. Benedikt, I. Giner,
    M.T. de los Arcos de Pedro, C. Hopmann, G. Grundmeier, A. Devi, P. Awakowicz,
    Journal of Physics D: Applied Physics (2017).'
date_created: 2021-07-07T09:09:32Z
date_updated: 2023-01-24T08:15:24Z
department:
- _id: '302'
doi: 10.1088/1361-6463/aa6e28
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Influence of PE-CVD and PE-ALD on defect formation in permeation barrier films
  on PET and correlation to atomic oxygen fluence
type: journal_article
user_id: '54556'
year: '2017'
...
---
_id: '22566'
article_number: '204002'
author:
- first_name: C
  full_name: Hoppe, C
  last_name: Hoppe
- first_name: F
  full_name: Mitschker, F
  last_name: Mitschker
- first_name: I
  full_name: Giner, I
  last_name: Giner
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: P
  full_name: Awakowicz, P
  last_name: Awakowicz
- first_name: G
  full_name: Grundmeier, G
  last_name: Grundmeier
citation:
  ama: 'Hoppe C, Mitschker F, Giner I, de los Arcos de Pedro MT, Awakowicz P, Grundmeier
    G. Influence of organic surface chemistry on the nucleation of plasma deposited
    SiOxfilms. <i>Journal of Physics D: Applied Physics</i>. Published online 2017.
    doi:<a href="https://doi.org/10.1088/1361-6463/aa69e5">10.1088/1361-6463/aa69e5</a>'
  apa: 'Hoppe, C., Mitschker, F., Giner, I., de los Arcos de Pedro, M. T., Awakowicz,
    P., &#38; Grundmeier, G. (2017). Influence of organic surface chemistry on the
    nucleation of plasma deposited SiOxfilms. <i>Journal of Physics D: Applied Physics</i>,
    Article 204002. <a href="https://doi.org/10.1088/1361-6463/aa69e5">https://doi.org/10.1088/1361-6463/aa69e5</a>'
  bibtex: '@article{Hoppe_Mitschker_Giner_de los Arcos de Pedro_Awakowicz_Grundmeier_2017,
    title={Influence of organic surface chemistry on the nucleation of plasma deposited
    SiOxfilms}, DOI={<a href="https://doi.org/10.1088/1361-6463/aa69e5">10.1088/1361-6463/aa69e5</a>},
    number={204002}, journal={Journal of Physics D: Applied Physics}, author={Hoppe,
    C and Mitschker, F and Giner, I and de los Arcos de Pedro, Maria Teresa and Awakowicz,
    P and Grundmeier, G}, year={2017} }'
  chicago: 'Hoppe, C, F Mitschker, I Giner, Maria Teresa de los Arcos de Pedro, P
    Awakowicz, and G Grundmeier. “Influence of Organic Surface Chemistry on the Nucleation
    of Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>,
    2017. <a href="https://doi.org/10.1088/1361-6463/aa69e5">https://doi.org/10.1088/1361-6463/aa69e5</a>.'
  ieee: 'C. Hoppe, F. Mitschker, I. Giner, M. T. de los Arcos de Pedro, P. Awakowicz,
    and G. Grundmeier, “Influence of organic surface chemistry on the nucleation of
    plasma deposited SiOxfilms,” <i>Journal of Physics D: Applied Physics</i>, Art.
    no. 204002, 2017, doi: <a href="https://doi.org/10.1088/1361-6463/aa69e5">10.1088/1361-6463/aa69e5</a>.'
  mla: 'Hoppe, C., et al. “Influence of Organic Surface Chemistry on the Nucleation
    of Plasma Deposited SiOxfilms.” <i>Journal of Physics D: Applied Physics</i>,
    204002, 2017, doi:<a href="https://doi.org/10.1088/1361-6463/aa69e5">10.1088/1361-6463/aa69e5</a>.'
  short: 'C. Hoppe, F. Mitschker, I. Giner, M.T. de los Arcos de Pedro, P. Awakowicz,
    G. Grundmeier, Journal of Physics D: Applied Physics (2017).'
date_created: 2021-07-07T09:08:02Z
date_updated: 2023-01-24T08:13:17Z
department:
- _id: '302'
doi: 10.1088/1361-6463/aa69e5
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Influence of organic surface chemistry on the nucleation of plasma deposited
  SiOxfilms
type: journal_article
user_id: '54556'
year: '2017'
...
---
_id: '22576'
article_number: 16LT01
author:
- first_name: Carles
  full_name: Corbella, Carles
  last_name: Corbella
- first_name: Adrian
  full_name: Marcak, Adrian
  last_name: Marcak
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Achim
  full_name: von Keudell, Achim
  last_name: von Keudell
citation:
  ama: 'Corbella C, Marcak A, de los Arcos de Pedro MT, von Keudell A. Revising secondary
    electron yields of ion-sputtered metal oxides. <i>Journal of Physics D: Applied
    Physics</i>. Published online 2016. doi:<a href="https://doi.org/10.1088/0022-3727/49/16/16lt01">10.1088/0022-3727/49/16/16lt01</a>'
  apa: 'Corbella, C., Marcak, A., de los Arcos de Pedro, M. T., &#38; von Keudell,
    A. (2016). Revising secondary electron yields of ion-sputtered metal oxides. <i>Journal
    of Physics D: Applied Physics</i>, Article 16LT01. <a href="https://doi.org/10.1088/0022-3727/49/16/16lt01">https://doi.org/10.1088/0022-3727/49/16/16lt01</a>'
  bibtex: '@article{Corbella_Marcak_de los Arcos de Pedro_von Keudell_2016, title={Revising
    secondary electron yields of ion-sputtered metal oxides}, DOI={<a href="https://doi.org/10.1088/0022-3727/49/16/16lt01">10.1088/0022-3727/49/16/16lt01</a>},
    number={16LT01}, journal={Journal of Physics D: Applied Physics}, author={Corbella,
    Carles and Marcak, Adrian and de los Arcos de Pedro, Maria Teresa and von Keudell,
    Achim}, year={2016} }'
  chicago: 'Corbella, Carles, Adrian Marcak, Maria Teresa de los Arcos de Pedro, and
    Achim von Keudell. “Revising Secondary Electron Yields of Ion-Sputtered Metal
    Oxides.” <i>Journal of Physics D: Applied Physics</i>, 2016. <a href="https://doi.org/10.1088/0022-3727/49/16/16lt01">https://doi.org/10.1088/0022-3727/49/16/16lt01</a>.'
  ieee: 'C. Corbella, A. Marcak, M. T. de los Arcos de Pedro, and A. von Keudell,
    “Revising secondary electron yields of ion-sputtered metal oxides,” <i>Journal
    of Physics D: Applied Physics</i>, Art. no. 16LT01, 2016, doi: <a href="https://doi.org/10.1088/0022-3727/49/16/16lt01">10.1088/0022-3727/49/16/16lt01</a>.'
  mla: 'Corbella, Carles, et al. “Revising Secondary Electron Yields of Ion-Sputtered
    Metal Oxides.” <i>Journal of Physics D: Applied Physics</i>, 16LT01, 2016, doi:<a
    href="https://doi.org/10.1088/0022-3727/49/16/16lt01">10.1088/0022-3727/49/16/16lt01</a>.'
  short: 'C. Corbella, A. Marcak, M.T. de los Arcos de Pedro, A. von Keudell, Journal
    of Physics D: Applied Physics (2016).'
date_created: 2021-07-07T09:12:49Z
date_updated: 2023-01-24T08:17:43Z
department:
- _id: '302'
doi: 10.1088/0022-3727/49/16/16lt01
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Revising secondary electron yields of ion-sputtered metal oxides
type: journal_article
user_id: '54556'
year: '2016'
...
---
_id: '22583'
article_number: '055206'
author:
- first_name: Daniel
  full_name: Schröder, Daniel
  last_name: Schröder
- first_name: Sebastian
  full_name: Burhenn, Sebastian
  last_name: Burhenn
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Volker
  full_name: Schulz-von der Gathen, Volker
  last_name: Schulz-von der Gathen
citation:
  ama: 'Schröder D, Burhenn S, de los Arcos de Pedro MT, Schulz-von der Gathen V.
    Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge.
    <i>Journal of Physics D: Applied Physics</i>. Published online 2015. doi:<a href="https://doi.org/10.1088/0022-3727/48/5/055206">10.1088/0022-3727/48/5/055206</a>'
  apa: 'Schröder, D., Burhenn, S., de los Arcos de Pedro, M. T., &#38; Schulz-von
    der Gathen, V. (2015). Characteristics of a propagating, self-pulsing, constricted
    ‘γ-mode-like’ discharge. <i>Journal of Physics D: Applied Physics</i>, Article
    055206. <a href="https://doi.org/10.1088/0022-3727/48/5/055206">https://doi.org/10.1088/0022-3727/48/5/055206</a>'
  bibtex: '@article{Schröder_Burhenn_de los Arcos de Pedro_Schulz-von der Gathen_2015,
    title={Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’
    discharge}, DOI={<a href="https://doi.org/10.1088/0022-3727/48/5/055206">10.1088/0022-3727/48/5/055206</a>},
    number={055206}, journal={Journal of Physics D: Applied Physics}, author={Schröder,
    Daniel and Burhenn, Sebastian and de los Arcos de Pedro, Maria Teresa and Schulz-von
    der Gathen, Volker}, year={2015} }'
  chicago: 'Schröder, Daniel, Sebastian Burhenn, Maria Teresa de los Arcos de Pedro,
    and Volker Schulz-von der Gathen. “Characteristics of a Propagating, Self-Pulsing,
    Constricted ‘γ-Mode-like’ Discharge.” <i>Journal of Physics D: Applied Physics</i>,
    2015. <a href="https://doi.org/10.1088/0022-3727/48/5/055206">https://doi.org/10.1088/0022-3727/48/5/055206</a>.'
  ieee: 'D. Schröder, S. Burhenn, M. T. de los Arcos de Pedro, and V. Schulz-von der
    Gathen, “Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’
    discharge,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 055206, 2015,
    doi: <a href="https://doi.org/10.1088/0022-3727/48/5/055206">10.1088/0022-3727/48/5/055206</a>.'
  mla: 'Schröder, Daniel, et al. “Characteristics of a Propagating, Self-Pulsing,
    Constricted ‘γ-Mode-like’ Discharge.” <i>Journal of Physics D: Applied Physics</i>,
    055206, 2015, doi:<a href="https://doi.org/10.1088/0022-3727/48/5/055206">10.1088/0022-3727/48/5/055206</a>.'
  short: 'D. Schröder, S. Burhenn, M.T. de los Arcos de Pedro, V. Schulz-von der Gathen,
    Journal of Physics D: Applied Physics (2015).'
date_created: 2021-07-07T09:15:40Z
date_updated: 2023-01-24T08:19:53Z
department:
- _id: '302'
doi: 10.1088/0022-3727/48/5/055206
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Characteristics of a propagating, self-pulsing, constricted ‘γ-mode-like’ discharge
type: journal_article
user_id: '54556'
year: '2015'
...
---
_id: '22588'
article_number: '475204'
author:
- first_name: D
  full_name: Marinov, D
  last_name: Marinov
- first_name: O
  full_name: Guaitella, O
  last_name: Guaitella
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: A
  full_name: von Keudell, A
  last_name: von Keudell
- first_name: A
  full_name: Rousseau, A
  last_name: Rousseau
citation:
  ama: 'Marinov D, Guaitella O, de los Arcos de Pedro MT, von Keudell A, Rousseau
    A. Adsorption and reactivity of nitrogen atoms on silica surface under plasma
    exposure. <i>Journal of Physics D: Applied Physics</i>. Published online 2014.
    doi:<a href="https://doi.org/10.1088/0022-3727/47/47/475204">10.1088/0022-3727/47/47/475204</a>'
  apa: 'Marinov, D., Guaitella, O., de los Arcos de Pedro, M. T., von Keudell, A.,
    &#38; Rousseau, A. (2014). Adsorption and reactivity of nitrogen atoms on silica
    surface under plasma exposure. <i>Journal of Physics D: Applied Physics</i>, Article
    475204. <a href="https://doi.org/10.1088/0022-3727/47/47/475204">https://doi.org/10.1088/0022-3727/47/47/475204</a>'
  bibtex: '@article{Marinov_Guaitella_de los Arcos de Pedro_von Keudell_Rousseau_2014,
    title={Adsorption and reactivity of nitrogen atoms on silica surface under plasma
    exposure}, DOI={<a href="https://doi.org/10.1088/0022-3727/47/47/475204">10.1088/0022-3727/47/47/475204</a>},
    number={475204}, journal={Journal of Physics D: Applied Physics}, author={Marinov,
    D and Guaitella, O and de los Arcos de Pedro, Maria Teresa and von Keudell, A
    and Rousseau, A}, year={2014} }'
  chicago: 'Marinov, D, O Guaitella, Maria Teresa de los Arcos de Pedro, A von Keudell,
    and A Rousseau. “Adsorption and Reactivity of Nitrogen Atoms on Silica Surface
    under Plasma Exposure.” <i>Journal of Physics D: Applied Physics</i>, 2014. <a
    href="https://doi.org/10.1088/0022-3727/47/47/475204">https://doi.org/10.1088/0022-3727/47/47/475204</a>.'
  ieee: 'D. Marinov, O. Guaitella, M. T. de los Arcos de Pedro, A. von Keudell, and
    A. Rousseau, “Adsorption and reactivity of nitrogen atoms on silica surface under
    plasma exposure,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 475204,
    2014, doi: <a href="https://doi.org/10.1088/0022-3727/47/47/475204">10.1088/0022-3727/47/47/475204</a>.'
  mla: 'Marinov, D., et al. “Adsorption and Reactivity of Nitrogen Atoms on Silica
    Surface under Plasma Exposure.” <i>Journal of Physics D: Applied Physics</i>,
    475204, 2014, doi:<a href="https://doi.org/10.1088/0022-3727/47/47/475204">10.1088/0022-3727/47/47/475204</a>.'
  short: 'D. Marinov, O. Guaitella, M.T. de los Arcos de Pedro, A. von Keudell, A.
    Rousseau, Journal of Physics D: Applied Physics (2014).'
date_created: 2021-07-07T11:11:00Z
date_updated: 2023-01-24T08:21:18Z
department:
- _id: '302'
doi: 10.1088/0022-3727/47/47/475204
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Adsorption and reactivity of nitrogen atoms on silica surface under plasma
  exposure
type: journal_article
user_id: '54556'
year: '2014'
...
---
_id: '22594'
article_number: '084009'
author:
- first_name: Andreas
  full_name: Will, Andreas
  last_name: Will
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: Carles
  full_name: Corbella, Carles
  last_name: Corbella
- first_name: Ante
  full_name: Hecimovic, Ante
  last_name: Hecimovic
- first_name: Patrick D
  full_name: Machura, Patrick D
  last_name: Machura
- first_name: Jörg
  full_name: Winter, Jörg
  last_name: Winter
- first_name: Achim
  full_name: von Keudell, Achim
  last_name: von Keudell
citation:
  ama: 'Will A, de los Arcos de Pedro MT, Corbella C, et al. Target implantation and
    redeposition processes during high-power impulse magnetron sputtering of aluminum.
    <i>Journal of Physics D: Applied Physics</i>. Published online 2013. doi:<a href="https://doi.org/10.1088/0022-3727/46/8/084009">10.1088/0022-3727/46/8/084009</a>'
  apa: 'Will, A., de los Arcos de Pedro, M. T., Corbella, C., Hecimovic, A., Machura,
    P. D., Winter, J., &#38; von Keudell, A. (2013). Target implantation and redeposition
    processes during high-power impulse magnetron sputtering of aluminum. <i>Journal
    of Physics D: Applied Physics</i>, Article 084009. <a href="https://doi.org/10.1088/0022-3727/46/8/084009">https://doi.org/10.1088/0022-3727/46/8/084009</a>'
  bibtex: '@article{Will_de los Arcos de Pedro_Corbella_Hecimovic_Machura_Winter_von
    Keudell_2013, title={Target implantation and redeposition processes during high-power
    impulse magnetron sputtering of aluminum}, DOI={<a href="https://doi.org/10.1088/0022-3727/46/8/084009">10.1088/0022-3727/46/8/084009</a>},
    number={084009}, journal={Journal of Physics D: Applied Physics}, author={Will,
    Andreas and de los Arcos de Pedro, Maria Teresa and Corbella, Carles and Hecimovic,
    Ante and Machura, Patrick D and Winter, Jörg and von Keudell, Achim}, year={2013}
    }'
  chicago: 'Will, Andreas, Maria Teresa de los Arcos de Pedro, Carles Corbella, Ante
    Hecimovic, Patrick D Machura, Jörg Winter, and Achim von Keudell. “Target Implantation
    and Redeposition Processes during High-Power Impulse Magnetron Sputtering of Aluminum.”
    <i>Journal of Physics D: Applied Physics</i>, 2013. <a href="https://doi.org/10.1088/0022-3727/46/8/084009">https://doi.org/10.1088/0022-3727/46/8/084009</a>.'
  ieee: 'A. Will <i>et al.</i>, “Target implantation and redeposition processes during
    high-power impulse magnetron sputtering of aluminum,” <i>Journal of Physics D:
    Applied Physics</i>, Art. no. 084009, 2013, doi: <a href="https://doi.org/10.1088/0022-3727/46/8/084009">10.1088/0022-3727/46/8/084009</a>.'
  mla: 'Will, Andreas, et al. “Target Implantation and Redeposition Processes during
    High-Power Impulse Magnetron Sputtering of Aluminum.” <i>Journal of Physics D:
    Applied Physics</i>, 084009, 2013, doi:<a href="https://doi.org/10.1088/0022-3727/46/8/084009">10.1088/0022-3727/46/8/084009</a>.'
  short: 'A. Will, M.T. de los Arcos de Pedro, C. Corbella, A. Hecimovic, P.D. Machura,
    J. Winter, A. von Keudell, Journal of Physics D: Applied Physics (2013).'
date_created: 2021-07-07T11:13:47Z
date_updated: 2023-01-24T08:23:28Z
department:
- _id: '302'
doi: 10.1088/0022-3727/46/8/084009
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: Target implantation and redeposition processes during high-power impulse magnetron
  sputtering of aluminum
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '22595'
article_number: '084007'
author:
- first_name: J
  full_name: Winter, J
  last_name: Winter
- first_name: A
  full_name: Hecimovic, A
  last_name: Hecimovic
- first_name: Maria Teresa
  full_name: de los Arcos de Pedro, Maria Teresa
  id: '54556'
  last_name: de los Arcos de Pedro
- first_name: M
  full_name: Böke, M
  last_name: Böke
- first_name: V
  full_name: Schulz-von der Gathen, V
  last_name: Schulz-von der Gathen
citation:
  ama: 'Winter J, Hecimovic A, de los Arcos de Pedro MT, Böke M, Schulz-von der Gathen
    V. Instabilities in high-power impulse magnetron plasmas: from stochasticity to
    periodicity. <i>Journal of Physics D: Applied Physics</i>. Published online 2013.
    doi:<a href="https://doi.org/10.1088/0022-3727/46/8/084007">10.1088/0022-3727/46/8/084007</a>'
  apa: 'Winter, J., Hecimovic, A., de los Arcos de Pedro, M. T., Böke, M., &#38; Schulz-von
    der Gathen, V. (2013). Instabilities in high-power impulse magnetron plasmas:
    from stochasticity to periodicity. <i>Journal of Physics D: Applied Physics</i>,
    Article 084007. <a href="https://doi.org/10.1088/0022-3727/46/8/084007">https://doi.org/10.1088/0022-3727/46/8/084007</a>'
  bibtex: '@article{Winter_Hecimovic_de los Arcos de Pedro_Böke_Schulz-von der Gathen_2013,
    title={Instabilities in high-power impulse magnetron plasmas: from stochasticity
    to periodicity}, DOI={<a href="https://doi.org/10.1088/0022-3727/46/8/084007">10.1088/0022-3727/46/8/084007</a>},
    number={084007}, journal={Journal of Physics D: Applied Physics}, author={Winter,
    J and Hecimovic, A and de los Arcos de Pedro, Maria Teresa and Böke, M and Schulz-von
    der Gathen, V}, year={2013} }'
  chicago: 'Winter, J, A Hecimovic, Maria Teresa de los Arcos de Pedro, M Böke, and
    V Schulz-von der Gathen. “Instabilities in High-Power Impulse Magnetron Plasmas:
    From Stochasticity to Periodicity.” <i>Journal of Physics D: Applied Physics</i>,
    2013. <a href="https://doi.org/10.1088/0022-3727/46/8/084007">https://doi.org/10.1088/0022-3727/46/8/084007</a>.'
  ieee: 'J. Winter, A. Hecimovic, M. T. de los Arcos de Pedro, M. Böke, and V. Schulz-von
    der Gathen, “Instabilities in high-power impulse magnetron plasmas: from stochasticity
    to periodicity,” <i>Journal of Physics D: Applied Physics</i>, Art. no. 084007,
    2013, doi: <a href="https://doi.org/10.1088/0022-3727/46/8/084007">10.1088/0022-3727/46/8/084007</a>.'
  mla: 'Winter, J., et al. “Instabilities in High-Power Impulse Magnetron Plasmas:
    From Stochasticity to Periodicity.” <i>Journal of Physics D: Applied Physics</i>,
    084007, 2013, doi:<a href="https://doi.org/10.1088/0022-3727/46/8/084007">10.1088/0022-3727/46/8/084007</a>.'
  short: 'J. Winter, A. Hecimovic, M.T. de los Arcos de Pedro, M. Böke, V. Schulz-von
    der Gathen, Journal of Physics D: Applied Physics (2013).'
date_created: 2021-07-07T11:14:06Z
date_updated: 2023-01-24T08:23:42Z
department:
- _id: '302'
doi: 10.1088/0022-3727/46/8/084007
extern: '1'
language:
- iso: eng
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: 'Instabilities in high-power impulse magnetron plasmas: from stochasticity
  to periodicity'
type: journal_article
user_id: '54556'
year: '2013'
...
---
_id: '8785'
author:
- first_name: D
  full_name: Sander, D
  last_name: Sander
- first_name: R
  full_name: Skomski, R
  last_name: Skomski
- first_name: A
  full_name: Enders, A
  last_name: Enders
- first_name: C
  full_name: Schmidthals, C
  last_name: Schmidthals
- first_name: Dirk
  full_name: Reuter, Dirk
  id: '37763'
  last_name: Reuter
- first_name: J
  full_name: Kirschner, J
  last_name: Kirschner
citation:
  ama: 'Sander D, Skomski R, Enders A, Schmidthals C, Reuter D, Kirschner J. The correlation
    between mechanical stress and magnetic properties of ultrathin films. <i>Journal
    of Physics D: Applied Physics</i>. 2002:663-670. doi:<a href="https://doi.org/10.1088/0022-3727/31/6/014">10.1088/0022-3727/31/6/014</a>'
  apa: 'Sander, D., Skomski, R., Enders, A., Schmidthals, C., Reuter, D., &#38; Kirschner,
    J. (2002). The correlation between mechanical stress and magnetic properties of
    ultrathin films. <i>Journal of Physics D: Applied Physics</i>, 663–670. <a href="https://doi.org/10.1088/0022-3727/31/6/014">https://doi.org/10.1088/0022-3727/31/6/014</a>'
  bibtex: '@article{Sander_Skomski_Enders_Schmidthals_Reuter_Kirschner_2002, title={The
    correlation between mechanical stress and magnetic properties of ultrathin films},
    DOI={<a href="https://doi.org/10.1088/0022-3727/31/6/014">10.1088/0022-3727/31/6/014</a>},
    journal={Journal of Physics D: Applied Physics}, author={Sander, D and Skomski,
    R and Enders, A and Schmidthals, C and Reuter, Dirk and Kirschner, J}, year={2002},
    pages={663–670} }'
  chicago: 'Sander, D, R Skomski, A Enders, C Schmidthals, Dirk Reuter, and J Kirschner.
    “The Correlation between Mechanical Stress and Magnetic Properties of Ultrathin
    Films.” <i>Journal of Physics D: Applied Physics</i>, 2002, 663–70. <a href="https://doi.org/10.1088/0022-3727/31/6/014">https://doi.org/10.1088/0022-3727/31/6/014</a>.'
  ieee: 'D. Sander, R. Skomski, A. Enders, C. Schmidthals, D. Reuter, and J. Kirschner,
    “The correlation between mechanical stress and magnetic properties of ultrathin
    films,” <i>Journal of Physics D: Applied Physics</i>, pp. 663–670, 2002.'
  mla: 'Sander, D., et al. “The Correlation between Mechanical Stress and Magnetic
    Properties of Ultrathin Films.” <i>Journal of Physics D: Applied Physics</i>,
    2002, pp. 663–70, doi:<a href="https://doi.org/10.1088/0022-3727/31/6/014">10.1088/0022-3727/31/6/014</a>.'
  short: 'D. Sander, R. Skomski, A. Enders, C. Schmidthals, D. Reuter, J. Kirschner,
    Journal of Physics D: Applied Physics (2002) 663–670.'
date_created: 2019-04-01T08:38:47Z
date_updated: 2022-01-06T07:04:00Z
department:
- _id: '15'
- _id: '230'
doi: 10.1088/0022-3727/31/6/014
language:
- iso: eng
page: 663-670
publication: 'Journal of Physics D: Applied Physics'
publication_identifier:
  issn:
  - 0022-3727
  - 1361-6463
publication_status: published
status: public
title: The correlation between mechanical stress and magnetic properties of ultrathin
  films
type: journal_article
user_id: '42514'
year: '2002'
...