--- _id: '23815' abstract: - lang: eng text: In this paper, silicon oxynitride films (SiON) grown by plasma-enhanced chemical vapor deposition are investigated. As precursor gases silane (SiH4), nitrous oxide (N2O), nitrogen (N2) and ammonia (NH3) are used with different compositions. We find that for achieving high nitrogen content adding ammonia to the precursor mix is most efficient. Moreover, we investigate the balance between adsorption and desorption processes during film growth by investigating the film growth rate as a function of the substrate temperature. From these data we are able to determine an effective activation energy for the film growth, corresponding to the difference between adsorption and desorption energy. Finally, we have thoroughly investigated the optical properties of the films using spectroscopic ellipsometry. From these measurements, we suggest a parametrized model for the refractive index and extinction coefficient in a wide range of compositions based on a Cauchy- and a Lorentz-fit. article_number: '138887' article_type: original author: - first_name: R. full_name: Aschwanden, R. last_name: Aschwanden - first_name: R. full_name: Köthemann, R. last_name: Köthemann - first_name: M. full_name: Albert, M. last_name: Albert - first_name: C. full_name: Golla, C. last_name: Golla - first_name: Cedrik full_name: Meier, Cedrik id: '20798' last_name: Meier orcid: https://orcid.org/0000-0002-3787-3572 citation: ama: Aschwanden R, Köthemann R, Albert M, Golla C, Meier C. Optical properties of silicon oxynitride films grown by plasma-enhanced chemical vapor deposition. Thin Solid Films. 2021;736. doi:10.1016/j.tsf.2021.138887 apa: Aschwanden, R., Köthemann, R., Albert, M., Golla, C., & Meier, C. (2021). Optical properties of silicon oxynitride films grown by plasma-enhanced chemical vapor deposition. Thin Solid Films, 736. https://doi.org/10.1016/j.tsf.2021.138887 bibtex: '@article{Aschwanden_Köthemann_Albert_Golla_Meier_2021, title={Optical properties of silicon oxynitride films grown by plasma-enhanced chemical vapor deposition}, volume={736}, DOI={10.1016/j.tsf.2021.138887}, number={138887}, journal={Thin Solid Films}, author={Aschwanden, R. and Köthemann, R. and Albert, M. and Golla, C. and Meier, Cedrik}, year={2021} }' chicago: Aschwanden, R., R. Köthemann, M. Albert, C. Golla, and Cedrik Meier. “Optical Properties of Silicon Oxynitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition.” Thin Solid Films 736 (2021). https://doi.org/10.1016/j.tsf.2021.138887. ieee: R. Aschwanden, R. Köthemann, M. Albert, C. Golla, and C. Meier, “Optical properties of silicon oxynitride films grown by plasma-enhanced chemical vapor deposition,” Thin Solid Films, vol. 736, 2021. mla: Aschwanden, R., et al. “Optical Properties of Silicon Oxynitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition.” Thin Solid Films, vol. 736, 138887, 2021, doi:10.1016/j.tsf.2021.138887. short: R. Aschwanden, R. Köthemann, M. Albert, C. Golla, C. Meier, Thin Solid Films 736 (2021). date_created: 2021-09-06T15:11:54Z date_updated: 2022-01-06T06:56:00Z department: - _id: '15' doi: 10.1016/j.tsf.2021.138887 intvolume: ' 736' language: - iso: eng project: - _id: '53' name: TRR 142 - _id: '55' name: TRR 142 - Project Area B - _id: '66' name: TRR 142 - Subproject B1 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published status: public title: Optical properties of silicon oxynitride films grown by plasma-enhanced chemical vapor deposition type: journal_article user_id: '20798' volume: 736 year: '2021' ... --- _id: '15732' author: - first_name: Hossein full_name: Mirhosseini, Hossein id: '71051' last_name: Mirhosseini orcid: https://orcid.org/0000-0001-6179-1545 - first_name: Janos full_name: Kiss, Janos last_name: Kiss - first_name: Guido full_name: Roma, Guido last_name: Roma - first_name: Claudia full_name: Felser, Claudia last_name: Felser citation: ama: 'Mirhosseini H, Kiss J, Roma G, Felser C. Reducing the Schottky barrier height at the MoSe2/Mo(110) interface in thin-film solar cells: Insights from first-principles calculations. Thin Solid Films. 2016:143-147. doi:10.1016/j.tsf.2016.03.053' apa: 'Mirhosseini, H., Kiss, J., Roma, G., & Felser, C. (2016). Reducing the Schottky barrier height at the MoSe2/Mo(110) interface in thin-film solar cells: Insights from first-principles calculations. Thin Solid Films, 143–147. https://doi.org/10.1016/j.tsf.2016.03.053' bibtex: '@article{Mirhosseini_Kiss_Roma_Felser_2016, title={Reducing the Schottky barrier height at the MoSe2/Mo(110) interface in thin-film solar cells: Insights from first-principles calculations}, DOI={10.1016/j.tsf.2016.03.053}, journal={Thin Solid Films}, author={Mirhosseini, Hossein and Kiss, Janos and Roma, Guido and Felser, Claudia}, year={2016}, pages={143–147} }' chicago: 'Mirhosseini, Hossein, Janos Kiss, Guido Roma, and Claudia Felser. “Reducing the Schottky Barrier Height at the MoSe2/Mo(110) Interface in Thin-Film Solar Cells: Insights from First-Principles Calculations.” Thin Solid Films, 2016, 143–47. https://doi.org/10.1016/j.tsf.2016.03.053.' ieee: 'H. Mirhosseini, J. Kiss, G. Roma, and C. Felser, “Reducing the Schottky barrier height at the MoSe2/Mo(110) interface in thin-film solar cells: Insights from first-principles calculations,” Thin Solid Films, pp. 143–147, 2016.' mla: 'Mirhosseini, Hossein, et al. “Reducing the Schottky Barrier Height at the MoSe2/Mo(110) Interface in Thin-Film Solar Cells: Insights from First-Principles Calculations.” Thin Solid Films, 2016, pp. 143–47, doi:10.1016/j.tsf.2016.03.053.' short: H. Mirhosseini, J. Kiss, G. Roma, C. Felser, Thin Solid Films (2016) 143–147. date_created: 2020-01-30T13:09:43Z date_updated: 2022-01-06T06:52:32Z doi: 10.1016/j.tsf.2016.03.053 language: - iso: eng page: 143-147 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published status: public title: 'Reducing the Schottky barrier height at the MoSe2/Mo(110) interface in thin-film solar cells: Insights from first-principles calculations' type: journal_article user_id: '71051' year: '2016' ... --- _id: '20924' author: - first_name: Christoph full_name: Ebbert, Christoph id: '7266' last_name: Ebbert - first_name: N. full_name: Alissawi, N. last_name: Alissawi - first_name: C. full_name: Somsen, C. last_name: Somsen - first_name: G. full_name: Eggeler, G. last_name: Eggeler - first_name: T. full_name: Strunskus, T. last_name: Strunskus - first_name: F. full_name: Faupel, F. last_name: Faupel - first_name: Guido full_name: Grundmeier, Guido id: '194' last_name: Grundmeier citation: ama: Ebbert C, Alissawi N, Somsen C, et al. Spectroelectrochemical and morphological studies of the ageing of silver nanoparticles embedded in ultra-thin perfluorinated sputter deposited films. Thin Solid Films. 2014:161-167. doi:10.1016/j.tsf.2014.10.054 apa: Ebbert, C., Alissawi, N., Somsen, C., Eggeler, G., Strunskus, T., Faupel, F., & Grundmeier, G. (2014). Spectroelectrochemical and morphological studies of the ageing of silver nanoparticles embedded in ultra-thin perfluorinated sputter deposited films. Thin Solid Films, 161–167. https://doi.org/10.1016/j.tsf.2014.10.054 bibtex: '@article{Ebbert_Alissawi_Somsen_Eggeler_Strunskus_Faupel_Grundmeier_2014, title={Spectroelectrochemical and morphological studies of the ageing of silver nanoparticles embedded in ultra-thin perfluorinated sputter deposited films}, DOI={10.1016/j.tsf.2014.10.054}, journal={Thin Solid Films}, author={Ebbert, Christoph and Alissawi, N. and Somsen, C. and Eggeler, G. and Strunskus, T. and Faupel, F. and Grundmeier, Guido}, year={2014}, pages={161–167} }' chicago: Ebbert, Christoph, N. Alissawi, C. Somsen, G. Eggeler, T. Strunskus, F. Faupel, and Guido Grundmeier. “Spectroelectrochemical and Morphological Studies of the Ageing of Silver Nanoparticles Embedded in Ultra-Thin Perfluorinated Sputter Deposited Films.” Thin Solid Films, 2014, 161–67. https://doi.org/10.1016/j.tsf.2014.10.054. ieee: C. Ebbert et al., “Spectroelectrochemical and morphological studies of the ageing of silver nanoparticles embedded in ultra-thin perfluorinated sputter deposited films,” Thin Solid Films, pp. 161–167, 2014. mla: Ebbert, Christoph, et al. “Spectroelectrochemical and Morphological Studies of the Ageing of Silver Nanoparticles Embedded in Ultra-Thin Perfluorinated Sputter Deposited Films.” Thin Solid Films, 2014, pp. 161–67, doi:10.1016/j.tsf.2014.10.054. short: C. Ebbert, N. Alissawi, C. Somsen, G. Eggeler, T. Strunskus, F. Faupel, G. Grundmeier, Thin Solid Films (2014) 161–167. date_created: 2021-01-13T09:16:32Z date_updated: 2022-01-06T06:54:41Z department: - _id: '321' doi: 10.1016/j.tsf.2014.10.054 language: - iso: eng page: 161-167 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published status: public title: Spectroelectrochemical and morphological studies of the ageing of silver nanoparticles embedded in ultra-thin perfluorinated sputter deposited films type: journal_article user_id: '7266' year: '2014' ... --- _id: '4379' abstract: - lang: eng text: Uniform mesoporous Si double layers are formed on 4 inch p-type < 100> wafers with an off orientation of 6º towards < 111> by means of electrochemical etching in ethanoic-based HF electrolytes. These substrates are of interest for the epitaxial growth of III–V compound semiconductor stacks on their top for the production of multi-junction solar cells and very thin electronic devices. We demonstrate transfer of porous layers after an annealing process in hydrogen atmosphere. Electron Back-Scatter Diffraction analysis confirms that the substrate orientation is conserved during the etching and annealing steps. Confocal μ-Raman spectroscopy analysis shows a decrease in the Raman signal intensity after etching and a subsequent increase after annealing while no shift is observed. By means of Atomic Force Microscopy, analysis the surface appearance after the etching and annealing steps can be visualized. The mean surface roughness varies during the process from 0.55 nm for the unprocessed wafers to 0.27 nm after etching and 0.78 nm after annealing. The decrease of average roughness after etching is caused by an electropolishing step prior to porous formation. Despite of slight increase of mean surface roughness after annealing the samples are still appropriate for high quality epitaxial growth and subsequent lift-off. article_type: original author: - first_name: E. full_name: Garralaga Rojas, E. last_name: Garralaga Rojas - first_name: B. full_name: Terheiden, B. last_name: Terheiden - first_name: H. full_name: Plagwitz, H. last_name: Plagwitz - first_name: J. full_name: Hensen, J. last_name: Hensen - first_name: V. full_name: Wiedemeier, V. last_name: Wiedemeier - first_name: Gerhard full_name: Berth, Gerhard id: '53' last_name: Berth - first_name: Artur full_name: Zrenner, Artur id: '606' last_name: Zrenner orcid: 0000-0002-5190-0944 - first_name: R. full_name: Brendel, R. last_name: Brendel citation: ama: Garralaga Rojas E, Terheiden B, Plagwitz H, et al. Lift-off of mesoporous layers by electrochemical etching on Si (100) substrates with miscut of 6° off towards (111). Thin Solid Films. 2011;520(1):606-609. doi:10.1016/j.tsf.2011.07.063 apa: Garralaga Rojas, E., Terheiden, B., Plagwitz, H., Hensen, J., Wiedemeier, V., Berth, G., … Brendel, R. (2011). Lift-off of mesoporous layers by electrochemical etching on Si (100) substrates with miscut of 6° off towards (111). Thin Solid Films, 520(1), 606–609. https://doi.org/10.1016/j.tsf.2011.07.063 bibtex: '@article{Garralaga Rojas_Terheiden_Plagwitz_Hensen_Wiedemeier_Berth_Zrenner_Brendel_2011, title={Lift-off of mesoporous layers by electrochemical etching on Si (100) substrates with miscut of 6° off towards (111)}, volume={520}, DOI={10.1016/j.tsf.2011.07.063}, number={1}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Garralaga Rojas, E. and Terheiden, B. and Plagwitz, H. and Hensen, J. and Wiedemeier, V. and Berth, Gerhard and Zrenner, Artur and Brendel, R.}, year={2011}, pages={606–609} }' chicago: 'Garralaga Rojas, E., B. Terheiden, H. Plagwitz, J. Hensen, V. Wiedemeier, Gerhard Berth, Artur Zrenner, and R. Brendel. “Lift-off of Mesoporous Layers by Electrochemical Etching on Si (100) Substrates with Miscut of 6° off towards (111).” Thin Solid Films 520, no. 1 (2011): 606–9. https://doi.org/10.1016/j.tsf.2011.07.063.' ieee: E. Garralaga Rojas et al., “Lift-off of mesoporous layers by electrochemical etching on Si (100) substrates with miscut of 6° off towards (111),” Thin Solid Films, vol. 520, no. 1, pp. 606–609, 2011. mla: Garralaga Rojas, E., et al. “Lift-off of Mesoporous Layers by Electrochemical Etching on Si (100) Substrates with Miscut of 6° off towards (111).” Thin Solid Films, vol. 520, no. 1, Elsevier BV, 2011, pp. 606–09, doi:10.1016/j.tsf.2011.07.063. short: E. Garralaga Rojas, B. Terheiden, H. Plagwitz, J. Hensen, V. Wiedemeier, G. Berth, A. Zrenner, R. Brendel, Thin Solid Films 520 (2011) 606–609. date_created: 2018-09-11T14:21:12Z date_updated: 2022-01-06T07:01:00Z department: - _id: '15' - _id: '230' - _id: '35' doi: 10.1016/j.tsf.2011.07.063 intvolume: ' 520' issue: '1' keyword: - Porous Si - Layer transfer - Thin-film - Photovoltaics language: - iso: eng page: 606-609 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published publisher: Elsevier BV status: public title: Lift-off of mesoporous layers by electrochemical etching on Si (100) substrates with miscut of 6° off towards (111) type: journal_article user_id: '49428' volume: 520 year: '2011' ... --- _id: '22598' author: - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Stefan full_name: Cwik, Stefan last_name: Cwik - first_name: Andrian P. full_name: Milanov, Andrian P. last_name: Milanov - first_name: Vanessa full_name: Gwildies, Vanessa last_name: Gwildies - first_name: Harish full_name: Parala, Harish last_name: Parala - first_name: Tristan full_name: Wagner, Tristan last_name: Wagner - first_name: Alexander full_name: Birkner, Alexander last_name: Birkner - first_name: Detlef full_name: Rogalla, Detlef last_name: Rogalla - first_name: Hans-Werner full_name: Becker, Hans-Werner last_name: Becker - first_name: Jörg full_name: Winter, Jörg last_name: Winter - first_name: Alfred full_name: Ludwig, Alfred last_name: Ludwig - first_name: Roland A. full_name: Fischer, Roland A. last_name: Fischer - first_name: Anjana full_name: Devi, Anjana last_name: Devi citation: ama: de los Arcos de Pedro MT, Cwik S, Milanov AP, et al. Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition. Thin Solid Films. Published online 2011:11-16. doi:10.1016/j.tsf.2011.12.007 apa: de los Arcos de Pedro, M. T., Cwik, S., Milanov, A. P., Gwildies, V., Parala, H., Wagner, T., Birkner, A., Rogalla, D., Becker, H.-W., Winter, J., Ludwig, A., Fischer, R. A., & Devi, A. (2011). Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition. Thin Solid Films, 11–16. https://doi.org/10.1016/j.tsf.2011.12.007 bibtex: '@article{de los Arcos de Pedro_Cwik_Milanov_Gwildies_Parala_Wagner_Birkner_Rogalla_Becker_Winter_et al._2011, title={Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition}, DOI={10.1016/j.tsf.2011.12.007}, journal={Thin Solid Films}, author={de los Arcos de Pedro, Maria Teresa and Cwik, Stefan and Milanov, Andrian P. and Gwildies, Vanessa and Parala, Harish and Wagner, Tristan and Birkner, Alexander and Rogalla, Detlef and Becker, Hans-Werner and Winter, Jörg and et al.}, year={2011}, pages={11–16} }' chicago: Arcos de Pedro, Maria Teresa de los, Stefan Cwik, Andrian P. Milanov, Vanessa Gwildies, Harish Parala, Tristan Wagner, Alexander Birkner, et al. “Influence of Process Parameters on the Crystallinity, Morphology and Composition of Tungsten Oxide-Based Thin Films Grown by Metalorganic Chemical Vapor Deposition.” Thin Solid Films, 2011, 11–16. https://doi.org/10.1016/j.tsf.2011.12.007. ieee: 'M. T. de los Arcos de Pedro et al., “Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition,” Thin Solid Films, pp. 11–16, 2011, doi: 10.1016/j.tsf.2011.12.007.' mla: de los Arcos de Pedro, Maria Teresa, et al. “Influence of Process Parameters on the Crystallinity, Morphology and Composition of Tungsten Oxide-Based Thin Films Grown by Metalorganic Chemical Vapor Deposition.” Thin Solid Films, 2011, pp. 11–16, doi:10.1016/j.tsf.2011.12.007. short: M.T. de los Arcos de Pedro, S. Cwik, A.P. Milanov, V. Gwildies, H. Parala, T. Wagner, A. Birkner, D. Rogalla, H.-W. Becker, J. Winter, A. Ludwig, R.A. Fischer, A. Devi, Thin Solid Films (2011) 11–16. date_created: 2021-07-07T11:14:50Z date_updated: 2023-01-24T08:26:47Z department: - _id: '302' doi: 10.1016/j.tsf.2011.12.007 extern: '1' language: - iso: eng page: 11-16 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published status: public title: Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition type: journal_article user_id: '54556' year: '2011' ... --- _id: '22606' author: - first_name: Atena Rastgoo full_name: Lahrood, Atena Rastgoo last_name: Lahrood - first_name: Maria Teresa full_name: de los Arcos de Pedro, Maria Teresa id: '54556' last_name: de los Arcos de Pedro - first_name: Marina full_name: Prenzel, Marina last_name: Prenzel - first_name: Achim full_name: von Keudell, Achim last_name: von Keudell - first_name: Jörg full_name: Winter, Jörg last_name: Winter citation: ama: Lahrood AR, de los Arcos de Pedro MT, Prenzel M, von Keudell A, Winter J. X-ray photoelectron spectroscopy on implanted argon as a tool to follow local structural changes in thin films. Thin Solid Films. Published online 2011:1625-1630. doi:10.1016/j.tsf.2011.07.040 apa: Lahrood, A. R., de los Arcos de Pedro, M. T., Prenzel, M., von Keudell, A., & Winter, J. (2011). X-ray photoelectron spectroscopy on implanted argon as a tool to follow local structural changes in thin films. Thin Solid Films, 1625–1630. https://doi.org/10.1016/j.tsf.2011.07.040 bibtex: '@article{Lahrood_de los Arcos de Pedro_Prenzel_von Keudell_Winter_2011, title={X-ray photoelectron spectroscopy on implanted argon as a tool to follow local structural changes in thin films}, DOI={10.1016/j.tsf.2011.07.040}, journal={Thin Solid Films}, author={Lahrood, Atena Rastgoo and de los Arcos de Pedro, Maria Teresa and Prenzel, Marina and von Keudell, Achim and Winter, Jörg}, year={2011}, pages={1625–1630} }' chicago: Lahrood, Atena Rastgoo, Maria Teresa de los Arcos de Pedro, Marina Prenzel, Achim von Keudell, and Jörg Winter. “X-Ray Photoelectron Spectroscopy on Implanted Argon as a Tool to Follow Local Structural Changes in Thin Films.” Thin Solid Films, 2011, 1625–30. https://doi.org/10.1016/j.tsf.2011.07.040. ieee: 'A. R. Lahrood, M. T. de los Arcos de Pedro, M. Prenzel, A. von Keudell, and J. Winter, “X-ray photoelectron spectroscopy on implanted argon as a tool to follow local structural changes in thin films,” Thin Solid Films, pp. 1625–1630, 2011, doi: 10.1016/j.tsf.2011.07.040.' mla: Lahrood, Atena Rastgoo, et al. “X-Ray Photoelectron Spectroscopy on Implanted Argon as a Tool to Follow Local Structural Changes in Thin Films.” Thin Solid Films, 2011, pp. 1625–30, doi:10.1016/j.tsf.2011.07.040. short: A.R. Lahrood, M.T. de los Arcos de Pedro, M. Prenzel, A. von Keudell, J. Winter, Thin Solid Films (2011) 1625–1630. date_created: 2021-07-07T11:31:20Z date_updated: 2023-01-24T08:27:01Z department: - _id: '302' doi: 10.1016/j.tsf.2011.07.040 extern: '1' language: - iso: eng page: 1625-1630 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published status: public title: X-ray photoelectron spectroscopy on implanted argon as a tool to follow local structural changes in thin films type: journal_article user_id: '54556' year: '2011' ... --- _id: '25962' abstract: - lang: eng text: We report the correlation of the aging of Pd-doped SnO2 methane sensors with the change of the oxidation state of Pd. Mesoporous SnO2 doped with palladium species was prepared and exposed to different gas mixtures at high temperature (600 °C) to simulate long term usage. After each exposure step a fraction of the sample was cooled down to “freeze” the current oxidation state of Pd which was then analyzed by X-ray Absorption Near-Edge Spectroscopy (XANES) using the 'white line' (i.e. the absorption peak corresponding to the transition from the 2p3/2 core level to unoccupied 4 d states) intensity of the L(III) edge as a probe for the oxidation state. The Pd oxidation state correlates with the response of the resistive SnO2 sensor to methane gas, as determined by measuring the gas response to different concentrations of methane. Samples treated with 5000 ppm methane in air show a significant reduction of Pd(II) to Pd(0), depending clearly on the carrier gas (synthetic air, pure nitrogen) and on the temperature (600 °C vs. 300 °C). article_type: original author: - first_name: T. full_name: Wagner, T. last_name: Wagner - first_name: M. full_name: Bauer, M. last_name: Bauer - first_name: T. full_name: Sauerwald, T. last_name: Sauerwald - first_name: C.-D. full_name: Kohl, C.-D. last_name: Kohl - first_name: Michael full_name: Tiemann, Michael id: '23547' last_name: Tiemann orcid: 0000-0003-1711-2722 citation: ama: Wagner T, Bauer M, Sauerwald T, Kohl C-D, Tiemann M. X-ray absorption near-edge spectroscopy investigation of the oxidation state of Pd species in nanoporous SnO2 gas sensors for methane detection. Thin Solid Films. Published online 2011:909-912. doi:10.1016/j.tsf.2011.04.187 apa: Wagner, T., Bauer, M., Sauerwald, T., Kohl, C.-D., & Tiemann, M. (2011). X-ray absorption near-edge spectroscopy investigation of the oxidation state of Pd species in nanoporous SnO2 gas sensors for methane detection. Thin Solid Films, 909–912. https://doi.org/10.1016/j.tsf.2011.04.187 bibtex: '@article{Wagner_Bauer_Sauerwald_Kohl_Tiemann_2011, title={X-ray absorption near-edge spectroscopy investigation of the oxidation state of Pd species in nanoporous SnO2 gas sensors for methane detection}, DOI={10.1016/j.tsf.2011.04.187}, journal={Thin Solid Films}, author={Wagner, T. and Bauer, M. and Sauerwald, T. and Kohl, C.-D. and Tiemann, Michael}, year={2011}, pages={909–912} }' chicago: Wagner, T., M. Bauer, T. Sauerwald, C.-D. Kohl, and Michael Tiemann. “X-Ray Absorption near-Edge Spectroscopy Investigation of the Oxidation State of Pd Species in Nanoporous SnO2 Gas Sensors for Methane Detection.” Thin Solid Films, 2011, 909–12. https://doi.org/10.1016/j.tsf.2011.04.187. ieee: 'T. Wagner, M. Bauer, T. Sauerwald, C.-D. Kohl, and M. Tiemann, “X-ray absorption near-edge spectroscopy investigation of the oxidation state of Pd species in nanoporous SnO2 gas sensors for methane detection,” Thin Solid Films, pp. 909–912, 2011, doi: 10.1016/j.tsf.2011.04.187.' mla: Wagner, T., et al. “X-Ray Absorption near-Edge Spectroscopy Investigation of the Oxidation State of Pd Species in Nanoporous SnO2 Gas Sensors for Methane Detection.” Thin Solid Films, 2011, pp. 909–12, doi:10.1016/j.tsf.2011.04.187. short: T. Wagner, M. Bauer, T. Sauerwald, C.-D. Kohl, M. Tiemann, Thin Solid Films (2011) 909–912. date_created: 2021-10-09T04:59:31Z date_updated: 2023-03-09T08:28:16Z department: - _id: '35' - _id: '2' - _id: '307' doi: 10.1016/j.tsf.2011.04.187 language: - iso: eng page: 909-912 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published quality_controlled: '1' status: public title: X-ray absorption near-edge spectroscopy investigation of the oxidation state of Pd species in nanoporous SnO2 gas sensors for methane detection type: journal_article user_id: '23547' year: '2011' ... --- _id: '25961' abstract: - lang: eng text: Mesoporous In2O3, synthesized by a nanocasting procedure, is used as a resistive gas sensor for ozone in very low concentrations (from 20 ppb to 2.4 ppm) at room temperature. Its sensing performance is substantially increased by illumination with blue light (460 nm, 2.7 eV). For low ozone concentrations the sensor response increases with increasing humidity. However, higher humidity also results in the occurrence of a saturation of the response at lower ozone concentrations; this is rationalized by assuming a poisoning of surface active sites by hydroxyl groups. article_type: original author: - first_name: T. full_name: Wagner, T. last_name: Wagner - first_name: J. full_name: Hennemann, J. last_name: Hennemann - first_name: C.-D. full_name: Kohl, C.-D. last_name: Kohl - first_name: Michael full_name: Tiemann, Michael id: '23547' last_name: Tiemann orcid: 0000-0003-1711-2722 citation: ama: 'Wagner T, Hennemann J, Kohl C-D, Tiemann M. Photocatalytic ozone sensor based on mesoporous indium oxide: Influence of the relative humidity on the sensing performance. Thin Solid Films. Published online 2011:918-921. doi:10.1016/j.tsf.2011.04.181' apa: 'Wagner, T., Hennemann, J., Kohl, C.-D., & Tiemann, M. (2011). Photocatalytic ozone sensor based on mesoporous indium oxide: Influence of the relative humidity on the sensing performance. Thin Solid Films, 918–921. https://doi.org/10.1016/j.tsf.2011.04.181' bibtex: '@article{Wagner_Hennemann_Kohl_Tiemann_2011, title={Photocatalytic ozone sensor based on mesoporous indium oxide: Influence of the relative humidity on the sensing performance}, DOI={10.1016/j.tsf.2011.04.181}, journal={Thin Solid Films}, author={Wagner, T. and Hennemann, J. and Kohl, C.-D. and Tiemann, Michael}, year={2011}, pages={918–921} }' chicago: 'Wagner, T., J. Hennemann, C.-D. Kohl, and Michael Tiemann. “Photocatalytic Ozone Sensor Based on Mesoporous Indium Oxide: Influence of the Relative Humidity on the Sensing Performance.” Thin Solid Films, 2011, 918–21. https://doi.org/10.1016/j.tsf.2011.04.181.' ieee: 'T. Wagner, J. Hennemann, C.-D. Kohl, and M. Tiemann, “Photocatalytic ozone sensor based on mesoporous indium oxide: Influence of the relative humidity on the sensing performance,” Thin Solid Films, pp. 918–921, 2011, doi: 10.1016/j.tsf.2011.04.181.' mla: 'Wagner, T., et al. “Photocatalytic Ozone Sensor Based on Mesoporous Indium Oxide: Influence of the Relative Humidity on the Sensing Performance.” Thin Solid Films, 2011, pp. 918–21, doi:10.1016/j.tsf.2011.04.181.' short: T. Wagner, J. Hennemann, C.-D. Kohl, M. Tiemann, Thin Solid Films (2011) 918–921. date_created: 2021-10-09T04:57:57Z date_updated: 2023-03-09T08:29:14Z department: - _id: '35' - _id: '2' - _id: '307' doi: 10.1016/j.tsf.2011.04.181 language: - iso: eng page: 918-921 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published quality_controlled: '1' status: public title: 'Photocatalytic ozone sensor based on mesoporous indium oxide: Influence of the relative humidity on the sensing performance' type: journal_article user_id: '23547' year: '2011' ... --- _id: '25974' abstract: - lang: eng text: We present the preparation of a semiconductor gas sensor based on ordered mesoporous In2O3. The In2O3 was synthesized by structure replication procedure from cubic KIT-6 silica. A detailed analysis of the morphology of the mesoporous powders as well as of the prepared sensing layer will be shown. Unique properties arise from the synthesis method of structure replication such as well defined porosity in the mesoporous regime and nanocrystallites with high thermal stability up to 450 °C. These properties are useful for the application in semiconducting gas sensors. Test measurements show sensitivity to methane gas in concentrations relevant for explosion prevention. article_type: original author: - first_name: T. full_name: Wagner, T. last_name: Wagner - first_name: T. full_name: Sauerwald, T. last_name: Sauerwald - first_name: C.-D. full_name: Kohl, C.-D. last_name: Kohl - first_name: T. full_name: Waitz, T. last_name: Waitz - first_name: C. full_name: Weidmann, C. last_name: Weidmann - first_name: Michael full_name: Tiemann, Michael id: '23547' last_name: Tiemann orcid: 0000-0003-1711-2722 citation: ama: Wagner T, Sauerwald T, Kohl C-D, Waitz T, Weidmann C, Tiemann M. Gas sensor based on ordered mesoporous In2O3. Thin Solid Films. Published online 2009:6170-6175. doi:10.1016/j.tsf.2009.04.013 apa: Wagner, T., Sauerwald, T., Kohl, C.-D., Waitz, T., Weidmann, C., & Tiemann, M. (2009). Gas sensor based on ordered mesoporous In2O3. Thin Solid Films, 6170–6175. https://doi.org/10.1016/j.tsf.2009.04.013 bibtex: '@article{Wagner_Sauerwald_Kohl_Waitz_Weidmann_Tiemann_2009, title={Gas sensor based on ordered mesoporous In2O3}, DOI={10.1016/j.tsf.2009.04.013}, journal={Thin Solid Films}, author={Wagner, T. and Sauerwald, T. and Kohl, C.-D. and Waitz, T. and Weidmann, C. and Tiemann, Michael}, year={2009}, pages={6170–6175} }' chicago: Wagner, T., T. Sauerwald, C.-D. Kohl, T. Waitz, C. Weidmann, and Michael Tiemann. “Gas Sensor Based on Ordered Mesoporous In2O3.” Thin Solid Films, 2009, 6170–75. https://doi.org/10.1016/j.tsf.2009.04.013. ieee: 'T. Wagner, T. Sauerwald, C.-D. Kohl, T. Waitz, C. Weidmann, and M. Tiemann, “Gas sensor based on ordered mesoporous In2O3,” Thin Solid Films, pp. 6170–6175, 2009, doi: 10.1016/j.tsf.2009.04.013.' mla: Wagner, T., et al. “Gas Sensor Based on Ordered Mesoporous In2O3.” Thin Solid Films, 2009, pp. 6170–75, doi:10.1016/j.tsf.2009.04.013. short: T. Wagner, T. Sauerwald, C.-D. Kohl, T. Waitz, C. Weidmann, M. Tiemann, Thin Solid Films (2009) 6170–6175. date_created: 2021-10-09T05:28:49Z date_updated: 2023-03-09T08:43:33Z department: - _id: '35' - _id: '2' - _id: '307' doi: 10.1016/j.tsf.2009.04.013 extern: '1' language: - iso: eng page: 6170-6175 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published quality_controlled: '1' status: public title: Gas sensor based on ordered mesoporous In2O3 type: journal_article user_id: '23547' year: '2009' ... --- _id: '25988' abstract: - lang: eng text: We report on the synthesis and the gas-sensing properties (CO and NO2 detection) of mesoporous zinc oxide. A two-step structure replication method for the synthesis is employed. In the first step mesoporous SBA-15 silica is prepared by the utilization of self-organization of amphiphilic organic agents. This mesoporous silica is used as the structure matrix for synthesizing mesoporous carbon CMK-3, which, in turn, is employed for yet another replication step, using zinc nitrate as the precursor. The resulting material is characterized by X-ray diffraction and nitrogen physisorption and its gas-sensing properties are compared with a non-porous ZnO sample. article_type: original author: - first_name: T. full_name: Wagner, T. last_name: Wagner - first_name: T. full_name: Waitz, T. last_name: Waitz - first_name: J. full_name: Roggenbuck, J. last_name: Roggenbuck - first_name: M. full_name: Fröba, M. last_name: Fröba - first_name: C.-D. full_name: Kohl, C.-D. last_name: Kohl - first_name: Michael full_name: Tiemann, Michael id: '23547' last_name: Tiemann orcid: 0000-0003-1711-2722 citation: ama: Wagner T, Waitz T, Roggenbuck J, Fröba M, Kohl C-D, Tiemann M. Ordered mesoporous ZnO for gas sensing. Thin Solid Films. Published online 2007:8360-8363. doi:10.1016/j.tsf.2007.03.021 apa: Wagner, T., Waitz, T., Roggenbuck, J., Fröba, M., Kohl, C.-D., & Tiemann, M. (2007). Ordered mesoporous ZnO for gas sensing. Thin Solid Films, 8360–8363. https://doi.org/10.1016/j.tsf.2007.03.021 bibtex: '@article{Wagner_Waitz_Roggenbuck_Fröba_Kohl_Tiemann_2007, title={Ordered mesoporous ZnO for gas sensing}, DOI={10.1016/j.tsf.2007.03.021}, journal={Thin Solid Films}, author={Wagner, T. and Waitz, T. and Roggenbuck, J. and Fröba, M. and Kohl, C.-D. and Tiemann, Michael}, year={2007}, pages={8360–8363} }' chicago: Wagner, T., T. Waitz, J. Roggenbuck, M. Fröba, C.-D. Kohl, and Michael Tiemann. “Ordered Mesoporous ZnO for Gas Sensing.” Thin Solid Films, 2007, 8360–63. https://doi.org/10.1016/j.tsf.2007.03.021. ieee: 'T. Wagner, T. Waitz, J. Roggenbuck, M. Fröba, C.-D. Kohl, and M. Tiemann, “Ordered mesoporous ZnO for gas sensing,” Thin Solid Films, pp. 8360–8363, 2007, doi: 10.1016/j.tsf.2007.03.021.' mla: Wagner, T., et al. “Ordered Mesoporous ZnO for Gas Sensing.” Thin Solid Films, 2007, pp. 8360–63, doi:10.1016/j.tsf.2007.03.021. short: T. Wagner, T. Waitz, J. Roggenbuck, M. Fröba, C.-D. Kohl, M. Tiemann, Thin Solid Films (2007) 8360–8363. date_created: 2021-10-09T09:42:12Z date_updated: 2023-03-09T08:49:25Z department: - _id: '35' - _id: '2' - _id: '307' doi: 10.1016/j.tsf.2007.03.021 extern: '1' language: - iso: eng page: 8360-8363 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published quality_controlled: '1' status: public title: Ordered mesoporous ZnO for gas sensing type: journal_article user_id: '23547' year: '2007' ... --- _id: '13720' author: - first_name: Wolf Gero full_name: Schmidt, Wolf Gero id: '468' last_name: Schmidt orcid: 0000-0002-2717-5076 - first_name: K. full_name: Seino, K. last_name: Seino - first_name: P.H. full_name: Hahn, P.H. last_name: Hahn - first_name: F. full_name: Bechstedt, F. last_name: Bechstedt - first_name: W. full_name: Lu, W. last_name: Lu - first_name: S. full_name: Wang, S. last_name: Wang - first_name: J. full_name: Bernholc, J. last_name: Bernholc citation: ama: 'Schmidt WG, Seino K, Hahn PH, et al. Calculation of surface optical properties: from qualitative understanding to quantitative predictions. Thin Solid Films. 2004;455-456:764-771. doi:10.1016/j.tsf.2003.11.263' apa: 'Schmidt, W. G., Seino, K., Hahn, P. H., Bechstedt, F., Lu, W., Wang, S., & Bernholc, J. (2004). Calculation of surface optical properties: from qualitative understanding to quantitative predictions. Thin Solid Films, 455456, 764–771. https://doi.org/10.1016/j.tsf.2003.11.263' bibtex: '@article{Schmidt_Seino_Hahn_Bechstedt_Lu_Wang_Bernholc_2004, title={Calculation of surface optical properties: from qualitative understanding to quantitative predictions}, volume={455–456}, DOI={10.1016/j.tsf.2003.11.263}, journal={Thin Solid Films}, author={Schmidt, Wolf Gero and Seino, K. and Hahn, P.H. and Bechstedt, F. and Lu, W. and Wang, S. and Bernholc, J.}, year={2004}, pages={764–771} }' chicago: 'Schmidt, Wolf Gero, K. Seino, P.H. Hahn, F. Bechstedt, W. Lu, S. Wang, and J. Bernholc. “Calculation of Surface Optical Properties: From Qualitative Understanding to Quantitative Predictions.” Thin Solid Films 455–456 (2004): 764–71. https://doi.org/10.1016/j.tsf.2003.11.263.' ieee: 'W. G. Schmidt et al., “Calculation of surface optical properties: from qualitative understanding to quantitative predictions,” Thin Solid Films, vol. 455–456, pp. 764–771, 2004.' mla: 'Schmidt, Wolf Gero, et al. “Calculation of Surface Optical Properties: From Qualitative Understanding to Quantitative Predictions.” Thin Solid Films, vol. 455–456, 2004, pp. 764–71, doi:10.1016/j.tsf.2003.11.263.' short: W.G. Schmidt, K. Seino, P.H. Hahn, F. Bechstedt, W. Lu, S. Wang, J. Bernholc, Thin Solid Films 455–456 (2004) 764–771. date_created: 2019-10-09T12:32:37Z date_updated: 2022-01-06T06:51:43Z department: - _id: '15' - _id: '170' - _id: '295' doi: 10.1016/j.tsf.2003.11.263 language: - iso: eng page: 764-771 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published status: public title: 'Calculation of surface optical properties: from qualitative understanding to quantitative predictions' type: journal_article user_id: '16199' volume: 455-456 year: '2004' ... --- _id: '13791' author: - first_name: A. full_name: Scholze, A. last_name: Scholze - first_name: Wolf Gero full_name: Schmidt, Wolf Gero id: '468' last_name: Schmidt orcid: 0000-0002-2717-5076 - first_name: F. full_name: Bechstedt, F. last_name: Bechstedt citation: ama: Scholze A, Schmidt WG, Bechstedt F. Diamond (111) and (100) surface reconstructions. Thin Solid Films. 1996;281-282:256-259. doi:10.1016/0040-6090(96)08646-4 apa: Scholze, A., Schmidt, W. G., & Bechstedt, F. (1996). Diamond (111) and (100) surface reconstructions. Thin Solid Films, 281282, 256–259. https://doi.org/10.1016/0040-6090(96)08646-4 bibtex: '@article{Scholze_Schmidt_Bechstedt_1996, title={Diamond (111) and (100) surface reconstructions}, volume={281–282}, DOI={10.1016/0040-6090(96)08646-4}, journal={Thin Solid Films}, author={Scholze, A. and Schmidt, Wolf Gero and Bechstedt, F.}, year={1996}, pages={256–259} }' chicago: 'Scholze, A., Wolf Gero Schmidt, and F. Bechstedt. “Diamond (111) and (100) Surface Reconstructions.” Thin Solid Films 281–282 (1996): 256–59. https://doi.org/10.1016/0040-6090(96)08646-4.' ieee: A. Scholze, W. G. Schmidt, and F. Bechstedt, “Diamond (111) and (100) surface reconstructions,” Thin Solid Films, vol. 281–282, pp. 256–259, 1996. mla: Scholze, A., et al. “Diamond (111) and (100) Surface Reconstructions.” Thin Solid Films, vol. 281–282, 1996, pp. 256–59, doi:10.1016/0040-6090(96)08646-4. short: A. Scholze, W.G. Schmidt, F. Bechstedt, Thin Solid Films 281–282 (1996) 256–259. date_created: 2019-10-10T16:10:25Z date_updated: 2022-01-06T06:51:44Z department: - _id: '15' - _id: '170' - _id: '295' doi: 10.1016/0040-6090(96)08646-4 funded_apc: '1' language: - iso: eng page: 256-259 publication: Thin Solid Films publication_identifier: issn: - 0040-6090 publication_status: published status: public title: Diamond (111) and (100) surface reconstructions type: journal_article user_id: '16199' volume: 281-282 year: '1996' ...