---
_id: '62875'
article_number: '140676'
author:
- first_name: Chantal
full_name: Theile-Rasche, Chantal
last_name: Theile-Rasche
- first_name: Fuzeng
full_name: Wang, Fuzeng
last_name: Wang
- first_name: Tim
full_name: Prüßner, Tim
last_name: Prüßner
- first_name: Marten
full_name: Huck, Marten
last_name: Huck
- first_name: Hans-Georg
full_name: Steinrück, Hans-Georg
last_name: Steinrück
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
orcid: '0000-0002-8684-273X '
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Theile-Rasche C, Wang F, Prüßner T, et al. Evaluation of anti-adhesive and
corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications
in polymer processing. Thin Solid Films. 2025;820. doi:10.1016/j.tsf.2025.140676
apa: Theile-Rasche, C., Wang, F., Prüßner, T., Huck, M., Steinrück, H.-G., de los
Arcos de Pedro, M. T., & Grundmeier, G. (2025). Evaluation of anti-adhesive
and corrosion protection properties of TiAlSiN-magnetron-sputtered films for applications
in polymer processing. Thin Solid Films, 820, Article 140676. https://doi.org/10.1016/j.tsf.2025.140676
bibtex: '@article{Theile-Rasche_Wang_Prüßner_Huck_Steinrück_de los Arcos de Pedro_Grundmeier_2025,
title={Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered
films for applications in polymer processing}, volume={820}, DOI={10.1016/j.tsf.2025.140676},
number={140676}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Theile-Rasche,
Chantal and Wang, Fuzeng and Prüßner, Tim and Huck, Marten and Steinrück, Hans-Georg
and de los Arcos de Pedro, Maria Teresa and Grundmeier, Guido}, year={2025} }'
chicago: Theile-Rasche, Chantal, Fuzeng Wang, Tim Prüßner, Marten Huck, Hans-Georg
Steinrück, Maria Teresa de los Arcos de Pedro, and Guido Grundmeier. “Evaluation
of Anti-Adhesive and Corrosion Protection Properties of TiAlSiN-Magnetron-Sputtered
Films for Applications in Polymer Processing.” Thin Solid Films 820 (2025).
https://doi.org/10.1016/j.tsf.2025.140676.
ieee: 'C. Theile-Rasche et al., “Evaluation of anti-adhesive and corrosion
protection properties of TiAlSiN-magnetron-sputtered films for applications in
polymer processing,” Thin Solid Films, vol. 820, Art. no. 140676, 2025,
doi: 10.1016/j.tsf.2025.140676.'
mla: Theile-Rasche, Chantal, et al. “Evaluation of Anti-Adhesive and Corrosion Protection
Properties of TiAlSiN-Magnetron-Sputtered Films for Applications in Polymer Processing.”
Thin Solid Films, vol. 820, 140676, Elsevier BV, 2025, doi:10.1016/j.tsf.2025.140676.
short: C. Theile-Rasche, F. Wang, T. Prüßner, M. Huck, H.-G. Steinrück, M.T. de
los Arcos de Pedro, G. Grundmeier, Thin Solid Films 820 (2025).
date_created: 2025-12-04T13:11:23Z
date_updated: 2025-12-04T13:12:56Z
department:
- _id: '302'
doi: 10.1016/j.tsf.2025.140676
intvolume: ' 820'
language:
- iso: eng
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
publisher: Elsevier BV
status: public
title: Evaluation of anti-adhesive and corrosion protection properties of TiAlSiN-magnetron-sputtered
films for applications in polymer processing
type: journal_article
user_id: '54556'
volume: 820
year: '2025'
...
---
_id: '23815'
abstract:
- lang: eng
text: In this paper, silicon oxynitride films (SiON) grown by plasma-enhanced chemical
vapor deposition are investigated. As precursor gases silane (SiH4), nitrous oxide
(N2O), nitrogen (N2) and ammonia (NH3) are used with different compositions. We
find that for achieving high nitrogen content adding ammonia to the precursor
mix is most efficient. Moreover, we investigate the balance between adsorption
and desorption processes during film growth by investigating the film growth rate
as a function of the substrate temperature. From these data we are able to determine
an effective activation energy for the film growth, corresponding to the difference
between adsorption and desorption energy. Finally, we have thoroughly investigated
the optical properties of the films using spectroscopic ellipsometry. From these
measurements, we suggest a parametrized model for the refractive index and extinction
coefficient in a wide range of compositions based on a Cauchy- and a Lorentz-fit.
article_number: '138887'
article_type: original
author:
- first_name: R.
full_name: Aschwanden, R.
last_name: Aschwanden
- first_name: R.
full_name: Köthemann, R.
last_name: Köthemann
- first_name: M.
full_name: Albert, M.
last_name: Albert
- first_name: C.
full_name: Golla, C.
last_name: Golla
- first_name: Cedrik
full_name: Meier, Cedrik
id: '20798'
last_name: Meier
orcid: https://orcid.org/0000-0002-3787-3572
citation:
ama: Aschwanden R, Köthemann R, Albert M, Golla C, Meier C. Optical properties of
silicon oxynitride films grown by plasma-enhanced chemical vapor deposition. Thin
Solid Films. 2021;736. doi:10.1016/j.tsf.2021.138887
apa: Aschwanden, R., Köthemann, R., Albert, M., Golla, C., & Meier, C. (2021).
Optical properties of silicon oxynitride films grown by plasma-enhanced chemical
vapor deposition. Thin Solid Films, 736. https://doi.org/10.1016/j.tsf.2021.138887
bibtex: '@article{Aschwanden_Köthemann_Albert_Golla_Meier_2021, title={Optical properties
of silicon oxynitride films grown by plasma-enhanced chemical vapor deposition},
volume={736}, DOI={10.1016/j.tsf.2021.138887},
number={138887}, journal={Thin Solid Films}, author={Aschwanden, R. and Köthemann,
R. and Albert, M. and Golla, C. and Meier, Cedrik}, year={2021} }'
chicago: Aschwanden, R., R. Köthemann, M. Albert, C. Golla, and Cedrik Meier. “Optical
Properties of Silicon Oxynitride Films Grown by Plasma-Enhanced Chemical Vapor
Deposition.” Thin Solid Films 736 (2021). https://doi.org/10.1016/j.tsf.2021.138887.
ieee: R. Aschwanden, R. Köthemann, M. Albert, C. Golla, and C. Meier, “Optical properties
of silicon oxynitride films grown by plasma-enhanced chemical vapor deposition,”
Thin Solid Films, vol. 736, 2021.
mla: Aschwanden, R., et al. “Optical Properties of Silicon Oxynitride Films Grown
by Plasma-Enhanced Chemical Vapor Deposition.” Thin Solid Films, vol. 736,
138887, 2021, doi:10.1016/j.tsf.2021.138887.
short: R. Aschwanden, R. Köthemann, M. Albert, C. Golla, C. Meier, Thin Solid Films
736 (2021).
date_created: 2021-09-06T15:11:54Z
date_updated: 2022-01-06T06:56:00Z
department:
- _id: '15'
doi: 10.1016/j.tsf.2021.138887
intvolume: ' 736'
language:
- iso: eng
project:
- _id: '53'
name: TRR 142
- _id: '55'
name: TRR 142 - Project Area B
- _id: '66'
name: TRR 142 - Subproject B1
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
status: public
title: Optical properties of silicon oxynitride films grown by plasma-enhanced chemical
vapor deposition
type: journal_article
user_id: '20798'
volume: 736
year: '2021'
...
---
_id: '15732'
author:
- first_name: Hossein
full_name: Mirhosseini, Hossein
id: '71051'
last_name: Mirhosseini
orcid: https://orcid.org/0000-0001-6179-1545
- first_name: Janos
full_name: Kiss, Janos
last_name: Kiss
- first_name: Guido
full_name: Roma, Guido
last_name: Roma
- first_name: Claudia
full_name: Felser, Claudia
last_name: Felser
citation:
ama: 'Mirhosseini H, Kiss J, Roma G, Felser C. Reducing the Schottky barrier height
at the MoSe2/Mo(110) interface in thin-film solar cells: Insights from first-principles
calculations. Thin Solid Films. 2016:143-147. doi:10.1016/j.tsf.2016.03.053'
apa: 'Mirhosseini, H., Kiss, J., Roma, G., & Felser, C. (2016). Reducing the
Schottky barrier height at the MoSe2/Mo(110) interface in thin-film solar cells:
Insights from first-principles calculations. Thin Solid Films, 143–147.
https://doi.org/10.1016/j.tsf.2016.03.053'
bibtex: '@article{Mirhosseini_Kiss_Roma_Felser_2016, title={Reducing the Schottky
barrier height at the MoSe2/Mo(110) interface in thin-film solar cells: Insights
from first-principles calculations}, DOI={10.1016/j.tsf.2016.03.053},
journal={Thin Solid Films}, author={Mirhosseini, Hossein and Kiss, Janos and Roma,
Guido and Felser, Claudia}, year={2016}, pages={143–147} }'
chicago: 'Mirhosseini, Hossein, Janos Kiss, Guido Roma, and Claudia Felser. “Reducing
the Schottky Barrier Height at the MoSe2/Mo(110) Interface in Thin-Film Solar
Cells: Insights from First-Principles Calculations.” Thin Solid Films,
2016, 143–47. https://doi.org/10.1016/j.tsf.2016.03.053.'
ieee: 'H. Mirhosseini, J. Kiss, G. Roma, and C. Felser, “Reducing the Schottky barrier
height at the MoSe2/Mo(110) interface in thin-film solar cells: Insights from
first-principles calculations,” Thin Solid Films, pp. 143–147, 2016.'
mla: 'Mirhosseini, Hossein, et al. “Reducing the Schottky Barrier Height at the
MoSe2/Mo(110) Interface in Thin-Film Solar Cells: Insights from First-Principles
Calculations.” Thin Solid Films, 2016, pp. 143–47, doi:10.1016/j.tsf.2016.03.053.'
short: H. Mirhosseini, J. Kiss, G. Roma, C. Felser, Thin Solid Films (2016) 143–147.
date_created: 2020-01-30T13:09:43Z
date_updated: 2022-01-06T06:52:32Z
doi: 10.1016/j.tsf.2016.03.053
language:
- iso: eng
page: 143-147
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
status: public
title: 'Reducing the Schottky barrier height at the MoSe2/Mo(110) interface in thin-film
solar cells: Insights from first-principles calculations'
type: journal_article
user_id: '71051'
year: '2016'
...
---
_id: '20924'
author:
- first_name: Christoph
full_name: Ebbert, Christoph
id: '7266'
last_name: Ebbert
- first_name: N.
full_name: Alissawi, N.
last_name: Alissawi
- first_name: C.
full_name: Somsen, C.
last_name: Somsen
- first_name: G.
full_name: Eggeler, G.
last_name: Eggeler
- first_name: T.
full_name: Strunskus, T.
last_name: Strunskus
- first_name: F.
full_name: Faupel, F.
last_name: Faupel
- first_name: Guido
full_name: Grundmeier, Guido
id: '194'
last_name: Grundmeier
citation:
ama: Ebbert C, Alissawi N, Somsen C, et al. Spectroelectrochemical and morphological
studies of the ageing of silver nanoparticles embedded in ultra-thin perfluorinated
sputter deposited films. Thin Solid Films. 2014:161-167. doi:10.1016/j.tsf.2014.10.054
apa: Ebbert, C., Alissawi, N., Somsen, C., Eggeler, G., Strunskus, T., Faupel, F.,
& Grundmeier, G. (2014). Spectroelectrochemical and morphological studies
of the ageing of silver nanoparticles embedded in ultra-thin perfluorinated sputter
deposited films. Thin Solid Films, 161–167. https://doi.org/10.1016/j.tsf.2014.10.054
bibtex: '@article{Ebbert_Alissawi_Somsen_Eggeler_Strunskus_Faupel_Grundmeier_2014,
title={Spectroelectrochemical and morphological studies of the ageing of silver
nanoparticles embedded in ultra-thin perfluorinated sputter deposited films},
DOI={10.1016/j.tsf.2014.10.054},
journal={Thin Solid Films}, author={Ebbert, Christoph and Alissawi, N. and Somsen,
C. and Eggeler, G. and Strunskus, T. and Faupel, F. and Grundmeier, Guido}, year={2014},
pages={161–167} }'
chicago: Ebbert, Christoph, N. Alissawi, C. Somsen, G. Eggeler, T. Strunskus, F.
Faupel, and Guido Grundmeier. “Spectroelectrochemical and Morphological Studies
of the Ageing of Silver Nanoparticles Embedded in Ultra-Thin Perfluorinated Sputter
Deposited Films.” Thin Solid Films, 2014, 161–67. https://doi.org/10.1016/j.tsf.2014.10.054.
ieee: C. Ebbert et al., “Spectroelectrochemical and morphological studies
of the ageing of silver nanoparticles embedded in ultra-thin perfluorinated sputter
deposited films,” Thin Solid Films, pp. 161–167, 2014.
mla: Ebbert, Christoph, et al. “Spectroelectrochemical and Morphological Studies
of the Ageing of Silver Nanoparticles Embedded in Ultra-Thin Perfluorinated Sputter
Deposited Films.” Thin Solid Films, 2014, pp. 161–67, doi:10.1016/j.tsf.2014.10.054.
short: C. Ebbert, N. Alissawi, C. Somsen, G. Eggeler, T. Strunskus, F. Faupel, G.
Grundmeier, Thin Solid Films (2014) 161–167.
date_created: 2021-01-13T09:16:32Z
date_updated: 2022-01-06T06:54:41Z
department:
- _id: '321'
doi: 10.1016/j.tsf.2014.10.054
language:
- iso: eng
page: 161-167
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
status: public
title: Spectroelectrochemical and morphological studies of the ageing of silver nanoparticles
embedded in ultra-thin perfluorinated sputter deposited films
type: journal_article
user_id: '7266'
year: '2014'
...
---
_id: '4379'
abstract:
- lang: eng
text: Uniform mesoporous Si double layers are formed on 4 inch p-type < 100> wafers
with an off orientation of 6º towards < 111> by means of electrochemical etching
in ethanoic-based HF electrolytes. These substrates are of interest for the epitaxial
growth of III–V compound semiconductor stacks on their top for the production
of multi-junction solar cells and very thin electronic devices. We demonstrate
transfer of porous layers after an annealing process in hydrogen atmosphere. Electron
Back-Scatter Diffraction analysis confirms that the substrate orientation is conserved
during the etching and annealing steps. Confocal μ-Raman spectroscopy analysis
shows a decrease in the Raman signal intensity after etching and a subsequent
increase after annealing while no shift is observed. By means of Atomic Force
Microscopy, analysis the surface appearance after the etching and annealing steps
can be visualized. The mean surface roughness varies during the process from 0.55
nm for the unprocessed wafers to 0.27 nm after etching and 0.78 nm after annealing.
The decrease of average roughness after etching is caused by an electropolishing
step prior to porous formation. Despite of slight increase of mean surface roughness
after annealing the samples are still appropriate for high quality epitaxial growth
and subsequent lift-off.
article_type: original
author:
- first_name: E.
full_name: Garralaga Rojas, E.
last_name: Garralaga Rojas
- first_name: B.
full_name: Terheiden, B.
last_name: Terheiden
- first_name: H.
full_name: Plagwitz, H.
last_name: Plagwitz
- first_name: J.
full_name: Hensen, J.
last_name: Hensen
- first_name: V.
full_name: Wiedemeier, V.
last_name: Wiedemeier
- first_name: Gerhard
full_name: Berth, Gerhard
id: '53'
last_name: Berth
- first_name: Artur
full_name: Zrenner, Artur
id: '606'
last_name: Zrenner
orcid: 0000-0002-5190-0944
- first_name: R.
full_name: Brendel, R.
last_name: Brendel
citation:
ama: Garralaga Rojas E, Terheiden B, Plagwitz H, et al. Lift-off of mesoporous layers
by electrochemical etching on Si (100) substrates with miscut of 6° off towards
(111). Thin Solid Films. 2011;520(1):606-609. doi:10.1016/j.tsf.2011.07.063
apa: Garralaga Rojas, E., Terheiden, B., Plagwitz, H., Hensen, J., Wiedemeier, V.,
Berth, G., … Brendel, R. (2011). Lift-off of mesoporous layers by electrochemical
etching on Si (100) substrates with miscut of 6° off towards (111). Thin Solid
Films, 520(1), 606–609. https://doi.org/10.1016/j.tsf.2011.07.063
bibtex: '@article{Garralaga Rojas_Terheiden_Plagwitz_Hensen_Wiedemeier_Berth_Zrenner_Brendel_2011,
title={Lift-off of mesoporous layers by electrochemical etching on Si (100) substrates
with miscut of 6° off towards (111)}, volume={520}, DOI={10.1016/j.tsf.2011.07.063},
number={1}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Garralaga
Rojas, E. and Terheiden, B. and Plagwitz, H. and Hensen, J. and Wiedemeier, V.
and Berth, Gerhard and Zrenner, Artur and Brendel, R.}, year={2011}, pages={606–609}
}'
chicago: 'Garralaga Rojas, E., B. Terheiden, H. Plagwitz, J. Hensen, V. Wiedemeier,
Gerhard Berth, Artur Zrenner, and R. Brendel. “Lift-off of Mesoporous Layers by
Electrochemical Etching on Si (100) Substrates with Miscut of 6° off towards (111).”
Thin Solid Films 520, no. 1 (2011): 606–9. https://doi.org/10.1016/j.tsf.2011.07.063.'
ieee: E. Garralaga Rojas et al., “Lift-off of mesoporous layers by electrochemical
etching on Si (100) substrates with miscut of 6° off towards (111),” Thin Solid
Films, vol. 520, no. 1, pp. 606–609, 2011.
mla: Garralaga Rojas, E., et al. “Lift-off of Mesoporous Layers by Electrochemical
Etching on Si (100) Substrates with Miscut of 6° off towards (111).” Thin Solid
Films, vol. 520, no. 1, Elsevier BV, 2011, pp. 606–09, doi:10.1016/j.tsf.2011.07.063.
short: E. Garralaga Rojas, B. Terheiden, H. Plagwitz, J. Hensen, V. Wiedemeier,
G. Berth, A. Zrenner, R. Brendel, Thin Solid Films 520 (2011) 606–609.
date_created: 2018-09-11T14:21:12Z
date_updated: 2022-01-06T07:01:00Z
department:
- _id: '15'
- _id: '230'
- _id: '35'
doi: 10.1016/j.tsf.2011.07.063
intvolume: ' 520'
issue: '1'
keyword:
- Porous Si
- Layer transfer
- Thin-film
- Photovoltaics
language:
- iso: eng
page: 606-609
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
publisher: Elsevier BV
status: public
title: Lift-off of mesoporous layers by electrochemical etching on Si (100) substrates
with miscut of 6° off towards (111)
type: journal_article
user_id: '49428'
volume: 520
year: '2011'
...
---
_id: '22598'
author:
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Stefan
full_name: Cwik, Stefan
last_name: Cwik
- first_name: Andrian P.
full_name: Milanov, Andrian P.
last_name: Milanov
- first_name: Vanessa
full_name: Gwildies, Vanessa
last_name: Gwildies
- first_name: Harish
full_name: Parala, Harish
last_name: Parala
- first_name: Tristan
full_name: Wagner, Tristan
last_name: Wagner
- first_name: Alexander
full_name: Birkner, Alexander
last_name: Birkner
- first_name: Detlef
full_name: Rogalla, Detlef
last_name: Rogalla
- first_name: Hans-Werner
full_name: Becker, Hans-Werner
last_name: Becker
- first_name: Jörg
full_name: Winter, Jörg
last_name: Winter
- first_name: Alfred
full_name: Ludwig, Alfred
last_name: Ludwig
- first_name: Roland A.
full_name: Fischer, Roland A.
last_name: Fischer
- first_name: Anjana
full_name: Devi, Anjana
last_name: Devi
citation:
ama: de los Arcos de Pedro MT, Cwik S, Milanov AP, et al. Influence of process parameters
on the crystallinity, morphology and composition of tungsten oxide-based thin
films grown by metalorganic chemical vapor deposition. Thin Solid Films.
Published online 2011:11-16. doi:10.1016/j.tsf.2011.12.007
apa: de los Arcos de Pedro, M. T., Cwik, S., Milanov, A. P., Gwildies, V., Parala,
H., Wagner, T., Birkner, A., Rogalla, D., Becker, H.-W., Winter, J., Ludwig, A.,
Fischer, R. A., & Devi, A. (2011). Influence of process parameters on the
crystallinity, morphology and composition of tungsten oxide-based thin films grown
by metalorganic chemical vapor deposition. Thin Solid Films, 11–16. https://doi.org/10.1016/j.tsf.2011.12.007
bibtex: '@article{de los Arcos de Pedro_Cwik_Milanov_Gwildies_Parala_Wagner_Birkner_Rogalla_Becker_Winter_et
al._2011, title={Influence of process parameters on the crystallinity, morphology
and composition of tungsten oxide-based thin films grown by metalorganic chemical
vapor deposition}, DOI={10.1016/j.tsf.2011.12.007},
journal={Thin Solid Films}, author={de los Arcos de Pedro, Maria Teresa and Cwik,
Stefan and Milanov, Andrian P. and Gwildies, Vanessa and Parala, Harish and Wagner,
Tristan and Birkner, Alexander and Rogalla, Detlef and Becker, Hans-Werner and
Winter, Jörg and et al.}, year={2011}, pages={11–16} }'
chicago: Arcos de Pedro, Maria Teresa de los, Stefan Cwik, Andrian P. Milanov, Vanessa
Gwildies, Harish Parala, Tristan Wagner, Alexander Birkner, et al. “Influence
of Process Parameters on the Crystallinity, Morphology and Composition of Tungsten
Oxide-Based Thin Films Grown by Metalorganic Chemical Vapor Deposition.” Thin
Solid Films, 2011, 11–16. https://doi.org/10.1016/j.tsf.2011.12.007.
ieee: 'M. T. de los Arcos de Pedro et al., “Influence of process parameters
on the crystallinity, morphology and composition of tungsten oxide-based thin
films grown by metalorganic chemical vapor deposition,” Thin Solid Films,
pp. 11–16, 2011, doi: 10.1016/j.tsf.2011.12.007.'
mla: de los Arcos de Pedro, Maria Teresa, et al. “Influence of Process Parameters
on the Crystallinity, Morphology and Composition of Tungsten Oxide-Based Thin
Films Grown by Metalorganic Chemical Vapor Deposition.” Thin Solid Films,
2011, pp. 11–16, doi:10.1016/j.tsf.2011.12.007.
short: M.T. de los Arcos de Pedro, S. Cwik, A.P. Milanov, V. Gwildies, H. Parala,
T. Wagner, A. Birkner, D. Rogalla, H.-W. Becker, J. Winter, A. Ludwig, R.A. Fischer,
A. Devi, Thin Solid Films (2011) 11–16.
date_created: 2021-07-07T11:14:50Z
date_updated: 2023-01-24T08:26:47Z
department:
- _id: '302'
doi: 10.1016/j.tsf.2011.12.007
extern: '1'
language:
- iso: eng
page: 11-16
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
status: public
title: Influence of process parameters on the crystallinity, morphology and composition
of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition
type: journal_article
user_id: '54556'
year: '2011'
...
---
_id: '22606'
author:
- first_name: Atena Rastgoo
full_name: Lahrood, Atena Rastgoo
last_name: Lahrood
- first_name: Maria Teresa
full_name: de los Arcos de Pedro, Maria Teresa
id: '54556'
last_name: de los Arcos de Pedro
- first_name: Marina
full_name: Prenzel, Marina
last_name: Prenzel
- first_name: Achim
full_name: von Keudell, Achim
last_name: von Keudell
- first_name: Jörg
full_name: Winter, Jörg
last_name: Winter
citation:
ama: Lahrood AR, de los Arcos de Pedro MT, Prenzel M, von Keudell A, Winter J. X-ray
photoelectron spectroscopy on implanted argon as a tool to follow local structural
changes in thin films. Thin Solid Films. Published online 2011:1625-1630.
doi:10.1016/j.tsf.2011.07.040
apa: Lahrood, A. R., de los Arcos de Pedro, M. T., Prenzel, M., von Keudell, A.,
& Winter, J. (2011). X-ray photoelectron spectroscopy on implanted argon as
a tool to follow local structural changes in thin films. Thin Solid Films,
1625–1630. https://doi.org/10.1016/j.tsf.2011.07.040
bibtex: '@article{Lahrood_de los Arcos de Pedro_Prenzel_von Keudell_Winter_2011,
title={X-ray photoelectron spectroscopy on implanted argon as a tool to follow
local structural changes in thin films}, DOI={10.1016/j.tsf.2011.07.040},
journal={Thin Solid Films}, author={Lahrood, Atena Rastgoo and de los Arcos de
Pedro, Maria Teresa and Prenzel, Marina and von Keudell, Achim and Winter, Jörg},
year={2011}, pages={1625–1630} }'
chicago: Lahrood, Atena Rastgoo, Maria Teresa de los Arcos de Pedro, Marina Prenzel,
Achim von Keudell, and Jörg Winter. “X-Ray Photoelectron Spectroscopy on Implanted
Argon as a Tool to Follow Local Structural Changes in Thin Films.” Thin Solid
Films, 2011, 1625–30. https://doi.org/10.1016/j.tsf.2011.07.040.
ieee: 'A. R. Lahrood, M. T. de los Arcos de Pedro, M. Prenzel, A. von Keudell, and
J. Winter, “X-ray photoelectron spectroscopy on implanted argon as a tool to follow
local structural changes in thin films,” Thin Solid Films, pp. 1625–1630,
2011, doi: 10.1016/j.tsf.2011.07.040.'
mla: Lahrood, Atena Rastgoo, et al. “X-Ray Photoelectron Spectroscopy on Implanted
Argon as a Tool to Follow Local Structural Changes in Thin Films.” Thin Solid
Films, 2011, pp. 1625–30, doi:10.1016/j.tsf.2011.07.040.
short: A.R. Lahrood, M.T. de los Arcos de Pedro, M. Prenzel, A. von Keudell, J.
Winter, Thin Solid Films (2011) 1625–1630.
date_created: 2021-07-07T11:31:20Z
date_updated: 2023-01-24T08:27:01Z
department:
- _id: '302'
doi: 10.1016/j.tsf.2011.07.040
extern: '1'
language:
- iso: eng
page: 1625-1630
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
status: public
title: X-ray photoelectron spectroscopy on implanted argon as a tool to follow local
structural changes in thin films
type: journal_article
user_id: '54556'
year: '2011'
...
---
_id: '25962'
abstract:
- lang: eng
text: We report the correlation of the aging of Pd-doped SnO2 methane sensors with
the change of the oxidation state of Pd. Mesoporous SnO2 doped with palladium
species was prepared and exposed to different gas mixtures at high temperature
(600 °C) to simulate long term usage. After each exposure step a fraction of the
sample was cooled down to “freeze” the current oxidation state of Pd which was
then analyzed by X-ray Absorption Near-Edge Spectroscopy (XANES) using the 'white
line' (i.e. the absorption peak corresponding to the transition from the 2p3/2
core level to unoccupied 4 d states) intensity of the L(III) edge as a probe for
the oxidation state. The Pd oxidation state correlates with the response of the
resistive SnO2 sensor to methane gas, as determined by measuring the gas response
to different concentrations of methane. Samples treated with 5000 ppm methane
in air show a significant reduction of Pd(II) to Pd(0), depending clearly on the
carrier gas (synthetic air, pure nitrogen) and on the temperature (600 °C vs.
300 °C).
article_type: original
author:
- first_name: T.
full_name: Wagner, T.
last_name: Wagner
- first_name: M.
full_name: Bauer, M.
last_name: Bauer
- first_name: T.
full_name: Sauerwald, T.
last_name: Sauerwald
- first_name: C.-D.
full_name: Kohl, C.-D.
last_name: Kohl
- first_name: Michael
full_name: Tiemann, Michael
id: '23547'
last_name: Tiemann
orcid: 0000-0003-1711-2722
citation:
ama: Wagner T, Bauer M, Sauerwald T, Kohl C-D, Tiemann M. X-ray absorption near-edge
spectroscopy investigation of the oxidation state of Pd species in nanoporous
SnO2 gas sensors for methane detection. Thin Solid Films. Published online
2011:909-912. doi:10.1016/j.tsf.2011.04.187
apa: Wagner, T., Bauer, M., Sauerwald, T., Kohl, C.-D., & Tiemann, M. (2011).
X-ray absorption near-edge spectroscopy investigation of the oxidation state of
Pd species in nanoporous SnO2 gas sensors for methane detection. Thin Solid
Films, 909–912. https://doi.org/10.1016/j.tsf.2011.04.187
bibtex: '@article{Wagner_Bauer_Sauerwald_Kohl_Tiemann_2011, title={X-ray absorption
near-edge spectroscopy investigation of the oxidation state of Pd species in nanoporous
SnO2 gas sensors for methane detection}, DOI={10.1016/j.tsf.2011.04.187},
journal={Thin Solid Films}, author={Wagner, T. and Bauer, M. and Sauerwald, T.
and Kohl, C.-D. and Tiemann, Michael}, year={2011}, pages={909–912} }'
chicago: Wagner, T., M. Bauer, T. Sauerwald, C.-D. Kohl, and Michael Tiemann. “X-Ray
Absorption near-Edge Spectroscopy Investigation of the Oxidation State of Pd Species
in Nanoporous SnO2 Gas Sensors for Methane Detection.” Thin Solid Films,
2011, 909–12. https://doi.org/10.1016/j.tsf.2011.04.187.
ieee: 'T. Wagner, M. Bauer, T. Sauerwald, C.-D. Kohl, and M. Tiemann, “X-ray absorption
near-edge spectroscopy investigation of the oxidation state of Pd species in nanoporous
SnO2 gas sensors for methane detection,” Thin Solid Films, pp. 909–912,
2011, doi: 10.1016/j.tsf.2011.04.187.'
mla: Wagner, T., et al. “X-Ray Absorption near-Edge Spectroscopy Investigation of
the Oxidation State of Pd Species in Nanoporous SnO2 Gas Sensors for Methane Detection.”
Thin Solid Films, 2011, pp. 909–12, doi:10.1016/j.tsf.2011.04.187.
short: T. Wagner, M. Bauer, T. Sauerwald, C.-D. Kohl, M. Tiemann, Thin Solid Films
(2011) 909–912.
date_created: 2021-10-09T04:59:31Z
date_updated: 2023-03-09T08:28:16Z
department:
- _id: '35'
- _id: '2'
- _id: '307'
doi: 10.1016/j.tsf.2011.04.187
language:
- iso: eng
page: 909-912
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
quality_controlled: '1'
status: public
title: X-ray absorption near-edge spectroscopy investigation of the oxidation state
of Pd species in nanoporous SnO2 gas sensors for methane detection
type: journal_article
user_id: '23547'
year: '2011'
...
---
_id: '25961'
abstract:
- lang: eng
text: Mesoporous In2O3, synthesized by a nanocasting procedure, is used as a resistive
gas sensor for ozone in very low concentrations (from 20 ppb to 2.4 ppm) at room
temperature. Its sensing performance is substantially increased by illumination
with blue light (460 nm, 2.7 eV). For low ozone concentrations the sensor response
increases with increasing humidity. However, higher humidity also results in the
occurrence of a saturation of the response at lower ozone concentrations; this
is rationalized by assuming a poisoning of surface active sites by hydroxyl groups.
article_type: original
author:
- first_name: T.
full_name: Wagner, T.
last_name: Wagner
- first_name: J.
full_name: Hennemann, J.
last_name: Hennemann
- first_name: C.-D.
full_name: Kohl, C.-D.
last_name: Kohl
- first_name: Michael
full_name: Tiemann, Michael
id: '23547'
last_name: Tiemann
orcid: 0000-0003-1711-2722
citation:
ama: 'Wagner T, Hennemann J, Kohl C-D, Tiemann M. Photocatalytic ozone sensor based
on mesoporous indium oxide: Influence of the relative humidity on the sensing
performance. Thin Solid Films. Published online 2011:918-921. doi:10.1016/j.tsf.2011.04.181'
apa: 'Wagner, T., Hennemann, J., Kohl, C.-D., & Tiemann, M. (2011). Photocatalytic
ozone sensor based on mesoporous indium oxide: Influence of the relative humidity
on the sensing performance. Thin Solid Films, 918–921. https://doi.org/10.1016/j.tsf.2011.04.181'
bibtex: '@article{Wagner_Hennemann_Kohl_Tiemann_2011, title={Photocatalytic ozone
sensor based on mesoporous indium oxide: Influence of the relative humidity on
the sensing performance}, DOI={10.1016/j.tsf.2011.04.181},
journal={Thin Solid Films}, author={Wagner, T. and Hennemann, J. and Kohl, C.-D.
and Tiemann, Michael}, year={2011}, pages={918–921} }'
chicago: 'Wagner, T., J. Hennemann, C.-D. Kohl, and Michael Tiemann. “Photocatalytic
Ozone Sensor Based on Mesoporous Indium Oxide: Influence of the Relative Humidity
on the Sensing Performance.” Thin Solid Films, 2011, 918–21. https://doi.org/10.1016/j.tsf.2011.04.181.'
ieee: 'T. Wagner, J. Hennemann, C.-D. Kohl, and M. Tiemann, “Photocatalytic ozone
sensor based on mesoporous indium oxide: Influence of the relative humidity on
the sensing performance,” Thin Solid Films, pp. 918–921, 2011, doi: 10.1016/j.tsf.2011.04.181.'
mla: 'Wagner, T., et al. “Photocatalytic Ozone Sensor Based on Mesoporous Indium
Oxide: Influence of the Relative Humidity on the Sensing Performance.” Thin
Solid Films, 2011, pp. 918–21, doi:10.1016/j.tsf.2011.04.181.'
short: T. Wagner, J. Hennemann, C.-D. Kohl, M. Tiemann, Thin Solid Films (2011)
918–921.
date_created: 2021-10-09T04:57:57Z
date_updated: 2023-03-09T08:29:14Z
department:
- _id: '35'
- _id: '2'
- _id: '307'
doi: 10.1016/j.tsf.2011.04.181
language:
- iso: eng
page: 918-921
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
quality_controlled: '1'
status: public
title: 'Photocatalytic ozone sensor based on mesoporous indium oxide: Influence of
the relative humidity on the sensing performance'
type: journal_article
user_id: '23547'
year: '2011'
...
---
_id: '25974'
abstract:
- lang: eng
text: We present the preparation of a semiconductor gas sensor based on ordered
mesoporous In2O3. The In2O3 was synthesized by structure replication procedure
from cubic KIT-6 silica. A detailed analysis of the morphology of the mesoporous
powders as well as of the prepared sensing layer will be shown. Unique properties
arise from the synthesis method of structure replication such as well defined
porosity in the mesoporous regime and nanocrystallites with high thermal stability
up to 450 °C. These properties are useful for the application in semiconducting
gas sensors. Test measurements show sensitivity to methane gas in concentrations
relevant for explosion prevention.
article_type: original
author:
- first_name: T.
full_name: Wagner, T.
last_name: Wagner
- first_name: T.
full_name: Sauerwald, T.
last_name: Sauerwald
- first_name: C.-D.
full_name: Kohl, C.-D.
last_name: Kohl
- first_name: T.
full_name: Waitz, T.
last_name: Waitz
- first_name: C.
full_name: Weidmann, C.
last_name: Weidmann
- first_name: Michael
full_name: Tiemann, Michael
id: '23547'
last_name: Tiemann
orcid: 0000-0003-1711-2722
citation:
ama: Wagner T, Sauerwald T, Kohl C-D, Waitz T, Weidmann C, Tiemann M. Gas sensor
based on ordered mesoporous In2O3. Thin Solid Films. Published online 2009:6170-6175.
doi:10.1016/j.tsf.2009.04.013
apa: Wagner, T., Sauerwald, T., Kohl, C.-D., Waitz, T., Weidmann, C., & Tiemann,
M. (2009). Gas sensor based on ordered mesoporous In2O3. Thin Solid Films,
6170–6175. https://doi.org/10.1016/j.tsf.2009.04.013
bibtex: '@article{Wagner_Sauerwald_Kohl_Waitz_Weidmann_Tiemann_2009, title={Gas
sensor based on ordered mesoporous In2O3}, DOI={10.1016/j.tsf.2009.04.013},
journal={Thin Solid Films}, author={Wagner, T. and Sauerwald, T. and Kohl, C.-D.
and Waitz, T. and Weidmann, C. and Tiemann, Michael}, year={2009}, pages={6170–6175}
}'
chicago: Wagner, T., T. Sauerwald, C.-D. Kohl, T. Waitz, C. Weidmann, and Michael
Tiemann. “Gas Sensor Based on Ordered Mesoporous In2O3.” Thin Solid Films,
2009, 6170–75. https://doi.org/10.1016/j.tsf.2009.04.013.
ieee: 'T. Wagner, T. Sauerwald, C.-D. Kohl, T. Waitz, C. Weidmann, and M. Tiemann,
“Gas sensor based on ordered mesoporous In2O3,” Thin Solid Films, pp. 6170–6175,
2009, doi: 10.1016/j.tsf.2009.04.013.'
mla: Wagner, T., et al. “Gas Sensor Based on Ordered Mesoporous In2O3.” Thin
Solid Films, 2009, pp. 6170–75, doi:10.1016/j.tsf.2009.04.013.
short: T. Wagner, T. Sauerwald, C.-D. Kohl, T. Waitz, C. Weidmann, M. Tiemann, Thin
Solid Films (2009) 6170–6175.
date_created: 2021-10-09T05:28:49Z
date_updated: 2023-03-09T08:43:33Z
department:
- _id: '35'
- _id: '2'
- _id: '307'
doi: 10.1016/j.tsf.2009.04.013
extern: '1'
language:
- iso: eng
page: 6170-6175
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
quality_controlled: '1'
status: public
title: Gas sensor based on ordered mesoporous In2O3
type: journal_article
user_id: '23547'
year: '2009'
...
---
_id: '25988'
abstract:
- lang: eng
text: We report on the synthesis and the gas-sensing properties (CO and NO2 detection)
of mesoporous zinc oxide. A two-step structure replication method for the synthesis
is employed. In the first step mesoporous SBA-15 silica is prepared by the utilization
of self-organization of amphiphilic organic agents. This mesoporous silica is
used as the structure matrix for synthesizing mesoporous carbon CMK-3, which,
in turn, is employed for yet another replication step, using zinc nitrate as the
precursor. The resulting material is characterized by X-ray diffraction and nitrogen
physisorption and its gas-sensing properties are compared with a non-porous ZnO
sample.
article_type: original
author:
- first_name: T.
full_name: Wagner, T.
last_name: Wagner
- first_name: T.
full_name: Waitz, T.
last_name: Waitz
- first_name: J.
full_name: Roggenbuck, J.
last_name: Roggenbuck
- first_name: M.
full_name: Fröba, M.
last_name: Fröba
- first_name: C.-D.
full_name: Kohl, C.-D.
last_name: Kohl
- first_name: Michael
full_name: Tiemann, Michael
id: '23547'
last_name: Tiemann
orcid: 0000-0003-1711-2722
citation:
ama: Wagner T, Waitz T, Roggenbuck J, Fröba M, Kohl C-D, Tiemann M. Ordered mesoporous
ZnO for gas sensing. Thin Solid Films. Published online 2007:8360-8363.
doi:10.1016/j.tsf.2007.03.021
apa: Wagner, T., Waitz, T., Roggenbuck, J., Fröba, M., Kohl, C.-D., & Tiemann,
M. (2007). Ordered mesoporous ZnO for gas sensing. Thin Solid Films, 8360–8363.
https://doi.org/10.1016/j.tsf.2007.03.021
bibtex: '@article{Wagner_Waitz_Roggenbuck_Fröba_Kohl_Tiemann_2007, title={Ordered
mesoporous ZnO for gas sensing}, DOI={10.1016/j.tsf.2007.03.021},
journal={Thin Solid Films}, author={Wagner, T. and Waitz, T. and Roggenbuck, J.
and Fröba, M. and Kohl, C.-D. and Tiemann, Michael}, year={2007}, pages={8360–8363}
}'
chicago: Wagner, T., T. Waitz, J. Roggenbuck, M. Fröba, C.-D. Kohl, and Michael
Tiemann. “Ordered Mesoporous ZnO for Gas Sensing.” Thin Solid Films, 2007,
8360–63. https://doi.org/10.1016/j.tsf.2007.03.021.
ieee: 'T. Wagner, T. Waitz, J. Roggenbuck, M. Fröba, C.-D. Kohl, and M. Tiemann,
“Ordered mesoporous ZnO for gas sensing,” Thin Solid Films, pp. 8360–8363,
2007, doi: 10.1016/j.tsf.2007.03.021.'
mla: Wagner, T., et al. “Ordered Mesoporous ZnO for Gas Sensing.” Thin Solid
Films, 2007, pp. 8360–63, doi:10.1016/j.tsf.2007.03.021.
short: T. Wagner, T. Waitz, J. Roggenbuck, M. Fröba, C.-D. Kohl, M. Tiemann, Thin
Solid Films (2007) 8360–8363.
date_created: 2021-10-09T09:42:12Z
date_updated: 2023-03-09T08:49:25Z
department:
- _id: '35'
- _id: '2'
- _id: '307'
doi: 10.1016/j.tsf.2007.03.021
extern: '1'
language:
- iso: eng
page: 8360-8363
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
quality_controlled: '1'
status: public
title: Ordered mesoporous ZnO for gas sensing
type: journal_article
user_id: '23547'
year: '2007'
...
---
_id: '13720'
author:
- first_name: Wolf Gero
full_name: Schmidt, Wolf Gero
id: '468'
last_name: Schmidt
orcid: 0000-0002-2717-5076
- first_name: K.
full_name: Seino, K.
last_name: Seino
- first_name: P.H.
full_name: Hahn, P.H.
last_name: Hahn
- first_name: F.
full_name: Bechstedt, F.
last_name: Bechstedt
- first_name: W.
full_name: Lu, W.
last_name: Lu
- first_name: S.
full_name: Wang, S.
last_name: Wang
- first_name: J.
full_name: Bernholc, J.
last_name: Bernholc
citation:
ama: 'Schmidt WG, Seino K, Hahn PH, et al. Calculation of surface optical properties:
from qualitative understanding to quantitative predictions. Thin Solid Films.
2004;455-456:764-771. doi:10.1016/j.tsf.2003.11.263'
apa: 'Schmidt, W. G., Seino, K., Hahn, P. H., Bechstedt, F., Lu, W., Wang, S., &
Bernholc, J. (2004). Calculation of surface optical properties: from qualitative
understanding to quantitative predictions. Thin Solid Films, 455–456,
764–771. https://doi.org/10.1016/j.tsf.2003.11.263'
bibtex: '@article{Schmidt_Seino_Hahn_Bechstedt_Lu_Wang_Bernholc_2004, title={Calculation
of surface optical properties: from qualitative understanding to quantitative
predictions}, volume={455–456}, DOI={10.1016/j.tsf.2003.11.263},
journal={Thin Solid Films}, author={Schmidt, Wolf Gero and Seino, K. and Hahn,
P.H. and Bechstedt, F. and Lu, W. and Wang, S. and Bernholc, J.}, year={2004},
pages={764–771} }'
chicago: 'Schmidt, Wolf Gero, K. Seino, P.H. Hahn, F. Bechstedt, W. Lu, S. Wang,
and J. Bernholc. “Calculation of Surface Optical Properties: From Qualitative
Understanding to Quantitative Predictions.” Thin Solid Films 455–456 (2004):
764–71. https://doi.org/10.1016/j.tsf.2003.11.263.'
ieee: 'W. G. Schmidt et al., “Calculation of surface optical properties:
from qualitative understanding to quantitative predictions,” Thin Solid Films,
vol. 455–456, pp. 764–771, 2004, doi: 10.1016/j.tsf.2003.11.263.'
mla: 'Schmidt, Wolf Gero, et al. “Calculation of Surface Optical Properties: From
Qualitative Understanding to Quantitative Predictions.” Thin Solid Films,
vol. 455–456, 2004, pp. 764–71, doi:10.1016/j.tsf.2003.11.263.'
short: W.G. Schmidt, K. Seino, P.H. Hahn, F. Bechstedt, W. Lu, S. Wang, J. Bernholc,
Thin Solid Films 455–456 (2004) 764–771.
date_created: 2019-10-09T12:32:37Z
date_updated: 2025-12-16T07:26:18Z
department:
- _id: '15'
- _id: '170'
- _id: '295'
- _id: '35'
- _id: '230'
doi: 10.1016/j.tsf.2003.11.263
language:
- iso: eng
page: 764-771
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
status: public
title: 'Calculation of surface optical properties: from qualitative understanding
to quantitative predictions'
type: journal_article
user_id: '16199'
volume: 455-456
year: '2004'
...
---
_id: '13791'
author:
- first_name: A.
full_name: Scholze, A.
last_name: Scholze
- first_name: Wolf Gero
full_name: Schmidt, Wolf Gero
id: '468'
last_name: Schmidt
orcid: 0000-0002-2717-5076
- first_name: F.
full_name: Bechstedt, F.
last_name: Bechstedt
citation:
ama: Scholze A, Schmidt WG, Bechstedt F. Diamond (111) and (100) surface reconstructions.
Thin Solid Films. 1996;281-282:256-259. doi:10.1016/0040-6090(96)08646-4
apa: Scholze, A., Schmidt, W. G., & Bechstedt, F. (1996). Diamond (111) and
(100) surface reconstructions. Thin Solid Films, 281–282, 256–259.
https://doi.org/10.1016/0040-6090(96)08646-4
bibtex: '@article{Scholze_Schmidt_Bechstedt_1996, title={Diamond (111) and (100)
surface reconstructions}, volume={281–282}, DOI={10.1016/0040-6090(96)08646-4},
journal={Thin Solid Films}, author={Scholze, A. and Schmidt, Wolf Gero and Bechstedt,
F.}, year={1996}, pages={256–259} }'
chicago: 'Scholze, A., Wolf Gero Schmidt, and F. Bechstedt. “Diamond (111) and (100)
Surface Reconstructions.” Thin Solid Films 281–282 (1996): 256–59. https://doi.org/10.1016/0040-6090(96)08646-4.'
ieee: 'A. Scholze, W. G. Schmidt, and F. Bechstedt, “Diamond (111) and (100) surface
reconstructions,” Thin Solid Films, vol. 281–282, pp. 256–259, 1996, doi:
10.1016/0040-6090(96)08646-4.'
mla: Scholze, A., et al. “Diamond (111) and (100) Surface Reconstructions.” Thin
Solid Films, vol. 281–282, 1996, pp. 256–59, doi:10.1016/0040-6090(96)08646-4.
short: A. Scholze, W.G. Schmidt, F. Bechstedt, Thin Solid Films 281–282 (1996) 256–259.
date_created: 2019-10-10T16:10:25Z
date_updated: 2025-12-16T07:29:22Z
department:
- _id: '15'
- _id: '170'
- _id: '295'
- _id: '35'
- _id: '230'
doi: 10.1016/0040-6090(96)08646-4
funded_apc: '1'
language:
- iso: eng
page: 256-259
publication: Thin Solid Films
publication_identifier:
issn:
- 0040-6090
publication_status: published
status: public
title: Diamond (111) and (100) surface reconstructions
type: journal_article
user_id: '16199'
volume: 281-282
year: '1996'
...