---
_id: '58178'
article_number: '114101'
author:
- first_name: Jörg K. N.
  full_name: Lindner, Jörg K. N.
  id: '20797'
  last_name: Lindner
- first_name: Christian
  full_name: Zietlow, Christian
  last_name: Zietlow
citation:
  ama: Lindner JKN, Zietlow C. An applied noise model for low-loss EELS maps. <i>Ultramicroscopy</i>.
    Published online 2025. doi:<a href="https://doi.org/10.1016/j.ultramic.2024.114101">10.1016/j.ultramic.2024.114101</a>
  apa: Lindner, J. K. N., &#38; Zietlow, C. (2025). An applied noise model for low-loss
    EELS maps. <i>Ultramicroscopy</i>, Article 114101. <a href="https://doi.org/10.1016/j.ultramic.2024.114101">https://doi.org/10.1016/j.ultramic.2024.114101</a>
  bibtex: '@article{Lindner_Zietlow_2025, title={An applied noise model for low-loss
    EELS maps}, DOI={<a href="https://doi.org/10.1016/j.ultramic.2024.114101">10.1016/j.ultramic.2024.114101</a>},
    number={114101}, journal={Ultramicroscopy}, publisher={Elsevier BV}, author={Lindner,
    Jörg K. N. and Zietlow, Christian}, year={2025} }'
  chicago: Lindner, Jörg K. N., and Christian Zietlow. “An Applied Noise Model for
    Low-Loss EELS Maps.” <i>Ultramicroscopy</i>, 2025. <a href="https://doi.org/10.1016/j.ultramic.2024.114101">https://doi.org/10.1016/j.ultramic.2024.114101</a>.
  ieee: 'J. K. N. Lindner and C. Zietlow, “An applied noise model for low-loss EELS
    maps,” <i>Ultramicroscopy</i>, Art. no. 114101, 2025, doi: <a href="https://doi.org/10.1016/j.ultramic.2024.114101">10.1016/j.ultramic.2024.114101</a>.'
  mla: Lindner, Jörg K. N., and Christian Zietlow. “An Applied Noise Model for Low-Loss
    EELS Maps.” <i>Ultramicroscopy</i>, 114101, Elsevier BV, 2025, doi:<a href="https://doi.org/10.1016/j.ultramic.2024.114101">10.1016/j.ultramic.2024.114101</a>.
  short: J.K.N. Lindner, C. Zietlow, Ultramicroscopy (2025).
date_created: 2025-01-14T09:41:23Z
date_updated: 2025-02-03T08:23:19Z
department:
- _id: '286'
- _id: '15'
doi: 10.1016/j.ultramic.2024.114101
language:
- iso: eng
publication: Ultramicroscopy
publication_identifier:
  issn:
  - 0304-3991
publication_status: published
publisher: Elsevier BV
status: public
title: An applied noise model for low-loss EELS maps
type: journal_article
user_id: '77496'
year: '2025'
...
---
_id: '59177'
article_number: '114101'
article_type: original
author:
- first_name: Christian
  full_name: Zietlow, Christian
  id: '77368'
  last_name: Zietlow
  orcid: https://orcid.org/0000-0001-9696-619X
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: Zietlow C, Lindner J. An applied noise model for low-loss EELS maps. <i>Ultramicroscopy</i>.
    2025;270. doi:<a href="https://doi.org/10.1016/j.ultramic.2024.114101">10.1016/j.ultramic.2024.114101</a>
  apa: Zietlow, C., &#38; Lindner, J. (2025). An applied noise model for low-loss
    EELS maps. <i>Ultramicroscopy</i>, <i>270</i>, Article 114101. <a href="https://doi.org/10.1016/j.ultramic.2024.114101">https://doi.org/10.1016/j.ultramic.2024.114101</a>
  bibtex: '@article{Zietlow_Lindner_2025, title={An applied noise model for low-loss
    EELS maps}, volume={270}, DOI={<a href="https://doi.org/10.1016/j.ultramic.2024.114101">10.1016/j.ultramic.2024.114101</a>},
    number={114101}, journal={Ultramicroscopy}, publisher={Elsevier BV}, author={Zietlow,
    Christian and Lindner, Jörg}, year={2025} }'
  chicago: Zietlow, Christian, and Jörg Lindner. “An Applied Noise Model for Low-Loss
    EELS Maps.” <i>Ultramicroscopy</i> 270 (2025). <a href="https://doi.org/10.1016/j.ultramic.2024.114101">https://doi.org/10.1016/j.ultramic.2024.114101</a>.
  ieee: 'C. Zietlow and J. Lindner, “An applied noise model for low-loss EELS maps,”
    <i>Ultramicroscopy</i>, vol. 270, Art. no. 114101, 2025, doi: <a href="https://doi.org/10.1016/j.ultramic.2024.114101">10.1016/j.ultramic.2024.114101</a>.'
  mla: Zietlow, Christian, and Jörg Lindner. “An Applied Noise Model for Low-Loss
    EELS Maps.” <i>Ultramicroscopy</i>, vol. 270, 114101, Elsevier BV, 2025, doi:<a
    href="https://doi.org/10.1016/j.ultramic.2024.114101">10.1016/j.ultramic.2024.114101</a>.
  short: C. Zietlow, J. Lindner, Ultramicroscopy 270 (2025).
date_created: 2025-03-28T06:58:55Z
date_updated: 2026-02-04T07:02:20Z
doi: 10.1016/j.ultramic.2024.114101
external_id:
  pmid:
  - '39823700'
intvolume: '       270'
language:
- iso: eng
main_file_link:
- open_access: '1'
oa: '1'
pmid: '1'
publication: Ultramicroscopy
publication_identifier:
  issn:
  - 0304-3991
publication_status: published
publisher: Elsevier BV
quality_controlled: '1'
status: public
title: An applied noise model for low-loss EELS maps
type: journal_article
user_id: '77368'
volume: 270
year: '2025'
...
---
_id: '20892'
article_number: '113118'
author:
- first_name: Julius
  full_name: Bürger, Julius
  last_name: Bürger
- first_name: Thomas
  full_name: Riedl, Thomas
  last_name: Riedl
- first_name: Jörg K.N.
  full_name: Lindner, Jörg K.N.
  last_name: Lindner
citation:
  ama: Bürger J, Riedl T, Lindner JKN. Influence of lens aberrations, specimen thickness
    and tilt on differential phase contrast STEM images. <i>Ultramicroscopy</i>. 2020.
    doi:<a href="https://doi.org/10.1016/j.ultramic.2020.113118">10.1016/j.ultramic.2020.113118</a>
  apa: Bürger, J., Riedl, T., &#38; Lindner, J. K. N. (2020). Influence of lens aberrations,
    specimen thickness and tilt on differential phase contrast STEM images. <i>Ultramicroscopy</i>.
    <a href="https://doi.org/10.1016/j.ultramic.2020.113118">https://doi.org/10.1016/j.ultramic.2020.113118</a>
  bibtex: '@article{Bürger_Riedl_Lindner_2020, title={Influence of lens aberrations,
    specimen thickness and tilt on differential phase contrast STEM images}, DOI={<a
    href="https://doi.org/10.1016/j.ultramic.2020.113118">10.1016/j.ultramic.2020.113118</a>},
    number={113118}, journal={Ultramicroscopy}, author={Bürger, Julius and Riedl,
    Thomas and Lindner, Jörg K.N.}, year={2020} }'
  chicago: Bürger, Julius, Thomas Riedl, and Jörg K.N. Lindner. “Influence of Lens
    Aberrations, Specimen Thickness and Tilt on Differential Phase Contrast STEM Images.”
    <i>Ultramicroscopy</i>, 2020. <a href="https://doi.org/10.1016/j.ultramic.2020.113118">https://doi.org/10.1016/j.ultramic.2020.113118</a>.
  ieee: J. Bürger, T. Riedl, and J. K. N. Lindner, “Influence of lens aberrations,
    specimen thickness and tilt on differential phase contrast STEM images,” <i>Ultramicroscopy</i>,
    2020.
  mla: Bürger, Julius, et al. “Influence of Lens Aberrations, Specimen Thickness and
    Tilt on Differential Phase Contrast STEM Images.” <i>Ultramicroscopy</i>, 113118,
    2020, doi:<a href="https://doi.org/10.1016/j.ultramic.2020.113118">10.1016/j.ultramic.2020.113118</a>.
  short: J. Bürger, T. Riedl, J.K.N. Lindner, Ultramicroscopy (2020).
date_created: 2021-01-12T08:26:40Z
date_updated: 2022-01-06T06:54:41Z
department:
- _id: '321'
- _id: '286'
- _id: '15'
doi: 10.1016/j.ultramic.2020.113118
language:
- iso: eng
publication: Ultramicroscopy
publication_identifier:
  issn:
  - 0304-3991
publication_status: published
status: public
title: Influence of lens aberrations, specimen thickness and tilt on differential
  phase contrast STEM images
type: journal_article
user_id: '46952'
year: '2020'
...
---
_id: '34088'
article_number: '113118'
author:
- first_name: Julius
  full_name: Bürger, Julius
  id: '46952'
  last_name: Bürger
- first_name: Thomas
  full_name: Riedl, Thomas
  id: '36950'
  last_name: Riedl
- first_name: Jörg
  full_name: Lindner, Jörg
  id: '20797'
  last_name: Lindner
citation:
  ama: Bürger J, Riedl T, Lindner J. Influence of lens aberrations, specimen thickness
    and tilt on differential phase contrast STEM images. <i>Ultramicroscopy</i>. 2020;219.
    doi:<a href="https://doi.org/10.1016/j.ultramic.2020.113118">10.1016/j.ultramic.2020.113118</a>
  apa: Bürger, J., Riedl, T., &#38; Lindner, J. (2020). Influence of lens aberrations,
    specimen thickness and tilt on differential phase contrast STEM images. <i>Ultramicroscopy</i>,
    <i>219</i>, Article 113118. <a href="https://doi.org/10.1016/j.ultramic.2020.113118">https://doi.org/10.1016/j.ultramic.2020.113118</a>
  bibtex: '@article{Bürger_Riedl_Lindner_2020, title={Influence of lens aberrations,
    specimen thickness and tilt on differential phase contrast STEM images}, volume={219},
    DOI={<a href="https://doi.org/10.1016/j.ultramic.2020.113118">10.1016/j.ultramic.2020.113118</a>},
    number={113118}, journal={Ultramicroscopy}, publisher={Elsevier BV}, author={Bürger,
    Julius and Riedl, Thomas and Lindner, Jörg}, year={2020} }'
  chicago: Bürger, Julius, Thomas Riedl, and Jörg Lindner. “Influence of Lens Aberrations,
    Specimen Thickness and Tilt on Differential Phase Contrast STEM Images.” <i>Ultramicroscopy</i>
    219 (2020). <a href="https://doi.org/10.1016/j.ultramic.2020.113118">https://doi.org/10.1016/j.ultramic.2020.113118</a>.
  ieee: 'J. Bürger, T. Riedl, and J. Lindner, “Influence of lens aberrations, specimen
    thickness and tilt on differential phase contrast STEM images,” <i>Ultramicroscopy</i>,
    vol. 219, Art. no. 113118, 2020, doi: <a href="https://doi.org/10.1016/j.ultramic.2020.113118">10.1016/j.ultramic.2020.113118</a>.'
  mla: Bürger, Julius, et al. “Influence of Lens Aberrations, Specimen Thickness and
    Tilt on Differential Phase Contrast STEM Images.” <i>Ultramicroscopy</i>, vol.
    219, 113118, Elsevier BV, 2020, doi:<a href="https://doi.org/10.1016/j.ultramic.2020.113118">10.1016/j.ultramic.2020.113118</a>.
  short: J. Bürger, T. Riedl, J. Lindner, Ultramicroscopy 219 (2020).
date_created: 2022-11-15T14:15:16Z
date_updated: 2023-01-10T12:12:40Z
department:
- _id: '15'
- _id: '230'
doi: 10.1016/j.ultramic.2020.113118
intvolume: '       219'
keyword:
- Instrumentation
- Atomic and Molecular Physics
- and Optics
- Electronic
- Optical and Magnetic Materials
language:
- iso: eng
publication: Ultramicroscopy
publication_identifier:
  issn:
  - 0304-3991
publication_status: published
publisher: Elsevier BV
status: public
title: Influence of lens aberrations, specimen thickness and tilt on differential
  phase contrast STEM images
type: journal_article
user_id: '77496'
volume: 219
year: '2020'
...
---
_id: '8772'
author:
- first_name: M
  full_name: Versen, M
  last_name: Versen
- first_name: B
  full_name: Klehn, B
  last_name: Klehn
- first_name: U
  full_name: Kunze, U
  last_name: Kunze
- first_name: Dirk
  full_name: Reuter, Dirk
  id: '37763'
  last_name: Reuter
- first_name: A.D
  full_name: Wieck, A.D
  last_name: Wieck
citation:
  ama: Versen M, Klehn B, Kunze U, Reuter D, Wieck A. Nanoscale devices fabricated
    by direct machining of GaAs with an atomic force microscope. <i>Ultramicroscopy</i>.
    2002:159-163. doi:<a href="https://doi.org/10.1016/s0304-3991(99)00127-8">10.1016/s0304-3991(99)00127-8</a>
  apa: Versen, M., Klehn, B., Kunze, U., Reuter, D., &#38; Wieck, A. . (2002). Nanoscale
    devices fabricated by direct machining of GaAs with an atomic force microscope.
    <i>Ultramicroscopy</i>, 159–163. <a href="https://doi.org/10.1016/s0304-3991(99)00127-8">https://doi.org/10.1016/s0304-3991(99)00127-8</a>
  bibtex: '@article{Versen_Klehn_Kunze_Reuter_Wieck_2002, title={Nanoscale devices
    fabricated by direct machining of GaAs with an atomic force microscope}, DOI={<a
    href="https://doi.org/10.1016/s0304-3991(99)00127-8">10.1016/s0304-3991(99)00127-8</a>},
    journal={Ultramicroscopy}, author={Versen, M and Klehn, B and Kunze, U and Reuter,
    Dirk and Wieck, A.D}, year={2002}, pages={159–163} }'
  chicago: Versen, M, B Klehn, U Kunze, Dirk Reuter, and A.D Wieck. “Nanoscale Devices
    Fabricated by Direct Machining of GaAs with an Atomic Force Microscope.” <i>Ultramicroscopy</i>,
    2002, 159–63. <a href="https://doi.org/10.1016/s0304-3991(99)00127-8">https://doi.org/10.1016/s0304-3991(99)00127-8</a>.
  ieee: M. Versen, B. Klehn, U. Kunze, D. Reuter, and A. . Wieck, “Nanoscale devices
    fabricated by direct machining of GaAs with an atomic force microscope,” <i>Ultramicroscopy</i>,
    pp. 159–163, 2002.
  mla: Versen, M., et al. “Nanoscale Devices Fabricated by Direct Machining of GaAs
    with an Atomic Force Microscope.” <i>Ultramicroscopy</i>, 2002, pp. 159–63, doi:<a
    href="https://doi.org/10.1016/s0304-3991(99)00127-8">10.1016/s0304-3991(99)00127-8</a>.
  short: M. Versen, B. Klehn, U. Kunze, D. Reuter, A.. Wieck, Ultramicroscopy (2002)
    159–163.
date_created: 2019-04-01T08:09:48Z
date_updated: 2022-01-06T07:04:00Z
department:
- _id: '15'
- _id: '230'
doi: 10.1016/s0304-3991(99)00127-8
language:
- iso: eng
page: 159-163
publication: Ultramicroscopy
publication_identifier:
  issn:
  - 0304-3991
publication_status: published
status: public
title: Nanoscale devices fabricated by direct machining of GaAs with an atomic force
  microscope
type: journal_article
user_id: '42514'
year: '2002'
...
---
_id: '8773'
author:
- first_name: S
  full_name: Skaberna, S
  last_name: Skaberna
- first_name: M
  full_name: Versen, M
  last_name: Versen
- first_name: B
  full_name: Klehn, B
  last_name: Klehn
- first_name: U
  full_name: Kunze, U
  last_name: Kunze
- first_name: Dirk
  full_name: Reuter, Dirk
  id: '37763'
  last_name: Reuter
- first_name: A
  full_name: D. Wieck, A
  last_name: D. Wieck
citation:
  ama: Skaberna S, Versen M, Klehn B, Kunze U, Reuter D, D. Wieck A. Fabrication of
    a quantum point contact by the dynamic plowing technique and wet-chemical etching.
    <i>Ultramicroscopy</i>. 2002:153-157. doi:<a href="https://doi.org/10.1016/s0304-3991(99)00126-6">10.1016/s0304-3991(99)00126-6</a>
  apa: Skaberna, S., Versen, M., Klehn, B., Kunze, U., Reuter, D., &#38; D. Wieck,
    A. (2002). Fabrication of a quantum point contact by the dynamic plowing technique
    and wet-chemical etching. <i>Ultramicroscopy</i>, 153–157. <a href="https://doi.org/10.1016/s0304-3991(99)00126-6">https://doi.org/10.1016/s0304-3991(99)00126-6</a>
  bibtex: '@article{Skaberna_Versen_Klehn_Kunze_Reuter_D. Wieck_2002, title={Fabrication
    of a quantum point contact by the dynamic plowing technique and wet-chemical etching},
    DOI={<a href="https://doi.org/10.1016/s0304-3991(99)00126-6">10.1016/s0304-3991(99)00126-6</a>},
    journal={Ultramicroscopy}, author={Skaberna, S and Versen, M and Klehn, B and
    Kunze, U and Reuter, Dirk and D. Wieck, A}, year={2002}, pages={153–157} }'
  chicago: Skaberna, S, M Versen, B Klehn, U Kunze, Dirk Reuter, and A D. Wieck. “Fabrication
    of a Quantum Point Contact by the Dynamic Plowing Technique and Wet-Chemical Etching.”
    <i>Ultramicroscopy</i>, 2002, 153–57. <a href="https://doi.org/10.1016/s0304-3991(99)00126-6">https://doi.org/10.1016/s0304-3991(99)00126-6</a>.
  ieee: S. Skaberna, M. Versen, B. Klehn, U. Kunze, D. Reuter, and A. D. Wieck, “Fabrication
    of a quantum point contact by the dynamic plowing technique and wet-chemical etching,”
    <i>Ultramicroscopy</i>, pp. 153–157, 2002.
  mla: Skaberna, S., et al. “Fabrication of a Quantum Point Contact by the Dynamic
    Plowing Technique and Wet-Chemical Etching.” <i>Ultramicroscopy</i>, 2002, pp.
    153–57, doi:<a href="https://doi.org/10.1016/s0304-3991(99)00126-6">10.1016/s0304-3991(99)00126-6</a>.
  short: S. Skaberna, M. Versen, B. Klehn, U. Kunze, D. Reuter, A. D. Wieck, Ultramicroscopy
    (2002) 153–157.
date_created: 2019-04-01T08:12:28Z
date_updated: 2022-01-06T07:04:00Z
department:
- _id: '15'
- _id: '230'
doi: 10.1016/s0304-3991(99)00126-6
language:
- iso: eng
page: 153-157
publication: Ultramicroscopy
publication_identifier:
  issn:
  - 0304-3991
publication_status: published
status: public
title: Fabrication of a quantum point contact by the dynamic plowing technique and
  wet-chemical etching
type: journal_article
user_id: '42514'
year: '2002'
...