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Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, <i>27</i>(5). <a href=\"https://doi.org/10.1116/1.3186528\">https://doi.org/10.1116/1.3186528</a>","mla":"Mehta, M., et al. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 27, no. 5, 2097, American Vacuum Society, 2009, doi:<a href=\"https://doi.org/10.1116/1.3186528\">10.1116/1.3186528</a>.","short":"M. Mehta, M. Ruth, K.A. Piegdon, D. Krix, H. Nienhaus, C. 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Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. 2009;27(5). doi:<a href=\"https://doi.org/10.1116/1.3186528\">10.1116/1.3186528</a>","ieee":"M. Mehta, M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and C. Meier, “Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films,” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 27, no. 5, 2009.","chicago":"Mehta, M., M. Ruth, K. A. Piegdon, D. Krix, H. 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D.}, year={2006} }","mla":"Reuter, Dirk, et al. “Fabrication of Submicrometer Patterned Two-Dimensional Electron Gases by Overgrowth of Focused Ion Beam Doped Al[Sub x]Ga[Sub 1−x]As.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, 1863, 2006, doi:<a href=\"https://doi.org/10.1116/1.2217975\">10.1116/1.2217975</a>.","short":"D. Reuter, C. Riedesel, A.D. Wieck, Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures (2006).","apa":"Reuter, D., Riedesel, C., &#38; Wieck, A. D. (2006). Fabrication of submicrometer patterned two-dimensional electron gases by overgrowth of focused ion beam doped Al[sub x]Ga[sub 1−x]As. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. <a href=\"https://doi.org/10.1116/1.2217975\">https://doi.org/10.1116/1.2217975</a>","ama":"Reuter D, Riedesel C, Wieck AD. Fabrication of submicrometer patterned two-dimensional electron gases by overgrowth of focused ion beam doped Al[sub x]Ga[sub 1−x]As. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. 2006. doi:<a href=\"https://doi.org/10.1116/1.2217975\">10.1116/1.2217975</a>","chicago":"Reuter, Dirk, C. Riedesel, and A. D. Wieck. “Fabrication of Submicrometer Patterned Two-Dimensional Electron Gases by Overgrowth of Focused Ion Beam Doped Al[Sub x]Ga[Sub 1−x]As.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, 2006. <a href=\"https://doi.org/10.1116/1.2217975\">https://doi.org/10.1116/1.2217975</a>.","ieee":"D. Reuter, C. Riedesel, and A. D. Wieck, “Fabrication of submicrometer patterned two-dimensional electron gases by overgrowth of focused ion beam doped Al[sub x]Ga[sub 1−x]As,” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, 2006."}}]