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A. and Krix, D. and Nienhaus, H. and Meier, Cedrik}, year={2009} }","mla":"Mehta, M., et al. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 27, no. 5, 2097, American Vacuum Society, 2009, doi:<a href=\"https://doi.org/10.1116/1.3186528\">10.1116/1.3186528</a>.","short":"M. Mehta, M. Ruth, K.A. Piegdon, D. Krix, H. Nienhaus, C. Meier, Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures 27 (2009).","chicago":"Mehta, M., M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and Cedrik Meier. “Inductively Coupled Plasma Reactive Ion Etching of Bulk ZnO Single Crystal and Molecular Beam Epitaxy Grown ZnO Films.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i> 27, no. 5 (2009). <a href=\"https://doi.org/10.1116/1.3186528\">https://doi.org/10.1116/1.3186528</a>.","apa":"Mehta, M., Ruth, M., Piegdon, K. A., Krix, D., Nienhaus, H., &#38; Meier, C. (2009). Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, <i>27</i>(5). <a href=\"https://doi.org/10.1116/1.3186528\">https://doi.org/10.1116/1.3186528</a>","ieee":"M. Mehta, M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and C. Meier, “Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films,” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, vol. 27, no. 5, 2009."},"_id":"7497","publisher":"American Vacuum Society","volume":27,"user_id":"20798","status":"public","date_created":"2019-02-04T14:44:44Z","department":[{"_id":"15"},{"_id":"230"},{"_id":"287"},{"_id":"35"}],"type":"journal_article","issue":"5","publication":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures","language":[{"iso":"eng"}],"article_number":"2097","doi":"10.1116/1.3186528","publication_identifier":{"issn":["1071-1023"]},"author":[{"full_name":"Mehta, M.","last_name":"Mehta","first_name":"M."},{"first_name":"M.","last_name":"Ruth","full_name":"Ruth, M."},{"full_name":"Piegdon, K. A.","last_name":"Piegdon","first_name":"K. 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Quantum size effect of valence band plasmon energies in Si and SnO[sub x] nanoparticles. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. 2006;24(3). doi:<a href=\"https://doi.org/10.1116/1.2190658\">10.1116/1.2190658</a>","bibtex":"@article{Nienhaus_Kravets_Koutouzov_Meier_Lorke_Wiggers_Kennedy_Kruis_2006, title={Quantum size effect of valence band plasmon energies in Si and SnO[sub x] nanoparticles}, volume={24}, DOI={<a href=\"https://doi.org/10.1116/1.2190658\">10.1116/1.2190658</a>}, number={31156}, journal={Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures}, publisher={American Vacuum Society}, author={Nienhaus, H. and Kravets, V. and Koutouzov, S. and Meier, Cedrik and Lorke, A. and Wiggers, H. and Kennedy, M. K. and Kruis, F. E.}, year={2006} }","apa":"Nienhaus, H., Kravets, V., Koutouzov, S., Meier, C., Lorke, A., Wiggers, H., … Kruis, F. E. (2006). 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Kruis. “Quantum Size Effect of Valence Band Plasmon Energies in Si and SnO[Sub x] Nanoparticles.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i> 24, no. 3 (2006). <a href=\"https://doi.org/10.1116/1.2190658\">https://doi.org/10.1116/1.2190658</a>."}},{"publication":"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures","citation":{"bibtex":"@article{Reuter_Riedesel_Wieck_2006, title={Fabrication of submicrometer patterned two-dimensional electron gases by overgrowth of focused ion beam doped Al[sub x]Ga[sub 1−x]As}, DOI={<a href=\"https://doi.org/10.1116/1.2217975\">10.1116/1.2217975</a>}, number={1863}, journal={Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures}, author={Reuter, Dirk and Riedesel, C. and Wieck, A. D.}, year={2006} }","ama":"Reuter D, Riedesel C, Wieck AD. Fabrication of submicrometer patterned two-dimensional electron gases by overgrowth of focused ion beam doped Al[sub x]Ga[sub 1−x]As. <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>. 2006. doi:<a href=\"https://doi.org/10.1116/1.2217975\">10.1116/1.2217975</a>","mla":"Reuter, Dirk, et al. “Fabrication of Submicrometer Patterned Two-Dimensional Electron Gases by Overgrowth of Focused Ion Beam Doped Al[Sub x]Ga[Sub 1−x]As.” <i>Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures</i>, 1863, 2006, doi:<a href=\"https://doi.org/10.1116/1.2217975\">10.1116/1.2217975</a>.","short":"D. Reuter, C. Riedesel, A.D. Wieck, Journal of Vacuum Science &#38; Technology B: Microelectronics and Nanometer Structures (2006).","chicago":"Reuter, Dirk, C. Riedesel, and A. D. 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